CN111316147B - Polarizing film protective laminate and method for producing same - Google Patents
Polarizing film protective laminate and method for producing same Download PDFInfo
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- CN111316147B CN111316147B CN201880073610.0A CN201880073610A CN111316147B CN 111316147 B CN111316147 B CN 111316147B CN 201880073610 A CN201880073610 A CN 201880073610A CN 111316147 B CN111316147 B CN 111316147B
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- resin layer
- photocurable resin
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
Abstract
A polarizing film protective laminate comprising a base film and a photocurable resin layer comprising a radically polymerizable compound laminated thereon, wherein the photocurable resin layer has a thickness of 9 [ mu ] m or less and the photocurable resin layer has a boric acid transmittance of 2.25g/m in terms of boron atom2As for seeds or seeds, the adhesion between the base film and the photocurable resin layer is 0.005 to 0.06N/mm, and the double-fold average surface roughness (rms) of the photocurable resin layer on the base film side after the base film is peeled from the photocurable resin layer is 300nm or less. Thus, a polarizing plate polarizing film protective laminate having excellent surface smoothness and excellent moist heat resistance even when the thickness of the photocurable resin layer is 9 μm or less, and a method for producing the same are provided.
Description
Technical Field
The present invention relates to a laminate for protecting a polarizing film, in which a photocurable resin layer is laminated on a base film, and a method for producing the laminate.
Background
Has the functions of light transmission and shadingThe polarizing plate and the liquid crystal that changes the polarization state of light are the basic components of a Liquid Crystal Display (LCD). Polarizing plates often have a structure in which a protective film such as a Triacetylcellulose (TAC) film is bonded to the surface of a polarizing film, and as a polarizing film constituting a polarizing plate, an iodine-based dye (I) is adsorbed on a stretched film obtained by uniaxially stretching and orienting a polyvinyl alcohol (PVA) film3 -、I5 -Etc.), dichroic dyes such as dichroic organic dyes, have become the mainstream. Such a polarizing film is generally continuously produced by uniaxially stretching a PVA film containing a dichroic dye in advance, or by allowing the PVA film to adsorb the dichroic dye while uniaxially stretching the PVA film, or by allowing the PVA film to adsorb the dichroic dye after uniaxially stretching the PVA film.
LCDs are used in a wide range of small devices such as calculators and wristwatches, notebook computers, liquid crystal monitors, liquid crystal color projectors, liquid crystal televisions, car navigation systems, smartphones, and measuring devices used indoors and outdoors, and in recent years, there has been an increasing demand for thinner polarizing plates, particularly as they are used in mobile applications such as small smartphones. In addition, in mobile applications, the use location is widely spread, and therefore, improvement of durability is also required.
As one method for thinning a polarizing plate, a method of thinning a protective film is proposed, and in recent years, a polarizing plate in which a photocurable resin layer is formed instead of the protective film has been proposed (for example, see patent documents 1 to 4).
Documents of the prior art
Patent document
Patent document 1: japanese patent laid-open publication No. 2011-221185
Patent document 2: japanese patent laid-open publication No. 2004-2456924
Patent document 3: japanese Kohyo publication No. 2013-513832
Patent document 4: japanese patent laid-open No. 2008-20891.
Disclosure of Invention
Problems to be solved by the invention
However, the polarizing plates having the photocurable resin layers described in patent documents 1 to 4 may have a reduced polarizing performance when used under high-temperature and high-humidity conditions. As in the method described in patent document 1 or 2, when a composition containing a radical polymerizable compound or the like is directly applied to the surface of a polarizing film, the surface smoothness of the photocurable resin layer is likely to be reduced, and the polarizing performance of the polarizing plate may be reduced due to interference. Further, there are problems as follows: the polarizing film is corroded by a solvent contained in the composition containing the radical polymerizable compound and the like to degrade the polarizing performance, or the adhesion between the polarizing film and the photocurable resin layer is lowered, and the photocurable resin layer is peeled off during processing such as cutting the polarizing plate into a panel size from a long roll. Further, when a composition containing a radical polymerizable compound or the like is directly applied to the surface of a polarizing film, the polarizing film may deteriorate, and therefore, ultraviolet rays or electron beams cannot be sufficiently irradiated, and it is difficult to increase the crosslinking density. On the other hand, patent documents 3 and 4 propose a method in which a photocurable resin layer is formed on a substrate film such as a release PET film, and then the photocurable resin layer and a polarizing film are bonded together using an adhesive. However, when the releasability between the base film and the photocurable resin layer is poor, the surface smoothness of the photocurable resin layer may be reduced, which may cause a reduction in the polarizing performance of the polarizing plate due to interference. Further, when used under high temperature and high humidity conditions, the polarization performance may be lowered, and improvement is demanded.
The present invention has been made to solve the above problems, and an object of the present invention is to provide a polarizing plate protective laminate which has excellent surface smoothness and is excellent in moist heat resistance even when the thickness of a photocurable resin layer is 9 μm or less, and a method for producing the polarizing plate protective laminate.
Means for solving the problems
The present inventors have made intensive studies to achieve the above object, and as a result, have found that: the boric acid permeability of the photocurable resin layer is 2.25g/m in terms of boron atom even if the thickness is 9 μm or less2When a photocurable resin layer not more than seed is laminated on a polarizing film, a polarizing plate having excellent moisture and heat resistance can be obtained, andthe present inventors have further studied based on the finding that a photocurable resin layer having an excellent surface smoothness can be obtained with an adhesive strength between the substrate film and the photocurable resin layer of 0.005 to 0.06N/mm, and have completed the present invention.
