CN111844494A - Crystal bar position calibration device and use method thereof - Google Patents
Crystal bar position calibration device and use method thereof Download PDFInfo
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- CN111844494A CN111844494A CN202010684807.7A CN202010684807A CN111844494A CN 111844494 A CN111844494 A CN 111844494A CN 202010684807 A CN202010684807 A CN 202010684807A CN 111844494 A CN111844494 A CN 111844494A
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- magnifier
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
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Abstract
The invention discloses a crystal bar position calibration device, which comprises: the magnifier comprises a magnifier and a first connecting block, wherein the first connecting block is arranged below the magnifier; the first sliding rail is connected with the first connecting block in a sliding mode, and the first sliding rail is parallel to the magnifying lens; the second connecting block is arranged below the first sliding rail; and the second sliding rail is in sliding connection with the second connecting block, wherein the second sliding rail is perpendicular to the first sliding rail. According to the crystal bar position calibrating device provided by the invention, the magnifier and the movable slide rail are arranged in the device, and the process of adjusting the crystal orientation angle tolerance of the wafer is completed by driving the magnifier to slide through the slide rail, so that the technical problem that the adjusting mode of the crystal orientation angle tolerance of the wafer in the prior art cannot meet the precision requirement can be effectively solved, and the accurate calibration of the crystal bar position can be realized.
Description
Technical Field
The invention relates to the technical field of semiconductor material processing, in particular to a crystal bar position calibration device and a use method thereof.
Background
Gallium arsenide has high electron mobility, and thus can be used for preparing high-speed or microwave semiconductor devices, gallium arsenide can also be used for preparing high-temperature resistant, anti-radiation or low-noise devices, near-infrared light emitting and laser devices, and can also be used as a photocathode material, and the like, and more importantly, gallium arsenide will become a base material for developing ultra-high-speed semiconductor integrated circuits in the future. Gallium arsenide wafers applied to various fields have strict requirements on the crystal orientation angle, and in order to make the precision of the cut wafers meet the requirements of customers, the gallium arsenide wafers have strict requirements on the crystal orientation angle because not only the crystal orientation of a crystal bar is ensured within the precision range, but also a steel wire is required to be parallel to the end face of the wafer when the crystal bar is cut.
In the prior art, a method for adjusting the crystal orientation angle of a gallium arsenide wafer is to use a dial indicator to detect whether the end face of a crystal bar is parallel to a wire saw workbench, and when the workbench is not parallel, the end face of the crystal bar is parallel to the workbench by adjusting the horizontal and vertical angles of the workbench, but the method has an error, namely a steel wire is not completely parallel to the workbench, and the error is about 0.2 degrees, so that the crystal orientation angle tolerance of the produced gallium arsenide wafer is about +/-0.5 degrees. Under the environment that the requirement on the crystal orientation angle tolerance of the gallium arsenide wafer is increasingly strict, the crystal orientation angle tolerance of the gallium arsenide wafer provided by many customers is within +/-0.02 degrees, and the angle tolerance of the wafer processed by the processing mode in the prior art can not meet the requirement.
With the development of the LED chip industry, the requirement for the crystal orientation angle tolerance of the gaas wafer is higher and higher, the existing adjustment method for the crystal orientation angle tolerance of the wafer cannot meet the precision requirement, and a new processing method needs to be designed to meet the requirement of the customer.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a crystal bar position calibration device and a use method thereof.
In order to achieve the purpose, the invention adopts the following technical scheme.
The invention provides a crystal bar position calibration device, which comprises: the magnifier comprises a magnifier and a first connecting block, wherein the first connecting block is arranged below the magnifier; the first sliding rail is connected with the first connecting block in a sliding mode, and the first sliding rail is parallel to the magnifying lens; the second connecting block is arranged below the first sliding rail; and the second sliding rail is in sliding connection with the second connecting block, wherein the second sliding rail is perpendicular to the first sliding rail.
