CN111041430A - Production process of high-temperature-resistant diamond-like carbon film layer - Google Patents
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- CN111041430A CN111041430A CN202010026743.1A CN202010026743A CN111041430A CN 111041430 A CN111041430 A CN 111041430A CN 202010026743 A CN202010026743 A CN 202010026743A CN 111041430 A CN111041430 A CN 111041430A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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Abstract
The invention relates to a production process of a high-temperature-resistant diamond-like film layer, which comprises the steps of assembling a substrate material in a vacuum container, vacuumizing the vacuum container, cleaning the surface of the substrate material by adopting an ion beam cleaning process after vacuumizing, and then performing pure ion vacuum coating treatment on the surface cleaned by adopting a pure ion vacuum coating process, wherein the coated film layer is a diamond-like Ta-C film layer. According to the technical scheme provided by the invention, before pure ion vacuum coating, the surface of the substrate material is cleaned by adopting an ion beam cleaning process, so that gas molecules adsorbed on the surface of the substrate material are completely removed, and the bonding strength of the film material is obviously improved. Meanwhile, the temperature requirement of the coating process of the pure ion vacuum coating is low, and the temperature resistance requirement of the insulating material is met.
Description
Technical Field
The invention relates to the field of material surface treatment, in particular to a production process of a high-temperature-resistant diamond-like carbon film layer.
Background
A diamond-Like carbon (DLC) film layer comprising carbon element and SP3And SP2Amorphous formed by bonding of bond formsThe amorphous carbon film has a diamond-like structure. The film layer has the excellent characteristics of diamond and graphite, and has high hardness, corrosion resistance, good optical performance and excellent tribological characteristics. The diamond-like carbon film can be widely applied to the industries of semiconductors, consumer electronics, precision molds, cutting conductors, war industry, aerospace, health care and the like.
The mainstream manufacturing methods of DLC include vacuum magnetron sputtering (Sputter) and Chemical Vapor Deposition (CVD), and diamond SP is a diamond-like film layer manufactured by the conventional method3The bond content is about 20-30%, and the amorphous carbon film contains a certain diamond component. The diamond-like carbon film layer obtained in the above way has the following defects: not high temperature resistant, highest working temperature<The temperature of 200 ℃ is higher than 200 ℃, and the film layer can be carbonized and peeled off quickly; the bonding force between the film layer and the substrate is relatively weak; the film layer is loose and not compact.
In order to solve the problem of binding force in the existing vacuum coating, a heating method is generally adopted: the vacuum coating temperature is increased to more than 400 ℃, the molecular thermal motion capability is increased, and the binding force and the density of the film layer are improved. However, most insulating materials, especially plastics, are resistant to temperatures below 200 ℃ and cannot bear the high temperature of vacuum coating, so that the existing vacuum coating technology cannot effectively improve the bonding force of the film layer for insulating material substrate products, especially materials such as plastics, resins and the like.
Disclosure of Invention
The invention aims to provide a production process of a high-temperature-resistant diamond-like carbon film layer.
The technical scheme adopted by the invention is as follows:
a production process of a high-temperature-resistant diamond-like carbon film layer is characterized by comprising the following steps: assembling a substrate material in a vacuum container, vacuumizing the vacuum container, firstly carrying out ion beam cleaning treatment on the surface of the substrate material by adopting an ion beam cleaning process after vacuumizing, and then carrying out pure ion vacuum coating treatment on the surface subjected to the ion beam cleaning treatment by adopting a pure ion vacuum coating process, wherein the coated film layer is a diamond-like Ta-C film layer.
The detailed scheme is as follows:
the process gas can be injected into the vacuum container in the process of the pure ion vacuum coating treatment process, and the process gas comprises the following components: ar, C2H2、C2H4、C2H6。
The cathode coating target in the pure ion vacuum coating treatment is a high-purity graphite target, the voltage of the ion beam cleaning treatment is 300-5000V, and the Ar ion energy is as follows: 200-5000 eV, and the substrate material comprises metal, alloy, glass, resin, plastic and ceramic.