Namely, the present invention relates to:
[1] a polarizing film protective laminate comprising a base film and a photocurable resin layer containing a radically polymerizable compound laminated thereon,
the thickness of the light-cured resin layer is 9 μm or less, and the boric acid permeability of the light-cured resin layer is 2.25g/m in terms of boron atom2As well as below the seed and seed stage,
the adhesion between the base film and the photocurable resin layer is 0.005 to 0.06N/mm,
a two-times average surface roughness (rms) of the photocurable resin layer on the substrate film side after the substrate film is peeled from the photocurable resin layer is 300nm or less;
[2] a polarizing plate, wherein the photocurable resin layer in the polarizing film protective laminate according to [1] is bonded to at least one surface of a polarizing film via an adhesive layer;
[3] [1] A method for producing a polarizing film protective laminate, which comprises laminating a base film with a photocurable resin layer containing a radically polymerizable compound, the method comprising:
applying a solution containing a radical polymerizable compound and a solvent to a base film;
heating the substrate film after coating to volatilize the solvent; and
a step of irradiating at least one of ultraviolet rays and electron beams,
the water contact angle of the coating surface of the substrate film is 40-100 degrees;
[4] the method for producing a polarizing film protective laminate according to [3], wherein the detected strength of silicon on the coated surface of the substrate film is 10cps/mA or less.
ADVANTAGEOUS EFFECTS OF INVENTION
The present invention provides a polarizing plate polarizing film protective laminate having excellent surface smoothness and excellent moist heat resistance even when the thickness of a photocurable resin layer is 9 μm or less, and a method for producing the same.
Drawings
FIG. 1 is a related schematic diagram of a method for measuring boron atom-converted boric acid permeability.
Detailed Description
The present invention will be described in detail below.
< polarizing film protective laminate >
The polarizing film protective laminate of the present invention is a polarizing film protective laminate comprising a base film and a photocurable resin layer comprising a radically polymerizable compound and having a thickness of 9 [ mu ] m or less, wherein the photocurable resin layer has a boric acid transmittance of 2.25g/m in terms of boron atom2And seed and root. The boric acid permeability of the photocurable resin layer was 2.25g/m in terms of boron atom2When the polarizing film is laminated with a polarizing film, a polarizing plate having excellent moist heat resistance capable of maintaining initial polarization performance can be obtained. The boric acid permeability is more than 2.25g/m in terms of boron atom2When seeding is used, the moisture and heat resistance of the polarizing plate cannot be sufficiently improved. From this viewpoint, the boric acid permeability of the photocurable resin layer is preferably 1.50g/m in terms of boron atom2Seeds or trees Below, more preferably 0.50g/m2Seed and seed Below, more preferably 0.20g/m2Seeds or trees, more preferably 0.10g/m2And seed and root. On the other hand, the lower limit of the boric acid permeability in terms of boron atoms of the photocurable resin layer is not particularly limited, and when the boric acid permeability in terms of boron atoms is too low, flexibility of the photocurable resin layer tends to be easily lost, and therefore, the boric acid permeability is preferably 0.02g/m in terms of boron atoms2More preferably 0.03g/m or more2And more than seeding date. The boric acid permeability in terms of boron atoms can be determined by the method described in examples to be described later.
In the present invention, the photocurable resin layer contains a radical polymerizable compound or the like. By using the radical polymerizable compound, the boric acid transmittance in terms of boron atoms of the obtained photocurable resin layer can be reduced. As the radical polymerizable compound, a compound having an acryloyl group in the molecule can be preferably used. The radical polymerizable compound may be used alone in 1 kind, or may be used in combination of 2 or more kinds. Further, as the photopolymerization initiator for curing by irradiating at least one of ultraviolet rays and electron beams, a radical polymerization initiator is preferably used. As the radical polymerization initiator, a compound capable of promoting the reaction of the radical polymerizable compound by irradiation with active energy rays can be used. Examples of such a radical polymerization initiator include carbonyl compounds such as acetophenones, benzophenones, Michler's ketones and benzoins; sulfur compounds such as tetramethylthiuram monosulfide and thioxanthone, and the like, and carbonyl compounds are preferred. These radical polymerization initiators may be used alone in 1 kind, or may be used in combination in 2 or more kinds.
In the present invention, the thickness of the photocurable resin layer is 9 μm or less. When the thickness exceeds 9 μm, the polarizing plate laminated with the conventional protective film cannot be made thin enough. From this viewpoint, the thickness of the photocurable resin layer is preferably 8 μm or less, more preferably 7 μm or less, and still more preferably 6 μm or less. On the other hand, the lower limit of the thickness of the photocurable resin layer is not particularly limited, and when the boric acid transmittance in terms of boron atoms is realized by a thin photocurable resin layer, the flexibility of the photocurable resin layer tends to be easily lost, and therefore, it is preferably 0.1 μm or more, more preferably 0.5 μm or more, and still more preferably 1 μm or more.
The substrate film used in the polarizing film protective laminate of the present invention is preferably a substrate film having excellent surface uniformity, and a polycarbonate film, a triacetyl cellulose film, a norbornene film, a polypropylene film, a polyester film, a polystyrene film, or the like can be used. The surface of the base film on the photocurable resin layer side may be subjected to a release treatment. By using a base film having excellent surface uniformity, the two-times average surface roughness (rms) of the photocurable resin layer on the base film side after the base film is peeled from the photocurable resin layer is easily 300nm or less.