As a further improvement of the present invention, the apparatus further comprises: the first limiting block and the second limiting block are respectively arranged at two ends of the first guide rail; the third limiting block and the fourth limiting block are respectively arranged at two ends of the second guide rail.
As a further improvement of the present invention, the apparatus further comprises: the first screw penetrates through the first limiting block and is fixedly connected with the first connecting block; and the second screw rod penetrates through the third limiting block and is fixedly connected with the second connecting block.
As a further improvement of the present invention, the apparatus further comprises: one end of the first spring is abutted against the first connecting block, and the other end of the first spring is abutted against the second limiting block; and one end of the second spring is abutted to the second connecting block, and the other end of the first spring is abutted to the fourth limiting block.
As a further improvement of the present invention, the apparatus further comprises: the first base is arranged between the magnifying lens and the first connecting block; and the second base is arranged on the lower end face of the second sliding rail.
As a further improvement of the present invention, the apparatus further comprises: the first fixer is arranged on the upper end face of the first base and used for fixing the rear half section of the magnifier; the second fixer is arranged on the upper end face of the first base and is parallel to the first fixer, and the second fixer is used for fixing the front half section of the magnifier.
As a further improvement of the present invention, the apparatus further comprises: the first nut is arranged on the first screw rod and is far away from the root part of one end of the first limiting block; and the second nut is arranged on the second screw rod and is far away from the root part of one end of the third limiting block.
The invention also provides a using method of the crystal bar position calibration device, which comprises the following steps: (A) arranging a crystal bar on a workbench of a multi-wire cutting machine; (B) adjusting the positions of the scale marks on the eyepiece of the magnifier and the steel wires on the multi-wire cutting machine to enable the scale marks to be parallel to the steel wires in the horizontal direction; (C) sticking a flat wafer on the end face of the crystal bar; (D) adjusting the positions of the scale marks on the eyepiece of the magnifier and the mirror surface of the wafer to make the scale marks parallel to the mirror surface of the wafer in the horizontal direction; (E) and taking off the wafer, and starting the multi-wire cutting machine to cut the crystal bar.
As a further improvement of the invention, the step of adjusting the positions of the scale marks on the eyepiece of the magnifier and the steel wire on the multi-wire cutting machine in the using method to enable the scale marks and the steel wire to be parallel in the horizontal direction comprises the following substeps: (B1) the magnifying lens is moved to rapidly slide left and right on the second sliding rail, and the scale marks are parallel to the steel wire in the horizontal direction by observing the magnifying lens; (B2) the magnifying lens slowly slides left and right on the second sliding rail by rotating the second screw rod, and the scale marks are parallel to the steel wire in the horizontal direction by observing the magnifying lens.
As a further improvement of the invention, the step of adjusting the positions of the scale marks on the eyepiece of the magnifier and the surface of the wafer mirror in the using method to make the scale marks and the surface of the wafer mirror parallel in the horizontal direction comprises the following substeps: (D1) the magnifying lens is moved to rapidly slide left and right on the second slide rail, and the scale marks are parallel to the mirror surface of the wafer in the horizontal direction by observing the magnifying lens; (D2) the magnifier slowly slides left and right on the second slide rail by rotating the second screw rod, and the scale marks are parallel to the mirror surface of the wafer in the horizontal direction by observing the magnifier.
According to the crystal bar position calibrating device provided by the invention, the magnifier and the movable slide rail are arranged in the device, and the process of adjusting the crystal orientation angle tolerance of the wafer is completed by driving the magnifier to slide through the slide rail, so that the technical problem that the adjusting mode of the crystal orientation angle tolerance of the wafer in the prior art cannot meet the precision requirement can be effectively solved, and the accurate calibration of the crystal bar position can be realized.
Drawings
Fig. 1 is a schematic structural diagram of a crystal bar position calibration device according to the present invention.
Fig. 2 is a schematic structural diagram of a crystal bar position calibration device according to another embodiment of the present invention.
