CN116086329A - Acquisition method and acquisition device for film parameters and terminal equipment - Google Patents

Acquisition method and acquisition device for film parameters and terminal equipment Download PDF

Info

Publication number
CN116086329A
CN116086329A CN202310034394.1A CN202310034394A CN116086329A CN 116086329 A CN116086329 A CN 116086329A CN 202310034394 A CN202310034394 A CN 202310034394A CN 116086329 A CN116086329 A CN 116086329A
Authority
CN
China
Prior art keywords
film
layer
value
thickness
reflected light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202310034394.1A
Other languages
Chinese (zh)
Inventor
王帅
韩玉永
张宇帆
张雪娜
洪峰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Aisin Semiconductor Technology Co ltd
Original Assignee
Shenzhen Aisin Semiconductor Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Aisin Semiconductor Technology Co ltd filed Critical Shenzhen Aisin Semiconductor Technology Co ltd
Priority to CN202310034394.1A priority Critical patent/CN116086329A/en
Publication of CN116086329A publication Critical patent/CN116086329A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/213—Spectrometric ellipsometry

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The application discloses a method and a device for acquiring film parameters and terminal equipment. The method comprises the following steps: obtaining a functional relation of the film, wherein independent variables of the functional relation comprise thicknesses and optical constants of layers of the film, and dependent variables comprise reflected light polarization information of the film; substituting the estimated values of the thickness and the optical constant of each layer of the film into a functional relation to obtain an analog value of the reflected light polarization information of the film, wherein the estimated values of the thickness of each layer in at least two layers of the film meet a preset proportion; when the difference between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film meets a preset condition, the estimated value of the thickness of each layer of the film is taken as an actual value of the thickness, and the estimated value of the optical constant of each layer of the film is taken as an actual value of the optical constant. According to the method and the device, the actual values of the optical constants and the thicknesses of the layers of the film are obtained through fitting by the thickness estimated values meeting the preset proportion, so that the calculated actual values of the thicknesses and the optical constants are more accurate.

