CN111377515A - Method for decomposing hydrogen peroxide and apparatus using the same - Google Patents
Method for decomposing hydrogen peroxide and apparatus using the same Download PDFInfo
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- CN111377515A CN111377515A CN201911368807.XA CN201911368807A CN111377515A CN 111377515 A CN111377515 A CN 111377515A CN 201911368807 A CN201911368807 A CN 201911368807A CN 111377515 A CN111377515 A CN 111377515A
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B17/00—Sulfur; Compounds thereof
- C01B17/69—Sulfur trioxide; Sulfuric acid
- C01B17/90—Separation; Purification
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/22—Treatment of water, waste water, or sewage by freezing
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/30—Wastewater or sewage treatment systems using renewable energies
- Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy
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- Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
Abstract
The present invention aims to economically and efficiently treat hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide. The present disclosure includes: adding a vanadium sulfate solution into the waste liquid and stirring; standing the waste liquid for a specified time after the waste liquid reaches the peak temperature; and a method for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide, which comprises a step of cooling after standing. Also disclosed is an apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide, the apparatus having one or more decomposition tanks in which a decomposition reaction is performed, the decomposition tanks including: an inlet opening for introducing the waste liquid and/or vanadium sulfate into the decomposition tank; a stirring mechanism for stirring the waste liquid in the decomposition reaction in the decomposition tank; an opening for discharging oxygen generated by the decomposition reaction; a thermometer for measuring a peak temperature of the waste liquid in the decomposition reaction; and a cooling mechanism for cooling the waste liquid after the decomposition reaction.
Description
Technical Field
The present invention relates to a method for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide discharged from a semiconductor manufacturing process or the like, and an apparatus using the same.
Background
In a wafer cleaning process in a semiconductor manufacturing process, a Hydrogen Peroxide sulfate Mixture (SPM) containing Sulfuric acid and Hydrogen Peroxide is used as a cleaning liquid. In this process, after the hydrogen peroxide sulfate mixture is used, the oxidizing power is restored by adding hydrogen peroxide to the hydrogen peroxide sulfate mixture and then used again as a cleaning liquid. However, during repeated use, the water content originating from the hydrogen peroxide increases, the sulfuric acid concentration in the sulfuric acid-hydrogen peroxide mixture decreases, and the cleaning power becomes weak, so that it is necessary to replace an appropriate liquid. The waste hydrogen peroxide sulfate mixture liquid discharged when the liquid is replaced contains hydrogen peroxide, and if the concentration exceeds a predetermined concentration, the waste hydrogen peroxide sulfate mixture liquid cannot be delivered as industrial waste (patent document 1).
As a method for decomposing hydrogen peroxide in a sulfuric acid waste liquid containing hydrogen peroxide, thermal decomposition of hydrogen peroxide using a large-scale facility (patent document 1), and particularly a method for decomposing hydrogen peroxide at a low concentration using metal vanadium or a vanadium compound as a catalyst (patent document 2) have been proposed.
Documents of the prior art
Patent document
Patent document 1: japanese laid-open patent publication No. 2013-208602
Patent document 2: japanese laid-open patent publication No. 2002-001358
Disclosure of Invention
However, when vanadium sulfate is used as a catalyst to decompose hydrogen peroxide in a sulfuric acid waste liquid, the present inventors have had to use an expensive sulfuric acid-resistant concentration meter in order to confirm whether hydrogen peroxide in the sulfuric acid waste liquid is decomposed to a predetermined concentration, and thus faced the problems of cost and complicated treatment.
That is, an object of the present invention is to economically and efficiently treat hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide.
In earnest studies for solving the above problems, the present inventors found that by including a step of adding a vanadium sulfate solution to a waste liquid and stirring; standing the waste liquid for a specified time after the waste liquid reaches the peak temperature; and a step of cooling after standing still to economically and efficiently treat hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide, and further studies have been made to complete the present invention.
That is, the present invention relates to the following.
1. A process for decomposing hydrogen peroxide in a waste stream comprising sulfuric acid and hydrogen peroxide, comprising: adding a vanadium sulfate solution into the waste liquid and stirring; standing the waste liquid for a specified time after the waste liquid reaches the peak temperature; and a step of cooling after standing.
