CN101654333A - Off-line high transparent clean color low radiation coated glass and preparation method - Google Patents
Off-line high transparent clean color low radiation coated glass and preparation method Download PDFInfo
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- CN101654333A CN101654333A CN200910027352A CN200910027352A CN101654333A CN 101654333 A CN101654333 A CN 101654333A CN 200910027352 A CN200910027352 A CN 200910027352A CN 200910027352 A CN200910027352 A CN 200910027352A CN 101654333 A CN101654333 A CN 101654333A
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Abstract
The invention discloses an off-line high transparent clean color low radiation coated glass, comprising a glass base, and TiOx, ZnOx, NiCr, Ag, NiCrOx, ZnOx, and SiNx are sequentially arranged on theglass base; a preparation method of the off-line high transparent clean color low radiation coated glass comprises: arranging the basic vacuum of a dual-end off-line high vacuum magnetic control sputtering coating device to reach 10<3>Pa, and sequentially sputtering TiOx, ZnOx, NiCr, Ag, NiCrOx, ZnOx, and SiNx on the glass when the linear speed is 2m/min. the invention has the advantage that highpermeability of the film layer to natural light, ranging from 82.5% to 83%, can be simultaneously realized on the basis of realizing low radiation rate and low heat conductivity of the film layer.
Description
Technical field:
The present invention relates to a kind of glass and manufacture method thereof, particularly a kind of off-line high transparent clean color low radiation coated glass and manufacture method thereof.
Background technology:
Existing conventional clear glass is used very extensive, its transmission range just in time overlaps with the solar radiation SPECTRAL REGION, therefore, when seeing through visible light, infrared heat energy in the sunlight also can see through glass in a large number, and the heat energy of 3～5um middle-infrared band is by a large amount of absorptions, thermal radiation more than the wavelength 5um that heating installation is sent, simple glass can not directly see through but be close to fully and absorb, and by conduction, radiation reaches can heat passagely arrive outdoor with cross-ventilated mode, indoor temperature is reduced, in addition, simple glass can not shielding of ultraviolet, easily makes indoor furniture and fabric fading, also having a kind of off-line high transparent low radiation coated glass at present, is by tin Sn, silver Ag, different thickness metal compound layer that nickel chromium triangle NiCr and silicon Si or zinc Zn generate by both-end off-line high vacuum magnetron sputtering technique and metal level are formed.This rete has than high reflectance the infrared radiation of 2.5-25 mum wavelength scope, and still, this kind film system can only reach 78% to the transmitance of natural light is the highest, can not bring into play the high permeability of natural light and the double effects of heat-insulating and energy-saving.
Summary of the invention:
The objective of the invention is in order to overcome above deficiency, a kind of enough very strong obstruct infrared rays are provided, have good heat insulation effect, also can realize off-line high transparent clean color low radiation coated glass and the manufacture method thereof of the high permeability 82.5-83% of natural light simultaneously.
Purpose of the present invention is achieved through the following technical solutions: a kind of off-line high transparent clean color low radiation coated glass, comprise glass substrate, glass substrate is provided with and is provided with titanium oxide TiOx, zinc oxide ZnOx, metal nickel chromium triangle NiCr, argent Ag, oxidation nickel chromium triangle NiCrOx, zinc oxide ZnOx, silicon nitride SiNx successively.
A kind of preparation method of off-line high transparent clean color low radiation coated glass may further comprise the steps:
A: select 3～15mm glass substrate, cut into sheet glass, sheet glass is cleaned with cleaning machine by predetermined size;
B: the base vacuum of high vacuum magnetron sputtering film device is set to 10
3Pa, linear velocity is set to 2 meters/minute;
C: glass substrate is sent into coating chamber, and the power that sets gradually the first high vacuum magnetron sputtering film device is 28KW～32KW, the titanium oxide TiOx of sputter the first layer 25nm～35nm on glass substrate;
D: the power that the second high vacuum magnetron sputtering film device is set is 21KW～25KW, the zinc oxide ZnOx of sputter second layer 15nm～25nm on glass substrate;
E: the power that the 3rd high vacuum magnetron sputtering film device is set is 2KW～3KW, the metal nickel chromium triangle NiCr of the 3rd layer of 6nm～10nm of sputter on glass substrate;
F: the power that the 4th high vacuum magnetron sputtering film device is set is 4.5KW～5.5KW, the argent Ag of the 4th layer of 13nm～17nm of sputter on glass substrate;
G: the power that the 5th high vacuum magnetron sputtering film device is set is 3.5KW～4.5KW, the oxidation nickel chromium triangle NiCrOx of sputter layer 5 10nm～14nm on glass substrate;
H: the power that the 6th high vacuum magnetron sputtering film device is set is 10KW～14KW, the zinc oxide ZnOx of sputter layer 6 15nm～35nm on glass substrate;
I: the power that the 7th high vacuum magnetron sputtering film device is set is 71KW～75KW, the silicon nitride SiNx of sputter layer 7 50nm～60nm on glass substrate.