Description

Acquisition method and acquisition device for film parameters and terminal equipment
Technical Field
The application belongs to the technical field of film measurement, and particularly relates to a film parameter acquisition method, an acquisition device, terminal equipment and a computer readable storage medium.
Background
Elliptical polarization spectroscopy is a surface-sensitive, non-destructive and non-invasive multilayer film measurement technique that obtains the thickness and optical constants of a film sample by model fitting based on changes in polarization state of linearly polarized light after reflection by the film sample. However, in practical applications it is often found that the thickness and optical constants obtained are not accurate.
Disclosure of Invention
The application provides a method, a device, a terminal device and a computer readable storage medium for acquiring film parameters, wherein the calculated thickness and the actual value of the optical constant can be more accurate by fitting the thickness estimated value meeting the preset proportion to obtain the optical constant and the actual value of the thickness of each layer of the film.
In a first aspect, the present application provides a method for obtaining a film parameter, including:
obtaining a functional relation of the film, wherein independent variables of the functional relation comprise thicknesses of all layers of the film and optical constants of all layers, and the dependent variables of the functional relation comprise reflected light polarization information of the film;
substituting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer into a functional relation, and calculating to obtain the analog value of the reflected light polarization information of the film, wherein the estimated value of the thickness of each layer in at least two layers of the film meets the preset proportion;
when the difference between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film meets a preset condition, the estimated value of the thickness of each layer of the film is taken as an actual value of the thickness, and the estimated value of the optical constant of each layer of the film is taken as an actual value of the optical constant.
Optionally, after substituting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer into the functional relation, the obtaining method further includes:
when the difference value between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film does not meet the preset condition, adjusting the estimated value of the thickness of each layer of the film and the estimated value 5 of the optical constant of each layer;
and determining the estimated value after the adjustment of the thickness of each layer as a new estimated value of the thickness of each layer, determining the estimated value after the adjustment of the optical constant of each layer as a new estimated value of the optical constant of each layer, and returning to execute the step of substituting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer into a functional relation to calculate the analog value of the reflected light polarization information of the film.
0 optionally, adjusting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer,
comprising the following steps:
the estimated values of the thicknesses of the layers and the estimated values of the optical constants of the layers of the thin film are adjusted by a gradient descent method.
Optionally, the preset conditions include: the difference between the analog value and the experimental value of the polarization information of the reflected light is smaller than the error 5 threshold.
Optionally, the reflected light polarization information includes N, C and S;
where n=cos2ψ, c=sin2ψcosΔ, s=sin2ψsin Δ;
ψ represents the amplitude ratio angle of the reflected light of the elliptically polarized light on the film surface, and Δ represents the phase difference angle of the reflected light of the elliptically polarized light on the film surface.
0 optionally, before substituting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer into the functional relation, and calculating to obtain the analog value of the reflected light polarization information of the film, the obtaining method further includes:
acquiring the time consumption of the corresponding manufacturing process of each layer in at least two layers of the film;
and determining a preset proportion according to the time spent of the corresponding manufacturing process of each layer.
Optionally, the optical constants include refractive index and dielectric constant.
5 in a second aspect, the present application provides an apparatus for acquiring parameters of a film, including:
a relation obtaining unit, configured to obtain a functional relation of the film, where an argument of the functional relation includes a thickness of each layer of the film and an optical constant of each layer, and an argument of the functional relation includes reflected light polarization information of the film;
an estimated value calculation unit, configured to substitute an estimated value of the thickness of each layer of the film and an estimated value of the optical constant of each layer into a functional relation, and calculate to obtain an analog value of the reflected light polarization information of the film, where the estimated values of the thickness of each layer satisfy a preset ratio in at least two layers of the film;
and the actual value determining unit is used for taking the estimated value of the thickness of each layer of the film as an actual value of the thickness and taking the estimated value of the optical constant of each layer of the film as an actual value of the optical constant when the difference value between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film meets a preset condition.
In a third aspect, the present application provides a terminal device comprising a memory, a processor and a computer program stored in the memory and executable on the processor, the processor implementing the steps of the method of the first aspect when executing the computer program.
In a fourth aspect, the present application provides a computer readable storage medium storing a computer program which, when executed by a processor, performs the steps of the method of the first aspect described above.
In a fifth aspect, the present application provides a computer program product comprising a computer program which, when executed by one or more processors, implements the steps of the method of the first aspect described above.
Compared with the prior art, the beneficial effects that this application exists are: according to the method, firstly, a functional relation (namely, an established model) of the film to be measured is obtained, then, the estimated values of the thickness and the optical constants of all layers of the film are substituted into the functional relation, the analog value of the reflected light polarization information of the film can be obtained, when the difference value between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film meets the preset condition, the estimated value of the thickness of all layers of the film is used as an actual value of the thickness, and the estimated value of the optical constants of all layers of the film is used as an actual value of the optical constants. Unlike the related art, the present solution determines the proportional relationship of the thickness between certain layers in the thin film in advance based on the manufacturing process information of the thin film. The calculated actual values of the thickness and the optical constant can be more accurate by fitting the thickness estimated values meeting the preset proportion to obtain the optical constants and the actual values of the thickness of each layer of the film.
