CN111305612A - Semiconductor factory building toilet - Google Patents
Semiconductor factory building toilet Download PDFInfo
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- CN111305612A CN111305612A CN202010108859.XA CN202010108859A CN111305612A CN 111305612 A CN111305612 A CN 111305612A CN 202010108859 A CN202010108859 A CN 202010108859A CN 111305612 A CN111305612 A CN 111305612A
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- air
- area
- clean
- air supply
- processing service
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- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04H—BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES; SWIMMING OR SPLASH BATHS OR POOLS; MASTS; FENCING; TENTS OR CANOPIES, IN GENERAL
- E04H5/00—Buildings or groups of buildings for industrial or agricultural purposes
- E04H5/02—Buildings or groups of buildings for industrial purposes, e.g. for power-plants or factories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F13/00—Details common to, or for air-conditioning, air-humidification, ventilation or use of air currents for screening
- F24F13/28—Arrangement or mounting of filters
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F7/00—Ventilation
- F24F7/007—Ventilation with forced flow
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- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
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Abstract
The invention discloses a semiconductor factory building clean room, which relates to the technical field of clean rooms and comprises a clean working room, wherein an air supply system, an air return system and a filtering system are arranged in the clean working room; the partition area comprises a vertical air supply area and a horizontal air supply area, wherein a longitudinal airflow wall and a transverse airflow wall are respectively formed in the vertical air supply area and the horizontal air supply area, and a partition area is formed between the longitudinal airflow wall and the transverse airflow wall. The clean operation area is internally provided with a vector air supply system and a one-way air supply system, and the processing service area is internally provided with a turbulent air supply system. The clean operation area and the processing service area achieve the purpose of limiting the occurrence of turbulence or vortex through the separating area between the clean operation area and the processing service area and the independent air supply system, air return system and filtering system, and further achieve the purpose of improving the air cleanliness of the clean room.
Description
Technical Field
The invention relates to the technical field of clean rooms, in particular to a clean room of a semiconductor factory building.
Background
Semiconductors, which are materials having electrical conductivity between conductors and insulators at normal temperature, are widely used in the fields of consumer electronics, communication systems, medical instruments, and the like. The dust-free clean room, also called as a dust-free room, a clean room or a dust-free workshop, can effectively control factors influencing the production operation process, such as air cleanliness, temperature and humidity, airflow trend and the like in a room or a factory building, and can meet the strict requirements of precision machinery industry and semiconductor industry on the operation environment.
The prior Chinese patent with the publication number of CN103206101B discloses a clean room for a semiconductor factory building, which comprises a large clean space, wherein a fresh air conveying system and an exhaust system are arranged in the large clean space, the large clean space comprises a framework space, a clean space and a circulating space from top to bottom, and a central walkway and at least one production walkway are arranged in the large clean space. The partitions are arranged around the production walkway, so that the parts of the framework space and the clean space at the production walkway form an independent clean microenvironment structure, and at least one ventilation pipe is arranged below the ceiling of the production walkway to form a clean microenvironment structure return air channel; be provided with chemical filter and second new trend conveying system in the clean microenvironment structure for atmospheric pressure in the independent clean microenvironment structure is greater than the atmospheric pressure in its outside large-scale clean space, in order to prevent corrosive gas in the service area to enter into to the production pavement.
Among the above-mentioned prior art, because the distance between baffle bottom and the raised floor is 2m at least, and atmospheric pressure in the clean microenvironment structure is greater than the atmospheric pressure in its outside large-scale clean space, then clean microenvironment structure can blow the air current in the large-scale clean space of outside, and should blow the air current for indiscriminate flow or vortex, cause the air current in the outside large-scale clean space to flow to the disorder, seriously influence the cleanliness factor in the outside large-scale clean space, prior art exists and can improve the part.
Disclosure of Invention
Aiming at the defects in the prior art, the invention aims to provide a clean room of a semiconductor factory building, which comprises a clean operation area, a processing service area and a separation area between the clean operation area and the processing service area, and achieves the purpose of limiting the occurrence of turbulent flow or vortex flow through the separation area, an air supply system, an air return system and a filtering system which are independent respectively, thereby achieving the purpose of improving the air cleanliness of the clean room.