In the present invention, the adhesion between the photocurable resin layer and the substrate film is 0.005 to 0.06N/mm. After the polarizing plate is obtained by laminating the photocurable resin layer and the polarizing film, the base film needs to be peeled from the photocurable resin layer, and therefore, the adhesion between the photocurable resin layer and the base film is preferably 0.05N/mm or less, more preferably 0.04N/mm or less, and still more preferably 0.03N/mm or less. By reinforcing the release treatment of the base film to be used, the adhesion between the photocurable resin layer and the base film can be set to 0.06N/mm or less. When the adhesion between the photocurable resin layer and the substrate film is too low, it is difficult to peel the substrate film from the photocurable resin layer and handle the laminate for protecting a polarizing film, such as when the photocurable resin layer is bonded to a polarizing film, and therefore the adhesion between the photocurable resin layer and the substrate film is preferably 0.010N/mm or more, more preferably 0.013N/mm or more, and still more preferably 0.015N/mm or more.
In the present invention, the two-times average surface roughness (rms) of the photocurable resin layer on the substrate film side after the substrate film is peeled from the photocurable resin layer is 300nm or less. The two-times average surface roughness (rms) of the photocurable resin layer on the substrate film side is preferably 250nm or less, more preferably 200nm or less, and still more preferably 150nm or less. In order to make the two-fold average surface roughness (rms) of the photocurable resin layer on the substrate film side 300nm or less, it is important that a solution containing a radical polymerizable compound and a solvent does not repel on the substrate film and the releasability between the substrate film and the photocurable resin layer is good when forming the polarizing film protective laminate, and as described later, it is effective to adjust the solubility parameter of the solvent used for the radical polymerizable compound and the water contact angle of the coated surface of the substrate film. The lower limit of the two-times average surface roughness (rms) of the photocurable resin layer on the substrate film side is not particularly limited, and is, for example, 20nm or more because it is difficult to obtain a very smooth surface.
< method for producing polarizing film protective laminate >
The method for producing the polarizing film protective laminate of the present invention preferably includes the steps of: applying a solution containing a radical polymerizable compound and a solvent to a base film; heating the substrate film after coating to volatilize the solvent; and irradiating at least one of ultraviolet rays and electron beams, wherein the water contact angle of the coated surface of the substrate film is 40 to 100 degrees. By including a solvent in the solution, the surface smoothness of the photocurable resin layer having a thickness of 9 μm or less is improved.
[ coating Process ]
As the step of applying the solution containing the radical polymerizable compound and the solvent to the substrate film, any appropriate method can be adopted. Examples of the method of applying a solution containing a radical polymerizable compound and a solvent to a substrate film include methods such as die coating, roll coating, air knife coating, gravure roll coating, blade coating, curtain flow coating, spray coating, wire bar coating, rod coating, dipping, and brush coating. Among them, gravure roll coating is preferable in order to make the thickness of the obtained photocurable resin layer 9 μm or less.
[ solvent volatilization Process ]
As the step of heating the substrate film after applying the solution to volatilize the solvent, any appropriate method can be adopted. The substrate film coated with the solution may be heated on a heated roll, and may be heated in a flow dryer. The preferable temperature of the heating roller and the hot air is determined according to the boiling point of the solvent, and is preferably in the range of 60 ℃ to 120 ℃. Further, it is preferable to evaporate the solvent until the residual amount of the solvent becomes 10% or less.
[ irradiation Process ]
As the step of irradiating at least one of ultraviolet rays and electron beams, at least one of ultraviolet rays and electron beams may be directly irradiated after drying the solution applied to the base film, or may be irradiated from the base film side. In addition, from the viewpoint of curing speed, availability of an irradiation apparatus, price, and the like, it is more preferable to have a step of irradiating ultraviolet rays.
The ultraviolet rays or the electron beams can be irradiated by a known apparatus. When ultraviolet light is used, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, a chemical lamp, an LED, or the like which emits light in a wavelength region of 450nm or less can be used. When Electron Beam (EB) is used, the acceleration voltage is preferably in the range of 0.1 to 10MeV, and the irradiation dose is preferably in the range of 1 to 500 kGy.
The cumulative amount of ultraviolet rays or electron beams is not particularly limited, but is preferably 10 to 20,000mJ/cm2More preferably 30 to 5,000mJ/cm2Within the range of (1). If the cumulative amount of ultraviolet light or electron beam is too small, curing of the radical polymerizable compound becomes poor, so that the boric acid transmittance in terms of boron atoms in the photocurable resin layer becomes high, or the mechanical strength of the photocurable resin layer becomes low. On the other hand, if the cumulative amount of ultraviolet light or electron beam is too large, excessive heat may be generated in the polarizing film protective laminate, and the photocurable resin layer and the substrate film may deteriorate.
In order to increase the crosslinking density of the photocurable resin layer during or after irradiation with ultraviolet rays or electron rays, heating may be performed as necessary to accelerate curing of the photocurable resin layer. The heating temperature is preferably in the range of 40 to 130 ℃, more preferably in the range of 50 to 100 ℃ from the viewpoints of curing speed, influence of the photocurable resin layer on the substrate film, and the like. When the temperature is less than 40 ℃, it is difficult to accelerate curing of the photocurable resin layer, and when the temperature exceeds 130 ℃, the substrate film is easily deformed, and a smooth photocurable resin layer may not be obtained. In the above method, the crosslinking density of the photocurable resin layer can be sufficiently increased on the substrate film, and therefore, the boric acid transmittance in terms of boron atoms can be preferably reduced.
In the method for producing a polarizing film protective laminate of the present invention, the water contact angle of the solution-coated surface of the substrate film is preferably 40 to 100 degrees. When the water contact angle of the solution-coated surface of the substrate film is large, the solution tends to be repelled when the solution is coated on the substrate film, and it may be difficult to uniformly coat the solution. Further, even when the solution can be uniformly applied, there is a problem that the surface of the photocurable resin layer on the side of the substrate film after the substrate film is peeled from the photocurable resin layer is difficult to be smooth. On the other hand, when the water contact angle is small, the adhesion between the base film and the photocurable resin layer becomes strong, the base film is difficult to peel from the photocurable resin layer, or the surface smoothness of the photocurable resin layer on the base film side after the base film is peeled from the photocurable resin layer becomes rough. From these viewpoints, the water contact angle of the solution-coated surface of the substrate film is preferably 45 to 95 degrees, more preferably 50 to 90 degrees, and still more preferably 55 to 85 degrees. In order to adjust the water contact angle of the solution-coated surface of the substrate film to the above range, it is effective to adjust the strength of the hydrophilization treatment such as corona treatment.