It will be appreciated that the advantages of the second to fifth aspects may be found in the above related description and will not be described here again.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following description will briefly introduce the drawings that are needed in the embodiments or the description of the prior art, it is obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is an application environment schematic diagram of a method for obtaining film parameters according to an embodiment of the present application;
fig. 2 is a schematic implementation flow chart of a method for obtaining film parameters according to an embodiment of the present application;
FIG. 3 is a schematic diagram of an apparatus for obtaining parameters of a thin film according to an embodiment of the present disclosure;
fig. 4 is a block diagram of a structure of a terminal device provided in an embodiment of the present application.
Detailed Description
In the following description, for purposes of explanation and not limitation, specific details are set forth, such as particular system configurations, techniques, etc. in order to provide a thorough understanding of the embodiments of the present application. It will be apparent, however, to one skilled in the art that the present application may be practiced in other embodiments that depart from these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present application with unnecessary detail.
In order to illustrate the technical solutions proposed in the embodiments of the present application, the following description is made by specific embodiments.
The application environment of the method for acquiring the film parameters provided in the embodiments of the present application is described below. Referring to fig. 1, the application environment of the method for obtaining the film parameters includes:
an ellipsometer comprising a light source and a detector, wherein the light source is adapted to emit light. Light emitted by the light source is reflected by the film sample and then received by the detector. The detector is used for analyzing the received reflected light to obtain an elliptical polarization spectrum.
And the computer can be connected with the elliptical polarization spectrometer and is used for obtaining the thickness and the optical constant of the film sample by utilizing the model fitting of the film sample according to the elliptical polarization spectrum output by the elliptical polarization spectrometer.
In particular, ellipsometry is a surface-sensitive, non-destructive and non-invasive multilayer film measurement technique that obtains the thickness and optical constants of a film sample by model fitting based on changes in the polarization state of linearly polarized light after reflection by the film sample. The specific measurement principle is as follows: when light is incident on the film sample, the reflected light undergoes multiple reflections and transmissions, and the polarization information of the reflected light changes. First, an elliptical polarization spectrum of the reflected light of the film sample can be detected by a detector, wherein the elliptical polarization spectrum can be represented by an amplitude ratio angle ψ and a phase difference angle Δ. In general, after the amplitude ratio angle ψ and the phase difference angle Δ are measured, ψ and Δ are converted into n=cos 2 ψ, c=sin2 ψcos Δ, s=sin2 ψsin Δ. Then, a model of the film sample needs to be constructed based on the materials of the respective layers of the film sample and the stacking order. By continuously changing the optical constant and the thickness in the model, the difference between the theoretical N, C, S output by the model and the N, C, S measured above is minimized, so that the more accurate thickness and optical constant of the film can be fitted.
The following describes a method for obtaining a film parameter provided in the embodiment of the present application. Referring to fig. 2, the method for obtaining the film parameters can be applied to the computer in fig. 1. The method for acquiring the film parameters comprises the following steps:
in step 201, a functional relationship of the film is obtained.
And 202, substituting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer into a functional relation, and calculating to obtain the analog value of the reflected light polarization information of the film.
In step 203, when the difference between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film satisfies the preset condition, the estimated value of the thickness of each layer of the film is taken as the actual value of the thickness, and the estimated value of the optical constant of each layer of the film is taken as the actual value of the optical constant.
In embodiments of the present application, the independent variables of the functional relationship of the film include the thickness of each layer of the film, as well as the optical constants of each layer of the film. The dependent variable of the functional relationship of the film includes reflected light polarization information of the film. The reflected light polarization information is used to represent the reflected light polarization change of the film. The film comprises a plurality of layers, and a user establishes a functional relation of the film according to the stacking sequence of the layers of the film. The user may then input the constructed functional relationship into the computer. The estimated value of the thickness and the estimated value of the optical constant of each layer of the thin film may be the estimated value input to the computer by the user, or may be the estimated value generated by the computer itself. The experimental value of the reflected light polarization information of the thin film is a value of the reflected light polarization information detected by the ellipsometer in fig. 1.
The computer can substitute the thickness estimated value and the optical constant estimated value into a functional relation, and calculate the analog value of the reflected light polarization information of the film. Alternatively, the computer may perform step 202 only once, resulting in an analog value of the reflected light polarization information that causes the difference to satisfy the preset condition. If the analog value of the reflected light polarization information that makes the difference meet the preset condition cannot be obtained only once, step 202 may be performed twice or more, and different thickness estimation values and optical constant estimation values may be substituted for each execution to obtain the analog value of the reflected light polarization information that makes the difference meet the preset condition. The following conditions are satisfied for each estimated value of the thickness of the thin film substituted into the functional relation: the estimated values of the thicknesses of at least two layers of the film meet the preset proportion. In the fabrication of film samples, the physical dimensions of each layer are related to the length of time that it is fabricated. Specifically, thickness = fabrication process time x growth rate. The growth rate can be calculated by: a destructive measurement experiment is carried out on a certain layer of material by utilizing a scanning electron microscope to obtain the thickness of the layer, and then the growth rate is calculated. After the growth rate is obtained, the thickness ratio between layers is obtained nondestructively by using the formula. The user may input the ratio into a computer, which takes the ratio as a preset ratio in the embodiments of the present application. The actual thickness value and the actual optical constant value are obtained by fitting the estimated values of the thicknesses of the layers meeting the preset proportion, so that the obtained actual thickness value and the obtained actual optical constant value are more accurate.
