TW201920557A - Laminate for protecting polarizing film and method for producing same - Google Patents

Laminate for protecting polarizing film and method for producing same Download PDF

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TW201920557A
TW201920557A TW107131826A TW107131826A TW201920557A TW 201920557 A TW201920557 A TW 201920557A TW 107131826 A TW107131826 A TW 107131826A TW 107131826 A TW107131826 A TW 107131826A TW 201920557 A TW201920557 A TW 201920557A
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resin layer
film
polarizing
photocurable resin
laminated body
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TW107131826A
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TWI830706B (en
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川崎繪美
岡山沙樹
磯崎孝德
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日商可樂麗股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G02B5/3041Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Polarising Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

Provided is a laminated body for protecting a polarizing film, in which a photocurable resin layer comprising a radical polymerizable compound is laminated on a substrate film, wherein the laminated body for protecting a polarizing film is characterized in that: the thickness of the photocurable resin layer is 9 [mu]m or less; the boric acid permeation in terms of boron atoms of the photocurable resin layer is 2.25 g/m2.day or less; the adhesion force between the substrate film and the photocurable resin layer is 0.005-0.06 N/mm; and the root-mean-square surface roughness (rms) of the photocurable resin layer on the substrate film side, after the substrate film is separated from the photocurable resin layer, is 300 nm or less. There are thereby provided: a laminated body for protecting a polarizing film, the laminated body having exceptional surface smoothness and exceptional humidity and heat resistance even when the thickness of the photocurable resin layer is 9 [mu]m or less; and a method for manufacturing said laminated body.

Description

偏光薄膜保護用積層體及其製造方法    Laminate for polarizing film protection and manufacturing method thereof   

本發明係有關於一種光硬化樹脂層積層於基材薄膜而成的偏光薄膜保護用積層體、及該積層體之製造方法。 The present invention relates to a laminated body for protecting a polarizing film formed by laminating a photocurable resin on a base film, and a method for producing the laminated body.

具有光之透射及遮蔽機能的偏光板係與使光之偏光狀態變化的液晶同時為液晶顯示器(LCD)的基本構成要素。偏光板大多具有在偏光薄膜的表面貼合三乙酸纖維素(TAC)膜等的保護膜之結構。作為構成偏光板的偏光薄膜,其主流為在將聚乙烯醇(PVA)薄膜單軸拉伸而配向的拉伸薄膜吸附有碘系色素(I3 -或I5 -等)或二色性有機染料等二色性色素者。此種偏光薄膜通常藉由將預先含有二色性色素的PVA薄膜單軸拉伸、與PVA薄膜的單軸拉伸同時吸附二色性色素,或在將PVA薄膜單軸拉伸後吸附二色性色素等而連續地製造。 A polarizing plate having a function of transmitting and shielding light is a basic constituent element of a liquid crystal display (LCD) at the same time as a liquid crystal that changes a polarization state of the light. Many polarizing plates have a structure in which a protective film such as a cellulose triacetate (TAC) film is bonded to the surface of a polarizing film. As a polarizing film constituting a polarizing plate, the mainstream is a iodine dye (I 3 - or I 5 - etc.) or a dichroic organic substance adsorbed on a stretched film in which a polyvinyl alcohol (PVA) film is uniaxially stretched and aligned. Dyes and other dichroic pigments. Such a polarizing film is generally obtained by uniaxially stretching a PVA film containing a dichroic pigment in advance, simultaneously adsorbing a dichroic dye with a uniaxial stretching of the PVA film, or adsorbing a dichroic pigment after uniaxially stretching the PVA film. Sex pigments are continuously produced.

LCD係於計算機及手錶等小型設備、筆記型電腦、液晶螢幕、液晶彩色投影機、液晶電視、車載用導航系統、智慧型手機、屋內外所使用之測量儀器等廣 泛用途中使用;但近年來,特別是隨著擴展至小型智慧型手機等行動用途等,而極力要求偏光板薄型化。又,於行動用途中,由於使用場所遍及廣大的範圍,亦同時要求耐久性的提升。 LCDs are used in a wide range of applications such as small devices such as computers and watches, notebook computers, LCD screens, LCD color projectors, LCD TVs, car navigation systems, smart phones, and measuring instruments used indoors and outdoors; however, in recent years In particular, with the expansion to mobile applications such as small smartphones, thinning of polarizing plates is strongly required. Also, in mobile applications, durability is required due to the wide range of use locations.

作為將偏光板薄型化的手法之一,可舉出將保護薄膜薄型化;近年來,有人提出一種形成光硬化樹脂層來替代保護薄膜的偏光板(例如參照專利文獻1~4等)。 One of the methods for reducing the thickness of a polarizing plate is to reduce the thickness of a protective film. In recent years, there has been proposed a polarizing plate that forms a photocurable resin layer instead of the protective film (for example, refer to Patent Documents 1 to 4).

[先前技術文獻]     [Prior technical literature]     [專利文獻]     [Patent Literature]    

[專利文獻1]日本特開2011-221185號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2011-221185

[專利文獻2]日本特開2004-245924號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2004-245924

[專利文獻3]日本特表2013-513832號公報 [Patent Document 3] Japanese Patent Publication No. 2013-513832

[專利文獻4]日本特開2008-20891號公報 [Patent Document 4] Japanese Patent Laid-Open No. 2008-20891

然而,就專利文獻1~4所記載之形成有光硬化樹脂層的偏光板而言,在高溫高濕度條件下使用時偏光性能會變差。如專利文獻1或2所記載之方法所述,若於偏光薄膜的表面直接塗敷包含自由基聚合性化合物等的組成物,則光硬化樹脂層的表面平滑性容易變差,而有可能因外在干擾而導致偏光板的偏光性能變差。再者,由於包含自由基聚合性化合物等的組成物所含之溶劑會侵蝕偏光薄膜,而有偏光性能變差,或偏光薄膜與 光硬化樹脂層的接著力降低,而由長尺寸捲體將偏光板切成面板大小時等的操作處理時,光硬化樹脂層發生剝離的問題。又,於偏光薄膜的表面直接塗敷包含自由基聚合性化合物等的組成物時,由於有偏光薄膜劣化之虞,無法充分照射紫外線或電子束,而不易提升交聯密度。另一方面,專利文獻3或4中提出在脫模PET薄膜等的基材薄膜上形成光硬化樹脂層後,使用接著劑將光硬化樹脂層與偏光薄膜貼合的方法。然而,基材薄膜與光硬化樹脂層的剝離性若非良好,則光硬化樹脂層的表面平滑性會變差,而因外在干擾而導致偏光板的偏光性能變差。又,在高溫高濕度條件下使用時偏光性也會變差,而要求其之改善。 However, in the polarizing plate having a photocurable resin layer described in Patent Documents 1 to 4, the polarizing performance is deteriorated when used under high temperature and high humidity conditions. As described in the method described in Patent Document 1 or 2, if a composition containing a radical polymerizable compound or the like is directly applied to the surface of a polarizing film, the surface smoothness of the photocurable resin layer is likely to be deteriorated. External interference causes the polarization performance of the polarizer to deteriorate. Furthermore, the solvent contained in the composition containing a radically polymerizable compound etc. will attack the polarizing film and deteriorate the polarizing performance, or the adhesive force between the polarizing film and the light-curing resin layer is reduced. When the polarizing plate is cut to a panel size and the like, the photo-curable resin layer is peeled during handling. In addition, when a composition containing a radical polymerizable compound or the like is directly coated on the surface of the polarizing film, the polarizing film may be deteriorated, and it is not possible to sufficiently irradiate ultraviolet rays or electron beams, and it is difficult to increase the crosslinking density. On the other hand, Patent Document 3 or 4 proposes a method of forming a photocurable resin layer on a base film such as a release PET film, and then bonding the photocurable resin layer to the polarizing film using an adhesive. However, if the releasability between the base film and the photocurable resin layer is not good, the surface smoothness of the photocurable resin layer is deteriorated, and the polarizing performance of the polarizing plate is deteriorated due to external interference. In addition, when used under high-temperature and high-humidity conditions, the polarizing property is also deteriorated, and improvement is required.

本發明係為了解決上述課題而完成者,茲以提供一種可獲得表面平滑性優良,光硬化樹脂層的厚度縱為9μm以下耐濕熱性亦優良的偏光板之偏光薄膜保護用積層體及其製造方法為目的。 The present invention has been made in order to solve the above-mentioned problems, and it is therefore to provide a laminated body for protecting a polarizing film for obtaining a polarizing plate with excellent surface smoothness and a thickness of a photocurable resin layer of 9 μm or less and excellent in heat and humidity resistance, and a manufacturing method thereof Method for the purpose.

本案發明人等為達成上述目的而致力累積多次研究的結果發現,光硬化樹脂層的厚度縱為9μm以下,藉由將硼酸穿透度以硼原子換算為2.25g/m2‧day以下的光硬化樹脂層貼合於偏光薄膜,亦可獲得耐濕熱性優良的偏光板,而且透過基材薄膜與光硬化樹脂層的接著力為0.005~0.06N/mm,可獲得表面平滑性優良的光硬化樹脂層,且基於此等見解進一步重複研究而完成本發明。 The inventors of the present case have accumulated a number of studies in order to achieve the above-mentioned purpose. It has been found that the thickness of the photocurable resin layer is 9 μm or less in length, and the boric acid penetration is 2.25 g / m 2 The light-hardening resin layer is bonded to the polarizing film, and a polarizing plate with excellent moisture and heat resistance can also be obtained. The adhesion between the base film and the light-hardening resin layer is 0.005 to 0.06 N / mm, and light with excellent surface smoothness can be obtained. The resin layer is hardened, and the present invention is further repeated based on these findings.

亦即,本發明係有關於: That is, the present invention relates to:

[1]一種偏光薄膜保護用積層體,其為包含自由基聚合性化合物之光硬化樹脂層積層於基材薄膜而成的偏光薄膜保護用積層體,其中,前述光硬化樹脂層的厚度為9μm以下,前述光硬化樹脂層的硼酸穿透度以硼原子換算為2.25g/m2‧day以下,基材薄膜與光硬化樹脂層的接著力為0.005~0.06N/mm,由光硬化樹脂層剝離基材薄膜後之基材薄膜側之該光硬化樹脂層的均方根面粗糙度(rms)為300nm以下。 [1] A laminated body for protecting a polarizing film, which is a laminated body for protecting a polarizing film obtained by laminating a photocurable resin containing a radical polymerizable compound on a base film, wherein the thickness of the photocurable resin layer is 9 μm Hereinafter, the boric acid penetration of the photocurable resin layer is 2.25 g / m 2 or less in terms of boron atoms, and the adhesion between the substrate film and the photocurable resin layer is 0.005 to 0.06 N / mm. The root-mean-square surface roughness (rms) of the photocurable resin layer on the substrate film side after the substrate film is peeled off is 300 nm or less.

