CN111244586A - Method for preparing periodic gear-shaped terahertz band-pass filter structure - Google Patents
Method for preparing periodic gear-shaped terahertz band-pass filter structure Download PDFInfo
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- CN111244586A CN111244586A CN202010043856.2A CN202010043856A CN111244586A CN 111244586 A CN111244586 A CN 111244586A CN 202010043856 A CN202010043856 A CN 202010043856A CN 111244586 A CN111244586 A CN 111244586A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/20—Frequency-selective devices, e.g. filters
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
- H01P11/007—Manufacturing frequency-selective devices
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Abstract
The invention discloses a method for preparing a periodic gear-shaped terahertz band-pass filter structure, which comprises the steps of firstly spin-coating AZ4562 photoresist on a smooth quartz glass sheet with a certain thickness, developing to obtain a groove of the structure, then evaporating a metal seed layer to cover the surface layer and the groove of the quartz glass sheet, and then adding (NH)4)2S2O8And (3) corroding the surface layer of the quartz glass sheet and a small amount of metal in the groove by using ammonium persulfate solution, and finally removing the residual positive photoresist by adding an AZ400T degumming agent. The periodic gear-shaped terahertz band-pass filter structure is obtained by utilizing the technologies of wet etching, UV-LIGA photoetching, evaporation and the like, and the problems of complex process and difficulty in realizing small size in the conventional preparation of the micron-sized terahertz band-pass filter structure are solved.
Description
Technical Field
The invention relates to the technical field of electromagnetic wave devices and micromachining, in particular to a method for preparing a periodic gear-shaped terahertz band-pass filter structure.
Background
Terahertz waves, refers to electromagnetic radiation having a frequency from 0.1THz to 10 THz. Terahertz waves are between microwaves and infrared radiation in the electromagnetic spectrum, and the information content of the band in the universe accounts for 50% of the total information content. However, until the 80's of the 20 th century, the research and understanding of various characteristics of terahertz waves was very limited, and thus, it was called a so-called "terahertz gap" between far-infrared rays and millimeter waves.
Terahertz filters are an extremely important passive device. In practical application, due to the limitation of application environment noise and application requirements, unnecessary frequency range and noise need to be filtered, and the performance of a system is improved, so that the terahertz filter has important application in practice.
The terahertz filter structure researched and proposed at home and abroad at present is often very complex, the processing technology is complex in the processing process, and the size is small and difficult to realize. The invention provides a preparation method for obtaining a periodic gear-shaped terahertz band-pass filter structure by utilizing the technologies of wet etching, UV-LIGA photoetching, evaporation and the like, and solves the problems.
Disclosure of Invention
The invention aims to provide a method for preparing a periodic gear-shaped terahertz band-pass filter structure, and solves the problems that the existing micron-sized terahertz filter structure is complex in process and difficult to realize small size.
In order to achieve the purpose, the invention provides the following scheme:
the invention discloses a method for preparing a periodic gear-shaped terahertz band-pass filter structure, which specifically comprises the following steps:
firstly, selecting a smooth high-temperature-resistant glass sheet with the 4cmx4cm specification and a smooth surface, sequentially carrying out ultrasonic cleaning by using acetone, ethanol and pure water, drying and cooling, then spin-coating a layer of AZ4562 positive photoresist with the thickness of 10 mu m on the upward surface of the quartz glass sheet, and pre-drying and cooling at the temperature of 110 ℃.
Then, the quartz glass sheet coated with the AZ4562 positive photoresist is placed under a chromium plating mask plate which is engraved with patterns and is made of glass materials and has the thickness of 3mm, and is exposed by using ultraviolet light with the wavelength of 365 nm;
then immersing the quartz glass sheet in AZ400K developing solution with the concentration of 2.14 percent for developing and removing the exposed positive photoresist, cleaning with pure water and drying the quartz glass sheet with nitrogen to obtain the required groove of the filter structure;
then, evaporating a metal seed layer with the thickness of 400-plus-500 nm on the positive glue surface layer and the groove surface of the quartz glass sheet by using 1g of copper; the quartz glass plate was then immersed in (NH) at a concentration of 20%4)2S2O8Removing surface metal of the quartz glass sheet and a small amount of groove surface metal from the solution;
and cleaning with pure water, and after drying by blowing with nitrogen, immersing the quartz glass sheet in an AZ400T degumming agent to remove the residual positive photoresist, thereby obtaining the periodic gear-shaped terahertz band-pass filter structure.
According to the method, the periodic gear-shaped terahertz band-pass filter structure is directly prepared on the quartz glass substrate, and the quartz glass is also a part of the filter, so that the processing technology is simplified, and meanwhile, the problem that a filter device with the level of 1 micrometer is difficult to process is solved.
According to the specific embodiment provided by the invention, the invention discloses the following technical effects:
the invention discloses a method for preparing a periodic gear-shaped terahertz band-pass filter structure, which comprises the steps of spin-coating positive photoresist on a quartz glass sheet, exposing and developing to obtain a filter structure groove with a large depth-to-width ratio, then evaporating a thin metal seed layer on the surface layer of the quartz glass sheet and the surface of the groove, and using (NH) with the concentration of 20%4)2S2O8The solution erodes the surface metal of the quartz glass sheet and a small amount of groove surface metal, because the contact area of the ammonium persulfate solution and the surface metal of the quartz glass is large, the reaction speed is high, and because the contact area of the groove surface metal and the solution is small, the reaction is slow, and finally the filter structure with the height of 200-300nm can be obtained. The method has the advantages of simple preparation steps, simple process and small processing size, and is favorable for promoting the integration of microwave passive devices.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without inventive exercise.
FIG. 1 is a flow chart of a manufacturing process according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a structural unit of a terahertz filter according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a mask used in the UV-LIGA photolithography process according to an embodiment of the present invention;
fig. 4 is a schematic structural diagram of a terahertz band-pass filter according to an embodiment of the present invention.
In the figure: 1-is a periodic gear-shaped terahertz band-pass filter structure, a 2-quartz glass sheet, 3-positive photoresist, a 4-metal seed layer and a 5-terahertz band-pass filter structure unit.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The invention aims to provide a method for preparing a periodic gear-shaped terahertz band-pass filter structure.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.
As shown in fig. 1 to 4, a method for manufacturing a periodic gear-shaped terahertz band-pass filter structure specifically includes the following steps:
the periodic gear-shaped terahertz band-pass filter structure 1 consists of a plurality of terahertz band-pass filter structure units 5;
selecting a quartz glass sheet 2 with the specification of 4cmx4cm and a smooth surface, sequentially carrying out ultrasonic cleaning by using acetone, ethanol and pure water, drying and cooling;
coating a layer of AZ4562 positive photoresist 3 with the thickness of 10 mu m on a quartz glass sheet 2 in a spinning way, and then pre-baking and cooling at the temperature of 110 ℃;
the quartz glass plate 2 coated with the AZ4562 positive photoresist 3 was placed under a chromium plating mask plate having a thickness of 3mm, engraved with a pattern 6, made of glass material, as shown in FIG. 3, and exposed to ultraviolet light having a wavelength of about 365nm at an exposure intensity of 1000cm2S; then immersing the quartz glass sheet in AZ400K developing solution with the concentration of 2.14% for developing for 10-12min and removing the exposed positive photoresist, cleaning with pure water and drying the quartz glass sheet by nitrogen to obtain a required filter structure groove;
1g of copper is used for evaporating a metal seed layer 4 with the thickness of 400-500nm on the positive glue surface layer and the groove surface of the quartz glass sheet; the quartz glass plate was then immersed in (NH) at a concentration of 20%4)2S2O8Removing surface metal of the quartz glass sheet and a small amount of groove surface metal in the solution for 1-2 min; and cleaning with pure water, drying with nitrogen, immersing the quartz glass sheet in an AZ400T degumming agent for 5-7min to remove the residual positive glue, and obtaining the periodic gear-shaped terahertz band-pass filter structure 5.
According to the invention, the periodic gear-shaped terahertz band-pass filter structure 1 is prepared on the quartz glass sheet 2, and the quartz glass sheet 2 is also a part of the periodic gear-shaped terahertz band-pass filter structure 1, so that the preparation process is simple, and the problem that a filter device of 1 micron level is difficult to process is solved.
The principles and embodiments of the present invention have been described herein using specific examples, which are provided only to help understand the method and the core concept of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, the specific embodiments and the application range may be changed. In summary, this summary should not be construed to limit the present invention.
Claims (7)
1. A method for preparing a periodic gear-shaped terahertz band-pass filter structure is characterized by comprising the following steps:
first selecting the ones that are smoothCarrying out ultrasonic cleaning on a quartz glass sheet with a smooth surface of 4cmx4cm specification by using acetone, ethanol and pure water in sequence, after drying and cooling, spin-coating a layer of AZ4562 positive photoresist with the thickness of 10 microns on the upward surface of the quartz glass sheet, carrying out pre-drying and cooling at the temperature of 110 ℃, then placing the quartz glass sheet coated with the AZ4562 positive photoresist under a chromium plating mask plate with patterns, glass materials and the thickness of 3mm, and exposing by using ultraviolet light with the wavelength of 365 nm; immersing the quartz glass sheet in AZ400K developing solution with the concentration of 2.14 percent for developing and removing the exposed positive photoresist, cleaning with pure water and drying the quartz glass sheet by nitrogen to obtain a required filter structure groove; then, evaporating a metal seed layer with the thickness of 400-plus-500 nm on the positive glue surface layer and the groove surface of the quartz glass sheet by using 1g of copper; the quartz glass plate was then immersed in (NH) at a concentration of 20%4)2S2O8Removing surface metal of the quartz glass sheet and a small amount of groove surface metal from the solution; and cleaning with pure water, and after drying by blowing with nitrogen, immersing the quartz glass sheet in an AZ400T degumming agent to remove the residual positive photoresist, thereby obtaining the periodic gear-shaped terahertz band-pass filter structure.
2. The method for preparing the structure of the periodic gear-shaped terahertz band-pass filter according to claim 1, wherein the cleaned upward side of the quartz glass sheet is coated with 10 μm of AZ4562 positive photoresist, and is subjected to pre-baking and cooling at a temperature of 110 ℃.
3. The method for preparing the structure of the periodic gear-shaped terahertz band-pass filter according to claim 1, wherein the quartz glass plate coated with the AZ4562 positive photoresist is placed under a chromium plating mask plate with patterns, glass material and thickness of 3mm, and is exposed by using ultraviolet light with wavelength of about 365 nm.
4. The method for preparing the periodic gear-shaped terahertz band-pass filter structure according to claim 1, wherein the exposed quartz glass sheet is immersed in AZ400K developer with concentration of 2.14% for development and exposed positive photoresist is removed to obtain the required filter structure groove.
5. The method for preparing the structure of the periodic gear-shaped terahertz band-pass filter as claimed in claim 1, wherein a metal seed layer with a thickness of 400-500nm is formed on the positive glue surface layer and the groove surface of the quartz glass sheet by evaporating 1g of copper.
6. The method for manufacturing a periodic gear-shaped terahertz band-pass filter structure according to claim 1, wherein the evaporated quartz glass piece is immersed in (NH) at a concentration of 20%4)2S2O8And removing the surface metal of the quartz glass sheet and a small amount of groove surface metal from the solution.
7. The method for preparing the periodic gear-shaped terahertz band-pass filter structure according to claim 1, wherein the quartz glass sheet after the metal layer is removed is immersed in an AZ400T degumming agent to remove residual positive glue, so that the periodic gear-shaped terahertz band-pass filter structure is obtained.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113745778A (en) * | 2021-09-03 | 2021-12-03 | 合肥工业大学 | Dual-band polarization sensitive band-stop filter and preparation method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060216742A1 (en) * | 2004-08-04 | 2006-09-28 | Intel Corporation | Methods and systems for detecting biomolecular binding using terahertz radiation |
| CN104764711A (en) * | 2015-04-17 | 2015-07-08 | 中国科学院重庆绿色智能技术研究院 | Terahertz metamaterial biosensing chip and testing method thereof |
| CN104931137A (en) * | 2015-05-25 | 2015-09-23 | 上海理工大学 | Terahertz resonator plasma chip and preparation method thereof |
| CN105048028A (en) * | 2015-07-23 | 2015-11-11 | 北京交通大学 | Terahertz filter and manufacturing method thereof |
| CN106653929A (en) * | 2016-09-18 | 2017-05-10 | 北京华碳元芯电子科技有限责任公司 | Semiconductor type carbon nanotube infrared light detecting and imaging device |
| CN109841939A (en) * | 2019-01-31 | 2019-06-04 | 中国科学院上海微系统与信息技术研究所 | Passive filter and preparation method thereof |
-
2020
- 2020-01-15 CN CN202010043856.2A patent/CN111244586A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060216742A1 (en) * | 2004-08-04 | 2006-09-28 | Intel Corporation | Methods and systems for detecting biomolecular binding using terahertz radiation |
| CN104764711A (en) * | 2015-04-17 | 2015-07-08 | 中国科学院重庆绿色智能技术研究院 | Terahertz metamaterial biosensing chip and testing method thereof |
| CN104931137A (en) * | 2015-05-25 | 2015-09-23 | 上海理工大学 | Terahertz resonator plasma chip and preparation method thereof |
| CN105048028A (en) * | 2015-07-23 | 2015-11-11 | 北京交通大学 | Terahertz filter and manufacturing method thereof |
| CN106653929A (en) * | 2016-09-18 | 2017-05-10 | 北京华碳元芯电子科技有限责任公司 | Semiconductor type carbon nanotube infrared light detecting and imaging device |
| CN109841939A (en) * | 2019-01-31 | 2019-06-04 | 中国科学院上海微系统与信息技术研究所 | Passive filter and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 王小康: ""220GHz太赫兹带通滤波器设计及加工"", 《万方数据库》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113745778A (en) * | 2021-09-03 | 2021-12-03 | 合肥工业大学 | Dual-band polarization sensitive band-stop filter and preparation method thereof |
| CN113745778B (en) * | 2021-09-03 | 2022-03-29 | 合肥工业大学 | Preparation method of dual-band polarization sensitive band-stop filter |
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Application publication date: 20200605 |