CN105884210A - Ultraviolet ray and infrared ray shielding glass capable of being subsequently processed - Google Patents
Ultraviolet ray and infrared ray shielding glass capable of being subsequently processed Download PDFInfo
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- CN105884210A CN105884210A CN201410815902.0A CN201410815902A CN105884210A CN 105884210 A CN105884210 A CN 105884210A CN 201410815902 A CN201410815902 A CN 201410815902A CN 105884210 A CN105884210 A CN 105884210A
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Abstract
The invention provides ultraviolet ray and infrared ray shielding glass capable of being subsequently processed through special design. The ultraviolet ray and infrared ray shielding glass is characterized in that a plurality of thin films composed of a first oxide layer 101/first infrared reflecting layer 102/first blocking layer 103/second oxide layer 104/second infrared reflecting layer 105/second blocking layer 106/third oxide layer 107/third infrared reflecting layer 108/third blocking layer 109/fourth oxide layer 110/ultraviolet blocking layer 111/protection layer 112 is sedimented on one surface of glass through the magnetron sputtering coating technology. The ultraviolet ray and infrared ray shielding glass has the advantages of being high in visible light transmittance and extremely low in ultraviolet and infrared light transmittance, and is stable in optical performance, resistant to heat and weather and capable of achieving remote subsequent tempering, hot bending, doubling and the like, and a very good choice is provided for high-grade building glass.
Description
[technical field]
The present invention relates to special glass field, a kind of can tempering, to visible ray high transmission, to the infrared and coated glass of the high shielding of ultraviolet light.
[background technology]
Low emissivity (also known as Low-E) glass is a kind of extraordinary coated glass of energy-saving effect, has begun to now be widely used in building, automobile, and the industrial circle such as electric refrigerator, microwave oven.It is the film layer that plating last layer is special on the glass substrate, it is allowed to the energy of short wavelength, such as visible ray and uv energy, by this film layer, and reflects the energy of long wavelength, and such as infrared energy, final realization reduces heating or the effect of energy consumption for cooling.
The structure design of this film layer generally adds one layer of infrared external reflection Ag layer in the middle of two-layer dielectric layer, and the height of the radiance of coated glass is dependent on the thickness of Ag layer.Thickness is the biggest, and radiance is the lowest, and its heat preservation and insulation is the best.But, blocked up Ag layer can greatly reduce passing through of visible ray, and then one layer of Ag is divided into two-layer or three layers by designer, embeds in multi-layer dielectric layer, solves this contradiction, defines double silver and three silver products.
But, double silver and three silver films are softer than single silver film of same material, so, simply increase the quantity of Ag layer and dielectric layer, not only can affect the appearance color of product, angle aberration, also can bring the series of problems of heat stability, mechanical endurance and chemical durability.Therefore, not through the film layer of particular design, after can only using first steel, the mode of plating is coated to safety glass surface, extreme influence production efficiency, and this film layer can not be coated to curved steel glass surface.
Meanwhile, although the design of existing Low-E glass film layers can intercept passing through of the ultraviolet of major part below 320nm wavelength, but the long wave ultraviolet for 320-400nm wavelength does not has good shield effectiveness.The ultraviolet long-term irradiation accumulation of this wave band, can cause the accelerated skin ageing and serious infringement of people, and the fading and damage of leather, furniture, the art work.
For these reasons, develop a kind of can the ultraviolet of following process and infrared shield glass, it will provide a kind of to glass for building purposes such as museum, odeum and high-end residentials and preferably select.
[summary of the invention]
The present invention through particular design, develop a kind of new can the film layer of following process, three silver medal Low-E film layers and ultraviolet blockage layer are combined, are simultaneously achieved ultraviolet and ultrared shield effectiveness.The technical scheme of this invention is:
A kind of can the ultraviolet of following process and infrared shield glass; it is characterized in that, a surface of glass substrate 100 uses magnetron sputtering plating process deposits have plural layers of following structure: the first trioxide layer 107/ the 3rd infrared reflecting layer 108/ the 3rd barrier layer 109/, oxide skin(coating) 104/ second infrared reflecting layer 105/ second barrier layer 106/, oxide skin(coating) 101/ first infrared reflecting layer 102/ first barrier layer 103/ second tetroxide layer 110/ ultraviolet blockage layer 111/ protective layer 112.
Wherein first oxide skin(coating) the 101, second oxide skin(coating) 104, trioxide layer 107 and tetroxide layer 110 can be single oxides, it is also possible to be the combination of oxides layer containing at least one high refractive index transparent oxide, such as TiO2、ZnO、Bi2O3、Nb2O5、ZnSnOx、AZO、SnO2Deng.The thickness of the first oxide skin(coating) 101 and tetroxide layer 110 is 20～50nm, and the thickness of the second oxide skin(coating) 104 and trioxide layer 107 is 50～90nm.Oxide skin(coating) 101,104,107 and 110 is either still made up of multilevel oxide single oxide, and the adjacent film layer of infrared reflecting layer 102,105,108 is necessary for ZnO or its doping oxide, such as ZnSnOx, AZO etc., its thickness is 5～12nm；The film layer adjacent with barrier layer 103,106,109 is necessary for ZnO or its doping oxide, such as ZnSnOx, AZO etc., its thickness is 5～12nm.If oxide skin(coating) 101,104,107,110 is made up of many oxide, carrying out transition in the way of gradient growth between different oxides, concrete grammar is dual rotary negative electrode, installs two kinds of different targets, midfrequent AC power supply is powered, and magnetron sputtering atmosphere is argon oxygen gas mixture.
First infrared reflecting layer 102, second infrared reflecting layer 105 of the present invention and the 3rd infrared reflecting layer 108 are metal Ag layer or Ag alloy-layer, metal Ag layer has the highest electrical conductivity and the reflectance to infra-red radiation, and Color Neutral, it is the major function layer of infrared shielding of the present invention.The thickness e of xth infrared reflecting layerxMeet ex=Aex-1, wherein:
Coefficient A meets 1 ＜ A≤2, and more preferable scope is 1.05 ＜ A≤2, even 1.05 ＜ A≤1.6；
First infrared reflecting layer 102 thickness e1Meet 10nm≤e1≤ 18nm, more preferable scope is 11nm≤e1≤15nm。
First the 103, second barrier layer the 106, the 3rd, barrier layer barrier layer 109 material therefor of the present invention is Ti, and surface density to reach 0.9～1.2 μ g/cm2, and the surface density on the 3rd barrier layer, barrier layer 109 to the second 106 is big, and the second barrier layer 106 to the first stops that aspect 103 density is big or identical.
Material used by the protective layer of the present invention is TiO2、Al2O3、SiO2In one or its mixture, surface density to reach 1.1～1.4 μ g/cm2。
The material used by ultraviolet blockage layer 111 of the present invention is CeO2Or and protective layer 112 composition mixture, such as CeO2-TiO2, thickness is 5～20nm.
Present invention also offers this ultraviolet and the technological process of production of infrared shielding glass, comprise the following steps:
1, base plate glass through over cleaning, dry up, enter vacuum sputtering chamber；
2, magnetron sputtering uses dual rotary negative electrode, and gas uses argon oxygen gas mixture, reactive sputter-deposition the first oxide skin(coating)；
3, magnetron sputtering uses planar cathode, and gas uses pure argon, metal sputter-deposition the first infrared reflecting layer；
4, magnetron sputtering uses planar cathode, and gas uses pure argon, metal sputter-deposition the first barrier layer；
5, magnetron sputtering uses dual rotary negative electrode, and gas uses argon oxygen gas mixture, reactive sputter-deposition the second oxide skin(coating)；
6, magnetron sputtering uses planar cathode, and gas uses pure argon, metal sputter-deposition the second infrared reflecting layer；
7, magnetron sputtering uses planar cathode, and gas uses pure argon, metal sputter-deposition the second barrier layer；
8, magnetron sputtering uses dual rotary negative electrode, and gas uses argon oxygen gas mixture, reactive sputter-deposition trioxide layer；
9, magnetron sputtering uses planar cathode, and gas uses pure argon, metal sputter-deposition the 3rd infrared reflecting layer；
10, magnetron sputtering uses planar cathode, and gas uses pure argon, metal sputter-deposition the 3rd barrier layer；
11, magnetron sputtering uses dual rotary negative electrode, and gas uses argon oxygen gas mixture, reactive sputter-deposition tetroxide layer；
12, magnetron sputtering uses dual rotary negative electrode, and gas uses argon oxygen gas mixture, reactive sputter-deposition ultraviolet blockage layer；
13, magnetron sputtering uses dual rotary negative electrode, and gas uses argon oxygen gas mixture, reactive sputter-deposition protective layer.
The ultraviolet of the present invention and the feature of infrared shielding Glass Design are:
1, the present invention is by controlling the particular design on barrier layer and coating growth so that it is Ag layer is had more preferable protective effect, solves the problem that Ag layer is more easily damaged during Post isothermal treatment.
2, the present invention grows this special technology mode by gradient, alleviates the internal stress between oxide skin(coating) different materials, makes the product of the present invention can avoid the film layer defects of the excessive initiation of internal stress during following process.
3, the present invention appropriate design by three layers of infrared external reflection Ag layer so that it is at utmost blocks infrared radiation, infrared transmittivity is less than 5%.
