CN111801301B - 减少唑类和aox腐蚀抑制剂的方法和组合物 - Google Patents
减少唑类和aox腐蚀抑制剂的方法和组合物 Download PDFInfo
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- CN111801301B CN111801301B CN201980017981.1A CN201980017981A CN111801301B CN 111801301 B CN111801301 B CN 111801301B CN 201980017981 A CN201980017981 A CN 201980017981A CN 111801301 B CN111801301 B CN 111801301B
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- Prior art keywords
- acid
- amino
- aox
- hydroxyethyl
- environmentally friendly
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- 238000000034 method Methods 0.000 title claims abstract description 62
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 title claims description 58
- 230000007797 corrosion Effects 0.000 title claims description 32
- 238000005260 corrosion Methods 0.000 title claims description 32
- 239000000203 mixture Substances 0.000 title claims description 24
- 239000003112 inhibitor Substances 0.000 title description 24
- 239000002738 chelating agent Substances 0.000 claims abstract description 33
- 238000001816 cooling Methods 0.000 claims abstract description 33
- 239000007800 oxidant agent Substances 0.000 claims abstract description 24
- 239000003139 biocide Substances 0.000 claims abstract description 22
- 239000000126 substance Substances 0.000 claims abstract description 19
- 230000001590 oxidative effect Effects 0.000 claims abstract description 16
- 230000003115 biocidal effect Effects 0.000 claims abstract description 14
- -1 trioctyl Chemical compound 0.000 claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 31
- 239000002184 metal Substances 0.000 claims description 31
- 239000002253 acid Substances 0.000 claims description 30
- 238000011282 treatment Methods 0.000 claims description 19
- 229920000642 polymer Polymers 0.000 claims description 17
- 239000002270 dispersing agent Substances 0.000 claims description 12
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 10
- 239000000872 buffer Substances 0.000 claims description 9
- 239000011575 calcium Substances 0.000 claims description 9
- CIEZZGWIJBXOTE-UHFFFAOYSA-N 2-[bis(carboxymethyl)amino]propanoic acid Chemical compound OC(=O)C(C)N(CC(O)=O)CC(O)=O CIEZZGWIJBXOTE-UHFFFAOYSA-N 0.000 claims description 7
- PJWWRFATQTVXHA-UHFFFAOYSA-N Cyclohexylaminopropanesulfonic acid Chemical compound OS(=O)(=O)CCCNC1CCCCC1 PJWWRFATQTVXHA-UHFFFAOYSA-N 0.000 claims description 7
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 7
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 claims description 6
- 235000001014 amino acid Nutrition 0.000 claims description 6
- 150000001413 amino acids Chemical class 0.000 claims description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 6
- 125000000524 functional group Chemical group 0.000 claims description 6
- 150000007523 nucleic acids Chemical class 0.000 claims description 6
- 108020004707 nucleic acids Proteins 0.000 claims description 6
- 102000039446 nucleic acids Human genes 0.000 claims description 6
- 150000002978 peroxides Chemical class 0.000 claims description 6
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 6
- QZTKDVCDBIDYMD-UHFFFAOYSA-N 2,2'-[(2-amino-2-oxoethyl)imino]diacetic acid Chemical compound NC(=O)CN(CC(O)=O)CC(O)=O QZTKDVCDBIDYMD-UHFFFAOYSA-N 0.000 claims description 5
- IHPYMWDTONKSCO-UHFFFAOYSA-N 2,2'-piperazine-1,4-diylbisethanesulfonic acid Chemical compound OS(=O)(=O)CCN1CCN(CCS(O)(=O)=O)CC1 IHPYMWDTONKSCO-UHFFFAOYSA-N 0.000 claims description 5
