CN215250440U

CN215250440U - Temperable near-infrared reflection type low-emissivity glass

Info

Publication number: CN215250440U
Application number: CN202023149820.7U
Authority: CN
Inventors: 武爱平
Original assignee: Kaixu Nanjing Photoelectric Technology Co ltd
Current assignee: Kaixu Nanjing Photoelectric Technology Co ltd
Priority date: 2020-12-23
Filing date: 2020-12-23
Publication date: 2021-12-21
Anticipated expiration: 2030-12-23

Abstract

The utility model provides a but low radiation glass of near infrared reflection formula of tempering, concretely relates to car and building coated glass production field, including the colored float glass substrate of body, be equipped with fine and close silica barrier layer, functional layer, fine and close silica protective layer on the float glass substrate, the functional layer is for realizing near infrared reflection's low radiation coating. The utility model overcomes the defect of online low radiation, improve the reflectivity of the near infrared ray of the online low radiation glass by more than one time, and contribute to the low radiation glass to enter the automobile energy-saving glass market.

Description

Temperable near-infrared reflection type low-emissivity glass

Technical Field

The utility model belongs to car and building coated glass production field, concretely relates to but low-emissivity glass of tempering near infrared reflection-type.

Background

In recent years, automobiles have increasingly demanded functional glass, including energy-saving glass, heat-insulating glass, color-changing glass, radiation-proof glass and the like. Two major types of functional glass are bulk-colored float glass and coated glass, and coated glass realizes the specific functions of the float glass by coating on the surface of the float glass, such as low-emissivity and solar control glass, and the coated glass plays an increasingly important role due to superior energy-saving performance. Especially, low-emissivity glass is the first choice for building energy-saving glass, and on-line low-emissivity glass also begins to permeate into automobile glass. However, the online low-emissivity glass has low reflectivity and absorptivity to ultraviolet rays and near infrared rays in sunlight, and has small contribution to heat insulation and energy conservation of automobile glass, so that the online low-emissivity glass is limited in practical use. Chinese patent CN 103864313a discloses a heat-insulating glass with an infrared reflective multilayer structure and a manufacturing method thereof, which comprises a multilayer structure, a silica barrier layer, a protective layer and a composite tungsten oxide heat-insulating layer, so that the glass has a good heat-insulating function. However, the wet coating barrier layer adopted in the patent cannot solve the problem of failure of the heat insulation function when toughening treatment is carried out at a high temperature of more than 700 ℃ due to poor compactness;

the utility model aims at overcoming the defect of online low radiation, improving the reflectivity of the near infrared ray of the online low radiation glass by more than one time, and helping the low radiation glass to enter the automobile energy-saving glass market.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a near infrared reflection type low emissivity glass that can temper is applied to toughened glass coating film with the thermal-insulated predecessor that has near infrared reflection and low radiation function.

The utility model provides a following technical scheme:

the temperable near infrared ray reflection type low-radiation glass comprises a float glass substrate colored in a body, wherein a dense silicon dioxide barrier layer, a functional layer and a dense silicon dioxide protective layer are arranged on the float glass substrate, and the functional layer is a low-radiation coating capable of realizing near infrared ray reflection.

Further, the bulk-colored float glass substrate is a commercially available colored glass produced by adding a colorant having heat absorbing property to a raw material, and the float glass substrate has a visible light transmittance of 40% to 80%.

Furthermore, the dense silicon dioxide barrier layer and the dense silicon dioxide protective layer are both obtained by adopting the same chemical vapor deposition process CVD, and the thickness of the dense silicon dioxide barrier layer is 600 nm-800 nm; the thickness of the dense silicon dioxide protective layer is 300 nm-500 nm.

Furthermore, the functional layer is made of a commercially available precursor liquid with infrared reflection and low radiation functions, can reflect infrared rays with the wavelength of more than 800nm, and has the near infrared reflectivity of more than 30%.

Further, the functional layer is obtained by spraying the precursor liquid on the barrier layer through an ultrasonic sprayer, and the frequency range of the ultrasonic sprayer is 60 KHz-130 KHz.

Further, the functional layer needs to be reduced at high temperature to enable precursors forming the functional layer to react, crack and change phase, which specifically comprises the following steps: mixing 10% of hydrogen and 90% of argon, injecting the mixture into a high-temperature furnace, pushing the toughened near-infrared reflection type low-emissivity glass into the high-temperature furnace, gradually heating to 500-550 ℃, keeping the temperature for 10-20 minutes, then slowly cooling, and cooling to 60 ℃ after 10-30 minutes.

Preferably, when the glass is subjected to hot bending or tempering, 10% of hydrogen and 90% of argon are mixed and then injected into a hot bending furnace or a tempering furnace, and the hot bending or tempering of the glass is completed under the protection of mixed atmosphere.

