CN111302651B - Low-radiation electric heating glass and preparation method thereof - Google Patents
Low-radiation electric heating glass and preparation method thereof Download PDFInfo
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- CN111302651B CN111302651B CN202010265924.XA CN202010265924A CN111302651B CN 111302651 B CN111302651 B CN 111302651B CN 202010265924 A CN202010265924 A CN 202010265924A CN 111302651 B CN111302651 B CN 111302651B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/74—UV-absorbing coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
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Abstract
The invention relates to the technical field of electric heating glass preparation, in particular to low-radiation electric heating glass and a preparation method thereof; the conductive layer is matched with the nano silver and the composite conductive material, so that the conductive efficiency and the conductive performance of the electric heating glass can be effectively improved; the temperature of each part of the electric heating glass can be uniformly and stably increased when the electric heating glass is heated, and the heating uniformity is ensured; in addition, the ultraviolet absorption layer can effectively absorb ultraviolet rays in sunlight, so that the intensity of ultraviolet radiation in light rays is reduced to a certain extent; after passing through the wear-resistant layer and the ultraviolet absorption layer, the light rays sequentially pass through the third medium layer, the conducting layer, the barrier layer, the second medium film layer, the first medium film layer and the substrate; in the process, the radiation intensity of ultraviolet rays and far infrared rays in the light is reduced by the layer, and the radiation intensity of the ultraviolet rays and the far infrared rays in the light which finally penetrates through the substrate is reduced.
Description
Technical Field
The invention relates to the technical field of electric heating glass preparation, in particular to low-radiation electric heating glass and a preparation method thereof.
Background
Electrically heated glass, also known as electrically heated glass, antifog glass. It consists of two parts: toughened glass, transparent plating film embedding layer, embedding the plating film in the middle of the toughened glass. The toughened glass can be flat or bent steel. When the glass is electrified, the glass can be heated, the thermistor of the glass is connected with the temperature control system, and the temperature of the surface can be automatically adjusted. The electric heating glass uses low voltage, has low power consumption and is safe and reliable. The working principle is that after the glass is electrified, the surface temperature begins to rise, and the rising temperature interval is as follows: the temperature of the heating surface of the glass is kept equal to or slightly higher than the surface temperature of the glass at 35-40 ℃, so that the effects of no generation of fog and frosting are achieved.
At present, glass of automobiles, electric automobiles, rail transit and the like is processed by common glass, so that the glass has no energy-saving effect, and has relatively poor infrared and ultraviolet blocking effect, namely, the radiation intensity of ultraviolet rays and far infrared rays cannot be reduced. In addition, when the automobile window is used as an automobile or an electric window, the visual effect of a driver during driving can be influenced, namely the visual effect is relatively poor.
Disclosure of Invention
In view of the above problems, the present invention provides a low radiation electric heating glass and a method for preparing the same, which is used to solve the technical problems in the background art.
In order to achieve the purpose, the invention adopts the following technical scheme:
the low-radiation electric heating glass comprises a substrate, and a first dielectric film layer, a second dielectric film layer, a barrier layer, a conducting layer, a third dielectric layer, an ultraviolet absorption layer and a wear-resistant layer which are sequentially deposited on the substrate. The thickness of the first dielectric film layer is 12-18 nm; namely the thickness of the second dielectric film layer is 18-25 nm; the thickness of the barrier layer is 25-35 nm; the thickness of the conducting layer is 10-15 nm; the thickness of the third medium film layer is 25-35 nm; the thickness of the ultraviolet absorption layer is 30-45 nm; the thickness of the wear-resistant layer is 40-50 nm.
Further, the raw material of the substrate is any one of ordinary glass or high borosilicate glass.
Furthermore, the raw material of the first dielectric film layer is nano silicon carbide.
Furthermore, the raw material of the second dielectric film layer is nano titanium dioxide or nano manganese dioxide.
Further, the raw material of the barrier layer is any one of ZnO or BZO.