- UXFQFBNBSPQBJW-UHFFFAOYSA-N 2-amino-2-methylpropane-1,3-diol Chemical compound OCC(N)(C)CO UXFQFBNBSPQBJW-UHFFFAOYSA-N 0.000 claims description 5
- DVLFYONBTKHTER-UHFFFAOYSA-N 3-(N-morpholino)propanesulfonic acid Chemical compound OS(=O)(=O)CCCN1CCOCC1 DVLFYONBTKHTER-UHFFFAOYSA-N 0.000 claims description 5
- NUFBIAUZAMHTSP-UHFFFAOYSA-N 3-(n-morpholino)-2-hydroxypropanesulfonic acid Chemical compound OS(=O)(=O)CC(O)CN1CCOCC1 NUFBIAUZAMHTSP-UHFFFAOYSA-N 0.000 claims description 5
- VTOWJTPBPWTSMK-UHFFFAOYSA-N 4-morpholin-4-ylbutane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCCN1CCOCC1 VTOWJTPBPWTSMK-UHFFFAOYSA-N 0.000 claims description 5
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 5
- OWXMKDGYPWMGEB-UHFFFAOYSA-N HEPPS Chemical compound OCCN1CCN(CCCS(O)(=O)=O)CC1 OWXMKDGYPWMGEB-UHFFFAOYSA-N 0.000 claims description 5
- DBXNUXBLKRLWFA-UHFFFAOYSA-N N-(2-acetamido)-2-aminoethanesulfonic acid Chemical group NC(=O)CNCCS(O)(=O)=O DBXNUXBLKRLWFA-UHFFFAOYSA-N 0.000 claims description 5
- MKWKNSIESPFAQN-UHFFFAOYSA-N N-cyclohexyl-2-aminoethanesulfonic acid Chemical compound OS(=O)(=O)CCNC1CCCCC1 MKWKNSIESPFAQN-UHFFFAOYSA-N 0.000 claims description 5
- JOCBASBOOFNAJA-UHFFFAOYSA-N N-tris(hydroxymethyl)methyl-2-aminoethanesulfonic acid Chemical compound OCC(CO)(CO)NCCS(O)(=O)=O JOCBASBOOFNAJA-UHFFFAOYSA-N 0.000 claims description 5
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 5
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 5
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 5
- 229910052791 calcium Inorganic materials 0.000 claims description 5
- 230000005764 inhibitory process Effects 0.000 claims description 5
- 108090000765 processed proteins & peptides Proteins 0.000 claims description 5
- 229910052723 transition metal Inorganic materials 0.000 claims description 5
- 150000003624 transition metals Chemical class 0.000 claims description 5
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 claims description 5
- BBVIDBNAYOIXOE-UHFFFAOYSA-N 1,2,4-oxadiazole Chemical compound C=1N=CON=1 BBVIDBNAYOIXOE-UHFFFAOYSA-N 0.000 claims description 4
- YGTAZGSLCXNBQL-UHFFFAOYSA-N 1,2,4-thiadiazole Chemical compound C=1N=CSN=1 YGTAZGSLCXNBQL-UHFFFAOYSA-N 0.000 claims description 4
- UDGKZGLPXCRRAM-UHFFFAOYSA-N 1,2,5-thiadiazole Chemical compound C=1C=NSN=1 UDGKZGLPXCRRAM-UHFFFAOYSA-N 0.000 claims description 4
- CIISBYKBBMFLEZ-UHFFFAOYSA-N 1,2-oxazolidine Chemical compound C1CNOC1 CIISBYKBBMFLEZ-UHFFFAOYSA-N 0.000 claims description 4
- FKASFBLJDCHBNZ-UHFFFAOYSA-N 1,3,4-oxadiazole Chemical compound C1=NN=CO1 FKASFBLJDCHBNZ-UHFFFAOYSA-N 0.000 claims description 4
- MBIZXFATKUQOOA-UHFFFAOYSA-N 1,3,4-thiadiazole Chemical compound C1=NN=CS1 MBIZXFATKUQOOA-UHFFFAOYSA-N 0.000 claims description 4
- LEVVMZZBTOYKSC-UHFFFAOYSA-N 1-amino-4-hydroxybutane-2-sulfonic acid Chemical compound NCC(S(O)(=O)=O)CCO LEVVMZZBTOYKSC-UHFFFAOYSA-N 0.000 claims description 4
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 claims description 4
- FJRPOHLDJUJARI-UHFFFAOYSA-N 2,3-dihydro-1,2-oxazole Chemical compound C1NOC=C1 FJRPOHLDJUJARI-UHFFFAOYSA-N 0.000 claims description 4
- KEQTWHPMSVAFDA-UHFFFAOYSA-N 2,3-dihydro-1h-pyrazole Chemical compound C1NNC=C1 KEQTWHPMSVAFDA-UHFFFAOYSA-N 0.000 claims description 4
- NHZLLKNRTDIFAD-UHFFFAOYSA-N 2,5-dihydro-1,3-oxazole Chemical compound C1OCN=C1 NHZLLKNRTDIFAD-UHFFFAOYSA-N 0.000 claims description 4
- TYFSYONDMQEGJK-UHFFFAOYSA-N 2-(2,2-dihydroxyethylamino)acetic acid Chemical compound OC(O)CNCC(O)=O TYFSYONDMQEGJK-UHFFFAOYSA-N 0.000 claims description 4