The pure ion current parameter in the pure ion vacuum coating treatment is 20-300A, the diameter of the electromagnetic filter tube in the pure ion vacuum coating treatment is 0.1-0.8 m, the length of the electromagnetic filter tube is 0.2-1.5 m, and the filtering magnetic field in the electromagnetic filter tube is 30-3000 Gs.
The electromagnetic scanning magnetic field is 10-3000 Gs during the pure ion vacuum coating process.
The thickness of the coating layer is 0-50 um.
The bias voltage applied to the substrate material when the substrate material is subjected to pure ion vacuum coating treatment is-10000-0V.
The temperature in the vacuum container is 0-150 ℃ when the substrate material is subjected to pure ion vacuum coating treatment, and the vacuum degree range of the vacuum container for vacuumizing is 10-1～10-5Pa。
The film layer plated on the substrate material is of a layered structure, and the material compositions of all layers are the same or different.
Before the adjacent layer is coated, ion beam cleaning treatment can be carried out.
Compared with the prior art, the technical scheme provided by the invention has the advantages that before pure ion vacuum coating, the surface of the substrate material is cleaned by adopting an ion beam cleaning process, so that gas molecules adsorbed on the surface of the substrate material are completely removed, and the bonding strength of the film layer is obviously improved. Meanwhile, the requirement on the coating temperature of the pure ion vacuum coating is low, and the requirement on the temperature resistance of the insulating material is met.
Drawings
Fig. 1 is a schematic structural diagram of a pure ion vacuum coating system.
100-vacuum container, 200-substrate material, 300-ion beam cleaning equipment, 410-pure ion coating equipment, 411-plasma trigger device, 412-cathode, 413-anode, 420-electromagnetic filter device, 430-electromagnetic scanning device and 500-vacuum pumping device.
Detailed Description
In order that the objects and advantages of the invention will be more clearly understood, the following description is given in conjunction with the accompanying examples. It is to be understood that the following text is merely illustrative of one or more specific embodiments of the invention and does not strictly limit the scope of the invention as specifically claimed.
As used herein, the terms "parallel," "perpendicular," and the like are not limited to their strict geometric definition, but include tolerances for machining or human error, reasonable and inconsistent.
The structure is shown in fig. 1, which is a vacuum coating system for coating according to the present invention, and the vacuum coating system includes a vacuum container 100, the vacuum container 100 is connected to a vacuum pumping device 500, an assembling device for assembling a substrate material 200 to be coated is disposed in the vacuum container 100, and an ion beam cleaning device 300 and a pure ion coating device 410 are further disposed on the vacuum container 100. The specific ion beam cleaning apparatus 300 and the pure ion plating apparatus 410 are disposed correspondingly on the side wall of the vacuum vessel 100. The assembling device is connected with the adjusting device, and the adjusting device adjusts the substrate material 100 to rotate, so that the surface to be processed of the substrate material 100 can be arranged corresponding to the ion beam cleaning equipment 300 and the pure ion plating equipment 410. The mounting device is connected to a bias power supply.
In detail, the pure ion plating apparatus 410 includes a cathode 412, an anode 413, and a plasma trigger 411, wherein the plasma trigger 411 is connected to the vacuum vessel 100 through an electromagnetic filter 420. The outlet end of the electromagnetic filtering device 420 is provided with an electromagnetic scanning device 430. The electromagnetic filtering device 420 comprises a filtering pipe with the radian of 30-180 degrees, a magnetic field filtering device is arranged on the filtering pipe, the length of the filtering pipe is 0.2-1.5 m, and the diameter of the filtering pipe is 0.1-0.8 m. The electromagnetic scanning device 430 includes a straight tube with a filtering tube outlet end arranged along the length direction, the diameter of the straight tube is consistent with that of the filtering tube, and a scanning magnetic field device is arranged on the straight tube. The base material is mounted in the vacuum container in a pedestal supporting or hanging manner. The bias power supply is a negative voltage power supply of-10000V-0V. The material of the filter pipe can be stainless steel, pure copper, copper alloy and aluminum alloy.
The example of using the vacuum coating system to realize the material surface metallization is as follows:
example 1
The substrate material is stainless steel, the substrate material is clamped in a vacuum container through an assembling device, and a vacuumizing device is started to vacuumize the vacuum container, so that the pressure in the vacuum container is 10-4Pa magnitude, adjusting the rotation of the rotating structure to enable the surface to be processed of the substrate material to be arranged corresponding to the ion beam cleaning device, and performing ion beam cleaning treatment on the surface of the substrate material by adopting an ion beam cleaning process, wherein the voltage of the ion beam cleaning treatment is 5000V, and the energy of Ar ions is as follows: 5000 eV. After the ion beam cleaning is finished, the substrate material is rotated to enable the surface after the cleaning treatment to be arranged corresponding to the pure ion vacuum coating equipment, the substrate material is connected with a negative pressure power supply of-10000V, and the temperature in the vacuum container is controlled to be 150 ℃. High-purity graphite is used as a coating target material of a cathode, a plasma trigger device is driven by compressed gas or a motor, and the current parameter of pure ions is 100A; adjusting the filtering magnetic field device to make the magnetic field in the filtering pipe: 3000 Gs; adjusting the scanning magnetic field device to make the scanning magnetic field: 3000 Gs; so that the thickness of the film coated layer on the base material was 5 μm.
Example 2
The base material is aluminum alloy, the base material is clamped in the vacuum container through the assembling device, and the vacuum-pumping device is started to vacuumize the vacuum container, so that the pressure in the vacuum container is 10-3Pa magnitude, adjusting the rotation of the rotating structure to enable the surface to be processed of the substrate material to be arranged corresponding to the ion beam cleaning device, and performing ion beam cleaning treatment on the surface of the substrate material by adopting an ion beam cleaning process, wherein the voltage of the ion beam cleaning treatment is 1000V, and the energy of Ar ions is as follows: 1000 eV. After the ion beam cleaning is finished, the substrate is rotatedThe material enables the surface after cleaning treatment to be arranged corresponding to the pure ion vacuum coating equipment, the substrate material is connected with a negative pressure power supply of-500V, and the temperature in the vacuum container is controlled to be 80 ℃. High-purity graphite is used as a coating target material of a cathode, a plasma trigger device is driven by compressed gas or a motor, and the current parameter of pure ions is 300A; adjusting the filtering magnetic field device to make the magnetic field in the filtering pipe: 100 Gs; adjusting the scanning magnetic field device to make the scanning magnetic field: 500 Gs; so that the thickness of the coating layer on the base material is 2 microns.
Example 3
The substrate material is glass, the substrate material is clamped in a vacuum container through an assembling device, and a vacuumizing device is started to vacuumize the vacuum container, so that the pressure in the vacuum container is 10-5Pa magnitude, adjusting the rotation of the rotating structure to enable the surface to be processed of the substrate material to be arranged corresponding to the ion beam cleaning device, and performing ion beam cleaning treatment on the surface of the substrate material by adopting an ion beam cleaning process, wherein the voltage of the ion beam cleaning treatment is 500V, and the energy of Ar ions is as follows: 500 eV. After the ion beam cleaning is finished, the substrate material is rotated to enable the surface after the cleaning treatment to be arranged corresponding to the pure ion vacuum coating equipment, the substrate material is connected with a negative pressure power supply of-100V, and the temperature in the vacuum container is controlled to be 120 ℃. High-purity graphite is used as a coating target material of a cathode, a plasma trigger device is driven by compressed gas or a motor, and the current parameter of pure ions is 30A; adjusting the filtering magnetic field device to make the magnetic field in the filtering pipe: 1000 Gs; adjusting the scanning magnetic field device to make the scanning magnetic field: 100 Gs; so that the thickness of the plated film on the base material was 50 μm.
