CN111842073B - 基于核壳Au@SiO2超原子的无序结构超材料及其制备方法 - Google Patents
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Abstract
本发明公开了一种基于核壳Au@SiO2超原子的无序结构超材料及其自组装制备方法,涉及自组装超材料技术领域。所述无序结构超材料是由核壳Au@SiO2超原子层与Al膜层复合而成;自组装制备工艺是在溶液环境下,通过设计核壳Au@SiO2超原子与Al膜之间的静电吸附及毛细作用而实现。光学性能综合表征显示,由核壳Au@SiO2超原子自组装制备的无序结构超材料,在可见光波段特定光入射角度下,能够实现近完美吸收光学性质(不同偏振状态,波长537nm、575nm位置光吸收率大于99%)。
Description
技术领域
本发明涉及自组装超材料技术领域,特别涉及一种基于核壳Au@SiO2超原子的无序结构超材料及其自组装制备方法。
背景技术
在自组装超材料技术的研究发展中,核壳Metal@SiO2纳米结构(即金属与电介质SiO2形成的核壳纳米包裹结构,例如Au@SiO2、Ag@SiO2等)是一种特殊的、具有应用潜质的超原子结构。理论上,Metal@SiO2纳米结构可与一定频率的入射电磁波相互作用而形成表面等离激元,通过人工结构设计,这些表面等离激元相互间易于发生共振耦合,从而有利于实现诸如“拓扑黑体”、“吸波器”、“隐身罩”等可见-近红外波段有望面向实际应用的光学超材料。
然而,由于受制于核壳Metal@SiO2纳米结构合成制备产率低以及适宜自组装技术缺乏等影响,当前利用核壳Metal@SiO2纳米结构作为超原子进行光学超材料自组装设计、制备 (Metal@SiO2相互之间,或与其他金属结构进行复合)的研究设想尚未能得到广泛推广。因此现阶段,探索基于核壳Metal@SiO2超原子的超材料自组装制备及其光学特性研究有着重要的实际意义。
发明内容
本发明针对现有核壳Metal@SiO2纳米结构合成制备产率低以及设计相应光学超材料适宜自组装技术缺乏等问题,提出了一种全新的、基于核壳Au@SiO2超原子的无序结构超材料及其自组装制备方法,其未来有望应用于等离子体传感、光伏器件、太阳能电池等领域。
本发明采用的技术方案为:一种基于核壳Au@SiO2超原子的无序结构超材料,所述无序结构超材料是由核壳Au@SiO2超原子层与Al膜层复合而成,其中,核壳Au@SiO2超原子层是以无序取向、随机密排方式铺叠在Al膜层表面,单个核壳Au@SiO2超原子大小均匀,其粒径在百纳米级,Al膜层厚度大于可见光趋肤深度,可见光波段特定光入射角度下,不同偏振状态的自组装无序结构超材料能够实现近完美吸收光学性质。
所使用的核壳Au@SiO2超原子包含Au纳米颗粒内核及SiO2介质壳层,其中Au纳米颗粒尺寸约为45nm,SiO2介质壳层厚度为85~100nm;核壳Au@SiO2超原子的自组装层数为3~5层;无序结构超材料在可见光波段的TE、TM偏振近完美光吸收峰分别位于波长537nm和575nm位置附近,其对应的光入射角度为44~48°。
本发明基于核壳Au@SiO2超原子的无序结构超材料自组装制备方法,包含如下操作步骤:
步骤S1:将洁净基片置于真空镀膜系统中,镀制大于80nm厚度的金属Al膜层后,将镀制有Al膜层的基片浸泡于PDDA水溶液(浓度大于1g/L)中30min,使其表面带上正电荷,然后依次使用去离子水、无水乙醇冲洗干净基片,N2吹干备用;
步骤S2:将带有Al膜层的基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子水溶液中,而后以0.3mm/min的提拉速度将基片与核壳Au@SiO2超原子(通过将聚乙烯砒咯烷酮保护的Au纳米颗粒在碱性溶液环境下与正硅酸乙酯、氨水发生水解反应制备而成)水溶液分离,在静电吸附和毛细作用下,核壳Au@SiO2超原子将自组装于Al膜层表面,形成单层核壳Au@SiO2超原子与Al膜层的复合结构;
步骤S3:将带有单层Au@SiO2超原子与Al膜层复合结构的基片再次分别浸泡于PDDA、 Au@SiO2超原子水溶液中,反复提拉进行3~5次,最终可制备获得层层堆积的目标无序结构超材料。