Wherein: 1-a magnifying glass; 2-a first connection block; 3-a first slide rail; 4-a second connecting block; 5-a second slide rail; 6-a first limiting block; 7-a second limiting block; 8-a third limiting block; 9-a fourth limiting block; 10-a first screw; 11-a second screw; 12-a first spring; 13-a second spring; 14-a first base; 15-a second base; 16-a first holder; 17-a second holder; 18-a first nut; 19-a second nut; 20-a third base; 21-a fourth base; 22-a third screw; 23-a third nut; 24-a first support column; 25-a second support column; 26-a third support column; 27-fourth support column.
Detailed Description
The technical solutions will be described clearly and completely in the following with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, according to a first aspect of the present invention, a crystal bar position calibration device is provided, which includes a magnifier 1 and a first connecting block 2, the first connecting block 2 is disposed below the magnifier 1, a first base 14 is further disposed between the first connecting block 2 and the magnifier 1, a first fixer 16 and a second fixer 17 which are parallel to each other are further mounted on an upper end surface of the first base 14, the first fixer 16 is used for fixing a rear half section of the magnifier 1, the second fixer 17 is used for fixing a front half section of the magnifier 1, the front half section and the rear half section of the magnifier 1 are detachably connected, an eyepiece is mounted on the front half section of the magnifier 1, and an objective lens is mounted on the rear half section of the magnifier 1.
In some embodiments of the present invention, the device provided by the present invention further includes a first slide rail 3, the first slide rail 3 is slidably connected to the first connecting block 2, wherein the first slide rail 3 is parallel to the magnifier 1, the first slide rail 3 includes two first guide rails, the number of the first guide rails is two, the first connecting block 2 includes two first grooves mutually matched with the guide rails on the first slide rail 3, the number of the first grooves is two consistent with the number of the first guide rails, the first grooves and the first guide rails are mutually matched to enable the first connecting block 2 to slide on the first slide rail 3, the sliding mode is front-back sliding, so that the magnifier 1 slides front and back above the first slide rail 3, the two ends of the first slide rail 3 are provided with a first stopper 6 and a second stopper 7, the first stopper 6 and the second stopper 7 play a role in limiting the front-back sliding space of the first slide rail 3, the derailment of the first connecting block 2 in the process of sliding on the first sliding rail 3 is prevented.
In some embodiments of the present invention, the device further includes a second connecting block 4 and a second slide rail 5, the second connecting block 4 is disposed below the first slide rail 3, the second slide rail 5 is slidably connected to the second connecting block 4, wherein the second slide rail 5 is perpendicular to the first slide rail 3, the second slide rail 5 includes two second guide rails, the second connecting block 4 includes two second grooves mutually matched with the guide rails on the second slide rail 5, the number of the second grooves is two consistent with the number of the second guide rails, the second grooves are mutually matched with the second guide rails to enable the second connecting block 4 to slide on the second slide rail 5 in a left-right sliding manner, so that the magnifier 1 slides left and right above the second slide rail 5, the lower end surface of the second slide rail 5 is provided with a second base 15 for supporting the whole device, two ends of the second slide rail 5 are provided with a third limiting block 8 and a fourth limiting block 9, the third limiting block 8 and the fourth limiting block 9 play a role in limiting the left-right sliding space of the second sliding rail 5, and prevent the second connecting block 4 from derailing in the sliding process on the second sliding rail 5.