[2]一種偏光板,其中如[1]之偏光薄膜保護用積層體之光硬化樹脂層係經由接著劑層貼合於偏光薄膜的至少其中一面。 [2] A polarizing plate in which the light-curable resin layer of the laminated body for protecting a polarizing film according to [1] is adhered to at least one side of a polarizing film via an adhesive layer.

[3]一種如[1]之偏光薄膜保護用積層體之製造方法,其為將包含自由基聚合性化合物之光硬化樹脂層積層於基材薄膜而得的偏光薄膜保護用積層體之製造方法,其特徵為,具有:將包含自由基聚合性化合物與溶劑的溶液塗敷於基材薄膜之步驟;於塗敷後將前述基材薄膜加熱而使溶劑揮發之步驟;及照射紫外線及電子束之至少一者之步驟;前述基材薄膜之塗敷面的水接觸角為40~100度。 [3] A method for producing a laminated body for polarizing film protection as described in [1], which is a method for producing a laminated body for polarizing film protection obtained by laminating a photocurable resin containing a radical polymerizable compound on a base film. It is characterized in that it includes a step of applying a solution containing a radical polymerizable compound and a solvent to a substrate film; a step of heating the substrate film after application to volatilize the solvent; and irradiating ultraviolet rays and electron beams. At least one of the steps; the water contact angle of the coating surface of the substrate film is 40 to 100 degrees.

[4]如[3]之偏光薄膜保護用積層體之製造方法,其中基材薄膜之塗敷面之矽的檢測強度為10cps/mA以下。 [4] The method for manufacturing a laminated body for protecting a polarizing film according to [3], wherein the detection intensity of silicon on the coating surface of the base film is 10 cps / mA or less.

根據本發明,可提供一種可獲得表面平滑性優良,光硬化樹脂層的厚度縱為9μm以下耐濕熱性亦優良的偏光板之偏光薄膜保護用積層體及其製造方法。 According to the present invention, a laminated body for protecting a polarizing film that can obtain a polarizing plate having excellent surface smoothness and a thickness of a photocurable resin layer of 9 μm or less and excellent in moisture and heat resistance, and a method for producing the same can be provided.

1‧‧‧光硬化樹脂層 1‧‧‧Light-hardened resin layer

2‧‧‧透濕度容杯 2‧‧‧ Permeability container

3‧‧‧純水 3‧‧‧ pure water

4‧‧‧密閉容器 4‧‧‧ airtight container

5‧‧‧60℃的8質量%硼酸水溶液 8 mass% boric acid aqueous solution at 5‧‧‧60 ° C

6‧‧‧試樣水 6‧‧‧ sample water

圖1為測定硼原子換算之硼酸穿透度的方法相關之示意圖。 FIG. 1 is a schematic diagram related to a method for measuring the penetration of boric acid in terms of boric acid.

[實施發明之形態]     [Form of Implementing Invention]    

以下就本發明詳細加以說明。 The present invention will be described in detail below.

<偏光薄膜保護用積層體>     <Laminated body for polarizing film protection>    

本發明之偏光薄膜保護用積層體係一種在基材薄膜上積層厚度9μm以下之包含自由基聚合性化合物之光硬化樹脂層而成的偏光薄膜保護用積層體,其特徵為光硬化樹脂層的硼酸穿透度以硼原子換算為2.25g/m2‧day以下。透過光硬化樹脂層的硼酸穿透度以硼原子換算為2.25g/m2‧day以下,與偏光薄膜貼合時,可獲得可維持初始偏光性能之耐濕熱性優良的偏光板。硼酸穿透度以硼原子換算超過2.25g/m2‧day時,無法充分改善偏光板的耐濕熱性。由此觀點,光硬化樹脂層的硼酸穿透度以硼原子換算較佳為1.50g/m2‧day以下,更佳為0.50g/m2‧day以下,再更佳為0.20g/m2‧day以下,特佳為0.10g/m2‧day以下。另一方面,光硬化樹脂層的硼原子換算之硼酸穿透度的下限不特別限制,硼原子換算之硼酸穿透度過低時,有容易喪失光硬化樹脂 層的柔軟性之傾向,因此硼酸穿透度以硼原子換算較佳為0.02g/m2‧day以上,更佳為0.03g/m2‧day以上。此外,硼原子換算之硼酸穿透度能以後述實施例所記載之方法求得。 The laminated system for protecting a polarizing film of the present invention is a laminated body for protecting a polarizing film formed by laminating a light-curable resin layer containing a radical polymerizable compound with a thickness of 9 μm or less on a base film, which is characterized by boric acid in the photo-curable resin layer. The transmittance is 2.25 g / m 2 or less in terms of boron atom. The degree of boric acid transmission through the light-hardening resin layer is 2.25 g / m 2 or less in terms of boron atoms. When bonded to a polarizing film, a polarizing plate with excellent moisture and heat resistance that can maintain initial polarization performance can be obtained. If the boric acid penetration exceeds 2.25 g / m 2 in terms of boron atom, ‧day, the moisture and heat resistance of the polarizing plate cannot be sufficiently improved. From this point of view, the boric acid penetration of the light-hardening resin layer is preferably 1.50 g / m 2 or less in terms of boron atoms, more preferably 0.50 g / m 2 or less, and even more preferably 0.20 g / m 2 Below ‧day, especially preferred is below 0.10g / m 2 ‧day. On the other hand, the lower limit of the boron atomic conversion of boric acid conversion of the photocurable resin layer is not particularly limited. When the boron atomic conversion of boric acid conversion is too low, the softness of the photocurable resin layer tends to be lost. The transmittance in terms of boron atom is preferably 0.02 g / m 2 ‧day or more, and more preferably 0.03 g / m 2 ‧day or more. In addition, the boric acid penetration in terms of boron atom can be obtained by the method described in the examples described later.

於本發明中,光硬化樹脂層係包含自由基聚合性化合物等。透過使用自由基聚合性化合物,可降低所得之光硬化樹脂層的硼原子換算之硼酸穿透度。就自由基聚合性化合物而言,較佳使用分子內具有丙烯醯基的化合物。自由基聚合性化合物可單獨使用1種,亦可併用2種以上。又,作為照射紫外線及電子束之至少一者而使其硬化用之光聚合起始劑,較佳使用自由基聚合起始劑。就自由基聚合起始劑而言,可使用可藉由照射活性能量線而促進自由基聚合性化合物的反應之化合物。作為此類自由基聚合起始劑,可舉出例如苯乙酮類、二苯甲酮類、米氏酮類、安息香類等羰基化合物;四甲基甲硫碳醯胺一硫化物、噻噸酮等硫化合物等,較佳為羰基化合物。此等自由基聚合起始劑可單獨使用1種,亦可併用2種以上。 In the present invention, the photocurable resin layer system contains a radical polymerizable compound and the like. By using a radical polymerizable compound, it is possible to reduce the boric acid penetration of the boron atom conversion of the obtained photocurable resin layer. As the radical polymerizable compound, a compound having an acrylofluorenyl group in the molecule is preferably used. The radical polymerizable compound may be used singly or in combination of two or more kinds. Moreover, as a photopolymerization initiator for irradiating at least one of ultraviolet rays and an electron beam to harden it, a radical polymerization initiator is preferably used. As the radical polymerization initiator, a compound that can promote the reaction of a radical polymerizable compound by irradiating an active energy ray can be used. Examples of such a radical polymerization initiator include carbonyl compounds such as acetophenones, benzophenones, Michler's ketones, and benzoin; tetramethylmethanilamine monosulfide, thioxanthine Sulfur compounds such as ketones, etc., are preferably carbonyl compounds. These radical polymerization initiators may be used individually by 1 type, and may use 2 or more types together.

於本發明中,光硬化樹脂層的厚度為9μm以下。厚度超過9μm時,無法使積層有習知保護薄膜的偏光板充分達到薄膜化。由此觀點,光硬化樹脂層的厚度較佳為8μm以下,更佳為7μm以下,再更佳為6μm以下。另一方面,光硬化樹脂層之厚度下限不特別限定,若要以較薄的光硬化樹脂層達到前述硼原子換算之硼酸穿透度時,則有喪失光硬化樹脂層的柔軟性之傾向,因 此較佳為0.1μm以上,更佳為0.5μm以上,再更佳為1μm以上。 In the present invention, the thickness of the photocurable resin layer is 9 μm or less. When the thickness exceeds 9 μm, a polarizing plate with a conventional protective film laminated cannot be sufficiently thinned. From this viewpoint, the thickness of the photocurable resin layer is preferably 8 μm or less, more preferably 7 μm or less, and even more preferably 6 μm or less. On the other hand, the lower limit of the thickness of the photocurable resin layer is not particularly limited. If the boron acid penetration of the boron atom conversion is to be achieved with a thinner photocurable resin layer, the softness of the photocurable resin layer tends to be lost. Therefore, it is preferably 0.1 μm or more, more preferably 0.5 μm or more, and even more preferably 1 μm or more.

就本發明之偏光薄膜保護用積層體所使用之基材薄膜,較佳為表面均勻性優良者,可使用聚碳酸酯薄膜、三乙酸纖維素薄膜、降莰烯薄膜、聚丙烯薄膜、聚酯薄膜、聚苯乙烯薄膜等。基材薄膜之光硬化樹脂層側的表面亦可實施脫模處理。透過使用表面均勻性優良的基材薄膜,由光硬化樹脂層剝離基材薄膜後之基材薄膜側之該光硬化樹脂層的均方根面粗糙度(rms)易成為300nm以下。 The substrate film used in the laminated body for polarizing film protection of the present invention is preferably one having excellent surface uniformity. Polycarbonate film, cellulose triacetate film, norbornene film, polypropylene film, polyester can be used. Film, polystyrene film, etc. The surface of the substrate film on the photocurable resin layer side may be subjected to a release treatment. By using a substrate film having excellent surface uniformity, the root-mean-square surface roughness (rms) of the photocurable resin layer on the substrate film side after the substrate film is peeled from the photocurable resin layer tends to be 300 nm or less.

