CN111351442A - Film thickness control method, device, device and computer readable storage medium - Google Patents

Abstract

The invention discloses a film thickness control method, a device, equipment and a computer-readable storage medium, wherein the control method comprises the following steps: setting the test thickness of the film layer, and coating the film according to the test thickness to obtain a film layer to be tested; detecting the film layer to be detected to obtain the detection thickness of the film layer to be detected; comparing the test thickness with the detection thickness to obtain a scale factor; and determining the film thickness value set during film coating according to the scale factor. The invention can effectively avoid contact measurement, thereby avoiding the surface damage of the film sample to be measured.

Description

Film thickness control method, device, device and computer readable storage medium

technical field

The present invention relates to the technical field of film thickness detection, and in particular, to a film thickness control method, device, device and computer-readable storage medium.

Background technique

At present, during the coating process or after the coating is finished, the thickness of the film sample to be measured is usually detected by the step test method. The step test method mainly uses a step tester, in which one or more probes with probes are installed to test The surface of the film sample is scanned by lateral contact. During the scanning process, the probe will move up and down with the tiny peaks and valleys on the surface of the film sample to be measured. The surface morphology of the thin film sample to be tested is drawn, and the film thickness of the thin film sample to be tested is measured.

However, when using the step tester of the step test method to test the thin film sample to be tested, the probe will contact the surface of the thin film sample to be tested, and the surface of the thin film sample to be tested is easily damaged when it contacts the surface of the thin film sample to be tested.

The above content is only used to assist the understanding of the technical solutions of the present application, and does not mean that the above content is the prior art.

SUMMARY OF THE INVENTION

Based on this, it is necessary to provide a film thickness control method, device, equipment and computer-readable storage medium for the problem that the probe of the step meter is easy to damage the surface of the thin film sample to be measured by using the step meter for thickness measurement. It can effectively avoid contact measurement, thereby avoiding surface damage of the film sample to be measured.

In order to achieve the above purpose, the present invention proposes a method for controlling the thickness of a film layer, wherein the steps of the control method include:

Set the test thickness of the film layer, and perform coating according to the test thickness to obtain the film layer to be tested;

Detecting the film layer to be tested to obtain the detected thickness of the film layer to be tested;

Comparing the test thickness and the detection thickness to obtain a scale factor;

The film thickness value set during coating is determined according to the scale factor.

Optionally, the step of detecting the film layer to be measured to obtain the detected thickness of the film layer to be measured includes:

Perform spectral detection on the film layer to be measured to obtain first reflection data or first transmission data of the film layer to be measured;

According to the first reflection data or the first transmission data, the detected thickness of the to-be-measured film layer is calculated.

Optionally, the step of calculating the detected thickness of the film layer to be measured according to the first reflection data or the first transmission data includes:

obtaining a first optical curve of light wavelength and reflectivity or light wavelength and transmittance according to the first reflection data or the first transmission data;

According to the first optical curve, the detected thickness of the to-be-measured film layer is calculated.

Optionally, the step of calculating the detected thickness of the film layer to be measured according to the first optical curve includes:

Selecting the peaks and/or troughs of the first optical curve to obtain the refractive index and extinction coefficient corresponding to the peaks and/or the troughs;

According to the wavelength of light corresponding to the wave peak and/or the wave trough, the refractive index and the extinction coefficient, the detected thickness of the film layer to be measured is calculated.

Optionally, the film layer is plated on the surface of the transparent substrate;

Before the step of calculating the detected thickness of the film layer to be measured according to the first optical curve, the method includes:

Perform spectral detection on the coating surface of the transparent substrate to obtain second reflection data or second transmission data of the coating surface of the transparent substrate;

obtaining a second optical curve according to the second reflection data or the second transmission data;

The step of calculating the detected thickness of the film layer to be measured according to the first optical curve further includes:

Combining the first optical curve and the second optical curve, the detected thickness of the film layer to be measured is calculated.

