CN112080733A - Tail gas discharging device and vacuum coating system - Google Patents
Tail gas discharging device and vacuum coating system Download PDFInfo
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- CN112080733A CN112080733A CN201910517150.2A CN201910517150A CN112080733A CN 112080733 A CN112080733 A CN 112080733A CN 201910517150 A CN201910517150 A CN 201910517150A CN 112080733 A CN112080733 A CN 112080733A
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- exhaust
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- air inlet
- tail gas
- gas discharge
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
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- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses a tail gas discharge device and a vacuum coating system, belongs to the technical field of coating, and is designed for solving the problems of airflow disturbance and the like during tail gas discharge. The tail gas discharge device comprises a shell, wherein an air inlet cavity and an exhaust cavity are arranged in the shell, the exhaust cavity is arranged around the air inlet cavity, a flow guide air hole communicated with the exhaust cavity and the air inlet cavity is formed in the side wall of the air inlet cavity, an air inlet communicated with the air inlet cavity and the outside is formed in the shell, a discharge pipeline communicated with the exhaust cavity is connected to the side wall of the shell, and the discharge pipeline is horizontally arranged. The vacuum coating system comprises a vacuum coating machine and the tail gas discharge device, wherein the vacuum coating machine is provided with a tail gas discharge port, and the tail gas discharge port is communicated with a gas inlet of the tail gas discharge device. The tail gas discharge device and the vacuum coating system realize uniform discharge of tail gas along the horizontal direction, and avoid the phenomenon that the growth of a film system is deteriorated due to gas disturbance and rapid edge temperature reduction during tail gas discharge.
Description
Technical Field
The invention relates to the technical field of coating, in particular to a tail gas discharge device and a vacuum coating system comprising the same.
Background
Chemical vapor deposition is a chemical technology, which is a method for generating a film by performing a chemical reaction on the surface of a substrate by using one or more gas-phase compounds or simple substances containing film elements. Usually, a vacuum coating system is used for chemical vapor deposition to form a film, and the vacuum coating system comprises a tail gas discharge device for discharging tail gas generated after reaction. The existing tail gas emission device has the following defects: the gas is easily disturbed, the edge temperature is reduced quickly, and the gas is easy to block, and any air hole blockage can cause uneven gas flow distribution, so that the growth of a film system is poor.
Disclosure of Invention
An object of the present invention is to provide an exhaust gas discharge device capable of solving the problem of disturbance of the flow of exhaust gas during exhaust gas discharge.
Another objective of the present invention is to provide a vacuum coating system including the exhaust gas discharge device.
To achieve the purpose, on one hand, the invention adopts the following technical scheme:
the tail gas discharge device comprises a shell, wherein an air inlet cavity and an air outlet cavity are arranged in the shell, the air outlet cavity surrounds the air inlet cavity, a flow guide air hole communicated with the air outlet cavity and the air inlet cavity is formed in the side wall of the air inlet cavity, an air inlet communicated with the air inlet cavity and the outside is formed in the shell, a discharge pipeline communicated with the air outlet cavity is connected to the side wall of the shell, and the discharge pipeline is horizontally arranged.
In one embodiment, the exhaust cavity comprises a first exhaust cavity and a second exhaust cavity, and the first exhaust cavity and the second exhaust cavity are independent of each other; the discharge pipeline comprises a first discharge pipeline and a second discharge pipeline, and the first discharge pipeline and the second discharge pipeline are respectively communicated with the first exhaust cavity and the second exhaust cavity.
In one embodiment, the first exhaust cavity is arranged symmetrically to the second exhaust cavity.
In one embodiment, the exhaust emission device further comprises a three-way pipe for connecting an exhaust power system, and the first emission pipeline and the second emission pipeline are respectively connected with the three-way pipe.
In one embodiment, the exhaust emission device further comprises a partition plate and a cover plate, the cover plate and the partition plate are arranged in the shell, the cover plate, the partition plate, the side wall of the shell and the bottom wall of the shell are jointly arranged to form the exhaust cavity, and the partition plate is provided with the flow guide air holes.
In one embodiment, the partition is a quartz plate; or the cover plate is a quartz plate.
In one embodiment, the exhaust gas discharge device further comprises a top plate, the housing is provided with an opening opposite to the bottom wall of the housing, the top plate is covered at the opening, the top plate, the partition plate and the bottom wall of the housing are jointly enclosed to form the air inlet cavity, and the top plate is provided with an air inlet.
In one embodiment, the exhaust emission device further comprises a fixing bracket for mounting the partition plate, the fixing bracket is fixedly arranged at four inner corners of the shell, and the fixing bracket is detachably connected with the partition plate.
In one embodiment, the side wall of the shell is provided with an exhaust hole, the inner wall surface of the side wall is provided with a groove, the exhaust hole is communicated with the groove, and the exhaust pipeline is connected to the exhaust hole.
On the other hand, the invention adopts the following technical scheme:
a vacuum coating system comprises a vacuum coating machine and the tail gas discharge device, wherein the vacuum coating machine is provided with a tail gas discharge port, and the tail gas discharge port is communicated with a gas inlet of the tail gas discharge device.
The invention has at least the following beneficial effects:
according to the tail gas discharging device, the air inlet cavity and the air outlet cavity are arranged in the shell, the air outlet cavity is arranged around the air inlet cavity, the side wall of the air inlet cavity is provided with the flow guide air hole communicated with the air outlet cavity and the air inlet cavity, the shell is provided with the air inlet communicated with the air inlet cavity and the outside, the side wall of the shell is connected with the discharging pipeline communicated with the air outlet cavity, and the discharging pipeline is horizontally arranged, so that uniform air flow distribution and horizontal discharging are realized, tail gas entering the tail gas discharging device can be uniformly discharged along the horizontal direction, and the phenomenon that the growth of a membrane system is poor due to disturbance of the gas and rapid reduction of the edge temperature when the gas is vertically flowed from the horizontal.
The vacuum coating system comprises the tail gas discharge device, the problem of airflow disturbance during tail gas discharge is solved through horizontal exhaust of the tail gas discharge device, and the growth of a film system is better in the film forming process.
Drawings
Fig. 1 is a schematic structural diagram of an exhaust gas discharge device according to an embodiment of the present invention;
FIG. 2 is a schematic structural view of the exhaust gas discharge device shown in FIG. 1 without a top plate;
FIG. 3 is a top view of the exhaust emission device of FIG. 2;
FIG. 4 is a transverse cross-sectional view of the exhaust emission device shown in FIG. 3;
FIG. 5 is a partial schematic structural view of a housing of the exhaust emission device shown in FIG. 1;
FIG. 6 is a partial schematic view of the housing of FIG. 5 taken along a central line of symmetry;
the reference numbers illustrate:
the exhaust device comprises a shell 100, an exhaust hole 101, a groove 102, an air inlet cavity 110, a first exhaust cavity 121, a second exhaust cavity 122, a first exhaust pipeline 210, a second exhaust pipeline 220, a three-way pipe 300, a partition plate 400, a flow guide air hole 401, a cover plate 500, a top plate 600, an air inlet hole 601 and a fixed support 700.
Detailed Description
To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
It should be noted that when a portion is referred to as being "secured to" another portion, it can be directly on the other portion or there can be an intervening portion. When a portion is said to be "connected" to another portion, it may be directly connected to the other portion or intervening portions may be present. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
The embodiment discloses a tail gas discharge device capable of solving the problem of airflow disturbance during tail gas discharge. As shown in fig. 1 to 4, the exhaust emission device includes a housing 100, an air inlet cavity 110 and an exhaust cavity are provided in the housing 100, the exhaust cavity is disposed around the air inlet cavity 110, a plurality of air guide holes 401 communicating the exhaust cavity with the air inlet cavity 110 are provided on a side wall of the air inlet cavity 110, the housing 100 is provided with an air inlet communicating the air inlet cavity 110 with the outside, the side wall of the housing 100 is connected with an exhaust pipeline communicating with the exhaust cavity, and the exhaust pipeline is horizontally disposed.