於本發明中,光硬化樹脂層與基材薄膜的接著力為0.005~0.06N/mm。將光硬化樹脂層與偏光薄膜貼合而得到偏光板後,由於需由光硬化樹脂層剝離基材薄膜,因此光硬化樹脂層與基材薄膜的接著力較佳為0.05N/mm以下,更佳為0.04N/mm以下,再更佳為0.03N/mm以下。此外,藉由強化所用基材薄膜的脫模處理,可使光硬化樹脂層與基材薄膜的接著力成為0.06N/mm以下。光硬化樹脂層與基材薄膜的接著力過低時,將光硬化樹脂層與偏光薄膜貼合時等的偏光薄膜保護用積層體之操作處理時,由於基材薄膜易從光硬化樹脂層剝落而不易操作處理,因此光硬化樹脂層與基材薄膜的接著力較佳為0.010N/mm以上,更佳為0.013N/mm以上,再更佳為0.015N/mm以上。 In the present invention, the adhesion between the photocurable resin layer and the substrate film is 0.005 to 0.06 N / mm. After the light-hardening resin layer is bonded to the polarizing film to obtain a polarizing plate, the base film needs to be peeled off from the light-hardening resin layer. Therefore, the adhesion between the light-hardening resin layer and the base film is preferably 0.05 N / mm or less. It is preferably 0.04 N / mm or less, and even more preferably 0.03 N / mm or less. In addition, by strengthening the release treatment of the base film used, the adhesion between the photocurable resin layer and the base film can be made 0.06 N / mm or less. When the adhesion between the photocurable resin layer and the base film is too low, when the laminated body for polarizing film protection such as when the photocurable resin layer and the polarizing film are bonded, the base film is likely to peel off from the photocurable resin layer. It is not easy to handle. Therefore, the adhesion between the light-hardening resin layer and the substrate film is preferably 0.010 N / mm or more, more preferably 0.013 N / mm or more, and still more preferably 0.015 N / mm or more.

於本發明中,由光硬化樹脂層剝離基材薄膜後之基材薄膜側之該光硬化樹脂層的均方根面粗糙度 (rms)為300nm以下。基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)較佳為250nm以下,更佳為200nm以下,再更佳為150nm以下。為使基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)成為300nm以下,重要的是:形成偏光薄膜保護用積層體時,在基材薄膜上包含自由基聚合性化合物與溶劑的溶液不會彈開;及基材薄膜與光硬化樹脂層的剝離性良好;諸如後述,調整自由基聚合性化合物所使用之溶劑的溶解度參數或基材薄膜之塗敷面的水接觸角係屬有效。基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)的下限不特別限制,由於不易具有極平滑的表面,而例如為20nm以上。 In the present invention, the root-mean-square surface roughness (rms) of the photocurable resin layer on the substrate film side after the substrate film is peeled from the photocurable resin layer is 300 nm or less. The root-mean-square roughness (rms) of the photocurable resin layer on the substrate film side is preferably 250 nm or less, more preferably 200 nm or less, and still more preferably 150 nm or less. In order to make the root-mean-square roughness (rms) of the photocurable resin layer on the base film side be 300 nm or less, it is important to include a radical polymerizable compound and The solvent solution does not spring up; and the peelability of the base film and the photocurable resin layer is good; for example, as described later, the solubility parameter of the solvent used for the radical polymerizable compound or the water contact angle of the coating surface of the base film is adjusted Department is valid. The lower limit of the root-mean-square surface roughness (rms) of the photocurable resin layer on the substrate film side is not particularly limited, and it is not easy to have an extremely smooth surface, but it is, for example, 20 nm or more.

<偏光薄膜保護用積層體之製造方法>     <Manufacturing method of laminated body for polarizing film protection>    

就本發明之偏光薄膜保護用積層體之製造方法來說,較佳為具有:將包含自由基聚合性化合物與溶劑的溶液塗敷於基材薄膜之步驟;於塗敷後將基材薄膜加熱而使溶劑揮發之步驟;及照射紫外線及電子束之至少一者之步驟,且前述基材薄膜之塗敷面的水接觸角為40~100度。藉由包含溶劑於該溶液中,厚度9μm以下之光硬化樹脂層的表面平滑性良好。 As for the manufacturing method of the laminated body for polarizing film protection of this invention, it is preferable to have the process of apply | coating the solution containing a radically polymerizable compound and a solvent to a base film, and heating a base film after coating. The step of volatilizing the solvent; and the step of irradiating at least one of ultraviolet rays and electron beams; and the water contact angle of the coating surface of the substrate film is 40 to 100 degrees. By including a solvent in this solution, the surface smoothness of the photocurable resin layer having a thickness of 9 μm or less is good.

[塗敷步驟]     [Coating step]    

就將包含自由基聚合性化合物與溶劑的溶液塗敷於基材薄膜之步驟,可採用任意的適切方法。作為將包含自由基聚合性化合物與溶劑的溶液塗敷於基材薄膜之方 法,可舉出例如模塗布、輥塗布、氣刀塗布、凹版輥塗布、刮刀輥塗布、刮刀塗布、淋幕式塗布、噴塗、線棒塗布、桿塗布、浸漬、毛刷塗布等方法。其中,為使所得光硬化樹脂層的厚度成為9μm以下,較佳為凹版輥塗布。 In the step of applying a solution containing a radically polymerizable compound and a solvent to the substrate film, any appropriate method can be adopted. Examples of the method for applying a solution containing a radically polymerizable compound and a solvent to a substrate film include die coating, roll coating, air knife coating, gravure roller coating, doctor blade coating, doctor blade coating, and curtain coating. , Spray coating, wire rod coating, rod coating, dipping, brush coating and other methods. Among these, in order to make the thickness of the obtained photocurable resin layer 9 μm or less, gravure roll coating is preferred.

[溶劑揮發步驟]     [Solvent evaporation step]    

就塗敷溶液後將基材薄膜加熱而使溶劑揮發之步驟而言,可採用任意的適切方法。可將塗敷有溶液的基材薄膜在熱輥上加熱,亦可於浮動乾燥機內加熱。熱輥或熱風之較佳溫度可根據所用溶劑的沸點來決定,較佳為60℃~120℃的範圍。又,較佳使溶劑揮發至溶劑的殘留量達10%以下。 For the step of heating the substrate film after the solution is applied to volatilize the solvent, any appropriate method can be adopted. The solution-coated substrate film can be heated on a heat roller or in a floating dryer. The preferred temperature of the hot roll or hot air can be determined according to the boiling point of the solvent used, and is preferably in the range of 60 ° C to 120 ° C. The solvent is preferably volatilized until the residual amount of the solvent becomes 10% or less.

[照射步驟]     [Irradiation procedure]    

就照射紫外線及電子束之至少一者之步驟而言,可將塗敷於基材薄膜上的溶液乾燥後直接照射紫外線及電子束之至少一者,亦可自基材薄膜側照射。又,基於硬化速度、照射裝置的取得性、價格等觀點,更佳為具有照射紫外線之步驟。 In the step of irradiating at least one of ultraviolet rays and electron beams, the solution applied on the substrate film may be directly irradiated with at least one of ultraviolet rays and electron beams after drying, or may be irradiated from the substrate film side. From the viewpoints of curing speed, availability of an irradiation device, and price, it is more preferable to have a step of irradiating ultraviolet rays.

前述紫外線或電子束可使用周知之裝置來照射。使用紫外線時,可採用可發出450nm以下波長區域的光之高壓水銀燈、超高壓水銀燈、碳弧燈、金屬鹵化物燈、氙燈、化學燈、LED等。又,使用電子束(EB)時,加速電壓較佳為0.1~10MeV的範圍內,照射線量 較佳為1~500kGy的範圍內。 The aforementioned ultraviolet rays or electron beams can be irradiated using a known device. When using ultraviolet rays, high-pressure mercury lamps, ultra-high-pressure mercury lamps, carbon arc lamps, metal halide lamps, xenon lamps, chemical lamps, LEDs, etc., which can emit light in a wavelength range below 450 nm can be used. When an electron beam (EB) is used, the acceleration voltage is preferably in the range of 0.1 to 10 MeV, and the irradiation dose is preferably in the range of 1 to 500 kGy.

前述紫外線或電子束的累計光量不特別限制,較佳為10~20,000mJ/cm2的範圍內,更佳為30~5,000mJ/cm2的範圍內。紫外線或電子束的累計光量過少的話,自由基聚合性化合物的硬化不良,而導致光硬化樹脂層的硼原子換算之硼酸穿透度變高或光硬化樹脂層的機械強度降低。另一方面,紫外線或電子束的累計光量過多的話,偏光薄膜保護用積層體會產生過多的熱,而導致光硬化樹脂層或基材薄膜劣化。 The integrated light quantity of ultraviolet or electron beam is not particularly limited, it is preferably in the range of 10 ~ 20,000mJ / cm 2, and more preferably in the range of 30 ~ 5,000mJ / cm 2 in. If the amount of integrated light of ultraviolet rays or electron beams is too small, the hardening of the radical polymerizable compound will be poor, and the boron atom conversion of the photocurable resin layer will increase, or the mechanical strength of the photocurable resin layer will decrease. On the other hand, if the amount of accumulated light of ultraviolet rays or electron beams is too much, the laminated body for polarizing film protection generates excessive heat, which causes deterioration of the photocurable resin layer or the base film.

於紫外線或電子束的照射中或照射後,為提升光硬化樹脂層的交聯密度,亦可視需求加熱而促進光硬化樹脂層的硬化。就此加熱溫度,基於硬化速度或對光硬化樹脂層及基材薄膜之影響等觀點,較佳為40~130℃的範圍內,更佳為50~100℃的範圍內。溫度小於40℃時,不易促進光硬化樹脂層的硬化;溫度超過130℃時,則基材薄膜容易變形,而無法獲得平滑的光硬化樹脂層。上述方法由於可於基材薄膜上充分提升光硬化樹脂層的交聯密度,而能夠適當降低硼原子換算之硼酸穿透度。 In order to increase the crosslinking density of the photo-curable resin layer during or after the irradiation with ultraviolet rays or electron beams, heating can also be performed as needed to promote the curing of the photo-curable resin layer. In view of this heating temperature, from the viewpoint of the curing speed or the effect on the light-curable resin layer and the base film, it is preferably in the range of 40 to 130 ° C, and more preferably in the range of 50 to 100 ° C. When the temperature is lower than 40 ° C, it is difficult to promote the curing of the photocurable resin layer; when the temperature exceeds 130 ° C, the substrate film is easily deformed, and a smooth photocurable resin layer cannot be obtained. The above method can sufficiently increase the crosslink density of the photocurable resin layer on the substrate film, and can appropriately reduce the boric acid penetration of boron atom conversion.

