CN111962026A - Film coating method for spectacle lens - Google Patents
Film coating method for spectacle lens Download PDFInfo
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- CN111962026A CN111962026A CN202010753327.1A CN202010753327A CN111962026A CN 111962026 A CN111962026 A CN 111962026A CN 202010753327 A CN202010753327 A CN 202010753327A CN 111962026 A CN111962026 A CN 111962026A
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- 238000000034 method Methods 0.000 title claims description 9
- 239000007888 film coating Substances 0.000 title abstract description 6
- 238000009501 film coating Methods 0.000 title abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 69
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 34
- 238000001704 evaporation Methods 0.000 claims abstract description 32
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 30
- 238000000576 coating method Methods 0.000 claims abstract description 26
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 22
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 22
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 16
- 229910052786 argon Inorganic materials 0.000 claims abstract description 15
- 238000010849 ion bombardment Methods 0.000 claims abstract description 15
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 14
- 238000001035 drying Methods 0.000 claims abstract description 12
- 230000008020 evaporation Effects 0.000 claims abstract description 12
- 238000007738 vacuum evaporation Methods 0.000 claims abstract description 9
- 238000000137 annealing Methods 0.000 claims abstract description 8
- 239000012153 distilled water Substances 0.000 claims abstract description 8
- 150000002500 ions Chemical class 0.000 claims abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 230000008018 melting Effects 0.000 claims description 28
- 238000002844 melting Methods 0.000 claims description 28
- 239000007787 solid Substances 0.000 claims description 28
- 238000010894 electron beam technology Methods 0.000 claims description 15
- 238000007747 plating Methods 0.000 claims description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 5
- 238000005406 washing Methods 0.000 claims description 5
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 2
- 238000001723 curing Methods 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Eyeglasses (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a coating method of spectacle lenses, in particular to the field of coating of spectacle lenses, S1, cleaning the spectacle lens to be coated with distilled water, baking for 9 to 11 hours; s2, evaporating a silicon dioxide layer with the thickness of 3000-3500 microns on the baked lens by using a vacuum evaporation coating method; s3, taking out the lens after 1 hour of evaporation, drying and curing, wherein the drying temperature is 160 ℃, and the curing time is 1.5 hoursWhen the current is over; s4, annealing the cured lens, transferring the annealed lens into a vacuum coating chamber, introducing argon, and performing ion bombardment on the lens by using a Hall ion source; s5, ensuring the vacuum degree of the vacuum chamber to be 2.6-2.7 × 10‑7pa at 40-60 deg.C, evaporating a zirconium dioxide layer with a thickness of 200-500 μm on the silicon dioxide layer by vacuum evaporation. The invention can effectively improve the firmness of the film coating and prolong the service life of the spectacle lens.
Description
Technical Field
The invention belongs to the field of spectacle lens coating, and particularly relates to a coating method of a spectacle lens.
Background
Most of spectacle lenses are resin lenses, the resin lenses are lower in cost and relatively superior in performance compared with lenses made of other materials, but the resin lenses have the big defect that the lenses are easy to scratch, if a film layer is plated on the surfaces of the lenses, the wear resistance of the lenses can be enhanced, and other performances of the lenses are not affected; after the lens is coated with the film, the lens can be prevented from being corroded and abraded, and the light transmittance and the definition of an object to be viewed can be improved; however, the existing lens coating process still has the defects of infirm coating and short service life;
in view of the above disadvantages, there is a need for a method for coating a spectacle lens, which can effectively improve the firmness of the coating and prolong the service life of the spectacle lens.
Disclosure of Invention
The invention aims to provide a film coating method for spectacle lenses, which can effectively improve the firmness of film coating and prolong the service life of the spectacle lenses.
