CN112068402B - 一种用于光刻机的晶片吸盘 - Google Patents
一种用于光刻机的晶片吸盘 Download PDFInfo
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- CN112068402B CN112068402B CN202010939978.XA CN202010939978A CN112068402B CN 112068402 B CN112068402 B CN 112068402B CN 202010939978 A CN202010939978 A CN 202010939978A CN 112068402 B CN112068402 B CN 112068402B
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- 238000001259 photo etching Methods 0.000 title abstract description 10
- 230000000149 penetrating effect Effects 0.000 claims abstract description 4
- 238000001179 sorption measurement Methods 0.000 claims description 34
- 238000001459 lithography Methods 0.000 claims description 12
- 235000012431 wafers Nutrition 0.000 description 42
- 238000000034 method Methods 0.000 description 5
- 238000000206 photolithography Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202010939978.XA CN112068402B (zh) | 2020-09-09 | 2020-09-09 | 一种用于光刻机的晶片吸盘 |
Applications Claiming Priority (1)
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CN202010939978.XA CN112068402B (zh) | 2020-09-09 | 2020-09-09 | 一种用于光刻机的晶片吸盘 |
Publications (2)
Publication Number | Publication Date |
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CN112068402A CN112068402A (zh) | 2020-12-11 |
CN112068402B true CN112068402B (zh) | 2022-04-22 |
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Application Number | Title | Priority Date | Filing Date |
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CN202010939978.XA Active CN112068402B (zh) | 2020-09-09 | 2020-09-09 | 一种用于光刻机的晶片吸盘 |
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CN (1) | CN112068402B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115097700B (zh) * | 2022-07-06 | 2023-10-10 | 江苏晶杰光电科技有限公司 | 一种用于光刻机的晶片吸盘结构 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2748127B2 (ja) * | 1988-09-02 | 1998-05-06 | キヤノン株式会社 | ウエハ保持方法 |
JP2880264B2 (ja) * | 1990-07-12 | 1999-04-05 | キヤノン株式会社 | 基板保持装置 |
CN107422614B (zh) * | 2017-08-30 | 2018-12-07 | 武汉科技大学 | 一种光刻机晶片吸盘 |
CN208888580U (zh) * | 2018-10-15 | 2019-05-21 | 福建汉晶光电科技有限公司 | 一种光刻机用上版夹具 |
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- 2020-09-09 CN CN202010939978.XA patent/CN112068402B/zh active Active
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Effective date of registration: 20220329 Address after: 300000 No. 495, Huanghe Road, Nankai District, Tianjin Applicant after: Wang Junming Address before: Room 1607, 16 / F, unit 1, building 1, 158 Xianning Avenue, Xianning City, Hubei Province Applicant before: Xianning Hengzhou Information Technology Co.,Ltd. |
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Effective date of registration: 20220407 Address after: 344000 phase II of Electronic Industrial Park, Hedong Industrial Park, Nancheng County, Fuzhou City, Jiangxi Province Applicant after: Jiangxi Xinguang Microelectronics Co.,Ltd. Address before: 300000 No. 495, Huanghe Road, Nankai District, Tianjin Applicant before: Wang Junming |
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