CN103396013A - Off-line high-transmittance solid-color low-radiation toughened coated glass and manufacturing method thereof - Google Patents
Off-line high-transmittance solid-color low-radiation toughened coated glass and manufacturing method thereof Download PDFInfo
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- CN103396013A CN103396013A CN2013103527981A CN201310352798A CN103396013A CN 103396013 A CN103396013 A CN 103396013A CN 2013103527981 A CN2013103527981 A CN 2013103527981A CN 201310352798 A CN201310352798 A CN 201310352798A CN 103396013 A CN103396013 A CN 103396013A
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Abstract
The invention discloses off-line high-transmittance solid-color low-radiation toughened coated glass which comprises a glass substrate, wherein the glass substrate is sequentially provided with silicon nitride SiNx, aluminum zinc oxide ZnALOx, metal nickel chromium NiCr, metal silver Ag, metal nickel chromium NiCr, aluminum zinc oxide ZnAlOx and silicon nitride SiNx. The preparation method of the off-line high-transmittance solid-color low-radiation coated glass comprises the following step: in double-end off-line high-vacuum magnetron sputtering coating equipment, when the basic vacuum is up to 10<3>Pa and the linear speed is 3m/min, sequentially spattering silicon nitride SiNx, aluminum zinc oxide ZnAlOx, metal nickel chromium NiCr, metal silver Ag, metal nickel chromium NiCr, aluminum zinc oxide ZnAlOx and silicon nitride SiNx on the glass. On the basis of realizing low radiance and low heat transfer property of the coating, the invention can also ensure that the coating has the advantage that the natural light transmittance is high (82.5-83%).
Description
Technical field
The present invention relates to a kind of glass and manufacture method thereof, but particularly a kind of off-line high transparent clean color low radiation steel coated glass and manufacture method thereof.
Background technology
existing conventional clear glass application is very extensive, its transmission range just in time overlaps with the solar radiation SPECTRAL REGION, therefore, when seeing through visible light, infrared heat energy in sunlight also can see through glass in a large number, and the heat energy of 2.5～5um middle-infrared band is by a large amount of absorptions, thermal radiation more than the wavelength 5um that heating installation is sent, simple glass can not directly see through but be close to fully and absorb, and by conduction, radiation reaches and can heat be delivered to outdoor with cross-ventilated mode, indoor temperature is reduced, in addition, simple glass can not shielding of ultraviolet, easily make indoor furniture and fabric fading, also has at present a kind of offline high, by tin Sn, silver Ag, the different thickness metal compound layer that nickel chromium triangle NiCr and silicon Si or zinc Zn generate by both-end off-line high vacuum magnetron sputtering technique and metal level form.This rete has than high reflectance the infrared radiation of 2.5-25 mum wavelength scope, but, this kind film system can only reach 75% to the transmitance of natural light is the highest, can not bring into play the high permeability of natural light and the double effects of heat-insulating and energy-saving, and this chemical durability of layers and physical strength are poor, can't widespread use.
Summary of the invention
The objective of the invention is in order to overcome above deficiency, a kind of enough very strong obstruct infrared rays are provided, have good heat insulation effect, but also can realize off-line high transparent clean color low radiation steel coated glass and the manufacture method thereof of the high permeability 82.5-83% of natural light simultaneously.
purpose of the present invention is achieved through the following technical solutions: but a kind of off-line high transparent clean color low radiation steel coated glass, comprise glass substrate, be provided with successively the first silicon nitride SiNx on glass substrate, the first zinc oxide aluminum ZnAlOx, the first metal nickel chromium triangle NiCr, argent Ag, the second metal nickel chromium triangle NiCr, the second zinc oxide aluminum ZnAlOx, the second silicon nitride SiNx, the thickness of glass substrate is 3mm～15mm, the thickness of the first silicon nitride SiNx is 37nm～45nm, the thickness of the first zinc oxide aluminum ZnAlOx is 15nm～20nm, the thickness of the first metal nickel chromium triangle NiCr is 1nm～5nm, the thickness of argent Ag is 10nm～15nm, the thickness of the second metal nickel chromium triangle NiCr is 1nm～5nm, the thickness of the second zinc oxide aluminum ZnAlOx is 15nm～20nm, the thickness of the second silicon nitride SiNx is 45nm～50nm.