Optionally, before the step of setting the test thickness of the film layer, performing coating according to the test thickness, and obtaining the film layer to be tested, comprising:

Set the first operating parameters of the coating equipment;

Before the step of determining the film thickness value set during coating according to the scale factor, the steps include:

Setting the second operating parameter of the coating device, and determining that the first operating parameter and the second operating parameter are consistent.

Optionally, the step of determining the film thickness value set during coating according to the scale factor includes:

The design thickness of the film layer is designed, and the design thickness and the scale factor are combined to determine the film thickness value set during film coating.

Optionally, after the step of determining the film thickness value set during coating according to the scale factor, the step includes:

Fitting to form a first spectral curve according to the set value of the film thickness;

Perform spectral detection on the film layer coated according to the set film thickness value to obtain a second spectral curve;

The first spectral curve and the second spectral curve are compared and analyzed to detect whether the thickness of the coating film meets the requirements.

In addition, in order to achieve the above object, the present invention also provides a coating device, which includes: a memory, a processor, and a film thickness control program stored on the memory and running on the processor; When the film thickness control program is executed by the processor, the steps of the film thickness control method as described above are implemented.

In addition, in order to achieve the above object, the present invention also provides a computer-readable storage medium, where a film thickness control program is stored on the computer-readable storage medium, and the film thickness control program is executed by a processor to achieve the above The steps of the film thickness control method.

In the technical scheme proposed by the present invention, by setting the test thickness of the film layer, a film coating operation is performed on the surface of the substrate according to the test thickness, and the film layer to be tested is obtained after the film coating; The detection thickness of the film layer to be tested; the test thickness and the detection thickness are compared to obtain a scale factor; the test thickness and the detection thickness have certain errors due to the influence of the process conditions, and the same coating film Under the conditions, the error of the test thickness and the detection thickness is unchanged, it can be seen that the scale factor obtained by comparing the test thickness and the detection thickness is also unchanged. The design needs to meet the thickness of the film required by the coating. The film thickness value set when the film is coated is determined according to the scale factor, and the film is coated according to the set film thickness value, and the obtained film thickness can meet the coating design requirements. Through this According to the scale factor, there is no need to touch the surface of the film to be tested, thereby avoiding damage to the film.

Description of drawings

In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention, and for those of ordinary skill in the art, other drawings can also be obtained according to the structures shown in these drawings without creative efforts.

1 is a schematic flowchart of a first embodiment of a film thickness control method according to the present invention;

2 is a schematic flowchart of a second embodiment of the method for controlling the thickness of a film layer according to the present invention;

3 is a schematic flowchart of a third embodiment of a method for controlling film thickness of the present invention;

FIG. 4 is a schematic flowchart of a fourth embodiment of the film thickness control method of the present invention;

FIG. 5 is a schematic flowchart of a fifth embodiment of the film thickness control method of the present invention;

6 is a schematic flowchart of a sixth embodiment of a method for controlling film thickness of the present invention;

FIG. 7 is a schematic flowchart of a seventh embodiment of a method for controlling film thickness of the present invention;

FIG. 8 is a schematic flowchart of an eighth embodiment of a method for controlling film thickness of the present invention;

9 is a schematic diagram of a first optical curve and a second optical curve in the film thickness control method of the present invention;

10 is a schematic diagram of the first optical curve and the second optical curve when the design thickness is 40 nm in the film thickness control method of the present invention;

11 is a schematic diagram of the first optical curve and the second optical curve when the design thickness is 20 nm in the film thickness control method of the present invention;

FIG. 12 is a schematic diagram of the first optical curve and the second optical curve when the design thickness is 16 nm in the film thickness control method of the present invention.

The realization, functional characteristics and advantages of the present invention will be further described with reference to the accompanying drawings in conjunction with the embodiments.