2. The method for decomposing hydrogen peroxide as described in 1, the waste liquid is a sulfuric acid-hydrogen peroxide mixture waste liquid for cleaning a semiconductor wafer.
3. The method for decomposing hydrogen peroxide according to 1 or 2, wherein the hydrogen peroxide in the waste liquid is 1.6 to 10.0 weight percent.
4. The method for decomposing hydrogen peroxide according to any one of 1 to 3, wherein the waste liquid is divided into a volume of 40L.
5. The method for decomposing hydrogen peroxide according to any one of claims 1 to 4, wherein 0.05g to 0.25g of the vanadium sulfate solution is added to 1L of the waste liquid.
6. The method for decomposing hydrogen peroxide according to any one of claims 1 to 5, having a peak temperature of 40 ℃ to 130 ℃.
7. The method for decomposing hydrogen peroxide according to any one of 1 to 6, wherein the stirring is performed by bubbling.
8. The method for decomposing hydrogen peroxide according to any one of claims 1 to 7, wherein a standing time after reaching a peak temperature is 5 minutes or more with respect to decomposition of 1.6 to 10.0 weight percent of hydrogen peroxide in the waste liquid.
9. A method for regenerating a waste liquid containing sulfuric acid and hydrogen peroxide into industrial sulfuric acid by using the method for decomposing hydrogen peroxide of any one of 1 to 8.
10. An apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide, the apparatus having one or more decomposition tanks in which decomposition reactions are performed, the decomposition tanks comprising:
an inlet opening for introducing the waste liquid and/or vanadium sulfate into the decomposition tank;
a stirring mechanism for stirring the waste liquid in the decomposition reaction in the decomposition tank;
an opening for discharging oxygen generated by the decomposition reaction;
a thermometer for measuring a peak temperature of the waste liquid in the decomposition reaction; and
and the cooling mechanism is used for cooling the waste liquid after the decomposition reaction.
11. According to the apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide as described in claim 10, the amount of the waste liquid charged into the decomposition vessel is 80% or less of the capacity of the decomposition vessel.
12. The apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide according to claim 10 or 11, wherein the cooling means performs external cooling using cold water.
13. The apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide according to any one of claims 10 to 12, which is an automated apparatus.
The method of the present invention does not require large-scale equipment and does not require a high-priced hydrogen peroxide concentration meter and time-consuming concentration measurement using the same, and thus can economically and efficiently decompose and treat hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide.
Further, the method of the present invention can treat the waste liquid in the state of the stock solution without neutralizing or diluting the waste liquid, and therefore can suppress the amount of the solution generated after the treatment.
In addition, according to the method of the present invention, the waste liquid is divided into predetermined amounts and treated by using a plurality of decomposition tanks, whereby the waste liquid can be safely treated even if the concentration of hydrogen peroxide is high.
Furthermore, the above method can be automatically performed by the apparatus of the present invention, and the continuous hydrogen peroxide decomposition treatment can be simply and accurately performed.
Drawings
Fig. 1 shows the structure of a decomposition tank of a hydrogen peroxide decomposition device according to the present invention.
Description of reference numerals
1: hydrogen peroxide decomposition device
2: decomposing tank
3: opening for input
4: stirring mechanism
5: discharge opening
6: temperature meter
7: cooling mechanism
Detailed Description
Hereinafter, the present invention will be described in detail based on preferred embodiments thereof.
The present invention relates to a process for decomposing hydrogen peroxide in a waste liquid comprising sulphuric acid and hydrogen peroxide, said process comprising: adding a vanadium sulfate solution into the waste liquid and stirring; standing the waste liquid for a specified time after the waste liquid reaches the peak temperature; and a step of cooling after standing.
The present invention also relates to an apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide, which is used in the above method.