Further improvement of the present invention is: the thickness of glass substrate is 6mm, the thickness of the first silicon nitride SiNx is 45nm, the thickness of the first zinc oxide aluminum ZnOx is 20nm, the thickness of the first metal nickel chromium triangle NiCr is 1nm, the thickness of argent Ag is 13nm, the thickness of the second metal nickel chromium triangle NiCr is 1.5nm, and the thickness of the second zinc oxide ZnOx is 20nm, and the thickness of the second silicon nitride SiNx is 50nm.
But a kind of preparation method of off-line high transparent clean color low radiation steel coated glass comprises the following steps:
A: select 3～15mm glass substrate, by predetermined size, cut into sheet glass, with cleaning machine, sheet glass is cleaned;
B: the base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10 3Pa, and linear velocity is set to 3 m/mins;
C: glass substrate is sent into coating chamber, and the power that sets gradually the first high vacuum magnetic-controlled sputtering coating equipment is 95KW～105KW, the first silicon nitride SiNx of sputter the first layer 37nm～45nm on glass substrate;
D: the power that the second high vacuum magnetic-controlled sputtering coating equipment is set is 18KW～25KW, the first zinc oxide aluminum ZnAlOx of sputter second layer 15nm～20nm on glass substrate;
E: the power that third high vacuum magnetron sputtering coating film equipment is set is 1KW～2KW, the first metal nickel chromium triangle NiCr of the 3rd layer of 0.5nm～1.5nm of sputter on glass substrate;
F: the power that the 4th high vacuum magnetic-controlled sputtering coating equipment is set is 2KW～2.7KW, the argent Ag of the 4th layer of 13nm～15nm of sputter on glass substrate;
G: the power that the 5th high vacuum magnetic-controlled sputtering coating equipment is set is 1KW～2KW, the second metal nickel chromium triangle NiCr of sputter layer 5 0.5nm～1.5nm on glass substrate;
H: the power that the 6th high vacuum magnetic-controlled sputtering coating equipment is set is 18KW～25KW, the second zinc oxide aluminum ZnAlOx of sputter layer 6 15nm～20nm on glass substrate;
I: the power that the 7th high vacuum magnetic-controlled sputtering coating equipment is set is 110KW～120KW, the second silicon nitride SiNx of sputter layer 7 45nm～55nm on glass substrate.
The present invention compared with prior art has the following advantages: on the basis of the low-E of realizing rete and low heat transfer performance, can realize simultaneously the high permeability 82.5-83% of rete to natural light.
Embodiment:
In order to deepen the understanding to invention, the invention will be further described below in conjunction with embodiment, and this embodiment only is used for explaining the present invention, does not form the restriction to protection domain of the present invention.
but a kind of embodiment of off-line high transparent clean color low radiation steel coated glass of the present invention is: but a kind of off-line high transparent clean color low radiation steel coated glass, comprise glass substrate, be provided with successively the first silicon nitride SiNx on glass substrate, the first zinc oxide aluminum ZnAlOx, the first metal nickel chromium triangle NiCr, argent Ag, the second metal nickel chromium triangle NiCr, the second zinc oxide aluminum ZnAlOx, the second silicon nitride SiNx, the thickness of glass substrate is 3mm～15mm, the thickness of the first silicon nitride SiNx is 37nm～45nm, the thickness of the first zinc oxide aluminum ZnAlOx is 15nm～20nm, the thickness of the first metal nickel chromium triangle NiCr is 1nm～5nm, the thickness of argent Ag is 10nm～15nm, the thickness of the second metal nickel chromium triangle NiCr is 1nm～5nm, the thickness of the second zinc oxide aluminum ZnAlOx is 15nm～20nm, the thickness of the second silicon nitride SiNx is 45nm～50nm.
