CN111793467B - 氮化铝基板用研磨剂组合物及氮化铝基板的研磨方法 - Google Patents

氮化铝基板用研磨剂组合物及氮化铝基板的研磨方法 Download PDF

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Publication number
CN111793467B
CN111793467B CN202010190298.2A CN202010190298A CN111793467B CN 111793467 B CN111793467 B CN 111793467B CN 202010190298 A CN202010190298 A CN 202010190298A CN 111793467 B CN111793467 B CN 111793467B
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China
Prior art keywords
acid
aluminum nitride
polishing
salt
amine compound
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English (en)
Chinese (zh)
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CN111793467A (zh
Inventor
后藤优治
巢河慧
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Yamaguchi Seiken Kogyo Co Ltd
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Yamaguchi Seiken Kogyo Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
CN202010190298.2A 2019-04-01 2020-03-18 氮化铝基板用研磨剂组合物及氮化铝基板的研磨方法 Active CN111793467B (zh)

Applications Claiming Priority (2)

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JP2019070014A JP7220114B2 (ja) 2019-04-01 2019-04-01 窒化アルミニウム基板用研磨剤組成物および窒化アルミニウム基板の研磨方法
JP2019-070014 2019-04-01

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CN111793467A CN111793467A (zh) 2020-10-20
CN111793467B true CN111793467B (zh) 2022-07-12

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JP (1) JP7220114B2 (ja)
CN (1) CN111793467B (ja)
TW (1) TWI821539B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114672252B (zh) * 2022-04-11 2023-11-28 宁波日晟新材料有限公司 一种无味氮化铝抛光液及其制备方法和应用

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5962343A (en) * 1996-07-30 1999-10-05 Nissan Chemical Industries, Ltd. Process for producing crystalline ceric oxide particles and abrasive
CN1366547A (zh) * 2000-07-05 2002-08-28 昭和电工株式会社 抛光组合物及用该抛光组合物抛光后的磁记录盘基片
CN101454121A (zh) * 2006-05-31 2009-06-10 旭硝子株式会社 研磨剂组合物及研磨方法
CN102108281A (zh) * 2009-12-25 2011-06-29 花王株式会社 研磨液组合物
CN106167691A (zh) * 2015-05-19 2016-11-30 昭和电工株式会社 研磨组合物和使用该研磨组合物的研磨方法
JP2018159033A (ja) * 2017-03-23 2018-10-11 山口精研工業株式会社 窒化アルミニウム基板用研磨剤組成物および窒化アルミニウム基板の研磨方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6756460B2 (ja) * 2014-12-26 2020-09-16 株式会社フジミインコーポレーテッド 研磨方法及びセラミック製部品の製造方法
JP7197366B2 (ja) * 2016-12-26 2022-12-27 株式会社フジミインコーポレーテッド 研磨用組成物及び研磨方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5962343A (en) * 1996-07-30 1999-10-05 Nissan Chemical Industries, Ltd. Process for producing crystalline ceric oxide particles and abrasive
CN1366547A (zh) * 2000-07-05 2002-08-28 昭和电工株式会社 抛光组合物及用该抛光组合物抛光后的磁记录盘基片
CN101454121A (zh) * 2006-05-31 2009-06-10 旭硝子株式会社 研磨剂组合物及研磨方法
CN102108281A (zh) * 2009-12-25 2011-06-29 花王株式会社 研磨液组合物
CN106167691A (zh) * 2015-05-19 2016-11-30 昭和电工株式会社 研磨组合物和使用该研磨组合物的研磨方法
JP2018159033A (ja) * 2017-03-23 2018-10-11 山口精研工業株式会社 窒化アルミニウム基板用研磨剤組成物および窒化アルミニウム基板の研磨方法

Also Published As

Publication number Publication date
JP2020170748A (ja) 2020-10-15
CN111793467A (zh) 2020-10-20
JP7220114B2 (ja) 2023-02-09
TW202104522A (zh) 2021-02-01
TWI821539B (zh) 2023-11-11

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