In some embodiments of the invention, the device provided by the invention further comprises a first screw 10, a second screw 11, a first spring 12 and a second spring 13, the first screw 10 penetrates through the first limiting block 6 to be fixedly connected with the first connecting block 2, a thread is arranged on the first screw 10, a nut is arranged on the first limiting block 6, the first screw 10 is in threaded engagement connection with the first limiting block 6 in a connection mode, the first screw 10 can be screwed on the nut on the first limiting block 6, the first screw 10 pushes the first connecting block 2 to drive the magnifier 1 to perform fine adjustment of front and back movement, tolerance of crystal orientation angle of a wafer is accurately adjusted, a first nut 18 is further arranged at the root of one end of the first screw 10 far away from the first limiting block 6, and the first nut 18 plays a more convenient role in screwing the first screw 10; one end of the first spring 12 is abutted against the first connecting block 2, the other end of the first spring 12 is abutted against the second limiting block 7, and the first spring 12 plays a role in fixing the first connecting block 2 and prevents the first connecting block 2 from moving back and forth on the first slide rail 3 in a static state; the second screw 11 penetrates through the third limiting block 8 and is fixedly connected with the second connecting block 4, threads are arranged on the second screw 11, a nut is arranged on the third limiting block 8, the second screw 11 is in threaded engagement connection with the third limiting block 8 in a connection mode, the second screw 11 can be screwed on the nut on the third limiting block 8, the second screw 11 pushes the second connecting block 4 to drive the magnifier 1 to perform fine adjustment of left and right movement, tolerance of crystal orientation angles of wafers is accurately adjusted, a second nut 19 is further arranged at the root of one end, far away from the third limiting block 8, of the second screw 11, and the second nut 19 plays a more convenient role in screwing the second screw 11; one end of the second spring 13 abuts against the second connecting block 4, the other end of the second spring 13 abuts against the fourth limiting block 9, the second spring 13 plays a role in fixing the second connecting block 4, and the second connecting block 4 in a static state is prevented from moving left and right on the second sliding rail 5.
Referring to fig. 2, in another embodiment of the present invention, the apparatus further includes a third base 20, a fourth base 21, a third screw 22, a third nut 23, a first supporting column 24, a second supporting column 25, a third supporting column 26, and a fourth supporting column 27, wherein the third base 20 is disposed between the fourth base 21 and the second base 15 and is parallel to the fourth base 21, and the first supporting column 24, the second supporting column 25, the third supporting column 26, and the fourth supporting column 27 all penetrate through the second base 15 and the third base 20 and are disposed on an end surface of the fourth base 21 in parallel and perpendicular to each other; the third screw 22 penetrates through the third base 20 and is fixedly connected with the second base 15, threads are arranged on the third screw 22, nuts are arranged on the third base 20, the third screw 22 is connected with the third base 20 in a threaded engagement mode, the third screw 22 can be screwed on the nuts on the third base 20 to drive the magnifier 1 to be finely adjusted in a vertical movement mode, the tolerance of the crystal orientation angle of the wafer can be accurately adjusted, a third nut 23 is further arranged at the root of one end, far away from the third base 20, of the third screw 22, and the third nut 23 plays a more convenient role in screwing the third screw 22.
According to a second aspect of the present invention, there is also provided a method of using a crystal rod position calibration apparatus, comprising the steps of: (A) arranging a crystal bar on a workbench of a multi-wire cutting machine; (B) adjusting the positions of the scale marks on the eyepiece of the magnifier and the steel wires on the multi-wire cutting machine to enable the scale marks to be parallel to the steel wires in the horizontal direction; (C) sticking a flat wafer on the end face of the crystal bar; (D) adjusting the positions of the scale marks on the eyepiece of the magnifier and the mirror surface of the wafer to make the scale marks parallel to the mirror surface of the wafer in the horizontal direction; (E) and taking off the wafer, and starting the multi-wire cutting machine to cut the crystal bar.
In this embodiment, the step of adjusting the positions of the scale marks on the eyepiece of the magnifier and the steel wire on the multi-wire cutting machine to make the scale marks and the steel wire parallel in the horizontal direction in the use method includes: the crystal bar position calibration device is placed on a workbench and fixed, the third screw rod is screwed to enable the scale mark of the magnifier to move up and down to be aligned with the position, which is in accordance with the measurement standard, in the vertical direction of the steel wire, and then the first screw rod is screwed to enable the scale mark on the magnifier to move up and down to be aligned with the position, which is in accordance with the measurement standard, in the horizontal direction of the steel wire, so that the scale mark and the steel wire are parallel in the horizontal direction.