The above object of the present invention is achieved by the following technical solutions: a semiconductor factory building clean room comprises a clean working room, wherein an air supply system, an air return system and a filtering system are arranged in the clean working room, the clean working room comprises a clean working area for realizing high-precision processing and a processing service area for finishing the pre-processing of a semiconductor, and a separation area is arranged between the clean working area and the processing service area; the partition area comprises a vertical air supply area and a horizontal air supply area, wherein a longitudinal air flow wall and a transverse air flow wall for separating a clean operation area and a processing service area are respectively formed in the vertical air supply area and the horizontal air supply area, air is supplied vertically through the longitudinal air flow wall and the transverse air flow wall, and a partition area is formed between the longitudinal air flow wall and the transverse air flow wall; a vector air supply system and a unidirectional air supply system are arranged in the clean operation area, a clean air flow with a vector flow direction and a clean air flow with a unidirectional flow direction are respectively formed in the vector air supply system and the unidirectional air supply system, and the vector air supply system and the unidirectional air supply system are used in a replacement mode; and a turbulent air supply system is arranged in the processing service area, and the turbulent air supply system forms clean air flow with non-single flow direction.
By adopting the technical scheme, the separation area formed by the vertical air supply area and the horizontal air supply area has the function of separating the processing service area and the cleaning operation area, so that the aim of reducing the mutual interference of air flows of the processing service area and the cleaning operation area is fulfilled; and a vector air supply system and a one-way air supply system are formed in the clean operation area, and a turbulent air supply system is formed in the processing service area and matched with the corresponding air return system and the corresponding filtering system, so that the purpose of filtering and treating the air in the clean room is achieved, and meanwhile, an independent air circulation filtering system is realized. The clean operation area, the processing service area and the partition area between the clean operation area and the processing service area are used for limiting the random flow or vortex flow through the partition area, the air supply system, the air return system and the filtering system which are independent of each other, and further the purpose of improving the air cleanliness of a clean room is achieved.
The present invention in a preferred example may be further configured to: the longitudinal airflow wall is formed on one side of the separation area close to the processing service area, the transverse airflow wall is formed on one side of the separation area close to the clean operation area, and the outer sides of the vertical air supply area and the horizontal air supply area, which are far away from each other, are provided with the retaining curtains.
By adopting the technical scheme, the blocking curtain achieves the purpose of preliminarily blocking larger-particle magazines from passing; and the longitudinal airflow wall and the transverse airflow wall are matched to play a role in preventing the polluted gas in the processing service area from entering the clean operation area.
The present invention in a preferred example may be further configured to: sunken grooves are formed in the bottom plate of the separation area at the positions of the check curtains, and the bottoms of the check curtains are contained in the sunken grooves.
By adopting the technical scheme, the polluted air flow can be effectively limited to enter the spacer area or the clean operation area through the gap between the bottom and the bottom surface of the check curtain, and the sunken groove can play a role in assisting in fixing the check curtain so as to achieve the purpose of limiting the irregular floating of the lower part of the check curtain.
The present invention in a preferred example may be further configured to: the air-conditioning system is characterized in that an air suction opening is formed in the bottom plate of the interval, the air suction opening extends along the horizontal direction of the longitudinal airflow wall and the horizontal airflow wall, the air suction opening is connected with an air mixing system independent of an air return system, and the air mixing system comprises a negative pressure device, a filtering device and an exhaust device.
By adopting the technical scheme, the air mixing system consisting of the negative pressure device, the filtering device and the exhaust device can extract polluted air flow or dissipated air flow which is dissipated into the interval region, so as to achieve the purpose of further separating the processing service area from the clean operation area.
The present invention in a preferred example may be further configured to: the clean working chamber comprises an outer air shower and an inner air shower, the outer air shower is arranged at the inlet of the processing service area, and the inner air shower is arranged at the separation area; the inner air shower comprises a pedestrian air shower channel and a vehicle air shower channel, and interlocking access doors which are independently matched for use are respectively arranged at the access points of the pedestrian air shower channel and the vehicle air shower channel.
By adopting the technical scheme, the outer air shower and the inner air shower respectively play a role in removing unclean air flow, dust and the like which enter an operation service area from the outside and enter a clean operation area from the operation service area in the process of air shower; and the pedestrian air shower channel and the vehicle air shower channel of the inner air shower chamber respectively play roles of air shower blow washing operators and transport vehicles, and have interlocking characteristics, namely the channel on one side is locked, the channel on the other side is automatically locked, and the device has better practicability and use safety.