於本發明之偏光薄膜保護用積層體之製造方法中,基材薄膜之溶液塗敷面的水接觸角較佳為40~100度。基材薄膜之溶液塗敷面的水接觸角較大時,在基材薄膜上塗敷溶液時溶液容易彈開,而不易均勻地塗敷溶液。再者,縱使可均勻地塗敷溶液,仍有由光硬化樹脂層剝離基材薄膜後之基材薄膜側之光硬化樹脂層的 表面不易呈平滑的問題。另一方面,水接觸角較小時,基材薄膜與光硬化樹脂層的接著力變強,而不易由光硬化樹脂層剝離基材薄膜,或由光硬化樹脂層剝離基材薄膜後之基材薄膜側之光硬化樹脂層的表面平滑性變差。基於此等觀點,基材薄膜之溶液塗敷面的水接觸角較佳為45~95度,更佳為50~90度,再更佳為55~85度。為了將基材薄膜之溶液塗敷面的水接觸角調整於上述範圍,調整電暈處理等親水化處理的強度係屬有效。 In the method for manufacturing a laminated body for protecting a polarizing film of the present invention, the water contact angle of the solution-coated surface of the base film is preferably 40 to 100 degrees. When the water contact angle of the solution coating surface of the base film is large, the solution is easy to bounce off when the solution is coated on the base film, and it is not easy to uniformly apply the solution. Furthermore, even if the solution can be applied uniformly, there is still a problem that the surface of the photocurable resin layer on the substrate film side after the substrate film is peeled off by the photocurable resin layer is not easily smooth. On the other hand, when the water contact angle is small, the adhesion force between the base film and the photo-curable resin layer becomes strong, and it is difficult to peel the base film from the photo-curable resin layer or the substrate after the base film is peeled from the photo-curable resin layer. The surface smoothness of the photocurable resin layer on the material film side is deteriorated. Based on these viewpoints, the water contact angle of the solution-coated surface of the substrate film is preferably 45 to 95 degrees, more preferably 50 to 90 degrees, and even more preferably 55 to 85 degrees. In order to adjust the water contact angle of the solution-coated surface of the base film to the above range, it is effective to adjust the strength of the hydrophilization treatment such as corona treatment.

包含自由基聚合性化合物與溶劑的溶液之溶劑的溶解度參數(SP值)較佳為8~10(cal/cm3)1/2。溶劑的溶解度參數過小或過大的話,於基材薄膜上塗敷溶液時溶液容易彈開,而不易均勻地塗敷溶液。基於此觀點,溶劑的溶解度參數較佳為8.2~9.8(cal/cm3)1/2的範圍,更佳為8.4~9.6(cal/cm3)1/2的範圍,特佳為8.6~9.4(cal/cm3)1/2的範圍。溶解度參數係使用文獻(作為一例,係高分子資料手冊:高分子學會編,溶劑手冊;淺原照三他編,D.W.VAN KREVELEN,PROPERTIES OF POLYMERS Third edition,p214~220(1990)等)所記載者。 The solubility parameter (SP value) of the solvent containing the solution of the radically polymerizable compound and the solvent is preferably 8 to 10 (cal / cm 3 ) 1/2 . If the solubility parameter of the solvent is too small or too large, when the solution is coated on the substrate film, the solution is easy to pop open, and it is not easy to uniformly apply the solution. From this point of view, the solubility parameter of the solvent is preferably in the range of 8.2 to 9.8 (cal / cm 3 ) 1/2 , more preferably in the range of 8.4 to 9.6 (cal / cm 3 ) 1/2 , and particularly preferably 8.6 to 9.4. (cal / cm 3 ) 1/2 range. Solubility parameters are documented in the literature (as an example, the Polymer Materials Handbook: Edited by the Polymer Society, Solvent Handbook; edited by Terasa Asahara, DWVAN KREVELEN, PROPERTIES OF POLYMERS Third edition, p214 ~ 220 (1990), etc.).

於本發明之偏光薄膜保護用積層體之製造方法中,基材薄膜之塗敷面之矽的檢測強度較佳為10cps/mA以下。一般而言,藉由在基材薄膜的表面塗敷含矽脫模劑等,可使形成之光硬化樹脂層的剝離性更良好。然而,會有含矽脫模劑等轉移至包含自由基聚合性化合物與溶劑的溶液,而導致所得光硬化樹脂層的物性 發生變化,或汙染製造偏光薄膜保護用積層體之設備的問題。因此,較佳使用以不使用含矽脫模劑之方法實施脫模處理的基材薄膜。此外,基材薄膜之塗敷面之矽的測定可如後述之實施例所記載,使用X射線分析顯微鏡來測定。 In the manufacturing method of the laminated body for polarizing film protection of this invention, it is preferable that the detection intensity of the silicon of the coating surface of a base film is 10 cps / mA or less. In general, by applying a silicon-containing release agent or the like to the surface of a base film, the peelability of the formed photocurable resin layer can be made better. However, there is a problem that a silicon-containing release agent or the like is transferred to a solution containing a radically polymerizable compound and a solvent, resulting in a change in the physical properties of the obtained photocurable resin layer or contamination of equipment for manufacturing a laminated body for protecting a polarizing film. Therefore, it is preferable to use a base film that is subjected to a release treatment without using a silicon-containing release agent. The measurement of silicon on the coated surface of the base film can be performed using an X-ray analysis microscope as described in Examples described later.

<偏光板>     <Polarizer>    

依本發明所得之偏光板係於偏光薄膜的至少其中一面,經由接著劑層貼合光硬化樹脂層而成者。藉此,可獲得耐濕熱性與表面平滑性優良的偏光板。用來製作偏光板之偏光薄膜可藉由對預含二色性色素之PVA薄膜實施單軸拉伸、與PVA薄膜之單軸拉伸同時使二色性色素吸附,或對PVA薄膜實施單軸拉伸後使二色性色素吸附等來製造。 The polarizing plate obtained according to the present invention is obtained by bonding a photocurable resin layer to at least one side of a polarizing film through an adhesive layer. Thereby, a polarizing plate excellent in moist heat resistance and surface smoothness can be obtained. The polarizing film used to make the polarizing plate can be uniaxially stretched to a PVA film pre-containing dichroic pigment, and simultaneously adsorb the dichroic pigment with the uniaxial stretching of the PVA film, or uniaxially to the PVA film. It is manufactured by adsorbing a dichroic dye or the like after stretching.

藉由將本發明之偏光薄膜保護用積層體中的光硬化樹脂層貼合於偏光薄膜,可製作呈薄型輕量化,且耐濕熱性更優良的偏光板。偏光板之製作方法不特別限制,可藉由具備例如以下步驟之製造方法來製作:於偏光薄膜的至少其中一面,經由接著劑層貼合本發明之偏光薄膜保護用積層體中的光硬化樹脂層之步驟(貼合步驟);及於該貼合步驟後照射紫外線或電子束之至少一者而使接著劑層硬化之步驟(接著步驟);進而,於該接著步驟後剝離基材薄膜之步驟(剝離步驟)。 By bonding the light-hardening resin layer in the laminated body for protecting a polarizing film of the present invention to a polarizing film, it is possible to produce a polarizing plate that is thin and lightweight, and has superior humidity and heat resistance. The manufacturing method of the polarizing plate is not particularly limited, and it can be manufactured by a manufacturing method having, for example, the following steps: At least one side of the polarizing film is bonded to the photocurable resin in the laminated body for polarizing film protection of the present invention through an adhesive layer. A step of laminating (adhesion step); and a step of hardening the adhesive layer by irradiating at least one of ultraviolet rays or electron beams after the lamination step (next step); further, peeling off the substrate film after the next step Step (peeling step).

[貼合步驟]     [Laminating step]    

於貼合步驟中,係於偏光薄膜的至少其中一面,經由接著劑層貼合本發明之偏光薄膜保護用積層體中的光硬化樹脂層。此貼合方法不特別限制,而基於可更簡便地貼合,較佳為對本發明之偏光薄膜保護用積層體的光硬化樹脂層面塗敷接著劑後,再疊合偏光薄膜的方法。再者,亦可對另一偏光薄膜保護用積層體的光硬化樹脂層面塗敷接著劑,再疊合於偏光薄膜的另一面。塗布接著劑的方法不特別限定,可舉出例如模塗布、輥塗布、風刀塗布、凹版輥塗布、刮刀輥塗布、刮刀塗布、淋幕式塗布、噴塗、線棒塗布、桿塗布、毛刷塗布等方法。 In the bonding step, the photocurable resin layer in the polarizing film protection laminate of the present invention is bonded to at least one side of the polarizing film via an adhesive layer. This laminating method is not particularly limited, and is based on simpler lamination, and is preferably a method of laminating a polarizing film after applying an adhesive to the photocurable resin layer of the laminated body for polarizing film protection of the present invention. Furthermore, an adhesive may be applied to the photocurable resin layer of another laminated body for polarizing film protection, and then laminated on the other side of the polarizing film. The method of applying the adhesive is not particularly limited, and examples thereof include die coating, roll coating, air knife coating, gravure roll coating, doctor roll coating, doctor blade coating, curtain coating, spray coating, wire rod coating, rod coating, and brush Coating and other methods.

再者,亦可將貼合步驟中所得之貼合物以輥等加壓。此時,作為輥之材質,可舉出例如金屬或橡膠等。 The paste obtained in the pasting step may be pressed with a roller or the like. In this case, examples of the material of the roller include metal and rubber.

就所用之接著劑而言,只要是可接著偏光薄膜與光硬化樹脂層者則不特別限制,宜使用無溶劑型光硬化性接著劑等。 The adhesive used is not particularly limited as long as it is capable of adhering a polarizing film and a photocurable resin layer, and a solvent-free photocurable adhesive is preferably used.

又,為使偏光薄膜與光硬化樹脂層的接著力進一步提升,亦可視需求對上述光硬化樹脂層的表面以周知之電暈處理、電漿處理、UV處理、火焰處理等進行改質。 In addition, in order to further improve the adhesion between the polarizing film and the light-hardening resin layer, the surface of the light-hardening resin layer may be modified by a known corona treatment, plasma treatment, UV treatment, flame treatment, or the like, as required.