The air inlet is communicated with the air inlet cavity 110 and the outside, the diversion air hole 401 is communicated with the air inlet cavity 110 and the exhaust cavity, the exhaust cavity is communicated with the exhaust pipeline, and the exhaust pipeline is horizontally arranged, so that tail gas can enter the exhaust cavity through the diversion air hole 401 after entering the air inlet cavity 110 from the air inlet, the tail gas is prevented from being directly and intensively gathered to the exhaust pipeline, and the uniform distribution of air flow is realized; and then, horizontally discharging tail gas from the exhaust cavity through a discharge pipeline to realize horizontal exhaust, so that the tail gas entering the tail gas discharge device can be uniformly discharged along the horizontal direction, and the phenomenon that the film system grows worse due to disturbance and rapid edge temperature reduction when the gas turns to a vertical flow direction from the horizontal direction is avoided, thereby solving the problem of gas flow disturbance when the tail gas is discharged.
Specifically, the housing 100 may be made of graphite or quartz, preferably graphite, which is more convenient for processing.
As shown in fig. 4, in order to reduce the phenomenon of uneven distribution of the air flow (uneven air discharge) caused by blockage, a preferred structure of the air discharge cavity comprises a first air discharge cavity 121 and a second air discharge cavity 122, wherein the first air discharge cavity 121 and the second air discharge cavity 122 are independent from each other; the discharge line includes a first discharge line 210 and a second discharge line 220, and the first discharge line 210 and the second discharge line 220 communicate the first exhaust chamber 121 and the second exhaust chamber 122, respectively.
On the basis of the above structure, in order to ensure that the gas is uniformly distributed in the same horizontal direction, the first exhaust chamber 121 is preferably arranged symmetrically with respect to the second exhaust chamber 122, so that the gas flow distribution is more uniform, and the uniformity of the film formation thickness is improved.
On the basis of the above structure, the exhaust gas discharging device further comprises a tee 300 (shown in fig. 1 to 4) for connecting with an exhaust power system, and the first discharging pipeline 210 and the second discharging pipeline 220 are respectively connected with the tee 300. The exhaust power system comprises a vacuum pump, a filter screen and the like, the vacuum pump is used for pumping air from the air inlet cavity 110 and the exhaust cavity, and the air in the air inlet cavity 110 and the exhaust cavity enters the vacuum pump through the exhaust pipeline.
In order to better control the on-off of the exhaust line, in one embodiment, an exhaust valve is disposed between the tee 300 and the vacuum pump, and the exhaust valve is used for controlling the opening and closing of the exhaust line to control the air suction of the vacuum pump to the air inlet cavity 110 and the exhaust cavity.
As shown in fig. 2 to 4, in one embodiment, the exhaust emission device further includes a partition plate 400 and a cover plate 500, the cover plate 500 and the partition plate 400 are both disposed in the casing 100, the cover plate 500, the partition plate 400, the side wall of the casing 100 and the bottom wall of the casing 100 jointly enclose an exhaust cavity, and the partition plate 400 is provided with a diversion air hole 401. The hole wall of the diversion air hole 401 is preferably arc-shaped, so that the diversion air hole 401 can be cylindrical or conical, smooth gas discharge is facilitated, the diversion effect is better, and airflow disturbance is further reduced.
In order to reduce the generation of the deposits on the surface of the spacer 400, the spacer 400 is preferably made of quartz, that is, the spacer 400 is made of quartz. In order to reduce the generation of the adhesion on the surface of the cover plate 500, the cover plate 500 is preferably made of quartz, i.e., the cover plate 500 is made of quartz. Because the surface of the quartz plate is relatively flat and smooth and is not easy to adhere to the quartz plate, the generation of attachments on the surface of the part of the exhaust emission device can be reduced, and the maintenance time of the exhaust emission device is delayed.
