CN1121644A - Probe card - Google Patents
Probe card Download PDFInfo
- Publication number
- CN1121644A CN1121644A CN95109441A CN95109441A CN1121644A CN 1121644 A CN1121644 A CN 1121644A CN 95109441 A CN95109441 A CN 95109441A CN 95109441 A CN95109441 A CN 95109441A CN 1121644 A CN1121644 A CN 1121644A
- Authority
- CN
- China
- Prior art keywords
- detecting card
- probe
- supported hole
- fixing device
- card
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07342—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being at an angle other than perpendicular to test object, e.g. probe card
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measuring Leads Or Probes (AREA)
Abstract
The present invention relates to a detecting card that is used for testing a semiconductor component. The detecting card comprises a group of chips having a section of bending probe supporting holes, and a group of probes that are inserted into the probe supporting holes respectively. Because the detecting card is made of the material that is the same as the wafer to make the thermal expansion rate of the detecting card is the same as that of the wafer, the test error caused by the temperature change is prevented, and fixing the probes in the bending probe supporting holes by the tensile force can test various types of the semiconductor components, and the detecting card with the half eon service life can be attained because the new probe easily replace the old probe.
Description
The present invention relates to a kind of detecting card, relate to a kind of detecting card with bending shape probe supported hole or rather, it has excellent certainty of measurement and semipermanent life-span.
Detecting card is the device on a kind of terminal pin (pad) that the signal of telecommunication is sent to semiconductor element in the characteristic test of for example semiconductor element wafer of memory chips, logic wafer and System on chip and so on, it has all kinds, for example epoxy resin detecting card, vertical shape detecting card and film shape detecting card.
To the epoxy resin detecting card of prior art the most frequently used in each detecting card be described below with reference to Fig. 1.
Fig. 1 is to use the schematic diagram of wafer detection system of a kind of epoxy resin detecting card of prior art, the wafer 11 that is formed with semiconductor element thereon is fixed on the main body 12, uses the detecting card 10 that constitutes and have the probe that a rule tilts by epoxy resin to measure property of semiconductor element on wafer 11 then.
Yet the coefficient of thermal expansion of epoxy resin detecting card is different with the coefficient of thermal expansion of wafer, makes the probe and the inaccurate aligning of the terminal pin on the wafer of epoxy resin test card, and this is because the temperature of the main body in testing apparatus approximately is increased to 85 ℃ and cause dislocation.In addition, because the probe adhesive securement, the replacing of waste and old probe is difficult, so the life-span of detecting card is limited.
Therefore, an object of the present invention is to provide a kind of detecting card, the coefficient of thermal expansion of its coefficient of thermal expansion and wafer is identical and to make test be accurate, and its life-span be semipermanent, simple in structure in addition and be used for the test change assembly easily of more eurypalynous semiconductor element.
This purpose of the present invention can be finished by a detecting card that uses in semiconductor element test, and it comprises a substrate, and this substrate has one group of probe supported hole that has a bending shape section, reaches the probe that one group of working pressure selectively inserts the probe supported hole.
For better understanding the present invention, this specification has the following example figure:
Fig. 1 is the schematic diagram of the wafer detection system of the prior art of an epoxy resin detecting card of employing;
Fig. 2 A is at the perspective view of probe insertion with last detecting card of the present invention;
Fig. 2 B is at the profile of probe insertion with last detecting card of the present invention;
Fig. 3 A is the sectional perspective view that inserts back one detecting card of the present invention at probe;
Fig. 3 B is the fragmentary cross-sectional view that inserts back one detecting card of the present invention at probe.
Below with reference to accompanying drawing one embodiment of the present of invention are described.
Fig. 2 A and Fig. 2 B are respectively the perspective view of detecting card and cutaway view before probe is inserted into according to one embodiment of present invention.The probe supported hole 22 that has bending shape part in a large number forms in the silicon chip 21 of insulation board, and forms the polyimide layer 20 of a preliminary dimension in the edge of silicon base layer 21, is used for fixing the lead of an I/O test signal.At this moment, on the structure of silicon chip 21 with sandwich construction, can be made into bending shape probe supported hole 22, and because the component of silicon chip 21 is identical with the component of the silicon wafer that is formed with the element that will test, so even variation of ambient temperature also can detect accurately.
