CN102555354A - Film-coating product - Google Patents
Film-coating product Download PDFInfo
- Publication number
- CN102555354A CN102555354A CN2011104378966A CN201110437896A CN102555354A CN 102555354 A CN102555354 A CN 102555354A CN 2011104378966 A CN2011104378966 A CN 2011104378966A CN 201110437896 A CN201110437896 A CN 201110437896A CN 102555354 A CN102555354 A CN 102555354A
- Authority
- CN
- China
- Prior art keywords
- layer
- rete
- film
- plated film
- silver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
The invention discloses a film-coating product, in particular relates to film-coating glass capable of being performed with high-temperature thermal treatment. Materials for reflecting infrared film layers of the film-coating product is changed from traditional pure silver materials into alloy materials of silver and niobium, an Agl-aNba film layer deposited by the alloy materials of silver and niobium replaces a pure silver film layer to serve as a functional layer of the film-coating product, stability of films in high-temperature thermal treatment is improved, and simultaneously chemical stability of a silver layer is improved and mechanical performance of the silver layer is improved. The film-coating product has high visible light transmission rate, good mechanical resistance and chemical stability. The film-coating product is mainly used in automobile windshields.
Description
[technical field]
The present invention relates to a kind of plated film product, refer more particularly to a kind of coated glass that carries out high-temperature heat treatment.
[background technology]
Common glass does not have heat insulating function; The enhancing of Along with people's awareness of saving energy; Now a lot of buildings or automobile have all used low radiation coated glass or heat reflection coated glass, and these coated glasses can play good effect of heat insulation, and the comfort level in interior of building or the car is increased.
Chinese patent CN201020503119.8 discloses a kind of single silver low radiation glass, and this list silver low radiation glass adopts the AgCu layer to substitute traditional fine silver rete as functional layer, makes this product have characteristics such as antiradar reflectivity, low-E.The silver alloy of the disclosed employing cupric of this patent has good infrared reflection function as infrared reflecting layer, can make rete produce the danger of erythema defective in follow-up process but contain copper in the silver alloy.For the vehicle glass front windshield, the visible light transmissivity of the disclosed single silver low radiation glass of this patent is relatively low, and its visible light transmissivity is less than 53%.
Produce the off-line low radiation coated glass now; Mostly be to use the functional film layer of fine silver as reflected infrared ray; Because pure metallic silver makes easily the performance degradation of silver with the sulfide gas reaction in air, silver is oxidized easily and lose low radiation functions in high-temperature heat treatment process, therefore; The making of present low radiation coated glass all is to use the multilayer dielectricity layer to protect silver layer, and bigger variation takes place a lot of low-radiation film systems performance after high-temperature heat treatment.
[summary of the invention]
The objective of the invention is in order to solve the deficiency of above low-radiation film, use the alloy material of silver, two kinds of metals of niobium to replace the functional film layer material of fine silver material as low-radiation film.Nb in this alloy material can stop the interaction of silver-colored with contiguous oxide skin(coating), improves the stability that film ties up to high-temperature heat treatment, can improve the chemical stability of silver layer simultaneously again and improve its mechanical performance.
The present invention is directed to the unstability of silver film in the existing low-emission coated product; With the functional film layer material of the high-purity ag material of the binary metal alloy replacing of niobium silver-doped, make low-emission coated product of the present invention have low radiance, low face resistance, high visible light transmissivity, favorable mechanical durability and chemical stability as low-radiation film.
The preparation of a kind of low-emission coated product of the present invention is carried out as follows:
1) growth bottom dielectric membranous layer on glass substrate, the bottom dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 20～50nm.
2) Ag of grow doping niobium on the bottom dielectric membranous layer
1-aNb
aRete, 0＜a≤15wt% wherein, preferably 1wt%≤a≤10wt% is more preferably 2wt%≤a≤7wt%, and its thicknesses of layers is 6～20nm.