Example 4
The base material is resin, the base material is clamped in a vacuum container through an assembling device, and a vacuumizing device is started to vacuumize the vacuum container, so that the pressure in the vacuum container is 10-3Pa magnitude, adjusting the rotation of the rotating structure to make the surface of the substrate material to be processed arranged corresponding to the ion beam cleaning device, performing ion beam cleaning treatment on the surface of the substrate material by adopting an ion beam cleaning process, wherein the voltage of the ion beam cleaning treatment is 300V,energy of Ar ion: 200 eV. After the ion beam cleaning is finished, the substrate material is rotated to enable the surface after the cleaning treatment to be arranged corresponding to the pure ion vacuum coating equipment, the substrate material is connected with a negative pressure power supply of-200V, and the temperature in the vacuum container is controlled to be 65 ℃. High-purity graphite is used as a coating target material of a cathode, a plasma trigger device is driven by compressed gas or a motor, and the pure ion current parameter is 60A; adjusting the filtering magnetic field device to make the magnetic field in the filtering pipe: 600 Gs; adjusting the scanning magnetic field device to make the scanning magnetic field: 300 Gs; so that the thickness of the plated film on the base material was 10 μm.
Example 5
The base material is plastic, the base material is clamped in the vacuum container through the assembling device, and the vacuum-pumping device is started to vacuumize the vacuum container, so that the pressure in the vacuum container is 10-3Pa magnitude, adjusting the rotation of the rotating structure to enable the surface to be processed of the substrate material to be arranged corresponding to the ion beam cleaning device, and performing ion beam cleaning treatment on the surface of the substrate material by adopting an ion beam cleaning process, wherein the voltage of the ion beam cleaning treatment is 1500V, and the energy of Ar ions: 1300 eV. After the ion beam cleaning is finished, the substrate material is rotated to enable the surface after the cleaning treatment to be arranged corresponding to the pure ion vacuum coating equipment, the substrate material is connected with a negative pressure power supply of-50V, and the temperature in the vacuum container is controlled to be 50 ℃. High-purity graphite is used as a coating target material of a cathode, a plasma trigger device is driven by compressed gas or a motor, and the pure ion current parameter is 80A; adjusting the filtering magnetic field device to make the magnetic field in the filtering pipe: 800 Gs; adjusting the scanning magnetic field device to make the scanning magnetic field: 800 Gs; so that the thickness of the plated film on the base material is 20 μm.
Example 6
The substrate material is ceramic, the substrate material is clamped in a vacuum container through an assembling device, and a vacuumizing device is started to vacuumize the vacuum container, so that the pressure in the vacuum container is 10-4Pa magnitude, adjusting the rotation of the rotating structure to make the surface to be treated of the substrate material arranged corresponding to the ion beam cleaning device, and performing ion beam cleaning process on the surface of the substrate materialIon beam cleaning treatment, wherein the voltage of the ion beam cleaning treatment is 1200V, and the Ar ion energy is as follows: 1100 eV. After the ion beam cleaning is finished, the substrate material is rotated to enable the surface after the cleaning treatment to be arranged corresponding to the pure ion vacuum coating equipment, the substrate material is connected with a negative pressure power supply of-80V, and the temperature in the vacuum container is controlled to be 150 ℃. High-purity graphite is used as a coating target material of a cathode, a plasma trigger device is driven by compressed gas or a motor, and the current parameter of pure ions is 200A; adjusting the filtering magnetic field device to make the magnetic field in the filtering pipe: 300 Gs; adjusting the scanning magnetic field device to make the scanning magnetic field: 300 Gs; so that the thickness of the plated film on the base material was 6 μm.
