CN112002351B - 磁盘用非磁性基板和磁盘 - Google Patents
磁盘用非磁性基板和磁盘 Download PDFInfo
- Publication number
- CN112002351B CN112002351B CN202010854430.5A CN202010854430A CN112002351B CN 112002351 B CN112002351 B CN 112002351B CN 202010854430 A CN202010854430 A CN 202010854430A CN 112002351 B CN112002351 B CN 112002351B
- Authority
- CN
- China
- Prior art keywords
- substrate
- magnetic disk
- thickness
- nonmagnetic substrate
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 350
- 239000011521 glass Substances 0.000 claims description 60
- 230000002093 peripheral effect Effects 0.000 claims description 51
- 230000003746 surface roughness Effects 0.000 claims description 31
- 229910000838 Al alloy Inorganic materials 0.000 claims description 18
- 229910045601 alloy Inorganic materials 0.000 claims description 18
- 239000000956 alloy Substances 0.000 claims description 18
- 229910018104 Ni-P Inorganic materials 0.000 claims description 8
- 229910018536 Ni—P Inorganic materials 0.000 claims description 8
- 239000000463 material Substances 0.000 abstract description 31
- 229910052751 metal Inorganic materials 0.000 abstract description 18
- 239000002184 metal Substances 0.000 abstract description 18
- 239000010408 film Substances 0.000 description 158
- 238000005498 polishing Methods 0.000 description 68
- 238000000227 grinding Methods 0.000 description 26
- 239000002245 particle Substances 0.000 description 25
- 230000007547 defect Effects 0.000 description 22
- 239000006061 abrasive grain Substances 0.000 description 17
- 230000000694 effects Effects 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 230000001629 suppression Effects 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 11
- 238000003426 chemical strengthening reaction Methods 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 238000012545 processing Methods 0.000 description 9
- 229910000861 Mg alloy Inorganic materials 0.000 description 8
- 239000005354 aluminosilicate glass Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 229910018137 Al-Zn Inorganic materials 0.000 description 6
- 229910018573 Al—Zn Inorganic materials 0.000 description 6
- 229910001093 Zr alloy Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- 229910001096 P alloy Inorganic materials 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 238000009863 impact test Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 229910018134 Al-Mg Inorganic materials 0.000 description 3
- 229910018467 Al—Mg Inorganic materials 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 description 3
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 241001422033 Thestylus Species 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 244000145845 chattering Species 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000007405 data analysis Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000003405 preventing effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73917—Metallic substrates, i.e. elemental metal or metal alloy substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73913—Composites or coated substrates