When the difference between the analog value and the experimental value of the reflected light polarization information of the film obtained by executing step 202 at a certain time satisfies the preset condition, the estimated value of the thickness of each layer of the film substituted at the time may be taken as the actual thickness value, and the estimated value of the optical constant of each layer of the film may be taken as the actual optical constant value.
In some embodiments, the preset condition may be that a difference between an analog value of the reflected light polarization information of the film and an experimental value of the reflected light polarization information of the film is less than a preset error threshold. That is, when the calculated analog value of the reflected light polarization information is close to the experimental value of the reflected light polarization information, the estimated thickness value and the estimated optical constant value substituted into the functional relation may be determined as actual values.
In other embodiments, the preset condition may be that after the step 202 is performed multiple times, a difference between the analog value and the experimental value of the reflected light polarization information calculated at a certain time is the smallest among the differences between the analog value and the experimental value of the reflected light polarization information calculated multiple times. For example, assume that step 202 is performed three times, the analog value of the reflected light polarization information calculated in the first step 202 is a1, the analog value of the reflected light polarization information calculated in the second step 202 is a2, and the analog value of the reflected light polarization information calculated in the third step 202 is a3. Assuming that the experimental value of the reflected light polarization information is b, if the difference between a3 and b is smaller than both the difference between a1 and b and the difference between a2 and b, the thickness estimation value and the optical constant estimation value of the third substitution functional relation may be determined as actual values.
Optionally, in order to determine the actual thickness value and the actual optical constant value faster, after each execution of step 202, the above-mentioned acquisition method further includes:
and when the difference value between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film does not meet the preset condition, adjusting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer.
The estimated value after the adjustment of the thickness of each layer is determined as a new estimated value of the thickness of each layer, the estimated value after the adjustment of the optical constants of each layer is determined as a new estimated value of the optical constants of each layer, and the procedure returns to step 202.
In this embodiment of the present application, if the difference between the analog value of the reflected light polarization information of the thin film obtained by this calculation and the experimental value of the reflected light polarization information of the thin film does not satisfy the preset condition, the thickness estimated value and the optical constant estimated value that are substituted into the functional relation at this time may be adjusted, the estimated value after adjustment of the thickness of each layer is determined as a new estimated value of the thickness of each layer, the estimated value after adjustment of the optical constant of each layer is determined as a new estimated value of the optical constant of each layer, and then step 202 is executed again. It should be understood that the re-execution of step 202 is performed by substituting the new estimated values of the thicknesses of the layers of the film and the new estimated values of the optical constants of the layers into the functional relation to obtain new estimated values of the polarization information of the reflected light. Wherein, in at least two layers of the film, the new estimated value of the thickness of each layer still meets the preset proportion. If the difference between the new estimated value of the reflected light polarization information and the experimental value of the reflected light polarization information meets the preset condition, the new estimated value of the thickness of each layer of the film is taken as an actual value of the thickness, and the new estimated value of the optical constant of each layer is taken as an actual value of the optical constant. And if the difference value between the new estimated value of the reflected light polarization information and the experimental value of the reflected light polarization information does not meet the preset condition, adjusting the new estimated value of the thickness of each layer of the film and the new estimated value of the optical constant of each layer, and the like. In the embodiment of the application, the new estimated value is obtained by adjusting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer, so that a user can be helped to obtain the actual value of the thickness and the actual value of the optical constant more quickly.
When the computer first executes step 202, the computer may use the value of the thickness of each layer of the film input by the user as an estimated value of the thickness of each layer of the film, and use the value of the optical constant of each layer of the film input by the user as an estimated value of the optical constant of each layer. For example, the user may input the thickness value designed before the thin film is formed into a computer, or may input the thickness value observed by an electron microscope into a computer, which is not limited herein. Wherein the optical constants of each layer of the film are related to the material used for that layer, and the user can obtain the value of the optical constant of each layer from the web or paper, and then input the value of the optical constant into the computer. It should be appreciated that the values of the optical constants obtained from the web or paper are not necessarily completely accurate due to the differences in the film making methods and can only be used as a reference.
In some embodiments, to determine the actual thickness value and the actual optical constant value more quickly, the adjusting the estimated thickness value of each layer of the thin film and the estimated optical constant value of each layer includes:
the estimated values of the thicknesses of the layers and the estimated values of the optical constants of the layers of the thin film are adjusted by a gradient descent method.
In this embodiment, from the second execution of step 202, the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer may be adjusted by using the gradient descent method based on the difference between the analog value and the experimental value of the polarization information of the reflected light obtained by the previous calculation, so as to accelerate the fitting speed of the film model.
In some embodiments, the reflected light polarization information described above may include N, C and S.
Where n=cos2ψ, c=sin2ψcosΔ, s=sin2ψsin Δ.