The solubility parameter (SP value) of the solvent in the solution containing the radical polymerizable compound and the solvent is preferably 8 to 10 (cal/cm)3）1/2. If the solubility parameter of the solvent is too small or too large, the solution is easily repelled when the solution is applied to the substrate film, and it is difficult to uniformly apply the solution. From this viewpoint, the solubility parameter of the solvent is more preferably 8.2 to 9.8 (cal/cm)3）1/2More preferably 8.4 to 9.6 (cal/cm)3）1/2Particularly preferably 8.6 to 9.4 (cal/cm)3）1/2The range of (1). The solubility parameters used are those described in the literature (for example, the Polymer data Manual: compilation OF society OF macromolecules, solvent Manual; compilation OF light shin san et al, D.W.VAN KREVELEN, PROPERTIES OF POLYMERS Third edition, p214 to 220 (1990), etc.).
In the method for producing a polarizing film protective laminate of the present invention, the detection strength of silicon on the coating surface of the substrate film is preferably 10cps/mA or less. In general, the release property of the formed photocurable resin layer can be improved by applying a release agent containing silicon or the like to the surface of the base film. However, the following problems exist: the silicon-containing release agent or the like is transferred to a solution containing a radical polymerizable compound and a solvent, and the physical properties of the obtained photocurable resin layer are changed or the equipment for producing the polarizing film protective laminate is contaminated. Therefore, a substrate film subjected to a release treatment by a method not using a silicon-containing release agent is preferably used. The measurement of silicon on the coated surface of the substrate film can be performed by using an X-ray analysis microscope as shown in examples described later.
< polarizing plate >
The polarizing plate obtained by the present invention has a photocurable resin layer laminated to at least one surface of a polarizing film via an adhesive layer. Thus, a polarizing plate having excellent moist heat resistance and surface smoothness can be obtained. The polarizing film used for producing the polarizing plate may be produced by uniaxially stretching a PVA film containing a dichroic dye in advance, by allowing the PVA film to adsorb the dichroic dye while uniaxially stretching the PVA film, or by allowing the PVA film to adsorb the dichroic dye after uniaxially stretching the PVA film.
By laminating the photocurable resin layer in the polarizing film protective laminate of the present invention to a polarizing film, a polarizing plate having a further excellent resistance to moist heat can be produced while being thin and lightweight. The method for producing the polarizing plate is not particularly limited, and the polarizing plate can be produced by a production method including the steps of: for example, a step of laminating the photocurable resin layer in the polarizing film protective laminate of the present invention on at least one surface of a polarizing film via an adhesive layer (laminating step); and a step (bonding step) of irradiating at least one of ultraviolet rays and electron beams after the bonding step to cure the adhesive layer; further, a step of peeling off the base film (peeling step) after the bonding step.
[ bonding Process ]
In the laminating step, the photocurable resin layer in the polarizing film protective laminate of the present invention is laminated to at least one surface of the polarizing film via an adhesive layer. The lamination method is not particularly limited, and a method of laminating polarizing films after applying an adhesive to the surface of the photocurable resin layer in the polarizing film protective laminate of the present invention is preferred in view of easier lamination. Further, the other polarizing film protective laminate may be laminated on the other surface of the polarizing film by applying an adhesive to the surface of the photocurable resin layer. The method for applying the adhesive is not particularly limited, and examples thereof include die coating, roll coating, air knife coating, gravure roll coating, blade coating, curtain flow coating, spray coating, wire bar coating, rod coating, and brush coating.
Further, the bonding body obtained in the bonding step may be pressed with a roller or the like. In this case, examples of the material of the roller include metal and rubber.
The adhesive used is not particularly limited as long as it can bond the polarizing film and the photocurable resin layer, and a solvent-free photocurable adhesive or the like can be suitably used.
In order to further improve the adhesion between the polarizing film and the photocurable resin layer, the surface of the photocurable resin layer may be modified by known corona treatment, plasma treatment, UV treatment, flame treatment, or the like as necessary.
[ bonding Process ]
In the bonding step, the uncured adhesive layer is cured by irradiating at least one of ultraviolet rays and electron beams. The irradiation with ultraviolet rays or electron beams can be performed using a known apparatus. The cumulative amount of ultraviolet rays or electron beams is not particularly limited, but is preferably 10 to 20,000mJ/cm2More preferably 30 to 5,000mJ/cm2In the presence of a surfactant. If the cumulative light amount is too small, the adhesion between the polarizing film and the photocurable resin layer may be insufficient. On the other hand, if the accumulated light amount is too large, excessive heat may be generated, and the adhesive layer, the polarizing film, and the photocurable resin layer may be deteriorated. From the viewpoints of curing speed, availability of an irradiation device, price, and the like, it is more preferable to use ultraviolet rays.
The curing of the adhesive layer may be promoted by heating as necessary during or after the irradiation with ultraviolet rays or electron beams. The heating temperature is preferably in the range of 40 to 130 ℃ and more preferably in the range of 50 to 100 ℃ from the viewpoints of curing speed, degree of deterioration of a polarizing film and the like. When the temperature is less than 40 ℃, curing of the adhesive layer is difficult to be promoted, and when the temperature exceeds 130 ℃, the polarizing film and the base film are likely to be deteriorated or deformed, and it is difficult to obtain a polarizing plate having excellent polarizing performance and smoothness.