The high-temperature resistant diamond-like carbon film layers prepared in the above embodiments 1 to 6 were detected, and the detection results were as follows:
the vacuum container is pumped to a specified vacuum condition through a vacuum pumping device, the cathode coating target material is excited to generate plasma by a plasma trigger device, the plasma is filtered and purified when passing through an electromagnetic filtering device, coating particles are removed, and only positive ions and electrons can pass through the electromagnetic filtering device; when the plasma reaches the tail end of the electromagnetic filtering device, the plasma is changed into a pure charged ion beam; the pure charged ion beam current is controlled by the electromagnetic scanning system, the flying direction is changed, the substrate material is connected with the negative-pressure power supply, an electric field is formed, the pure charged ions are accelerated by the electric field in the flying process and are deposited on the surface of a plated product with large energy, and therefore a compact and uniform coating layer with high bonding strength is formed on the surface of the substrate material.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that those skilled in the art can make various improvements and modifications without departing from the principle of the present invention, and these improvements and modifications should also be construed as the protection scope of the present invention. Structures, devices, and methods of operation not specifically described or illustrated herein are generally practiced in the art without specific recitation or limitation.
Claims (10)
1. A production process of a high-temperature-resistant diamond-like carbon film layer is characterized by comprising the following steps: assembling a substrate material in a vacuum container, vacuumizing the vacuum container, firstly carrying out ion beam cleaning treatment on the surface of the substrate material by adopting an ion beam cleaning process after vacuumizing, and then carrying out pure ion vacuum coating treatment on the surface subjected to the ion beam cleaning treatment by adopting a pure ion vacuum coating process, wherein the coated film layer is a diamond-like Ta-C film layer.
2. The process for producing a high temperature resistant diamond-like film layer according to claim 1, wherein: the process gas can be injected into the vacuum container in the process of the pure ion vacuum coating treatment process, and the process gas comprises the following components: ar, C2H2、C2H4、C2H6。
3. A process for the production of a high temperature resistant diamond-like film layer according to claim 2, characterized in that: the cathode coating target in the pure ion vacuum coating treatment is a high-purity graphite target, the voltage of the ion beam cleaning treatment is 300-5000V, and the Ar ion energy is as follows: 200-5000 eV, and the substrate material comprises metal, alloy, glass, resin, plastic and ceramic.
4. A process for the production of a high temperature resistant diamond-like film layer according to claim 3, characterized in that: the pure ion current parameter in the pure ion vacuum coating treatment is 20-300A, the diameter of the electromagnetic filter tube in the pure ion vacuum coating treatment is 0.1-0.8 m, the length of the electromagnetic filter tube is 0.2-1.5 m, and the filtering magnetic field in the electromagnetic filter tube is 30-3000 Gs.
5. A process for the production of a high temperature resistant diamond-like film layer according to claim 3, characterized in that: the electromagnetic scanning magnetic field is 10-3000 Gs during the pure ion vacuum coating process.
6. A process for the production of a high temperature resistant diamond-like film layer according to claim 3, characterized in that: the thickness of the coating layer is 0-50 um.
7. A process for the production of a high temperature resistant diamond-like film layer according to claim 3, characterized in that: the bias voltage applied to the substrate material when the substrate material is subjected to pure ion vacuum coating treatment is-10000-0V.
8. The process for producing a high temperature resistant diamond-like film layer according to claim 4, wherein: the temperature in the vacuum container is 0-150 ℃ when the substrate material is subjected to pure ion vacuum coating treatment, and the vacuum degree range of the vacuum container for vacuumizing is 10-1～10-5Pa。
9. The process for producing a high temperature resistant diamond-like film layer according to claim 1, wherein: the film layer plated on the substrate material is of a layered structure, and the material compositions of all layers are the same or different.