本发明的有益效果是:以纳米尺度的核壳Au@SiO2超原子为基础,首次探索研究了静电沉积结合毛细作用自组装技术制备无序结构超材料,所制备无序结构超材料在可见光波段展现出了偏振依赖的近完美光吸收性质,这在以往的超材料自组装制备研究中是未曾报道的;通过调节核壳Au@SiO2超原子层数、SiO2介质球壳厚度等自组装参数,本发明可实现对无序结构超材料光吸收性质的有效调控。另外,本发明中的自组装制备方法成本低、稳定性高,所制备无序结构超材料的光吸收性能重复性良好。
附图说明
图1为自组装核壳Au@SiO2超原子制备的四层无序结构超材料SEM图;
图2为TE偏振状态下,44°光入射角度测试的四层无序结构超材料光吸收曲线;
图3为TM偏振状态下,48°光入射角度测试的四层无序结构超材料光吸收曲线;
图4为具有三层核壳Au@SiO2超原子的无序结构超材料SEM图;
图5为TE偏振状态下,45°光入射角度测试的三层无序结构超材料光吸收曲线;
图6为调控SiO2介质壳层厚度为95nm时,五层无序结构超材料的光吸收曲线(TE偏振, 45°入射角)。
具体实施方式
结合以下具体实施案例及附图,对本发明作进一步说明,但本发明的保护内容不局限于以下实施例。熟悉本领域的技术人员可容易对以下实例进行修改,并把一般原理应用到其它实例中而不通过创造性的劳动。故凡本领域技术人员根据本发明之提示,对本发明进行的修改和改进均在本发明的保护之内,并且以所附的权利要求书为保护范围。
实施例1
将洁净基片置于真空磁控溅射镀膜系统中,镀制90nm厚的Al膜层后,将Al膜基片浸泡于1.5g/L浓度的PDDA水溶液中30min,而后洗净吹干Al膜基片,再将基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子(SiO2介质壳层厚度为85nm)水溶液中,通过0.3mm/min 的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,重复将附着有Au@SiO2超原子的Al 膜基片浸泡于PDDA、Au@SiO2超原子水溶液中进行两次提拉,最终可获得具有三层核壳 Au@SiO2超原子的无序结构超材料,并对其相应的结构、光学性能进行表征分析。
实施例2
将洁净基片置于真空磁控溅射镀膜系统中,镀制100nm厚的Al膜层后,将Al膜基片浸泡于1.8g/L浓度的PDDA水溶液中30min,而后洗净吹干Al膜基片,再将基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子(SiO2介质壳层厚度为95nm)水溶液中,通过0.3mm/min 的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,重复将附着有Au@SiO2超原子的Al 膜基片浸泡于PDDA、Au@SiO2超原子水溶液中进行三次提拉,最终可获得具有四层核壳 Au@SiO2超原子的无序结构超材料,并对其相应的结构、光学性能进行表征分析。
实施例3
将洁净基片置于真空磁控溅射镀膜系统中,镀制110nm厚的Al膜层后,将Al膜基片浸泡于2g/L浓度的PDDA水溶液中30min,而后洗净吹干Al膜基片,再将基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子(SiO2介质壳层厚度为95nm)水溶液中,通过0.3mm/min 的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,重复将附着有Au@SiO2超原子的Al 膜基片浸泡于PDDA、Au@SiO2超原子水溶液中进行四次提拉,最终可获得具有五层核壳 Au@SiO2超原子的无序结构超材料,并对其相应的结构、光学性能进行表征分析。
实施例4
将洁净基片置于真空磁控溅射镀膜系统中,镀制85nm厚的Al膜层后,将Al膜基片浸泡于1.7g/L浓度的PDDA水溶液中30min,而后洗净吹干Al膜基片,再将基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子(SiO2介质壳层厚度为100nm)水溶液中,通过0.3mm/min 的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,重复将附着有Au@SiO2超原子的Al 膜基片浸泡于PDDA、Au@SiO2超原子水溶液中进行三次提拉,最终可获得另一种具有四层核壳Au@SiO2超原子的无序结构超材料,并对其相应的结构、光学性能进行表征分析。
实施例5
将洁净基片置于真空磁控溅射镀膜系统中,镀制120nm厚的Al膜层后,将Al膜基片浸泡于1.2g/L浓度的PDDA水溶液中30min,而后洗净吹干Al膜基片,再将基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子(SiO2介质壳层厚度为100nm)水溶液中,通过0.3mm/min 的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,重复将附着有Au@SiO2超原子的Al 膜基片浸泡于PDDA、Au@SiO2超原子水溶液中进行四次提拉,最终可获得另一种具有五层核壳Au@SiO2超原子的无序结构超材料,并对其相应的结构、光学性能进行表征分析。
对照例1
将洁净基片置于真空磁控溅射镀膜系统中,镀制85nm厚的Al膜层获得所需试样并进行相关结构、性能测试表征。
对照例2
将洁净基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子(SiO2介质壳层厚度为90nm) 水溶液中,通过0.3mm/min的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,重复将附着有Au@SiO2超原子的基片浸泡于PDDA、Au@SiO2超原子水溶液中进行两次提拉,获得具有三层核壳Au@SiO2超原子的自组装对照结构,并对该种自组装结构及其光学性能进行测试表征。
对照例3
将洁净基片置于真空磁控溅射镀膜系统中,镀制85nm厚的Al膜层后,将Al膜基片浸泡于1.5g/L浓度的PDDA水溶液中30min,而后洗净吹干Al膜基片,再将基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子(SiO2介质壳层厚度为50nm)水溶液中,通过0.3mm/min 的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,重复将附着有Au@SiO2超原子的Al 膜基片浸泡于PDDA、Au@SiO2超原子水溶液中进行三次提拉,获得具有四层核壳Au@SiO2超原子的自组装对照结构,并对该种自组装结构及其光学性能进行测试表征。
对照例4
将洁净基片置于真空磁控溅射镀膜系统中,镀制100nm厚的Al膜层后,将Al膜基片浸泡于0.5g/L浓度的PDDA水溶液中30min,而后洗净吹干Al膜基片,再将基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子(SiO2介质壳层厚度为120nm)水溶液中,通过0.3mm/min 的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,重复将附着有Au@SiO2超原子的Al 膜基片浸泡于PDDA、Au@SiO2超原子水溶液中进行四次提拉,获得具有五层核壳Au@SiO2超原子的自组装对照结构,并对该种自组装结构及其光学性能进行测试表征。
对照例5
将洁净基片置于真空磁控溅射镀膜系统中,镀制50nm厚的Al膜层后,将Al膜基片浸泡于1.8g/L浓度的PDDA水溶液中30min,而后洗净吹干Al膜基片,再将基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子(SiO2介质壳层厚度为95nm)水溶液中,通过0.3mm/min 的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,重复将附着有Au@SiO2超原子的Al 膜基片浸泡于PDDA、Au@SiO2超原子水溶液中进行三次提拉,获得另一种具有四层核壳 Au@SiO2超原子的自组装对照结构,并对该种自组装结构及其光学性能进行测试表征。
表1:本发明中自组装无序结构超材料的光吸收性能
自组装无序结构超材料 | 最高光吸收率 | 吸收峰个数 | 光偏振状态 | 测试/模拟波段 |
实施例1 | 99.1% | 2 | TE偏振 | 400~750nm |
实施例2 | 99.9% | 2 | TE偏振 | 400~750nm |
实施例3 | 99.3% | 1 | TM偏振 | 400~750nm |
实施例4 | 99.5% | 1 | TM偏振 | 400~750nm |
实施例5 | 99.2% | 2 | TE偏振 | 400~750nm |
对照例1 | 12% | 0 | 普通入射 | 400~750nm |
对照例2 | 70.5% | 1 | 普通入射 | 400~750nm |