- SXGZJKUKBWWHRA-UHFFFAOYSA-N 2-(N-morpholiniumyl)ethanesulfonate Chemical compound [O-]S(=O)(=O)CC[NH+]1CCOCC1 SXGZJKUKBWWHRA-UHFFFAOYSA-N 0.000 claims description 4
- IZXIZTKNFFYFOF-UHFFFAOYSA-N 2-Oxazolidone Chemical compound O=C1NCCO1 IZXIZTKNFFYFOF-UHFFFAOYSA-N 0.000 claims description 4
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 claims description 4
- VKZRWSNIWNFCIQ-UHFFFAOYSA-N 2-[2-(1,2-dicarboxyethylamino)ethylamino]butanedioic acid Chemical compound OC(=O)CC(C(O)=O)NCCNC(C(O)=O)CC(O)=O VKZRWSNIWNFCIQ-UHFFFAOYSA-N 0.000 claims description 4
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 claims description 4
- ACERFIHBIWMFOR-UHFFFAOYSA-N 2-hydroxy-3-[(1-hydroxy-2-methylpropan-2-yl)azaniumyl]propane-1-sulfonate Chemical compound OCC(C)(C)NCC(O)CS(O)(=O)=O ACERFIHBIWMFOR-UHFFFAOYSA-N 0.000 claims description 4
- HSXUNHYXJWDLDK-UHFFFAOYSA-N 2-hydroxypropane-1-sulfonic acid Chemical compound CC(O)CS(O)(=O)=O HSXUNHYXJWDLDK-UHFFFAOYSA-N 0.000 claims description 4
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 claims description 4
- INEWUCPYEUEQTN-UHFFFAOYSA-N 3-(cyclohexylamino)-2-hydroxy-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(O)CNC1CCCCC1 INEWUCPYEUEQTN-UHFFFAOYSA-N 0.000 claims description 4
- RZQXOGQSPBYUKH-UHFFFAOYSA-N 3-[[1,3-dihydroxy-2-(hydroxymethyl)propan-2-yl]azaniumyl]-2-hydroxypropane-1-sulfonate Chemical compound OCC(CO)(CO)NCC(O)CS(O)(=O)=O RZQXOGQSPBYUKH-UHFFFAOYSA-N 0.000 claims description 4
- XCBLFURAFHFFJF-UHFFFAOYSA-N 3-[bis(2-hydroxyethyl)azaniumyl]-2-hydroxypropane-1-sulfonate Chemical compound OCCN(CCO)CC(O)CS(O)(=O)=O XCBLFURAFHFFJF-UHFFFAOYSA-N 0.000 claims description 4
- DEEPVUMBLJVOEL-UHFFFAOYSA-N 3H-pyrazole Chemical compound C1C=CN=N1 DEEPVUMBLJVOEL-UHFFFAOYSA-N 0.000 claims description 4
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- LOJNFONOHINEFI-UHFFFAOYSA-N 4-[4-(2-hydroxyethyl)piperazin-1-yl]butane-1-sulfonic acid Chemical compound OCCN1CCN(CCCCS(O)(=O)=O)CC1 LOJNFONOHINEFI-UHFFFAOYSA-N 0.000 claims description 4
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 claims description 4
- UDMBCSSLTHHNCD-UHFFFAOYSA-N Coenzym Q(11) Natural products C1=NC=2C(N)=NC=NC=2N1C1OC(COP(O)(O)=O)C(O)C1O UDMBCSSLTHHNCD-UHFFFAOYSA-N 0.000 claims description 4
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- WRYCSMQKUKOKBP-UHFFFAOYSA-N Imidazolidine Chemical compound C1CNCN1 WRYCSMQKUKOKBP-UHFFFAOYSA-N 0.000 claims description 4
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- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 claims description 4
- YNLCVAQJIKOXER-UHFFFAOYSA-N N-[tris(hydroxymethyl)methyl]-3-aminopropanesulfonic acid Chemical compound OCC(CO)(CO)NCCCS(O)(=O)=O YNLCVAQJIKOXER-UHFFFAOYSA-N 0.000 claims description 4
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Classifications
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- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
- C02F1/683—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water by addition of complex-forming compounds
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
- C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
- C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
- C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
- C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
- C02F5/12—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing nitrogen
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
- C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