On the basis of the structure, as shown in fig. 1, the tail gas discharging device further comprises a top plate 600, the casing 100 is provided with an opening opposite to the bottom wall of the casing 100, the top plate 600 covers the opening and is used for sealing the opening, the top plate 600, the partition plate 400 and the bottom wall of the casing 100 jointly enclose to form the air inlet cavity 110, the top plate 600 is provided with a plurality of air inlets 601, tail gas generated after reaction enters the air inlet cavity 110 from the air inlets 601, and then is conveyed to the air outlet cavity through the diversion air holes 401 on the partition plate 400 in a horizontal spraying mode, and finally is discharged through the discharging pipeline in a horizontal discharging mode. Preferably, the upper surface of the top plate 600 is on the same plane as the upper surface of the base, so that the overall appearance of the exhaust gas discharge device is more beautiful.
Further, as shown in fig. 5 and 6, in one embodiment, a side wall of the housing 100 is provided with a discharge hole 101, an inner wall surface of the side wall is provided with a groove 102, the discharge hole 101 communicates with the groove 102, and a discharge line is connected to the discharge hole 101. By designing the groove 102, smooth gas discharge is facilitated, and gas flow disturbance is reduced. Preferably, the groove 102 is an arc-shaped groove, and the arc-shaped groove can further facilitate smooth gas discharge and reduce gas flow disturbance. More preferably, the groove 102 is a circular arc groove.
In one embodiment, the exhaust gas discharging apparatus further includes a fixing bracket 700 (shown in fig. 4) for mounting the partition 400, the fixing bracket 700 is fixedly disposed in the casing 100, and the fixing bracket 700 is detachably connected to the partition 400. Through the design of the fixing bracket 700 and the detachable connection of the fixing bracket 700 and the partition board 400, the disassembly and the assembly are more convenient, and the installation and the maintenance of the whole exhaust emission device are facilitated. Specifically, as shown in fig. 3 and 4, the casing 100 may be a cube or a cuboid, four inner corners of the casing 100 are respectively provided with one fixing bracket 700, a partition 400 is arranged between every two adjacent fixing brackets 700, and all the fixing brackets 700 and the partitions 400 jointly enclose to form a ring.
The detachable connection between the fixing bracket 700 and the partition 400 includes, but is not limited to, the following: a through sliding groove is formed in one of the partition 400 and the fixing bracket 700, and a protrusion is formed in the other, and the protrusion can be inserted into the sliding groove and move along the sliding groove. For example, a through slide groove may be provided in the partition plate 400, and a protrusion may be provided in the fixing bracket 700; alternatively, the fixing bracket 700 may be provided with a through-groove, and the partition plate 400 may be provided with a projection. It is understood that, when the through sliding groove is provided in the fixing bracket 700, the partition 400 may not be provided with the protrusion, and the thickness of the partition 400 may be designed to be smaller than the width of the sliding groove so that the partition 400 can be inserted into the sliding groove.
Specifically, as shown in fig. 4, the housing 100 is in a square shape, the number of the partition boards 400 is multiple, the number of the fixing brackets 700 is four, four fixing brackets 700 are respectively disposed at four diagonal corners of the housing 100, and each partition board 400 is fixedly connected to the fixing bracket 700.