[ peeling Process ]
By peeling the base film after the bonding step, a polarizing plate in which a photocurable resin layer is disposed on at least one surface of the polarizing film via an adhesive layer can be obtained.
Examples
The present invention is specifically illustrated by the following examples, but the present invention is not limited to these examples. The evaluation methods to the measurement methods used in the following examples and comparative examples are shown below.
[ boric acid transmittance in terms of boron atom of photocurable resin layer ]
The photocurable resin layer obtained in each of the following examples or comparative examples was mounted in a moisture-permeable cup (pressure application type, based on JIS Z-0208) containing pure water, and immersed in an 8 mass% boric acid aqueous solution at 60 ℃. The boron concentrations of the sample water (pure water) in the moisture permeability cup before the start of the test and the sample water in the moisture permeability cup after 24 hours of immersion were analyzed by ICP emission analysis (shimadzu multifunction ICP emission analyzer ICPE-9000, manufactured by shimadzu corporation), and the boron atom-equivalent boric acid permeability (a) was calculated from the increase in boron concentration by the following formula (1) (see fig. 1).
A＝｛（a24-a0）×10-6×M｝/S （1）
A: boron atom equivalent boric acid permeability [ g/m2・day]
a24: boron concentration [ ppm ] of sample water after 24 hours]
a0: boron concentration [ ppm ] of sample water (pure water) before the start of the test]
M: weight of sample Water [ g ]
S: contact area between the photocurable resin layer and the aqueous boric acid solution (transmission area of moisture-permeable cup) [ m [ ]2]。
[ adhesion between base film and photocurable resin layer ]
The polarizing film protective laminate obtained in each of the following examples and comparative examples was left to stand at 23 ℃ and 50% RH for 24 hours, and then 5 pieces of 250mm × 25mm short strip-shaped film pieces were cut out from the polarizing film protective laminate. Next, for each film, the base film and the photocurable resin layer were peeled off in accordance with the T-peel test of JIS K6854-3:1999, and the average value of 5 measurements of the obtained peel force was defined as the adhesive force. In this test, the peeling speed was set to 30 mm/min. When the adhesion between the base film and the photocurable resin layer was too high and the base film or the photocurable resin layer was broken, the evaluation was "material breakage".
[ two-times average surface roughness (rms) of the photocurable resin layer on the substrate film side ]
The base film of the polarizing film protective laminate obtained in each of the following examples or comparative examples was peeled off to expose the surface of the photocurable resin layer on the base film side. Thereafter, the surface shape of the photocurable resin layer on the substrate film side was measured using a white interference microscope (manufactured by zygo corporation), and the two-times average surface roughness (rms) was calculated (calculation range was 2.0mm × 2.7 mm).
[ Water contact Angle ]
A strip-shaped film piece of 200 mm. times.15 mm was cut out from the base film used in the following examples or comparative examples, and the water contact angle of the solution-coated surface of the film piece was measured according to JIS R3257:1999 (method for testing wettability of substrate glass surface). That is, a water droplet of 4 μ L or less is left on a horizontally placed membrane, the shape of the water droplet is measured, and the water contact angle θ (degree) is obtained from the radius r (mm) of the surface of the water droplet in contact with the membrane and the height h (mm) from the surface of the membrane to the apex of the water droplet according to the following formula (2).
θ ＝ 2tan-1（h/r） （2）。
The measurements were performed 5 times, and the average value thereof was defined as the water contact angle of the substrate film. The measurement was carried out at 25 ℃ and 50% RH.
[ silicon on the coating surface of the substrate film ]
A50 mm square piece of the base film used in the following examples or comparative examples was cut out, and the detection intensity of silicon on the solution-coated surface of the piece of film was measured using an X-ray analysis microscope (XGTT-5200 manufactured by horiba, Ltd., X-ray irradiation diameter of 100 μm, current of 1mA, X-ray tube voltage of 30kV, and measurement time of 400 seconds).
[ Total light transmittance and degree of polarization of polarizing plate ]
Rectangular samples of 2 polarizing plates having a length direction (MD) of 2cm and a width direction (TD) of 3cm were collected from the center portion in the width direction (TD) of the polarizing plate obtained in the following examples or comparative examples. For each sample, the light transmittance at an inclination of 45 ° and the light transmittance at an inclination of-45 ° with respect to the longitudinal direction were measured, and the average value of all of them was defined as the total light transmittance (%) of the polarizing plate. In the same manner as in the case of the total light transmittance (%), the light transmittance T/(%) when the two samples were in the parallel nicols state and the light transmittance T ∞ (%) when the two samples were in the orthogonal nicols state were measured, and the degree of polarization was determined from the following formula (3). In the measurement of the transmittance, a spectrophotometer with an integrating sphere ("V7100" manufactured by japan spectrophotometers) was used to correct the visual sensitivity of the C light source and the visible light region of the 2 ° field of view in accordance with JIS Z8722 (method for measuring the object color).
Degree of polarization { (T/T { (T/+ T })1/2×100 （3）。
The initial total light transmittance before the wet heat resistance test is denoted as T0。
[ moist Heat resistance of polarizing plate ]
From the central portion in the width direction (TD) of the polarizing plate obtained in the following examples and comparative examples, a rectangular sample of 2 polarizing plates having a length direction (MD) of 4cm and a width direction (TD) of 3cm was taken and fixed to a metal frame, and the initial total light transmittance (T) was determined by the above method0) And a degree of polarization. The resultant was placed in a constant temperature and humidity apparatus (HUMIDIC CHAMBER IG400 manufactured by ヤマト scientific Co.) at 60 ℃ and 90% RH, a moist heat resistance test was carried out for 48 hours, and the total light transmittance (T) after the moist heat resistance test was measured by the above-mentioned method48) And the degree of polarization. Using the following formula (4), from the above T0And T48The amount of change (Δ T) in total light transmittance was obtained and used as an index of the moist heat resistance of the polarizing plate.