- C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
- C02F5/14—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing phosphorus
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
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- C—CHEMISTRY; METALLURGY
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Abstract
减少或消除N‑杂环的方法,所述方法向水性冷却系统中提供一种或多种环境友好的螯合剂(EBC),所述水性冷却系统在卤化或非卤化氧化剂存在下具有至少一种N‑杂环。减少或消除AOX的方法,所述方法向水性冷却系统中提供一种或多种环境友好的螯合剂(EBC),所述水性冷却系统在卤化杀生物剂存在下具有至少一种含AOX的物质。
Description
相关申请的交叉引用
本申请要求2018年3月8日提交的美国临时专利申请序列号62/640,163的优先权权益。
技术领域
本发明涉及减少或消除N-杂环和/或AOX (可吸附的有机卤化物)的方法和组合物,且更特定地,涉及从工业冷却系统中减少或消除唑类和/或AOX,同时保持适当的腐蚀防护。
背景技术
工业系统使用水作为加热和冷却应用的介质。这些再循环系统可以是封闭的或对环境开放的。开放式再循环冷却系统包括利用金属管道、冷凝器和换热器的各种特征。所选择的冶金可以从非常贵的金属(如钛)或多种类型的不锈钢到不太贵的金属(如低碳钢)和各种黄色金属的合金(如铜、ADM和铜镍)变化。
水和其中包含的各种盐离子自然地对许多类型的冶金有腐蚀性。氯化物和硫酸盐与溶解氧结合可导致在金属表面上形成全面或局部的腐蚀原电池。在开放式再循环冷却系统中,当水通过冷却塔时,水变得浓缩,进一步增加了腐蚀性,如通过已知的指数测量的,所述指数如Larson-Scoll指数,其将腐蚀速率与氯化物和硫酸盐的浓度相关联。由于操作条件,开放式再循环工业系统可携载并促进微生物生长。这些微生物可通过形成生物膜(其呼吸废物产生氯化物和硫酸盐)或控制其种群所需的处理来提高浓缩水的腐蚀性。
微生物的常见且成本有效的处理是使用氧化杀生物剂。氧化杀生物剂可分为两类:卤化的那些(氯和溴种类)和非卤化的那些(二氧化氯、无机过氧化物、有机过氧化物和臭氧)。卤化氧化剂可与有机材料或工业化学处理剂反应,以控制结垢和腐蚀,产生可吸收的有机卤化物(AOX)。所有氧化剂都增加水的腐蚀性,因为它们具有足够高的氧化电位以避免传统的与氧的阴极腐蚀反应,并且从贱金属接受电子,加速全面和局部腐蚀。
由于盐浓度、微生物生长和氧化剂的使用,工业系统经常用腐蚀抑制剂处理。沉淀盐是铁基冶金的常用方法,其以分子和聚合物处理来利用盐过饱和和抑制的具体控制。所用的典型阴极抑制盐是碳酸钙和磷酸钙。表面膜容易形成并通过相应的阻垢剂控制。这些钝化膜的厚度处于微米级,并且不被认为是积垢或结垢,因为它们最低限度地干扰传热过程。当水中的条件使得碳酸钙和磷酸盐不足够有效时,可以以低剂量添加各种金属以补充或作为替代物。典型的金属包括各种过渡金属、p-区金属和f-区金属:Cr、Mo、W、Ti、Mn、Al、As、Sn、Zn、La、Eu等。
或者,以p-区元素为特点的有机基分子和聚合物已成为铁冶金和铜冶金两者的常见腐蚀抑制剂。以氮原子为特点的那些已显示出对于铁和铜基表面的适用性。具体地,分子或聚合物以氮杂环为特点。处理黄色金属表面的工业标准是使用被取代的唑类,尤其是苯并三唑家族。
不幸地,许多N-杂环(如唑类)的特点是不利的生物可降解性和毒性分布。这可以在苯并三唑家族中看到,其中(由于这类分子的生物可降解性和分子稳定性差)它们逃脱废水处理过程并在河流和湖泊中生物累积。这通过相关的水生毒性分布进一步加剧。存在减少或消除使用N-杂环作为工业化学处理剂的需要,以有利于“更绿色的”替代方案,同时提供等效或改善的铁和铜基冶金的腐蚀抑制。在铜的情况下,还必须提供通过螯合和沉淀化学反应来控制铜排放的能力。
浓度高于0.5 ppm残余游离卤化物的卤化杀生物剂的常见用途是使与军团菌相关的风险最小化,其也引起对AOX日益增长的关注。进料卤化杀生物剂的工业系统的N-杂环物质将容易原位反应。添加到N-杂环的卤素可以平衡存在,其中卤素作为瞬时物质存在,或者永久地共价连接到N-杂环,使得工业系统中AOX贡献的任一方式都增加了一定量。唑类抑制剂通常遇到如下问题,其中苯并三唑或甲苯基三唑已经显示出在工业冷却条件下氯化或溴化,导致抑制剂损失、产生恶臭和AOX增加。因此,AOX物质是固有有毒的,如在阻燃剂工业中所见,并且更多的健康和环境法规希望最小化或减少AOX的量。
使N-杂环与卤化杀生物剂的反应性最小化的常见实践是在具体位点并入卤素,或使其以新分子在热力学上或空间上阻断原位反应的方式增进N-杂环。当卤素被加到母体分子时,这种非原位方法不幸地导致固有AOX物质的产生,并且提供改善的腐蚀性能。这是在开发氯-和溴-甲苯基三唑的情况下所看到的。
存在开发新的腐蚀控制程序和抑制剂以减少或消除来自工业处理程序的AOX的需要。因此,由于N-杂环物质(如唑类)的生物降解差和一类可具有有力毒性分布的分子的相应生物积累,存在减少或最小化来自工业水处理程序的N-杂环物质(如唑类)的需要。类似地,存在减少或最小化在卤化氧化条件下由于原位瞬时卤代N-杂环的形成或非原位卤代N-杂环的使用而贡献AOX物质的工业腐蚀处理程序的需要。因此,希望开发“更绿色的”抑制剂和整体腐蚀程序,其实现前述成果并以相同或改善的性能存在。
发明内容
下文一般性描述的公开技术用以从工业冷却系统中减少或消除唑类(N-杂环)或AOX。
根据所公开技术的一个方面,提供了减少或消除N-杂环的方法。所述方法包括向水性冷却系统中提供一种或多种环境友好的螯合剂(EBC),所述水性冷却系统在卤化或非卤化氧化剂存在下包含至少一种N-杂环。
在一些实施方案中,环境友好的螯合剂(EBC)包括(1)氨基多羧酸,(2)聚氨基酸或核酸,(3)缓冲剂,或(4)氨基亚烷基膦酸和它们相应的水解产物的混合物。
在一些实施方案中,氨基多羧酸包括具有-COOH和/或-PO3的被取代的氨基酸或其组合。在一些实施方案中,所述氨基多羧酸包含一个或多个氨基官能团,其中所述氨基多羧酸是乙二胺四乙酸、N-(2-羟基乙基)乙二胺三乙酸、二亚乙基三胺五乙酸、次氮基三乙酸、甲基甘氨酸二乙酸(MGDA)、N,N-二羧甲基谷氨酸四钠盐、(2R,3R,4S,5R,6R)-3,4,6-三羟基-5-磺基氧基噁烷-2-羧酸或乙二胺-N,N’-二琥珀酸。在一些实施方案中,所述聚氨基酸是聚天冬氨酸或包含多于一个氨基酸的肽。
在一些实施方案中,缓冲剂选自N-(2-乙酰氨基)-2-氨基乙磺酸、N-(2-乙酰氨基)亚氨基二乙酸、单磷酸腺苷、2-氨基-2-甲基丙烷-1,3-二醇、2-羟基-3-[(2-羟基-1,1-二甲基乙基)氨基]-1-丙磺酸、N,N-双(2-羟基乙基)-2-氨基乙磺酸、N,N-二羟乙基甘氨酸(Bicine)、Bis-Tris、1,3-双(三(羟基甲基)甲基氨基)丙烷、烷基苯磺酸钙、N-环己基-3-氨基丙磺酸、N-环己基-2-羟基-3-氨基丙磺酸、2-(环己基氨基)乙磺酸、3-(双(2-羟基乙基)氨基)-2-羟基丙烷-1-磺酸、3-[4-(2-羟基乙基)-1-哌嗪基]丙磺酸、4-(2-羟基乙基)-1-哌嗪丙磺酸、4-(4-(2-羟基乙基)哌嗪-1-基)丁烷-1-磺酸、4-(2-羟基乙基)-1-哌嗪乙磺酸、2-羟基-3-(4-(2-羟基乙基)哌嗪-1-基)丙烷-1-磺酸、2-(N-吗啉代)乙磺酸、4-吗啉代丁烷-1-磺酸、3-(N-吗啉代)丙磺酸、3-吗啉代-2-羟基丙磺酸、哌嗪-N,N'-双(2-乙磺酸)、哌嗪-1,4-双(2-羟基丙磺酸、4-((1,3-二羟基-2-(羟基甲基)丙-2-基)氨基)丁烷-1-磺酸、3-((1,3-二羟基-2-(羟基甲基)丙-2-基)氨基)丙烷-1-磺酸、N-[三(羟基甲基)甲基]-3-氨基-2-羟基丙磺酸、三乙醇胺、N-三(羟基甲基)甲基-2-氨基乙磺酸、曲辛(tricine)、三(羟基甲基)氨基甲烷或其被取代的或官能化的化合物。