ψ represents the amplitude ratio angle of the reflected light of the elliptically polarized light on the film surface, and Δ represents the phase difference angle of the reflected light of the elliptically polarized light on the film surface.
In some embodiments, the optical constants described above include refractive index and dielectric constant. Wherein the refractive index is the ratio of the propagation speed of light in vacuum to the propagation speed of light in the medium. The higher the refractive index of the material, the greater the ability to refract incident light. Dielectric constant is a macroscopic physical quantity that comprehensively reflects the electrical polarization properties of the material interior.
In some embodiments, to determine the preset ratio, before the step 202, the obtaining method further includes:
and obtaining the time consumption of the corresponding manufacturing process of each layer in at least two layers of the film.
And determining the preset proportion according to the time consumption of the corresponding manufacturing process of each layer.
In the manufacturing process of the film sample, the physical size of each layer is related to the time consumption of the manufacturing process, and when a certain proportional relationship exists between the manufacturing process time of the layers, the ratio constraint exists between the thicknesses of the layers. In the embodiment of the application, the user can input the time consumption of the manufacturing process corresponding to each layer in at least two layers of the film to the computer. The computer can determine the preset proportion according to the time consumption of the manufacturing process corresponding to each layer.
From the above, according to the scheme, firstly, a functional relation (i.e. an established model) of the film to be measured is obtained, then, the estimated values of the thickness and the optical constants of all layers of the film are substituted into the functional relation, the analog value of the reflected light polarization information of the film can be obtained, and when the difference value between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film meets the preset condition, the estimated value of the thickness of all layers of the film is taken as the actual value of the thickness, and the estimated value of the optical constants of all layers of the film is taken as the actual value of the optical constants. Unlike the related art, the present solution determines the proportional relationship of the thickness between certain layers in the thin film in advance based on the manufacturing process information of the thin film. The calculated actual values of the thickness and the optical constant can be more accurate by fitting the thickness estimated values meeting the preset proportion to obtain the optical constants and the actual values of the thickness of each layer of the film.
Corresponding to the method for acquiring the film parameters provided above, the embodiment of the application also provides a device for acquiring the film parameters. As shown in fig. 3, the apparatus 300 for obtaining a film parameter in the embodiment of the present application includes:
and a relation acquisition unit 301 configured to acquire a functional relation of the thin film, where an argument of the functional relation includes thicknesses of layers of the thin film and optical constants of the layers, and the argument of the functional relation includes reflected light polarization information of the thin film.
And an estimated value calculating unit 302, configured to substitute the estimated values of the thicknesses of the layers of the film and the estimated values of the optical constants of the layers into a functional relation, and calculate an analog value of the polarization information of the reflected light of the film, where the estimated values of the thicknesses of the layers satisfy a preset ratio.
The actual value determining unit 303 is configured to, when the difference between the analog value of the reflected light polarization information of the thin film and the experimental value of the reflected light polarization information of the thin film satisfies a preset condition, take the estimated value of the thickness of each layer of the thin film as an actual value of the thickness and take the estimated value of the optical constant of each layer of the thin film as an actual value of the optical constant.
Optionally, the acquiring apparatus 300 further includes:
the adjusting unit is used for adjusting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer when the difference value between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film does not meet the preset condition;
and a new value determining unit for determining the estimated value after the adjustment of the thickness of each layer as a new estimated value of the thickness of each layer, determining the estimated value after the adjustment of the optical constant of each layer as a new estimated value of the optical constant of each layer, and returning to the step of substituting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer into a functional relation, and calculating the analog value of the reflected light polarization information of the film.
Optionally, the adjusting unit is specifically configured to adjust an estimated value of a thickness of each layer of the thin film and an estimated value of an optical constant of each layer by using a gradient descent method.
Optionally, the preset conditions include: the difference between the analog value and the experimental value of the reflected light polarization information is less than the error threshold.
Alternatively, the reflected light polarization information includes N, C and S.
Where n=cos2ψ, c=sin2ψcosΔ, s=sin2ψsin Δ.
ψ represents the amplitude ratio angle of the reflected light of the elliptically polarized light on the film surface, and Δ represents the phase difference angle of the reflected light of the elliptically polarized light on the film surface.
Optionally, the acquiring apparatus 300 further includes:
the time length obtaining unit is used for obtaining the time length of the corresponding manufacturing process of each layer in at least two layers of the film.
The proportion determining unit is used for determining a preset proportion according to the time spent of the manufacturing process corresponding to each layer.
Optionally, the optical constants include refractive index and dielectric constant.
From the above, according to the scheme, firstly, a functional relation (i.e. an established model) of the film to be measured is obtained, then, the estimated values of the thickness and the optical constants of all layers of the film are substituted into the functional relation, the analog value of the reflected light polarization information of the film can be obtained, and when the difference value between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film meets the preset condition, the estimated value of the thickness of all layers of the film is taken as the actual value of the thickness, and the estimated value of the optical constants of all layers of the film is taken as the actual value of the optical constants. Unlike the related art, the present solution determines the proportional relationship of the thickness between certain layers in the thin film in advance based on the manufacturing process information of the thin film. The calculated actual values of the thickness and the optical constant can be more accurate by fitting the thickness estimated values meeting the preset proportion to obtain the optical constants and the actual values of the thickness of each layer of the film.