[接著步驟]     [Next steps]    

於接著步驟中,係照射紫外線或電子束之至少一者而使未硬化之接著劑層硬化。紫外線或電子束的照射可使用周知之裝置來進行。紫外線或電子束的累計光量不 特別限制,較佳為10~20,000mJ/cm2的範圍內,更佳為30~5,000mJ/cm2的範圍內。累計光量過少的話,偏光薄膜與光硬化樹脂層的接著力不足。另一方面,累計光量過多的話,則會產生過多的熱,而導致接著劑層或偏光薄膜、及光硬化樹脂層劣化。此外,基於硬化速度、照射裝置的取得性、價格等觀點,更佳為使用紫外線。 In the subsequent step, the uncured adhesive layer is cured by irradiating at least one of ultraviolet rays or electron beams. Irradiation with ultraviolet rays or electron beams can be performed using a known device. Integrated light quantity of ultraviolet or electron beam is not particularly limited, it is preferably in the range of 10 ~ 20,000mJ / cm 2, and more preferably in the range of 30 ~ 5,000mJ / cm 2 in. If the amount of accumulated light is too small, the adhesion between the polarizing film and the photocurable resin layer is insufficient. On the other hand, if the cumulative amount of light is too large, excessive heat is generated, and the adhesive layer, the polarizing film, and the photocurable resin layer are deteriorated. In addition, from the viewpoints of curing speed, availability of irradiation equipment, and price, it is more preferable to use ultraviolet rays.

於紫外線或電子束的照射中或照射後,亦可視需求藉由加熱來促進接著劑層的硬化。此加熱溫度係基於硬化速度或偏光薄膜等的劣化程度等觀點,較佳為40~130℃的範圍內,更佳為50~100℃的範圍內。溫度小於40℃時,不易促進接著劑層的硬化;溫度超過130℃時,則偏光薄膜或基材薄膜容易劣化或變形,而不易得到偏光性能或平滑性優良的偏光板。 During or after irradiation with ultraviolet rays or electron beams, the hardening of the adhesive layer can also be promoted by heating as required. This heating temperature is based on viewpoints such as the hardening rate and the degree of deterioration of the polarizing film, etc., and is preferably in the range of 40 to 130 ° C, and more preferably in the range of 50 to 100 ° C. When the temperature is lower than 40 ° C, it is difficult to promote the hardening of the adhesive layer; when the temperature is higher than 130 ° C, the polarizing film or the substrate film is easily deteriorated or deformed, and it is difficult to obtain a polarizing plate with excellent polarization performance or smoothness.

[剝離步驟]     [Stripping step]    

藉由在接著步驟後剝離基材薄膜,可獲得光硬化樹脂層經由接著劑層配置於偏光薄膜的至少其中一面的偏光板。 By peeling the base film after the subsequent step, a polarizing plate in which the photocurable resin layer is disposed on at least one side of the polarizing film through the adhesive layer can be obtained.

[實施例]     [Example]    

根據以下實施例更具體地說明本發明,惟本發明不受此等實施例的任何限定。此外,以下示出以下實施例及比較例中所採用的各種評定方法或測定方法。 The present invention will be described more specifically based on the following examples, but the present invention is not limited at all by these examples. In addition, various evaluation methods or measurement methods used in the following examples and comparative examples are shown below.

[光硬化樹脂層的硼原子換算的硼酸穿透度]     [Boric acid penetration in terms of boron atom of photocurable resin layer]    

將以下各實施例或比較例中所得之光硬化樹脂層安 裝於裝有純水的透濕度容杯(緊固式,依據JIS Z-0208)中,浸漬於60℃的8質量%硼酸水溶液中。然後,以ICP發光分析法(島津製作所製島津MULTI型ICP發光分析儀ICPE-9000)分析試驗開始前之透濕度容杯內的試樣水(純水)、與浸漬24小時後之透濕度容杯內的試樣水的硼濃度,由其硼濃度增加量依下述式(1)算出硼原子換算之硼酸穿透度(A)(參照圖1)。 The light-hardening resin layer obtained in each of the following examples or comparative examples was mounted in a moisture-permeable container (fastened type, based on JIS Z-0208) containing pure water, and immersed in an 8 mass% boric acid aqueous solution at 60 ° C. . Then, the ICP luminescence analysis method (Shimadzu MULTI-type ICP luminescence analyzer ICPE-9000, manufactured by Shimadzu Corporation) was used to analyze the sample water (pure water) in the water vapor permeability container before the test and the water vapor permeability after immersion for 24 hours. The boron concentration of the sample water in the cup was calculated from the increase in boron concentration according to the following formula (1): the boric acid penetration (A) (see Fig. 1).

A={(a24-a0)×10-6×M}/S (1) A = ((a 24 -a 0 ) × 10 -6 × M) / S (1)

A:硼原子換算之硼酸穿透度[g/m2‧day] A: Boric acid penetration in terms of boron atom [g / m 2 ‧day]

a24:24小時後之試樣水的硼濃度[ppm] a 24 : boron concentration in sample water after 24 hours [ppm]

a0:試驗開始前之試樣水(純水)的硼濃度[ppm] a 0 : boron concentration of the sample water (pure water) before the start of the test [ppm]

M:試樣水的重量[g] M: weight of sample water [g]

S:光硬化樹脂層與硼酸水溶液接觸之面積(透濕度容杯的穿透面積)[m2] S: The area where the light-hardening resin layer is in contact with the aqueous boric acid solution (penetration area of the water permeability container) [m 2 ]

[基材薄膜與光硬化樹脂層的接著力]     [Adhesion between substrate film and photocurable resin layer]    

將以下各實施例或比較例中所得之偏光薄膜保護用積層體在23℃、50%RH的條件下靜置24小時後,由該偏光薄膜保護用積層體各切出5片250mm×25mm的長條狀薄膜片。其次,對各薄膜片,將基材薄膜與光硬化樹脂層之間,依據JIS K6854-3:1999之T型剝離試驗予以剝離,以所得剝離力之5次測定的平均值作為接著力。於該試驗中,剝離速度係設為30mm/分鐘。此外,基材薄膜與光硬化樹脂層的接著力過高而使基材薄膜或光硬化樹脂層遭破壞時,係評為「材料破壞」。 After the laminated bodies for polarizing film protection obtained in each of the following examples or comparative examples were allowed to stand under the conditions of 23 ° C and 50% RH for 24 hours, 5 pieces of 250 mm × 25 mm were cut out of the laminated bodies for polarizing film protection. Long thin film sheet. Next, for each film sheet, the base film and the photocurable resin layer were peeled in accordance with a T-type peel test according to JIS K6854-3: 1999, and the average value of five measurements of the obtained peel force was used as the adhesion force. In this test, the peeling speed was set to 30 mm / minute. In addition, when the adhesion between the base film and the photo-curable resin layer is too high and the base film or the photo-curable resin layer is damaged, it is evaluated as "material failure".

[基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)]     [Root-Mean-Square Roughness (rms) of the Photocurable Resin Layer on the Base Film Side]    

剝離以下各實施例或比較例中所得之偏光薄膜保護用積層體的基材薄膜,使基材薄膜側之光硬化樹脂層的表面露出。其後,使用白色干涉顯微鏡(zygo公司製)測定基材薄膜側之光硬化樹脂層的表面形狀,計算出均方根面粗糙度(rms)(計算範圍為2.0mm×2.7mm)。 The base film of the laminated body for polarizing film protection obtained in each of the following Examples or Comparative Examples was peeled off to expose the surface of the photocurable resin layer on the base film side. Thereafter, the surface shape of the photocurable resin layer on the base film side was measured using a white interference microscope (manufactured by Zygo), and the root-mean-square surface roughness (rms) was calculated (the calculation range was 2.0 mm × 2.7 mm).

[水接觸角]     [Water contact angle]    

由以下實施例或比較例中所使用之基材薄膜切出200mm×15mm的長條狀薄膜片,依據JIS R3257:1999(基板玻璃表面之濡濕性試驗方法)之記載測定此薄膜片之溶液塗敷面上的水接觸角。亦即,在呈水平配置的薄膜片上靜置4μL以下之水滴,測定水滴的形狀,由水滴接觸薄膜片的面之半徑r(mm)、及從薄膜片表面至水滴的頂點之高度h(mm),依下述式(2)求出水接觸角θ(度)。 A 200 mm × 15 mm long thin film sheet was cut from the substrate film used in the following examples or comparative examples, and the solution coating of this thin film sheet was measured in accordance with JIS R3257: 1999 (Test method for wettability of the substrate glass surface). Water contact angle on the surface. That is, a water droplet of 4 μL or less is left to stand on a horizontally arranged film sheet, and the shape of the water droplet is measured. The radius r (mm) of the surface where the water droplet contacts the film sheet, and the height h (mm) ), And the water contact angle θ (degrees) is obtained by the following formula (2).

θ=2tan-1(h/r) (2) θ = 2tan -1 (h / r) (2)

此外,測定係實施5次,以其平均值作為該基材薄膜的水接觸角。又,測定係在25℃、50%RH的條件下進行。 The measurement was performed five times, and the average value was used as the water contact angle of the base film. The measurement was performed under the conditions of 25 ° C and 50% RH.

[基材薄膜之塗敷面的矽]     [Silicon on the coating surface of the base film]    

由以下實施例或比較例中所使用之基材薄膜切出50mm見方之薄膜片,使用X射線分析顯微鏡(堀場製作所股份有限公司製XGT-5200,X射線照射徑100μm,電 流1mA,X射線管電壓30kV,測定時間400秒)來測定此薄膜片之溶液塗敷面的矽的檢測強度。 A 50 mm square film was cut from the base film used in the following examples or comparative examples, and an X-ray analysis microscope (XGT-5200 manufactured by Horiba, Ltd. was used. The X-ray irradiation diameter was 100 μm and the current was 1 mA. The X-ray tube The voltage was 30 kV, and the measurement time was 400 seconds.)

[偏光板的總透光率及偏光度]     [Total transmittance and polarization of polarizing plate]    

自以下實施例或比較例中所得之偏光板之寬度方向(TD)的中央部,採取2片在偏光板之長度方向(MD)為2cm、在寬度方向(TD)為3cm的長方形試樣。針對各試樣,測定與長度方向傾斜45°時的光穿透率、與傾斜-45°時的光穿透率,以彼等全部的平均值作為該偏光板的總透光率(%)。又,以與上述總透光率(%)之情形同樣的方式測定該2片試樣呈平行尼科耳狀態時的光穿透率T ∥(%)、及該2片試樣呈正交尼科耳狀態時的光穿透率T ⊥(%),依下述式(3)求出偏光度。此外,穿透率的測定係使用附有積分球之分光光度計(日本分光股份有限公司製「V7100」),依據JIS Z 8722(物體顏色之測定方法),進行C光源、2°視野之可見光區域的視感度校正。 From the central portion in the width direction (TD) of the polarizing plate obtained in the following examples or comparative examples, two rectangular samples having a length direction (MD) of the polarizing plate of 2 cm and a width direction (TD) of 3 cm were taken. For each sample, the light transmittance at a 45 ° inclination from the longitudinal direction and the light transmittance at a -45 ° inclination were measured, and the average of all of them was taken as the total transmittance (%) of the polarizing plate. . In addition, the light transmittance T ∥ (%) when the two samples were in a parallel Nicols state were measured in the same manner as in the case of the total light transmittance (%), and the two samples were orthogonal. The light transmittance T ⊥ (%) in the Nicols state was determined by the following formula (3). In addition, the transmittance was measured using a spectrophotometer with an integrating sphere ("V7100" manufactured by JASCO Corporation) in accordance with JIS Z 8722 (method for measuring the color of an object), and visible light with a C light source and a 2 ° field of view Visual sensitivity correction of the area.