3) at the Ag of doping niobium
1-aNb
aGrowth first sacrifice layer on the rete, first sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
4) growth top layer dielectric membranous layer on first sacrifice layer; The top layer dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiOx, its thicknesses of layers are 10～35nm.
5) growth protecting layer on the top layer dielectric membranous layer, protective layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiNOx, its thicknesses of layers are 10～25nm.
6) at last low radiation coated glass is made hollow or laminated glass.
The preparation of the low-emission coated product of another kind of the present invention is carried out as follows:
1) growth bottom dielectric membranous layer on glass substrate, the bottom dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 20～50nm.
2) Ag of grow doping niobium on the bottom dielectric membranous layer
1-aNb
aRete, 0＜a≤15wt% wherein, preferably 1wt%≤a≤10wt% is more preferably 2wt%≤a≤7wt%, and its thicknesses of layers is 6～20nm.
3) at the Ag of doping niobium
1-aNb
aGrowth first sacrifice layer on the rete, first sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
4) growth second dielectric membranous layer on first sacrifice layer, second dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 40～90nm.
5) Ag of grow doping niobium on second dielectric membranous layer
1-aNb
aRete, 0＜a≤15wt% wherein, preferably 1wt%≤a≤10wt% is more preferably 2wt%≤a≤7wt%, and its thicknesses of layers is 6～20nm.
6) at the Ag of doping niobium
1-aNb
aGrowth second sacrifice layer on the rete, second sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
7) deposited top layer dielectric membranous layer on second sacrifice layer; The top layer dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiOx, its thicknesses of layers are 10～35nm.
8) growth protecting layer on the top layer dielectric membranous layer, protective layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiNOx, its thicknesses of layers are 10～25nm.
9) at last low radiation coated glass is made hollow or laminated glass.
The preparation of the third low-emission coated product of the present invention is carried out as follows:
1) growth bottom dielectric membranous layer on glass substrate, the bottom dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 20～50nm.
2) Ag of grow doping niobium on the bottom dielectric membranous layer
1-aNb
aRete, 0＜a≤15wt% wherein, preferably 1wt%≤a≤10wt% is more preferably 2wt%≤a≤7wt%, and its thicknesses of layers is 6～20nm.
3) at the Ag of doping niobium
1-aNb
aGrowth first sacrifice layer on the rete, first sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
4) growth second dielectric membranous layer on first sacrifice layer, second dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 40～90nm.
5) Ag of grow doping niobium on second dielectric membranous layer
1-aNb
aRete, 0＜a≤15wt% wherein, preferably 1wt%≤a≤10wt% is more preferably 2wt%≤a≤7wt%, and its thicknesses of layers is 6～20nm.
6) at the Ag of doping niobium
1-aNb
aGrowth second sacrifice layer on the rete, second sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
7) deposition the 3rd dielectric membranous layer on second sacrifice layer, the 3rd dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 40～90nm.
8) Ag of grow doping niobium on the 3rd dielectric membranous layer
1-aNb
aRete, 0＜a≤15wt% wherein, preferably 1wt%≤a≤10wt% is more preferably 2wt%≤a≤7wt%, and its thicknesses of layers is 6～20nm.
9) at the Ag of doping niobium
1-aNb
aGrowth regulation three sacrifice layers on the rete, the 3rd sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
10) deposited top layer dielectric membranous layer on the 3rd sacrifice layer; The top layer dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiOx, its thicknesses of layers are 10～35nm.
11) growth protecting layer on the top layer dielectric membranous layer, protective layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiNOx, its thicknesses of layers are 10～25nm.
12) at last low radiation coated glass is made hollow or laminated glass.
In above-mentioned film structure, can be at the Ag of dopant deposition niobium
1-aNb
aDeposit one deck sacrifice layer before the rete earlier.
Compared with prior art the present invention has the following advantages:
The silver-colored niobium alloy that is employed in niobium-doped formation in the fine silver is exposed to the corrosion that receives pernicious gas when perhaps heat-treating in the atmosphere as the target depositional coating because the existence of niobium can alleviate rete, and metal niobium also has the function of reflected infrared ray simultaneously.Adopt silver-colored niobium binary alloy material more cheap, for the large-scale production positive role that reduced cost than fine silver material.