In this embodiment, the flat wafer is a finished wafer meeting the standard of the angular tolerance, and the finished wafer is adhered to the end face of the crystal bar by the flat wafer, so that the finished wafer is parallel to the crystal bar to be cut, and the finished wafer mirror surface can be known to be parallel to the steel wire by adjusting the scale marks to be parallel to the wafer mirror surface in the horizontal direction, so that the crystal bar to be cut is known to be parallel to the steel wire, and the wafer can be taken down to start the multi-wire cutting machine to cut the crystal bar.
Further, the step of adjusting the positions of the scale marks on the eyepiece of the magnifier and the steel wire on the multi-wire cutting machine in the using method to enable the scale marks and the steel wire to be parallel in the horizontal direction comprises the following substeps: (B1) the magnifying lens is moved to rapidly slide left and right on the second sliding rail, and the scale marks are parallel to the steel wire in the horizontal direction by observing the magnifying lens; (B2) the magnifying lens slowly slides left and right on the second sliding rail by rotating the second screw rod, and the scale marks are parallel to the steel wire in the horizontal direction by observing the magnifying lens.
Further, the step of adjusting the positions of the scale marks on the eyepiece of the magnifier and the mirror surface of the wafer in the using method to make the scale marks parallel to the mirror surface of the wafer in the horizontal direction comprises the following substeps: (D1) the magnifying lens is moved to rapidly slide left and right on the second slide rail, and the scale marks are parallel to the mirror surface of the wafer in the horizontal direction by observing the magnifying lens; (D2) the magnifier slowly slides left and right on the second slide rail by rotating the second screw rod, and the scale marks are parallel to the mirror surface of the wafer in the horizontal direction by observing the magnifier.
According to the crystal bar position calibrating device provided by the invention, the magnifier and the movable slide rail are arranged in the device, and the process of adjusting the crystal orientation angle tolerance of the wafer is completed by driving the magnifier to slide through the slide rail, so that the technical problem that the adjusting mode of the crystal orientation angle tolerance of the wafer in the prior art cannot meet the precision requirement can be effectively solved, and the accurate calibration of the crystal bar position can be realized.
Although the preferred embodiments of the present invention have been disclosed for illustrative purposes, those skilled in the art will appreciate that various modifications, additions and substitutions are possible, without departing from the scope and spirit of the invention as disclosed in the accompanying claims.
Claims (10)
1. A crystal rod position calibration device, comprising:
the magnifier comprises a magnifier and a first connecting block, wherein the first connecting block is arranged below the magnifier;
the first sliding rail is connected with the first connecting block in a sliding mode, and the first sliding rail is parallel to the magnifying lens;
the second connecting block is arranged below the first sliding rail;
and the second sliding rail is in sliding connection with the second connecting block, wherein the second sliding rail is perpendicular to the first sliding rail.
2. The apparatus of claim 1, further comprising:
the first limiting block and the second limiting block are respectively arranged at two ends of the first guide rail;
the third limiting block and the fourth limiting block are respectively arranged at two ends of the second guide rail.
3. The apparatus of claim 1, further comprising:
the first screw penetrates through the first limiting block and is fixedly connected with the first connecting block;
And the second screw rod penetrates through the third limiting block and is fixedly connected with the second connecting block.
4. The apparatus of claim 1, further comprising:
one end of the first spring is abutted against the first connecting block, and the other end of the first spring is abutted against the second limiting block;
and one end of the second spring is abutted to the second connecting block, and the other end of the first spring is abutted to the fourth limiting block.
5. The apparatus of claim 1, further comprising:
the first base is arranged between the magnifying lens and the first connecting block;
and the second base is arranged on the lower end face of the second sliding rail.
6. The apparatus of claim 5, further comprising:
the first fixer is arranged on the upper end face of the first base and used for fixing the rear half section of the magnifier;
the second fixer is arranged on the upper end face of the first base and is parallel to the first fixer, and the second fixer is used for fixing the front half section of the magnifier.