偏光度={(T ∥-T ⊥)/(T ∥+T ⊥)}1/2×100 (3) Polarization = ((T ∥-T ⊥) / (T ∥ + T ⊥)) 1/2 × 100 (3)

此外,將耐濕熱性試驗前的初始總透光率設為T0In addition, the initial total light transmittance before the moist heat resistance test was set to T 0 .

[偏光板的耐濕熱性]     [Damp and heat resistance of polarizing plate]    

自以下實施例或比較例中所得之偏光板之寬度方向(TD)的中央部,採取2片朝偏光板之長度方向(MD)為4cm、朝寬度方向(TD)為3cm的長方形試樣,分別固定於金屬框,並根據上述方法求出初始總透光率(T0)及偏光度。置入60℃、90%RH的恆溫恆濕器(Yamato Scientific股份有限公司製HUMIDIC CHAMBER IG400),進行48小時的耐濕熱性試驗,根據上述方法測定耐濕熱性試驗後的總透光率(T48)、偏光度。由上述T0與T48,利用下述式(4)求出總透光率的變化量(△T),將其作為偏光板的耐濕熱性的指標。 From the central portion of the width direction (TD) of the polarizing plate obtained in the following examples or comparative examples, two rectangular samples having a length direction (MD) of the polarizing plate of 4 cm and a width direction (TD) of 3 cm were taken. Each was fixed to a metal frame, and the initial total light transmittance (T 0 ) and the degree of polarization were obtained according to the above method. A 60 ° C, 90% RH thermo-hygrostat (HUMIDIC CHAMBER IG400, manufactured by Yamato Scientific Co., Ltd.) was placed, and a 48-hour humidity and heat resistance test was performed. The total light transmittance after the humidity and heat resistance test (T 48 ). Polarization. From the above T 0 and T 48 , the change amount (ΔT) of the total light transmittance was obtained by the following formula (4), and this was used as an index of the moisture and heat resistance of the polarizing plate.

△T=T48-T0 (4) △ T = T 48 -T 0 (4)

[實施例1]     [Example 1]     <偏光薄膜保護用積層體的製作>     <Production of laminated body for polarizing film protection>    

於試樣管中秤量作為包含自由基聚合性化合物與溶劑的溶液之包含自由基聚合性化合物的HITALOID 7975(日立化成工業股份有限公司製,樹脂分32質量%,溶劑甲苯,溶劑的SP值8.9)31.25g與1-羥基環己基苯基酮(BASF製IRGACURE 184)0.4g,攪拌24小時予以均勻混合,而得到溶液。其後,將作為基材薄膜之經脫模處理PET薄膜之LAYHIPAR F(中井工業股份有限公司製,水接觸角68.9度,矽的檢測強度5.25cps/mA)切成大小300mm×150mm,使用棒塗布器將前述溶液塗敷於脫模處理面,以70℃加熱1分鐘將溶劑揮發後,使用紫外線照射裝置(使用GS YUASA股份有限公司之金屬鹵化物燈,照射強度300mW/cm2),以累計光量達300mJ/cm2的方式照射紫外線,而得到在基材薄膜上具有厚度5.9μm之光硬化樹脂層的偏光薄膜保護用積層體。此外,就此累計光量係使用UV量測器(GS YUASA股份有限公司)來測定。 HITALOID 7975 (manufactured by Hitachi Chemical Co., Ltd., resin content 32% by mass, solvent toluene, and solvent SP value 8.9 was measured in a sample tube as a solution containing the radical polymerizable compound and a solvent. ) 31.25 g and 0.4 g of 1-hydroxycyclohexylphenyl ketone (IRGACURE 184 manufactured by BASF) were stirred and mixed uniformly for 24 hours to obtain a solution. Thereafter, LAYHIPAR F (manufactured by Nakai Industry Co., Ltd., water contact angle 68.9 degrees, silicon detection strength 5.25 cps / mA) was cut into a size 300 mm × 150 mm as a base film, and a rod was used. The applicator applied the solution to the release-treated surface, heated it at 70 ° C for 1 minute to volatilize the solvent, and then used an ultraviolet irradiation device (using a metal halide lamp of GS YUASA Co., Ltd., with an irradiation intensity of 300 mW / cm 2 ). Ultraviolet rays were irradiated so that the accumulated light amount reached 300 mJ / cm 2 to obtain a laminated body for polarizing film protection having a light-curing resin layer having a thickness of 5.9 μm on the base film. The cumulative light amount was measured using a UV measuring device (GS YUASA Co., Ltd.).

<偏光薄膜保護用積層體的評定>     <Evaluation of laminated body for polarizing film protection>    

針對所得偏光薄膜保護用積層體,根據前述方法進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、及基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)的評定。將結果示於表1及表2。 With respect to the obtained laminated body for protecting a polarizing film, the boric acid conversion of the boron atom conversion of the photocurable resin layer, the adhesion force of the base film and the photocurable resin layer, and the Evaluation of root mean square roughness (rms). The results are shown in Tables 1 and 2.

<偏光薄膜的製作>     <Production of Polarizing Film>    

將厚度為30μm且寬度為65cm的長尺寸PVA薄膜(包含PVA、甘油與界面活性劑,相對於100質量份的PVA,甘油的含量為12質量份;相對於100質量份的PVA,界面活性劑的含量為0.03質量份的PVA薄膜。PVA為乙酸乙烯酯之均聚物的皂化物,聚合度為2,400,皂化度為99.9莫耳%)自其薄膜捲連續地捲出,實施膨潤處理、染色處理、交聯處理、拉伸處理、固定處理及乾燥處理而製成偏光薄膜。 A long-sized PVA film (including PVA, glycerol, and a surfactant, having a thickness of 30 μm and a width of 65 cm, contains 12 parts by mass of glycerol relative to 100 parts by mass of PVA; and 100 parts by mass of PVA, a surfactant The content of PVA film is 0.03 parts by mass. PVA is a saponified product of a homopolymer of vinyl acetate with a degree of polymerization of 2,400 and a degree of saponification of 99.9 mol%. The film is continuously rolled out from the film roll, subjected to swelling treatment, and dyed. Treatment, cross-linking treatment, stretching treatment, fixing treatment, and drying treatment to form a polarizing film.

亦即,就膨潤處理,係將PVA薄膜浸漬於30℃的水中1分鐘,於此期間以拉伸倍率2倍朝長度方向實施單軸拉伸。然後,就染色處理,係浸漬於含有碘系色素的水溶液(碘濃度:0.02質量%,碘化鉀濃度:0.4質量%,30℃)中1分鐘,於此期間以拉伸倍率1.2倍朝長度方向實施單軸拉伸。進而,就交聯處理,係浸漬於硼酸水溶液(硼酸濃度:2.6質量%、30℃)中2分鐘,於此期間以拉伸倍率1.1倍朝長度方向實施單軸拉伸。接著,就拉 伸處理,係於硼酸水溶液(硼酸濃度:2.8質量%,碘化鉀濃度:5質量%、57℃)中以拉伸倍率2.4倍朝長度方向實施單軸拉伸(總拉伸倍率6.3倍)。再者,就固定處理,係浸漬於硼酸水溶液(硼酸濃度:1.5質量%,碘化鉀濃度:5質量%、22℃)中10秒。其後,就乾燥處理,係以60℃乾燥1分鐘,而得到偏光薄膜。 That is, for the swelling treatment, the PVA film was immersed in water at 30 ° C. for 1 minute, and during this period, uniaxial stretching was performed at a stretching ratio of 2 times in the longitudinal direction. Then, the dyeing treatment was performed by immersing in an aqueous solution (iodine concentration: 0.02% by mass, potassium iodide concentration: 0.4% by mass, 30 ° C) containing an iodine-based pigment for 1 minute, and the stretching was performed in the lengthwise direction at 1.2 times during this period. Uniaxial stretching. Further, the crosslinking treatment was immersed in an aqueous boric acid solution (boric acid concentration: 2.6% by mass, 30 ° C.) for 2 minutes, and during this period, uniaxial stretching was performed at a stretching ratio of 1.1 times in the longitudinal direction. Next, the stretching treatment was performed in a boric acid aqueous solution (boric acid concentration: 2.8% by mass, potassium iodide concentration: 5% by mass, 57 ° C) at a stretching ratio of 2.4 times in the longitudinal direction (total stretching ratio) 6.3 times). The fixing treatment was performed by immersing in a boric acid aqueous solution (boric acid concentration: 1.5% by mass, potassium iodide concentration: 5% by mass, 22 ° C) for 10 seconds. After that, it was dried and dried at 60 ° C for 1 minute to obtain a polarizing film.

<接著劑的製作>     <Preparation of Adhesive>    

於試樣管中秤量3-乙基-3-羥甲基氧雜環丁烷(東亞合成股份有限公司製OXT-101)2g、3’,4’-環氧環己基甲基3,4-環氧環己烷羧酸酯(DAICEL股份有限公司製Celloxide 2021P)8g、與二苯基[4-(苯硫基)苯基]鋶六氟磷酸酯之碳酸伸丙酯50質量%溶液(San-Apro股份有限公司製CPI-100P)0.8g,攪拌24小時予以均勻混合,而得到用來接著偏光薄膜與光硬化樹脂層的接著劑。 In a sample tube, weigh 2 g of 3-ethyl-3-hydroxymethyloxetane (OXT-101 manufactured by Toa Synthesis Co., Ltd.), 3 ', 4'-epoxycyclohexylmethyl 3,4- 8 g of epoxycyclohexane carboxylate (Celloxide 2021P, manufactured by DAICEL Co., Ltd.), 50% by mass solution of propylene carbonate with diphenyl [4- (phenylthio) phenyl] fluorene hexafluorophosphate (San -Apro Co., Ltd. CPI-100P) 0.8g, stirred for 24 hours and uniformly mixed to obtain an adhesive for adhering a polarizing film and a photocurable resin layer.