Furthermore, the raw materials used for the conductive layer comprise nano silver and a composite conductive material; the preparation method of the composite conductive material comprises the following steps:
a. adding a proper amount of concentrated sulfuric acid into a beaker under an ice bath condition, adding 2.0g of graphite powder, 1.0g of sodium nitrate and 6.0g of potassium permanganate under magnetic stirring, uniformly stirring, heating to 30-36 ℃, and adding 200mL of deionized water into the mixture; then, continuously heating to 85-90 ℃, adding 20mL of hydrogen peroxide into the mixture, filtering and washing to obtain graphite oxide;
b. mixing the obtained graphite oxide and melamine according to the mass ratio of 3:2, adding the mixture into 100mL of ethanol solution, stirring for 5h, heating and boiling the solution to remove ethanol, and drying in a vacuum drying oven at the temperature of 110-;
c. the dried sample was placed in a tube furnace and heated at N2Raising the temperature to 900-; and after the substitution reaction is finished, cooling the temperature of the system to room temperature, repeatedly washing and filtering the sample by using boiled deionized water, and carrying out ultrasonic treatment for 18-22h to obtain the composite conductive material.
Furthermore, the raw material used by the third dielectric layer is any one of lanthanum oxide or bismuth oxide.
Furthermore, the raw material of the ultraviolet absorption layer is any one of 2-hydroxy-4-methoxybenzophenone or 2-hydroxy-4-n-octoxybenzophenone.
Furthermore, the raw material of the wear-resistant layer is zirconia.
A preparation method of low-radiation electric heating glass comprises the following steps:
s1, placing the selected matrix in an ultrasonic cleaning machine filled with distilled water, adding a proper amount of cleaning agent into the distilled water, ultrasonically cleaning the matrix for 10-15min, taking out the matrix, cleaning the matrix with distilled water, and airing the matrix under natural conditions for later use;
s2, placing the raw material of the first dielectric film layer in a vacuum coating machine, and performing coating treatment on the upper surface of the substrate by adopting the existing vacuum coating process, wherein a film layer with the thickness of 12-18nm formed on the upper surface of the substrate after coating is the first dielectric film layer;
s3, placing the raw material of the second dielectric film layer in a vacuum coating machine, and finally obtaining a film layer with the thickness of 18-25nm formed on the upper surface of the first dielectric film layer by adopting the same vacuum coating process as the vacuum coating process of S2, namely the second dielectric film layer;
s4, forming a transparent dielectric film with the film thickness of 25-35nm on the upper surface of the second dielectric film layer by adopting a vacuum coating process to form a barrier layer;
s5, forming a metal conducting layer with a film thickness of 10-15nm and a porous net structure on the upper surface of the barrier layer by a mask method through a vacuum coating process, and then uniformly plating the composite conducting material in pores of the metal conducting layer with the porous net structure through the vacuum coating process to obtain a conducting layer;
s6, placing the raw material of the third dielectric film layer in a vacuum coating machine, and forming a transparent dielectric film with the thickness of 25-35nm on the surface of the conducting layer by adopting a vacuum coating process, namely the third dielectric film layer;
s7, uniformly plating the raw material of the ultraviolet absorption layer on the surface of the third medium film layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 30-45nm, namely the ultraviolet absorption layer;
s8, uniformly plating the raw materials of the wear-resistant layer on the surface of the ultraviolet absorption layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 40-50nm, namely the wear-resistant layer; and finally obtaining the finished product of the low-radiation electric heating glass.