7. A crystal rod position calibration device as claimed in claim 3, said device further comprising:
the first nut is arranged on the first screw rod and is far away from the root part of one end of the first limiting block;
and the second nut is arranged on the second screw rod and is far away from the root part of one end of the third limiting block.
8. The use method of the crystal bar position calibration device according to claims 1 to 7, comprising the steps of:
(A) arranging a crystal bar on a workbench of a multi-wire cutting machine;
(B) adjusting the positions of the scale marks on the eyepiece of the magnifier and the steel wires on the multi-wire cutting machine to enable the scale marks to be parallel to the steel wires in the horizontal direction;
(C) sticking a flat wafer on the end face of the crystal bar;
(D) adjusting the positions of the scale marks on the eyepiece of the magnifier and the mirror surface of the wafer to make the scale marks parallel to the mirror surface of the wafer in the horizontal direction;
(E) and taking off the wafer, and starting the multi-wire cutting machine to cut the crystal bar.
9. The method of claim 8, wherein step (B) comprises the sub-steps of:
(B1) the magnifying lens is moved to rapidly slide left and right on the second sliding rail, and the scale marks are parallel to the steel wire in the horizontal direction by observing the magnifying lens;
(B2) The magnifying lens slowly slides left and right on the second sliding rail by rotating the second screw rod, and the scale marks are parallel to the steel wire in the horizontal direction by observing the magnifying lens.
10. The method of claim 8, wherein step (D) comprises the sub-steps of:
(D1) the magnifying lens is moved to rapidly slide left and right on the second slide rail, and the scale marks are parallel to the mirror surface of the wafer in the horizontal direction by observing the magnifying lens;
(D2) the magnifier slowly slides left and right on the second slide rail by rotating the second screw rod, and the scale marks are parallel to the mirror surface of the wafer in the horizontal direction by observing the magnifier.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010684807.7A CN111844494A (en) | 2020-07-16 | 2020-07-16 | Crystal bar position calibration device and use method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010684807.7A CN111844494A (en) | 2020-07-16 | 2020-07-16 | Crystal bar position calibration device and use method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN111844494A true CN111844494A (en) | 2020-10-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010684807.7A Pending CN111844494A (en) | 2020-07-16 | 2020-07-16 | Crystal bar position calibration device and use method thereof |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0966520A (en) * | 1995-08-31 | 1997-03-11 | Nippei Toyama Corp | Wire sawing machine |
| JP2002337137A (en) * | 2001-05-16 | 2002-11-27 | Nippei Toyama Corp | Work mounting method, wire saw and support plate |
| CN103231457A (en) * | 2013-04-22 | 2013-08-07 | 孝感市瑞晟机电制造有限公司 | High-yield graphene manufacturing method |
| CN105806781A (en) * | 2016-04-20 | 2016-07-27 | 北京石油化工学院 | Microscope clamping and adjusting device |
| CN111376393A (en) * | 2020-04-14 | 2020-07-07 | 福州天瑞线锯科技有限公司 | Single silicon crystal bar cutting and grinding all-in-one machine |
-
2020
- 2020-07-16 CN CN202010684807.7A patent/CN111844494A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0966520A (en) * | 1995-08-31 | 1997-03-11 | Nippei Toyama Corp | Wire sawing machine |
| JP2002337137A (en) * | 2001-05-16 | 2002-11-27 | Nippei Toyama Corp | Work mounting method, wire saw and support plate |
| CN103231457A (en) * | 2013-04-22 | 2013-08-07 | 孝感市瑞晟机电制造有限公司 | High-yield graphene manufacturing method |
| CN105806781A (en) * | 2016-04-20 | 2016-07-27 | 北京石油化工学院 | Microscope clamping and adjusting device |
| CN111376393A (en) * | 2020-04-14 | 2020-07-07 | 福州天瑞线锯科技有限公司 | Single silicon crystal bar cutting and grinding all-in-one machine |
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Application publication date: 20201030 |