CN111600573A - 滤波器、多工器、通信设备及滤波器制造方法 - Google Patents
滤波器、多工器、通信设备及滤波器制造方法 Download PDFInfo
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- CN111600573A CN111600573A CN202010481281.2A CN202010481281A CN111600573A CN 111600573 A CN111600573 A CN 111600573A CN 202010481281 A CN202010481281 A CN 202010481281A CN 111600573 A CN111600573 A CN 111600573A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 238000004891 communication Methods 0.000 title claims abstract description 10
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- 238000000034 method Methods 0.000 abstract description 13
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/48—Coupling means therefor
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/205—Constructional features of resonators consisting of piezoelectric or electrostrictive material having multiple resonators
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0414—Resonance frequency
- H03H2003/0421—Modification of the thickness of an element
- H03H2003/0442—Modification of the thickness of an element of a non-piezoelectric layer
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0414—Resonance frequency
- H03H2003/045—Modification of the area of an element
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- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
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CN202010481281.2A CN111600573B (zh) | 2020-05-31 | 2020-05-31 | 滤波器、多工器、通信设备及滤波器制造方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114785317A (zh) * | 2022-04-28 | 2022-07-22 | 成都频岢微电子有限公司 | 一种体声波双工器 |
CN114785317B (zh) * | 2022-04-28 | 2024-09-27 | 成都频岢微电子有限公司 | 一种体声波双工器 |
Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1476618A (zh) * | 2001-09-05 | 2004-02-18 | ά | 多联电容器 |
US20110062549A1 (en) * | 2009-09-11 | 2011-03-17 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Integrated Passive Device |
CN102223142A (zh) * | 2011-08-13 | 2011-10-19 | 张�浩 | 声波谐振器 |
CN102280339A (zh) * | 2010-06-14 | 2011-12-14 | 东京毅力科创株式会社 | 基板处理方法和基板处理装置 |
CN103890884A (zh) * | 2011-10-24 | 2014-06-25 | 迪睿合电子材料有限公司 | 静电电容元件及谐振电路 |
CN105190807A (zh) * | 2013-02-28 | 2015-12-23 | 迪睿合电子材料有限公司 | 静电电容器件、谐振电路及电子设备 |
CN106058395A (zh) * | 2015-04-14 | 2016-10-26 | Tdk株式会社 | 包含线圈和电容器的层叠复合电子部件 |
US20170025596A1 (en) * | 2015-07-22 | 2017-01-26 | Cindy X. Qiu | Tunable film bulk acoustic resonators and filters |
WO2018012274A1 (ja) * | 2016-07-15 | 2018-01-18 | 株式会社村田製作所 | ラダー型周波数可変フィルタ、マルチプレクサ、高周波フロントエンド回路、および、通信端末 |
US20180041193A1 (en) * | 2016-08-08 | 2018-02-08 | Qorvo Us, Inc. | Acoustic filtering circuitry including capacitor |
WO2019051504A1 (en) * | 2017-09-11 | 2019-03-14 | Akoustis, Inc. | SYSTEM FOR WIRELESS COMMUNICATION INFRASTRUCTURE CONFIGURED WITH MONOCRYSTALLINE PIEZOELECTRIC RESONATOR AND FILTERING STRUCTURE |
US20190115900A1 (en) * | 2016-04-25 | 2019-04-18 | Kumu Networks, Inc. | High quality factor time delay filters using multi-layer fringe capacitors |
CN109831178A (zh) * | 2018-12-29 | 2019-05-31 | 天津大学 | 一种双工器 |
US20190214970A1 (en) * | 2016-09-16 | 2019-07-11 | Murata Manufacturing Co., Ltd. | Acoustic wave filter device, multiplexer, rf front-end circuit, and communication apparatus |