Niobium is incorporated into the whole resistance to elevated temperatures that can improve silver alloy in the silver, the mechanical property of rete is greatly improved; Simultaneously niobium has excellent corrosion resisting performance, can improve the chemical stability of silver alloy behind it and the silver-colored component alloy.
Silver is unstable on thermodynamics, when oxygen exists, is prone to generated silver oxide by the dioxygen oxidation in the atmosphere.Coated glass is carried out high-temperature heat treatment, diffuse into the Ag of doping niobium when aerobic
1-aNb
aDuring rete, niobium can react with oxygen earlier, thereby avoids the oxidized function of rete that makes of silver to worsen.
Because the atomic radius of niobium is 1.45 dusts, the atomic radius of silver is 1.44 dusts, and niobium is very nearly the same with the atomic radius of silver, and the silver that mixes with niobium can make it when rete deposits, have less lattice defect.
[specific embodiment]
Define earlier at this: 1) " Ag
1-aNb
a" be illustrated in doping Nb element among the pure Ag, wherein a representes the weight percent content of element nb, in whole specification, all uses " wt% " expression.2) " baking is curved heats " is meant that coated glass stands the high-temperature heat treatment more than 620 ℃, and under this high temperature, stops at least 2～5min.3) value of x is 0＜x≤2 among SnOx, TiOx, ZrOx and the SiOx; The value of x is 0＜x≤1 among the ZnOx; The value of x is 0＜x≤4/3 among the SiNx; The value of n is 0＜n≤x+2y among ZnxSnyOn and the ZnxTiyOn, wherein x and y get arbitrarily on the occasion of; The value of x is 0＜x≤5/2 among the NbOx; The value of x is 0＜x≤1/2 among the SiNOx; The value of x is 0＜x≤3.5 among the NiCrOx.In the middle of this entire chapter invention, all use above method for expressing.
Below in conjunction with specific embodiment the present invention is elaborated.
Below relate to embodiment and Comparative Examples, all on the air surface of the transparent float glass former (being labeled as glass substrate 2.0C) clean, that thickness is 2.0mm, plate each rete successively.
After the baking of monolithic glass substrate film coating is curved; The outermost coatings of coated glass substrate is the outermost protective layer; The outermost protective layer outwards successively with thickness be the PVB of 0.76mm, in addition a slice not have the thickness of plated film be that the clear float glass substrate of 2.0mm is laminated together, form low-emission coated laminated glass.And the low-emission coated laminated glass that forms need be through knocking experiment---one of most important physical property test, this experiment are the detection methods of weighing adhesive property between rete and PVB, the glass.Solutia Europe s.a. company is divided into 9 grades with the laminated glass standard of knocking.According to knock the back cullet be bonded at amount on the PVB from few to many, the required standard grade is the 1st grade to the 9th grade.Satisfying the grade of knocking that automobile laminated glass needs that GB GB9656-2003 requires meet is: 3rd level≤knock grade≤6th grade.
Knocking experimental procedure is:
A. downcut the test film of two 100 * 300mm from whole low-emission coated laminated glass; B. two samples being placed on-18 ℃ ± 2 ℃ preserved 2 hours down at least; C. sample is taken out from above-mentioned low temperature and placed 1-2 minute at normal temperatures, just be placed on the sample case and knock with iron hammer; D. knock the back sample allow to return to room temperature again with standard sample of photo contrast, but after will waiting until the condensed water volatilization; E. the conscientious and standard sample of photo comparison with sample just can be judged the grade of knocking experiment.
Embodiment 1
On glass substrate 2.0C, plate the ZnSnO that thickness is 42nm successively
2Rete; Thickness is the Ag of 12nm
1-aNb
aRete, wherein a=15wt%; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 22nm
2Rete; Thickness is the Si of 18nm
3N
4Rete is as protective layer, but obtains the heat treatment low radiation coated glass.