- G11B5/73915—Silicon compound based coating
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73917—Metallic substrates, i.e. elemental metal or metal alloy substrates
- G11B5/73919—Aluminium or titanium elemental or alloy substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
- G11B5/82—Disk carriers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Ceramic Engineering (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-070232 | 2017-03-31 | ||
| JP2017070232 | 2017-03-31 | ||
| CN201880013884.0A CN110326042B (zh) | 2017-03-31 | 2018-04-02 | 磁盘用非磁性基板和磁盘 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880013884.0A Division CN110326042B (zh) | 2017-03-31 | 2018-04-02 | 磁盘用非磁性基板和磁盘 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112002351A CN112002351A (zh) | 2020-11-27 |
| CN112002351B true CN112002351B (zh) | 2022-02-08 |
Family
ID=63676296
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010854430.5A Active CN112002351B (zh) | 2017-03-31 | 2018-04-02 | 磁盘用非磁性基板和磁盘 |
| CN201880013884.0A Active CN110326042B (zh) | 2017-03-31 | 2018-04-02 | 磁盘用非磁性基板和磁盘 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880013884.0A Active CN110326042B (zh) | 2017-03-31 | 2018-04-02 | 磁盘用非磁性基板和磁盘 |
Country Status (7)
| Country | Link |
|---|---|
| US (4) | US11031036B2 (https=) |
| JP (5) | JP6574537B2 (https=) |
| CN (2) | CN112002351B (https=) |
| MY (1) | MY192572A (https=) |
| PH (2) | PH12021552252A1 (https=) |
| SG (2) | SG11201908015QA (https=) |
| WO (1) | WO2018182046A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI755466B (zh) * | 2016-12-28 | 2022-02-21 | 日商東洋鋼鈑股份有限公司 | 硬碟用基板及使用其之硬碟裝置 |
| US11031036B2 (en) | 2017-03-31 | 2021-06-08 | Hoya Corporation | Non-magnetic substrate for magnetic disk, and magnetic disk |
| US11152026B2 (en) * | 2017-06-30 | 2021-10-19 | Hoya Corporation | Substrate for magnetic disks, and magnetic disk |
| MY208527A (en) | 2018-08-07 | 2025-05-14 | Hoya Corp | Substrate for magnetic disk and magnetic disk |
| CN117242520A (zh) * | 2021-04-30 | 2023-12-15 | 豪雅株式会社 | 生产环形物体的方法、成膜装置、环形物体和硬盘驱动装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005322364A (ja) * | 2004-05-11 | 2005-11-17 | Fuji Electric Device Technology Co Ltd | 垂直磁気記録媒体用ディスク基板、該基板を用いた垂直磁気記録媒体、および、それらの製造方法 |
| CN104584125A (zh) * | 2012-09-28 | 2015-04-29 | Hoya株式会社 | 磁盘用玻璃基板、磁盘 |
| CN104584126A (zh) * | 2012-09-28 | 2015-04-29 | Hoya株式会社 | 磁盘用玻璃基板、磁盘以及磁盘用玻璃基板的制造方法 |
| CN104823239A (zh) * | 2012-12-29 | 2015-08-05 | Hoya株式会社 | 磁盘用玻璃基板和磁盘 |
| CN105009213A (zh) * | 2013-03-01 | 2015-10-28 | Hoya株式会社 | 磁盘用玻璃基板和磁盘 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4882236A (en) * | 1988-02-10 | 1989-11-21 | Olin Corporation | Rigid magnetic recording disks and method of producing same |
| JPH0757233A (ja) * | 1993-08-19 | 1995-03-03 | Hitachi Ltd | 磁気記録媒体 |