The invention provides the following technical scheme:
a coating method of an eyeglass comprises the following specific steps:
s1, washing the lens to be coated with the film by using distilled water, transferring the lens to a dust-free coating constant-temperature oven, and baking the lens for 9 to 11 hours at the temperature of between 100 and 120 ℃;
s2, evaporating the baked lens by using a vacuum evaporation coating method to form a silica layer with the thickness of 3000-3500 microns, wherein the evaporation conditions are as follows: the vacuum degree is 2.6 to 2.7 multiplied by 10-7pa at a temperature of 90 to 110 ℃, a silica solid melting voltage of 7.6 to 8.3kV, and a silica solid melting current of 100 to 130A;
s3, after evaporation is finished for 1 hour, taking out the lens, drying and curing, wherein the drying temperature is 160 ℃, and the curing time is 1.5 hours;
s4, annealing the cured lens, transferring the annealed lens into a vacuum coating chamber, introducing argon, and performing ion bombardment on the lens by using a Hall ion source under the conditions that the temperature is 60-80 ℃, the ion bombardment rate is 150-170 a/sec, and the time is 2-5 min; argon flow is 15-20 sccm for 2-5 min;
s5, ensuring the vacuum degree of the vacuum chamber to be 2.6-2.7 × 10-7pa at 40-60 deg.C, vacuum evaporating at secondEvaporating a zirconium dioxide layer with the thickness of 200 to 500 microns on the silicon oxide layer; the melting voltage of the zirconium dioxide solid is 6 to 8kV, and the melting current of the zirconium dioxide solid is 200 to 230A.
S6, ensuring the vacuum chamber vacuum degree to be 3X 10-7Pa, temperature 50-70 deg.C, starting electron beam gun, adjusting electron beam position, and vapor deposition rate
And (3) evaporating and plating a fluoride film layer with the thickness of 80-100 microns on the surface of the silicon dioxide layer, closing the electron beam gun, closing the molecular pump, opening the air inlet valve, introducing air, and taking out the lens.
Preferably, in the step S1, the lens to be coated is cleaned with distilled water, and then is transferred to a dust-free coating constant-temperature oven to be baked for 10 hours at 110 ℃;
preferably, in step S2, the baked lens is subjected to vacuum evaporation coating to deposit a silica layer with a thickness of 3250 μm under the following conditions: the vacuum degree is 2.65 multiplied by 10-7pa at a temperature of 100 ℃, a melting voltage of the silica solid of 8kV, and a melting current of the silica solid of 115A.
Preferably, in the step S4, annealing the cured lens, transferring the annealed lens into a vacuum coating chamber, introducing argon gas, and performing ion bombardment on the lens by using a hall ion source under the conditions of a temperature of 70 ℃, an ion bombardment rate of 160a/sec, and a time of 3 min; argon flow of 18sccm for 4min
Preferably, in step S5, the vacuum chamber is maintained at a vacuum degree of 2.65 × 10-7pa, evaporating a zirconium dioxide layer with the thickness of 300 microns on the silicon dioxide layer by adopting a vacuum evaporation method at the temperature of 50 ℃; the melting voltage of the zirconium dioxide solid is 7kV, and the melting current of the zirconium dioxide solid is 215A.
The invention has the beneficial effects that:
the invention can effectively improve the firmness of the film coating, prolong the service life of the spectacle lens, ensure that the plating layers are tightly connected and have excellent adhesive force, and greatly improve the optical performance and the mechanical performance of the spectacle lens.
Detailed Description
Example 1
S1, washing the lens to be coated with the film by using distilled water, and baking the lens in a dust-free coating constant-temperature oven for 9 hours at 100 ℃;
s2, evaporating the baked lens by using a vacuum evaporation coating method to form a silica layer with the thickness of 3000 microns, wherein the evaporation conditions are as follows: the vacuum degree is 2.6 multiplied by 10-7pa, the temperature is 90 ℃, the melting voltage of the silicon dioxide solid is 7.6kV, and the melting current of the silicon dioxide solid is 100A;
s3, after evaporation is finished for 1 hour, taking out the lens, drying and curing, wherein the drying temperature is 160 ℃, and the curing time is 1.5 hours;
s4, annealing the cured lens, transferring the annealed lens into a vacuum coating chamber, introducing argon, and performing ion bombardment on the lens by using a Hall ion source under the conditions that the temperature is 60 ℃, the ion bombardment rate is 150a/sec, and the time is 2 min; argon flow is 15sccm, and the time is 2 min;
s5, ensuring the vacuum degree of the vacuum chamber to be 2.65 x 10-7pa, evaporating a zirconium dioxide layer with the thickness of 300 microns on the silicon dioxide layer by adopting a vacuum evaporation method at the temperature of 50 ℃; the melting voltage of the zirconium dioxide solid is 7kV, and the melting current of the zirconium dioxide solid is 215A.
S6, ensuring the vacuum chamber vacuum degree to be 3X 10-7Pa, the temperature is 60 ℃, an electron beam gun is started, the position of an electron beam is adjusted, and the evaporation rate is
And (3) evaporating and plating a fluoride film layer with the thickness of 90 microns on the surface of the silicon dioxide layer, closing the electron beam gun, closing the molecular pump, opening the air inlet valve, introducing air, and taking out the lens.