在一些实施方案中,氨基亚烷基膦酸由式(I)表示
, (I)
其中R1为-CH2-R3、-(CH2)y-NR2或-(CH2)y-NR-(CH2)y-NR2;并且其中R为-(CH2)x-R3;R2为-(CH2)xR3;并且R3为-PO3或-OH,其中R3相同或不同,并且其中y在1和4之间,且x在1和4之间。
在一些实施方案中,环境友好的螯合剂可与金属阳离子盐一起使用,所述金属阳离子盐包含过渡金属、p-区金属、p-区半金属、SiO2、硅酸盐和金属硅酸盐、镧系元素和锕系元素。
在一些实施方案中,所述至少一种N-杂环为唑、环胺、内酰胺、磺内酰胺、吡啶、氢-吡啶、吡啶酮、吡嗪、嘧啶、三嗪或氮杂。在一些实施方案中,所述唑是咪唑烷酮、噁唑烷酮、乙内酰脲、脲唑、噁唑烷、咪唑烷、异噁唑烷、吡唑烷、吡咯啉、马来酰亚胺、吡咯啉-2-酮、2-异噁唑啉、4-异噁唑啉、2-噁唑啉、3-噁唑啉、2-咪唑啉、吡咯、噻唑啉、吡唑啉、3-吡唑啉、3H-吡唑、咪唑、吡唑、1,2,3-三唑、1,2,4-三唑、四唑、五唑、噁唑、异噁唑、1,2,3-噁二唑、1,2,4-噁二唑、呋咱、1,3,4-噁二唑、噻唑、异噻唑、1,2,4-噻二唑、1,2,5-噻二唑、1,3,4-噻二唑或其被取代的或官能化的化合物。
在一些实施方案中,环境友好的螯合剂(EBC)以大于所述至少一种N-杂环的浓度的浓度添加。在一些实施方案中,所述至少一种N-杂环的浓度小于1.0 ppm。在一些实施方案中,所述方法使N-杂环含量降低约0.1%至100%。在一些实施方案中,所述非卤化氧化剂包括ClO2、无机过氧化物、有机过氧化物或臭氧。
在所公开技术的又一方面,提供了减少或消除AOX的方法。所述方法包括向水性冷却系统中提供一种或多种环境友好的螯合剂(EBC),所述水性冷却系统在卤化杀生物剂存在下包含至少一种含AOX的物质。
在一些实施方案中,所述环境友好的螯合剂(EBC)包括(1)氨基多羧酸,(2)聚氨基酸或核酸,(3)缓冲剂,或(4)氨基亚烷基膦酸和它们相应的水解产物的混合物。
在一些实施方案中,所述氨基多羧酸包括具有-COOH和/或-PO3的被取代的氨基酸或其组合。
在一些实施方案中,所述氨基多羧酸包含一个或多个氨基官能团,其中所述氨基多羧酸是乙二胺四乙酸、N-(2-羟基乙基)乙二胺三乙酸、二亚乙基三胺五乙酸、次氮基三乙酸、甲基甘氨酸二乙酸、N,N-二羧甲基谷氨酸四钠盐、(2R,3R,4S,5R,6R)-3,4,6-三羟基-5-磺基氧基噁烷-2-羧酸、乙二胺-N,N’-二琥珀酸或其被取代的或官能化的化合物。在一些实施方案中,所述聚氨基酸是聚天冬氨酸或包含多于一个氨基酸的肽。
在一些实施方案中,缓冲剂选自N-(2-乙酰氨基)-2-氨基乙磺酸、N-(2-乙酰氨基)亚氨基二乙酸、单磷酸腺苷、2-氨基-2-甲基丙烷-1,3-二醇、2-羟基-3-[(2-羟基-1,1-二甲基乙基)氨基]-1-丙磺酸、N,N-双(2-羟基乙基)-2-氨基乙磺酸、N,N-二羟乙基甘氨酸、Bis-Tris、1,3-双(三(羟基甲基)甲基氨基)丙烷、烷基苯磺酸钙、N-环己基-3-氨基丙磺酸、N-环己基-2-羟基-3-氨基丙磺酸、2-(环己基氨基)乙磺酸、3-(双(2-羟基乙基)氨基)-2-羟基丙烷-1-磺酸、3-[4-(2-羟基乙基)-1-哌嗪基]丙磺酸、4-(2-羟基乙基)-1-哌嗪丙磺酸、4-(4-(2-羟基乙基)哌嗪-1-基)丁烷-1-磺酸、4-(2-羟基乙基)-1-哌嗪乙磺酸)、2-羟基-3-(4-(2-羟基乙基)哌嗪-1-基)丙烷-1-磺酸、2-(N-吗啉代)乙磺酸、4-吗啉代丁烷-1-磺酸、3-(N-吗啉代)丙磺酸、3-吗啉代-2-羟基丙磺酸、哌嗪-N,N'-双(2-乙磺酸)、哌嗪-1,4-双(2-羟基丙磺酸、4-((1,3-二羟基-2-(羟基甲基)丙-2-基)氨基)丁烷-1-磺酸、3-((1,3-二羟基-2-(羟基甲基)丙-2-基)氨基)丙烷-1-磺酸、N-[三(羟基甲基)甲基]-3-氨基-2-羟基丙磺酸、三乙醇胺、N-三(羟基甲基)甲基-2-氨基乙磺酸、曲辛、三(羟基甲基)氨基甲烷或其被取代的或官能化的化合物。
在一些实施方案中,所述氨基亚烷基膦酸由式(II)表示
, (II)
其中R4为-CH2-R6、-(CH2)y-NR5或-(CH2)y-NR'-(CH2)y-NR5;R5为-(CH2)xR6;并且其中R'为-(CH2)x-R6;且R6为-PO3或-OH,其中R6相同或不同,并且其中y在1和4之间,且x在1和4之间。
在一些实施方案中,所述至少一种含AOX的物质包含(1)固有含AOX的分子,或(2)瞬时含AOX的分子。
在一些实施方案中,所述固有含AOX的分子是在卤化或非卤化条件下的固有AOX唑。在一些实施方案中,所述卤化条件提供了卤化杀生物剂,所述卤化杀生物剂包含漂白剂、氯、溴、稳定化的卤素或卤代胺。
在一些实施方案中,所述方法使AOX贡献降低0.1%至100%。在一些实施方案中,所述环境友好的螯合剂可与金属阳离子盐一起使用,所述金属阳离子盐包含过渡金属、p-区金属、p-区半金属、SiO2、硅酸盐和金属硅酸盐、镧系元素和锕系元素。
在所公开技术的又一方面,提供了从水性冷却系统中减少或消除N-杂环或AOX的组合物。所述组合物包含(i)分散剂聚合物;(ii)杀生物剂;(iii)pH调节物质;和(iv)环境友好的螯合剂,其中所述环境友好的螯合剂包含:(1)氨基多羧酸,(2)聚氨基酸或核酸,(3)缓冲剂,或(4)氨基亚烷基膦酸和相应水解产物的混合物。
在一些实施方案中,从水性冷却系统中减少或消除N-杂环或AOX的组合物还包含(vi)盐抑制剂、金属抑制剂或两者。在一些实施方案中,从水性冷却系统中减少或消除N-杂环或AOX的组合物还包含(vii)至少一种N-杂环。
在一些实施方案中,所述至少一种N-杂环为唑、环胺、内酰胺、磺内酰胺、吡啶、氢-吡啶、吡啶酮、吡嗪、嘧啶、三嗪或氮杂。在一些实施方案中,所述唑是咪唑烷酮、噁唑烷酮、乙内酰脲、脲唑、噁唑烷、咪唑烷、异噁唑烷、吡唑烷、吡咯啉、马来酰亚胺、吡咯啉-2-酮、2-异噁唑啉、4-异噁唑啉、2-噁唑啉、3-噁唑啉、2-咪唑啉、吡咯、噻唑啉、吡唑啉、3-吡唑啉、3H-吡唑、咪唑、吡唑、1,2,3-三唑、1,2,4-三唑、四唑、五唑、噁唑、异噁唑、1,2,3-噁二唑、1,2,4-噁二唑、呋咱、1,3,4-噁二唑、噻唑、异噻唑、1,2,4-噻二唑、1,2,5-噻二唑、1,3,4-噻二唑或其被取代的或官能化的化合物。
具体实施方式
现在将在以下详细描述中描述本发明,其中详细描述了优选的实施方案以使得能够实践本发明。尽管参考这些具体的优选实施方案描述了本发明,但是应当理解,本发明并不限于这些优选的实施方案。相反,本发明包括许多替代、修改和等同方案,如从下面的详细描述的考虑将变得显而易见的。
本公开提供了利用环境友好的螯合剂(EBC)结合低水平的唑类(或N-杂环)的方法,所述方法允许减少或消除N-杂环和/或AOX。在一些实施方案中,EBC、浓缩的工业水、分散剂和抑盐聚合物的使用提供铁和铜合金上的必要表面钝化。
膦酸盐是用于工业冷却水系统的常见水处理技术。它们可以抑制矿物结垢,以及帮助在铁和铜合金上形成钝化膜。然而,许多膦酸盐可与钙或钙矿物盐形成不溶性盐,限制了它们在工业应用中的广泛使用。众所周知,膦酸盐将水解,至少裂解-PO3官能团,这将o-PO4(正磷酸盐)加到大体积工业用水中。额外的o-PO4可增加Ca/PO4的结垢潜力或有助于形成钝化膜。一旦膦酸盐返原成o-PO4,则剩余的物质不再是有效的阻垢剂。
氧化杀生物剂(例如HOCl/OCl-、HOBr/OBr-、ClO2、H2O2、O3等)加速膦酸盐水解反应,形成不再是有效阻垢剂的降解产物。令人惊奇地发现,膦酸盐返原(reversion)物质实际上是EBC,其可用于从工业冷却系统中减少或消除N-杂环和/或AOX。已经利用广泛的膦酸盐形成返原EBC。形成的这种返原EBC的实例包括(但不限于)羟基亚乙基-1,1-二亚膦酸盐(HEDP)、氨基-三-(亚甲基膦酸盐)(AMP)和1,3-丙二氨基四亚甲基膦酸(PDTMP)。
另外,令人惊奇地发现,存在几类环境友好的螯合剂(EBC),其可在氧化条件下使用,以从工业冷却系统中减少或除去N-杂环(或唑类)或AOX,同时改善整个冷却程序的毒性或生物降解性分布。膦酸盐返原产生的分解产物形成与唑类协同相互作用的复合物以提供电化防护,以及在铁和铜冶金上的必要钝化膜。因此,EBC允许减少或消除唑类。通过减少或消除这些已知的工业污染物(如唑类),所公开的技术将降低AOX的贡献。