| US5626943A (en) * | 1994-06-02 | 1997-05-06 | The Carborundum Company | Ultra-smooth ceramic substrates and magnetic data storage media prepared therefrom |
| US5747135A (en) * | 1995-12-08 | 1998-05-05 | Aluminum Company Of America | Thin film pretreatment for memory disks and associated methods |
| JPH09198640A (ja) | 1996-01-16 | 1997-07-31 | Kobe Steel Ltd | 磁気ディスク |
| US6383404B1 (en) * | 1998-08-19 | 2002-05-07 | Hoya Corporation | Glass substrate for magnetic recording medium, magnetic recording medium, and method of manufacturing the same |
| US6316097B1 (en) * | 1998-09-28 | 2001-11-13 | Seagate Technology Llc | Electroless plating process for alternative memory disk substrates |
| JP2003016633A (ja) * | 2001-06-28 | 2003-01-17 | Asahi Glass Co Ltd | 磁気ディスク用ガラス基板及びその製造方法 |
| JP2003263713A (ja) * | 2002-03-08 | 2003-09-19 | Canon Inc | 円筒状磁気記録媒体およびその作製方法 |
| CN100538827C (zh) * | 2004-03-25 | 2009-09-09 | Hoya株式会社 | 磁盘用玻璃基板 |
| JP2005346880A (ja) * | 2004-06-07 | 2005-12-15 | Toshiba Corp | 磁気記録再生装置 |
| CN1993735A (zh) * | 2004-08-16 | 2007-07-04 | 昭和电工株式会社 | 用于磁记录介质的硅基底、制造硅基底的方法以及磁记录介质 |
| US7573674B1 (en) * | 2004-12-23 | 2009-08-11 | Maxtor Corporation | Storage disk having increased damping characteristics in a disk drive |
| JP2006260700A (ja) * | 2005-03-18 | 2006-09-28 | Fujitsu Ltd | 磁気記録媒体及び磁気記録装置 |
| JP2006302358A (ja) * | 2005-04-18 | 2006-11-02 | Kobe Steel Ltd | 磁気記録媒体用Ａｌ合金基板および磁気記録媒体 |
| JP2007066390A (ja) * | 2005-08-30 | 2007-03-15 | Konica Minolta Opto Inc | 磁気記録媒体用基板、及び磁気記録媒体用基板の製造方法 |
| JP4665886B2 (ja) * | 2006-10-27 | 2011-04-06 | 富士電機デバイステクノロジー株式会社 | 垂直磁気記録媒体、垂直磁気記録媒体用基板、および、それらの製造方法 |
| JP2009160831A (ja) * | 2008-01-08 | 2009-07-23 | Fujifilm Corp | パターンローラの製作方法 |
| JP2010118111A (ja) | 2008-11-12 | 2010-05-27 | Toshiba Storage Device Corp | 磁気記憶装置 |
| CA2804212C (en) * | 2010-07-09 | 2018-01-02 | Micro Motion, Inc. | A vibrating meter including an improved meter case |
| JP5762612B1 (ja) | 2014-09-27 | 2015-08-12 | 株式会社Uacj | 磁気ディスク基板用アルミニウム合金板及びその製造方法、ならびに、磁気ディスクの製造方法 |
| JP2016126808A (ja) | 2014-12-31 | 2016-07-11 | Hoya株式会社 | 磁気ディスク用基板の製造方法、及び端面研磨処理装置 |
| CN110450009B (zh) | 2014-12-31 | 2021-08-13 | Hoya株式会社 | 基板的制造方法、基板端面的加工装置、基板端面的加工方法和磨削用磨石 |
| JP2017199442A (ja) | 2016-04-25 | 2017-11-02 | 旭硝子株式会社 | 磁気記録媒体用基板の製造方法、磁気記録媒体用基板の梱包体 |
| TWI755466B (zh) | 2016-12-28 | 2022-02-21 | 日商東洋鋼鈑股份有限公司 | 硬碟用基板及使用其之硬碟裝置 |
| JP6832179B2 (ja) * | 2017-02-03 | 2021-02-24 | 昭和電工株式会社 | 磁気記録媒体用基板およびハードディスクドライブ |
| US11031036B2 (en) * | 2017-03-31 | 2021-06-08 | Hoya Corporation | Non-magnetic substrate for magnetic disk, and magnetic disk |
| US11152026B2 (en) * | 2017-06-30 | 2021-10-19 | Hoya Corporation | Substrate for magnetic disks, and magnetic disk |
-
2018
- 2018-04-02 US US16/499,200 patent/US11031036B2/en active Active
- 2018-04-02 SG SG11201908015Q patent/SG11201908015QA/en unknown
- 2018-04-02 CN CN202010854430.5A patent/CN112002351B/zh active Active