The present invention in a preferred example may be further configured to: the inner air shower is positioned at one side of the separation area close to the side wall of the clean working chamber, and the vector flow direction of the clean air flow in the clean working area flows from the diagonal side of the inner air shower to one side of the inner air shower.
By adopting the technical scheme, when the inner air shower is opened, the clean air flow vector in the clean operation area flows to the opening of the inner air shower diagonally so as to achieve the purpose of secondary purging for operators.
The present invention in a preferred example may be further configured to: the inner air shower is located on one side, close to the side wall of the clean working chamber, of the separation area, a turbulent air flow system and a vector air supply system are arranged in the processing service area in a mixed mode, the vector flow direction of clean air flow in the processing service area flows to the oblique diagonal side of the inner air shower from one side of the inner air shower, and the flow speed of the clean air flow in the vector flow direction is smaller than that of the clean air flow in a non-single flow direction.
By adopting the technical scheme, the aim of cleaning the air flow in the processing service area is fulfilled by matching the turbulent air supply system and the vector air supply system, and the flow rate of the clean air flow flowing in the vector direction is limited, so that the aims of further improving the air flow cleaning effect in the processing service area and reducing mutual interference among the air flows are fulfilled.
The present invention in a preferred example may be further configured to: the semiconductor component bearing vehicle is matched with the vehicle air shower channel and comprises a cart body, a bearing plate is horizontally lapped on the cart body, and vent holes are uniformly formed in the bearing plate.
Through adopting above-mentioned technical scheme, set up the ventilation hole on the shallow body to reach the ventilative performance that improves the semiconductor and hold the car, thereby reach the wind of improving the semiconductor parts on the shallow body and drench area of contact, and then reach the purpose that improves the wind of semiconductor parts drenches the effect.
The present invention in a preferred example may be further configured to: the filtering system comprises a first filtering unit and a second filtering unit, and the first filtering unit and the second filtering unit are respectively used for filtering return air flow of a clean operation area and a processing service area.
Through adopting above-mentioned technical scheme, adopt first filter unit and second filter unit to filter the independent processing mode of clean operation district and the return air current of processing service area respectively, can obtain better filtration treatment effect to the air current mutual pollution production of restriction clean operation district and processing service area.
The present invention in a preferred example may be further configured to: the filtration system is including high-efficient air cleaner, high-efficient air cleaner includes the HEPA filter screen that constitutes according to the cleanliness factor demand selection ratio, the filter screen layer of HEPA filter screen is including PP filter paper, glass fiber, compound filter paper, melt-blown dacron non-woven fabrics and melt-blown glass fiber, and is used for filtering the return air current of processing service area the second filter unit still includes chemical filter.
By adopting the technical scheme, the return air flow is filtered by the high-efficiency filter, so that the filtering effect of the air flow can be improved; and a chemical filter is arranged aiming at the processing service area, so that the smoke generated in the production operation process of the processing service area can be effectively filtered and treated.
In summary, the invention includes at least one of the following beneficial technical effects:
1. the cleaning operation area, the processing service area and the partition area between the cleaning operation area and the processing service area achieve the purpose of limiting the occurrence of turbulence or vortex through the partition area and the air supply system, the air return system and the filtering system which are independent from each other, and further achieve the purpose of improving the air cleanliness of a clean room;
2. the filtering system which is independent and has different pertinence is adopted to respectively filter and process the service area and the clean operation area, so that the filtering treatment effect and the filtering treatment operation safety are better;
3. the air shower system is formed by matching the inner air shower and the outer air shower together, so that the air exchange effect of a processing service area, a clean operation area and an external environment can be further limited, and the effect of further improving the overall cleanliness of the clean room can be realized.
Drawings
FIG. 1 is a schematic plan view of a semiconductor fab clean room;
FIG. 2 is a schematic view of the gas flow in the clean room of the semiconductor factory building;
FIG. 3 is a schematic diagram of a system for displaying a clean job area and a process service area;
FIG. 4 is a schematic view of a structure mainly used for showing a partitioned area;
fig. 5 is a schematic structural view mainly showing a semiconductor component carrier cart.
