CN111440003A - 新型浮法玻璃窑锡槽高温段专用的底部大砖及其制备方法 - Google Patents
新型浮法玻璃窑锡槽高温段专用的底部大砖及其制备方法 Download PDFInfo
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title claims abstract description 58
- 239000011449 brick Substances 0.000 title claims abstract description 34
- 239000005329 float glass Substances 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title abstract description 8
- 229920002994 synthetic fiber Polymers 0.000 claims abstract description 18
- 239000002994 raw material Substances 0.000 claims abstract description 9
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052863 mullite Inorganic materials 0.000 claims abstract description 8
- 239000004568 cement Substances 0.000 claims abstract description 7
- 239000011230 binding agent Substances 0.000 claims abstract description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910001570 bauxite Inorganic materials 0.000 claims abstract description 4
- 229910052593 corundum Inorganic materials 0.000 claims abstract description 4
- 239000010431 corundum Substances 0.000 claims abstract description 4
- 239000000843 powder Substances 0.000 claims abstract description 4
- 239000011863 silicon-based powder Substances 0.000 claims abstract description 4
- 239000002689 soil Substances 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 238000000465 moulding Methods 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 238000010304 firing Methods 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 238000001354 calcination Methods 0.000 claims description 3
- 238000001723 curing Methods 0.000 claims description 3
- 238000003837 high-temperature calcination Methods 0.000 claims description 2
- 239000011521 glass Substances 0.000 abstract description 11
- 239000007788 liquid Substances 0.000 abstract description 7
- 229910052664 nepheline Inorganic materials 0.000 abstract description 5
- 239000010434 nepheline Substances 0.000 abstract description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 4
- 239000001301 oxygen Substances 0.000 abstract description 4
- 229910052760 oxygen Inorganic materials 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 239000011819 refractory material Substances 0.000 abstract description 3