所公开的技术是趋向于通过减少或消除这些已知的工业污染物(如唑类)来开发“绿色的”冷却程序的步骤。本发明另外降低了AOX的贡献,或存在的可吸附的有机卤素(AOX)的总量。低水平的唑类和EBC的组合令人惊奇地在提高的氧化条件下提供了改善的腐蚀速率,所述提高的氧化条件是控制微生物生长的标准。
在所公开技术的一个方面,大体提供了减少或消除N-杂环的方法。所述方法包括向水性冷却系统中提供一种或多种环境友好的螯合剂(EBC),其中所述水性冷却系统在卤化或非卤化氧化剂存在下包含至少一种N-杂环。N-杂环是指在环内含有氮的任何环状结构。
本公开的水性冷却系统包括工业冷却水系统、再循环水、废水、固体分离前的清洗水等。在一些实施方案中,水性系统与金属表面,特别是铜和铁冶金(包括它们的合金)接触。在一些实施方案中,替代表面可包括塑料、陶瓷或复合材料。在一些实施方案中,所述复合材料可以是塑料、陶瓷或无机材料(如碳基同素异形体)的组合。
环境友好的螯合剂(EBC)与水性冷却系统中存在的水、分散剂和抑盐聚合物一起作用,以允许在工业表面上形成改善的磷酸钙钝化膜。本文所用的EBC满足Good's缓冲剂的基本要求,如缓冲能力,它们是生物安全的、廉价的并且具有与金属配位的能力。
环境友好的螯合剂(EBC)可以选自(1)氨基多羧酸,(2)聚氨基酸或核酸,(3)缓冲剂,或(4)氨基亚烷基膦酸和它们相应的水解产物的混合物。
在一些实施方案中,环境友好的螯合剂(EBC)是氨基多羧酸。通过用一个或多个羧酸官能团适当地取代氨基有机分子,将产生具有螯合金属的能力的氨基多羧酸。例如,这种取代方法包括但不限于米歇尔加成、使用氯代亚烷基羧酸衍生物(如氯乙酸)或传统使用甲醛和氰化钠。或者,在一些实施方案中,可使用与甲醛和亚磷酸的曼尼希反应来替代易于与卤化杀生物剂反应的EBC。
在一些实施方案中,氨基多羧酸包括具有-COOH和/或-PO3的被取代的氨基酸。在一些实施方案中,氨基多羧酸包含一个或多个氨基官能团,其中所述氨基多羧酸是乙二胺四乙酸、N-(2-羟基乙基)乙二胺三乙酸、二亚乙基三胺五乙酸、次氮基三乙酸、甲基甘氨酸二乙酸(MGDA)、N,N-二羧甲基谷氨酸四钠盐、(2R,3R,4S,5R,6R)-3,4,6-三羟基-5-磺基氧基噁烷-2-羧酸或乙二胺-N,N’-二琥珀酸。
在其他实施方案中,环境友好的螯合剂是聚氨基酸或核酸。本公开的聚氨基酸或肽可以包括氨基酸基团的均聚物,例如聚天冬氨酸,或由多于一种氨基酸组成,例如肽,其是人工合成的并且表现得像适体,或从天然和可持续来源分离。在一些实施方案中,聚核酸由形成DNA或RNA型适体的各种碱基对组成。
在其他实施方案中,环境友好的螯合剂是缓冲剂,尤其是Good's缓冲剂。在一些实施方案中,Good's缓冲剂或适当官能化的Good's缓冲剂可选自以下化合物家族:吗啉、哌嗪、双(2-羟基乙基)胺、TRIS、环己基氨基、乙酰氨基和丙醇。应当理解,Good's缓冲剂的适当官能化包括:烷基羧酸的加成(类似于用于构建氨基多羧酸的合成途径),烷基磺酸、烷基膦酸或膦酸的加成,以及官能化环氧化物部分的开环。
在一些实施方案中,适当官能化的Goods缓冲剂包括但不限于N-(2-乙酰氨基)-2-氨基乙磺酸(ACES)、N-(2-乙酰氨基)亚氨基二乙酸(ADA)、单磷酸腺苷(AMP)、2-氨基-2-甲基丙烷-1,3-二醇(AMPD)、2-羟基-3-[(2-羟基-1,1-二甲基乙基)氨基]-1-丙磺酸(AMPSO)、N,N-双(2-羟基乙基)-2-氨基乙磺酸(BES)、N,N-二羟乙基甘氨酸、Bis-Tris、1,3-双(三(羟基甲基)甲基氨基)丙烷(BTP)、烷基苯磺酸钙(CABS)、N-环己基-3-氨基丙磺酸(CAPS)、N-环己基-2-羟基-3-氨基丙磺酸(CAPSO)、2-(环己基氨基)乙磺酸(CHES)、3-(双(2-羟基乙基)氨基)-2-羟基丙烷-1-磺酸(DIPSO)、3-[4-(2-羟基乙基)-1-哌嗪基]丙磺酸(EPPS)、4-(2-羟基乙基)-1-哌嗪丙磺酸(HEPPS)、4-(4-(2-羟基乙基)哌嗪-1-基)丁烷-1-磺酸(HEPBS)、(4-(2-羟基乙基)-1-哌嗪乙磺酸)(HEPES)、2-羟基-3-(4-(2-羟基乙基)哌嗪-1-基)丙烷-1-磺酸(HEPPSO)、2-(N-吗啉代)乙磺酸(MES)、4-吗啉代丁烷-1-磺酸(MOBS)、3-(N-吗啉代)丙磺酸(MOPS)、3-吗啉代-2-羟基丙磺酸(MOPSO)、哌嗪-N,N'-双(2-乙磺酸)(PIPES)、哌嗪-1,4-双(2-羟基丙磺酸(POPSO)、4-((1,3-二羟基-2-(羟基甲基)丙烷-2-基)氨基)丁烷-1-磺酸(TABS)、3-((1,3-二羟基-2-(羟基甲基)丙烷-2-基)氨基)丙烷-1-磺酸(TAPS)、N-[三(羟基甲基)甲基]-3-氨基-2-羟基丙磺酸(TAPSO)、三乙醇胺(TEA)、N-三(羟基甲基)甲基-2-氨基乙磺酸(TES)、曲辛和三(羟基甲基)氨基甲烷(Tris)。
在其他实施方案中,环境友好的螯合剂(EBC)是氨基亚烷基膦酸,或氨基亚烷基膦酸和它们相应的水解产物的混合物。在一些实施方案中,这些氨基亚烷基膦酸由式(I)表示
(I)
其中R1为-CH2-R3、-(CH2)y-NR2或-(CH2)y-NR-(CH2)y-NR2;R2为-(CH2)xR3;R为-(CH2)x-R3;且R3为-PO3或-OH,其中R3相同或不同,并且其中x和y均包含一至四个碳原子。这些氨基亚烷基膦酸与水解化合物混合,所述水解化合物包含至少一个或多个H2-N-R1、H2-N-R、R-NH-R1、R-NH-R,其中R是-(CH2)x-R3,且R1为-CH2-R3、-(CH2)y-NR2 或-(CH2)y-NR-(CH2)y-NR2,且R2为-(CH2)xR3;并且其中x和y均包含一至四个碳原子。
在一些实施方案中,环境友好的螯合剂可与金属阳离子盐一起使用,所述金属阳离子盐包含Ti、Mo、Mn、W、Zn、Al、SiO2、As、Sn、La、Eu或其组合。
在一些实施方案中,环境友好的螯合剂(EBC)以大于N-杂环浓度的浓度添加。在一些实施方案中,N-杂环的浓度小于1.0 ppm。在其他实施方案中,N-杂环的浓度小于0.5ppm,并且在其他实施方案中,N-杂环的浓度小于0.25 ppm。
在一些实施方案中,本发明方法将N-杂环含量降低约0.1%至100%。在其他实施方案中,N-杂环含量降低约10-90%,在其他实施方案中,N-杂环含量降低约25-75%,并且在其他实施方案中,N-杂环含量降低约40-60%。
在一些实施方案中,N-杂环是唑。唑是含有氮原子的五元杂环化合物。本领域技术人员应当理解,本技术的唑可以包括任何类型的取代或官能化的唑分子。
在一些实施方案中,其中N-杂环是唑,所述唑是咪唑烷酮、噁唑烷酮、乙内酰脲、脲唑、噁唑烷、咪唑烷、异噁唑烷、吡唑烷、吡咯啉、马来酰亚胺、吡咯啉-2-酮、2-异噁唑啉、4-异噁唑啉、2-噁唑啉、3-噁唑啉、2-咪唑啉、吡咯、噻唑啉、吡唑啉、3-吡唑啉、3H-吡唑、咪唑、吡唑、1,2,3-三唑、1,2,4-三唑、四唑、五唑、噁唑、异噁唑、1,2,3-噁二唑、1,2,4-噁二唑、呋咱、1,3,4-噁二唑、噻唑、异噻唑、1,2,4-噻二唑、1,2,5-噻二唑、1,3,4-噻二唑或任何其被取代的或官能化的化合物。
在其他实施方案中,N-杂环是内酰胺、磺内酰胺、吡啶、氢-吡啶、吡啶酮、吡嗪、嘧啶、三嗪或氮杂。
在一些实施方案中,环境友好的螯合剂(EBC)以大于唑类的浓度的浓度添加。在一些实施方案中,唑类的浓度小于1.0 ppm。在其他实施方案中,唑类的浓度小于0.5 ppm,并且在其他实施方案中,唑类的浓度小于0.25 ppm。
在一些实施方案中,本发明方法将唑含量降低约0.1%至100%。在其他实施方案中,唑含量降低约10-90%,在其他实施方案中,唑含量降低约25-75%,并且在其他实施方案中,唑含量降低约40-60%。
在一些实施方案中,本发明包括氧化处理或氧化剂。氧化剂可以对抗唑形成钝化膜的能力。本发明方法将工业冷却系统中唑类的浓度降低到低于1.0 ppm,使得磷酸钙很少形成钝化膜,而不在唑和盐之间竞争表面。低水平的唑类与添加的EBC一起作用以提供必要的电化腐蚀防护,因此导致唑类(和AOX)的减少,同时在用于微生物控制的提高的氧化水平下保持和改善性能。