In the figure, 1, a clean room; 11. an outer air shower; 12. an inner air shower; 121. a pedestrian air shower channel; 122. a vehicle air shower channel is driven; 2. cleaning the operation area; 3. processing a service area; 4. a separation zone; 41. a vertical air supply area; 42. a horizontal air supply area; 43. interval; 44. a curtain; 45. sinking grooves; 46. an air suction opening; 47. a wind mixing system; 471. a negative pressure device; 472. a filtration device; 473. an air exhaust device; 51. a first filter unit; 52. a second filter unit; 6. an air supply system; 7. an air return system; 8. a semiconductor component carrier cart; 81. a cart body; 82. a carrier plate; 821. a vent hole.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
As shown in fig. 1, a semiconductor factory building clean room comprises a clean working room 1, wherein the clean working room 1 comprises a clean working area 2 and a processing service area 3, the clean working area 2 and the processing service area 3 are respectively used for realizing high-precision processing operation and semiconductor pre-processing operation, a separation area 4 is arranged between the clean working area 2 and the processing service area 3 in a separation manner, and the separation area 4 achieves the purpose of separating the clean working area 2 from the processing service area 3 in an airflow wall manner. As shown in fig. 1 and 3, while the clean working area 2 and the processing service area 3 are separated, an air supply system 6, an air return system 7 and a filtering system are respectively arranged in the clean working area 2 and the processing service area 3, that is, the purpose of limiting the occurrence of turbulence or eddy current is achieved by separating the clean working area 2 and the processing service area 3 and arranging the independent air supply, air return and filtering systems in a matching manner, so as to achieve the purpose of improving the cleanliness of the air in the clean room.
Referring to fig. 1 and 3, the air supply system 6 and the air return system 7 of the clean working area 2 and the processing service area 3 have the same composition, and each of them includes a blower, an exhaust fan, and air supply and return pipes, but the air supply and return directions are different. A vector air supply system and a one-way air supply system are arranged in the clean working area 2, a vector flow direction clean air flow and a one-way flow direction clean air flow are respectively formed in the vector air supply system and the one-way air supply system, and the vector air supply system and the one-way air supply system are used in a replacement mode; and a turbulent air supply system is arranged in the processing service area 3, and the turbulent air supply system forms clean air flow with non-single flow direction.
Referring to fig. 1 and 2, the clean working area 2 and the processing service area 3 respectively include a first filtering unit 51 and a second filtering unit 52, the first filtering unit 51 and the second filtering unit 52 are respectively used for filtering the return air flow of the working area and the processing service area 3, and the first filtering unit 51 and the second filtering unit 52 are not identical, and the same point is that both include a high efficiency air filter, the high efficiency air filter includes a HEPA filter net formed by selecting a proportion according to the requirement of the degree, and the filter net layer of the HEPA filter net includes PP filter paper, glass fiber, composite filter paper, melt-blown polyester non-woven fabric and melt-blown glass fiber, but the difference between the two is that the second filtering unit 52 used for the processing service area 3 is additionally provided with a chemical filter based on the first filtering unit 51, because the second filtering unit 52 corresponds to the processing service area 3, and chemical gas is generated in the processing service area 3 during the production process, the chemical filter can effectively filter and remove chemical gas.
As shown in fig. 1, the partition 4 includes a vertical blowing area 41 and a horizontal blowing area 42, the vertical blowing area 41 and the horizontal blowing area 42 are respectively formed with a longitudinal flow wall and a transverse flow wall, the longitudinal flow wall is formed on a side of the partition 4 close to the processing service area 3, the transverse flow wall is formed on a side of the partition 4 close to the clean working area 2, and a partition 43 is formed therebetween. The vertical air supply area 41 and the horizontal air supply area 42 are respectively provided with a longitudinal air flow wall and a transverse air flow wall for separating the clean working area 2 from the processing service area 3, although the air flow directions of the transverse air flow wall and the transverse air flow wall are different, the transverse air flow wall and the transverse air flow wall are both used for vertical air supply so as to achieve the purpose of blocking the air flow of the processing service area 3 and the clean working area 2, a strip-shaped interval between the longitudinal air flow wall and the transverse air flow wall is the interval 43, and the interval 43 plays the roles of buffering the escaping air flow and further separating the processing service area 3 from the clean working area 2.