The present invention compared with prior art has the following advantages: on the basis of the low-E of realizing rete and low heat transfer performance, can realize the high permeability 82.5-83% of rete to natural light simultaneously.
Embodiment:
In order to deepen the understanding to invention, the invention will be further described below in conjunction with embodiment, and this embodiment only is used to explain the present invention, does not constitute the qualification to protection domain of the present invention.
A kind of embodiment of off-line high transparent clean color low radiation coated glass of the present invention is: off-line high transparent clean color low radiation coated glass is the silicon nitride SiNx of zinc oxide ZnOx, 50nm～60nm of oxidation nickel chromium triangle NiCrOx, 15nm～25nm of argent Ag, 10nm～14nm of metal nickel chromium triangle NiCr, 13nm～17nm of zinc oxide ZnOx, 6nm～10nm that is provided with titanium oxide TiOx, the 15nm～25nm of 25nm～35nm 3mm～15mm on glass successively.
The preparation method of off-line high transparent clean color low radiation coated glass may further comprise the steps:
A: select 3～15mm glass substrate, cut into sheet glass, sheet glass is cleaned with cleaning machine by predetermined size;
B: the base vacuum of high vacuum magnetron sputtering film device is set to 10
3Pa, linear velocity is set to 2 meters/minute;
C: glass substrate is sent into coating chamber, and the power that the first high vacuum magnetron sputtering film device is set is 28KW～32KW, the titanium oxide TiOx of sputter the first layer 25nm～35nm on glass substrate, and the thick more color relation that reaches of its thickness is dark more;
D: the power that the second high vacuum magnetron sputtering film device is set is 21KW～25KW, the zinc oxide ZnOx of sputter second layer 15nm～25nm on glass substrate;
E: the power that the 3rd high vacuum magnetron sputtering film device is set is 2KW～3KW, the metal nickel chromium triangle NiCr of the 3rd layer of 6nm～10nm of sputter on glass substrate;
F: the power that the 4th high vacuum magnetron sputtering film device is set is 4.5KW～5.5KW, and the argent Ag of the 4th layer of 13nm～17nm of sputter on glass substrate can make glass play low radiating effect;
G: the power that the 5th high vacuum magnetron sputtering film device is set is 3.5KW～4.5KW, the oxidation nickel chromium triangle NiCrOx of sputter layer 5 10nm～14nm on glass substrate, and Ag is not oxidized for the protection argent;
H: the power that the 6th high vacuum magnetron sputtering film device is set is 10KW～14KW, the zinc oxide ZnOx of sputter layer 6 15nm～35nm on glass substrate;
I: the power that the 7th high vacuum magnetron sputtering film device is set is 71KW～75KW, and the silicon nitride SiNx of sputter layer 7 50nm～60nm on glass substrate protects each layer material not by external environmental and corrosion.
The present invention has on the basis of the low-E of realizing rete and low heat transfer performance, can realize the advantage of rete to the high permeability 82.5-83% of natural light simultaneously.
Embodiment 1:
In both-end off-line high vacuum magnetron sputtering film device, make its base vacuum reach 10
3Pa, when linear velocity is 2 meters/minute, sputter successively on the 6mm glass substrate: the titanium oxide TiOx thickness of sputter when power is 30KW is 30nm, the zinc oxide ZnOx thickness of sputter when power is 23KW is 20nm, the metal nickel chromium triangle NiCr thickness of sputter when power is 2.5KW is 8nm, the argent Ag thickness of sputter when power is 5KW is 15nm, and the zinc oxide ZnOx thickness of sputter when power is 12KW is 20nm, and the silicon nitride SiNx thickness of sputter when power is 73KW is 55nm.The glass colour degree of depth of this thickness is moderate, and can not only infrared radiation reflecting, can also play the effect of heat-insulating and energy-saving, is 82.5%～83% to the high saturating rate of natural light.