Optical performance test
Before heat treatment, the radiance of monolithic low radiation coated glass is 0.055, visible light transmissivity 80.6%; The curved heating of baking back is detected, and the radiance of monolithic low radiation coated glass is 0.037, and visible light transmissivity is 82.7%, and face resistance is 11.2 Ω/square; Wash, close the low-emission coated laminated glass that obtains after the operation such as sheet then, through detecting, its visible light transmissivity is 76.3%, the direct transmitance 48.7% of solar energy.
Physical property
According to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 2
On glass substrate 2.0C, plate the ZnSnO that thickness is 37nm successively
1.8Rete; Thickness is the Ag of 10nm
1-aNb
aRete, wherein a=2.5wt%; Thickness is the Ti rete of 2nm; Thickness is the ZnSnO of 76nm
1.8Rete; Thickness is the Ag of 12nm
1-aNb
aRete, wherein a=2.5wt%; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 28nm
1.8Rete; Thickness is the TiO of 10nm
2Rete is as protective layer, but obtains the heat treatment low radiation coated glass.
Optical performance test
Before heat treatment, the radiance of monolithic low radiation coated glass is 0.041, visible light transmissivity 78.8%; The curved heating of baking back is detected, and the radiance of monolithic low radiation coated glass is 0.032, and visible light transmissivity is 80.4%, and face resistance is 4.1 Ω/square; Wash, close the low-emission coated laminated glass that obtains after the operation such as sheet then, through detecting, its visible light transmissivity is 75.1%, the direct transmitance 41.6% of solar energy.
Physical property
According to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 3
On glass substrate 2.0C, plate the ZnSnO that thickness is 34nm successively
2.3Rete; Thickness is the Ag of 12nm
1-aNb
aRete, wherein a=0.05wt%; Thickness is the Ti rete of 2nm; Thickness is the ZnSnO of 72nm
2.3Rete; Thickness is the Ag of 10nm
1-aNb
aRete, wherein a=0.05wt%; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 68nm
2.3Rete; Thickness is the Ag of 9nm
1-aNb
aRete, wherein a=0.05wt%; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 22nm
2.3Rete; Thickness is the ZrO of 12nm
2Rete is as protective layer, but obtains the heat treatment low radiation coated glass.
Optical performance test
Before heat treatment, the radiance of monolithic low radiation coated glass is 0.022, visible light transmissivity 76.1%; The curved heating of baking back is detected, and the radiance of monolithic low radiation coated glass is 0.016, and visible light transmissivity is 78.5%, and face resistance is 2.1 Ω/square; Wash, close the low-emission coated laminated glass that obtains after the operation such as sheet then, through detecting, its visible light transmissivity is 70.5%, the direct transmitance 36.8% of solar energy.
Physical property
According to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 4 (doing contrast) with example 2
On glass substrate 2.0C, plate the ZnSnO that thickness is 37nm successively
1.8Rete; Thickness is the Ag rete of 10nm; Thickness is the Ti rete of 2nm; Thickness is the ZnSnO of 76nm
1.8Rete; Thickness is the Ag rete of 12nm; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 28nm
1.8Rete; Thickness is the TiO of 10nm
2Rete is as protective layer, but obtains the heat treatment low radiation coated glass.
Optical performance test
Before heat treatment, the radiance of monolithic low radiation coated glass is 0.044, visible light transmissivity 78.4%; The curved heating of baking back is detected, and the radiance of monolithic low radiation coated glass is 0.031, and visible light transmissivity is 80%, and face resistance is 4.5 Ω/square; Wash, close the low-emission coated laminated glass that obtains after the operation such as sheet then, through detecting, its visible light transmissivity is 75.1%, the direct transmitance 42.8% of solar energy.
Physical property
According to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 5
The coated glass that embodiment 2 is made carries out high-temperature heat treatment, makes it in 620 ℃ baking and bending furnace, stop 12min, and the radiance of testing the monolithic low radiation coated glass then is 0.044, and face resistance is 5.1 Ω/square.