Referring to fig. 1 and 4, a curtain 44 is disposed on the outer side of the vertical blowing area 41 and the horizontal blowing area 42, and a sunken groove 45 is formed on the bottom plate of the spacing area 43 at the position of the curtain 44, and the bottom of the curtain 44 is accommodated in the sunken groove 45 to prevent the curtain 44 from irregularly floating under the action of the escaping airflow. In order to further limit the air flow exchange between the clean working area 2 and the processing service area 3, an air suction opening 46 is provided on the bottom plate (or floor) of the partition 43, the air suction opening 46 extends along the horizontal direction of the longitudinal air flow wall and the transverse air flow wall, meanwhile, the air suction opening 46 is connected with an air mixing system 47 independent of the air return system 7, and the air mixing system 47 comprises a negative pressure device 471, a filtering device 472 and an exhaust device 473; the air mixing system 47 can draw away the escaping air flow into the compartment 43 to maintain the cleanliness of the air flow in the compartment 43.
As shown in fig. 1 and 5, in the process of entering the processing service area 3 from the external environment and entering the clean service area from the processing service area 3 (only entering is taken as an example for explanation, and the same is true for the opposite leaving process), air showering and purging are required to remove impurities such as dust on the operator or on the semiconductor component carrier 8 and the semiconductor components thereon. Therefore, it is necessary to provide an outer air shower 11 and an inner air shower 12 in the clean room 1, the outer air shower 11 being provided at the entrance of the processing service area 3, and the inner air shower 12 being provided at the end position of the partition 4.
As shown in fig. 1, the inner air shower 12 includes a pedestrian air shower passage 121 and a vehicle air shower passage 122, and the entrances and exits of the pedestrian air shower passage 121 and the vehicle air shower passage 122 are respectively provided with an interlocking entrance and exit door for independent cooperation, so that the interlocking safety of the pedestrian air shower passage 121 and the vehicle air shower passage 122 is maintained while the workers and the transportation vehicles are respectively air showered and purged. The inner air shower 12 is located at one side of the separation area 4 close to the side wall of the clean working chamber 1, the vector flow direction of the clean air flow in the clean working area 2 flows from the diagonal side of the inner air shower 12 to one side of the inner air shower 12, the vector flow direction of the clean air flow in the processing service area 3 flows from one side of the inner air shower 12 to the diagonal side of the inner air shower 12, and the flow rate of the clean air flow in the vector flow direction is smaller than that of the clean air flow in a non-single flow direction.
As shown in fig. 5, the semiconductor component carrying cart 8 is used in cooperation with the vehicle air shower passage 122, the semiconductor component carrying cart 8 includes a cart body 81, a carrying plate 82 is horizontally overlapped on the cart body 81, vent holes 821 are uniformly formed in the carrying plate 82, and vent holes 821 are also formed in a box body of the carrying plate 82, so as to achieve the purpose of improving the air shower blowing and cleaning degree of the semiconductor component and the semiconductor component carrying cart 8.
The invention is further illustrated below with reference to specific principles:
the method is characterized in that a separation area 4 is arranged between a processing service area 3 and a cleaning operation area 2, an airflow wall type separation structure is formed in a mode of combining a vertical air supply area 41 and a horizontal air supply area 42, independent air supply, return air and filtering systems are respectively arranged in the processing service area 3, the cleaning operation area 2 and the separation area 4, and finally, operating personnel and semiconductor component bearing vehicles 8 and semiconductor components on the semiconductor components are swept through matching of an outer air shower 11 and an inner air shower 12, so that the purposes of keeping the independence and the cleanliness of the airflow of the processing service area 3 and the cleaning operation area 2 are achieved, and the overall cleanliness of a semiconductor clean room plant is further improved.
The embodiments of the present invention are preferred embodiments of the present invention, and the scope of the present invention is not limited by these embodiments, so: all equivalent changes made according to the structure, shape and principle of the invention are covered by the protection scope of the invention.
Claims (10)
1. The utility model provides a semiconductor factory building toilet, including clean studio (1), just be provided with air supply system (6), return air system (7) and filtration system in clean studio (1), its characterized in that: the clean working chamber (1) comprises a clean working area (2) for realizing high-precision processing and a processing service area (3) for finishing the pre-process processing of the semiconductor, and a separation area (4) is arranged between the clean working area (2) and the processing service area (3); the separating area (4) comprises a vertical air supply area (41) and a horizontal air supply area (42), the vertical air supply area (41) and the horizontal air supply area (42) are respectively provided with a longitudinal air flow wall and a transverse air flow wall for separating the clean operation area (2) and the processing service area (3), the longitudinal air flow wall and the transverse air flow wall supply air vertically, and a separating area (43) is formed between the longitudinal air flow wall and the transverse air flow wall; a vector air supply system and a one-way air supply system are arranged in the clean operation area (2), the vector air supply system and the one-way air supply system respectively form clean air flow in a vector flow direction and clean air flow in a one-way flow direction, and the vector air supply system and the one-way air supply system are used in a replacement mode; and a turbulent air supply system is arranged in the processing service area (3), and the turbulent air supply system forms clean air flow with non-single flow direction.