In summary, the exhaust emission device at least has the following advantages:
(1) the shell 100 is internally provided with the air inlet cavity 110 and the air outlet cavity, the air outlet cavity is arranged around the air inlet cavity 110, the side wall of the air inlet cavity 110 is provided with the flow guide air hole 401 communicated with the air outlet cavity and the air inlet cavity 110, the shell 100 is provided with the air inlet communicated with the air inlet cavity 110 and the outside, the side wall of the shell 100 is connected with the discharge pipeline communicated with the air outlet cavity, and the discharge pipeline is horizontally arranged, so that the uniform distribution and the horizontal discharge of air flow are realized, tail gas entering the tail gas discharge device can be uniformly discharged along the horizontal direction, and the phenomenon that the growth of a membrane system is deteriorated due to the fact that the gas is disturbed when the gas turns to the vertical flow direction from the horizontal;
(2) the exhaust cavity is designed to comprise a first exhaust cavity 121 and a second exhaust cavity 122, the exhaust pipeline comprises a first exhaust pipeline 210 and a second exhaust pipeline 220, and the first exhaust pipeline 210 and the second exhaust pipeline 220 are respectively communicated with the first exhaust cavity 121 and the second exhaust cavity 122, so that double-pipe exhaust is realized, and the phenomenon of uneven air flow distribution (uneven exhaust) caused by blockage is reduced; when the first exhaust cavity 121 and the second exhaust cavity 122 are symmetrically arranged, the gas is further uniformly distributed in the same horizontal direction, so that the gas flow distribution is more uniform, and the uniformity of the film forming thickness is improved;
(3) the partition plate 400 and the cover plate 500 are preferably quartz plates, the surfaces of the quartz plates are relatively flat and smooth and are not easy to adhere to each other, so that the generation of attachments on the surfaces of components of the exhaust emission device can be reduced, and the maintenance time of the exhaust emission device is delayed;
(4) the grooves 102 are formed in the side wall of the shell 100, so that smooth gas discharge is facilitated, and gas flow disturbance is reduced;
(5) through the design of the fixing bracket 700 and the detachable connection of the fixing bracket 700 and the partition board 400, the disassembly and the assembly are more convenient, and the installation and the maintenance of the whole exhaust emission device are facilitated.
The embodiment also discloses a vacuum coating system which can be particularly but not exclusively a low-pressure film growth system. The vacuum coating system comprises a vacuum coating machine and the tail gas discharge device, wherein the vacuum coating machine is provided with a tail gas discharge port, and the tail gas discharge port is communicated with a gas inlet of the tail gas discharge device. The vacuum coater may be, but not limited to, a CVD (Chemical Vapor Deposition) apparatus or an MOCVD (Metal-organic Chemical Vapor Deposition) apparatus, etc. The vacuum coating system solves the problem of airflow disturbance during tail gas emission through horizontal exhaust of the tail gas emission device, and the film system grows better in the film forming process. Because the vacuum coating system comprises the tail gas discharge device, the vacuum coating system at least has all the beneficial effects brought by the tail gas discharge device, and the details are not repeated.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. The tail gas discharge device is characterized by comprising a shell (100), wherein an air inlet cavity (110) and an exhaust cavity are arranged in the shell (100), the exhaust cavity surrounds the air inlet cavity (110), a flow guide air hole (401) communicated with the exhaust cavity and the air inlet cavity (110) is formed in the side wall of the air inlet cavity (110), an air inlet communicated with the air inlet cavity (110) and the outside is formed in the shell (100), a discharge pipeline communicated with the exhaust cavity is connected to the side wall of the shell (100), and the discharge pipeline is horizontally arranged.
2. The exhaust emission device according to claim 1, wherein the exhaust cavity comprises a first exhaust cavity (121) and a second exhaust cavity (122), the first exhaust cavity (121) and the second exhaust cavity (122) being independent from each other; the discharge pipeline comprises a first discharge pipeline (210) and a second discharge pipeline (220), and the first discharge pipeline (210) and the second discharge pipeline (220) are respectively communicated with the first exhaust cavity (121) and the second exhaust cavity (122).
3. The exhaust emission device according to claim 2, wherein the first exhaust cavity (121) and the second exhaust cavity (122) are symmetrically arranged.
4. The exhaust emission device according to claim 3, further comprising a tee (300) for connecting an exhaust power system, wherein the first discharge line (210) and the second discharge line (220) are respectively connected to the tee (300).