By adopting the technical scheme, the invention has the beneficial effects that:
according to the invention, dirt and oil stain on the surface of the substrate are cleaned by the cleaning agent, so that the first medium film layer is plated on the upper surface of the substrate through a vacuum coating process, and the uniformity of the first film layer is ensured while the first medium film layer can be firmly attached to the surface of the substrate. Moreover, the conductive layer is formed by matching the nano silver and the composite conductive material, so that the conductive efficiency and the conductive performance of the electric heating glass can be effectively improved. The temperature of each part of the electric heating glass can be uniformly and stably increased when the electric heating glass is heated, and the heating uniformity is ensured. In addition, the ultraviolet absorbing layer can effectively absorb ultraviolet rays in sunlight, thereby reducing the intensity of ultraviolet radiation in light to a certain extent. After passing through the wear-resistant layer and the ultraviolet absorption layer, the light rays sequentially pass through the third medium layer, the conducting layer, the blocking layer, the second medium film layer, the first medium film layer and the substrate. In the process, the radiation intensity of ultraviolet rays and far infrared rays in the light is reduced by the layer, and the radiation intensity of the ultraviolet rays and the far infrared rays in the light finally penetrating through the substrate is extremely low, so that the visual effect is good.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without any inventive step, are within the scope of the present invention.
Example 1:
the low-radiation electric heating glass comprises a substrate, and a first dielectric film layer, a second dielectric film layer, a barrier layer, a conductive layer, a third dielectric layer, an ultraviolet absorption layer and a wear-resistant layer which are sequentially deposited on the substrate.
The raw material of the substrate is common glass.
The raw material of the first medium film layer is nano silicon carbide.
The raw material of the second medium film layer is nano titanium dioxide.
The barrier layer is made of ZnO.
The raw materials used by the conductive layer comprise nano silver and a composite conductive material; the preparation method of the composite conductive material comprises the following steps:
a. adding a proper amount of concentrated sulfuric acid into a beaker under an ice bath condition, adding 2.0g of graphite powder, 1.0g of sodium nitrate and 6.0g of potassium permanganate under magnetic stirring, uniformly stirring, heating to 30 ℃, and adding 200mL of deionized water into the mixture; then, continuously heating to 85 ℃, adding 20mL of hydrogen peroxide into the mixture, filtering and washing to obtain graphite oxide;
b. mixing the obtained graphite oxide and melamine according to the mass ratio of 3:2, adding the mixture into 100mL of ethanol solution, stirring for 5 hours, heating and boiling the solution to remove ethanol, and drying in a vacuum drying oven at 110 ℃ for 6 hours;
c. the dried sample was placed in a tube furnace and heated at N2Heating to 900 ℃ at the speed of 5 ℃/min under the atmosphere, and reacting for 30min under the condition; and after the substitution reaction is finished, cooling the temperature of the system to room temperature, repeatedly washing and filtering the sample by using boiled deionized water, and carrying out ultrasonic treatment for 18 hours to obtain the composite conductive material.
The third dielectric layer is made of lanthanum oxide.
The raw material of the ultraviolet absorption layer is 2-hydroxy-4-methoxybenzophenone.
The raw material of the wear-resistant layer is zirconia.
A preparation method of low-radiation electric heating glass comprises the following steps:
s1, placing the selected matrix in an ultrasonic cleaning machine filled with distilled water, adding a proper amount of cleaning agent into the distilled water, ultrasonically cleaning the matrix for 10min, taking out the matrix, cleaning the matrix with the distilled water, and airing the matrix under natural conditions for later use;
s2, placing the raw material of the first dielectric film layer in a vacuum coating machine, and performing coating treatment on the upper surface of the substrate by adopting the existing vacuum coating process, wherein a film layer with the thickness of 12nm formed on the upper surface of the substrate after coating is the first dielectric film layer;
s3, placing the raw material of the second dielectric film layer in a vacuum coating machine, and finally obtaining a film layer with the thickness of 18nm formed on the upper surface of the first dielectric film layer by adopting the same vacuum coating process as the vacuum coating process of S2, namely the second dielectric film layer;
s4, forming a transparent dielectric film with the thickness of 25nm on the upper surface of the second dielectric film layer by adopting a vacuum coating process to form a barrier layer;
s5, forming a metal conducting layer with a film thickness of 10nm and a porous net structure on the upper surface of the barrier layer by a mask method through a vacuum coating process, and then uniformly plating the composite conducting material in pores of the metal conducting layer with the porous net structure through the vacuum coating process to obtain a conducting layer;
s6, placing the raw material of the third dielectric film layer in a vacuum coating machine, and forming a transparent dielectric film with the thickness of 25nm on the surface of the conducting layer by adopting a vacuum coating process, namely the third dielectric film layer;
s7, uniformly plating the raw material of the ultraviolet absorption layer on the surface of the third dielectric film layer by adopting a vacuum coating process to form a transparent dielectric film with the thickness of 30nm, namely the ultraviolet absorption layer;
s8, uniformly plating the raw materials of the wear-resistant layer on the surface of the ultraviolet absorption layer by adopting a vacuum coating process to form a transparent medium film with the thickness of 40nm, namely the wear-resistant layer; and finally obtaining the finished product of the low-radiation electric heating glass.
Example 2:
the low-radiation electric heating glass comprises a substrate, and a first dielectric film layer, a second dielectric film layer, a barrier layer, a conductive layer, a third dielectric layer, an ultraviolet absorption layer and a wear-resistant layer which are sequentially deposited on the substrate.
The substrate is made of high borosilicate glass.
The raw material of the first medium film layer is nano silicon carbide.
The raw material of the second medium film layer is nano manganese dioxide.
The raw material of the barrier layer is BZO.
The raw materials used by the conductive layer comprise nano silver and a composite conductive material; the preparation method of the composite conductive material comprises the following steps:
a. adding a proper amount of concentrated sulfuric acid into a beaker under an ice bath condition, adding 2.0g of graphite powder, 1.0g of sodium nitrate and 6.0g of potassium permanganate under magnetic stirring, uniformly stirring, heating to 32 ℃, and adding 200mL of deionized water into the mixture; then, continuously heating to 88 ℃, adding 20mL of hydrogen peroxide into the mixture, filtering and washing to obtain graphite oxide;
b. mixing the obtained graphite oxide and melamine according to the mass ratio of 3:2, adding the mixture into 100mL of ethanol solution, stirring for 5 hours, heating and boiling the solution to remove ethanol, and drying in a vacuum drying oven at 115 ℃ for 6 hours;
c. the dried sample was placed in a tube furnace and heated at N2Heating to 930 ℃ at the speed of 5 ℃/min under the atmosphere, and reacting for 35min under the condition; and after the substitution reaction is finished, cooling the temperature of the system to room temperature, repeatedly washing and filtering the sample by using boiled deionized water, and carrying out ultrasonic treatment for 20 hours to obtain the composite conductive material.
The raw material used by the third dielectric layer is bismuth oxide.
The raw material of the ultraviolet absorption layer is 2-hydroxy-4-n-octoxy benzophenone.
The raw material of the wear-resistant layer is zirconia.
A preparation method of low-radiation electric heating glass comprises the following steps:
s1, placing the selected matrix in an ultrasonic cleaning machine filled with distilled water, adding a proper amount of cleaning agent into the distilled water, ultrasonically cleaning the matrix for 10min, taking out the matrix, cleaning the matrix with the distilled water, and airing the matrix under natural conditions for later use;
s2, placing the raw material of the first dielectric film layer in a vacuum coating machine, and performing coating treatment on the upper surface of the substrate by adopting the existing vacuum coating process, wherein a film layer with the thickness of 15nm formed on the upper surface of the substrate after coating is the first dielectric film layer;
s3, placing the raw material of the second dielectric film layer in a vacuum coating machine, and finally obtaining a film layer with the thickness of 20nm formed on the upper surface of the first dielectric film layer by adopting the same vacuum coating process as the vacuum coating process of S2, namely the second dielectric film layer;
s4, forming a transparent dielectric film with the film thickness of 30nm on the upper surface of the second dielectric film layer by adopting a vacuum coating process to form a barrier layer;
s5, forming a metal conducting layer with a film thickness of 12nm and a porous net structure on the upper surface of the barrier layer by a mask method through a vacuum coating process, and then uniformly plating the composite conducting material in pores of the metal conducting layer with the porous net structure through the vacuum coating process to obtain a conducting layer;
s6, placing the raw material of the third dielectric film layer in a vacuum coating machine, and forming a transparent dielectric film with the film thickness of 28nm on the surface of the conducting layer by adopting a vacuum coating process, namely the third dielectric film layer;
s7, uniformly plating the ultraviolet absorption layer raw material on the surface of the third medium film layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 35nm, namely the ultraviolet absorption layer;
s8, uniformly plating the raw materials of the wear-resistant layer on the surface of the ultraviolet absorption layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 45nm, namely the wear-resistant layer; and finally obtaining the finished product of the low-radiation electric heating glass.
Example 3:
the low-radiation electric heating glass comprises a substrate, and a first dielectric film layer, a second dielectric film layer, a barrier layer, a conductive layer, a third dielectric layer, an ultraviolet absorption layer and a wear-resistant layer which are sequentially deposited on the substrate.
The raw material of the substrate is common glass.
The raw material of the first medium film layer is nano silicon carbide.
The raw material of the second medium film layer is nano titanium dioxide.
The barrier layer is made of ZnO.
The raw materials used by the conductive layer comprise nano silver and a composite conductive material; the preparation method of the composite conductive material comprises the following steps:
a. adding a proper amount of concentrated sulfuric acid into a beaker under an ice bath condition, adding 2.0g of graphite powder, 1.0g of sodium nitrate and 6.0g of potassium permanganate under magnetic stirring, uniformly stirring, heating to 35 ℃, and adding 200mL of deionized water into the mixture; then, continuously heating to 88 ℃, adding 20mL of hydrogen peroxide into the mixture, filtering and washing to obtain graphite oxide;
b. mixing the obtained graphite oxide and melamine according to the mass ratio of 3:2, adding the mixture into 100mL of ethanol solution, stirring for 5 hours, heating and boiling the solution to remove ethanol, and drying in a vacuum drying oven at 115 ℃ for 6 hours;
c. the dried sample was placed in a tube furnace and heated at N2Heating to 950 ℃ at the speed of 5 ℃/min under the atmosphere, and reacting for 35min under the condition; and after the substitution reaction is finished, cooling the temperature of the system to room temperature, repeatedly washing and filtering the sample by using boiled deionized water, and carrying out ultrasonic treatment for 21 hours to obtain the composite conductive material.
The third dielectric layer is made of lanthanum oxide.
The raw material of the ultraviolet absorption layer is 2-hydroxy-4-methoxybenzophenone.
The raw material of the wear-resistant layer is zirconia.
A preparation method of low-radiation electric heating glass comprises the following steps:
s1, placing the selected matrix in an ultrasonic cleaning machine filled with distilled water, adding a proper amount of cleaning agent into the distilled water, ultrasonically cleaning the matrix for 10min, taking out the matrix, cleaning the matrix with the distilled water, and airing the matrix under natural conditions for later use;
s2, placing the raw material of the first dielectric film layer in a vacuum coating machine, and performing coating treatment on the upper surface of the substrate by adopting the existing vacuum coating process, wherein a film layer with the thickness of 16nm formed on the upper surface of the substrate after coating is finished is the first dielectric film layer;
s3, placing the raw material of the second dielectric film layer in a vacuum coating machine, and finally obtaining a film layer with the thickness of 23nm formed on the upper surface of the first dielectric film layer by adopting the same vacuum coating process as the vacuum coating process of S2, namely the second dielectric film layer;
s4, forming a transparent dielectric film with the film thickness of 32nm on the upper surface of the second dielectric film layer by adopting a vacuum coating process to form a barrier layer;
s5, forming a metal conducting layer with a film thickness of 14nm and a porous net structure on the upper surface of the barrier layer by a mask method through a vacuum coating process, and then uniformly plating the composite conducting material in pores of the metal conducting layer with the porous net structure through the vacuum coating process to obtain a conducting layer;
s6, placing the raw material of the third dielectric film layer in a vacuum coating machine, and forming a transparent dielectric film with the film thickness of 30nm on the surface of the conducting layer by adopting a vacuum coating process, namely the third dielectric film layer;
s7, uniformly plating the ultraviolet absorption layer raw material on the surface of the third medium film layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 40nm, namely the ultraviolet absorption layer;
s8, uniformly plating the raw materials of the wear-resistant layer on the surface of the ultraviolet absorption layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 48nm, namely the wear-resistant layer; and finally obtaining the finished product of the low-radiation electric heating glass.
Example 4:
the low-radiation electric heating glass comprises a substrate, and a first dielectric film layer, a second dielectric film layer, a barrier layer, a conductive layer, a third dielectric layer, an ultraviolet absorption layer and a wear-resistant layer which are sequentially deposited on the substrate.
The substrate is made of high borosilicate glass.
The raw material of the first medium film layer is nano silicon carbide.
The raw material of the second medium film layer is nano manganese dioxide.
The raw material of the barrier layer is BZO.
The raw materials used by the conductive layer comprise nano silver and a composite conductive material; the preparation method of the composite conductive material comprises the following steps:
a. adding a proper amount of concentrated sulfuric acid into a beaker under an ice bath condition, adding 2.0g of graphite powder, 1.0g of sodium nitrate and 6.0g of potassium permanganate under magnetic stirring, uniformly stirring, heating to 36 ℃, and adding 200mL of deionized water into the mixture; then, continuously heating to 90 ℃, adding 20mL of hydrogen peroxide into the mixture, filtering and washing to obtain graphite oxide;
b. mixing the obtained graphite oxide and melamine according to the mass ratio of 3:2, adding the mixture into 100mL of ethanol solution, stirring for 5 hours, heating and boiling the solution to remove ethanol, and drying in a vacuum drying oven at 120 ℃ for 6 hours;
c. the dried sample was placed in a tube furnace and heated at N2Heating to 980 ℃ at the speed of 5 ℃/min under the atmosphere, and reacting for 30-40min under the condition; and after the substitution reaction is finished, cooling the temperature of the system to room temperature, repeatedly washing and filtering the sample by using boiled deionized water, and carrying out ultrasonic treatment for 22 hours to obtain the composite conductive material.
And bismuth oxide serving as a raw material for the third dielectric layer.
The raw material of the ultraviolet absorption layer is 2-hydroxy-4-n-octoxy benzophenone.
The raw material of the wear-resistant layer is zirconia.
A preparation method of low-radiation electric heating glass comprises the following steps:
s1, placing the selected matrix in an ultrasonic cleaning machine filled with distilled water, adding a proper amount of cleaning agent into the distilled water, ultrasonically cleaning the matrix for 15min, taking out the matrix, cleaning the matrix with distilled water, and airing the matrix under natural conditions for later use;
s2, placing the raw material of the first dielectric film layer in a vacuum coating machine, and performing coating treatment on the upper surface of the substrate by adopting the existing vacuum coating process, wherein a film layer with the thickness of 18nm formed on the upper surface of the substrate after coating is the first dielectric film layer;
s3, placing the raw material of the second dielectric film layer in a vacuum coating machine, and finally obtaining a thin film layer with the thickness of 25nm formed on the upper surface of the first dielectric film layer by adopting the same vacuum coating process as the vacuum coating process of S2, namely the second dielectric film layer;
s4, forming a transparent dielectric film with the film thickness of 35nm on the upper surface of the second dielectric film layer by adopting a vacuum coating process to form a barrier layer;
s5, forming a metal conducting layer with a film thickness of 15nm and a porous net structure on the upper surface of the barrier layer by a mask method through a vacuum coating process, and then uniformly plating the composite conducting material in pores of the metal conducting layer with the porous net structure through the vacuum coating process to obtain a conducting layer;
s6, placing the raw material of the third dielectric film layer in a vacuum coating machine, and forming a transparent dielectric film with the film thickness of 35nm on the surface of the conducting layer by adopting a vacuum coating process, namely the third dielectric film layer;
s7, uniformly plating the ultraviolet absorption layer raw material on the surface of the third medium film layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 45nm, namely the ultraviolet absorption layer;
s8, uniformly plating the raw materials of the wear-resistant layer on the surface of the ultraviolet absorption layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 50nm, namely the wear-resistant layer; and finally obtaining the finished product of the low-radiation electric heating glass.
Comparative example 1
Certain brand of low-radiation electric heating glass is sold in the market;
comparative example 2
The comparative example 2 is different from the example 4 in that the thickness of the first dielectric film layer is 30 nm.
Comparative example 3
The difference between the comparative example 3 and the example 4 is that the thickness without the second dielectric film layer is 40 nm.
Comparative example 4
Comparative example 4 differs from example 4 in that the thickness of the barrier layer is 50 nm.
Comparative example 5
The comparative example 5 is different from the example 4 in that the thickness of the third dielectric film layer is 50 nm.
And (3) detection results:
the performance of a certain brand of commercially available low-emissivity electrically heated glass (comparative example 1) and the low-emissivity electrically heated glass prepared according to the present invention (examples) was determined and the results are shown in the following table:
| test items | Emissivity of radiation | Solar direct emissivity/percent | hardness/H |
| Example 1 | 0.073 | 32 | 3 |
| Example 2 | 0.081 | 35 | 3 |
| Example 3 | 0.068 | 30 | 3 |
| Example 4 | 0.076 | 34 | 3 |
| Comparative example 1 | 0.182 | 49 | 1 |
| Comparative example 2 | 0.127 | 41 | 3 |
| Comparative example 3 | 0.111 | 42 | 3 |
| Comparative example 4 | 0.131 | 43 | 3 |
| Comparative example 5 | 0.115 | 42 | 3 |
The data in the table show that the dielectric layers are different in thickness, the radiance of the electric heating glass and the direct radiance of solar energy are different, in addition, the radiance of the electric heating glass prepared by the invention is smaller than that of a certain brand of commercially available low-radiation electric heating glass, and the wear resistance of the electric heating glass prepared by the invention is superior to that of the low-radiation electric heating glass of the certain brand, so that the quality of the low-radiation electric heating glass prepared by the invention is better, and the electric heating glass is more suitable for popularization.
The above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (1)
1. The low-radiation electric heating glass is characterized by comprising a substrate, and a first dielectric film layer, a second dielectric film layer, a barrier layer, a conductive layer, a third dielectric layer, an ultraviolet absorption layer and a wear-resistant layer which are sequentially deposited on the substrate;
the thickness of the first dielectric film layer is 12-18 nm; the thickness of the second dielectric film layer is 18-25 nm; the thickness of the barrier layer is 25-35 nm; the thickness of the conducting layer is 10-15 nm; the thickness of the third medium film layer is 25-35 nm; the thickness of the ultraviolet absorption layer is 30-45 nm; the thickness of the wear-resistant layer is 40-50 nm;
the raw material of the first medium film layer is nano silicon carbide; the raw material used by the substrate is any one of ordinary glass or high borosilicate glass;
the raw material of the second medium film layer is nano manganese dioxide;
the raw material used by the barrier layer is any one of ZnO or BZO;
the raw materials used by the conducting layer comprise nano silver and a composite conducting material; the preparation method of the composite conductive material comprises the following steps:
a. adding a proper amount of concentrated sulfuric acid into a beaker under an ice bath condition, adding 2.0g of graphite powder, 1.0g of sodium nitrate and 6.0g of potassium permanganate under magnetic stirring, uniformly stirring, heating to 30-36 ℃, and adding 200mL of deionized water into the mixture; then, continuously heating to 85-90 ℃, adding 20mL of hydrogen peroxide into the mixture, filtering and washing to obtain graphite oxide;
b. mixing the obtained graphite oxide and melamine according to the mass ratio of 3:2, adding the mixture into 100mL of ethanol solution, stirring for 5h, heating and boiling the solution to remove ethanol, and drying in a vacuum drying oven at the temperature of 110-;
c. the dried sample was placed in a tube furnace and heated at N2Raising the temperature to 900-; after the reaction is finished, cooling the temperature of the system to room temperature, repeatedly washing and filtering the sample by using boiled deionized water, and carrying out ultrasonic treatment for 18-22h to obtain the composite conductive material;
the raw material used by the third dielectric layer is any one of lanthanum oxide or bismuth oxide;
the raw material used by the ultraviolet absorption layer is any one of 2-hydroxy-4-methoxybenzophenone or 2-hydroxy-4-n-octoxybenzophenone;
the raw material of the wear-resistant layer is zirconium oxide;
the preparation method of the low-radiation electric heating glass comprises the following steps:
s1, placing the selected matrix in an ultrasonic cleaning machine filled with distilled water, adding a proper amount of cleaning agent into the distilled water, ultrasonically cleaning the matrix for 10-15min, taking out the matrix, cleaning the matrix with distilled water, and airing the matrix under natural conditions for later use;
s2, placing the raw material of the first dielectric film layer in a vacuum coating machine, and performing coating treatment on the upper surface of the substrate by adopting the existing vacuum coating process, wherein a film layer with the thickness of 12-18nm formed on the upper surface of the substrate after coating is the first dielectric film layer;
s3, placing the raw material of the second dielectric film layer in a vacuum coating machine, and finally obtaining a film layer with the thickness of 18-25nm formed on the upper surface of the first dielectric film layer by adopting the same vacuum coating process as the vacuum coating process of S2, namely the second dielectric film layer;
s4, forming a transparent dielectric film with the film thickness of 25-35nm on the upper surface of the second dielectric film layer by adopting a vacuum coating process to form a barrier layer;
s5, forming a metal conducting layer with a film thickness of 10-15nm and a porous net structure on the upper surface of the barrier layer by a mask method through a vacuum coating process, and then uniformly plating the composite conducting material in pores of the metal conducting layer with the porous net structure through the vacuum coating process to obtain a conducting layer;
s6, placing the raw material of the third dielectric film layer in a vacuum coating machine, and forming a transparent dielectric film with the thickness of 25-35nm on the surface of the conducting layer by adopting a vacuum coating process, namely the third dielectric film layer;
s7, uniformly plating the raw material of the ultraviolet absorption layer on the surface of the third medium film layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 30-45nm, namely the ultraviolet absorption layer;
s8, uniformly plating the raw materials of the wear-resistant layer on the surface of the ultraviolet absorption layer by adopting a vacuum coating process to form a transparent medium film with the film thickness of 40-50nm, namely the wear-resistant layer; and finally obtaining the finished product of the low-radiation electric heating glass.
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| CN108439824A (en) * | 2017-12-19 | 2018-08-24 | 江苏繁华玻璃股份有限公司 | A kind of transparent electrically heated glass of Low emissivity and its preparation process |
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| CN104882223B (en) * | 2015-04-27 | 2017-11-10 | 国家纳米科学中心 | Graphene oxide/nano silver wire compound transparent electricity conductive film and preparation method thereof |
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| KR102509032B1 (en) * | 2018-05-09 | 2023-03-09 | 쌩-고벵 글래스 프랑스 | Clear substrate provided with multilayer coating and insulation glazing unit including the same |
| CN109473200A (en) * | 2018-12-12 | 2019-03-15 | 北京石墨烯研究院 | Transparent conducting glass and preparation method thereof |
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| CN104600306A (en) * | 2013-10-31 | 2015-05-06 | 青岛泰浩达碳材料有限公司 | Preparation method for nitrogen-graphene composite electrode graphite material |
| CN105884210A (en) * | 2014-12-23 | 2016-08-24 | 北京金晶智慧有限公司 | Ultraviolet ray and infrared ray shielding glass capable of being subsequently processed |
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