Through closing the low-emission coated laminated glass that obtains after the operations such as sheet according to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands with this monolithic low radiation coated glass.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 6
The coated glass that embodiment 4 is made carries out high-temperature heat treatment, makes it in 620 ℃ baking and bending furnace, stop 12min, and the radiance of testing the monolithic low radiation coated glass then is 0.14, and face resistance is 22.8 Ω/square.
Through closing the low-emission coated laminated glass that obtains after the operations such as sheet according to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can not meet the demands with this monolithic low radiation coated glass.Through detecting, knocking experimental grade is 2 grades, and the adhesive force variation of rete and glass and PVB is described.
Embodiment 5 can find out with the comparison of embodiment 6: the face resistance of embodiment 5 and the face resistance of embodiment 2 are more or less the same; And the face resistance of the face resistance ratio embodiment 4 of embodiment 6 has increased more than one times, explains through its silver film after the heat treatment of embodiment 6 to receive destructions such as oxidation to a certain degree; Say from another point of view, adopt Ag
1-aNb
aRete instead of pure Ag rete can improve the resistance to elevated temperatures of whole rete, anti-mechanical performance and chemical stability.
Claims (11)
1. a plated film product is characterized in that: contain one deck Ag at least in this plated film product film structure
1-aNb
aFunctional layer.
2. plated film product according to claim 1 is characterized in that: contain one deck Ag in this plated film product film structure
1-aNb
aFunctional layer is followed successively by bottom dielectric layer, Ag outward from glass baseplate surface
1-aNb
aRete, first sacrifice layer, top layer dielectric layer, protective layer.
3. plated film product according to claim 1 is characterized in that: contain two-layer Ag in this plated film product film structure
1-aNb
aFunctional layer is followed successively by bottom dielectric layer, Ag outward from glass baseplate surface
1-aNb
aRete, first sacrifice layer, second dielectric layer, Ag
1-aNb
aRete, second sacrifice layer, top layer dielectric layer, protective layer.
4. plated film product according to claim 1 is characterized in that: contain three layers of Ag in this plated film product film structure
1-aNb
aFunctional layer is followed successively by bottom dielectric layer, Ag outward from glass baseplate surface
1-aNb
aRete, first sacrifice layer, second dielectric layer, Ag
1-aNb
aRete, second sacrifice layer, the 3rd dielectric layer, Ag
1-aNb
aRete, the 3rd sacrifice layer, top layer dielectric layer, protective layer.
5. according to claim 1,2,3 or 4 described plated film products, it is characterized in that: Ag
1-aNb
aIn the rete, the content of Nb is 0＜a≤15wt%, and this thicknesses of layers is 6～20nm.
6. according to claim 2,3 or 4 described plated film products; It is characterized in that: the bottom dielectric layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, the bottom dielectric layer thickness is 20～50nm.
7. according to claim 2,3 or 4 described plated film products, it is characterized in that: first sacrifice layer, second sacrifice layer and the 3rd sacrifice layer are selected following at least a material for use: NiCr, Ti, Nb, NiCrOx, Sb, sacrificial layer thickness is 1～5nm.
8. according to claim 3 or 4 described plated film products; It is characterized in that: second dielectric layer and the 3rd dielectric layer are selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, second dielectric layer and the 3rd dielectric layer thickness are 40～90nm.
9. according to claim 2,3 or 4 described plated film products; It is characterized in that: the top layer dielectric layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiOx, the top layer dielectric layer thickness is 10～35nm.
10. according to claim 2,3 or 4 described plated film products; It is characterized in that: protective layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiNOx, protective layer thickness are 5～25nm.