Example 2
S1, washing the lens to be coated with the film by using distilled water, and baking the lens in a dust-free coating constant-temperature oven for 10 hours at 110 ℃;
s2, evaporating the baked lens by using a vacuum evaporation coating methodPlating a silica layer with the thickness of 3250 microns, wherein the evaporation conditions are as follows: the vacuum degree is 2.65 multiplied by 10-7pa, the temperature is 100 ℃, the melting voltage of the silicon dioxide solid is 8kV, and the melting current of the silicon dioxide solid is 115A;
s3, after evaporation is finished for 1 hour, taking out the lens, drying and curing, wherein the drying temperature is 160 ℃, and the curing time is 1.5 hours;
s4, annealing the cured lens, transferring the annealed lens into a vacuum coating chamber, introducing argon, and performing ion bombardment on the lens by using a Hall ion source under the conditions that the temperature is 70 ℃, the ion bombardment rate is 160a/sec, and the time is 3 min; argon flow is 18sccm, and the time is 4 min;
s5, ensuring the vacuum degree of the vacuum chamber to be 2.6-2.7 × 10-7pa, evaporating a zirconium dioxide layer with the thickness of 200 to 500 microns on the silicon dioxide layer by adopting a vacuum evaporation method at the temperature of between 40 and 60 ℃; the melting voltage of the zirconium dioxide solid is 6 to 8kV, and the melting current of the zirconium dioxide solid is 200 to 230A.
S6, ensuring the vacuum chamber vacuum degree to be 3X 10-7Pa, temperature 50-70 deg.C, starting electron beam gun, adjusting electron beam position, and vapor deposition rate
And (3) evaporating and plating a fluoride film layer with the thickness of 80-100 microns on the surface of the silicon dioxide layer, closing the electron beam gun, closing the molecular pump, opening the air inlet valve, introducing air, and taking out the lens.
Example 3
S1, washing the lens to be coated with the film by using distilled water, and baking the lens in a dust-free coating constant-temperature oven for 11 hours at 120 ℃;
s2, evaporating the baked lens by using a vacuum evaporation coating method to form a silicon dioxide layer with the thickness of 3500 microns, wherein the evaporation conditions are as follows: the degree of vacuum was 2.7X 10-7pa, the temperature is 110 ℃, the melting voltage of the silicon dioxide solid is 8.3kV, and the melting current of the silicon dioxide solid is 130A;
s3, after evaporation is finished for 1 hour, taking out the lens, drying and curing, wherein the drying temperature is 160 ℃, and the curing time is 1.5 hours;
s4, annealing the cured lens, transferring the annealed lens into a vacuum coating chamber, introducing argon, and performing ion bombardment on the lens by using a Hall ion source under the conditions that the temperature is 80 ℃, the ion bombardment rate is 170a/sec, and the time is 5 min; argon flow is 20sccm, and the time is 5 min;
s5, ensuring the vacuum degree of the vacuum chamber to be 2.7X 10-7pa, evaporating a zirconium dioxide layer with the thickness of 500 microns on the silicon dioxide layer by adopting a vacuum evaporation method at the temperature of 60 ℃; the melting voltage of the zirconium dioxide solid is 8kV, and the melting current of the zirconium dioxide solid is 230A.
S6, ensuring the vacuum chamber vacuum degree to be 3X 10-7Pa, the temperature is 70 ℃, an electron beam gun is started, the position of an electron beam is adjusted, and the evaporation rate is
And (3) evaporating and plating a fluoride film layer with the thickness of 100 microns on the surface of the silicon dioxide layer, closing the electron beam gun, closing the molecular pump, opening the air inlet valve, introducing air, and taking out the lens.
Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art will understand that various changes, modifications and substitutions can be made without departing from the spirit and scope of the invention as defined by the appended claims. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (5)
1. A method for coating a spectacle lens is characterized by comprising the following specific steps:
s1, washing the lens to be coated with the film by using distilled water, transferring the lens to a dust-free coating constant-temperature oven, and baking the lens for 9 to 11 hours at the temperature of between 100 and 120 ℃;
s2, evaporating the baked lens by using a vacuum evaporation coating method to form an evaporated lens with a thickness of 3000 to 3500 micronsThe silicon dioxide layer with the thickness of meter is evaporated under the following conditions: the vacuum degree is 2.6 to 2.7 multiplied by 10-7pa at a temperature of 90 to 110 ℃, a silica solid melting voltage of 7.6 to 8.3kV, and a silica solid melting current of 100 to 130A;
s3, after evaporation is finished for 1 hour, taking out the lens, drying and curing, wherein the drying temperature is 160 ℃, and the curing time is 1.5 hours;
s4, annealing the cured lens, transferring the annealed lens into a vacuum coating chamber, introducing argon, and performing ion bombardment on the lens by using a Hall ion source under the conditions that the temperature is 60-80 ℃, the ion bombardment rate is 150-170 a/sec, and the time is 2-5 min; argon flow is 15-20 sccm for 2-5 min;
s5, ensuring the vacuum degree of the vacuum chamber to be 2.6-2.7 × 10-7pa, evaporating a zirconium dioxide layer with the thickness of 200 to 500 microns on the silicon dioxide layer by adopting a vacuum evaporation method at the temperature of between 40 and 60 ℃; the melting voltage of the zirconium dioxide solid is 6 to 8kV, and the melting current of the zirconium dioxide solid is 200 to 230A;
s6, ensuring the vacuum chamber vacuum degree to be 3X 10-7Pa, temperature 50-70 deg.C, starting electron beam gun, adjusting electron beam position, and vapor deposition rate
And (3) evaporating and plating a fluoride film layer with the thickness of 80-100 microns on the surface of the silicon dioxide layer, closing the electron beam gun, closing the molecular pump, opening the air inlet valve, introducing air, and taking out the lens.
2. A method for coating an ophthalmic lens, comprising: in step S1, the lens to be coated is cleaned with distilled water and then is baked for 10 hours in a dust-free coating constant temperature oven at 110 ℃.
3. The method of claim 1, wherein: in step S2, evaporating a silica layer with a thickness of 3250 μm on the baked lens by vacuum evaporation coating method under the condition of: the vacuum degree is 2.65 multiplied by 10-7pa at a temperature of 100 ℃, a melting voltage of the silica solid of 8kV, and a melting current of the silica solid of 115A.
4. The method of claim 4, wherein: in the step S4, annealing the cured lens, transferring the annealed lens into a vacuum coating chamber, introducing argon gas, and performing ion bombardment on the lens by using a Hall ion source under the conditions that the temperature is 70 ℃, the ion bombardment rate is 160a/sec, and the time is 3 min; argon flow was 18sccm for 4 min.
5. The method of claim 4, wherein: in step S5, the vacuum chamber is maintained at a vacuum degree of 2.65X 10-7pa, evaporating a zirconium dioxide layer with the thickness of 300 microns on the silicon dioxide layer by adopting a vacuum evaporation method at the temperature of 50 ℃; the melting voltage of the zirconium dioxide solid is 7kV, and the melting current of the zirconium dioxide solid is 215A.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010753327.1A CN111962026A (en) | 2020-07-30 | 2020-07-30 | Film coating method for spectacle lens |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010753327.1A CN111962026A (en) | 2020-07-30 | 2020-07-30 | Film coating method for spectacle lens |
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| CN111962026A true CN111962026A (en) | 2020-11-20 |
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| CN202010753327.1A Pending CN111962026A (en) | 2020-07-30 | 2020-07-30 | Film coating method for spectacle lens |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115572938A (en) * | 2022-07-18 | 2023-01-06 | 江西弘耀光学水晶有限公司 | High-precision optical lens coating method |
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| CN105861993A (en) * | 2016-05-17 | 2016-08-17 | 江苏淘镜有限公司 | Colored resin spectacle lens and preparation method thereof |
| CN105866975A (en) * | 2016-05-17 | 2016-08-17 | 江苏淘镜有限公司 | Color change resin spectacle lens and preparation method thereof |
| CN108018527A (en) * | 2017-12-15 | 2018-05-11 | 奥特路（漳州）光学科技有限公司 | A kind of anti glare anti static coatings lens coating method |
| CN108048803A (en) * | 2017-12-15 | 2018-05-18 | 奥特路（漳州）光学科技有限公司 | A kind of lens coating method |
| CN110346846A (en) * | 2019-07-30 | 2019-10-18 | 威海世高光电子有限公司 | Anti-reflection waterproof membrane and preparation method thereof, optical lens |
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2020
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| CN115572938B (en) * | 2022-07-18 | 2024-03-22 | 江西弘耀光学水晶有限公司 | High-precision optical lens coating method |
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