4, the present invention utilizes special material CeO2Ultraviolet band high scattering properties so that it is preferably stop ultraviolet radiation, ultraviolet permeability be less than 5%.
【Accompanying drawing explanation】
It is ultraviolet of the present invention and the structural representation of infrared shielding glass shown in Fig. 1.
It it is the optical transmission spectra in the range of ultraviolet of the present invention and the 300 of infrared shielding glass～2500nm shown in Fig. 2.
It it is the optical transmission spectra in the range of ultraviolet of the present invention and the 300 of infrared shielding glass～800nm shown in Fig. 3.
[specific embodiment]
Below for the present invention provide can the ultraviolet of following process and the film structure of one application example of infrared shielding glass:
Glass substrate/ZnSnOx/ZnO/Ag/Ti/ZnO/ZnSnOx/ZnO/Ag/Ti/ZnO/ZnSnOx/ZnO/Ag/ Ti/ZnO/ZnSnOx/CeO2/TiO2。
Wherein, the first oxide skin(coating) is the composite bed of ZnSnOx and ZnO, and thickness is 42～46nm, with gradient growth pattern transition.
First infrared external reflection Ag layer thickness is 11nm.
First barrier layer is Ti layer, and surface density is 1.1 μ g/cm2。
Second oxide skin(coating) is the composite bed of ZnSnOx and ZnO, and thickness is 70～75nm, two-layer ZnO and ZnSnOx all transition in the way of gradient growth.
Second infrared external reflection Ag layer thickness is 13nm.
Second barrier layer is Ti layer, and surface density is 1.2 μ g/cm2。
Trioxide layer is the composite bed of ZnSnOx and ZnO, and thickness is 70～75nm, two-layer ZnO and ZnSnOx all transition in the way of gradient growth.
3rd infrared external reflection Ag layer thickness is 17nm.
3rd barrier layer is Ti layer, and surface density is 1.2 μ g/cm2。
Tetroxide layer is the composite bed of ZnSnOx and ZnO, and thickness is 35～40nm, two-layer ZnO and ZnSnOx all transition in the way of gradient growth.
Ultraviolet blockage layer is CeO2Layer, thickness is 5nm.
Protective layer is TiO2Layer, surface density is 1.3 μ g/cm2。
The ultraviolet of the present embodiment, infrared and visible ray Transmissivity measurement result are
| 380nm | 300nm～380nm ultraviolet | 380～780nm visible rays | 780～2500nm is infrared | |
| Transmitance (%) | 13.108 | 4.763 | 73.200 | 3.269 |
Claims (12)
1. one kind can the ultraviolet of following process and infrared shield glass, it is characterised in that use on a surface of glass
Magnetron sputtering plating process deposits has plural layers of following structure: the first oxide skin(coating)/the first infrared reflecting layer/the first barrier layer/
Second oxide skin(coating)/the second infrared reflecting layer/the second barrier layer/the trioxide layer/the 3rd infrared reflecting layer/the 3rd barrier layer/4th
Oxide skin(coating)/ultraviolet blockage layer/protective layer.
The most according to claim 1 can the ultraviolet of following process and infrared shield glass, it is characterised in that described
First oxide skin(coating), the second oxide skin(coating), trioxide layer and tetroxide layer are containing at least one high refractive index transparent
Oxide, such as TiO2、ZnO、Bi2O3、Nb2O5、ZnSnOx、AZO、SnO2Deng, and between many oxide with
The mode of gradient growth carries out transition.
The most according to claim 2 can the ultraviolet of following process and infrared shield glass, it is characterised in that described
The thickness of the first oxide skin(coating) and tetroxide layer is 20～50nm, and the thickness of the second oxide skin(coating) and trioxide layer is
50～90nm.
The most according to claim 2 can the ultraviolet of following process and infrared shield glass, it is characterised in that described
In first oxide skin(coating), the second oxide skin(coating), trioxide layer, and the adjacent oxide of infrared reflecting layer be ZnO or its mix
Miscellaneous oxide, such as ZnSnOx, AZO etc..
The most according to claim 2 can the ultraviolet of following process and infrared shield glass, it is characterised in that described
In second oxide skin(coating), trioxide layer, tetroxide layer, and the adjacent oxide in barrier layer is ZnO or its doped with oxygen
Compound, such as ZnSnOx, AZO etc..
The most according to claim 2 can the ultraviolet of following process and infrared shield glass, it is characterised in that described
In first oxide skin(coating), the oxide of a kind of compact texture, it is possible to stop that the active sodium ion of glass surface is in film layer
Migrate.
The most according to claim 1 can the ultraviolet of following process and infrared shield glass, it is characterised in that described
First infrared reflecting layer, the second infrared reflecting layer, the 3rd infrared reflecting layer use metal Ag or the alloy material containing Ag,
And the thickness e of xth infrared reflecting layerxMeet ex=Aex-1, wherein:
Coefficient A meets 1 ＜ A≤2, and more preferable scope is 1.05 ＜ A≤2, even 1.05 ＜ A≤1.6；
First infrared reflecting layer thickness e1Meet 10nm≤e1≤ 18nm, more preferable scope is 11nm≤e1≤15nm。
The most according to claim 1 can the ultraviolet of following process and infrared shield glass, it is characterised in that described
First barrier layer, the second barrier layer, the 3rd barrier layer material therefor are Ti, and surface density to reach 0.9～1.2 μ g/cm2, and
3rd barrier layer is bigger than the surface density on the second barrier layer, and the second barrier layer is bigger or identical than the first barrier layer surface density.
The most according to claim 1 can the ultraviolet of following process and infrared shield glass, it is characterised in that described
Ultraviolet blockage layer material therefor is CeO2Or CeTiOx, thickness is 5～20nm.
The most according to claim 1 can the ultraviolet of following process and infrared shield glass, it is characterised in that described
The material used by protective layer be TiO2、Al2O3、SiO2In one or its mixture, surface density to reach 1.1～1.4 μ g/cm2。
11. according to claim 2 can the ultraviolet of following process and the production technology of infrared shield glass, its feature
Being, different interlevel oxides use the mode of gradient growth, and implementing way is dual rotary negative electrode, installs two kinds of different targets
Material, midfrequent AC power supply powers, and magnetron sputtering atmosphere is argon oxygen gas mixture.
12. according to described in claim 1-10 can the ultraviolet of following process and infrared shield glass, it is characterised in that right
In visible ray (wavelength is from 380nm-780nm) transmitance up to more than 70%, for Infrared (wavelength 780nm-2500nm)
Transmitance is below 5%, and for the transmitance of ultraviolet light (below 380nm) below 5%, the ultraviolet at 380nm is saturating
Rate of crossing is below 15%.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410815902.0A CN105884210A (en) | 2014-12-23 | 2014-12-23 | Ultraviolet ray and infrared ray shielding glass capable of being subsequently processed |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410815902.0A CN105884210A (en) | 2014-12-23 | 2014-12-23 | Ultraviolet ray and infrared ray shielding glass capable of being subsequently processed |
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| CN201410815902.0A Pending CN105884210A (en) | 2014-12-23 | 2014-12-23 | Ultraviolet ray and infrared ray shielding glass capable of being subsequently processed |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111302651A (en) * | 2020-04-07 | 2020-06-19 | 索曼电子（深圳）有限公司 | Low-radiation electric heating glass and preparation method thereof |
| CN114044632A (en) * | 2021-12-16 | 2022-02-15 | 西湖大学 | Vehicle glass and preparation method thereof |
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| US20070243391A1 (en) * | 2006-04-13 | 2007-10-18 | Guardian Industries Corp. | Coated glass substrate with infrared and ultraviolet blocking characteristics |
| CN101497501A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass |
| CN102730985A (en) * | 2011-04-12 | 2012-10-17 | 鸿富锦精密工业（深圳）有限公司 | Coated article and its preparation method |
| CN103879089A (en) * | 2012-12-21 | 2014-06-25 | 中国南玻集团股份有限公司 | High-performance three-silver-layer low-radiation glass and preparation method thereof |
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2014
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070243391A1 (en) * | 2006-04-13 | 2007-10-18 | Guardian Industries Corp. | Coated glass substrate with infrared and ultraviolet blocking characteristics |
| CN101497501A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass |
| CN102730985A (en) * | 2011-04-12 | 2012-10-17 | 鸿富锦精密工业（深圳）有限公司 | Coated article and its preparation method |
| CN103879089A (en) * | 2012-12-21 | 2014-06-25 | 中国南玻集团股份有限公司 | High-performance three-silver-layer low-radiation glass and preparation method thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111302651A (en) * | 2020-04-07 | 2020-06-19 | 索曼电子（深圳）有限公司 | Low-radiation electric heating glass and preparation method thereof |
| CN111302651B (en) * | 2020-04-07 | 2020-12-01 | 索曼电子（深圳）有限公司 | Low-radiation electric heating glass and preparation method thereof |
| CN114044632A (en) * | 2021-12-16 | 2022-02-15 | 西湖大学 | Vehicle glass and preparation method thereof |
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Inventor after: Xu Jun Inventor after: Wu Qiongyu Inventor after: Zhao Wanhui Inventor after: Zhang Xin Inventor after: Ji Yalin Inventor before: Zhang Xin Inventor before: Ji Yalin |
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Application publication date: 20160824 |