10. A process for the production of a high temperature resistant diamond-like film layer according to claim 9, wherein: and before the adjacent layers are coated, ion beam cleaning treatment is carried out.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112647040A (en) * | 2021-01-04 | 2021-04-13 | 中国科学院兰州化学物理研究所 | Ta-c base multilayer wear-resistant cutter coating and preparation method thereof |
| US20220025538A1 (en) * | 2021-07-14 | 2022-01-27 | Jomoo Kitchen & Bath Co., Ltd. | Method for metallizing plastic by pre-plating for electroplating |
Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1224772A (en) * | 1998-01-24 | 1999-08-04 | 西南交通大学 | Carbon-based film synthesis method |
| JP2004060019A (en) * | 2002-07-30 | 2004-02-26 | Fuji Electric Holdings Co Ltd | Vacuum arc deposition system and vacuum arc vapor deposition method |
| CN1760405A (en) * | 2005-11-14 | 2006-04-19 | 吴大维 | Physical vapor deposition device and method for Nano silicon-crystal thin film of solar battery |
| CN101298656A (en) * | 2008-01-18 | 2008-11-05 | 西南交通大学 | Preparation of high-hardness diamond-like multi-layer film |
| CN101321427A (en) * | 2008-07-22 | 2008-12-10 | 核工业西南物理研究院 | DC magnetic filtering cathode vacuum arc plasma source |
| CN101768720A (en) * | 2010-03-31 | 2010-07-07 | 西安交通大学 | Method for preparing amorphous carbon coating on surface of medical stainless steel knife saw |
| CN101781748A (en) * | 2010-03-31 | 2010-07-21 | 西安交通大学 | Method for preparing amorphous carbon composite coating on surface of hard alloy material and high-speed steel material |
| CN101806928A (en) * | 2010-03-31 | 2010-08-18 | 西安交通大学 | Hard resin lens and organic glass lens surface ultra-hard coat coating method |
| CN202465853U (en) * | 2012-01-20 | 2012-10-03 | 纳峰真空镀膜（上海）有限公司 | Low-temperature vacuum film-plating device |
| CN202482431U (en) * | 2012-01-20 | 2012-10-10 | 纳峰真空镀膜（上海）有限公司 | Continuous vacuum coater |
| CN106507848B (en) * | 2011-10-08 | 2014-03-19 | 成都飞机工业（集团）有限责任公司 | A kind of diamond-film-like depositing operation |
| CN104762604A (en) * | 2015-04-22 | 2015-07-08 | 安徽纯源镀膜科技有限公司 | Method for increasing deposition rate of thin film in pure ion vacuum arc coating equipment |
| CN204982040U (en) * | 2015-07-24 | 2016-01-20 | 安徽纯源镀膜科技有限公司 | Pure ion vacuum arc filming equipment |
| CN106637207A (en) * | 2016-12-30 | 2017-05-10 | 纳峰真空镀膜（上海）有限公司 | Method for coating high temperature-resistant diamond on graphite substrate |
| CN108546920A (en) * | 2018-04-20 | 2018-09-18 | 北京师范大学 | A kind of cathode vacuum arc plasma magnetic filter and its application |
| CN109295414A (en) * | 2018-12-11 | 2019-02-01 | 北京师范大学 | The technology and equipment of plated film in a kind of deep hole |
| CN109371360A (en) * | 2018-12-13 | 2019-02-22 | 纳峰真空镀膜（上海）有限公司 | A kind of preparation method applied to the wear-resisting diamond-like coating on cryogenic material |
| CN109594058A (en) * | 2018-12-13 | 2019-04-09 | 纳峰真空镀膜（上海）有限公司 | A kind of shading process for decorating DLC film |
| CN109735799A (en) * | 2018-12-21 | 2019-05-10 | 兰州空间技术物理研究所 | A kind of cutting tool surface multi-layer step high temperature wear-resistant coating and preparation method thereof |