Detailed ways

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present invention are only used to explain the relationship between various components under a certain posture (as shown in the accompanying drawings). The relative positional relationship, the movement situation, etc., if the specific posture changes, the directional indication also changes accordingly.

In addition, descriptions such as "first", "second", etc. in the present invention are only for descriptive purposes, and should not be construed as indicating or implying their relative importance or implicitly indicating the number of indicated technical features. Thus, a feature delimited with "first", "second" may expressly or implicitly include at least one of that feature. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless otherwise expressly and specifically defined.

In the present invention, unless otherwise expressly specified and limited, the terms "connected", "fixed" and the like should be understood in a broad sense, for example, "fixed" may be a fixed connection, a detachable connection, or an integrated; It can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be an internal communication between two elements or an interaction relationship between the two elements, unless otherwise explicitly defined. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific situations.

In addition, the technical solutions between the various embodiments of the present invention can be combined with each other, but must be based on the realization by those of ordinary skill in the art. When the combination of technical solutions is contradictory or cannot be realized, it should be considered that the combination of technical solutions does not exist and is not within the scope of protection claimed by the present invention.

Referring to FIG. 1, the first embodiment of the present invention is a method for controlling the thickness of a film layer. The steps of the control method include:

Step S10, set the test thickness of the film layer, perform coating according to the test thickness, and obtain the film layer to be tested; specifically, set the test thickness of the film layer, usually the test thickness of the film layer is thicker, generally reaching several hundreds of nanometers or more, For example 400 nanometers. According to the coating process steps, a film is coated on the substrate, and a film layer to be measured is formed on the substrate. In addition, the coating process steps usually include confirming whether the hardware and software of the equipment can work normally, cleaning the coating chamber, adding coating materials, installing the coating substrate, vacuuming to the coating conditions, confirming the coating parameters, and starting the coating equipment for coating. Operation. The principles of coating include vacuum sputtering and magnetron sputtering.

In step S20, the film layer to be measured is detected to obtain the detection thickness of the film layer to be measured; specifically, after the coating is completed, the coated substrate is taken out, and the film layer to be measured is detected, for example, by non-contact methods such as spectral detection, The obtained optical curve can be analyzed to calculate the detection thickness of the film to be tested. Usually, the film to be tested is a single-layer film (in other cases, it can be a multi-layer or ultra-multi-layer film). The measuring layer can better detect its thickness. The spectral detection method can also avoid touching the surface of the film to be measured and avoid scratches.

In addition, the main purpose of the film to be tested is to calculate the scale factor. It can be understood that the film to be tested is a sample and is not used in actual products. Therefore, the thickness of the film to be tested can also be measured in a contact way. , such as the step test method.

Step S30, comparing the test thickness and the detection thickness to obtain a scale factor; specifically, the test thickness is a set value, which can be understood as a theoretical value, while the detection thickness is obtained by measurement and can be understood as an actual value, generally speaking , there is a certain error between the theoretical value and the actual value, that is to say, there is a certain error between the test thickness and the test thickness, for example, the test thickness may be greater than the test thickness, the test thickness may also be smaller than the test thickness, or the two may be equal. Under the same operating parameters of the coating equipment, the scaling factor is usually the same, that is, when the set test thickness decreases, the test thickness also decreases, and the set test thickness increases, and the test thickness also increases.

Step S40, determining the film thickness value set during film coating according to the scale factor. Since the scale factor is fixed, before the coating production, the scale factor is measured and obtained. According to the scale factor, the film thickness value input on the coating equipment during coating is calculated, that is, the set film thickness value, which is obtained by coating according to the film thickness value. The film layer is the film layer required for production. In this way, the scale factor is used to avoid film thickness measurement during coating, saving testing time and improving coating production efficiency.

