CN108439824A - A kind of transparent electrically heated glass of Low emissivity and its preparation process - Google Patents

A kind of transparent electrically heated glass of Low emissivity and its preparation process Download PDF

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Publication number
CN108439824A
CN108439824A CN201810187994.0A CN201810187994A CN108439824A CN 108439824 A CN108439824 A CN 108439824A CN 201810187994 A CN201810187994 A CN 201810187994A CN 108439824 A CN108439824 A CN 108439824A
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China
Prior art keywords
coating
low emissivity
layer
electrically heated
film
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CN201810187994.0A
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Chinese (zh)
Inventor
刘江
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Bustling Glass Limited-Liability Co In Jiangsu
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Bustling Glass Limited-Liability Co In Jiangsu
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3613—Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3639—Multilayers containing at least two functional metal layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C03C17/366—Low-emissivity or solar control coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/216—ZnO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/254—Noble metals
    • C03C2217/256—Ag
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/27—Mixtures of metals, alloys
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/28—Other inorganic materials
    • C03C2217/281—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation

Abstract

The present invention relates to a kind of transparent electrically heated glass of Low emissivity and its preparation processes, the transparent electrically heated glass of Low emissivity includes the substrate positioned at bottom, and media coating one, media coating two, barrier layer, mesh nanometer functional film layer, barrier layer, media coating three, media coating two and the anti abrasion layer being sequentially depositing on substrate.The advantage of the invention is that：Low emissivity that the transparent electrically heated glass of Low emissivity of the present invention can solve the side window glass such as automobile, electric vehicle, rail traffic is energy saving, barrier infrared ray and ultraviolet light, replaces existing automobile adhesive film technique and improves visible light transmittance；The invisible electric heating problems of the existing tempering of otherwise address, doubling glass, the electric heating wire of shelves is not stealthy effect after doubling front and tempering at present, so existing on the visual effect of driving influences.