Corresponding to the method for obtaining the film parameters provided above, the embodiment of the present application further provides a terminal device, which may be a computer in fig. 1 or any other device with computing capability. Referring to fig. 4, the terminal device 4 in the embodiment of the present application includes: a memory 401, one or more processors 402 (only one shown in fig. 4) and a computer program stored on the memory 401 and executable on the processors. Wherein: the memory 401 is used for storing software programs and units, and the processor 402 executes various functional applications and data processing by running the software programs and units stored in the memory 401 to acquire resources corresponding to preset events. Specifically, the processor 402 implements the method for acquiring the parameters of the thin film as in the corresponding embodiment of fig. 2 by running the above-described computer program stored in the memory 401.
It should be appreciated that in embodiments of the present application, the processor 402 may be a central processing unit (Central Processing Unit, CPU), which may also be other general purpose processors, digital signal processors (Digital Signal Processor, DSPs), application specific integrated circuits (Application Specific Integrated Circuit, ASICs), off-the-shelf programmable gate arrays (Field-Programmable Gate Array, FPGAs) or other programmable logic devices, discrete gate or transistor logic devices, discrete hardware components, or the like. A general purpose processor may be a microprocessor, or may be any conventional processor or the like.
Memory 401 may include read-only memory and random access memory, and provides instructions and data to processor 402. Some or all of memory 401 may also include non-volatile random access memory. For example, the memory 401 may also store information of a device class.
Corresponding to the method for obtaining the film parameters applied to the terminal device provided above, the embodiments of the present application further provide a computer readable storage medium, where a computer program is stored, where the computer program is executed by a processor to implement the steps of the method for obtaining the film parameters in the corresponding embodiment of fig. 2.
Corresponding to the method for obtaining the film parameters applied to the terminal device provided above, the embodiments of the present application further provide a computer program product, where the computer program product includes a computer program, and when the computer program is executed by one or more processors, implements the steps of the method for obtaining the film parameters in the corresponding embodiment of fig. 2.
It will be apparent to those skilled in the art that, for convenience and brevity of description, only the above-described division of the functional units and modules is illustrated, and in practical application, the above-described functional distribution may be performed by different functional units and modules according to needs, i.e. the internal structure of the apparatus is divided into different functional units or modules to perform all or part of the above-described functions. The functional units and modules in the embodiment may be integrated in one processing unit, or each unit may exist alone physically, or two or more units may be integrated in one unit, where the integrated units may be implemented in a form of hardware or a form of a software functional unit. In addition, specific names of the functional units and modules are only for convenience of distinguishing from each other, and are not used for limiting the protection scope of the present application. The specific working process of the units and modules in the above system may refer to the corresponding process in the foregoing method embodiment, which is not described herein again.
In the foregoing embodiments, the descriptions of the embodiments are emphasized, and in part, not described or illustrated in any particular embodiment, reference is made to the related descriptions of other embodiments.
Those of ordinary skill in the art will appreciate that the various illustrative elements and algorithm steps described in connection with the embodiments disclosed herein may be implemented as electronic hardware, or combinations of external device software and electronic hardware. Whether such functionality is implemented as hardware or software depends upon the particular application and design constraints imposed on the solution. Skilled artisans may implement the described functionality in varying ways for each particular application, but such implementation decisions should not be interpreted as causing a departure from the scope of the present application.
In the embodiments provided in the present application, it should be understood that the disclosed apparatus and method may be implemented in other manners. For example, the system embodiments described above are merely illustrative, e.g., the division of modules or units described above is merely a logical functional division, and there may be additional divisions when actually implemented, e.g., multiple units or components may be combined or integrated into another system, or some features may be omitted, or not performed. Alternatively, the coupling or direct coupling or communication connection shown or discussed may be an indirect coupling or communication connection via interfaces, devices or units, which may be in electrical, mechanical or other forms.
The units described above as separate components may or may not be physically separate, and components shown as units may or may not be physical units, may be located in one place, or may be distributed over a plurality of network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.
The integrated units described above, if implemented in the form of software functional units and sold or used as stand-alone products, may be stored in a computer readable storage medium. Based on such understanding, the present application implements all or part of the flow of the method of the above-described embodiments, or may be implemented by a computer program to instruct associated hardware, where the computer program may be stored in a computer readable storage medium, where the computer program, when executed by a processor, may implement the steps of each of the method embodiments described above. The computer program comprises computer program code, and the computer program code can be in a source code form, an object code form, an executable file or some intermediate form and the like. The above computer readable storage medium may include: any entity or device capable of carrying the computer program code described above, a recording medium, a U disk, a removable hard disk, a magnetic disk, an optical disk, a computer readable memory, a Read-only memory (ROM), a random access memory (RAM, random Access Memor 8), an electrical carrier signal, a telecommunications signal, a software distribution medium, and so forth. It should be noted that the content of the computer readable storage medium described above may be appropriately increased or decreased according to the requirements of the jurisdiction's legislation and the patent practice, for example, in some jurisdictions, the computer readable storage medium does not include electrical carrier signals and telecommunication signals according to the legislation and the patent practice.
The above embodiments are only for illustrating the technical solution of the present application, and are not limiting thereof; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present application, and are intended to be included in the scope of the present application.