In the technical solution proposed in this embodiment, by setting the test thickness of the film layer, a film coating operation is performed on the surface of the substrate according to the test thickness, and the film layer to be tested is obtained after the film coating; The detected thickness of the film layer to be tested; the tested thickness and the detected thickness are compared to obtain a scale factor; the tested thickness and the detected thickness have a certain error due to the influence of the process conditions, and the same Under the coating conditions, the error between the test thickness and the detection thickness is unchanged, so it can be seen that the proportional factor obtained by comparing the test thickness and the detection thickness is also unchanged. The design needs to meet the thickness of the film required by the coating. The film thickness value set when the film is coated is determined according to the scale factor, and the film is coated according to the set film thickness value, and the obtained film thickness can meet the coating design requirements. Through this According to the scale factor, there is no need to touch the surface of the film to be tested, thereby avoiding damage to the film.

Referring to FIG. 2 , on the basis of the first embodiment, a second embodiment of the present invention is proposed. The step S20 of detecting the film layer to be measured and obtaining the detected thickness of the film layer to be measured includes:

Step S21, performing spectral detection on the film layer to be measured to obtain first reflection data or first transmission data of the film layer to be measured.

The data of spectral detection of film layers of different materials are also different, so the film layers targeted in this embodiment are of the same material, such as titanium oxide. Through spectral detection, the first reflection data or first transmission data of the film to be measured can be obtained, and the corresponding characteristics of the film to be measured, including optical constants, can be calculated from the first reflection data and the first transmission data.

Step S22, calculating the detection thickness of the film layer to be measured according to the first reflection data or the first transmission data.

According to the first reflection data or the first transmission data, calculate the optical constants of the film to be measured by the envelope method, record and save these calculated optical constants, and calculate the optical constants of these materials through the optical design software. The detection thickness of the film to be measured. Referring to FIG. 3 , on the basis of the second embodiment, a third embodiment of the present invention is proposed. According to the first reflection data or the first transmission data, the step S22 of calculating the detection thickness of the film layer to be tested includes: :

Step S220, according to the first reflection data or the first transmission data, obtain the first optical curve of light wavelength and reflectivity or light wavelength and transmittance; specifically, the reflectivity or transmittance of different light wavelengths on the film to be measured Differently, according to the first reflection data or the first transmission data, a continuous reflection curve of light wavelength and reflectivity, or a transmission curve of light wavelength and transmittance is generated in the range of light wavelength from small to large, the reflection curve and The transmission curve is the first optical curve. Light wavelengths generally range from ultraviolet to infrared, eg, 350 nm to 1150 nm.

Step S221, calculating the detected thickness of the film layer to be measured according to the first optical curve.

Similarly, according to the first optical curve, the optical constants of the film to be measured are calculated by the envelope method, the optical constants obtained by these calculations are recorded and saved, and the film to be measured is calculated by combining these optical constants with optical software. detection thickness.

Referring to FIG. 4 , on the basis of the third embodiment, a fourth embodiment of the present invention is proposed. According to the first optical curve, the step S221 of calculating the detection thickness of the film layer to be measured includes:

Step S221a, select the peaks and/or troughs of the first optical curve, and obtain the refractive index and extinction coefficient corresponding to the peaks and/or troughs; the first optical curve is not a smooth curve, that is, the first optical curve itself is up and down. fluctuating, thereby forming several peaks and troughs, the peaks refer to the high points of the fluctuation of the first optical curve, and the troughs refer to the low points of the fluctuations of the first optical curve. Generally speaking, the thicker the thickness of the film to be measured, the more peaks and troughs are included in the formation of the first optical curve, the more data points can be selected, and the more accurate the measurement result will be.

In step S221b, the detection thickness of the film layer to be measured is calculated according to the wavelength of light, the refractive index and the extinction coefficient corresponding to the peaks and/or troughs. Specifically, the optical constants include the light wavelengths of the peaks or troughs, and the refractive index and extinction coefficient corresponding to the light wavelengths. You can choose the light wavelength corresponding to the peak, the light wavelength corresponding to the trough, or the light wavelength corresponding to the combination of the peak and the trough, and bring the corresponding light wavelength, refractive index and extinction coefficient into the optical software, and then calculate Get the detection thickness. Referring to Table 1, the peak or trough of the first optical curve corresponds to the refractive index and extinction coefficient, the thickness of the film to be tested is 400 nm, and the thickness calculated by the optical software is 392.62 nm.