The above apparatus has one or more than two decomposition tanks in which decomposition reactions are carried out. And, the decomposition tank includes: an inlet opening for introducing the waste liquid and/or vanadium sulfate into the decomposition tank; a stirring mechanism for stirring the waste liquid in the decomposition reaction in the decomposition tank; an opening for discharging oxygen generated by the decomposition reaction; a thermometer for measuring a peak temperature of the waste liquid in the decomposition reaction; and a cooling mechanism for cooling the waste liquid after the decomposition reaction.
The decomposition reaction of hydrogen peroxide in the decomposition tank of the present invention by contacting the waste liquid with vanadium sulfate is as follows:
H2O2→H2O+(1/2)O2(formula 1)
In the reaction of formula 1, vanadium sulfate is used as a catalyst for the decomposition reaction of hydrogen peroxide, and vanadium sulfate itself does not react. The reaction is exothermic.
In the present invention, the waste liquid and the vanadium sulfate solution are sequentially introduced into the decomposition tank through the introduction opening and stirred by the stirring mechanism.
The waste liquid used in the present invention contains sulfuric acid and hydrogen peroxide. The concentration of sulfuric acid is not particularly limited, for example, about 70 weight percent. The concentration of hydrogen peroxide is also not particularly limited, but is preferably 10.0% by weight or less, more preferably 7.0% by weight or less, still more preferably 1.6 to 10.0% by weight, and particularly preferably 1.6 to 7.0% by weight. The waste stream may contain components other than sulfuric acid and hydrogen peroxide.
The type of the waste liquid is not particularly limited as long as the waste liquid contains sulfuric acid and hydrogen peroxide, and examples thereof include a waste liquid of a mixture of sulfuric acid and hydrogen peroxide for cleaning a wafer of a semiconductor, a chemical polishing liquid, and the like.
In the case where the waste liquid is a hydrogen peroxide sulfate mixture waste liquid used for cleaning a wafer of a semiconductor, the amount of the waste liquid generated per day is not particularly limited, and is, for example, 1000L to 4000L.
In the case where a large amount of waste liquid is treated with one decomposition tank, particularly when the concentration of hydrogen peroxide in the waste liquid is high, a severe decomposition reaction proceeds, and a danger may occur in the waste liquid treatment operation. Therefore, from the viewpoint of safe disposal, it is preferable to divide the waste liquid into predetermined amounts and decompose the hydrogen peroxide in the waste liquid by using a plurality of decomposition vessels, and the amount of hydrogen peroxide may be, for example, 40L, although not particularly limited. By dividing the waste liquid into predetermined amounts and treating the same, the waste liquid can be safely treated even if the concentration of hydrogen peroxide is high. Also, since the decomposition reactions in the respective decomposers are independent of each other, even if a hazard occurs in one decomposer, the other decomposers are not affected, and the hazard accompanying the waste liquid treatment operation can be minimized.
The solvent of the vanadium sulfate solution used in the present invention is not particularly limited as long as hydrogen peroxide in the waste liquid can be decomposed.
The amount of the vanadium sulfate solution used is not particularly limited, but is preferably 0.05g to 0.25g per 1L of the waste liquid. If the amount is more than 0.25g, the decomposition of hydrogen peroxide is excessively promoted, which may cause a risk in the waste liquid treatment operation. On the other hand, if the amount is less than 0.05g, the decomposition reaction of hydrogen peroxide does not proceed sufficiently.
The material of the decomposition vessel used in the present invention is not particularly limited as long as it has strong acid resistance, and examples thereof include resin-lined metal, glass-lined metal, and fluororesin, and glass-lined metal is preferable.
The shape of the decomposition vessel is not particularly limited as long as it does not interfere with the decomposition of hydrogen peroxide in the waste liquid containing sulfuric acid and hydrogen peroxide, and examples thereof include a cylindrical shape and a box shape. The cylindrical shape is preferable from the viewpoint of easy stirring.
The size of the decomposition vessel is not particularly limited as long as hydrogen peroxide in the waste liquid containing sulfuric acid and hydrogen peroxide can be safely decomposed, and is, for example, phi 300mm × H700mm, and the amount of the waste liquid charged into the decomposition vessel is not particularly limited as long as the waste liquid can be safely handled, and is preferably 80% or less of the capacity of the decomposition vessel, for example, 40L.