2. The semiconductor factory building clean room of claim 1, wherein: the longitudinal airflow wall is formed on one side, close to the processing service area (3), of the separation area (4), the transverse airflow wall is formed on one side, close to the clean operation area (2), of the separation area (4), and the outer sides, far away from each other, of the vertical air supply area (41) and the horizontal air supply area (42) are respectively provided with a retaining curtain (44).
3. The semiconductor factory building clean room of claim 2, wherein: a sunken groove (45) is formed in the bottom plate of the separation area (4) at the position of the curtain (44), and the bottom of the curtain (44) is accommodated in the sunken groove (45).
4. The semiconductor factory building clean room according to claim 2 or 3, characterized in that: an air suction opening (46) is formed in the bottom plate of the interval region (43), the air suction opening (46) extends along the horizontal direction of the longitudinal airflow wall and the horizontal airflow wall, the air suction opening (46) is connected with an air mixing system (47) independent of the air return system (7), and the air mixing system (47) comprises a negative pressure device (471), a filtering device (472) and an air exhaust device (473).
5. The semiconductor factory building clean room of claim 1, wherein: the clean working room (1) comprises an outer air shower (11) and an inner air shower (12), the outer air shower (11) is arranged at an inlet of the processing service area (3), and the inner air shower (12) is arranged at the separation area (4); the inner air shower (12) comprises a pedestrian air shower channel (121) and a vehicle air shower channel (122), and interlocking access doors which are independently matched for use are respectively arranged at the access and exit of the pedestrian air shower channel (121) and the vehicle air shower channel (122).
6. The semiconductor factory building clean room of claim 5, wherein: the inner air shower (12) is positioned on one side of the separation area (4) close to the side wall of the clean working chamber (1), and the vector flow of the clean air flow in the clean working area (2) flows from the diagonal side of the inner air shower (12) to one side of the inner air shower (12).
7. The semiconductor factory building clean room of claim 5, wherein: interior wind leaching rooms (12) are located the one side that the side wall of subregion (4) and clean studio (1) is close to mutually, and processing service area (3) interior mixed set up indiscriminate flowing wind system (6) and vector air supply system (6), just clean air current vector flow in processing service area (3) is to the diagonal side of interior wind leaching rooms (12) by interior wind leaching rooms (12) one side flow direction, the clean air current velocity of flow of vector flow direction is less than the clean air current velocity of flow of non-single flow direction.
8. The semiconductor factory building clean room according to any one of claims 5 to 7, characterized in that: with car air shower passageway (122) cooperation is used and is had semiconductor part to bear car (8), semiconductor part bears car (8) including shallow body (81), just it has loading board (82) to go up horizontal overlap joint in shallow body (81), evenly set up on loading board (82) and be formed with ventilation hole (821).
9. The semiconductor factory building clean room of claim 1, wherein: the filtering system comprises a first filtering unit (51) and a second filtering unit (52), and the first filtering unit (51) and the second filtering unit (52) are respectively used for filtering return air flow of the clean working area (2) and the processing service area (3).
10. The semiconductor factory building clean room of claim 9, wherein: the filtering system comprises a high-efficiency air filter, the high-efficiency air filter comprises an HEPA filter screen formed by selecting a proportion according to cleanliness requirements, a filter screen layer of the HEPA filter screen comprises PP filter paper, glass fibers, composite filter paper, melt-blown polyester non-woven fabric and melt-blown glass fibers, and the second filtering unit (52) used for filtering return air flow of the processing service area (3) further comprises a chemical filter.
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| CN202010108859.XA CN111305612B (en) | 2020-02-21 | 2020-02-21 | Semiconductor factory building toilet |
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| CN202010108859.XA CN111305612B (en) | 2020-02-21 | 2020-02-21 | Semiconductor factory building toilet |
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| CN111305612A true CN111305612A (en) | 2020-06-19 |
| CN111305612B CN111305612B (en) | 2021-07-06 |
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