Table I

Wavelength (nm) refractive index Extinction coefficient 414.85 2.61499 0.00211 446.94 2.55918 0.00144 491.32 2.49495 0.00076 548.55 2.43800 0.00047 628.23 2.40764 0.00043 742.12 2.40377 0.00034 915.79 2.39984 0.00029

Referring to FIG. 5 , on the basis of the third embodiment, a fifth embodiment of the present invention is proposed, and the film layer is plated on the surface of the transparent substrate;

Before step S221 of calculating the detected thickness of the film layer to be measured according to the first optical curve, the method includes:

In step S50, spectral detection is performed on the coating surface of the transparent substrate to obtain second reflection data or second transmission data of the coating surface of the transparent substrate; generally, the optical film layer does not exist alone, and is usually attached to the surface of the substrate, while the coated substrate usually As a transparent substrate, the optical characteristics of the light source will also change when the surface of the coated film layer is coated. Therefore, in order to accurately calculate the detection thickness, it is necessary to perform spectral detection on the transparent substrate to obtain the second reflection data of the coated surface of the transparent substrate or For the second transmission data, the transparent substrate may be transparent glass or transparent resin material; when using film surface reflection data and substrate reflection data, the coating substrate may also be opaque, such as a silicon wafer. It should be noted that when measuring the transmittance, it can be measured from both sides of the substrate. When measuring the reflection on one side, pay attention to the film surface and the non-film surface.

Step S60, obtaining a second optical curve according to the second reflection data or the second transmission data; fitting the first optical curve and the second optical curve together, and determining the first optical curve through the fitted graphs at the position of the second optical curve corresponding to the wave crest or wave trough.

Referring to Fig. 9, a1 represents the second optical curve, a2 represents the first optical curve, and according to the first optical curve, the step S221 of calculating the detected thickness of the film layer to be measured further includes:

Step S221c, combining the first optical curve and the second optical curve to calculate the detection thickness of the film layer to be measured. By combining the first optical curve and the second optical curve, the corresponding data value of the transparent substrate corresponding to the position of the first optical curve can be obtained, and the corresponding data value can be substituted into the optical software, which can be calculated more accurately. Measure the thickness of the film layer.

Referring to FIG. 6 , on the basis of any one of the first to fifth embodiments, a sixth embodiment of the present invention is proposed. The test thickness of the film layer is set, and the film is coated according to the test thickness to obtain the Before step S10 of measuring the film layer, it includes:

Step S70 , setting the first operating parameters of the coating equipment; specifically, the first operating parameters include conditions for reaching the vacuum degree, materials used, heating temperature, coating rate, and the like. In addition, the principle of coating is the same, such as vacuum sputtering or evaporation. Due to the performance differences of different coating equipment, the coating equipment is the same equipment.

Before step S40 of determining the film thickness value set during coating according to the scale factor, the steps include:

Step S80, setting the second operating parameter of the coating equipment, and determining that the first operating parameter is consistent with the second operating parameter. Specifically, the operating parameters, that is, the second operating parameters, also need to be set when the coating is performed by the coating equipment again. If the operating parameters change, it will easily affect the accuracy of the measurement results. Therefore, by confirming the settings of the second operating parameters, the first The second operation parameter is consistent with the first operation parameter, and the setting contents of the second operation parameter and the first operation parameter are also the same.

Referring to FIG. 7 , on the basis of any one of the first embodiment to the fifth embodiment, a seventh embodiment of the present invention is proposed. The step S40 of determining the film thickness value set during coating according to the scale factor, include:

Step S41 , design the design thickness of the film layer, and combine the design thickness and the scale factor to determine the film thickness value set during film coating.