The opening for introducing the waste liquid and the vanadium sulfate solution may be the same or different. The opening for input can be opened and closed.
The stirring mechanism used in the present invention is not particularly limited as long as the waste liquid can be brought into effective contact with vanadium sulfate to promote the decomposition reaction of hydrogen peroxide in the waste liquid, and examples thereof include a stirrer, bubbling and the like. Since sulfuric acid is contained in the waste liquid, in the case of using a metal stirring mechanism, dissolution or corrosion of metal by sulfuric acid may occur. Therefore, bubbling is preferred from the viewpoint of not using a metal.
When bubbling is used as the stirring means, the flow rate of air is not particularly limited as long as the waste liquid is brought into effective contact with vanadium sulfate to promote the decomposition reaction of hydrogen peroxide in the waste liquid and the decomposition reaction can be safely carried out. Further, if the bubbling is continuously performed, the decomposition reaction may be vigorously generated, and therefore, the bubbling is preferably performed intermittently.
Oxygen generated by the decomposition reaction is discharged through the discharge opening. The discharge opening for discharging oxygen may be the same as or different from the discharge opening for charging the waste liquid and/or the vanadium sulfate solution.
In the present invention, the peak temperature of the waste liquid during the decomposition reaction is measured with a thermometer and then left for a predetermined time.
The peak temperature of the waste liquid measured in the present invention represents the maximum temperature of the waste liquid heated by the heat generated by the decomposition reaction of hydrogen peroxide, and when the temperature of the waste liquid starts to decrease, the temperature before the start of the decrease is regarded as the maximum temperature of the waste liquid.
The mechanism for measuring the temperature of the waste liquid used in the present invention is not particularly limited, but a thermocouple sensor coated with a fluororesin or the like is preferable.
The peak temperature depends on the concentration of hydrogen peroxide in the waste stream, e.g. 40-130 ℃ relative to 2.0-8.0 weight percent hydrogen peroxide. From the viewpoint of safely carrying out the decomposition reaction, the peak temperature is preferably 80 ℃ or lower.
The decomposition reaction of hydrogen peroxide continues even in the standing step. According to the experimentally known relationship between the peak temperature and the standing time taken to reduce hydrogen peroxide to a prescribed concentration, it is possible to reduce hydrogen peroxide to a prescribed concentration only by standing. The above step eliminates the need for a high-price concentration meter for continuously measuring the hydrogen peroxide concentration in the waste liquid, so that the decomposition reaction of hydrogen peroxide can be economically and effectively suppressed.
In one embodiment, the standing time is 5 minutes or more with respect to the concentration of hydrogen peroxide in the waste liquid of 1.6 to 10.0 weight percent.
In the present invention, after standing, cooling is performed by a cooling mechanism.
The cooling used in the present invention is performed after standing, and its main function is to completely terminate the decomposition reaction and lower the temperature of the waste liquid to a safe temperature. The decomposition reaction is still in progress during the standing, and if cooling is performed during the standing, the cooling is not performed during the standing but is started after the standing because the decomposition reaction may be terminated and cannot be allowed to proceed to a predetermined hydrogen peroxide concentration.
The cooling mechanism used in the present invention is not particularly limited as long as it can lower the waste liquid, which has terminated the decomposition reaction of hydrogen peroxide, to a safe temperature without changing the composition of the waste liquid, and it is preferable to perform external cooling with cold water. Further, in the case where the external cooling is performed by cold water, the decomposition tank may have a two-tank structure so that the cooling water can pass through the outer package of the decomposition tank. Further, it is preferable to use a glass liner or the like inside the decomposition tank because cooling efficiency can be improved.
The hydrogen peroxide concentration in the liquid obtained after application of the process of the invention is preferably 0.5 weight percent or less, particularly preferably 0.1 weight percent or less.
Further, the present invention relates to a process for regenerating sulfuric acid from a waste liquid containing sulfuric acid and hydrogen peroxide using the process of the present invention.
In one embodiment, the method of the invention can be performed using the automated apparatus of the invention.
