CN111575654B - 一种超声振动辅助真空微蒸发镀设备 - Google Patents
一种超声振动辅助真空微蒸发镀设备 Download PDFInfo
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- CN111575654B CN111575654B CN202010433501.4A CN202010433501A CN111575654B CN 111575654 B CN111575654 B CN 111575654B CN 202010433501 A CN202010433501 A CN 202010433501A CN 111575654 B CN111575654 B CN 111575654B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
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CN202010433501.4A CN111575654B (zh) | 2020-05-21 | 2020-05-21 | 一种超声振动辅助真空微蒸发镀设备 |
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CN202010433501.4A CN111575654B (zh) | 2020-05-21 | 2020-05-21 | 一种超声振动辅助真空微蒸发镀设备 |
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CN111575654A CN111575654A (zh) | 2020-08-25 |
CN111575654B true CN111575654B (zh) | 2021-04-20 |
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CN112626484A (zh) * | 2020-11-30 | 2021-04-09 | 蓬莱市超硬复合材料有限公司 | 一种金刚石镀膜系统、镀膜方法、终端及可读存储介质 |
CN114481031A (zh) * | 2022-02-11 | 2022-05-13 | 丹东安顺微电子有限公司 | 一种半导体生产用石墨坩埚蒸铝的工艺 |
CN116837354B (zh) * | 2023-09-01 | 2023-11-24 | 上海陛通半导体能源科技股份有限公司 | 半导体加热装置和气相沉积设备 |
Citations (2)
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US8366259B2 (en) * | 2008-11-17 | 2013-02-05 | Fujifilm Corporation | Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer |
CN109957762A (zh) * | 2017-12-14 | 2019-07-02 | 京东方科技集团股份有限公司 | 蒸镀方法以及蒸镀装置 |
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JPH06172973A (ja) * | 1992-12-04 | 1994-06-21 | Toyota Motor Corp | 薄膜形成装置 |
WO1999028391A1 (fr) * | 1997-11-28 | 1999-06-10 | Compagnie Generale Des Etablissements Michelin - Michelin & Cie | Noir de carbone revetu d'une couche alumineuse et procede pour l'obtenir |
CN2536598Y (zh) * | 2002-04-18 | 2003-02-19 | 司勇 | 一种适用于真空微蒸发镀的装置 |
CN100493780C (zh) * | 2006-12-30 | 2009-06-03 | 江苏天一超细金属粉末有限公司 | 磨料颗粒包覆金属结合剂的方法及设备 |
JP5046210B2 (ja) * | 2007-11-27 | 2012-10-10 | 国立大学法人 東京医科歯科大学 | 微粒子を形成する方法およびこの微粒子を利用した生体物質の検査法 |
WO2014052792A1 (en) * | 2012-09-28 | 2014-04-03 | Sio2 Medical Products, Inc. | Halogenated or parylene polymer coating |
CN103436845A (zh) * | 2013-06-18 | 2013-12-11 | 广东工业大学 | 一种在金刚石颗粒表面包覆TiC层的方法 |
CN105543781A (zh) * | 2015-12-23 | 2016-05-04 | 兰州交通大学 | 用于磁性粉体颗粒表面真空镀膜的装置及镀膜方法 |
CN110359014A (zh) * | 2019-06-11 | 2019-10-22 | 惠科股份有限公司 | 一种蒸镀设备和坩埚装置 |
CN110284105B (zh) * | 2019-06-25 | 2024-02-09 | 郑州航空工业管理学院 | 一种粉体表面金属化方法及其装置 |
CN110468265A (zh) * | 2019-08-14 | 2019-11-19 | 南京航空航天大学 | 一种深孔超声振动冲击强化装置及方法 |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US8366259B2 (en) * | 2008-11-17 | 2013-02-05 | Fujifilm Corporation | Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer |
CN109957762A (zh) * | 2017-12-14 | 2019-07-02 | 京东方科技集团股份有限公司 | 蒸镀方法以及蒸镀装置 |
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Inventor after: Wang Changrui Inventor after: Li Zhiyou Inventor after: Li Hongzhao Inventor after: Jingqi Inventor after: Tian Wei Inventor before: Wang Changrui Inventor before: Li Zhiyou Inventor before: Li Hongzhao Inventor before: Jingqi Inventor before: Chen Minghe Inventor before: Xie Lansheng |
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Effective date of registration: 20220126 Address after: No. 29, Qinhuai District, Qinhuai District, Nanjing, Jiangsu Patentee after: Nanjing University of Aeronautics and Astronautics Asset Management Co.,Ltd. Address before: No. 29, Qinhuai District, Qinhuai District, Nanjing, Jiangsu Patentee before: Nanjing University of Aeronautics and Astronautics |
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