CN112144013A - 一种GT35球碗零件内表面TiN厚膜制备方法 - Google Patents

一种GT35球碗零件内表面TiN厚膜制备方法 Download PDF

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CN112144013A
CN112144013A CN201910571586.XA CN201910571586A CN112144013A CN 112144013 A CN112144013 A CN 112144013A CN 201910571586 A CN201910571586 A CN 201910571586A CN 112144013 A CN112144013 A CN 112144013A
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titanium nitride
transition layer
transition
deposition
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赵显伟
毕新儒
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Shaanxi Aerospace Times Navigation Equipment Co ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本发明公开了一种GT35球碗零件内表面TiN厚膜制备方法，球碗零件置于真空炉内抽真空并加热，通入氩气进行氩离子刻蚀，氩离子刻蚀完成后开启靶材对零件表面镀打底层，打底层将零件表面全覆盖后对零件表面沉积氮化钛过渡层，过渡层包括氮化钛第一过渡层和氮化钛第二过渡层，沉积氮化钛第一过渡层的弧电电流为60A弧电电压为180V，沉积时长为30分钟；在该氮化钛第一过渡层基础上沉积氮化钛层第二过渡层，沉积该氮化钛第二过渡层的弧电电流为120A弧电电压200V，沉积时长为20分钟，氮化钛第一过渡层和氮化钛第二过渡层交替沉积多次直至总厚度大于等于10μm形成过渡层，在过渡层上沉积氮化钛功能层，功能层沉积完成后即可冷却出炉。

Description

一种GT35球碗零件内表面TiN厚膜制备方法
技术领域
本发明涉及一种无力气相沉积工艺，尤其涉及针对GT35球碗零件内表面制备TiN厚膜的工艺方法。
背景技术
在PVD行业中，TiN膜层由于柱状晶结构的影响，膜层内应力过大，一出现膜层开裂、脱落、起皮等缺陷引起膜层失效，采用常规工艺方法沉积的TiN膜层的厚度一般均在5μm以下，很难满足球碗要求的15μm以上膜层厚度要求。
发明内容
为了解决现有技术中的不足，提供一种膜层厚度达到15μm以上且结合力好，不易开裂、脱落、起皮的GT35球碗零件内表面TiN厚膜制备方法：
一种GT35球碗零件内表面TiN厚膜制备方法，球碗零件置于真空炉内抽真空并加热至指定温度，通入氩气对零件表面进行氩离子刻蚀，氩离子刻蚀完成后开启靶材对零件表面镀打底层，打底层对零件表面全覆盖后通入饱和量的氮气并开启钛靶对零件表面沉积氮化钛过渡层，过渡层包括氮化钛第一过渡层和氮化钛第二过渡层，沉积氮化钛第一过渡层的弧电电流为60A弧电电压为180V，沉积时长为30分钟；在该氮化钛第一过渡层基础上沉积氮化钛层第二过渡层，沉积该氮化钛第二过渡层的弧电电流为120A弧电电压200V，沉积时长为20分钟，氮化钛第一过渡层和氮化钛第二过渡层交替沉积多次直至总厚度大于等于10μm形成过渡层，在过渡层上沉积氮化钛功能层，沉积功能弧电电流80A弧电电压180V沉积100分钟，功能层沉积完成后即可冷却出炉。
进一步的，氩气和氮气通入量由炉内压控制，初始炉内压为4×10-5mbar，氩离子刻蚀时炉内压为3×10-2mbar，镀打底层时炉内压为3×10-2mbar，沉积过渡层和功能层时炉内压为3×10-2mbar。
进一步的，氩离子刻蚀、沉积过渡层和沉积功能层时温度保持在360～400℃，冷却温度降至80℃以下即可出炉。
该工艺中由于过渡层采用两种不同沉积速率的氮化钛层交替沉积形成，从而打断柱状晶的连续生成，使得膜层结合力好，膜层厚度达到15μm以上也会造成开裂、脱落、起皮的现象。
具体实施方式
本发明提供一种GT35球碗零件内表面TiN厚膜制备方法，首先将零件装入真空炉内抽真空，炉内温度升高至360～400℃，向炉内通入氩气对零件表面进行氩离子刻蚀，在氩离子刻蚀完成后开启靶材(该靶材可选用Cr或Ti)对零件内表面镀打底层，待打底层将零件表面全覆盖后完成打底，之后通入饱和量的氮气并开启钛靶在零件表面沉积氮化钛过渡层，该过渡层包括氮化钛第一过渡层和氮化钛第二过渡层，氮化钛第一过渡层沉积时采用的弧电电流为80A弧电电压为180V沉积时长为30分钟，第二过渡层沉积时采用的弧电电流为120A弧电电压为200V沉积时长为20分钟，通过改变沉积时的电流和电压值改变柱状晶成长速度，避免柱状晶生长过大造成氮化钛过渡层断裂，整个过渡层通过第一过渡层和第二过渡层交替成绩数次厚度大于等于10μm即可完成，第一过渡层和第二过渡层厚度均不超过5μm为最佳，可以避免柱状晶生成过大，之后在过渡层上沉积氮化钛功能层，沉积该功能层时采用的电话电流为80A弧电电压为180V沉积100分钟，功能层沉积厚度一般达到6μm以上即可完成。
上述方案中通入氩气和氮气的量由炉内压控制，初始炉内压为4×10-5mbar，氩离子刻蚀时炉内压为3×10-2mbar，镀打底层时炉内压为3×10-2mbar，沉积过渡层和功能层时炉内压为3×10-2mbar，氩离子刻蚀、沉积过渡层和沉积功能层时温度保持在360～400℃，冷却温度降至80℃以下即可出炉。

Claims (3)

1.一种GT35球碗零件内表面TiN厚膜制备方法，其特征在于：球碗零件置于真空炉内抽真空并加热至指定温度，通入氩气对零件表面进行氩离子刻蚀，氩离子刻蚀完成后开启靶材对零件表面镀打底层，打底层将零件表面全覆盖后通入饱和量的氮气并开启钛靶对零件表面沉积氮化钛过渡层，过渡层包括氮化钛第一过渡层和氮化钛第二过渡层，沉积氮化钛第一过渡层的弧电电流为60A弧电电压为180V，沉积时长为30分钟；在该氮化钛第一过渡层基础上沉积氮化钛层第二过渡层，沉积该氮化钛第二过渡层的弧电电流为120A弧电电压200V，沉积时长为20分钟，氮化钛第一过渡层和氮化钛第二过渡层交替沉积多次直至总厚度大于等于10μm形成过渡层，在过渡层上沉积氮化钛功能层，沉积功能层弧电电流80A弧电电压180V沉积100分钟，功能层沉积完成后即可冷却出炉。
2.根据权利要求1所述的一种GT35球碗零件内表面TiN厚膜制备方法，其特征在于：氩气和氮气通入量由炉内压控制，初始炉内压为4×10-5mbar，氩离子刻蚀时炉内压为3×10- 2mbar，镀打底层时炉内压为3×10-2mbar，沉积过渡层和功能层时炉内压为3×10-2mbar。
3.根据权利要求1或2所述的一种GT35球碗零件内表面TiN厚膜制备方法，其特征在于：氩离子刻蚀、沉积过渡层和沉积功能层时温度保持在360～400℃，冷却温度降至80℃以下即可出炉。
CN201910571586.XA 2019-06-28 2019-06-28 一种GT35球碗零件内表面TiN厚膜制备方法 Withdrawn CN112144013A (zh)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113249689A (zh) * 2021-05-12 2021-08-13 东莞市华升真空镀膜科技有限公司 工件涂层及其制备方法与应用
CN113652637A (zh) * 2021-08-09 2021-11-16 陕西航天时代导航设备有限公司 GT35球碗曲面沉积TiN膜工艺方法

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CN101338412A (zh) * 2008-07-23 2009-01-07 西南交通大学 一种低应力氮化铬多层硬质薄膜的制备方法
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CN104911551A (zh) * 2015-06-03 2015-09-16 陕西航天导航设备有限公司 一种厚度为21.5μm的TiN膜制备方法
CN108823544A (zh) * 2018-09-12 2018-11-16 杨杰平 基于氮化钛复合膜及其制备方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0289173A1 (en) * 1987-04-30 1988-11-02 The British Petroleum Company p.l.c. Wear-resistant coated object
CN101298655A (zh) * 2007-04-30 2008-11-05 中国科学院金属研究所 一种纳米叠层TiN梯度膜及其制备方法
CN101338412A (zh) * 2008-07-23 2009-01-07 西南交通大学 一种低应力氮化铬多层硬质薄膜的制备方法
CN102517546A (zh) * 2011-12-30 2012-06-27 山推工程机械股份有限公司 一种耐磨刀具的加工方法
CN104911551A (zh) * 2015-06-03 2015-09-16 陕西航天导航设备有限公司 一种厚度为21.5μm的TiN膜制备方法
CN108823544A (zh) * 2018-09-12 2018-11-16 杨杰平 基于氮化钛复合膜及其制备方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113249689A (zh) * 2021-05-12 2021-08-13 东莞市华升真空镀膜科技有限公司 工件涂层及其制备方法与应用
CN113652637A (zh) * 2021-08-09 2021-11-16 陕西航天时代导航设备有限公司 GT35球碗曲面沉积TiN膜工艺方法

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