ΔT＝T48-T0 （4）。
[ example 1]
< preparation of polarizing film-protecting laminate >
ヒタロイド 7975 g of a solution containing a radical polymerizable compound (32% by mass of a resin component, 32% by mass of a solvent, toluene, and an SP value of the solvent of 8.9, manufactured by Hitachi chemical industries, Ltd.) and 0.4g of 1-hydroxycyclohexyl phenyl ketone (IRGACURE 184, manufactured by BASF) were weighed into a sample tube and stirred for 24 hours to be uniformly mixed, thereby obtaining a solution. Thereafter, レイハイパー F (manufactured by Zhongjing industries, Ltd., water contact angle of 68.9 degrees, detection intensity of silicon of 5.25 cps/mA) as a release-treated PET film was cut into a size of 300mm × 150mm as a base film, the solution was applied to the release-treated surface by using a bar coater, and the solution was heated at 70 ℃ for 1 minute to volatilize the solvent, and then an ultraviolet irradiation apparatus (using a metal halide lamp of GS Yuasa, Ltd., irradiation intensity of 300 mW/cm) was used2) So that the accumulated light amount reaches 300mJ/cm2The polarizing film protective laminate having a photocurable resin layer with a thickness of 5.9 μm on the substrate film was obtained by irradiating ultraviolet rays as described above. The cumulative light amount was measured by using a UV measuring instrument (GS YUASA).
< evaluation of polarizing film protective laminate >
The obtained polarizing film protective laminate was evaluated for boric acid permeability in terms of boron atoms of the photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, and double-fold average surface roughness (rms) of the photocurable resin layer on the substrate film side, by the methods described above. The results are shown in tables 1 and 2.
< preparation of polarizing film >
A long PVA film having a thickness of 30 μm and a width of 65cm (a PVA film comprising PVA, glycerin and a surfactant and having a glycerin content of 12 parts by mass per 100 parts by mass of PVA and a surfactant content of 0.03 parts by mass per 100 parts by mass of PVA, which is a saponified product of a homopolymer of vinyl acetate and has a polymerization degree of 2,400 and a saponification degree of 99.9 mol%) was continuously pulled out from a roll thereof, and subjected to swelling treatment, dyeing treatment, crosslinking treatment, stretching treatment, fixing treatment and drying treatment to prepare a polarizing film.
That is, as the swelling treatment, the PVA film was immersed in water at 30 ℃ for 1 minute, and uniaxially stretched in the longitudinal direction at a stretch ratio of 2. Then, as the dyeing treatment, the fiber was immersed in an aqueous solution containing an iodine dye (iodine concentration: 0.02 mass%, potassium iodide concentration: 0.4 mass%, 30 ℃) for 1 minute, while uniaxially stretched at a stretch ratio of 1.2 times along the longitudinal direction. Further, as the crosslinking treatment, the sheet was immersed in an aqueous boric acid solution (boric acid concentration: 2.6 mass%, 30 ℃) for 2 minutes, while uniaxially stretched at a stretch ratio of 1.1 times in the longitudinal direction. Next, as a stretching treatment, uniaxial stretching was performed in a boric acid aqueous solution (boric acid concentration: 2.8 mass%, potassium iodide concentration: 5 mass%, 57 ℃) at a stretching ratio of 2.4 times along the longitudinal direction (total stretching ratio: 6.3 times). Further, as the fixing treatment, the plate was immersed in an aqueous boric acid solution (boric acid concentration: 1.5% by mass, potassium iodide concentration: 5% by mass, 22 ℃) for 10 seconds. Then, the film was dried at 60 ℃ for 1 minute to obtain a polarizing film.
< preparation of adhesive >
2g of 3-ethyl-3-hydroxymethyloxetane (manufactured by Toyo Synthesis Co., Ltd., OXT-101), 8g of 3 ', 4' -epoxycyclohexylmethyl 3, 4-epoxycyclohexanecarboxylate (manufactured by ダイセル Co., セロキサイド 2021P) and 0.8g of a 50 mass% solution of diphenyl [4- (phenylthio) phenyl ] sulfonium hexafluorophosphate (manufactured by サンアプロ Co., CPI-100P) were weighed into a sample tube and uniformly mixed by stirring for 24 hours, thereby obtaining an adhesive for bonding a polarizing film and a photocurable resin layer.
< preparation of polarizing plate >
The polarizing film protective laminate was cut into 2 pieces of 140mm × 120mm, and the adhesive was applied to the surface of the 1 st polarizing film protective laminate on the photocurable resin layer using a bar coater. Then, a polarizing film was superimposed on the adhesive, and the polarizing film was cut into a length direction (MD) of 120mm and a width direction (TD) of 100 mm. Thereafter, the same adhesive as described above was applied to the photocurable resin surface of the 2 nd polarizing film protective laminate using a bar coater, and the laminate was laminated on the other surface of the polarizing film. The laminate having the layers of the base film/photocurable resin layer/adhesive/polarizing film/adhesive/photocurable resin layer/base film thus obtained was introduced into a laminator and pressed, so that the thickness of each adhesive portion was adjusted to 1 μm. Thereafter, the adhesive was cured by irradiation with ultraviolet rays, and then the base films on both sides were peeled off and removed to obtain a polarizing plate.
< evaluation of polarizing plate >
With respect to the obtained polarizing plate, the initial polarization performance (initial total light transmittance (T)) of the polarizing plate was performed by the aforementioned method0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Polarization degree, and change amount of total light transmittance (Δ T)). The results are shown in Table 2.
