CN111229711A - 新型晶圆半导体生产辅助设备 - Google Patents
新型晶圆半导体生产辅助设备 Download PDFInfo
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- CN111229711A CN111229711A CN202010058708.8A CN202010058708A CN111229711A CN 111229711 A CN111229711 A CN 111229711A CN 202010058708 A CN202010058708 A CN 202010058708A CN 111229711 A CN111229711 A CN 111229711A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 238000004140 cleaning Methods 0.000 claims abstract description 84
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 50
- 238000001914 filtration Methods 0.000 claims description 25
- 238000005406 washing Methods 0.000 claims description 13
- 239000010865 sewage Substances 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 241000220317 Rosa Species 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005381 potential energy Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
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- B08B1/20—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/044—Cleaning involving contact with liquid using agitated containers in which the liquid and articles or material are placed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/045—Cleaning involving contact with liquid using perforated containers, e.g. baskets, or racks immersed and agitated in a liquid bath
- B08B3/047—Containers specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010058708.8A CN111229711B (zh) | 2020-01-19 | 2020-01-19 | 新型晶圆半导体生产辅助设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010058708.8A CN111229711B (zh) | 2020-01-19 | 2020-01-19 | 新型晶圆半导体生产辅助设备 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN111229711A true CN111229711A (zh) | 2020-06-05 |
CN111229711B CN111229711B (zh) | 2021-11-23 |
Family
ID=70866862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202010058708.8A Active CN111229711B (zh) | 2020-01-19 | 2020-01-19 | 新型晶圆半导体生产辅助设备 |
Country Status (1)
Country | Link |
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CN (1) | CN111229711B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113458076A (zh) * | 2021-06-16 | 2021-10-01 | 江苏飞船股份有限公司 | 一种齿轮制造清洗设备 |
CN113770113A (zh) * | 2021-09-10 | 2021-12-10 | 安徽富乐德科技发展股份有限公司 | 一种半导体清洗装置 |
CN113909198A (zh) * | 2021-09-06 | 2022-01-11 | 邱献超 | 一种晶圆半导体加工用清洗装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4957128A (en) * | 1989-11-28 | 1990-09-18 | Chen Ching Shih | Compact, vibrating-type contact lens cleaner |
JPH08215647A (ja) * | 1995-02-13 | 1996-08-27 | Hitachi Ltd | 洗浄装置 |
CN205949403U (zh) * | 2016-06-30 | 2017-02-15 | 江西大杰新能源技术有限公司 | 一种硅片超声波清洗槽的清洗液循环过滤装置 |
CN206794265U (zh) * | 2017-05-08 | 2017-12-26 | 济源石晶光电频率技术有限公司 | 一种清洗大尺寸石英晶片的清洗装置 |
CN110238122A (zh) * | 2019-07-18 | 2019-09-17 | 陕西科技大学 | 一种石英晶片清洗装置及清洗方法 |
CN110508556A (zh) * | 2019-09-25 | 2019-11-29 | 福州腾景光电科技有限公司 | 一种单槽超声波清洁用辅助装置 |
CN211707572U (zh) * | 2020-01-19 | 2020-10-20 | 浙江蓝特光学股份有限公司 | 新型晶圆半导体生产辅助设备 |
-
2020
- 2020-01-19 CN CN202010058708.8A patent/CN111229711B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4957128A (en) * | 1989-11-28 | 1990-09-18 | Chen Ching Shih | Compact, vibrating-type contact lens cleaner |
JPH08215647A (ja) * | 1995-02-13 | 1996-08-27 | Hitachi Ltd | 洗浄装置 |
CN205949403U (zh) * | 2016-06-30 | 2017-02-15 | 江西大杰新能源技术有限公司 | 一种硅片超声波清洗槽的清洗液循环过滤装置 |
CN206794265U (zh) * | 2017-05-08 | 2017-12-26 | 济源石晶光电频率技术有限公司 | 一种清洗大尺寸石英晶片的清洗装置 |
CN110238122A (zh) * | 2019-07-18 | 2019-09-17 | 陕西科技大学 | 一种石英晶片清洗装置及清洗方法 |
CN110508556A (zh) * | 2019-09-25 | 2019-11-29 | 福州腾景光电科技有限公司 | 一种单槽超声波清洁用辅助装置 |
CN211707572U (zh) * | 2020-01-19 | 2020-10-20 | 浙江蓝特光学股份有限公司 | 新型晶圆半导体生产辅助设备 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113458076A (zh) * | 2021-06-16 | 2021-10-01 | 江苏飞船股份有限公司 | 一种齿轮制造清洗设备 |
CN113458076B (zh) * | 2021-06-16 | 2022-04-19 | 江苏飞船股份有限公司 | 一种齿轮制造清洗设备 |
CN113909198A (zh) * | 2021-09-06 | 2022-01-11 | 邱献超 | 一种晶圆半导体加工用清洗装置 |
CN113909198B (zh) * | 2021-09-06 | 2023-09-01 | 天津晟龙科技发展有限公司 | 一种晶圆半导体加工用清洗装置 |
CN113770113A (zh) * | 2021-09-10 | 2021-12-10 | 安徽富乐德科技发展股份有限公司 | 一种半导体清洗装置 |
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Publication number | Publication date |
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CN111229711B (zh) | 2021-11-23 |
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: New wafer semiconductor production auxiliary equipment Effective date of registration: 20230625 Granted publication date: 20211123 Pledgee: Zhejiang Hecheng Rural Commercial Bank Co.,Ltd. Pledgor: ZHEJIANG LANTE OPTICS Co.,Ltd. Registration number: Y2023980045439 |
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PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20231120 Granted publication date: 20211123 Pledgee: Zhejiang Hecheng Rural Commercial Bank Co.,Ltd. Pledgor: ZHEJIANG LANTE OPTICS Co.,Ltd. Registration number: Y2023980045439 |
|
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: New wafer semiconductor production auxiliary equipment Effective date of registration: 20231123 Granted publication date: 20211123 Pledgee: Zhejiang Hecheng Rural Commercial Bank Co.,Ltd. Pledgor: ZHEJIANG LANTE OPTICS Co.,Ltd. Registration number: Y2023980067181 |