对照例3 | 78.2% | 1 | TM偏振 | 400~750nm |
对照例4 | 85.7% | 1 | TM偏振 | 400~750nm |
对照例5 | 81.4% | 2 | TE偏振 | 400~750nm |
Claims (5)
1.一种基于核壳Au@SiO2超原子的无序结构超材料,其特征在于:所述无序结构超材料是由核壳Au@SiO2超原子层与Al膜层复合而成,其中,核壳Au@SiO2超原子层是以无序取向、随机密排方式铺叠在Al膜层表面,单个核壳Au@SiO2超原子大小均匀,其粒径在百纳米级,可见光波段特定光入射角度下,不同偏振状态的自组装无序结构超材料能够实现近完美吸收光学性质,在不同偏振状态,波长537nm、575nm位置光吸收率大于99%;
所使用的核壳Au@SiO2超原子包含Au纳米颗粒内核及SiO2介质壳层,其中Au纳米颗粒尺寸为45nm,Al膜层的厚度大于80nm,SiO2介质壳层厚度为85~100nm;核壳Au@SiO2超原子的自组装层数为3~5层;无序结构超材料在可见光波段的TE、TM偏振近完美光吸收峰分别位于波长537nm和575nm位置附近,其对应的光入射角度为44~48°。
2.一种根据权利要求1所述的基于核壳Au@SiO2超原子的无序结构超材料的自组装制备方法,其特征在于,包含如下操作步骤:
步骤S1:将洁净基片置于真空镀膜系统中,镀制大于80nm厚度的金属Al膜层,随后将镀制有Al膜层的基片浸泡于聚二烯丙基二甲基氯化铵水溶液中30min,使其表面带上正电荷,然后依次使用去离子水、无水乙醇冲洗干净基片,N2吹干备用;
步骤S2:将处理好的带有Al膜层的基片垂直浸渍于饱和浓度的核壳Au@SiO2超原子水溶液中,而后以缓慢的提拉速度将基片与核壳Au@SiO2超原子水溶液分离,在静电吸附和毛细作用下,核壳Au@SiO2超原子将自组装于Al膜层表面,形成单层核壳Au@SiO2超原子与Al膜层的复合结构;
步骤S3:将带有单层Au@SiO2超原子与Al膜层复合结构的基片再次分别浸泡于聚二烯丙基二甲基氯化铵、Au@SiO2超原子水溶液中,反复提拉进行3~5次,最终可制备获得层层堆积的无序结构超材料。
3.根据权利要求2所述的无序结构超材料自组装制备方法,其特征在于:核壳Au@SiO2超原子是通过将聚乙烯砒咯烷酮保护的Au纳米颗粒在碱性溶液环境下与正硅酸乙酯、氨水发生水解反应而制成。
4.根据权利要求2所述的无序结构超材料自组装制备方法,其特征在于:真空镀膜系统可选择蒸镀仪或磁控溅射仪;聚二烯丙基二甲基氯化铵水溶液浓度大于1g/L;基片与核壳Au@SiO2超原子水溶液的分离速度为0.3mm/min。
5.根据权利要求2所述的无序结构超材料自组装制备方法,其特征在于:整个自组装实验过程是在一个60℃的密闭环境中进行。
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104874789A (zh) * | 2015-05-12 | 2015-09-02 | 济南大学 | 一种超薄壳层Au@SiO2纳米复合材料的可控制备方法 |
WO2017205658A1 (en) * | 2016-05-25 | 2017-11-30 | The Regents Of The University Of Colorado, A Body Corporate | Atomic layer etching on microdevices and nanodevices |
CN108520903A (zh) * | 2018-05-10 | 2018-09-11 | 江西师范大学 | 一种可见-近红外区域宽波段完美吸收器及其制备方法 |
CN108919391A (zh) * | 2018-06-14 | 2018-11-30 | 国家纳米科学中心 | 基于金属薄膜-核壳等离子体结构的宽带完美吸收体 |
CN109581553A (zh) * | 2019-01-10 | 2019-04-05 | 中国科学院光电技术研究所 | 一种可见光波段超材料完美吸收体及其自组装制备方法 |
CN110196460A (zh) * | 2019-06-21 | 2019-09-03 | 东北大学 | 一种与可见光隐身兼容的红外隐身金属纳米颗粒超材料复合膜及其制备方法 |
CN110346853A (zh) * | 2019-07-18 | 2019-10-18 | 江西师范大学 | 一种可见-近红外波段的可调谐双频完美吸收器 |