But the preparation method of off-line high transparent clean color low radiation steel coated glass comprises the following steps:
A: select 3～15mm glass substrate, by predetermined size, cut into sheet glass, with cleaning machine, sheet glass is cleaned;
B: the base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10 3Pa, and linear velocity is set to 3 m/mins;
C: glass substrate is sent into coating chamber, and the power that sets gradually the first high vacuum magnetic-controlled sputtering coating equipment is 95KW～105KW, the first silicon nitride SiNx of sputter the first layer 37nm～45nm on glass substrate, and the thicker color relation that reaches of its thickness is darker;
D: the power that the second high vacuum magnetic-controlled sputtering coating equipment is set is 18KW～25KW, the first zinc oxide aluminum ZnAlOx of sputter second layer 15nm～20nm on glass substrate;
E: the power that third high vacuum magnetron sputtering coating film equipment is set is 1KW～2KW, the first metal nickel chromium triangle NiCr of the 3rd layer of 0.5nm～1.5nm of sputter on glass substrate;
F: the power that the 4th high vacuum magnetic-controlled sputtering coating equipment is set is 2KW～2.7KW, and the argent Ag of the 4th layer of 13nm～15nm of sputter on glass substrate can make glass play the effect of low radiation;
G: the power that the 5th high vacuum magnetic-controlled sputtering coating equipment is set is 1KW～2KW, the second metal nickel chromium triangle NiCr of sputter layer 5 0.5nm～1.5nm on glass substrate, and Ag is not oxidized for the protection argent;
H: the power that the 6th high vacuum magnetic-controlled sputtering coating equipment is set is 18KW～25KW, the second zinc oxide aluminum ZnAlOx of sputter layer 6 15nm～20nm on glass substrate;
I: the power that the 7th high vacuum magnetic-controlled sputtering coating equipment is set is 110KW～120KW, and the second silicon nitride SiNx of sputter layer 7 45nm～55nm on glass substrate, protect each layer material not by external environmental and corrosion.
The present invention has on the basis of the low-E of realizing rete and low heat transfer performance, can realize simultaneously the advantage of rete to the high permeability 82.5-83% of natural light.
Embodiment 1:
in both-end off-line high vacuum magnetic-controlled sputtering coating equipment, make its base vacuum reach 10 3Pa, when linear velocity is 3 m/mins, sputter successively on the 6mm glass substrate: the silicon nitride SiNx thickness of sputter when power is 105KW is 45nm, the zinc oxide aluminum ZnAlOx thickness of sputter when power is 20KW is 15nm, the metal nickel chromium triangle NiCr thickness of sputter when power is 1.1KW is 1nm, the argent Ag thickness of sputter when power is 2.5KW is 13nm, the metal nickel chromium triangle NiCr thickness of sputter when power is 1.1KW is 1nm, the zinc oxide aluminum ZnAlOx thickness of sputter when power is 20KW is 15nm, the silicon nitride SiNx thickness of sputter when power is 105KW is 50nm.The glass colour degree of depth of this thickness is moderate, and can not only infrared radiation reflecting, can also play the effect of heat-insulating and energy-saving, to the high rate thoroughly of natural light, is 82.5%～83%.
Claims (3)
1. but steel off-line high transparent clean color low radiation coated glass, comprise glass substrate, it is characterized in that: be provided with successively the first silicon nitride SiNx on described glass substrate, the first zinc oxide aluminum ZnAlOx, the first metal nickel chromium triangle NiCr, argent Ag, the second metal nickel chromium triangle NiCr, the second zinc oxide aluminum ZnAlOx, the second silicon nitride SiNx, the thickness of described glass substrate is 3mm～15mm, the thickness of described the first silicon nitride SiNx is 37nm～45nm, the thickness of described the first zinc oxide aluminum ZnAlOx is 15nm～20nm, the thickness of described the first metal nickel chromium triangle NiCr is 1nm～5nm, the thickness of described argent Ag is 10nm～15nm, the thickness of described the second metal nickel chromium triangle NiCr is 1nm～5nm, the thickness of described the second zinc oxide aluminum ZnAlOx is 15nm～20nm, the thickness of described the second silicon nitride SiNx is 45nm～50nm.