Among them, the value of the scale factor is generally fixed. For example, the set test thickness of the film layer is 400nm, and the actual detection thickness obtained by the test is 392.62nm, then, T=400nm/392.62nm=1.019, where T represents the ratio factor. Through the film system design software, the design thickness d1 of the designed film layer is 40nm, then d2=d1*T=40nm*1.019=40.76nm, and d2 is the set film thickness value. Furthermore, according to the film system design software, the design thickness d1 of the designed film layer can be 20 nm, then d2=d1*T=20nm*1.019=20.38nm. The design thickness d1 of the film layer can also be designed to be 16 nm, then d2=d1*T=16nm*1.019=216.304nm.

Referring to FIG. 8 , on the basis of any one of the first to fifth embodiments, an eighth embodiment of the present invention is proposed, after step S40 of determining the film thickness value set during coating according to the scale factor ,include:

Step S90 , a first spectral curve is formed by fitting according to the set film thickness value; for example, the first spectral curve includes a transmission curve, and the first spectral curve is presented on the display interface through optical software or film system design software.

In step S91, spectral detection is performed on the film layer coated according to the set film thickness value to obtain a second spectral curve; similarly, the second spectral curve also includes a transmission curve, and the second spectral curve is calculated by optical software or film system design software. presented in the display interface.

Step S92, compare and analyze the first spectral curve and the second spectral curve to detect whether the thickness of the coating film meets the requirements. Through intuitive comparison or software analysis, it is judged whether the coating results meet the design requirements.

In FIG. 10 , a first spectral curve with a thickness of 40 nm is designed, the first spectral curve is a dotted line, and the second spectral curve is an actual measurement result.

In FIG. 11 , a first spectral curve with a thickness of 40 nm is designed, the first spectral curve is a dotted line, and the second spectral curve is an actual measurement result.

In FIG. 12 , the design thickness of the first spectral curve is 40 nm, the first spectral curve is a dotted line, and the second spectral curve is the actual measurement result.

The present invention also provides a coating device, comprising: a memory, a processor, and a film thickness control program stored on the memory and running on the processor; the film thickness control program is The processor implements the steps of the film thickness control method as described above when executed.

For the specific implementation of the coating apparatus of the present invention, reference may be made to the above-mentioned embodiments of the film thickness control method, and details are not described herein again.

This embodiment also provides a computer-readable storage medium, where a film thickness control program is stored on the computer-readable storage medium, and when the film thickness control program is executed by a processor, the film thickness as described above is realized The steps of the control method.

For the specific implementation manner of the computer-readable storage medium of the present invention, reference may be made to the above-mentioned embodiments of the film thickness control method, which will not be repeated here.

It should be noted that, herein, the terms "comprising", "comprising" or any other variation thereof are intended to encompass non-exclusive inclusion, such that a process, method, article or system comprising a series of elements includes not only those elements, It also includes other elements not expressly listed or inherent to such a process, method, article or system. Without further limitation, an element qualified by the phrase "comprising a..." does not preclude the presence of additional identical elements in the process, method, article or system that includes the element.

The above-mentioned serial numbers of the embodiments of the present invention are only for description, and do not represent the advantages or disadvantages of the embodiments.

From the description of the above embodiments, those skilled in the art can clearly understand that the method of the above embodiment can be implemented by means of software plus a necessary general hardware platform, and of course can also be implemented by hardware, but in many cases the former is better implementation. Based on such understanding, the technical solutions of the present invention can be embodied in the form of software products in essence or the parts that make contributions to the prior art, and the computer software products are stored in a storage medium (such as ROM/RAM) as described above. , magnetic disk, optical disc), including several instructions to make a terminal device (which may be a mobile phone, a computer, a server, or a network device, etc.) execute the methods described in the various embodiments of the present invention.