5. The exhaust emission device according to claim 1, further comprising a partition plate (400) and a cover plate (500), wherein the cover plate (500) and the partition plate (400) are both disposed in the casing (100), the cover plate (500), the partition plate (400), a side wall of the casing (100) and a bottom wall of the casing (100) jointly enclose the exhaust cavity, and the partition plate (400) is provided with the air guide hole (401).
6. The exhaust emission device according to claim 5, wherein the partition (400) is a quartz plate; alternatively, the cover plate (500) is a quartz plate.
7. The exhaust emission device according to claim 5, further comprising a top plate (600), wherein the housing (100) has an opening opposite to the bottom wall of the housing (100), the top plate (600) covers the opening, the top plate (600), the partition plate (400) and the bottom wall of the housing (100) together enclose the air inlet cavity (110), and the top plate (600) has an air inlet hole (601) formed therein.
8. The exhaust emission device according to any one of claims 5 to 7, further comprising fixing brackets (700) for mounting the partition (400), wherein the fixing brackets (700) are fixedly arranged at four inner corners of the housing (100), and the fixing brackets (700) are detachably connected with the partition (400).
9. The exhaust gas discharge device according to any one of claims 5 to 7, wherein a side wall of the casing (100) is provided with an exhaust hole (101), an inner wall surface of the side wall is provided with a groove (102), the exhaust hole (101) communicates with the groove (102), and the discharge line is connected at the exhaust hole (101).
10. A vacuum coating system comprising a vacuum coating machine and the exhaust gas discharge device as claimed in any one of claims 1 to 9, wherein the vacuum coating machine has an exhaust gas discharge port which communicates with an air inlet of the exhaust gas discharge device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910517150.2A CN112080733A (en) | 2019-06-14 | 2019-06-14 | Tail gas discharging device and vacuum coating system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910517150.2A CN112080733A (en) | 2019-06-14 | 2019-06-14 | Tail gas discharging device and vacuum coating system |
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| CN112080733A true CN112080733A (en) | 2020-12-15 |
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| CN201910517150.2A Pending CN112080733A (en) | 2019-06-14 | 2019-06-14 | Tail gas discharging device and vacuum coating system |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI265977B (en) * | 2000-08-09 | 2006-11-11 | Itt Mfg Enterprises Inc | Gas collector for epitaxial reactor |
| CN101429651A (en) * | 2007-11-08 | 2009-05-13 | 应用材料股份有限公司 | Multi-port pumping system for substrate processing chambers |
| KR20150098454A (en) * | 2014-02-20 | 2015-08-28 | 주식회사 원익아이피에스 | Apparatus for processing substrate |
| CN105374705A (en) * | 2014-08-27 | 2016-03-02 | 株式会社日立国际电气 | Substrate processing apparatus ,method of manufacturing semiconductor device, and recording medium |
| CN109087869A (en) * | 2018-06-28 | 2018-12-25 | 武汉华星光电技术有限公司 | Exhaust apparatus and dry etching equipment |
-
2019
- 2019-06-14 CN CN201910517150.2A patent/CN112080733A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI265977B (en) * | 2000-08-09 | 2006-11-11 | Itt Mfg Enterprises Inc | Gas collector for epitaxial reactor |
| CN101429651A (en) * | 2007-11-08 | 2009-05-13 | 应用材料股份有限公司 | Multi-port pumping system for substrate processing chambers |
| KR20150098454A (en) * | 2014-02-20 | 2015-08-28 | 주식회사 원익아이피에스 | Apparatus for processing substrate |
| CN105374705A (en) * | 2014-08-27 | 2016-03-02 | 株式会社日立国际电气 | Substrate processing apparatus ,method of manufacturing semiconductor device, and recording medium |
| CN109087869A (en) * | 2018-06-28 | 2018-12-25 | 武汉华星光电技术有限公司 | Exhaust apparatus and dry etching equipment |
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