Claims (10)

1. The method for acquiring the film parameters is characterized by comprising the following steps:
obtaining a functional relation of the film, wherein independent variables of the functional relation comprise thicknesses of all layers of the film and optical constants of all layers, and the dependent variables of the functional relation comprise reflected light polarization information of the film;
substituting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer into the functional relation, and calculating to obtain the analog value of the reflected light polarization information of the film, wherein the estimated value of the thickness of each layer in at least two layers of the film meets the preset proportion;
when the difference between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film meets a preset condition, the estimated value of the thickness of each layer of the film is taken as an actual value of the thickness, and the estimated value of the optical constant of each layer of the film is taken as an actual value of the optical constant.
2. The acquisition method according to claim 1, wherein after substituting the estimated value of the thickness of each layer of the thin film and the estimated value of the optical constant of each layer into the functional relation, the acquisition method further comprises:
when the difference value between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film does not meet the preset condition, adjusting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer;
and determining the estimated value after the adjustment of the thickness of each layer as a new estimated value of the thickness of each layer, determining the estimated value after the adjustment of the optical constant of each layer as a new estimated value of the optical constant of each layer, and returning to the step of substituting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer into the functional relation to calculate the analog value of the reflected light polarization information of the film.
3. The method of obtaining according to claim 2, wherein adjusting the estimated values of the thickness of each layer of the thin film and the estimated values of the optical constants of each layer comprises:
and adjusting the estimated value of the thickness of each layer of the film and the estimated value of the optical constant of each layer by using a gradient descent method.
4. The acquisition method according to claim 1, wherein the preset conditions include: the difference between the analog value of the reflected light polarization information and the experimental value is smaller than an error threshold.
5. The method of claim 4, wherein the reflected light polarization information comprises N, C and S;
where n=cos2ψ, c=sin2ψcosΔ, s=sin2ψsin Δ;
ψ represents the amplitude ratio angle of the reflected light of the elliptically polarized light on the film surface, and Δ represents the phase difference angle of the reflected light of the elliptically polarized light on the film surface.
6. The acquisition method according to claim 4, wherein before substituting the estimated value of the thickness of each layer of the thin film and the estimated value of the optical constant of each layer into the functional relation, the acquisition method further comprises:
acquiring the time consumption of the corresponding manufacturing process of each layer in the at least two layers of the film;
and determining the preset proportion according to the time spent of the manufacturing process corresponding to each layer.
7. The method of acquisition of claim 1 wherein the optical constants include refractive index and dielectric constant.
8. An apparatus for obtaining parameters of a film, comprising:
a relation obtaining unit, configured to obtain a functional relation of a film, where an argument of the functional relation includes thicknesses of layers of the film and optical constants of the layers, and an argument of the functional relation includes reflected light polarization information of the film;
an estimated value calculation unit, configured to substitute an estimated value of the thickness of each layer of the film and an estimated value of an optical constant of each layer into the functional relation, and calculate an analog value of the reflected light polarization information of the film, where a preset ratio is satisfied between the estimated values of the thickness of each layer in at least two layers of the film;
and the actual value determining unit is used for taking the estimated value of the thickness of each layer of the film as an actual value of the thickness and taking the estimated value of the optical constant of each layer of the film as an actual value of the optical constant when the difference value between the analog value of the reflected light polarization information of the film and the experimental value of the reflected light polarization information of the film meets a preset condition.
9. A terminal device comprising a memory, a processor and a computer program stored in the memory and executable on the processor, characterized in that the processor implements the method according to any of claims 1 to 7 when executing the computer program.
10. A computer readable storage medium storing a computer program, characterized in that the computer program when executed by a processor implements the method according to any one of claims 1 to 7.
CN202310034394.1A 2023-01-10 2023-01-10 Acquisition method and acquisition device for film parameters and terminal equipment Pending CN116086329A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202310034394.1A CN116086329A (en) 2023-01-10 2023-01-10 Acquisition method and acquisition device for film parameters and terminal equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202310034394.1A CN116086329A (en) 2023-01-10 2023-01-10 Acquisition method and acquisition device for film parameters and terminal equipment