CN110849864A (zh) * | 2019-11-18 | 2020-02-28 | 长春理工大学 | 一种图案化核壳结构纳米粒子sers活性基底及制备方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20140212575A1 (en) * | 2012-09-24 | 2014-07-31 | The Regents Of The University Of Colorado, A Body Corporate | Novel Self-Assembling Nanocomposite Structures and Methods of Preparing Same |
US10121919B2 (en) * | 2017-01-06 | 2018-11-06 | Nanoclear Technologies Inc. | Control of surface properties by deposition of particle monolayers |
-
2020
- 2020-07-09 CN CN202010656366.XA patent/CN111842073B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104874789A (zh) * | 2015-05-12 | 2015-09-02 | 济南大学 | 一种超薄壳层Au@SiO2纳米复合材料的可控制备方法 |
WO2017205658A1 (en) * | 2016-05-25 | 2017-11-30 | The Regents Of The University Of Colorado, A Body Corporate | Atomic layer etching on microdevices and nanodevices |
CN108520903A (zh) * | 2018-05-10 | 2018-09-11 | 江西师范大学 | 一种可见-近红外区域宽波段完美吸收器及其制备方法 |
CN108919391A (zh) * | 2018-06-14 | 2018-11-30 | 国家纳米科学中心 | 基于金属薄膜-核壳等离子体结构的宽带完美吸收体 |
CN109581553A (zh) * | 2019-01-10 | 2019-04-05 | 中国科学院光电技术研究所 | 一种可见光波段超材料完美吸收体及其自组装制备方法 |
CN110196460A (zh) * | 2019-06-21 | 2019-09-03 | 东北大学 | 一种与可见光隐身兼容的红外隐身金属纳米颗粒超材料复合膜及其制备方法 |
CN110346853A (zh) * | 2019-07-18 | 2019-10-18 | 江西师范大学 | 一种可见-近红外波段的可调谐双频完美吸收器 |
CN110849864A (zh) * | 2019-11-18 | 2020-02-28 | 长春理工大学 | 一种图案化核壳结构纳米粒子sers活性基底及制备方法 |
Non-Patent Citations (3)
Title |
---|
"Flexible Visible-Infrared Metamaterials and Their Applications in Highly Sensitive Chemical and Biological Sensing";Xu, Xinlong等;《NANO LETTERS》;20110831;第11卷(第8期);第3232-3238页 * |
"Self-assembled metamaterial perfect absorbers at visible wavelengths using core-shell Au@SiO(2)meta-atoms";Zhang, Haibin等;《JOURNAL OF MATERIALS CHEMISTRY C》;20201007;第8卷(第37期);第12876-12885页 * |
"柔性光学超材料和等离子激元的发展和应用";高丽等;《中国科学:物理学 力学 天文学》;20160420;第46卷(第4期);第30-41页 * |
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