Claims (5)
1, a kind of off-line high transparent clean color low radiation coated glass, comprise glass substrate, it is characterized in that: be provided with titanium oxide TiOx, zinc oxide ZnOx, metal nickel chromium triangle NiCr, argent Ag, oxidation nickel chromium triangle NiCrOx, zinc oxide ZnOx, silicon nitride SiNx on the described glass substrate successively.
2, according to the described off-line high transparent clean color low radiation coated glass of claim 1, it is characterized in that: the thickness of described glass substrate is 3mm～15mm, the thickness of described titanium oxide TiOx is 25nm～35nm, the thickness of described zinc oxide ZnOx is 15nm～25nm, the thickness of described metal nickel chromium triangle NiCr is 6nm～10nm, the thickness of described argent Ag is 13nm～17nm, the thickness of described oxidation nickel chromium triangle NiCrOx is 10nm～14nm, the thickness of described zinc oxide ZnOx is 15nm～25nm, and the thickness of described silicon nitride SiNx is 50nm～60nm.
3, according to claim 1 or 2 described off-line high transparent clean color low radiation coated glass, it is characterized in that: the thickness of described glass substrate is 6mm, the thickness of described titanium oxide TiOx is 30nm, the thickness of described zinc oxide ZnOx is 20nm, the thickness of described metal nickel chromium triangle NiCr is 8nm, and the thickness of described argent Ag is 15nm, and the thickness of described oxidation nickel chromium triangle NiCrOx is 12nm, the thickness of described zinc oxide ZnOx is 20nm, and the thickness of described silicon nitride SiNx is 55nm.
4, a kind of preparation method of off-line high transparent clean color low radiation coated glass is characterized in that: may further comprise the steps:
A: select 3～15mm glass substrate, cut into sheet glass, sheet glass is cleaned with cleaning machine by predetermined size;
B: the base vacuum of high vacuum magnetron sputtering film device is set to 10
3Pa, linear velocity is set to 2 meters/minute;
C: glass substrate is sent into coating chamber, and the power that sets gradually the first high vacuum magnetron sputtering film device is 28KW～32KW, the titanium oxide TiOx of sputter the first layer 25nm～35nm on glass substrate;
D: the power that the second high vacuum magnetron sputtering film device is set is 21KW～25KW, the zinc oxide ZnOx of sputter second layer 15nm～25nm on glass substrate;
E: the power that the 3rd high vacuum magnetron sputtering film device is set is 2KW～3KW, the metal nickel chromium triangle NiCr of the 3rd layer of 6nm～10nm of sputter on glass substrate;
F: the power that the 4th high vacuum magnetron sputtering film device is set is 4.5KW～5.5KW, the argent Ag of the 4th layer of 13nm～17nm of sputter on glass substrate;
G: the power that the 5th high vacuum magnetron sputtering film device is set is 3.5KW～4.5KW, the oxidation nickel chromium triangle NiCrOx of sputter layer 5 10nm～14nm on glass substrate;
H: the power that the 6th high vacuum magnetron sputtering film device is set is 10KW～14KW, the zinc oxide ZnOx of sputter layer 6 15nm～35nm on glass substrate;
I: the power that the 7th high vacuum magnetron sputtering film device is set is 71KW～75KW, the silicon nitride SiNx of sputter layer 7 50nm～60nm on glass substrate.
5, according to the preparation method of the described off-line pale green low radiation coated glass of claim 4, it is characterized in that:
In the described steps A, the thickness of glass substrate is 6mm;
Among the described step C, the power that the first high vacuum magnetron sputtering film device is set is 30KW, the titanium oxide TiOx of sputter the first layer 30nm on glass substrate;
Among the described step D, the power that the second high vacuum magnetron sputtering film device is set is 23KW, the zinc oxide ZnOx of sputter second layer 20nm on glass substrate;
In the described step e, the power that the 3rd high vacuum magnetron sputtering film device is set is 2.5KW, the metal nickel chromium triangle NiCr of the 3rd layer of 8nm of sputter on glass substrate;
In the described step F, the power that the 4th high vacuum magnetron sputtering film device is set is 5KW, the argent Ag of the 4th layer of 15nm of sputter on glass substrate;
Among the described step G, the power that the 5th high vacuum magnetron sputtering film device is set is 4KW, the oxidation nickel chromium triangle NiCrOx of sputter layer 5 12nm on glass substrate;
Among the described step H, the power that the 6th high vacuum magnetron sputtering film device is set is 12KW, the zinc oxide ZnOx of sputter layer 6 20nm on glass substrate;
Among the described step I, the power that the 7th high vacuum magnetron sputtering film device is set is 73KW, the silicon nitride SiNx of sputter layer 7 55nm on glass substrate.