Fig. 3 A and Fig. 3 B are respectively the sectional perspective view of detecting card and profile after probe is inserted into according to one embodiment of present invention, in many probe supported holes 22, probe 30 is passed probe supported hole corresponding to element formwork to be measured, at this, probe 30 is that the tension force that utilizes the structure by probe supported hole 22 to produce fixes.This tension force has improved the conductivity between probe 30 and the terminal pin 31.
The I/O of test signal is to realize by the mode that the tension force that lead 33 is connected with probe in being fixed on bending shape probe supported hole 22 and uses the bending structure by probe supported hole 22 to be produced leans on probe 30 to push the terminal pin 31 of element to be tested, and improves conductivity between terminal pin 31 and the probe 30 according to the tension force of probe 30.Therefore, after test, on terminal pin 31, leave probe impression 32.
The power of the tension force of the angle of bend may command probe 30 by adjusting probe supported hole 22.
As a reference, be used in the bending shape detecting card of test of semiconductor device 16M DRAM one, the diameter of bending shape probe supported hole 22 is 130 μ m, the dislocation of bending shape probe supported hole 22 is 20 μ m, the material of probe 30 is a tungsten, the diameter of probe 30 is 125 μ m, and the diameter of the end of probe 30 is 15 μ m-30 μ m.
According to the present invention, because detecting card is by making with the wafer identical materials, make that the coefficient of thermal expansion of detecting card is identical with the coefficient of thermal expansion of wafer, so prevented to vary with temperature and the test error that causes.And, by with tension force with probe stationary in bending shape probe supported hole, can test various types of semiconductor elements, and because be easy to change old probe, and can obtain the detecting card in a semipermanent life-span with new probe.
Claims (13)
1, a kind of detecting card that is used for the measuring semiconductor element comprises:
One substrate, it has one group of probe supported hole that has a bending shape section;
One group of probe inserts respectively in the described probe supported hole.
2, detecting card as claimed in claim 1, wherein, described substrate is by making with tested semiconductor element identical materials.
3, detecting card as claimed in claim 2, wherein, described substrate forms with lamination layer structure, is used for described probe supported hole is made bending shape.
4, detecting card as claimed in claim 3, wherein, described substrate also comprises the wire fixing device of the lead of a fixedly I/O test signal.
5, detecting card as claimed in claim 4, wherein, described wire fixing device is arranged on the edge of described substrate.
6, detecting card as claimed in claim 5, wherein, described wire fixing device is made by polyimides.
7, detecting card as claimed in claim 1, wherein, each probe of described probe groups is fixed in the described probe supported hole by the tension force of utilization by the structure generation of described probe supported hole.
8, detecting card as claimed in claim 7, wherein, described each probe supported hole all is formed with an angle of bend, and the angle of bend that is inserted in the described probe of described probe supported hole by control is adjusted the power by the tension force that angle of bend produced of described probe supported hole.
9, detecting card as claimed in claim 8, wherein, described substrate is by making with semiconductor element identical materials to be tested.
10, detecting card as claimed in claim 9, wherein, described substrate is formed by lamination layer structure, is used to form described bending shape probe supported hole.
11, detecting card as claimed in claim 10, wherein, described substrate also comprises the wire fixing device of the I/O lead of a fixing test signal.
12, detecting card as claimed in claim 11, wherein, described wire fixing device is set on the edge of described substrate.