- 2018-04-02 SG SG10202111088SA patent/SG10202111088SA/en unknown
- 2018-04-02 CN CN201880013884.0A patent/CN110326042B/zh active Active
- 2018-04-02 MY MYPI2019005183A patent/MY192572A/en unknown
- 2018-04-02 PH PH1/2021/552252A patent/PH12021552252A1/en unknown
- 2018-04-02 JP JP2019509441A patent/JP6574537B2/ja active Active
- 2018-04-02 WO PCT/JP2018/014169 patent/WO2018182046A1/ja not_active Ceased
-
2019
- 2019-08-16 JP JP2019149512A patent/JP6983842B2/ja active Active
- 2019-09-12 PH PH12019502068A patent/PH12019502068A1/en unknown
-
2021
- 2021-05-07 US US17/315,145 patent/US11545178B2/en active Active
- 2021-11-24 JP JP2021189876A patent/JP7191185B2/ja active Active
-
2022
- 2022-12-06 JP JP2022194840A patent/JP7465332B2/ja active Active
- 2022-12-12 US US18/079,849 patent/US11955151B2/en active Active
-
2024
- 2024-02-28 US US18/590,811 patent/US12548594B2/en active Active
- 2024-03-29 JP JP2024056918A patent/JP7646914B2/ja active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005322364A (ja) * | 2004-05-11 | 2005-11-17 | Fuji Electric Device Technology Co Ltd | 垂直磁気記録媒体用ディスク基板、該基板を用いた垂直磁気記録媒体、および、それらの製造方法 |
| CN104584125A (zh) * | 2012-09-28 | 2015-04-29 | Hoya株式会社 | 磁盘用玻璃基板、磁盘 |
| CN104584126A (zh) * | 2012-09-28 | 2015-04-29 | Hoya株式会社 | 磁盘用玻璃基板、磁盘以及磁盘用玻璃基板的制造方法 |
| CN104823239A (zh) * | 2012-12-29 | 2015-08-05 | Hoya株式会社 | 磁盘用玻璃基板和磁盘 |
| CN105009213A (zh) * | 2013-03-01 | 2015-10-28 | Hoya株式会社 | 磁盘用玻璃基板和磁盘 |
| CN105009213B (zh) * | 2013-03-01 | 2018-06-29 | Hoya株式会社 | 磁盘用玻璃基板和磁盘 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20240282337A1 (en) | 2024-08-22 |
| JP2024075787A (ja) | 2024-06-04 |
| US11955151B2 (en) | 2024-04-09 |
| JP7646914B2 (ja) | 2025-03-17 |
| CN110326042A (zh) | 2019-10-11 |
| US11031036B2 (en) | 2021-06-08 |
| US11545178B2 (en) | 2023-01-03 |
| CN112002351A (zh) | 2020-11-27 |
| JP2022028852A (ja) | 2022-02-16 |
| JP2023027179A (ja) | 2023-03-01 |
| JPWO2018182046A1 (ja) | 2019-11-07 |
| US20210264943A1 (en) | 2021-08-26 |
| PH12019502068B1 (en) | 2020-10-26 |
| PH12019502068A1 (en) | 2020-10-26 |
| US20200035268A1 (en) | 2020-01-30 |
| JP7465332B2 (ja) | 2024-04-10 |
| SG10202111088SA (en) | 2021-11-29 |
| PH12021552252A1 (en) | 2022-05-02 |
| JP7191185B2 (ja) | 2022-12-16 |
| JP6574537B2 (ja) | 2019-09-11 |
| JP2019215951A (ja) | 2019-12-19 |
| JP6983842B2 (ja) | 2021-12-17 |
| MY192572A (en) | 2022-08-29 |
| CN110326042B (zh) | 2020-09-11 |
| US12548594B2 (en) | 2026-02-10 |
| SG11201908015QA (en) | 2019-10-30 |
| US20230121742A1 (en) | 2023-04-20 |
| WO2018182046A1 (ja) | 2018-10-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN113362863B (zh) | 磁盘用基板和磁盘 | |
| JP7646914B2 (ja) | 磁気ディスク用非磁性基板及び磁気ディスク | |
| CN110503983B (zh) | 磁盘用玻璃基板及其制造方法、磁盘和玻璃基板中间体 | |
| CN112513985A (zh) | 磁盘用基板以及磁盘 | |
| JP5536481B2 (ja) | 情報記録媒体用ガラス基板の製造方法及び情報記録媒体の製造方法 | |
| JP5870187B2 (ja) | 磁気ディスク用ガラス基板、磁気ディスク、磁気ディスクドライブ装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |