CN111928788A - Bidirectional correlation spectrum confocal flat plate thickness detection system and double-optical-axis calibration method thereof - Google Patents

Bidirectional correlation spectrum confocal flat plate thickness detection system and double-optical-axis calibration method thereof Download PDF

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CN111928788A
CN111928788A CN202010915875.XA CN202010915875A CN111928788A CN 111928788 A CN111928788 A CN 111928788A CN 202010915875 A CN202010915875 A CN 202010915875A CN 111928788 A CN111928788 A CN 111928788A
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confocal
flat plate
optical axis
axis
confocal probe
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CN111928788B (en
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杨甬英
曹频
江佳斌
肖翔
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Zernike Optical Technology Co ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

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Abstract

The invention discloses a two-way correlation spectrum confocal flat plate thickness detection system and a double-optical axis calibration method thereof. Firstly, respectively adjusting the parallelism of two confocal probes of a system and the surface of a measured flat plate; secondly, the optical axes of the two confocal probes of the coarse adjustment system are aligned, so that the optical axes of the two confocal probes are parallel and intersect at the central point of the measured flat plate; finally, aligning the optical axes of the two confocal probes of the fine adjustment system to enable the two confocal probes to be parallel and intersected at the central point of the measured flat plate; the invention utilizes two five-axis displacement platforms to bear confocal probes and arrange the confocal probes on two sides of a measured flat plate, and utilizes an optical energy method to quantitatively and accurately adjust the parallelism of a system and align the optical axes of the confocal probes by adjusting corresponding shaft body knobs. Only after parallelism calibration and optical axis alignment are carried out, the system can accurately carry out parameter calibration and thickness detection, the error of subsequent flat plate thickness measurement is effectively reduced, and the system measurement precision is improved.

Description

Bidirectional correlation spectrum confocal flat plate thickness detection system and double-optical-axis calibration method thereof
Technical Field
The invention relates to a two-way correlation spectrum confocal flat plate thickness detection system and a double-optical axis calibration method thereof.
Background
The confocal sensor has a wide application in the field of manufacturing and detecting various intelligent terminals such as mobile phone panels, IPAD and other products, and the traditionally used confocal sensor is used for measuring the thickness of a light-transmitting flat plate such as mobile phone glass by using a single confocal probe. However, for the opaque flat panel device required for the mobile phone housing and the internal installation, because the device has no light transmission, a single confocal probe cannot work, and has certain limitation. Therefore, the invention solves the problem by utilizing a two-way correlation spectrum confocal thickness detection system consisting of two five-axis displacement platforms respectively bearing confocal probes, and increases the detection of the thickness of an opaque flat plate on the basis of being compatible with the original single confocal probe system to measure the transparent flat plate. In such systems, there are two main problems that can affect the measurements: the two confocal probe optical axes of the system are not aligned. In both cases, a large error is caused when the system measures the thickness, and an accurate calibration technique is required to calibrate the parallelism and the optical axis of the system respectively. According to the principle of spectral confocal technology: the polychromatic light source passes through the confocal probe, the monochromatic light of each wavelength corresponds to a specific position on the optical axis due to the dispersion effect of the probe, when the surface of the measured flat plate is positioned at a specific position on the optical axis, the confocal measurement can be realized only by the wavelength corresponding to the current position, the monochromatic light of other wavelengths can only exist on the surface of the flat plate in the form of diffuse spots, and at the moment, the energy of the specific wavelength can be obviously higher than that of the other wavelengths and is expressed as the peak wavelength. When the measured transparent flat plate is inclined, the focused light on the lower surface of the transparent flat plate is influenced by the inclination of the upper surface, so that the information of the current position of the lower surface cannot be accurately expressed. The energy loss caused by the inclination can be set to be the full focus position according to the maximum position of energy of a specific wavelength, and the confocal probe and the measured flat plate are in a parallel state. Similarly, when the optical axes of the system are not uniform, the confocal probe is used for receiving the light rays emitted by the opposite confocal probe, all the received energy is smaller than the received energy when the optical axes are aligned, and a maximum received light intensity position is searched to be the optical axis alignment position. The parallelism of the system can be quantitatively and accurately calibrated by an optical energy method, and the optical axis of the system is aligned. Through a system for calibrating parallelism and an optical axis, higher measurement precision can be realized on the thickness measurement of the transparent flat plate and the non-transparent flat plate.
Disclosure of Invention
The invention aims to provide a two-way correlation spectrum confocal flat plate thickness detection system and a two-optical axis calibration method thereof aiming at the defects of the prior art. The digital quantification is accurate, and the parallelism and the optical axis of the two-way correlation spectrum confocal flat plate thickness detection system are calibrated, so that the measurement error is reduced.
The invention mainly adopts the following steps aiming at system calibration:
step 1, respectively adjusting the parallelism of two confocal probes of a system and the surface of a measured flat plate;
step 2, roughly adjusting the alignment of the optical axes of the two confocal probes of the system, so that the optical axes of the two confocal probes are parallel and intersect at the central point of the measured flat plate;
step 3, aligning the optical axes of the two confocal probes of the fine adjustment system to enable the two confocal probes to be parallel and intersected at the central point of the measured flat plate;
the theoretical model for adjusting the parallelism of the confocal probe and the surface of the measured flat plate in the step 1 is as follows:
when the confocal probe is absolutely parallel to the measured flat plate, the confocal probe receives the spectrum signal W returned by the flat plate1(λ), the signal peak wavelength λ1Corresponding to light intensity energy of W11) When the theoretical wavelength is λ1The monochromatic light passing through the plate shows that the focusing energy is maximally reflected back to the confocal probe.
When the confocal probe and the measured flat plate are inclined at any angle theta, the confocal probe receives a spectrum signal W returned by the flat platei(λ), the signal peak wavelength λiWavelength λ1The light intensity energy corresponding to the monochromatic light is Wi1) Due to λ1Monochromatic light does not achieve complete confocal, so W is11)>Wi1). By quantitative description of lambda1Spectral signal W of monochromatic light at current position and different rotation anglesi(lambda) finding the corresponding intensity of light Wi1) The position of maximum represents the position where the parallelism is optimal.
The theoretical model for aligning the optical axes of the two confocal probes in the step 2 is as follows:
when the optical axes of the two confocal probes are in the same straight line, the total energy of the light rays emitted by the confocal probe at the opposite side and received by the confocal probe is W1At this time, according to the symmetry of the system, all the light rays emitted by the opposite side confocal probe are received by the confocal probe;
when the optical axes of the two confocal probes are not in the same straight line, the confocal probes cannot completely receive the light emitted by the opposite confocal probe, and the received energy is WiTherefore has W1>Wi. The position of the confocal probe receiving the maximum light intensity emitted by the opposite side confocal probe is found as the alignment position of the optical axis.
Step 3, aligning the optical axis of the fine adjustment system, which comprises the following specific steps:
the light-transmitting paper sheet is placed in the working range of the system, the light spots emitted by the two confocal probes on the paper sheet are observed, and the positions of the light spots are continuously adjusted, so that the light spots are approximately overlapped on the paper sheet.
A device is used to provide five-axis rotation functions for two confocal probes, respectively. The five-axis displacement platform bears the confocal probe and provides rotation functions of an X axis, a Y axis, a Z axis, an R axis and a theta axis, wherein the Y axis and the Z axis are used for aligning optical axes, and the R axis and the theta axis are used for adjusting parallelism. Two five-axis displacement platforms are respectively used for bearing confocal probes and are arranged on two sides of a measured flat plate, and the optical axis of the system is calibrated.
The invention has the following beneficial effects:
the invention utilizes two five-axis displacement platforms to bear confocal probes and arrange the confocal probes on two sides of a measured flat plate, and utilizes an optical energy method to quantitatively and accurately adjust the parallelism of a system and align the optical axes of the confocal probes by adjusting corresponding shaft body knobs. Only after parallelism calibration and optical axis alignment are carried out, the system can accurately carry out parameter calibration and thickness detection, the error of subsequent flat plate thickness measurement is effectively reduced, and the system measurement precision is improved.
Drawings
FIG. 1 is a diagram of an adjustment device of a bi-directional correlation thickness detection system;
FIG. 2 is a schematic diagram of parallelism deviation and optical axis misalignment of a confocal probe of the two-way correlation thickness detection system;
FIG. 3 is a diagram of the optical path of the confocal probe tilted relative to the surface of the measured flat plate;
FIG. 4 is a schematic diagram showing the comparison between the relative tilted spectrum signal and the un-tilted spectrum signal of the confocal probe and the measured flat surface;
FIG. 5 is a schematic diagram of coarse optical axis alignment using a sheet of paper;
fig. 6 is a schematic view of the optical axis misalignment of the confocal probe.
Fig. 7 is a schematic view of confocal probe optical axis alignment.
Detailed Description
The invention will be further explained with reference to the drawings.
As shown in FIG. 1, a two-way correlation spectrum confocal plate thickness detection system is disclosed, wherein a five-axis displacement platform P1 is used to carry a confocal probe ConfP1, and a five-axis displacement platform P2 is used to carry a confocal probe ConfP2, wherein the five-axis displacement platform adjustment knobs are R-axis adjustment knobs WMD respectivelyRTheta axis adjusting knob WMDθX-axis adjusting knob WMDXY-axis adjusting knob WMDYZ-axis adjusting knob WMDZ. The five-axis device is used for calibrating the parallelism and the optical axis of the system, and the five-axis device specifically comprises the following steps:
step 1, respectively adjusting the parallelism of two confocal probes of a system and the surface of a measured flat plate; as shown in FIG. 2, the system parallelism is defined, S represents the measured plate with inclination, when the measured plate is inclined around the Y axis by the angle theta, the Z axis of the S surface coordinate axis is followed by the inclination of the Z axis by the angle theta1The tilt angle θ about the Y axis is referred to as a pitch tilt deviation. When the measured flat plate is inclined by an angle R around the Z axis, the Y axis of the S surface coordinate axis is inclined by an angle R1The inclination angle R about the Z axis is referred to as horizontal rotational deviation, and R and θ are collectively referred to as parallelism deviation. By actual light occurring at an inclinationAnd analyzing the path, and considering the pitching inclination deviation and the horizontal rotation deviation as the same type of deviation.
As shown in FIG. 3, S' represents the surface of the untilted plate, Si' represents the measured plate surface where the inclination of the angle α occurs. Wavelength of λ1The monochromatic light is reflected by S to realize complete focusing, i.e. the reflected light ray2Can return to the confocal probe ConfP as it passes through the inclined plate SiReflects the reflected light ray1Deviating from ConfP, part of the energy is lost. At this time, the wavelength is lambdaiPassing the monochromatic light through SiReflection of the reflected light rayiMaximum reception by ConfP.
As shown in FIG. 4, the spectral signal reflected by the flat surface S is W1(lambda), inclined plate surface SiThe reflected spectral signal is Wi(λ)。W1(λ) has a peak wavelength of λ1,Wi(λ) has a peak wavelength of λiAs can be seen from the graph, the light intensities corresponding to the peak wavelengths are W respectively when not tilted11)、Wi1) And W is11)>Wi1) Denotes the position corresponding to an arbitrary tilt, λ1The corresponding intensity will be less than it would be without the tilt. Therefore, in the adjustment, the WMD is fixedθContinuously adjusting WMDRLooking for a Wi1) A maximum position, which represents a completion of pitch tilt misalignment adjustment; by fixing the WMDRContinuously adjusting WMDθLooking for a Wi1) Maximum position, which represents the completion of the horizontal rotational offset adjustment. At this point, the system parallelism adjustment is completed.
Step 2, aligning the optical axes of the two confocal probes of the coarse adjustment system;
as shown in fig. 2, the light emitted from the confocal probe ConfP1 is focused on a point a on the surface S of the board to be measured, and the light emitted from the confocal probe ConfP2 is focused on a point B on the surface S of the board to be measured, where the center point of the surface S of the board to be measured is point O. The point A deviates on the Y axis and the Z axis, and the distance d between the point A and the point O is used in the figure1Representing the optical axis of the confocal probe ConfP1O1N1Deviation of d1In the presence of dZAnd dYA component; the point B deviates from the Y axis and the Z axis, and the distance d between the point B and the point O is used in the figure2Represents the optical axis O of the confocal probe ConfP22N2Deviation of d2In the presence of dZAnd dYAnd (4) components. Therefore, the optical axis O is at this time1N1And the optical axis O2N2There are instances where misalignment is required to be aligned. D due to optical axis irregularityZAnd dYThe components are of the same type and are analyzed in the same manner.
As shown in FIG. 5, a piece of light-transmitting paper Z is placed1The confocal probe ConfP1 and ConfP2 are respectively arranged in the working range of the system, the light Spot on the paper sheet is shot 1, the light Spot on the paper sheet is shot 2, at the moment, due to the fact that the optical axes are not uniform, the shot 1 and the shot 2 are in a deviation state on the Y axis and the Z axis, and the five-axis displacement platform WMD is adjustedYAnd WMDZSo that the Spot1 and the Spot2 substantially coincide, as shown by the drawing sheet Z2As shown.
Step 3, aligning the optical axes of the two confocal probes of the fine adjustment system;
as shown in FIG. 6, the light emitted from the confocal probe ConfP1 is focused on the optical axis O1N1At point A, the optical axis O of the confocal probe ConfP22N2The light emitted from the upper point B can be received due to the optical axis O1N1And O2N2There is a deviation, so the light emitted from the confocal probe ConfP1 cannot be completely received by the confocal probe ConfP2, and the total light intensity of the received spectrum signal of the confocal probe ConfP2 is Wi. As shown in fig. 7, the optical axis O at this time1N1And O2N2In the completely aligned state, the confocal probe ConfP2 receives the spectrum signal with the total light intensity W1. W is in alignment with the optical axis1Loss vs. WiSmaller, so W1>Wi. During the adjustment, the WMD of the confocal probe ConfP2 and the confocal probe ConfP1 were fixedYAdjusting WMD of ConfP1 without movingZLooking for a WiThe maximum value position of (b) represents that there is no deviation of the optical axis on the Z-axis; of a stationary confocal probe ConfP1WMDZWMD of confocal probe ConfP2ZAnd WMDYAdjusting WMD of ConfP1 without movingYLooking for a WiThe maximum value position of (b) represents that there is no deviation of the optical axis on the Y-axis. The optical axis of the confocal probe of the system is aligned, and the next system calibration and thickness detection can be carried out.
W isiThe maximum position of (2) is found as follows:
Wirepresenting the total light intensity of the receiving side spectrum confocal system, W is adjusted continuouslyiForming a series of discrete values having a maximum value Wmax. Record each W during the tuning process using system softwareiAnd update W at this timemaxIf W is collected at this timeiAt WmaxNearby wave, then a location can be found such that it corresponds to WiGradually approaches Wmax