[ example 2]
A polarizing film protective laminate and a polarizing plate were obtained in the same manner as in example 1, except that the thickness of the obtained photocurable resin layer was 1.4 μm. The obtained polarizing film protective laminate and polarizing plate were subjected to boric acid transmittance in terms of boron atoms in the photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, surface roughness average of two times (rms) of the photocurable resin layer on the substrate film side, and initial polarizing performance (initial total light transmittance (T) of the polarizing plate0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Polarization degree, and change amount of total light transmittance (Δ T)). The results are shown in tables 1 and 2.
[ example 3]
As the base film, レイハイパー N1 (manufactured by Zhongjing industries, Ltd., water contact angle of 84 degrees, detection intensity of silicon of 5.89 cps/mA) as a release-treated PET film was used, and the thickness of the obtained photocurable resin layer was 5.5. mu.m,except for this, a polarizing film protective laminate and a polarizing plate were obtained in the same manner as in example 1. The obtained polarizing film protective laminate and polarizing plate were subjected to boric acid transmittance in terms of boron atoms in the photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, surface roughness average of two times (rms) of the photocurable resin layer on the substrate film side, and initial polarizing performance (initial total light transmittance (T) of the polarizing plate0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Polarization degree, and change amount of total light transmittance (Δ T)). The results are shown in tables 1 and 2.
[ example 4]
A polarizing film protective laminate and a polarizing plate were obtained in the same manner as in example 1, except that ピューレックス AN15 (manufactured by imperial デュポンフィルム, water contact angle 82.7 degrees, and detection intensity of silicon 6.12 cps/mA) as a release-treated PET film was used as the base film, and the thickness of the obtained photocurable resin layer was 5.6 μm. The obtained polarizing film protective laminate and polarizing plate were subjected to boric acid transmittance in terms of boron atoms in the photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, surface roughness average of two times (rms) of the photocurable resin layer on the substrate film side, and initial polarizing performance (initial total light transmittance (T) of the polarizing plate0) Degree of polarization) and polarizing performance after the moist heat resistance test of a polarizing plate (total light transmittance after the moist heat resistance test (T)48) Polarization degree, and change amount of total light transmittance (Δ T)). The results are shown in tables 1 and 2.
[ example 5]
5g of dimethylol tricyclodecane diacrylate (ライトアクリレート DCP-A, manufactured by KyoeishｃA chemical Co., Ltd.) and 5g of tris (2-hydroxyethyl) isocyanurate triacrylate (M-315, manufactured by Toyo Seisaku K.K.), 0.4g of 1-hydroxycyclohexyl phenyl ketone (IRGACURE 184, manufactured by BASF Co., Ltd.) as ｃA photopolymerization initiator and ethyl acetate (Wako pure chemical industries, Ltd.) as ｃA solvent were added to the mixturePrepared, and the SP value is 9.1) is weighed into a sample tube, stirred for 24 hours and mixed evenly to obtain a solution. A polarizing film protective laminate and a polarizing plate were obtained in the same manner as in example 1, except that the thickness of the obtained photocurable resin layer was 5.1 μm. The obtained polarizing film protective laminate and polarizing plate were subjected to boric acid transmittance in terms of boron atoms in the photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, surface roughness average of two times (rms) of the photocurable resin layer on the substrate film side, and initial polarizing performance (initial total light transmittance (T) of the polarizing plate0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Polarization degree, and change amount of total light transmittance (Δ T)). The results are shown in tables 1 and 2.
Comparative example 1
16.67g of ヒタロイド 7975D (60% by mass of resin component, methyl isobutyl ketone as solvent, and 8.4% SP value of solvent, manufactured by Hitachi chemical Co., Ltd.) as a radical polymerizable compound and 0.4g of 1-hydroxycyclohexyl phenyl ketone (IRGACURE 184, manufactured by BASF) as a photopolymerization initiator were weighed into a sample tube, and stirred for 24 hours to be uniformly mixed, thereby obtaining a solution. A polarizing film protective laminate and a polarizing plate were obtained in the same manner as in example 1, except that the thickness of the obtained photocurable resin layer was 6.0 μm. The obtained polarizing film protective laminate and polarizing plate were subjected to boric acid transmittance in terms of boron atoms in the photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, surface roughness average of two times (rms) of the photocurable resin layer on the substrate film side, and initial polarizing performance (initial total light transmittance (T) of the polarizing plate0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Polarization degree, and change amount of total light transmittance (Δ T)). The results are shown in tables 1 and 2.
Comparative example 2
Will be contained as a radical polymerizable compound10g of 3, 4-epoxycyclohexanecarboxylic acid 3 ', 4' -epoxycyclohexylmethyl ester (セロキサイド 2021P, manufactured by ダイセル Co.) and diphenyl [4- (phenylthio) phenyl group as a photopolymerization initiator]0.8g of a 50 mass% solution (manufactured by サンアプロ Co., Ltd., CPI-100P) of sulfonium hexafluorophosphate and propylene carbonate as a solvent was weighed into a sample tube, and stirred for 24 hours to be uniformly mixed, thereby obtaining a solution. A polarizing film protective laminate and a polarizing plate were obtained in the same manner as in example 1, except that the thickness of the obtained photocurable resin layer was 6.1 μm. The obtained polarizing film protective laminate and polarizing plate were subjected to boric acid transmittance in terms of boron atom of the photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, surface roughness average (rms) of the photocurable resin layer on the substrate film side, and initial polarizing performance (initial total light transmittance (T) of the polarizing plate0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Polarization degree, and change amount of total light transmittance (Δ T)). The results are shown in tables 1 and 2.
Comparative example 3
A polarizing film protective laminate was obtained in the same manner as in example 1, except that ピューレックス a31 (manufactured by imperial デュポンフィルム, water contact angle 110.6 degrees, and silicon detection intensity 19.24 cps/mA) as a release-treated PET film was used as the base film, and the thickness of the obtained photocurable resin layer was 5.7 μm. However, when the resin composition is coated on a PET film, a solution is repelled, and thus a photocurable resin layer having a uniform film surface cannot be obtained. Therefore, the boric acid transmittance in terms of boron atoms of the obtained photocurable resin layer, the adhesion between the base film and the photocurable resin layer, the double-fold average surface roughness (rms) of the photocurable resin layer on the base film side, and the initial polarization performance (initial total light transmittance (T) of the polarizing plate could not be obtained0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Polarization degree, and change amount of total light transmittance (Δ T)). Will be provided withThe results are shown in tables 1 and 2.
Comparative example 4
A polarizing film protective laminate and a polarizing plate were obtained in the same manner as in example 1, except that ピューレックス a71 (manufactured by imperial デュポンフィルム, water contact angle 108.2 degrees, and silicon detection intensity 18.55 cps/mA) as a release-treated PET film was used as the base film, and the thickness of the obtained photocurable resin layer was 5.8 μm. The obtained polarizing film protective laminate and polarizing plate were evaluated for boric acid permeability in terms of boron atoms in the photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, and double-fold average surface roughness (rms) of the photocurable resin layer on the substrate film side. The two-times average surface roughness of the photocurable resin layer on the substrate film side was very large, and thus it was judged to be unsuitable, and the initial polarization performance (initial total light transmittance (T)) of the polarizing plate was terminated0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Polarization degree, and change amount of total light transmittance (Δ T)). The results are shown in tables 1 and 2.
Comparative example 5
A polarizing film protective laminate and a polarizing plate were obtained in the same manner as in example 1, except that a film obtained by corona-treating ピューレックス a71 (manufactured by imperial デュポンフィルム, silicon detection strength 18.55 cps/mA) as a release-treated PET film so that the water contact angle was 33.3 degrees was used as the base film. The obtained polarizing film protective laminate and polarizing plate were evaluated for boric acid permeability in terms of boron atoms in the photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, and double-fold average surface roughness (rms) of the photocurable resin layer on the substrate film side. The two-times average surface roughness of the photocurable resin layer on the substrate film side was very large, and thus it was judged to be unsuitable, and the initial polarization performance (initial total light transmittance (T)) of the polarizing plate was terminated0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Degree of polarizationAnd the amount of change in total light transmittance (Δ T)). The results are shown in tables 1 and 2.
Comparative example 6
A polarizing film protective laminate was obtained in the same manner as in example 1, except that TN-100 (manufactured by toyobo corporation, silicon detection strength: 7.11 cps/mA) as a release-treated PET film was subjected to corona treatment so that the water contact angle was 31.1 degrees, as a base film. Among them, the base film and the photocurable resin layer have a strong adhesive force, and the material of the photocurable resin layer is damaged. Therefore, the boric acid transmittance in terms of boron atoms in the photocurable resin layer, the two-times average surface roughness (rms) of the photocurable resin layer on the substrate film side, and the initial polarization performance (initial total light transmittance (T) of the polarizing plate cannot be obtained0) Degree of polarization) and polarization performance after wet heat resistance test of polarizing plate (total light transmittance (T) after wet heat resistance test48) Polarization degree, and change in total light transmittance (Δ T)). The results are shown in tables 1 and 2.
Description of the reference numerals
1 light-curing resin layer
2 cup with moisture permeability
3 pure water
4 closed container
560 ℃ 8% by mass aqueous boric acid solution
Claims (3)
1. A polarizing plate comprising a polarizing film protective laminate in which a photocurable resin layer comprising a radically polymerizable compound is laminated on a base film, wherein the photocurable resin layer is laminated to at least one surface of the polarizing film via an adhesive layer,
the radical polymerizable compound is a compound having an acryloyl group in a molecule,
the thickness of the light-cured resin layer is less than 9 μm, and the boric acid permeability of the light-cured resin layer is 2.25g/m in terms of boron atom2As well as below the seed and seed stage,
the adhesion between the base film and the photocurable resin layer is 0.005 to 0.06N/mm,
the two-times average surface roughness (rms) of the photocurable resin layer on the substrate film side after the substrate film is peeled from the photocurable resin layer is 300nm or less,
the polarizing plate is obtained by peeling off the substrate film in the polarizing film protective laminate.
2. The method for producing a polarizing plate according to claim 1, wherein the photocurable resin layer in a polarizing-film-protecting laminate obtained by laminating a photocurable resin layer containing a radical polymerizable compound on a base film is bonded to at least one surface of a polarizing film via an adhesive layer, and the method for producing the polarizing-film-protecting laminate comprises:
a step of applying a solution containing a radical polymerizable compound and a solvent to a base film,
a step of heating the substrate film after coating to volatilize the solvent, and
a step of irradiating at least one of ultraviolet rays and electron beams;
the water contact angle of the coating surface of the substrate film is 40 to 100 degrees,
the method for manufacturing the polarizing plate comprises the following steps:
a laminating step of laminating the photocurable resin layer in the polarizing film protective laminate on at least one surface of the polarizing film via an adhesive layer,
and an adhesion step of irradiating at least one of ultraviolet rays and electron beams after the adhesion step to cure the adhesive layer,
and a peeling step of peeling the base film after the bonding step.
3. The method for producing a polarizing plate according to claim 2, wherein the detection intensity of silicon on the coated surface of the base film is 10cps/mA or less.
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| KR102290005B1 (en) * | 2016-08-22 | 2021-08-13 | 주식회사 쿠라레 | Polarizer |
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