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| CN200910027352A CN101654333A (en) | 2009-05-31 | 2009-05-31 | Off-line high transparent clean color low radiation coated glass and preparation method |
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| CN200910027352A CN101654333A (en) | 2009-05-31 | 2009-05-31 | Off-line high transparent clean color low radiation coated glass and preparation method |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102092960A (en) * | 2010-12-17 | 2011-06-15 | 华中科技大学 | Low emissivity glass |
| CN102501448A (en) * | 2011-11-07 | 2012-06-20 | 中山市格兰特实业有限公司火炬分公司 | Single-silver LOW-E (low-emission) glass |
| CN102615877A (en) * | 2012-03-29 | 2012-08-01 | 江苏奥蓝工程玻璃有限公司 | Low-radiation coated glass capable of being toughened off line and production method thereof |
| CN102617048A (en) * | 2012-03-22 | 2012-08-01 | 联海（国际）玻璃技术有限公司 | Emerald green film-coated glass and manufacturing method thereof |
| WO2012116518A1 (en) | 2011-03-01 | 2012-09-07 | 苏州大学 | Low emissivity thin film, low emissivity coated glass and producing method thereof |
| CN105731826A (en) * | 2015-11-17 | 2016-07-06 | 北京金晶智慧有限公司 | Neutral transmittance color double-silver low radiation glass and preparation method thereof |
| CN108264243A (en) * | 2018-04-16 | 2018-07-10 | 四川南玻节能玻璃有限公司 | A kind of low radiation coated glass |
| CN111517667A (en) * | 2020-06-02 | 2020-08-11 | 江苏奥蓝工程玻璃有限公司 | One-way perspective glass and preparation method thereof |
| CN114163142A (en) * | 2021-11-23 | 2022-03-11 | 太仓耀华玻璃有限公司 | Magnetron sputtering single-silver LOW-E toughened glass and manufacturing process thereof |
-
2009
- 2009-05-31 CN CN200910027352A patent/CN101654333A/en active Pending
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102092960A (en) * | 2010-12-17 | 2011-06-15 | 华中科技大学 | Low emissivity glass |
| WO2012116518A1 (en) | 2011-03-01 | 2012-09-07 | 苏州大学 | Low emissivity thin film, low emissivity coated glass and producing method thereof |
| CN102501448A (en) * | 2011-11-07 | 2012-06-20 | 中山市格兰特实业有限公司火炬分公司 | Single-silver LOW-E (low-emission) glass |
| CN102617048B (en) * | 2012-03-22 | 2013-12-25 | 联海（国际）玻璃技术有限公司 | Emerald green film-coated glass and manufacturing method thereof |
| CN102617048A (en) * | 2012-03-22 | 2012-08-01 | 联海（国际）玻璃技术有限公司 | Emerald green film-coated glass and manufacturing method thereof |
| CN102615877B (en) * | 2012-03-29 | 2015-06-10 | 江苏奥蓝工程玻璃有限公司 | Low-radiation coated glass capable of being toughened off line and production method thereof |
| CN102615877A (en) * | 2012-03-29 | 2012-08-01 | 江苏奥蓝工程玻璃有限公司 | Low-radiation coated glass capable of being toughened off line and production method thereof |
| CN105731826A (en) * | 2015-11-17 | 2016-07-06 | 北京金晶智慧有限公司 | Neutral transmittance color double-silver low radiation glass and preparation method thereof |
| CN108264243A (en) * | 2018-04-16 | 2018-07-10 | 四川南玻节能玻璃有限公司 | A kind of low radiation coated glass |
| CN108264243B (en) * | 2018-04-16 | 2023-10-03 | 四川南玻节能玻璃有限公司 | Low-emissivity coated glass |
| CN111517667A (en) * | 2020-06-02 | 2020-08-11 | 江苏奥蓝工程玻璃有限公司 | One-way perspective glass and preparation method thereof |
| CN111517667B (en) * | 2020-06-02 | 2022-03-25 | 江苏奥蓝工程玻璃有限公司 | One-way perspective glass and preparation method thereof |
| CN114163142A (en) * | 2021-11-23 | 2022-03-11 | 太仓耀华玻璃有限公司 | Magnetron sputtering single-silver LOW-E toughened glass and manufacturing process thereof |
| CN114163142B (en) * | 2021-11-23 | 2024-02-06 | 太仓耀华玻璃有限公司 | Magnetron sputtering single-silver LOW-E toughened glass and manufacturing process thereof |
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Application publication date: 20100224 |