2. but off-line high transparent clean color low radiation steel coated glass according to claim 1, it is characterized in that: the thickness of described glass substrate is 6mm, the thickness of described the first silicon nitride SiNx is 45nm, the thickness of described the first zinc oxide aluminum ZnOx is 20nm, the thickness of described the first metal nickel chromium triangle NiCr is 1nm, the thickness of described argent Ag is 13nm, the thickness of described the second metal nickel chromium triangle NiCr is 1.5nm, the thickness of described the second zinc oxide ZnOx is 20nm, and the thickness of described the second silicon nitride SiNx is 50nm.
3. but the preparation method of an off-line high transparent clean color low radiation steel coated glass is characterized in that: comprise the following steps:
A: select 3～15mm glass substrate, by predetermined size, cut into sheet glass, with cleaning machine, sheet glass is cleaned;
B: the base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10 3Pa, and linear velocity is set to 3 m/mins;
C: glass substrate is sent into coating chamber, and the power that sets gradually the first high vacuum magnetic-controlled sputtering coating equipment is 95KW～105KW, the first silicon nitride SiNx of sputter the first layer 37nm～45nm on glass substrate;
D: the power that the second high vacuum magnetic-controlled sputtering coating equipment is set is 18KW～25KW, the first zinc oxide aluminum ZnAlOx of sputter second layer 15nm～20nm on glass substrate;
E: the power that third high vacuum magnetron sputtering coating film equipment is set is 1KW～2KW, the first metal nickel chromium triangle NiCr of the 3rd layer of 0.5nm～1.5nm of sputter on glass substrate;
F: the power that the 4th high vacuum magnetic-controlled sputtering coating equipment is set is 2KW～2.7KW, the argent Ag of the 4th layer of 13nm～15nm of sputter on glass substrate;
G: the power that the 5th high vacuum magnetic-controlled sputtering coating equipment is set is 1KW～2KW, the second metal nickel chromium triangle NiCr of sputter layer 5 0.5nm～1.5nm on glass substrate;
H: the power that the 6th high vacuum magnetic-controlled sputtering coating equipment is set is 18KW～25KW, the second zinc oxide aluminum ZnAlOx of sputter layer 6 15nm～20nm on glass substrate;
I: the power that the 7th high vacuum magnetic-controlled sputtering coating equipment is set is 110KW～120KW, the second silicon nitride SiNx of sputter layer 7 45nm～55nm on glass substrate.
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| CN104890323A (en) * | 2015-06-11 | 2015-09-09 | 广东南亮玻璃科技有限公司 | Novel glass structure and production technology thereof |
| CN109305763A (en) * | 2018-08-30 | 2019-02-05 | 河北中玻新材料有限公司 | A kind of high-transparency list silver low-radiation coated glass |
| CN111517667A (en) * | 2020-06-02 | 2020-08-11 | 江苏奥蓝工程玻璃有限公司 | One-way perspective glass and preparation method thereof |
| CN112679112A (en) * | 2020-12-11 | 2021-04-20 | 安徽凤阳玻璃有限公司 | Off-line high-transmittance clean-color low-radiation steel-coated glass and manufacturing method thereof |
| CN114735945A (en) * | 2022-04-15 | 2022-07-12 | 深圳南玻应用技术有限公司 | Composite glass and preparation method and application thereof |
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| CN104890323A (en) * | 2015-06-11 | 2015-09-09 | 广东南亮玻璃科技有限公司 | Novel glass structure and production technology thereof |
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| CN109305763B (en) * | 2018-08-30 | 2021-07-23 | 望美实业集团有限公司 | High-transmittance single-silver low-emissivity coated glass |
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| CN112679112A (en) * | 2020-12-11 | 2021-04-20 | 安徽凤阳玻璃有限公司 | Off-line high-transmittance clean-color low-radiation steel-coated glass and manufacturing method thereof |
| CN114735945A (en) * | 2022-04-15 | 2022-07-12 | 深圳南玻应用技术有限公司 | Composite glass and preparation method and application thereof |
| CN114735945B (en) * | 2022-04-15 | 2023-09-26 | 深圳南玻应用技术有限公司 | Composite glass and preparation method and application thereof |
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