<偏光板的製作>     <Production of Polarizing Plate>    

將偏光薄膜保護用積層體切成2片大小140mm×120mm者,於第1片偏光薄膜保護用積層體的光硬化樹脂層面,使用棒塗布器塗敷上述接著劑。其次,將切成長度方向(MD)為120mm、寬度方向(TD)為100mm的偏光薄膜經由上述接著劑疊合於其上。其後,使用棒塗布器將與上述相同的接著劑塗敷於第2片偏光薄膜保護用積層體的光硬化樹脂面,再疊合於偏光薄膜的另一面。藉由將如此所得之具有基材薄膜/光硬化樹脂層/接 著劑/偏光薄膜/接著劑/光硬化樹脂層/基材薄膜之層構成的貼合物通過層壓機而予以按壓,將接著劑的部分厚度分別調整成1μm。其後,照射紫外線,將接著劑硬化後,剝離去除兩面之基材薄膜,而得到偏光板。 The laminated body for polarizing film protection was cut into two pieces having a size of 140 mm × 120 mm, and the above-mentioned adhesive was applied to the photocurable resin layer of the first laminated body for polarizing film protection with a bar coater. Next, a polarizing film cut into a length direction (MD) of 120 mm and a width direction (TD) of 100 mm was laminated thereon via the above-mentioned adhesive. After that, the same adhesive as described above was applied to the light-curing resin surface of the second polarizing film-protecting laminate by using a bar coater, and then laminated on the other surface of the polarizing film. The laminate having the substrate film / light-curable resin layer / adhesive agent / polarizing film / adhesive agent / light-curable resin layer / base film layer thus obtained is pressed by a laminator, The partial thickness of the agent was adjusted to 1 μm. Thereafter, the substrate was irradiated with ultraviolet rays to harden the adhesive, and then the substrate film on both sides was peeled off to obtain a polarizing plate.

<偏光板的評定>     <Evaluation of Polarizer>    

針對所得偏光板,根據前述方法進行偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表2。 For the obtained polarizing plate, the initial polarizing performance (initial total light transmittance (T 0 ), degree of polarization) of the polarizing plate and the polarizing performance (total transmittance after moist-heat resistance test) of the polarizing plate after the moist-heat resistance test were performed according to the aforementioned method. Evaluation of luminosity (T 48 ), degree of polarization, and total light transmittance (ΔT)). The results are shown in Table 2.

[實施例2]     [Example 2]    

除所得光硬化樹脂層的厚度為1.4μm以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體及偏光板。針對所得偏光薄膜保護用積層體及偏光板,進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)、偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 A laminated body for polarizing film protection and a polarizing plate were obtained in the same manner as in Example 1 except that the thickness of the obtained photocurable resin layer was 1.4 μm. For the obtained laminated body for protecting a polarizing film and a polarizing plate, the boric acid conversion of the boron atom conversion of the photocuring resin layer, the adhesion between the base film and the photocuring resin layer, and the uniformity of the photocuring resin layer on the base film side were performed. Square root surface roughness (rms), initial polarizing performance of the polarizer (initial total light transmittance (T 0 ), degree of polarization), and polarizing performance after polarizing plate's humidity and heat resistance test (total transmittance after humidity and heat resistance test) Evaluation of luminosity (T 48 ), degree of polarization, and total light transmittance (ΔT)). The results are shown in Tables 1 and 2.

[實施例3]     [Example 3]    

除作為基材薄膜,使用經脫模處理PET薄膜之 LAYHIPAR N1(中井工業股份有限公司製、水接觸角84度、矽的檢測強度5.89cps/mA);及所得光硬化樹脂層的厚度為5.5μm以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體及偏光板。針對所得偏光薄膜保護用積層體及偏光板,進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)、偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 Except as the base film, LAYHIPAR N1 (manufactured by Nakai Industry Co., Ltd., water contact angle of 84 degrees, silicon detection strength of 5.89 cps / mA) was used as the PET film; and the thickness of the obtained photocurable resin layer was 5.5. Except for μm, a laminated body for polarizing film protection and a polarizing plate were obtained in the same manner as in Example 1. For the obtained laminated body for protecting a polarizing film and a polarizing plate, the boric acid conversion of the boron atom conversion of the photocuring resin layer, the adhesion between the base film and the photocuring resin layer, and the uniformity of the photocuring resin layer on the base film side were performed. Square root surface roughness (rms), initial polarizing performance of the polarizer (initial total light transmittance (T 0 ), degree of polarization), and polarizing performance after polarizing plate's humidity and heat resistance test (total transmittance after humidity and heat resistance test) Evaluation of luminosity (T 48 ), degree of polarization, and total light transmittance (ΔT)). The results are shown in Tables 1 and 2.

[實施例4]     [Example 4]    

除作為基材薄膜,使用經脫模處理PET薄膜之Purex AN15(TEIJIN DUPONT FILM股份有限公司製,水接觸角82.7度,矽的檢測強度6.12cps/mA);及所得光硬化樹脂層的厚度為5.6μm以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體及偏光板。針對所得偏光薄膜保護用積層體及偏光板,進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)、偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 Except as the base film, Purex AN15 (manufactured by TEIJIN DUPONT FILM Co., Ltd., water contact angle of 82.7 degrees, silicon detection strength of 6.12 cps / mA) was used as the PET film; and the thickness of the obtained photocurable resin layer was Except for 5.6 μm, a laminated body for polarizing film protection and a polarizing plate were obtained in the same manner as in Example 1. For the obtained laminated body for protecting a polarizing film and a polarizing plate, the boric acid conversion of the boron atom conversion of the photocuring resin layer, the adhesion between the base film and the photocuring resin layer, and the uniformity of the photocuring resin layer on the base film side were performed. Square root surface roughness (rms), initial polarizing performance of the polarizer (initial total light transmittance (T 0 ), degree of polarization), and polarizing performance after polarizing plate's humidity and heat resistance test (total transmittance after humidity and heat resistance test) Evaluation of luminosity (T 48 ), degree of polarization, and total light transmittance (ΔT)). The results are shown in Tables 1 and 2.

[實施例5]     [Example 5]    

於試樣管中秤量作為自由基聚合性化合物之二羥甲基三環癸烷二丙烯酸酯(共榮社化學股份有限公司製LIGHT ACRYLATE DCP-A)5g與參(2-羥乙基)異三聚氰酸酯三丙烯酸酯(東亞合成股份有限公司製M-315)5g、作為光聚合起始劑之1-羥基環己基苯基酮(BASF製IRGACURE 184)0.4g、及作為溶劑之乙酸乙酯(和光純藥工業股份有限公司製,SP值9.1)的任意量,攪拌24小時予以均勻混合,而得到溶液。其以後除所得光硬化樹脂層的厚度為5.1μm以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體及偏光板。針對所得偏光薄膜保護用積層體及偏光板,進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)、偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 In a sample tube, 5 g of dimethylol tricyclodecane diacrylate (LIGHT ACRYLATE DCP-A, manufactured by Kyoeisha Chemical Co., Ltd.), which is a radical polymerizable compound, was weighed in different amounts to ginseng (2-hydroxyethyl). 5 g of cyanurate triacrylate (M-315, manufactured by Toa Synthesis Co., Ltd.), 0.4 g of 1-hydroxycyclohexylphenyl ketone (IRGACURE 184, manufactured by BASF) as a photopolymerization initiator, and acetic acid as a solvent Any amount of ethyl ester (manufactured by Wako Pure Chemical Industries, Ltd., SP value 9.1) was stirred for 24 hours and uniformly mixed to obtain a solution. Thereafter, a laminated body for polarizing film protection and a polarizing plate were obtained in the same manner as in Example 1 except that the thickness of the obtained photocurable resin layer was 5.1 μm. For the obtained laminated body for protecting a polarizing film and a polarizing plate, the boric acid conversion of the boron atom conversion of the photocuring resin layer, the adhesion between the base film and the photocuring resin layer, and the uniformity of the photocuring resin layer on the base film side were performed. Square root surface roughness (rms), initial polarizing performance of the polarizer (initial total light transmittance (T 0 ), degree of polarization), and polarizing performance after polarizing plate's humidity and heat resistance test (total transmittance after humidity and heat resistance test) Evaluation of luminosity (T 48 ), degree of polarization, and total light transmittance (ΔT)). The results are shown in Tables 1 and 2.

[比較例1]     [Comparative Example 1]    

於試樣管中秤量作為自由基聚合性化合物之HITALOID 7975D(日立化成工業股份有限公司製,樹脂分60質量%,溶劑甲基異丁基酮,溶劑的SP值8.4)16.67g、與作為光聚合起始劑之1-羥基環己基苯基 酮(BASF製IRGACURE 184)0.4g,攪拌24小時予以均勻混合而得到溶液。其以後除所得光硬化樹脂層的厚度為6.0μm以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體及偏光板。針對所得偏光薄膜保護用積層體及偏光板,進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)、偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 16.67 g of HITALOID 7975D (manufactured by Hitachi Chemical Co., Ltd., 60% by mass of resin, methyl isobutyl ketone, and solvent SP value of 8.4) as a radical polymerizable compound was measured in a sample tube. 0.4 g of 1-hydroxycyclohexylphenyl ketone (IRGACURE 184 manufactured by BASF) as a polymerization initiator was stirred for 24 hours and uniformly mixed to obtain a solution. Thereafter, a laminated body for polarizing film protection and a polarizing plate were obtained in the same manner as in Example 1 except that the thickness of the obtained photocurable resin layer was 6.0 μm. For the obtained laminated body for protecting a polarizing film and a polarizing plate, the boric acid conversion of the boron atom conversion of the photocuring resin layer, the adhesion between the base film and the photocuring resin layer, and the uniformity of the photocuring resin layer on the base film side were performed. Square root surface roughness (rms), initial polarizing performance of the polarizer (initial total light transmittance (T 0 ), degree of polarization), and polarizing performance after polarizing plate's humidity and heat resistance test (total transmittance after humidity and heat resistance test) Evaluation of luminosity (T 48 ), degree of polarization, and total light transmittance (ΔT)). The results are shown in Tables 1 and 2.