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical compound [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 10
- 239000006060 molten glass Substances 0.000 description 9
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- 230000009286 beneficial effect Effects 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052656 albite Inorganic materials 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 239000007767 bonding agent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- 230000035515 penetration Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
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- 238000007493 shaping process Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
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Abstract
本发明属于耐火材料技术领域,具体涉及一种新型浮法玻璃窑锡槽高温段专用的底部大砖及其制备方法。所述的底部大砖,原料的质量百分比组成如下:合成料60‑70%;耐火水泥1‑5%;烧结刚玉5‑15%;莫来石细粉5‑15%;微硅粉2‑5%;合成料由以下质量百分比的原料制成:苏州土30‑40%;铝矾土30‑40%;莫来石20‑25%;结合剂2‑8%。先烧成合成料后,再经混料、高频浇筑成型后入窑烧成成品。本发明制备的底部大砖,强度大,密度高、气孔率低,能够使得整体锡槽气密性提升,氧污染降低,同时不产生霞石化现象,减少锡液中游离物和锡槽顶部滴落物,使玻璃的成品率增加5%以上,可有效提高玻璃企业的利润。
Description
技术领域
本发明属于耐火材料技术领域,具体涉及一种新型浮法玻璃窑锡槽高温段专用的底部大砖及其制备方法。
背景技术
锡槽的主要承载物为锡液和玻璃液。而承载两种液体的锡槽底衬为锡槽底部大砖。锡液在整个浮法平板玻璃的生产过程中始终保持一种液态现象。利用锡液的比重7.28g/cm3远大于玻璃液比重2.5g/cm3产生的175度浸润角(几乎完全不浸润)的性质使玻璃液始终浮在锡液表面成为玻璃液的良好载体。
锡液的上表面接触玻璃液,其下表面直接接触物为锡槽底部大砖。这使得锡槽底部大砖不仅要有支撑整个锡液和玻璃液重量的强度,同时尽量避免在此压力下与锡液发生过多的渗透、反应甚至化学互换,从而生成过多的游离物质滑伤平板玻璃的下表面导致玻璃成品率的降低。同时高温融化的玻璃液带进入锡槽时温度高达1100℃(某些特种玻璃液带进入时的温度会达到1200-1300℃)的高温以及玻璃融化时产生的Na2O气体随着锡液渗透到大砖后发生化学反应转化为钠长石和霞石,Na2O≥10%时,底砖就会出现剥落起层,在和砖体不同应力的情况下断裂脱落后滑伤玻璃带下表面。锡槽底部大砖气密性不足会使锡槽内的锡液氧化产生氧化亚锡和氧化锡,增加锡耗的同时污染锡槽整体气氛降低玻璃的成品率。
发明内容
本发明要解决的技术问题是:克服现有技术的不足,提供一种新型浮法玻璃窑锡槽高温段专用的底部大砖,强度大,密度高、气孔率低,能够使得整体锡槽气密性提升,氧污染降低,同时不产生霞石化现象,减少锡液中游离物和锡槽顶部滴落物,使玻璃的成品率增加5%以上;同时本发明还提供其制备方法。
本发明所述的新型浮法玻璃窑锡槽高温段专用的底部大砖,原料的质量百分比组成如下:
其中,所述合成料由以下质量百分比的原料制成:
优选地,所述的结合剂为高铝水泥。
本发明所述的新型浮法玻璃窑锡槽高温段专用的底部大砖的制备方法,包括如下步骤:
(1)合成料的制备:
将苏州土、铝矾土、莫来石和结合剂混合成型后经高温煅烧后粉碎,即得合成料;
(2)浇筑成型:
将合成料、耐火水泥、烧结刚玉、莫来石细粉和微硅粉加水完全混合后倒入固定模具中,经高频震动成型,得到坯体;
(3)脱模干燥:
待坯体固化后进行脱模,经自然养护烘干72h后进行烧成,得到新型浮法玻璃窑锡槽高温段专用的底部大砖。
步骤(1)中所述的合成料的粒径为3-5mm。
步骤(1)中所述的高温煅烧温度为1500-1600℃,时间为16-18h。
步骤(2)中所述的水的加入量为原料总质量的4-7%。