Publications (1)

Publication Number Publication Date
CN116086329A true CN116086329A (en) 2023-05-09

Family

ID=86198779

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202310034394.1A Pending CN116086329A (en) 2023-01-10 2023-01-10 Acquisition method and acquisition device for film parameters and terminal equipment

Country Status (1)

Country Link
CN (1) CN116086329A (en)

Similar Documents

Publication Publication Date Title
CN111122460B (en) Single-rotation compensator type spectroscopic ellipsometer parameter calibration method and device
TWI637448B (en) Thin film thickness measuring method and system thereof
US20040080761A1 (en) Method and apparatus for thickness decomposition of complicated layer structures
US7522294B2 (en) Measuring a process parameter of a semiconductor fabrication process using optical metrology
KR20150012509A (en) A method and apparatus for measuring thickness of object to be measured
CN103743349B (en) Method and device for measuring nano film
CN112629421B (en) Film thickness measuring method based on fast Fourier transform
KR101813314B1 (en) Method and system for measuring composition of thin film
CN116124017B (en) Method and device for measuring film thickness, electronic equipment and storage medium
CN116086329A (en) Acquisition method and acquisition device for film parameters and terminal equipment
JP3781245B2 (en) Manufacturing method of semiconductor device
CN115979148A (en) Method and device for acquiring film parameters and terminal equipment
Zhaoxian et al. Generalized simulated annealing algorithm applied in the ellipsometric inversion problem
CN115468744A (en) System parameter optimal configuration method and device of optical measurement instrument
TWI628422B (en) Stress analysis method based on temporal phase unwrapping
CN112345463B (en) Ellipsometer-based method for measuring parameters of sample to be measured
CN115752265A (en) Calibration method of non-ideal ellipsometry system
JP2011075548A (en) Fourier coefficient measuring method using integration type photodetector
Montecchi et al. Thickness and model optimization in characterization of optical interference films by using discontinuities of n (lambda) solutions
Quinten On the use of fast Fourier transform for optical layer thickness determination
CN116124018A (en) Method and device for measuring film thickness, electronic equipment and storage medium
Buonanno et al. Method for Robust Estimation of the Resonance Frequency of Microwave Biosensors
CN115096823B (en) Thin film structure detection method and device, electronic equipment and storage medium
CN118260508B (en) Method and equipment for determining parameters of near-surface layer medium in wafer grinding scene
CN113609687B (en) Ellipsometer real-time measurement result optimization method

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination