CN111286061A - 一种具有低摩擦系数和高水接触角的薄膜及制备方法 - Google Patents
一种具有低摩擦系数和高水接触角的薄膜及制备方法 Download PDFInfo
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Abstract
本发明提供了一种具有低摩擦系数和高水接触角的薄膜及制备方法,其薄膜包括从下到上依次贴合的透明基膜、底涂层和AF层;其制备方法包括以下步骤:步骤S001,取材;选取合适材料的透明基膜;步骤S002,配置底涂液;将含不饱和官能团的聚合物和光引发剂用溶剂稀释,形成底涂液;步骤S003,贴合底涂层;将底涂液涂布在透明基膜上,经烘箱加热固化、UV固化或双固化后形成底涂层;步骤S004,贴合AF层;将AF液涂布在步骤S003中成形的半成品上,经烘箱加热后交联固化形成AF层。本发明提供的一种具有低摩擦系数和高水接触角的薄膜及制备方法,克服了现有薄膜爽滑和防指纹效果差、制备工艺复杂、不适合大批量生产的缺陷。
Description
技术领域
本发明涉及电子产品薄膜领域,特别是涉及一种具有低摩擦系数和高水接触角的薄膜及制备方法。
背景技术
近年来,消费者对电子产品的要求越来越高,不仅在性能上追求更高和更稳定更好外,对产品也提出了如防水、防指纹和高爽滑等要求。为增加消费者对如手机等电子产品良好的体验感和满意度,电子产品表面高爽滑和防指纹效果是必不可少的要求。目前,具有高爽滑和防指纹效果薄膜实现方案主要有以下两种。
第一种方案采用的是AF镀膜的方式,这种方案是在清洗干净的触摸屏上喷涂一层AF喷雾,经固化处理后形成AF膜。第二种方案采用的是通过表面修饰来降低摩擦系数的方式,这种方案是将铜基表面经化学刻蚀后的粗糙结构用硅烷溶液再次化学接枝修饰表面,从而达到降低摩擦系数的效果。虽然这两种方案在一定程度上提高了薄膜的高爽滑和防指纹效果,但其提升效果有限,还有待改善;并且现有的薄膜主要是通过喷涂和镀膜方式来实现爽滑和防指纹效果,操作复杂加工生产时间慢,制造成本高,不利于大批量生产。
发明内容
(一)要解决的技术问题
本发明所要解决的问题是提供一种具有低摩擦系数和高水接触角的薄膜及制备方法,克服了现有薄膜爽滑和防指纹效果差、制备工艺复杂、不适合大批量生产的缺陷。
(二)技术方案
为解决所述技术问题,本发明提供一种具有低摩擦系数和高水接触角的薄膜,包括从下到上依次贴合的透明基膜、底涂层和AF层,所述底涂层和所述AF层之间还贴合有稳定层。本发明在透明基膜的表面依次贴合有底涂层、稳定层和AF层,设置透明基膜、底涂层和稳定层,便于贴合AF层,本薄膜具有摩擦系数低和水接触角高的特点,可有效实现爽滑和防指纹效果且稳定性好。
进一步的,所述透明基膜的材质可为PET、TAC、PC、PE、PP、PI、PMMA、TPU或PEN,所述透明基膜的厚度为20μm~500μm,优选的厚度为50μm-200μm。所述AF层是由AF液固化而形成的涂层,所述AF层的涂层厚度在5nm~100nm,优选的厚度为10nm-80nm。
进一步的,所述底涂层由底涂液经热固、UV固化或双固化而形成,所述底涂层的涂层厚度为1μm~10μm,优选的厚度为1.5μm-8μm;以质量百分含量计,所述底涂液的原料组成包括:含不饱和官能团的聚合物25~55%、溶剂40%~75%和光引发剂1%~8%,所述聚合物包括聚氨酯丙烯酸树脂、聚酯丙烯酸树脂、环氧丙烯酸树脂、氟丙烯酸树脂中的一种或几种的组合,所述溶剂包括异丙醇、丙酮、甲基异丁基酮、丁酮、丙二醇甲醚、丙二醇单丁基醚、乙酸甲酯、乙酸乙酯和乙酸丁酯中的一种或几种的混合,所述光引发剂包括2,4,6-三甲基苯甲酰基-二苯基氧化膦、1-羟基环己基苯基甲酮、2,4,6-三甲基苯甲酰基膦酸乙酯、2-甲基-1-(4-甲硫基苯基)-2-吗啉基-1-丙酮、2-异丙基硫杂蒽酮、2-苄基-2-二甲基氨基-1-(4-吗啉苯基)丁酮、苯基双(2,4,6-三甲基苯甲酰基)氧化膦中的一种或两种搭配。其中,以质量百分含量计,所述底涂液的原料组成还可包括可添加成分1%~5%,所述可添加成分包括纳米二氧化硅、含硅添加剂、抗静电剂中的一种或几种组合。
进一步的,所述稳定层由硅烷溶液固化形成,所述稳定层的涂层厚度为5nm~150nm,优选的厚度为10nm-100nm;以质量百分含量计,所述硅烷溶液的原料组成包括:硅烷偶联剂0.1%~2%和溶剂,所述硅烷偶联剂包括γ-氨丙基三乙氧基硅烷、γ-缩水甘油醚氧丙基三甲氧基硅烷、γ-(甲基丙烯酰氧基)丙基三甲氧基硅烷、N-(β-氨乙基)-γ-氨丙基甲基二甲氧基硅烷、γ-缩水甘油醚氧基丙基甲基二乙氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三(β-甲氧基乙氧基)硅烷中的一种或几种组合,所述溶剂包括乙醇、甲醇、异丙醇和丙酮中的一种或几种混合。设置稳定层,旨在提高爽滑和防指纹效果的持久性。
本发明还提供一种具有低摩擦系数和高水接触角的薄膜的制备方法,包括以下步骤:
步骤S001,取材;选取合适材料的透明基膜;
步骤S002,配置底涂液;将含不饱和官能团的聚合物和光引发剂用溶剂稀释,形成底涂液;
步骤S003,贴合底涂层;采用涂布的方式,将所述底涂液涂布在所述透明基膜上,经烘箱加热固化、UV固化或双固化后形成底涂层。其中,所述底涂层的涂层厚度为1μm~10μm;以质量百分含量计,所述底涂液的原料组成包括:含不饱和官能团的聚合物25~55%、溶剂40%~75%和光引发剂1%~8%,所述聚合物包括聚氨酯丙烯酸树脂、聚酯丙烯酸树脂、环氧丙烯酸树脂、氟丙烯酸树脂中的一种或几种的组合,所述溶剂包括异丙醇、丙酮、甲基异丁基酮、丁酮、丙二醇甲醚、丙二醇单丁基醚、乙酸甲酯、乙酸乙酯和乙酸丁酯中的一种或几种的混合,所述光引发剂包括2,4,6-三甲基苯甲酰基-二苯基氧化膦、1-羟基环己基苯基甲酮、2,4,6-三甲基苯甲酰基膦酸乙酯、2-甲基-1-(4-甲硫基苯基)-2-吗啉基-1-丙酮、2-异丙基硫杂蒽酮、2-苄基-2-二甲基氨基-1-(4-吗啉苯基)丁酮、苯基双(2,4,6-三甲基苯甲酰基)氧化膦中的一种或两种组合。
步骤S004,贴合AF层;采用涂布的方式,将AF液涂布在所述步骤S003中成形的半成品上,经烘箱加热后交联固化形成AF层。
进一步的,所述步骤S003还包括以下步骤:
步骤S0031,配置硅烷溶液;将硅烷偶联剂用溶剂稀释,形成硅烷溶液;
步骤S0032,贴合稳定层;采用涂布的方式,将所述硅烷溶液涂布在所述底涂层上,经烘箱加热后交联固化形成稳定层。其中,所述稳定层的涂层厚度为5nm~150nm;以质量百分含量计,所述硅烷溶液的原料组成包括:硅烷偶联剂0.1%~2%和溶剂,所述硅烷偶联剂包括γ-氨丙基三乙氧基硅烷、γ-缩水甘油醚氧丙基三甲氧基硅烷、γ-(甲基丙烯酰氧基)丙基三甲氧基硅烷、N-(β-氨乙基)-γ-氨丙基甲基二甲氧基硅烷、γ-缩水甘油醚氧基丙基甲基二乙氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三(β-甲氧基乙氧基)硅烷中的一种或几种组合,所述溶剂包括乙醇、甲醇、异丙醇和丙酮中的一种或几种混合。
(三)有益效果
本发明提供的一种具有低摩擦系数和高水接触角的薄膜,在透明基膜的表面依次贴合有底涂层、稳定层和AF层,本薄膜具有摩擦系数低和水接触角高的特点,可有效实现爽滑和防指纹效果且稳定性好,该薄膜对水的静态接触角可在115°,酒精擦拭后也可稳定在110°,且摩擦系数无论酒精擦拭前后均可稳定保持在0.06以下;本发明提供的一种具有低摩擦系数和高水接触角的薄膜的制备方法,制备方法简单,加工生产快速,加工成本低,能快速实现大批量生产;克服了现有薄膜爽滑和防指纹效果差、制备工艺复杂、不适合大批量生产的缺陷。
附图说明
图1为本发明一种具有低摩擦系数和高水接触角的薄膜实施例1的结构示意图;
图2为本发明一种具有低摩擦系数和高水接触角的薄膜实施例3的结构示意图;
图3为本发明一种具有低摩擦系数和高水接触角的薄膜实施例3制备的薄膜对水的静态接触角的测试图片;
图4为本发明一种具有低摩擦系数和高水接触角的薄膜实施例3制备的薄膜经三次酒精擦拭后的摩擦系数的测试图片;
图5为本发明一种具有低摩擦系数和高水接触角的薄膜的制备方法的工艺流程图;
图中各个附图标记的对应的部件名称是:1、透明基膜;2、底涂层;3、AF层;4、稳定层。
具体实施方式
下面结合附图和实施例,对本发明的具体实施方式作进一步详细描述。以下实施例用于说明本发明,但不用来限制本发明的范围。
实施例1:
参阅图1,本实施例提供一种具有低摩擦系数和高水接触角的薄膜,包括从下到上依次贴合的透明基膜1、底涂层2和AF层3。
透明基膜1的材质可为PET(聚对苯二甲酸类塑料)、TAC(三醋酸纤维薄膜)、PC(聚碳酸酯)、PE(聚乙烯)、PP(聚丙烯)、PI(聚酰亚胺)、PMMA(聚甲基丙烯酸甲酯)、TPU(热塑性聚氨酯弹性体)或PEN(聚苯二甲酸乙二醇酯),透明基膜1的厚度为20μm~500μm,优选的厚度为50μm-200μm。AF层3是由AF液固化而形成的涂层;AF液的主要成分是含氟化合物,可以直接从市场上购买得到;AF层3的涂层厚度在5nm~100nm,优选的厚度为10nm-80nm。
底涂层2由底涂液经热固化、UV(紫外线)固化或双固化而形成,底涂层2的涂层厚度1μm~10μm,优选厚度为1.5μm-8μm。以质量百分含量计,底涂液的原料组成包括:含不饱和官能团的聚合物25~55%、溶剂40%~75%和光引发剂1%~8%,聚合物可以是聚氨酯丙烯酸树脂、聚酯丙烯酸树脂、环氧丙烯酸树脂、氟丙烯酸树脂中的一种或几种组合,溶剂可以是异丙醇、丙酮、甲基异丁基酮、丁酮、丙二醇甲醚、丙二醇单丁基醚、乙酸甲酯、乙酸乙酯和乙酸丁酯中的一种或几种的混合,光引发剂可以是2,4,6-三甲基苯甲酰基-二苯基氧化膦、1-羟基环己基苯基甲酮、2,4,6-三甲基苯甲酰基膦酸乙酯、2-甲基-1-(4-甲硫基苯基)-2-吗啉基-1-丙酮、2-异丙基硫杂蒽酮、2-苄基-2-二甲基氨基-1-(4-吗啉苯基)丁酮、苯基双(2,4,6-三甲基苯甲酰基)氧化膦中的一种或两种搭配。
参阅图5,本实施例还提供了一种制备上述薄膜的方法,包括以下步骤:
步骤S001,取材;选取合适材料的透明基膜1;透明基膜1的材质可为PET、TAC、PC、PE、PP、PI、PMMA、TPU或PEN,透明基膜1的厚度为20μm~500μm,优选的厚度为50μm-200μm。本实施例中,取厚度为125μm的PET作为透明基膜1。
步骤S002,配置底涂液;将含不饱和官能团的聚合物和光引发剂用溶剂稀释,形成底涂液;以质量百分含量计,底涂液的原料组成包括:含不饱和官能团的聚合物25~55%、溶剂40%~75%和光引发剂1%~8%,聚合物可以是聚氨酯丙烯酸树脂、聚酯丙烯酸树脂、环氧丙烯酸树脂、氟丙烯酸树脂中的一种或几种组合,溶剂可以是异丙醇、丙酮、甲基异丁基酮、丁酮、丙二醇甲醚、丙二醇单丁基醚、乙酸甲酯、乙酸乙酯和乙酸丁酯中的一种或几种的混合,光引发剂可以是2,4,6-三甲基苯甲酰基-二苯基氧化膦、1-羟基环己基苯基甲酮、2,4,6-三甲基苯甲酰基膦酸乙酯、2-甲基-1-(4-甲硫基苯基)-2-吗啉基-1-丙酮、2-异丙基硫杂蒽酮、2-苄基-2-二甲基氨基-1-(4-吗啉苯基)丁酮、苯基双(2,4,6-三甲基苯甲酰基)氧化膦中的一种或两种搭配。本实施例中,以聚氨酯丙烯酸树脂作为聚合物,以甲基异丁基酮作为溶剂,以2,4,6-三甲基苯甲酰基-二苯基氧化膦和1-羟基环己基苯基甲酮作为光引发剂;将聚氨酯丙烯酸树脂用溶剂甲基异丁基酮稀释至固含量为30%,然后加入光引发剂2,4,6-三甲基苯甲酰基-二苯基氧化膦1%和1-羟基环己基苯基甲酮4%来配置底涂液。
步骤S003,贴合底涂层;采用微凹涂布的方式,将底涂液涂布在透明基膜1上,经烘箱加热固化、UV固化或双固化后形成底涂层2;本实施例中,将配置好的底涂液涂布在透明基膜1上,在60℃温度下先热固化后再经UV固化(双固化)形成底涂层2,其厚度为2.0μm-2.5μm。
步骤S004,贴合AF层;采用微凹涂布的方式,将AF液涂布在底涂层上,经烘箱加热后交联固化形成AF层3。其中,加热温度为120℃,5min后固化形成AF层3,其厚度为30nm。
其中,上述步骤中的涂布的方式不局限于微凹涂布,还可以是辊涂、喷涂、浸涂、逗号涂布、狭缝涂布或刮刀涂布。
实施例2:
本实施例与实施例1的区别在于:以质量百分含量计,底涂液的原料组成还可包括可添加成分1%~5%,可添加成分包括纳米二氧化硅、含硅添加剂、抗静电剂中的一种或几种组合。本实施例中,在底涂液中还加入了纳米二氧化硅。
本实施例制备上述薄膜的方法与实施例1的区别在于:在步骤S002中,配置底涂液时还添加了可添加成分,可添加成分包括纳米二氧化硅、含硅添加剂、抗静电剂中的一种或几种组合。本实施例中,可添加成分为纳米二氧化硅。
实施例3:
参阅图2至图4,本实施例与实施例1的区别在于:底涂层2和AF层3之间还贴合有稳定层4,稳定层4由硅烷溶液固化形成,稳定层4的涂层厚度为5nm~150nm,优选厚度为10nm-100nm。以质量百分含量计,硅烷溶液的原料组成包括:硅烷偶联剂0.1%~2%和溶剂,硅烷偶联剂包括γ-氨丙基三乙氧基硅烷、γ-缩水甘油醚氧丙基三甲氧基硅烷、γ-(甲基丙烯酰氧基)丙基三甲氧基硅烷、N-(β-氨乙基)-γ-氨丙基甲基二甲氧基硅烷、γ-缩水甘油醚氧基丙基甲基二乙氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三(β-甲氧基乙氧基)硅烷中的一种或几种组合,溶剂包括乙醇、甲醇、异丙醇和丙酮中的一种或几种混合。
参阅图5,本实施例制备上述薄膜的方法与实施例1的区别在于,步骤S003还包括以下步骤:
步骤S0031,配置硅烷溶液;将硅烷偶联剂用溶剂稀释,形成硅烷溶液;以质量百分含量计,硅烷溶液的原料组成包括:硅烷偶联剂0.1%~2%和溶剂,硅烷偶联剂包括γ-氨丙基三乙氧基硅烷、γ-缩水甘油醚氧丙基三甲氧基硅烷、γ-(甲基丙烯酰氧基)丙基三甲氧基硅烷、N-(β-氨乙基)-γ-氨丙基甲基二甲氧基硅烷、γ-缩水甘油醚氧基丙基甲基二乙氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三(β-甲氧基乙氧基)硅烷中的一种或几种组合,溶剂包括乙醇、甲醇、异丙醇和丙酮中的一种或几种混合。本实施例中,硅烷偶联剂选用γ-缩水甘油醚氧丙基三甲氧基硅烷和γ-(甲基丙烯酰氧基)丙基三甲氧基硅烷,溶剂选用异丙醇,将γ-缩水甘油醚氧丙基三甲氧基硅烷和γ-(甲基丙烯酰氧基)丙基三甲氧基硅烷用异丙醇溶解稀释至0.5%的固含量形成硅烷溶液。
步骤S0032,贴合稳定层;采用涂布的方式,将硅烷溶液涂布在底涂层2上,经烘箱加热后交联固化形成稳定层4。本实施例中,取澄清状态的硅烷溶液涂布于底涂层表面,经烘箱加热,加热温度为130℃,5min后固化形成稳定层,厚度为25nm。
本实施例,步骤S004,贴合AF层时,是将AF液涂布在稳定层上。
实施例4:
本实施例与实施例3的区别在于:稳定层4的厚度为50nm。
本实施例制备上述薄膜的方法与实施例3的区别在于:步骤S0032中,稳定层4的厚度为50nm。
实施例5:
本实施例与实施例3的区别在于:AF层3的厚度为60nm。
本实施例制备上述薄膜的方法与实施例3的区别在于:步骤S004中,AF层3的厚度为60nm。
实施例6:
本实施例与实施例1的区别在于:透明基膜1选用厚度为50μm的TAC。
本实施例制备上述薄膜的方法与实施例3的区别在于:步骤S001中,透明基膜1选用厚度为50μm的TAC。
实施例7:
本实施例与实施例1的区别在于:底涂层2是由底涂液经热固化形成的涂层。将配置好的底涂液涂布于透明基膜1上,经烘箱加热,加热温度为130℃,固化形成厚度为3.2μm-3.5μm的底涂层。
本实施例制备上述薄膜的方法与实施例1的区别在于:步骤S002中,以热固性丙烯酸树脂作为聚合物,以二甲苯作为溶剂,将热固性丙烯酸树脂用溶剂二甲苯稀释至固含量为30%配置成底涂液。步骤S003中,将配置好的底涂液涂布于透明基膜1上,经烘箱加热,加热温度为130℃,固化形成厚度为3.2μm-3.5μm的底涂层。
对实施例1~7中制备得到的薄膜进行水接触角和摩擦系数测试,再对酒精擦拭三次后的薄膜进行水接触角和摩擦系数测试,结果如表1所示:
表1:
由表1可知,本发明制备的薄膜具有摩擦系数低且水接触角高的特点,并且稳定性较好,对水的静态接触角可稳定在115°,酒精擦拭后可保持在110°以上,摩擦系数可保持在0.1-0.02,酒精擦拭后可保持在0.1以下。
本发明提供的一种具有低摩擦系数和高水接触角的薄膜及制备方法,其薄膜具有低摩擦系数和高水接触角的特点,其制备方法加工生产快速,加工成本低,能快速实现大批量生产;克服了现有薄膜制备步骤简单,爽滑和防指纹效果差、制备工艺复杂、不适合大批量生产的缺陷。
以上所述仅是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明技术原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。
Claims (10)
1.一种具有低摩擦系数和高水接触角的薄膜,其特征在于:包括从下到上依次贴合的透明基膜(1)、底涂层(2)和AF层(3)。
2.如权利要求1所述的具有低摩擦系数和高水接触角的薄膜,其特征在于:所述底涂层(2)和所述AF层(3)之间还贴合有稳定层(4)。
3.如权利要求1所述的具有低摩擦系数和高水接触角的薄膜,其特征在于:所述透明基膜(1)的材质为PET、TAC、PC、PE、PP、PI、PMMA、TPU或PEN,所述透明基膜(1)的厚度为20μm~500μm;所述AF层(3)是由AF液固化形成的涂层,所述AF层(3)的涂层厚度在5nm~100nm。
4.如权利要求1所述的具有低摩擦系数和高水接触角的薄膜,其特征在于:所述底涂层(2)由底涂液经热固、UV固化或双固化而形成,所述底涂层(2)的涂层厚度为1μm~10μm;以质量百分含量计,所述底涂液的原料组成包括:含不饱和官能团的聚合物25~55%、溶剂40%~75%和光引发剂1%~8%,所述聚合物包括聚氨酯丙烯酸树脂、聚酯丙烯酸树脂、环氧丙烯酸树脂、氟丙烯酸树脂中的一种或几种的组合,所述溶剂包括异丙醇、丙酮、甲基异丁基酮、丁酮、丙二醇甲醚、丙二醇单丁基醚、乙酸甲酯、乙酸乙酯和乙酸丁酯中的一种或几种的混合,所述光引发剂包括2,4,6-三甲基苯甲酰基-二苯基氧化膦、1-羟基环己基苯基甲酮、2,4,6-三甲基苯甲酰基膦酸乙酯、2-甲基-1-(4-甲硫基苯基)-2-吗啉基-1-丙酮、2-异丙基硫杂蒽酮、2-苄基-2-二甲基氨基-1-(4-吗啉苯基)丁酮、苯基双(2,4,6-三甲基苯甲酰基)氧化膦中的一种或两种组合。
5.如权利要求4所述的具有低摩擦系数和高水接触角的薄膜,其特征在于:以质量百分含量计,所述底涂液的原料组成还包括可添加成分1%~5%,所述可添加成分包括纳米二氧化硅、含硅添加剂、抗静电剂中的一种或几种组合。
6.如权利要求2所述的具有低摩擦系数和高水接触角的薄膜,其特征在于:所述稳定层(4)由硅烷溶液固化形成,所述稳定层(4)的涂层厚度为5nm~150nm;以质量百分含量计,所述硅烷溶液的原料组成包括:硅烷偶联剂0.1%~2%和溶剂,所述硅烷偶联剂包括γ-氨丙基三乙氧基硅烷、γ-缩水甘油醚氧丙基三甲氧基硅烷、γ-(甲基丙烯酰氧基)丙基三甲氧基硅烷、N-(β-氨乙基)-γ-氨丙基甲基二甲氧基硅烷、γ-缩水甘油醚氧基丙基甲基二乙氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三(β-甲氧基乙氧基)硅烷中的一种或几种组合,所述溶剂包括乙醇、甲醇、异丙醇和丙酮中的一种或几种混合。
7.一种具有低摩擦系数和高水接触角的薄膜的制备方法,其特征在于,包括以下步骤:
步骤S001,取材;选取合适材料的透明基膜(1);
步骤S002,配置底涂液;将含不饱和官能团的聚合物和光引发剂用溶剂稀释,形成底涂液;
步骤S003,贴合底涂层;采用涂布的方式,将所述底涂液涂布在所述透明基膜(1)上,经烘箱加热固化、UV固化或双固化后形成底涂层(2);
步骤S004,贴合AF层;采用涂布的方式,将AF液涂布在所述步骤S003中成形的半成品上,经烘箱加热后交联固化形成AF层(3)。
8.如权利要求7所述的具有低摩擦系数和高水接触角的薄膜的制备方法,其特征在于,所述步骤S003还包括以下步骤:
步骤S0031,配置硅烷溶液;将硅烷偶联剂用溶剂稀释,形成硅烷溶液;
步骤S0032,贴合稳定层;采用涂布的方式,将所述硅烷溶液涂布在所述底涂层(2)上,经烘箱加热后交联固化形成稳定层(4)。
9.如权利要求7所述的具有低摩擦系数和高水接触角的薄膜的制备方法,其特征在于:所述底涂层(2)的涂层厚度为1μm~10μm;以质量百分含量计,所述底涂液的原料组成包括:含不饱和官能团的聚合物25~55%、溶剂40%~75%和光引发剂1%~8%,所述聚合物包括聚氨酯丙烯酸树脂、聚酯丙烯酸树脂、环氧丙烯酸树脂、氟丙烯酸树脂中的一种或几种的组合,所述溶剂包括异丙醇、丙酮、甲基异丁基酮、丁酮、丙二醇甲醚、丙二醇单丁基醚、乙酸甲酯、乙酸乙酯和乙酸丁酯中的一种或几种的混合,所述光引发剂包括2,4,6-三甲基苯甲酰基-二苯基氧化膦、1-羟基环己基苯基甲酮、2,4,6-三甲基苯甲酰基膦酸乙酯、2-甲基-1-(4-甲硫基苯基)-2-吗啉基-1-丙酮、2-异丙基硫杂蒽酮、2-苄基-2-二甲基氨基-1-(4-吗啉苯基)丁酮、苯基双(2,4,6-三甲基苯甲酰基)氧化膦中的一种或两种组合。
10.如权利要求8所述的具有低摩擦系数和高水接触角的薄膜的制备方法,其特征在于:所述稳定层(4)的涂层厚度为5nm~150nm;以质量百分比计算,所述硅烷溶液的原料组成包括:硅烷偶联剂0.1%~2%和溶剂,所述硅烷偶联剂包括γ-氨丙基三乙氧基硅烷、γ-缩水甘油醚氧丙基三甲氧基硅烷、γ-(甲基丙烯酰氧基)丙基三甲氧基硅烷、N-(β-氨乙基)-γ-氨丙基甲基二甲氧基硅烷、γ-缩水甘油醚氧基丙基甲基二乙氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三(β-甲氧基乙氧基)硅烷中的一种或几种组合,所述溶剂包括乙醇、甲醇、异丙醇和丙酮中的一种或几种混合。
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