Description

A kind of transparent electrically heated glass of Low emissivity and its preparation process
Technical field
The invention belongs to glassware technical field, more particularly to the transparent electrically heated glass of a kind of Low emissivity and its work is prepared Skill.
Background technology
As the increasingly depleted and the mankind of earth resource are to the excessive influence of environment, environmentally protective, energy-saving low-carbon material at For the hot spot of research, automobile Low emissivity energy-saving glass is to replace one of best approach of automobile adhesive film at present；In addition such low The film layer of radiation energy-saving glass can prepare a kind of electric heating energy-saving glass with stealthy effect very well by yellow light technique, It can be adapted for the modes such as tempering, doubling.
The transparent electrically heated glass of Low emissivity be one kind in glass surface by vacuum plasma magnetically controlled sputter method in glass Surface plates the membrane system product of multiple layer metal or other compounds composition, and membrane system product has to visible light high transmission and centering The characteristic of far infrared high reflection has excellent heat insulation and good translucency.Also have according further to membrane system product The advantage of low square resistance and high transmission prepares the electric heating wire of a rule by yellow light technique, can ensure that Low emissivity is energy saving Has stealthy electrically heated effect while effect.
The glass such as automobile, electric vehicle, rail traffic are process using simple glass at present, have no energy saving, resistance Every infrared and ultraviolet ability, in addition the electrically heated technology of preceding shelves doubling is still prepared into using 0.2~0.3mm tungsten filaments at present Electrode, but the visual effect driven still can be influenced, the electrical heating of rear shelves is the electrode prepared using high temperature silver paste, vision effect Fruit is worse.
Invention content
The technical problem to be solved in the present invention is to provide a kind of transparent electrically heated glass of Low emissivity and its preparation processes, with solution Certainly the Low emissivity of the side window glass such as automobile, electric vehicle, rail traffic is energy saving, obstructs infrared ray and ultraviolet light, replaces existing vapour Traffic allowance membrane process simultaneously improves visible light transmittance；The invisible electric heating problems of the existing tempering of otherwise address, doubling glass, current clip The electric heating wire of shelves is not stealthy effect after glue front and tempering, so existing on the visual effect of driving influences.
In order to solve the above technical problems, the technical scheme is that：A kind of transparent electrically heated glass of Low emissivity, innovation Point is：The transparent electrically heated glass of Low emissivity includes the substrate positioned at bottom, and the medium being sequentially depositing on substrate Film layer one, media coating two, barrier layer, mesh nanometer functional film layer, barrier layer, media coating three, media coating two, deielectric-coating Layer one and anti abrasion layer.
Further, the substrate selects any one of simple glass, ultra-clear glasses or high-boron-silicon glass.
Further, the dielectric thin-film material of the media coating one selects Si3N4Or SiO2Any one of.
Further, the dielectric thin-film material of the media coating two selects TiN or TiO2Any one of.
Further, the dielectric thin-film material on the barrier layer selects any one of ZnO, AZO or BZO.
Further, the thin-film material of the mesh nanometer functional film layer selects nano silver.
Further, the dielectric thin-film material of the media coating three selects any one of NiCr or MCr.
Further, the thin-film material of the anti abrasion layer selects zirconia film.
A kind of preparation process of the transparent electrically heated glass of above-mentioned Low emissivity, innovative point are：The preparation process packet Include following steps：
(1) use vacuum coating, evaporation coating or sol gel process substrate surface formed a tunic thickness 15nm~ The transparent dielectric film of 20nm forms media coating one；
(2) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on one surface of media coating The transparent dielectric film of 20nm~25nm forms media coating two；
(3) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on two surface of media coating The transparent dielectric film of 25nm~40nm forms barrier layer；
(4) tunic thickness 8nm~12nm tools are formed by vacuum coating or evaporation coating by mask method over the barrier layer There is the metal conducting layer of porous network structure, and then forms mesh nanometer functional film layer；
(5) vacuum coating, evaporation coating or sol gel process is used to form one layer on mesh nanometer functional film layer surface The transparent dielectric film of film thickness 25nm~40nm forms barrier layer；
(6) use vacuum coating, evaporation coating or sol gel process barrier layer surface formed a tunic thickness 20nm~ The transparent dielectric film of 40nm forms media coating three；
(7) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on three surface of media coating The transparent dielectric film of 20nm~25nm forms media coating two；
(8) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on two surface of media coating The transparent dielectric film of 15nm~20nm forms media coating one；
(9) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on one surface of media coating The transparent dielectric film of 40nm~50nm forms anti abrasion layer, and then forms the transparent electrically heated glass of Low emissivity.
Further, the specific preparation process of step (4) the mesh nanometer functional film layer includes the following steps：
A. being coated with last layer in such a way that spraying, in-situ reaction or solution impregnate lifting in barrier layer surface has The PH of nanoparticle solution, nanoparticle solution is 4~6, and the grain size of nanoparticle is 20~500nm；
B. by the substrate containing nanoparticle solution in pure water by clean 3~15 times, obtain microballoon coverage rate be 15 ~75% substrate containing nanoparticle solution；
C. by the substrate of the nanoparticle solution containing 15~75% coverage rates after cleaning after accurate air knife air-dries, Form the substrate of surface attachment microsphere particle；
D. function deposit metal films are arrived using vacuum coating, evaporation coating by the way that microsphere particle substrate is adhered on surface Substrate surface, control film thickness is no more than the radius of microsphere particle in deposition process；
E. the microsphere particle of substrate surface is removed by wiping, ultrasonic vibration or backwashing manner, forms metal conducting layer；
F. the substrate surface containing metal conducting layer is coated with a tunic thickness by precise silk screen silk-screen or roller coating technology is The photoresists of 50~100um, using 120~160 DEG C of baking oven baking and curings；
G. designed heater strip figure is generated into the film by laser drawing machine, by the film and contains the substrate of photoresists It is aligned and is positioned on exposure machine and carry out exposure glass, form mask graph；
H. the metal conducting layer for forming the region for covering no mask graph by acid corrosion after mask graph removes, then The metallic conduction reticular structure that needs will be formed after the cured photoresists removal of mask by alkaline photoresists mask remover, into And form mesh nanometer functional film layer.
The advantage of the invention is that：The transparent electrically heated glass of Low emissivity of the present invention, wherein mesh nanometer metallic conduction function The setting of layer so that lower surface resistance can be obtained under high transmittance, generally can be reduced to 5 from 15~20ohm ~8ohm, while metal material also has the function of good infrared external reflection, can stop heat radiation and with good energy saving effect Fruit can be used as electrical heating to carry out defrosting-defogging function so as to realize in the case where yellow light etches to form electrode；Meanwhile Film structure can be made to be resistant to 680~750 DEG C of high temperature molding processes by the combination and blocking double shielding of media coating, Ensure that the metal conductive film of mesh nanometer metallic conduction functional layer is not oxidized, and then can be allowed by the developing material to film layer Membrane system can high temperature resistant and tempering and the hot bending processing together of realization and glass substrate；In addition, ensuring glass by increasing anti abrasion layer Film layer is not destroyed during processing, transport etc., has good rub resistance and breakage resistant ability, film hardness can be with It is promoted from original 1H to 3H.
Description of the drawings
The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
Fig. 1 is the structural schematic diagram of the transparent electrically heated glass of Low emissivity of the present invention.
Specific implementation mode
The following examples can make professional and technical personnel that the present invention be more fully understood, but therefore not send out this It is bright to be limited among the embodiment described range.
Embodiment 1
The transparent electrically heated glass of the present embodiment Low emissivity, as shown in Figure 1, the transparent electrically heated glass of the Low emissivity includes being located at The substrate 1 of bottom, and the media coating 1, media coating 23, barrier layer 4, the mesh nanometer work(that are sequentially depositing on substrate 1 It can film layer 5, barrier layer 6, media coating 37, media coating 28, media coating 1 and anti abrasion layer 10；Wherein, substrate 1 selects With any one of simple glass, ultra-clear glasses or high-boron-silicon glass, the present embodiment substrate 1 selects ultra-clear glasses；Media coating One 2 dielectric thin-film material selects Si3N4Or SiO2Any one of, the present embodiment media coating 1 selects Si3N4；Deielectric-coating The dielectric thin-film material of layer 23 selects TiN or TiO2Any one of, the present embodiment media coating 23 selects TiN；Barrier layer 4 Dielectric thin-film material select any one of ZnO, AZO or BZO, the dielectric thin-film material of the present embodiment to select AZO；Nano net The thin-film material of shape functional film layer 5 selects nano silver；The dielectric thin-film material on barrier layer 6 selects any in ZnO, AZO or BZO Kind, the dielectric thin-film material of the present embodiment selects ZnO；The dielectric thin-film material of media coating 37 selects appointing in NiCr or MCr One kind, the present embodiment media coating 7 select NiCr；The dielectric thin-film material of media coating 28 selects TiN or TiO2In any Kind, the present embodiment media coating 28 selects TiN；The dielectric thin-film material of media coating 1 selects Si3N4Or SiO2In any Kind, the present embodiment media coating 1 selects Si3N4；The thin-film material of anti abrasion layer 10 selects zirconia film.
Embodiment 2
The transparent electrically heated glass of 1 Low emissivity of embodiment is prepared by following step of preparation process：
(1) use vacuum coating, evaporation coating or sol gel process 1 surface of substrate formed a tunic thickness 15nm~ The transparent dielectric film of 20nm forms media coating 1；
(2) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on one 2 surface of media coating The transparent dielectric film of 20nm~25nm forms media coating 23；
(3) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on 23 surface of media coating The transparent dielectric film of 25nm~40nm forms barrier layer 4；
(4) tunic thickness 8nm~12nm tools are formed by vacuum coating or evaporation coating on barrier layer 4 by mask method There is the metal conducting layer of porous network structure, and then forms mesh nanometer functional film layer 5；
(5) vacuum coating, evaporation coating or sol gel process is used to form one layer on 5 surface of mesh nanometer functional film layer The transparent dielectric film of film thickness 25nm~40nm forms barrier layer 6；
(6) use vacuum coating, evaporation coating or sol gel process 6 surface of barrier layer formed a tunic thickness 20nm~ The transparent dielectric film of 40nm forms media coating 37；
(7) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on 37 surface of media coating The transparent dielectric film of 20nm~25nm forms media coating 28；
(8) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on 28 surface of media coating The transparent dielectric film of 15nm~20nm forms media coating 1；
(9) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on one 9 surface of media coating The transparent dielectric film of 40nm~50nm forms anti abrasion layer 10, and then forms the transparent electrically heated glass of Low emissivity.
Wherein, the specific preparation process of mesh nanometer functional film layer 5 includes the following steps：
A. being coated with last layer in such a way that spraying, in-situ reaction or solution impregnate lifting in barrier layer surface has The PH of nanoparticle solution, nanoparticle solution is 4~6, and the grain size of nanoparticle is 20~500nm；
B. by the substrate containing nanoparticle solution in pure water by clean 3~15 times, obtain microballoon coverage rate be 15 ~75% substrate containing nanoparticle solution；
C. by the substrate of the nanoparticle solution containing 15~75% coverage rates after cleaning after accurate air knife air-dries, Form the substrate of surface attachment microsphere particle；
D. function deposit metal films are arrived using vacuum coating, evaporation coating by the way that microsphere particle substrate is adhered on surface Substrate surface, control film thickness is no more than the radius of microsphere particle in deposition process；
E. the microsphere particle of substrate surface is removed by wiping, ultrasonic vibration or backwashing manner, forms metal conducting layer；
F. the substrate surface containing metal conducting layer is coated with a tunic thickness by precise silk screen silk-screen or roller coating technology is The photoresists of 50~100um, using 120~160 DEG C of baking oven baking and curings；
G. designed heater strip figure is generated into the film by laser drawing machine, by the film and contains the substrate of photoresists It is aligned and is positioned on exposure machine and carry out exposure glass, form mask graph；
H. the metal conducting layer for forming the region for covering no mask graph by acid corrosion after mask graph removes, then The metallic conduction reticular structure that needs will be formed after the cured photoresists removal of mask by alkaline photoresists mask remover, into And form mesh nanometer functional film layer 5.
The transparent electrically heated glass of Low emissivity that the present embodiment is prepared into is tested, can be obtained under high transmittance Lower surface resistance is reduced to 5~8ohm from 15~20ohm；In addition, ensuring that glass film layers are adding by increasing anti abrasion layer It is not destroyed during work, transport etc., there is good rub resistance and breakage resistant ability, film hardness can be from original 1H is promoted to 3H.
The basic principles and main features and advantages of the present invention of the present invention have been shown and described above.The skill of the industry Art personnel it should be appreciated that the present invention is not limited to the above embodiments, the above embodiments and description only describe The principle of the present invention, without departing from the spirit and scope of the present invention, various changes and improvements may be made to the invention, these Changes and improvements all fall within the protetion scope of the claimed invention.The claimed scope of the invention by appended claims and Its equivalent thereof.

Claims (10)

1. a kind of transparent electrically heated glass of Low emissivity, it is characterised in that：The transparent electrically heated glass of Low emissivity includes being located at bottom Layer substrate, and be sequentially depositing on substrate media coating one, media coating two, barrier layer, mesh nanometer functional film layer, Barrier layer, media coating three, media coating two, media coating one and anti abrasion layer.
2. the transparent electrically heated glass of Low emissivity according to claim 1, it is characterised in that：The substrate selects common glass Any one of glass, ultra-clear glasses or high-boron-silicon glass.
3. the transparent electrically heated glass of Low emissivity according to claim 1, it is characterised in that：The medium of the media coating one Thin-film material selects Si3N4Or SiO2Any one of.
4. the transparent electrically heated glass of Low emissivity according to claim 1, it is characterised in that：The medium of the media coating two Thin-film material selects TiN or TiO2Any one of.
5. the transparent electrically heated glass of Low emissivity according to claim 1, it is characterised in that：The dielectric film on the barrier layer Any one of material selection ZnO, AZO or BZO.
6. the transparent electrically heated glass of Low emissivity according to claim 1, it is characterised in that：The mesh nanometer functional film layer Thin-film material select nano silver.
7. the transparent electrically heated glass of Low emissivity according to claim 1, it is characterised in that：The medium of the media coating three Thin-film material selects any one of NiCr or MCr.
8. the transparent electrically heated glass of Low emissivity according to claim 1, it is characterised in that：The film material of the anti abrasion layer Material selects zirconia film.
9. a kind of preparation process of the transparent electrically heated glass of Low emissivity described in claim 1, it is characterised in that：The preparation work Skill includes the following steps：
(1) vacuum coating, evaporation coating or sol gel process is used to form a tunic thickness 15nm~20nm's in substrate surface Transparent dielectric film forms media coating one；
(2) use vacuum coating, evaporation coating or sol gel process one surface of media coating formed a tunic thickness 20nm~ The transparent dielectric film of 25nm forms media coating two；
(3) use vacuum coating, evaporation coating or sol gel process two surface of media coating formed a tunic thickness 25nm~ The transparent dielectric film of 40nm forms barrier layer；
(4) a tunic thickness 8nm~12nm is formed with more by vacuum coating or evaporation coating by mask method over the barrier layer The metal conducting layer of hole reticular structure, and then form mesh nanometer functional film layer；
(5) vacuum coating, evaporation coating or sol gel process is used to form tunic thickness on mesh nanometer functional film layer surface The transparent dielectric film of 25nm~40nm forms barrier layer；
(6) vacuum coating, evaporation coating or sol gel process is used to form a tunic thickness 20nm~40nm in barrier layer surface Transparent dielectric film, formed media coating three；
(7) use vacuum coating, evaporation coating or sol gel process three surface of media coating formed a tunic thickness 20nm~ The transparent dielectric film of 25nm forms media coating two；
(8) use vacuum coating, evaporation coating or sol gel process two surface of media coating formed a tunic thickness 15nm~ The transparent dielectric film of 20nm forms media coating one；
(9) use vacuum coating, evaporation coating or sol gel process one surface of media coating formed a tunic thickness 40nm~ The transparent dielectric film of 50nm forms anti abrasion layer, and then forms the transparent electrically heated glass of Low emissivity.
10. the preparation process of the transparent electrically heated glass of Low emissivity according to claim 9, it is characterised in that：The step (4) the specific preparation process of mesh nanometer functional film layer includes the following steps：
A. being coated with last layer in such a way that spraying, in-situ reaction or solution impregnate lifting in barrier layer surface has nanometer The PH of microspheres solution, nanoparticle solution is 4~6, and the grain size of nanoparticle is 20~500nm；
B. by the substrate containing nanoparticle solution in pure water by clean 3~15 times, obtain microballoon coverage rate be 15~ 75% substrate containing nanoparticle solution；
C. it by the substrate of the nanoparticle solution containing 15~75% coverage rates after cleaning after accurate air knife air-dries, is formed The substrate of microsphere particle is adhered on surface；
D. by the way that microsphere particle substrate is adhered to using vacuum coating, evaporation coating by function deposit metal films to substrate in surface Surface, control film thickness is no more than the radius of microsphere particle in deposition process；
E. the microsphere particle of substrate surface is removed by wiping, ultrasonic vibration or backwashing manner, forms metal conducting layer；
F. by the substrate surface containing metal conducting layer by precise silk screen silk-screen or roller coating technology be coated with a tunic thickness be 50~ The photoresists of 100um, using 120~160 DEG C of baking oven baking and curings；
G. designed heater strip figure is generated into the film by laser drawing machine, the film and the substrate containing photoresists is carried out It aligns and is positioned on exposure machine and carry out exposure glass, form mask graph；
H. the metal conducting layer for forming the region for covering no mask graph by acid corrosion after mask graph removes, then passes through Alkaline photoresists mask remover will form the metallic conduction reticular structure of needs, and then shape after the cured photoresists removal of mask At mesh nanometer functional film layer.
CN201810187994.0A 2017-12-19 2018-03-07 A kind of transparent electrically heated glass of Low emissivity and its preparation process Withdrawn CN108439824A (en)

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CN2017113712328 2017-12-19

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111302651A (en) * 2020-04-07 2020-06-19 索曼电子（深圳）有限公司 Low-radiation electric heating glass and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111302651A (en) * 2020-04-07 2020-06-19 索曼电子（深圳）有限公司 Low-radiation electric heating glass and preparation method thereof
CN111302651B (en) * 2020-04-07 2020-12-01 索曼电子（深圳）有限公司 Low-radiation electric heating glass and preparation method thereof

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