Claims (6)

1. The system for detecting the thickness of the bidirectional correlation spectrum confocal flat plate is characterized in that a five-axis displacement platform P1 is used for bearing a confocal probe ConfP1, a five-axis displacement platform P2 is used for bearing a confocal probe ConfP2, and the five-axis displacement platform adjusting knobs are R-axis adjusting knobs WMD respectivelyRTheta axis adjusting knob WMDθX-axis adjusting knob WMDXY-axis adjusting knob WMDYZ-axis adjusting knob WMDZAnd calibrating the parallelism and the optical axis of the system by using the five-axis displacement platform.
2. The method for calibrating the optical axis of the double confocal probe of the bi-directional correlation spectrum confocal flat plate thickness detection system according to claim 1, characterized by comprising the following steps:
step 1, respectively adjusting the parallelism of a system confocal probe ConfP1, a confocal probe ConfP2 and a measured flat plate S;
step 2, roughly adjusting the optical axis O of the confocal probe ConfP1 of the system1N1Optical axis O of confocal probe ConfP22N2Aligned so that the optical axis O1N1And the optical axis O2N2Parallel to and intersecting with the central point O of the measured flat plate;
step 3, locating the optical axis O of the confocal probe ConfP1 of the system1N1Optical axis O of confocal probe ConfP22N2Aligned so that the optical axis O1N1And the optical axis O2N2Parallel to and intersecting the measured plate center point O.
3. The method for calibrating the optical axis of the double confocal probes of the bi-directional correlation spectrum confocal flat plate thickness detection system according to claim 2, wherein the theoretical model for adjusting the parallelism between the confocal probes and the measured flat plate in the step 1 is as follows:
when the confocal probe is absolutely parallel to the measured flat plate, the confocal probe receives the spectrum signal W returned by the flat plate1(λ), the signal peak wavelength λ1Corresponding to light intensity energy of W11) At the wavelength of λ1The monochromatic light is reflected back to the confocal probe to the maximum extent through the flat plate to show that the focusing energy is reflected;
when the confocal probe and the measured flat plate are inclined at any angle theta, the confocal probe receives a spectrum signal W returned by the flat platei(λ), the signal peak wavelength λiWavelength λ1The light intensity energy corresponding to the monochromatic light is Wi1) Due to λ1Monochromatic light fails to achieve complete confocal, so W11)>Wi1) Denotes the position corresponding to an arbitrary tilt, λ1The corresponding intensity will be less than it would be without the tilt. By quantitative description of lambda1Spectral signal W of monochromatic light at current position and different rotation anglesi(lambda) finding the corresponding intensity of light Wi1) The position of maximum represents the position where the parallelism is optimal.
4. The method for calibrating the optical axis of the double confocal probe of the bi-directional correlation spectrum confocal flat plate thickness detection system according to claim 3, wherein the theoretical model for the optical axis alignment of the double confocal probe in the step 2 is as follows:
when the confocal probe ConfP1 is located on the optical axis O1N1Optical axis O of confocal probe ConfP22N2When the confocal probe ConfP2 is in the same straight line, the total energy of the light emitted from the confocal probe ConfP1 received by the confocal probe ConfP2 is W1At this time, all the light emitted from the confocal probe ConfP1 according to the symmetry of the system will be received by the confocal probe ConfP 2;
when the confocal probe ConfP1 is located on the optical axis O1N1Optical axis O of confocal probe ConfP22N2When the confocal point ConfP2 is not in the same straight line, the confocal point ConfP1 cannot receive the light emitted from the confocal point ConfP2 completely, and the received energy is WiTherefore has W1>Wi(ii) a The position where the optical axes are aligned is known as the position where the confocal probe ConfP2 receives the maximum energy.
5. The method for calibrating the optical axis of the double confocal probe of the bi-directional correlation spectrum confocal flat plate thickness detection system according to claim 4, wherein the step 2 is implemented by roughly adjusting the alignment of the optical axis of the system, and further implementing the following steps:
a piece of light-transmitting paper Z1The confocal probe ConfP1 and ConfP2 are respectively arranged in the working range of the system, the light Spot on the paper sheet is shot 1, the light Spot on the paper sheet is shot 2, at the moment, due to the fact that the optical axes are not uniform, the shot 1 and the shot 2 are in a deviation state on the Y axis and the Z axis, and the five-axis displacement platform WMD is adjustedYAnd WMDZSo that Spot1 substantially coincides with Spot 2.
6. The method of claim 5, wherein the WMD of the confocal probe ConfP2 and the confocal probe ConfP1 is fixed during the adjustment processYAdjusting WMD of ConfP1 without movingZLooking for a WiThe maximum value position of (b) represents that there is no deviation of the optical axis on the Z-axis; WMD of fixed confocal probe ConfP1ZAdjusting WMD of ConfP1 without movingYLooking for a WiThe maximum position of (b) represents no deviation of the optical axis on the Y-axis, so far the system is confocalThe optical axes of the probes are aligned.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113945517A (en) * 2021-10-15 2022-01-18 上海德瀛睿创半导体科技有限公司 Silicon wafer detection device and detection method
CN114166119A (en) * 2021-11-29 2022-03-11 湖北亿纬动力有限公司 Battery size measuring method, device, equipment and storage medium
CN117006955A (en) * 2023-07-28 2023-11-07 江苏集萃激光科技有限公司 Device and method for on-line measurement of thickness of battery membrane electrode
CN118640831A (en) * 2024-08-02 2024-09-13 华中科技大学 Method for calculating relative inclination angle between optical axis of spectral confocal sensor and measured sample

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104613881A (en) * 2015-02-12 2015-05-13 江苏宇迪光学股份有限公司 Lens center thickness measuring device and method based on double face confocal measurement
CN105157584A (en) * 2015-08-31 2015-12-16 江苏大学 On-line measurement apparatus and method of thickness of non-contact object
CN106152951A (en) * 2016-07-05 2016-11-23 中国工程物理研究院激光聚变研究中心 A kind of two-sided interference device measuring non-transparent film thickness distribution and method
CN108955549A (en) * 2018-09-11 2018-12-07 深圳立仪科技有限公司 A kind of two-sided measuring thickness device of translucent material
CN109000571A (en) * 2018-09-11 2018-12-14 中国科学院光电技术研究所 Thickness consistency detection device
US10228551B1 (en) * 2018-06-20 2019-03-12 Precitec Optronik Gmbh Device and method for optically measuring a measurement object

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104613881A (en) * 2015-02-12 2015-05-13 江苏宇迪光学股份有限公司 Lens center thickness measuring device and method based on double face confocal measurement
CN105157584A (en) * 2015-08-31 2015-12-16 江苏大学 On-line measurement apparatus and method of thickness of non-contact object
CN106152951A (en) * 2016-07-05 2016-11-23 中国工程物理研究院激光聚变研究中心 A kind of two-sided interference device measuring non-transparent film thickness distribution and method
US10228551B1 (en) * 2018-06-20 2019-03-12 Precitec Optronik Gmbh Device and method for optically measuring a measurement object
CN108955549A (en) * 2018-09-11 2018-12-07 深圳立仪科技有限公司 A kind of two-sided measuring thickness device of translucent material
CN109000571A (en) * 2018-09-11 2018-12-14 中国科学院光电技术研究所 Thickness consistency detection device

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
PIN CAO: "Alignment methods for micron-scale surface defects", 《CHINESE OPTICS LETTERS》 *
YANG, YONGYING: "Detection and classification of glass defects based on machine vision", 《APPLIED OPTICAL METROLOGY II》 *
冯国华: "基于光谱共焦的厚度检测系统研究", 《中国优秀硕士论文期刊》 *
周林: "玻璃面板油墨厚度无损在线数字化检测系统", 《红外与激光工程》 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113945517A (en) * 2021-10-15 2022-01-18 上海德瀛睿创半导体科技有限公司 Silicon wafer detection device and detection method
CN114166119A (en) * 2021-11-29 2022-03-11 湖北亿纬动力有限公司 Battery size measuring method, device, equipment and storage medium
CN117006955A (en) * 2023-07-28 2023-11-07 江苏集萃激光科技有限公司 Device and method for on-line measurement of thickness of battery membrane electrode
CN118640831A (en) * 2024-08-02 2024-09-13 华中科技大学 Method for calculating relative inclination angle between optical axis of spectral confocal sensor and measured sample
CN118640831B (en) * 2024-08-02 2024-10-29 华中科技大学 Method for calculating relative inclination angle between optical axis of spectral confocal sensor and measured sample

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