11. according to claim 1,2,3 or 4 described plated film products, it is characterized in that: this plated film product can be made into laminated glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011104378966A CN102555354A (en) | 2011-12-23 | 2011-12-23 | Film-coating product |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011104378966A CN102555354A (en) | 2011-12-23 | 2011-12-23 | Film-coating product |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102555354A true CN102555354A (en) | 2012-07-11 |
Family
ID=46402592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011104378966A Pending CN102555354A (en) | 2011-12-23 | 2011-12-23 | Film-coating product |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102555354A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103073196A (en) * | 2013-02-08 | 2013-05-01 | 福耀玻璃工业集团股份有限公司 | Low-emissivity coated glass and laminated glass product thereof |
| CN106564242A (en) * | 2016-11-07 | 2017-04-19 | 福耀玻璃工业集团股份有限公司 | Low-radiation coated glass comprising two infrared reflecting layers and interlayer glass product of low-radiation coated glass |
| CN111362590A (en) * | 2020-03-25 | 2020-07-03 | 四川猛犸半导体科技有限公司 | Thin film device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1971731A (en) * | 2005-10-31 | 2007-05-30 | 索尼株式会社 | Optical recording medium |
| CN101497501A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass |
-
2011
- 2011-12-23 CN CN2011104378966A patent/CN102555354A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1971731A (en) * | 2005-10-31 | 2007-05-30 | 索尼株式会社 | Optical recording medium |
| CN101497501A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103073196A (en) * | 2013-02-08 | 2013-05-01 | 福耀玻璃工业集团股份有限公司 | Low-emissivity coated glass and laminated glass product thereof |
| CN103073196B (en) * | 2013-02-08 | 2015-12-02 | 福耀玻璃工业集团股份有限公司 | A kind of low radiation coated glass and laminated glass articles thereof |
| CN106564242A (en) * | 2016-11-07 | 2017-04-19 | 福耀玻璃工业集团股份有限公司 | Low-radiation coated glass comprising two infrared reflecting layers and interlayer glass product of low-radiation coated glass |
| CN106564242B (en) * | 2016-11-07 | 2018-08-07 | 福耀玻璃工业集团股份有限公司 | Low radiation coated glass and its laminated glass articles containing two layers of infrared reflecting layer |
| CN111362590A (en) * | 2020-03-25 | 2020-07-03 | 四川猛犸半导体科技有限公司 | Thin film device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11192821B2 (en) | Glass sheet coated with a stack of thin layers and with an enamel layer | |
| CN102786231B (en) | Low-eradiation coated glass available for heat treatment and sandwich glass products thereof | |
| JP6328122B2 (en) | Low emissivity coated products with low visible light transmission | |
| CN202170300U (en) | Low-radiation coated glass | |
| US10025010B2 (en) | Solar control glazing with low solar factor | |
| CN102807330B (en) | Low-emissivity film-coated glass high in infrared reflection and sandwich glass product thereof | |
| JP5830011B2 (en) | Solar control coating with high solar thermal gain factor | |
| US9126862B2 (en) | Heat-treatable low-emissivity glass and a production method therefor | |
| JP6684212B2 (en) | Heat-treatable coated glass plate | |
| JP6408565B2 (en) | Low emissivity and anti-sun glazing | |
| US20170059753A1 (en) | Solar control coating with enhanced solar control performance | |
| CN102918434A (en) | Solar control glazing | |
| KR102356221B1 (en) | Substrate coated with a stack of functional layers having improved mechanical properties | |
| WO2014191474A2 (en) | Low-emissivity and anti-solar glazing | |
| EP3004015A2 (en) | Low-emissivity glazing | |
| KR20080109899A (en) | Coated glass pane | |
| EP4058417B1 (en) | Coated glass substrate | |
| KR20190113966A (en) | Coated articles with Roy coatings with doped silver IR reflecting layer (s) | |
| CN102529212A (en) | Coated product | |
| CN102350834B (en) | Low-radiation coated glass | |
| CN103396013B (en) | Off-line high-transmittance solid-color low-radiation toughened coated glass and manufacturing method thereof | |
| CN201458971U (en) | Contour-bendable low-radiation coated glass | |
| CN102555354A (en) | Film-coating product | |
| CN102515562A (en) | Coated product | |
| KR101756581B1 (en) | Low-emissivity GLASS |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120711 |