The above are only the preferred embodiments of the present invention, and are not intended to limit the scope of the present invention. Under the inventive concept of the present invention, the equivalent structure transformation made by the contents of the description and drawings of the present invention, or directly/indirectly applied to other All relevant technical fields are included in the scope of patent protection of the present invention.

Claims (10)

1. A film layer thickness control method, characterized in that the control method comprises the steps of:

setting the test thickness of the film layer, and coating the film according to the test thickness to obtain a film layer to be tested;

detecting the film layer to be detected to obtain the detection thickness of the film layer to be detected;

comparing the test thickness with the detection thickness to obtain a scale factor;

and determining the film thickness value set during film coating according to the scale factor.

2. The film thickness control method of claim 1, wherein the step of detecting the film to be detected to obtain the detected thickness of the film to be detected comprises:

performing spectrum detection on the film layer to be detected to obtain first reflection data or first transmission data of the film layer to be detected;

and calculating the detection thickness of the film layer to be detected according to the first reflection data or the first transmission data.

3. The film thickness control method of claim 2, wherein the step of calculating the detected thickness of the film to be measured according to the first reflection data or the first transmission data comprises:

obtaining a first optical curve of the optical wavelength and the reflectivity or the optical wavelength and the transmissivity according to the first reflection data or the first transmission data;

and calculating the detection thickness of the film layer to be detected according to the first optical curve.

4. The method for controlling film thickness according to claim 3, wherein the step of calculating the detected thickness of the film to be detected according to the first optical curve comprises:

selecting a peak and/or a trough of the first optical curve to obtain a refractive index and an extinction coefficient corresponding to the peak and/or the trough;

and calculating the detection thickness of the film layer to be detected according to the optical wavelength corresponding to the wave crest and/or the wave trough, the refractive index and the extinction coefficient.

5. The film thickness control method of claim 3, wherein the film is coated on the surface of a transparent substrate;

before the step of calculating the detection thickness of the film layer to be detected according to the first optical curve, the method comprises the following steps:

performing spectrum detection on the film coating surface of the transparent substrate to obtain second reflection data or second transmission data of the film coating surface of the transparent substrate;

obtaining a second optical curve according to the second reflection data or the second transmission data;

the step of calculating the detection thickness of the film layer to be detected according to the first optical curve further includes:

and combining the first optical curve and the second optical curve, and calculating to obtain the detection thickness of the film layer to be detected.

6. The method for controlling film thickness according to any one of claims 1 to 5, wherein the step of setting a test thickness of the film and performing the coating according to the test thickness to obtain the film to be tested comprises:

setting a first operating parameter of the coating equipment;

before the step of determining the film thickness value set during film coating according to the scale factor, the method comprises the following steps:

and setting a second operation parameter of the coating equipment, and determining that the first operation parameter is consistent with the second operation parameter.

7. The method for controlling film thickness according to any one of claims 1 to 5, wherein the step of determining the film thickness value set during the film plating according to the scaling factor comprises:

and designing the design thickness of the film layer, and combining the design thickness and the scale factor to determine the film thickness value set during film coating.

8. The method for controlling the thickness of the film layer according to any one of claims 1 to 5, wherein the step of determining the film thickness value set during the film coating according to the scale factor comprises the following steps:

fitting according to the set film thickness value to form a first spectrum curve;

performing spectrum detection on the film coated according to the set film thickness value to obtain a second spectrum curve;

and comparing and analyzing the first spectral curve and the second spectral curve, and detecting whether the thickness of the plated film layer meets the requirement.

9. A plating apparatus, characterized by comprising: the device comprises a memory, a processor and a film thickness control program which is stored on the memory and can run on the processor; the film thickness control program, when executed by the processor, implements the steps of the film thickness control method of any one of claims 1 to 8.

10. A computer-readable storage medium, having a film thickness control program stored thereon, which when executed by a processor, implements the steps of the film thickness control method of any one of claims 1 to 8.

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