The utility model has the advantages that:

the application aims at avoiding structural function failure by high-temperature processing, and a dense barrier layer of a chemical deposition (CVD) layer is deposited on a glass substrate so as to improve the stability of the glass surface and avoid the high-temperature sodium permeation effect from damaging the lattice structure arrangement in a functional layer to cause the functional layer to fail. The functional layer is a low-radiation coating with a high near infrared ray reflection function. And depositing a compact protective layer by adopting a CVD method after the functional layer to prevent the functional layer from being oxidized during high-temperature processing. The multilayer structure performance can be optimized by adjusting the density and thickness of the barrier layer, the functional layer and the protective layer.

Drawings

The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description serve to explain the invention and not to limit the invention. In the drawings:

fig. 1 is a structural diagram of the present invention.

Detailed Description

As shown in fig. 1, a Chemical Vapor Deposition (CVD) process is used to replace wet coating, and a thick and dense silicon dioxide barrier layer with a thickness of more than 600nm and a protective layer with a thickness of more than 300nm are deposited on a glass substrate, so that sodium permeation and oxidation during high-temperature glass tempering treatment at a temperature of more than 700 ℃ can be well blocked, and functional layer failure or performance degradation caused by the sodium permeation and oxidation can be avoided. The temperable near infrared ray reflection type low-emissivity glass needs to be added with a reducing protective atmosphere of 10% hydrogen and 90% argon during high-temperature sintering. The temperable near-infrared reflection type low-emissivity glass needs to be subjected to high-temperature reduction treatment, wherein the reduction temperature is 500-550 ℃, and the retention time is 10-20 minutes. The production process of the tempered heat-reflecting glass is characterized in that the temperature of the glass needs to be slowly reduced to 60 ℃ after the glass is sintered at a high temperature, and the temperature needs to be reduced to 60 ℃ after 10-30 minutes, so that the tempering effect caused by the stress increase on the surface of the glass due to the too fast temperature reduction of the glass is avoided, and the subsequent cutting and other processing are influenced. The glass substrate is made of body-colored float glass, can absorb a large amount of solar infrared heat radiation, weaken the irradiation intensity of sunlight, and can further increase the blocking of the glass to sunlight near infrared rays by matching with the infrared reflection and low radiation functions of the functional layer.

Practical implementation and production cases:

depositing a compact silicon dioxide barrier layer with the thickness of 700nm on the glass substrate with the number of #1 by adopting a Chemical Vapor Deposition (CVD) process; and spraying transparent heat-insulating precursor liquid with infrared reflection and low radiation functions on the barrier layer by adopting an ultrasonic spraying machine with the frequency of 100KHz, adjusting the spraying thickness according to the requirement of 30 percent of the total reflectivity of near infrared rays before tempering, leveling after 6 minutes after spraying, and drying in a 200 ℃ oven to form the functional layer. After the functional layer is processed, a compact silicon dioxide protective layer with the thickness of 500nm is deposited on the functional layer by adopting a chemical vapor deposition process.

After the three-layer structure is processed, the glass is sent into a 500 ℃ oven for sintering, the oven needs to be firstly filled with a protective atmosphere of 10% hydrogen and 90% argon, and the sintering time is kept for 15 minutes. After the glass is sintered, the temperature is slowly reduced, and the temperature is reduced to the room temperature after 30 minutes.

Example 2, all conditions, materials and processes were the same as in example 1, only the thickness of the silica barrier layer was reduced from 700nm to 500nm to compare haze and near infrared reflectance.

After the three-layer structure is processed, the glass is sent into a toughening furnace for toughening, and the toughening furnace needs to be filled with a protective atmosphere of 10% hydrogen and 90% argon.

Comparison of results	#1	#2
			Haze degree	06％	1.5％
Reflectivity of near infrared ray	35％	16％

According to the results of the above examples, #1 performed well, while #2 after tempering had an increased haze and a decreased near infrared reflectance by more than half, which means that when the thickness of the blocking layer was less than 500nm, the sodium penetration could not be effectively blocked to destroy the lattice structure in the functional layer, resulting in a decreased performance of the functional layer.

Although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described in the foregoing embodiments, or equivalents may be substituted for elements thereof. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A temperable near-infrared reflection type low emissivity glass comprising a bulk-tinted float glass substrate, characterized in that: a dense silicon dioxide barrier layer, a functional layer and a dense silicon dioxide protective layer are sequentially arranged on a float glass substrate, and the functional layer is a low-radiation coating capable of realizing near infrared ray reflection.

2. The near infrared ray reflection type low emissivity glass as claimed in claim 1, wherein: the visible light transmittance of the float glass substrate is 40-80%.

3. The near infrared ray reflection type low emissivity glass as claimed in claim 2, wherein: the thickness of the compact silicon dioxide barrier layer is 600 nm-800 nm; the thickness of the compact silicon dioxide protective layer is 300 nm-500 nm, and the thickness of the functional layer is determined according to the functional requirements.

4. The near infrared ray reflection type low emissivity glass as claimed in claim 3, wherein: the functional layer can reflect infrared rays with the wavelength of more than 800nm, and the reflectivity of the near infrared rays is more than 30 percent.