在一些实施方案中,氧化剂可以选自次氯酸钠(漂白剂)或次氯酸、次溴酸钠或次溴酸、稳定化的溴、过氧化物(无机过氧化物,如H2O2,和有机过氧化物,如过乙酸)、臭氧。在一些实施方案中,将这些氧化剂直接添加到水相中。在一些实施方案中,氧化剂可以是卤化的或非卤化的。卤化氧化剂具有将卤素加到有机分子或聚合物的能力。
在一些实施方案中,提供非卤化氧化剂。在一些实施方案中,非卤化氧化剂包括ClO2、过氧化物或臭氧。
在本公开的又一方面,提供了减少或消除AOX的方法。所述方法包括向水性冷却系统中提供一种或多种环境友好的螯合剂(EBC),其中所述水性冷却系统在卤化杀生物剂或氧化剂的存在下包含至少一种含AOX的物质。
可吸附的有机卤素或AOX可以表征为具有共价连接到母体结构的卤素原子的任何有机物质,因此能够吸收到基材上。当与某些氧化剂如卤化氧化剂(例如漂白剂或溴)一起使用时,唑类在工业冷却系统中可以具有固有可吸收的有机卤化物(AOX)或瞬时AOX。在分子骨架或聚合物主链上具有卤素的分子或聚合物固有地是AOX物质。
在一些实施方案中,本发明方法提供至少一种含AOX的物质,所述含AOX的物质包含(1)固有含AOX的分子,或(2)瞬时含AOX的分子。
在一些实施方案中,提供了固有的或固有含AOX的物质,其特征在于卤素在工业水流的非原位和外部共价加成到母体结构。固有AOX物质可以利用混合罐或机械装置以显著的浓度产生,其在工业系统现场并且就在加到工业水流中之前结合了足够的卤化剂。
固有含AOX的分子的实例包括但不限于氯苯并三唑、溴苯并三唑、氯-甲苯基三唑、溴-甲苯基三唑、5-氯-1-苯基-1H-四唑或5-(4-氯苯基)-1H-四唑。在一些实施方案中,固有含AOX的分子是在卤化或非卤化条件下的固有AOX唑。
在一些实施方案中,形成瞬时AOX物质,其中由于反应性有机物质和卤化氧化杀生物剂的存在,在工业水流的原位提供共价卤键。瞬时AOX物质将以母体分子和卤化瞬时AOX产物之间的平衡存在。在一些实施方案中,固有AOX物质可以与氯化或溴化氧化剂原位反应,以形成以平衡存在的瞬时AOX物质,其中唑的摩尔浓度的至少0.1%作为AOX存在。因此,在工业物流中的任何给定的时间,有机物质的一定比例的浓度总是作为瞬时AOX存在。
在一些实施方案中,含AOX的物质包含瞬时含AOX的分子。瞬时含AOX的分子的实例包括但不限于1-N-氯苯并三唑、1-N-氯-甲苯基三唑、1-N-氯-氯甲苯基三唑、1-N-溴苯并三唑、1-N-溴-甲苯基三唑或5-苯基-1N-氯四唑。
在一些实施方案中,所公开的方法使AOX贡献降低0.1%至100%。在其他实施方案中,所公开的方法使AOX贡献降低至少75%,并且在其他实施方案中,降低至少50%。
在一些实施方案中,利用卤化杀生物剂。在一些实施方案中,卤化杀生物剂包括漂白剂、氯或溴。
在所公开技术的又一方面,提供了从水性冷却系统中减少或消除唑类或AOX的组合物。在一些实施方案中,组合物包含(i)分散剂聚合物;(ii)盐抑制剂;(iii)杀生物剂;(iv) pH调节物质;(v) EBC;(vi)金属抑制剂;和(vii) N-杂环。在其他实施方案中,组合物包含(i)分散剂聚合物;(ii)盐抑制剂;(iii)杀生物剂;(iv) pH调节物质;(v) EBC;(vi)金属抑制剂;和/或(vii) N-杂环。
在一些实施方案中,根据抑制结垢或腐蚀的需要而添加盐抑制剂和pH调节物质。在一些实施方案中,当指定pH目标设定点时,包括金属抑制剂。然而,在一些工业水性应用情况下,不以pH设定点为目标,并且水的pH可以基于水特性和缓冲能力达到其自然pH目标。
在一些实施方案中,被处理的工业水流由矿物阳离子和阴离子组成。典型的特征性阳离子是Ca2+和Mg2+,其浓度范围为0 ppm至10,000 ppm。典型的特征性阴离子由Cl-、SO4 2-、PO4 3-、HCO3 -和CO3 2-组成,其浓度范围为0 ppm至100,000 ppm。也可以发现第1族阳离子,并且其通常有助于使水性基质的总电荷平衡。各种形式的硅酸盐和二氧化硅可以表征水流,其浓度范围为0 ppm至1000 ppm。
在一些实施方案中,可以用金属阳离子处理工业水流以改善腐蚀控制。在一些实施方案中,金属阳离子盐包含过渡金属、p-区金属、p-区半金属、SiO2、硅酸盐和金属硅酸盐、镧系元素和锕系元素。在一些实施方案中,可以添加的金属阳离子盐包括但不限于Ti、Mo、Mn、W、Zn、Al、二氧化硅(SiO2)、As、Sn、La和Eu。这些可以以0 ppm至100 ppm的浓度作为阳离子金属盐添加。
在一些实施方案中,可以将盐抑制剂或阻垢剂添加到水流中。盐抑制剂通常是多羧酸分子或低分子量聚合物(<10,000 MW)。膦酸盐传统上也用作盐抑制剂和阻垢剂。当特定的盐过饱和时,将盐抑制剂添加到水流中,其中计算的SI大于1。可以添加0 ppm至100ppm浓度的盐抑制剂。
在一些实施方案中,将聚合物分散剂和/或盐抑制剂添加到水流中。在一些实施方案中,聚合物分散剂和/或盐抑制剂是多羧酸基聚合物,其中至少一种另外的单体由磺酸基团组成。分散剂单体将悬浮在溶液中过饱和的盐、悬浮固体和金属氧化物胶体,并防止在金属表面上积垢或结垢。
在一些实施方案中,将杀生物剂进料到增进微生物物种的微环境的工业系统。在一些实施方案中,杀生物剂可以是氧化的或非氧化的。另外,生物分散剂可以与杀生物剂一起添加。在一些实施方案中,生物分散剂可以是阴离子、阳离子或非离子表面活性剂。
在一些实施方案中,将pH调节剂/物质添加到水流中。pH调节剂/物质包含允许pH改变到目标设定点的任何盐、无机或有机物质。实例包括但不限于硫酸、盐酸、氢氧化钠、苛性碱、碳酸氢钠、CO2和柠檬酸。
实验
表1和2提供了本发明方法的实验性试验,所述方法提供了对卤化稳定的处理,还提供了良好的耐腐蚀性。
提供了再循环试验台。所述试验台的总体积为约1.4 L,并且装备有抽水泵、腐蚀试片和探针的旁路支架、树脂玻璃封装的换热器和控制pH和ORP的探针。以下说明水化学。换热器装有控制热负荷的电加热器(0-11,000 BTU/ft2/hr)和流量计(0-4.6 ft/sec)。使用安装在旁路支架上的Corrator计监测腐蚀速率。通过将试样插入旁路支架中测试期的持续时间7-8天,来计算重量损失腐蚀速率。使用硫酸滴注控制pH。将氧化还原电位(ORP)控制在所需的游离残余氯(FRC)水平,该水平通过Hach Powder Pack方法测定。水流量保持在约4 ft/sec,并且本体水温控制在120℉。
表1
如表1中提供的水特性:600 ppm Ca,以CaCO3计,300 ppm Mg,以CaCO3计,50 ppmM-碱度,以CaCO3计,3 ppm p-PO4,以PO4计,485 ppm Cl-,285 ppm SO4 2-,pH=7.2;ADM-C和LCS-C是指试样的平均重量损失;ADM-P和LCS-P是指在整个测试持续时间内的平均即时腐蚀速率;AOX是指固有AOX浓度;漂白剂是通过Hach Powder Pack试验测定的残余游离氯的量度。除了N-杂环和EBC之外,将分散剂聚合物添加到水性系统中以保持6 ppm的浓度。化学剂量基于活性物%。a试样具有显著的脱锌区域。b试验运行测得来自Hach的(总氯-残余氯)粉末测试之间的△>0.1 ppm。
表1表示了自中性工业条件/在中性工业条件下减少或消除N-杂环和AOX的示例性数据。表1中的运行1和2表示利用N-杂环 氯甲苯基三唑的典型冷却程序,其差别仅在于残余游离氯的ppm。增加游离氯导致了更具腐蚀性的环境,如运行2中的试样结果的提高的腐蚀速率所看到的。在运行2中还看到,没有完全由腐蚀速率数字表示,出现了铜冶金的脱锌或脱合金。较久的试验最终将导致高得多的腐蚀速率。
运行4、5和8中的EBC示出EBC将N-杂环含量从2 ppm降低到0.5 ppm,并且将固有AOX从500 ppb降低到100 ppb的能力。由于膦酸盐的返原,o-PO4浓度增加2 ppm。进行对照运行3以表明,不存在EBC的情况下,同时使o-PO4浓度增加2 ppm,导致了LCS试样的腐蚀速率明显更高。运行4和5还示出,不是所有的膦酸盐的性能都相同,其中,对于相对于对照运行2的ADM和LCS试样两者,运行4的性能优于运行5。运行4中的EBC和水解产物的组合在钝化金属表面和螯合可溶性铜以便电化防护方面更好。