CN110492864A (zh) * | 2019-08-09 | 2019-11-22 | 天津大学 | 一种体声波滤波器的封装结构及该滤波器的制造方法 |
CN110828441A (zh) * | 2019-10-18 | 2020-02-21 | 天津大学 | 一种多工器 |
CN111064447A (zh) * | 2019-11-15 | 2020-04-24 | 天津大学 | 一种双工器 |
CN111082771A (zh) * | 2019-12-26 | 2020-04-28 | 河源市众拓光电科技有限公司 | 一种体声波谐振器及其制备方法、滤波器 |
-
2020
- 2020-05-31 CN CN202010481281.2A patent/CN111600573B/zh active Active
Patent Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1476618A (zh) * | 2001-09-05 | 2004-02-18 | ά | 多联电容器 |
US20110062549A1 (en) * | 2009-09-11 | 2011-03-17 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Integrated Passive Device |
CN102280339A (zh) * | 2010-06-14 | 2011-12-14 | 东京毅力科创株式会社 | 基板处理方法和基板处理装置 |
CN102223142A (zh) * | 2011-08-13 | 2011-10-19 | 张�浩 | 声波谐振器 |
CN103890884A (zh) * | 2011-10-24 | 2014-06-25 | 迪睿合电子材料有限公司 | 静电电容元件及谐振电路 |
CN105190807A (zh) * | 2013-02-28 | 2015-12-23 | 迪睿合电子材料有限公司 | 静电电容器件、谐振电路及电子设备 |
CN106058395A (zh) * | 2015-04-14 | 2016-10-26 | Tdk株式会社 | 包含线圈和电容器的层叠复合电子部件 |
US20170025596A1 (en) * | 2015-07-22 | 2017-01-26 | Cindy X. Qiu | Tunable film bulk acoustic resonators and filters |
US20190115900A1 (en) * | 2016-04-25 | 2019-04-18 | Kumu Networks, Inc. | High quality factor time delay filters using multi-layer fringe capacitors |
WO2018012274A1 (ja) * | 2016-07-15 | 2018-01-18 | 株式会社村田製作所 | ラダー型周波数可変フィルタ、マルチプレクサ、高周波フロントエンド回路、および、通信端末 |
US20180041193A1 (en) * | 2016-08-08 | 2018-02-08 | Qorvo Us, Inc. | Acoustic filtering circuitry including capacitor |
US20190214970A1 (en) * | 2016-09-16 | 2019-07-11 | Murata Manufacturing Co., Ltd. | Acoustic wave filter device, multiplexer, rf front-end circuit, and communication apparatus |
WO2019051504A1 (en) * | 2017-09-11 | 2019-03-14 | Akoustis, Inc. | SYSTEM FOR WIRELESS COMMUNICATION INFRASTRUCTURE CONFIGURED WITH MONOCRYSTALLINE PIEZOELECTRIC RESONATOR AND FILTERING STRUCTURE |
CN109831178A (zh) * | 2018-12-29 | 2019-05-31 | 天津大学 | 一种双工器 |
CN110492864A (zh) * | 2019-08-09 | 2019-11-22 | 天津大学 | 一种体声波滤波器的封装结构及该滤波器的制造方法 |
CN110828441A (zh) * | 2019-10-18 | 2020-02-21 | 天津大学 | 一种多工器 |
CN111064447A (zh) * | 2019-11-15 | 2020-04-24 | 天津大学 | 一种双工器 |
CN111082771A (zh) * | 2019-12-26 | 2020-04-28 | 河源市众拓光电科技有限公司 | 一种体声波谐振器及其制备方法、滤波器 |
Non-Patent Citations (2)
Title |
---|
A. BOUTEJDAR: "Extracting of compact tunable BPF from LPF using single T-DGS-resonator and 0.25PF/0.5PF Chip Monolithic Ceramic Capacitors", 《2015 4TH INTERNATIONAL CONFERENCE ON ELECTRICAL ENGINEERING (ICEE)》 * |
孙蕴鹏: "基于薄膜体声波技术的器件设计及应用", 《中国优秀硕士学位论文全文数据库信息科技辑》 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114785317A (zh) * | 2022-04-28 | 2022-07-22 | 成都频岢微电子有限公司 | 一种体声波双工器 |
CN114785317B (zh) * | 2022-04-28 | 2024-09-27 | 成都频岢微电子有限公司 | 一种体声波双工器 |
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Denomination of invention: Filter, multiplexer, communication equipment and filter manufacturing method Effective date of registration: 20210908 Granted publication date: 20210416 Pledgee: Tianjin TEDA Haihe intelligent manufacturing industry development fund partnership (L.P.) Pledgor: ROFS MICROSYSTEM(TIANJIN) Co.,Ltd. Registration number: Y2021980009022 |
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