Examples
Next, the etching liquid composition of the present invention will be described in more detail by the following examples and comparative examples, but the present invention is not limited thereto.
A waste liquid (70 wt% sulfuric acid, 7 wt% or less hydrogen peroxide) containing sulfuric acid and hydrogen peroxide discharged from a wafer cleaning process in semiconductor manufacture at 2800L/day was treated, and 6 hydrogen peroxide decomposition devices (manufactured by kanto engineering) having the structure of fig. 1 were prepared, and the hydrogen peroxide decomposition devices were housed in a PVC resin box, and had an outer diameter of about D1200mm × W3000mm × H2000mm and a capacity of each decomposition tank of 23L.
The treatment of 1 batch of 1 decomposition tank was set to 1 hour and all 6 tanks were set to automatic continuous operation. The automated process flow for 1 batch of 1 decomposers is as follows. When the automatic operation of the apparatus started, waste liquid was charged from the wastewater treatment tank, and 3g of vanadium sulfate was charged from the decomposing agent tank. Bubbling was performed intermittently in the decomposition tank, and after measuring 40 ℃, bubbling was completely stopped. And after measuring the peak temperature, the decomposition tank was left standing for 15 minutes. After standing, cold water was circulated, and the outside of the decomposition tank was cooled until the liquid temperature in the decomposition tank reached 35 ℃. After cooling, a waste liquid containing the decomposed vanadium sulfate is discharged from the decomposition tank and stored in a storage tank. And, the cooling water is additionally discharged. The hydrogen peroxide concentration of the decomposed waste liquid is 0.1 weight percent or less.
The above operation was carried out in all 6 tanks, and about 3000L of treatment was completed in 24 hours.
Claims (13)
1. A method for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide, comprising:
adding a vanadium sulfate solution into the waste liquid and stirring;
standing the waste liquid for a specified time after the waste liquid reaches the peak temperature; and
and (5) after standing, cooling.
2. The method for decomposing hydrogen peroxide according to claim 1, wherein the waste liquid is a hydrogen peroxide sulfate mixture waste liquid for cleaning a semiconductor wafer.
3. The method for decomposing hydrogen peroxide according to claim 1 or 2, wherein the hydrogen peroxide in the waste liquid is 1.6 to 10.0% by weight.
4. The method for decomposing hydrogen peroxide according to any one of claims 1 to 3, characterized in that the waste liquid is divided into a capacity of 40L.
5. The method for decomposing hydrogen peroxide according to any one of claims 1 to 4, characterized in that 0.05g to 0.25g of a vanadium sulfate solution is added with respect to 1L of the waste liquid.
6. The method for decomposing hydrogen peroxide according to any one of claims 1 to 5, characterized in that the peak temperature is 40 ℃ to 130 ℃.
7. The method for decomposing hydrogen peroxide according to any one of claims 1 to 6, characterized in that the stirring is performed by bubbling.
8. The method for decomposing hydrogen peroxide according to any one of claims 1 to 7, characterized in that the standing time after reaching the peak temperature is 5 minutes or more with respect to the decomposition of 1.6 to 10.0 weight percent of hydrogen peroxide in the waste liquid.
9. A method for regenerating a waste liquid containing sulfuric acid and hydrogen peroxide into industrial sulfuric acid, characterized in that the waste liquid containing sulfuric acid and hydrogen peroxide is regenerated into industrial sulfuric acid by using the method for decomposing hydrogen peroxide according to any one of claims 1 to 8.
10. An apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide, the apparatus having one or more decomposition tanks in which decomposition reactions are performed, the decomposition tanks comprising:
an inlet opening for introducing the waste liquid and/or vanadium sulfate into the decomposition tank;
a stirring mechanism for stirring the waste liquid in the decomposition reaction in the decomposition tank;
an opening for discharging oxygen generated by the decomposition reaction;
a thermometer for measuring a peak temperature of the waste liquid in the decomposition reaction; and
and the cooling mechanism is used for cooling the waste liquid after the decomposition reaction.
11. The apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide according to claim 10, wherein an amount of the waste liquid charged into the decomposition vessel is 80% or less of a capacity of the decomposition vessel.