与对照运行1和2相比,表1中的所有实例都可以有效地保护铜和铜合金表面。运行9至12都表现出总氯对残余游离氯的显著△值。表明EBC易受来自卤化氧化剂、漂白剂的一些卤化形式影响。这些EBC可以更好地适用于具有非卤化氧化剂的系统,或者可以用亚烷基羧酸或膦酸适当地官能化。
运行13-14是对铜具有可观的结合常数的螯合剂的实例。尽管具有这种性质,但它们在保护金属表面方面不如其他EBC有效。EBC不是仅仅基于金属结合常数选择的,并且在减少N-杂环和/或AOX的同时保持性能方面是有效的。
表2具有在碱性工业冷却条件下使用EBC的示例性实例。运行3显示使用EBC降低测试水中N-杂环(唑)和AOX的能力。运行4证实了使用EBC仅减少工业水中的N-杂环(唑类)的能力。EBC GLADMP也是氨基酸甘氨酸如何被适当的官能团取代的实例,所述官能团赋予卤素稳定性和作为EBC的活性。甘氨酸的胺官能团与2当量的氯乙酸反应(参见示例性程序)。
表2提供在碱性工业水系统中的结果。在表2中,运行4提供了通过使用EBC减少瞬时AOX的实例。已公开的文献估计甲苯基三唑形成了约10%的瞬时1-N-氯-甲苯基三唑。使用测量AOX的标准方法,已经发现甲苯基三唑,3 ppm样品,和苯并三唑,1.5 ppm样品分别贡献97 μg Cl/L和46 μg Cl/L。因此,除了降低唑浓度之外,运行4还能够将瞬时AOX从97 μgCl/L降低至可能16 μg Cl/L。
表2
如表2中提供的水特性:400 ppm Ca,以CaCO3计,150 ppm Mg,以CaCO3计,200 ppmM-碱度,以CaCO3计,ppm Cl-,ppm SO4 2-,pH=8.6;ADM-C和LCS-C是指试样的平均重量损失;ADM-P和LCS-P是指在整个测试持续时间内的平均即时腐蚀速率;AOX是指固有AOX浓度;漂白剂是如通过Hach Powder Pack试验测定的残余游离氯的量度。除了N-杂环和EBC之外,将分散剂聚合物添加到水性系统中以保持8 ppm的浓度。添加8 ppm的另外的盐抑制剂用于结垢控制。化学剂量基于活性物%。
如表2中所示的GLADMP的合成(或使用与亚磷酸的曼尼希型反应的双(膦酰基甲基)甘氨酸的合成)根据以下进行:在装有温度计、搅拌器、冷凝器和进料管线的4颈烧瓶中,将46.62 g (0.56摩尔)亚磷酸溶解在55.00 mL去离子水中。其次,将21.07 g (0.28摩尔)甘氨酸和27.59 g (0.28摩尔) 37% HCl添加到烧瓶中,并在105℃下加热至回流。一旦处于回流,则在1小时时间内加入53.57 g (0.66摩尔,20%过量)的37%甲醛。在添加完成之后,将溶液保持回流3小时,然后冷却至25℃。通过添加91.42 g (1.14摩尔)的50%苛性碱将溶液的pH从0.64调节至5.24。产物溶液的质量为288.19 g,固含量为39.73%。
本书面描述使用实施例来公开本发明,包括最佳模式,并且使本领域技术人员能够实践本发明,包括制造和使用任何装置或系统以及执行任何结合的方法。本发明可取得专利的范围由权利要求限定,并且可以包括本领域技术人员想到的其他实施例。如果这些其他实施例具有与权利要求的字面语言没有不同的结构元素,或者如果它们包括与权利要求的字面语言无实质差异的等同结构元素,则这些其他实施例旨在处于权利要求的范围内。
Claims (12)
1.一种减少N-杂环同时保持或改善腐蚀抑制性能的方法,所述方法包括:
向水性冷却系统提供一种或多种环境友好的螯合剂,其中所述水性冷却系统包括:
在卤化或非卤化氧化剂存在下的至少一种N-杂环,其中所述至少一种N-杂环的浓度小于1.0ppm且所述环境友好的螯合剂以大于所述至少一种N-杂环的浓度的浓度添加,其中所述环境友好的螯合剂包括(1)氨基多羧酸,(2)聚氨基酸或核酸,(3)缓冲剂,或(4)氨基亚烷基膦酸和它们相应的水解产物的混合物;且其中缓冲剂选自N-(2-乙酰氨基)-2-氨基乙磺酸、N-(2-乙酰氨基)亚氨基二乙酸、单磷酸腺苷、2-氨基-2-甲基丙烷-1,3-二醇、2-羟基-3-[(2-羟基-1,1-二甲基乙基)氨基]-1-丙磺酸、N,N-双(2-羟基乙基)-2-氨基乙磺酸、N,N-二羟乙基甘氨酸、Bis-Tris、1,3-双(三(羟基甲基)甲基氨基)丙烷、烷基苯磺酸钙、N-环己基-3-氨基丙磺酸、N-环己基-2-羟基-3-氨基丙磺酸、2-(环己基氨基)乙磺酸、3-(双(2-羟基乙基)氨基)-2-羟基丙烷-1-磺酸、3-[4-(2-羟基乙基)-1-哌嗪基]丙磺酸、4-(2-羟基乙基)-1-哌嗪丙磺酸、4-(4-(2-羟基乙基)哌嗪-1-基)丁烷-1-磺酸、4-(2-羟基乙基)-1-哌嗪乙磺酸、2-羟基-3-(4-(2-羟基乙基)哌嗪-1-基)丙烷-1-磺酸、2-(N-吗啉代)乙磺酸、4-吗啉代丁烷-1-磺酸、3-(N-吗啉代)丙磺酸、3-吗啉代-2-羟基丙磺酸、哌嗪-N,N'-双(2-乙磺酸)、哌嗪-1,4-双(2-羟基丙磺酸、4-((1,3-二羟基-2-(羟基甲基)丙-2-基)氨基)丁烷-1-磺酸、3-((1,3-二羟基-2-(羟基甲基)丙-2-基)氨基)丙烷-1-磺酸、N-[三(羟基甲基)甲基]-3-氨基-2-羟基丙磺酸、三乙醇胺、N-三(羟基甲基)甲基-2-氨基乙磺酸、曲辛、三(羟基甲基)氨基甲烷或它们被取代的或官能化的化合物。
2.根据权利要求1所述的方法,其中所述氨基多羧酸包括具有-COOH和/或-PO3的被取代的氨基酸或其组合。
3.根据权利要求1所述的方法,其中所述氨基多羧酸包含一个或多个氨基官能团,其中所述氨基多羧酸是乙二胺四乙酸、N-(2-羟基乙基)乙二胺三乙酸、二亚乙基三胺五乙酸、次氮基三乙酸、甲基甘氨酸二乙酸(MGDA)、N,N-二羧甲基谷氨酸四钠盐或乙二胺-N,N’-二琥珀酸。
4.根据权利要求1所述的方法,其中所述聚氨基酸是聚天冬氨酸或包含多于一个氨基酸的肽。
5.根据权利要求1所述的方法,其中所述氨基亚烷基膦酸由式(I)表示
其中R1为-CH2-R3、-(CH2)y-NR2或-(CH2)y-NR-(CH2)y-NR2;并且其中R为-(CH2)x-R3;R2为-(CH2)xR3;并且R3为-PO3或-OH,其中R3相同或不同,并且其中y在1和4之间,且x在1和4之间。
6.根据权利要求1所述的方法,其中所述至少一种N-杂环为唑。
7.根据权利要求1所述的方法,其中所述至少一种N-杂环是咪唑烷酮、噁唑烷酮、乙内酰脲、脲唑、噁唑烷、咪唑烷、异噁唑烷、吡唑烷、吡咯啉、马来酰亚胺、吡咯啉-2-酮、2-异噁唑啉、4-异噁唑啉、2-噁唑啉、3-噁唑啉、2-咪唑啉、吡咯、噻唑啉、吡唑啉、3-吡唑啉、3H-吡唑、咪唑、吡唑、1,2,3-三唑、1,2,4-三唑、四唑、五唑、噁唑、异噁唑、1,2,3-噁二唑、1,2,4-噁二唑、呋咱、1,3,4-噁二唑、噻唑、异噻唑、1,2,4-噻二唑、1,2,5-噻二唑、1,3,4-噻二唑或它们被取代的或官能化的化合物。
8.根据权利要求1所述的方法,其中所述非卤化氧化剂包括无机过氧化物、有机过氧化物或臭氧。
9.根据权利要求1所述的方法,其中所述氧化剂是ClO2。
10.根据权利要求1所述的方法,其中所述环境友好的螯合剂可与金属阳离子盐一起使用,所述金属阳离子盐包含过渡金属、p-区金属、p-区半金属、SiO2、硅酸盐和金属硅酸盐、镧系元素和锕系元素。
11.一种从水性冷却系统中减少N-杂环同时保持或改善腐蚀抑制性能的组合物,所述组合物包含:
(i)分散剂聚合物;
(ii)杀生物剂;
(iii)pH调节物质;以及
(iv)环境友好的螯合剂,其中所述环境友好的螯合剂包括:
(4)氨基亚烷基膦酸和相应水解产物的混合物。
12.一种从水性冷却系统中减少N-杂环同时保持或改善腐蚀抑制性能的组合物,所述组合物包含:
(i)分散剂聚合物;
(ii)杀生物剂;
(iii)pH调节物质;
(iv)环境友好的螯合剂,包括氨基亚烷基膦酸和相应水解产物的混合物;和
(v)至少一种N-杂环,
其中所述环境友好的螯合剂具有大于所述至少一种N-杂环的浓度的浓度。
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