13, detecting card as claimed in claim 12, wherein, described wire fixing device is made by polyimides.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR94016769A KR0135244B1 (en) | 1994-07-12 | 1994-07-12 | Probe card |
| KR9416769 | 1994-07-12 | ||
| KR94-16769 | 1994-07-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1121644A true CN1121644A (en) | 1996-05-01 |
| CN1076871C CN1076871C (en) | 2001-12-26 |
Family
ID=19387831
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN95109441A Expired - Fee Related CN1076871C (en) | 1994-07-12 | 1995-07-12 | Probe card |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR0135244B1 (en) |
| CN (1) | CN1076871C (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100343968C (en) * | 2004-04-09 | 2007-10-17 | 矽统科技股份有限公司 | Detecting head of tester |
| CN100431127C (en) * | 2004-06-14 | 2008-11-05 | 飞而康公司 | Silicon wafer for probe bonding and probe bonding method using thereof |
| CN100451660C (en) * | 2004-05-14 | 2009-01-14 | 精炼金属股份有限公司 | Electrical test device |
| CN101151540B (en) * | 2005-03-31 | 2010-07-21 | 奥克泰克有限公司 | Microstructure probe card, and microstructure inspecting device and method |
| CN102384992A (en) * | 2011-07-12 | 2012-03-21 | 日月光半导体制造股份有限公司 | Probe card and manufacturing method thereof |
| CN101796623B (en) * | 2007-07-02 | 2012-04-04 | 李在夏 | Probe assembly and manufacturing method thereof |
| CN102651506A (en) * | 2011-02-23 | 2012-08-29 | 光九实业股份有限公司 | Conducting colloid with bent leads |
| CN105358991A (en) * | 2013-07-11 | 2016-02-24 | 约翰国际有限公司 | Testing apparatus for wafer level IC testing |
| CN106526449A (en) * | 2016-10-26 | 2017-03-22 | 华为技术有限公司 | Chip test board and chip test method |
| CN110389243A (en) * | 2018-04-18 | 2019-10-29 | 中华精测科技股份有限公司 | Probe card device and its rectangular probe |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1740963A4 (en) * | 2004-04-01 | 2010-12-22 | Wentworth Lab Inc | Double side probing of semiconductor devices |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6180330A (en) * | 1984-09-26 | 1986-04-23 | Fujitsu Ltd | Voice recognizing device |
| JPH04145638A (en) * | 1990-10-05 | 1992-05-19 | Tokyo Kasoode Kenkyusho:Kk | Semiconductor wafer inspecting device |
-
1994
- 1994-07-12 KR KR94016769A patent/KR0135244B1/en not_active IP Right Cessation
-
1995
- 1995-07-12 CN CN95109441A patent/CN1076871C/en not_active Expired - Fee Related
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100343968C (en) * | 2004-04-09 | 2007-10-17 | 矽统科技股份有限公司 | Detecting head of tester |
| CN100451660C (en) * | 2004-05-14 | 2009-01-14 | 精炼金属股份有限公司 | Electrical test device |
| CN100431127C (en) * | 2004-06-14 | 2008-11-05 | 飞而康公司 | Silicon wafer for probe bonding and probe bonding method using thereof |
| CN101151540B (en) * | 2005-03-31 | 2010-07-21 | 奥克泰克有限公司 | Microstructure probe card, and microstructure inspecting device and method |
| CN101796623B (en) * | 2007-07-02 | 2012-04-04 | 李在夏 | Probe assembly and manufacturing method thereof |
| CN102651506A (en) * | 2011-02-23 | 2012-08-29 | 光九实业股份有限公司 | Conducting colloid with bent leads |
| CN102384992A (en) * | 2011-07-12 | 2012-03-21 | 日月光半导体制造股份有限公司 | Probe card and manufacturing method thereof |
| CN105358991A (en) * | 2013-07-11 | 2016-02-24 | 约翰国际有限公司 | Testing apparatus for wafer level IC testing |
| CN105358991B (en) * | 2013-07-11 | 2019-03-19 | 约翰国际有限公司 | The test device and method tested for microcircuit and wafer scale IC |
| CN106526449A (en) * | 2016-10-26 | 2017-03-22 | 华为技术有限公司 | Chip test board and chip test method |
| CN106526449B (en) * | 2016-10-26 | 2019-02-12 | 华为技术有限公司 | Chip test board and chip test method |
| CN110389243A (en) * | 2018-04-18 | 2019-10-29 | 中华精测科技股份有限公司 | Probe card device and its rectangular probe |
| CN110389243B (en) * | 2018-04-18 | 2022-05-06 | 台湾中华精测科技股份有限公司 | Probe card device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR0135244B1 (en) | 1998-04-25 |
| KR960005745A (en) | 1996-02-23 |
| CN1076871C (en) | 2001-12-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20011226 |