12. The apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide according to claim 10 or 11, wherein the cooling mechanism performs external cooling using cold water.
13. The apparatus according to any one of claims 10 to 12, wherein the apparatus is an automated apparatus for decomposing hydrogen peroxide in a waste liquid containing sulfuric acid and hydrogen peroxide.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018248406A JP7219088B2 (en) | 2018-12-28 | 2018-12-28 | Method for decomposing hydrogen peroxide and apparatus for use in said method |
| JP2018-248406 | 2018-12-28 |
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| Publication Number | Publication Date |
|---|---|
| CN111377515A true CN111377515A (en) | 2020-07-07 |
| CN111377515B CN111377515B (en) | 2023-06-27 |
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| CN201911368807.XA Active CN111377515B (en) | 2018-12-28 | 2019-12-26 | Method for decomposing hydrogen peroxide and apparatus using the same |
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| JP (1) | JP7219088B2 (en) |
| KR (1) | KR20200083322A (en) |
| CN (1) | CN111377515B (en) |
| TW (1) | TW202035279A (en) |
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| CN113336198B (en) * | 2021-08-05 | 2021-10-15 | 清大国华环境集团股份有限公司 | Method and system for recycling waste sulfuric acid in integrated circuit industry |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1223971A (en) * | 1997-12-01 | 1999-07-28 | 索尼株式会社 | Method for utilizing sulfuric acid/peroxide liquid mixture |
| JPH11319849A (en) * | 1998-05-15 | 1999-11-24 | Sony Corp | Mixed medicinal liquid treating apparatus for treating chemical liquid containing sulfuric acid and peroxide |
| JP2002001358A (en) * | 2000-06-20 | 2002-01-08 | Mitsubishi Gas Chem Co Inc | Hydrogen peroxide decomposing method for chemical polishing waste liquid |
| CN105293449A (en) * | 2015-10-30 | 2016-02-03 | 上海新阳半导体材料股份有限公司 | Method for recycling sulfuric acid from waste acid obtained through semiconductor cleaning process |
| CN108793095A (en) * | 2018-09-26 | 2018-11-13 | 高频美特利环境科技（北京）有限公司 | Solution impurity-removing method and solution impurity removed system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5954530B2 (en) | 2012-03-30 | 2016-07-20 | 栗田工業株式会社 | Sulfuric acid waste liquid treatment apparatus and sulfuric acid waste liquid treatment method |
-
2018
- 2018-12-28 JP JP2018248406A patent/JP7219088B2/en active Active
-
2019
- 2019-12-26 TW TW108147802A patent/TW202035279A/en unknown
- 2019-12-26 CN CN201911368807.XA patent/CN111377515B/en active Active
- 2019-12-27 KR KR1020190176382A patent/KR20200083322A/en unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1223971A (en) * | 1997-12-01 | 1999-07-28 | 索尼株式会社 | Method for utilizing sulfuric acid/peroxide liquid mixture |
| JPH11319849A (en) * | 1998-05-15 | 1999-11-24 | Sony Corp | Mixed medicinal liquid treating apparatus for treating chemical liquid containing sulfuric acid and peroxide |
| JP2002001358A (en) * | 2000-06-20 | 2002-01-08 | Mitsubishi Gas Chem Co Inc | Hydrogen peroxide decomposing method for chemical polishing waste liquid |
| CN105293449A (en) * | 2015-10-30 | 2016-02-03 | 上海新阳半导体材料股份有限公司 | Method for recycling sulfuric acid from waste acid obtained through semiconductor cleaning process |
| CN108793095A (en) * | 2018-09-26 | 2018-11-13 | 高频美特利环境科技（北京）有限公司 | Solution impurity-removing method and solution impurity removed system |
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| Publication number | Publication date |
|---|---|
| TW202035279A (en) | 2020-10-01 |
| JP7219088B2 (en) | 2023-02-07 |
| JP2020104086A (en) | 2020-07-09 |
| KR20200083322A (en) | 2020-07-08 |
| CN111377515B (en) | 2023-06-27 |
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