[比較例2]     [Comparative Example 2]    

於試樣管中秤量作為自由基聚合性化合物之3’,4’-環氧環己基甲基3,4-環氧環己烷羧酸酯(DAICEL股份有限公司製Celloxide 2021P)10g、作為聚合起始劑之包含二苯基[4-(苯硫基)苯基]鋶六氟磷酸酯與溶劑之碳酸伸丙酯的50質量%溶液(San-Apro股份有限公司製CPI-100P)0.8g,攪拌24小時予以均勻混合而得到溶液。其以後除所得光硬化樹脂層的厚度為6.1μm以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體及偏光板。針對所得偏光薄膜保護用積層體及偏光板,進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)、偏光板之初始偏光性能(初始 總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 In a sample tube, 10 g of 3 ', 4'-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate (Celloxide 2021P, manufactured by DAICEL Co., Ltd.) was weighed as a radical polymerizable compound, and polymerized as a polymer. A starting solution containing 50% by mass of a solution of diphenyl [4- (phenylthio) phenyl] fluorene hexafluorophosphate and a solvent of propylene carbonate (CPI-100P manufactured by San-Apro Co., Ltd.) 0.8 g , Stir for 24 hours and mix uniformly to obtain a solution. Thereafter, a laminated body for polarizing film protection and a polarizing plate were obtained in the same manner as in Example 1 except that the thickness of the obtained photocurable resin layer was 6.1 μm. For the obtained laminated body for protecting a polarizing film and a polarizing plate, the boric acid conversion of the boron atom conversion of the photocuring resin layer, the adhesion between the base film and the photocuring resin layer, and the uniformity of the photocuring resin layer on the base film side were performed. Square root surface roughness (rms), initial polarizing performance of the polarizer (initial total light transmittance (T 0 ), degree of polarization), and polarizing performance after polarizing plate's damp heat resistance test (total transmittance after damp heat resistance test Evaluation of luminosity (T 48 ), degree of polarization, and total light transmittance (ΔT)). The results are shown in Tables 1 and 2.

[比較例3]     [Comparative Example 3]    

除作為基材薄膜,使用經脫模處理PET薄膜之Purex A31(TEIJIN DUPONT FILM股份有限公司製,水接觸角110.6度,矽的檢測強度19.24cps/mA);及所得光硬化樹脂層的厚度為5.7μm以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體。惟,由於塗敷於PET薄膜上時溶液會撥開,而無法得到膜面均勻的光硬化樹脂層。因而,無法進行所得光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)、偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 Except as the base film, Purex A31 (manufactured by TEIJIN DUPONT FILM Co., Ltd., with a water contact angle of 110.6 degrees and a silicon detection strength of 19.24 cps / mA) was used as the PET film; and the thickness of the obtained photocurable resin layer was Except for 5.7 μm, a laminated body for protecting a polarizing film was obtained in the same manner as in Example 1. However, since the solution is spread away when applied to a PET film, a photo-curable resin layer with a uniform film surface cannot be obtained. Therefore, it is impossible to perform boric acid conversion in terms of boron atom conversion of the obtained photocurable resin layer, adhesion between the substrate film and the photocurable resin layer, and root-mean-square surface roughness (rms) of the photocurable resin layer on the substrate film side. , The initial polarizing performance of the polarizing plate (initial total light transmittance (T 0 ), degree of polarization) and the polarizing performance after the polarizing plate's humidity and heat resistance test (the total light transmittance after the humidity and heat resistance test (T 48 ), polarized light) And the total light transmittance (ΔT)). The results are shown in Tables 1 and 2.

[比較例4]     [Comparative Example 4]    

除作為基材薄膜,使用經脫模處理PET薄膜之Purex A71(TEIJIN DUPONT FILM股份有限公司製,水接觸角108.2度,矽的檢測強度18.55cps/mA);及所得光硬化樹脂層的厚度為5.8μm以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體及偏光板。針對所得偏光薄 膜保護用積層體及偏光板,進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)的評定。由於基材薄膜側之光硬化樹脂層的均方根面粗糙度極大,而判斷為非適用者,而中止偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 Except as the base film, Purex A71 (manufactured by TEIJIN DUPONT FILM Co., Ltd., with a water contact angle of 108.2 degrees and a silicon detection strength of 18.55 cps / mA) was used as the PET film; and the thickness of the obtained light-hardening resin layer was Except for 5.8 μm, a laminated body for protecting a polarizing film and a polarizing plate were obtained in the same manner as in Example 1. For the obtained laminated body for protecting a polarizing film and a polarizing plate, the boric acid conversion of the boron atom conversion of the photocuring resin layer, the adhesion between the base film and the photocuring resin layer, and the uniformity of the photocuring resin layer on the base film side Evaluation of square root surface roughness (rms). Because the root-mean-square roughness of the light-hardening resin layer on the substrate film side is extremely large, it is judged as not applicable, and the initial polarization performance (initial total light transmittance (T 0 ), polarization degree) and polarization of the polarizing plate are discontinued. Evaluation of the polarizing performance (total light transmittance (T 48 ), polarization degree, and total light transmittance change (ΔT) after the moist heat resistance test) of the board after the moist heat resistance test. The results are shown in Tables 1 and 2.

[比較例5]     [Comparative Example 5]    

除作為基材薄膜,使用對經脫模處理PET薄膜之Purex A71(TEIJIN DUPONT FILM股份有限公司製,矽的檢測強度18.55cps/mA)實施電暈處理而使水接觸角成33.3度者以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體及偏光板。針對所得偏光薄膜保護用積層體及偏光板,進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜與光硬化樹脂層的接著力、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)的評定。由於基材薄膜側之光硬化樹脂層的均方根面粗糙度極大,而判斷為非適用者,而中止偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 Except for the substrate film, which uses corona treatment on Purex A71 (manufactured by TEIJIN DUPONT FILM Co., Ltd., the detection strength of silicon is 18.55 cps / mA) to release the PET film to make the water contact angle 33.3 degrees A laminated body for polarizing film protection and a polarizing plate were obtained in the same manner as in Example 1. For the obtained laminated body for protecting a polarizing film and a polarizing plate, the boric acid conversion of the boron atom conversion of the photocuring resin layer, the adhesion between the base film and the photocuring resin layer, and the uniformity of the photocuring resin layer on the base film side were performed. Evaluation of square root surface roughness (rms). Because the root-mean-square roughness of the light-hardening resin layer on the substrate film side is extremely large, it is judged as not applicable, and the initial polarization performance (initial total light transmittance (T 0 ), polarization degree) and polarization of the polarizing plate are discontinued. Evaluation of the polarizing performance (total light transmittance (T 48 ), polarization degree, and total light transmittance change (ΔT) after the moist heat resistance test) of the board after the moist heat resistance test. The results are shown in Tables 1 and 2.

[比較例6]     [Comparative Example 6]    

除作為基材薄膜,使用對經脫模處理PET薄膜之TN-100(東洋紡股份有限公司製,矽的檢測強度7.11cps/mA)實施電暈處理而使水接觸角成31.1度者以外係以與實施例1同樣的方式得到偏光薄膜保護用積層體。惟,基材薄膜與光硬化樹脂層的接著力較強,光硬化樹脂層發生了材料破壞。因而,無法進行光硬化樹脂層的硼原子換算之硼酸穿透度、基材薄膜側之光硬化樹脂層的均方根面粗糙度(rms)、偏光板之初始偏光性能(初始總透光率(T0)、偏光度)及偏光板之耐濕熱性試驗後的偏光性能(耐濕熱性試驗後的總透光率(T48)、偏光度、總透光率的變化量(△T))的評定。將結果示於表1及表2。 Except for using TN-100 (manufactured by Toyobo Co., Ltd., the detection strength of silicon is 7.11 cps / mA) as the base film to corona treat the PET film with a water contact angle of 31.1 degrees. A laminated body for protecting a polarizing film was obtained in the same manner as in Example 1. However, the adhesion between the substrate film and the photo-curable resin layer was strong, and the photo-curable resin layer was damaged in material. Therefore, it is impossible to perform boric acid conversion of the boron atom conversion of the photo-hardening resin layer, the root-mean-square surface roughness (rms) of the photo-hardening resin layer on the substrate film side, and the initial polarization performance (initial total light transmittance) (T 0 ), polarization degree) and polarization performance (total light transmittance (T 48 ) after humidity and heat resistance test), polarization degree, total light transmittance change (△ T) ) 'S evaluation. The results are shown in Tables 1 and 2.

Claims (4)

一種偏光薄膜保護用積層體,其為包含自由基聚合性化合物之光硬化樹脂層積層於基材薄膜而成的偏光薄膜保護用積層體,其中,前述光硬化樹脂層的厚度為9μm以下,前述光硬化樹脂層的硼酸穿透度以硼原子換算為2.25g/m 2‧day以下,基材薄膜與光硬化樹脂層的接著力為0.005~0.06N/mm,由光硬化樹脂層剝離基材薄膜後之基材薄膜側之該光硬化樹脂層的均方根面粗糙度(rms)為300nm以下。 A laminated body for protecting a polarizing film, which is a laminated body for protecting a polarizing film obtained by laminating a photocurable resin containing a radical polymerizable compound on a base film, wherein the thickness of the photocurable resin layer is 9 μm or less. The boric acid penetration of the light-curing resin layer is 2.25 g / m 2 or less in terms of boron atoms. The adhesion between the substrate film and the light-curing resin layer is 0.005 to 0.06 N / mm. The substrate is peeled from the light-curing resin layer. The root-mean-square surface roughness (rms) of the photocurable resin layer on the substrate film side after the film is 300 nm or less. 一種偏光板,其中,如請求項1之偏光薄膜保護用積層體之光硬化樹脂層係經由接著劑層貼合於偏光薄膜的至少其中一面。     A polarizing plate in which the light-curable resin layer of the laminated body for polarizing film protection according to claim 1 is bonded to at least one side of the polarizing film via an adhesive layer.     一種如請求項1之偏光薄膜保護用積層體之製造方法,其為將包含自由基聚合性化合物之光硬化樹脂層積層於基材薄膜而得的偏光薄膜保護用積層體之製造方法,其特徵為,具有:將包含自由基聚合性化合物與溶劑的溶液塗敷於基材薄膜之步驟;於塗敷後將前述基材薄膜加熱而使溶劑揮發之步驟;及照射紫外線及電子束之至少一者之步驟;前述基材薄膜之塗敷面的水接觸角為40~100度。     A method for producing a laminated body for polarizing film protection as claimed in claim 1, which is a method for producing a laminated body for polarizing film protection obtained by laminating a light-curable resin containing a radical polymerizable compound on a base film, which is characterized by The method comprises the steps of: applying a solution containing a radically polymerizable compound and a solvent to a substrate film; heating the substrate film after the application to volatilize the solvent; and irradiating at least one of ultraviolet rays and an electron beam. The water contact angle of the coating surface of the substrate film is 40 to 100 degrees.     如請求項3之偏光薄膜保護用積層體之製造方法,其中基材薄膜之塗敷面之矽的檢測強度為10cps/mA以下。     For example, the method for manufacturing a laminated body for protecting a polarizing film of claim 3, wherein the detection intensity of silicon on the coating surface of the base film is 10 cps / mA or less.    
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