步骤(2)中所述的高频震动的频率大于100次/分钟。将模具固定在单独定制的频率高于100次/分钟的大型震动平台上进行高频震动排出水分和混合料中的气体和气孔,可有效控制颗粒均匀分布以增强锡槽底部大砖的强度。以更多闭孔率代替开孔率维持砖的密度达到2.35g/cm3以上阻止锡液的进一步渗透,增加总气孔率中15%的闭合气孔率添加成孔料控制锡槽底部大砖密度和导热性。
步骤(3)中所述的烧成条件为:将烘干后坯体放入高温窑炉10小时持续升温至500℃恒温3小时,12小时升温至1000℃恒温3小时,12小时升温至1400℃恒温2小时,12小时逐渐降温至110℃,开窑后冷却进行加工,冷加工过程中利用高精密度德国进口切割设备确保尺寸公差保持在-1~+0mm,光滑的六面磨光利于施工过程中技术调整保持水平平面有利于锡液的通畅流动。大砖的螺栓孔内加入倒螺旋纹固定封孔料防止加热后脱落。
与现有技术相比,本发明的有益效果如下:
1、本发明采用了自主研发的合成料,合成料的加入使得AL2O3组分比例增加,降低Na2O的含量,可杜绝钠长石和霞石的畸变率,延长使用寿命。
2、本发明降低了生产过程里锡液中35%的游离物,同时控制了开放气孔率和闭合气孔率的比例,降低氢扩散率到100mmH2O以下,有效缓解了锡槽内的氧污染使锡氧化后产生的氧化亚锡和氧化锡浮渣以及氧化亚锡溶解后进入气氛在锡槽顶盖、水包处冷凝以及聚集而落到玻璃的上表面,形成锡点和光畸变点,从而极大的助力提高玻璃成品率高达90%以上。
3、本发明制备的锡槽高温段专用的底部大砖强度大可高达100MPa以上,密度高、气孔率低,能够使得整体锡槽气密性提升,氧污染降低,同时不产生霞石化现象,减少锡液中游离物和锡槽顶部滴落物,使玻璃的成品率增加5%以上,有效提高玻璃企业的利润。
4、本发明提供的制备方法,科学合理,生产高效,有利于大规模生产。
附图说明
图1为本发明的工艺流程图。
具体实施方式
下面结合实施例对本发明作进一步的说明。
实施例中用到的所有原料,除特殊说明外均为市购。
实施例
所述的新型浮法玻璃窑锡槽高温段专用的底部大砖的制备方法,包括如下步骤:
(1)合成料的制备:
将苏州土、铝矾土、莫来石和结合剂高铝水泥混合成型后经1550±20℃高温煅烧后粉碎至粒径为3-5mm,即得合成料;
(2)浇筑成型:
将合成料、耐火水泥、烧结刚玉、莫来石细粉和微硅粉加水完全混合后倒入固定模具中,经150次/分钟的高频震动成型,得到坯体;
(3)脱模干燥:
待坯体固化后进行脱模,经自然养护烘干72h后放入高温窑炉10小时持续升温至500℃恒温3小时,12小时升温至1000℃恒温3小时,12小时升温至1400℃恒温2小时,12小时逐渐降温至110℃开窑后冷却,得到新型浮法玻璃窑锡槽高温段专用的底部大砖。
实施例1-5中原料的质量百分比组成以及成品的氢扩散率、气孔率、体积密度、强度等理化指标见表1。
表1具体实施例表
体积密度和气孔率采用GB/T2997-2000致密定形耐火制品体积密度、显气孔率和真气孔率试验方法测定;常温耐压强度采用GB/T5072-2008耐火材料常温耐压强度试验方法测定;氢扩散率采用JC/T 926-2003《浮法玻璃用锡槽底砖(附录A氢扩散度试验方法)》进行测定。
当然,上述内容仅为本发明的较佳实施例,不能被认为用于限定对本发明的实施例范围。本发明也并不仅限于上述举例,本技术领域的普通技术人员在本发明的实质范围内所做出的均等变化与改进等,均应归属于本发明的专利涵盖范围内。
Claims (8)
2.根据权利要求1所述的新型浮法玻璃窑锡槽高温段专用的底部大砖,其特征在于:所述的结合剂为高铝水泥。
3.一种权利要求1-2任一所述的新型浮法玻璃窑锡槽高温段专用的底部大砖的制备方法,其特征在于:包括如下步骤:
(1)合成料的制备:
将苏州土、铝矾土、莫来石和结合剂混合成型后经高温煅烧后粉碎,即得合成料;
(2)浇筑成型:
将合成料、耐火水泥、烧结刚玉、莫来石细粉和微硅粉加水完全混合后倒入固定模具中,经高频震动成型,得到坯体;
(3)脱模干燥:
待坯体固化后进行脱模,经自然养护烘干后进行烧成,得到新型浮法玻璃窑锡槽高温段专用的底部大砖。
4.根据权利要求3所述的新型浮法玻璃窑锡槽高温段专用的底部大砖的制备方法,其特征在于:步骤(1)中所述的合成料的粒径为3-5mm。
5.根据权利要求3所述的新型浮法玻璃窑锡槽高温段专用的底部大砖的制备方法,其特征在于:步骤(1)中所述的高温煅烧温度为1500-1600℃,时间为16-18h。
6.根据权利要求3所述的新型浮法玻璃窑锡槽高温段专用的底部大砖的制备方法,其特征在于:步骤(2)中所述的水的加入量为原料总质量的4-7%。
7.根据权利要求3所述的新型浮法玻璃窑锡槽高温段专用的底部大砖的制备方法,其特征在于:步骤(2)中所述的高频震动的频率大于100次/分钟。
8.根据权利要求3所述的新型浮法玻璃窑锡槽高温段专用的底部大砖的制备方法,其特征在于:步骤(3)中所述的烧成条件为:将烘干后坯体放入高温窑炉10小时持续升温至500℃恒温3小时,12小时升温至1000℃恒温3小时,12小时升温至1400℃恒温2小时,12小时逐渐降温至110℃,开窑后冷却。
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