| CN110318023A (en) * | 2019-07-30 | 2019-10-11 | 中国人民解放军陆军工程大学 | Film deposition device and method for screening laser plasma by controllable magnetic field |
-
2020
- 2020-01-10 CN CN202010026743.1A patent/CN111041430A/en active Pending
Patent Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1224772A (en) * | 1998-01-24 | 1999-08-04 | 西南交通大学 | Carbon-based film synthesis method |
| JP2004060019A (en) * | 2002-07-30 | 2004-02-26 | Fuji Electric Holdings Co Ltd | Vacuum arc deposition system and vacuum arc vapor deposition method |
| CN1760405A (en) * | 2005-11-14 | 2006-04-19 | 吴大维 | Physical vapor deposition device and method for Nano silicon-crystal thin film of solar battery |
| CN101298656A (en) * | 2008-01-18 | 2008-11-05 | 西南交通大学 | Preparation of high-hardness diamond-like multi-layer film |
| CN101321427A (en) * | 2008-07-22 | 2008-12-10 | 核工业西南物理研究院 | DC magnetic filtering cathode vacuum arc plasma source |
| CN101768720A (en) * | 2010-03-31 | 2010-07-07 | 西安交通大学 | Method for preparing amorphous carbon coating on surface of medical stainless steel knife saw |
| CN101781748A (en) * | 2010-03-31 | 2010-07-21 | 西安交通大学 | Method for preparing amorphous carbon composite coating on surface of hard alloy material and high-speed steel material |
| CN101806928A (en) * | 2010-03-31 | 2010-08-18 | 西安交通大学 | Hard resin lens and organic glass lens surface ultra-hard coat coating method |
| CN106507848B (en) * | 2011-10-08 | 2014-03-19 | 成都飞机工业（集团）有限责任公司 | A kind of diamond-film-like depositing operation |
| CN202482431U (en) * | 2012-01-20 | 2012-10-10 | 纳峰真空镀膜（上海）有限公司 | Continuous vacuum coater |
| CN202465853U (en) * | 2012-01-20 | 2012-10-03 | 纳峰真空镀膜（上海）有限公司 | Low-temperature vacuum film-plating device |
| CN104762604A (en) * | 2015-04-22 | 2015-07-08 | 安徽纯源镀膜科技有限公司 | Method for increasing deposition rate of thin film in pure ion vacuum arc coating equipment |
| CN204982040U (en) * | 2015-07-24 | 2016-01-20 | 安徽纯源镀膜科技有限公司 | Pure ion vacuum arc filming equipment |
| CN106637207A (en) * | 2016-12-30 | 2017-05-10 | 纳峰真空镀膜（上海）有限公司 | Method for coating high temperature-resistant diamond on graphite substrate |
| CN108546920A (en) * | 2018-04-20 | 2018-09-18 | 北京师范大学 | A kind of cathode vacuum arc plasma magnetic filter and its application |
| CN109295414A (en) * | 2018-12-11 | 2019-02-01 | 北京师范大学 | The technology and equipment of plated film in a kind of deep hole |
| CN109371360A (en) * | 2018-12-13 | 2019-02-22 | 纳峰真空镀膜（上海）有限公司 | A kind of preparation method applied to the wear-resisting diamond-like coating on cryogenic material |
| CN109594058A (en) * | 2018-12-13 | 2019-04-09 | 纳峰真空镀膜（上海）有限公司 | A kind of shading process for decorating DLC film |
| CN109735799A (en) * | 2018-12-21 | 2019-05-10 | 兰州空间技术物理研究所 | A kind of cutting tool surface multi-layer step high temperature wear-resistant coating and preparation method thereof |
| CN110318023A (en) * | 2019-07-30 | 2019-10-11 | 中国人民解放军陆军工程大学 | Film deposition device and method for screening laser plasma by controllable magnetic field |
Non-Patent Citations (2)
| Title |
|---|
| 刘琳: "《薄膜材料的制备及应用》", 31 December 2011, 东北大学出版社 * |
| 赵印中: "离子束清洗对光学太阳反射镜（OSR）性能的影响研究", 《真空与低温》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112647040A (en) * | 2021-01-04 | 2021-04-13 | 中国科学院兰州化学物理研究所 | Ta-c base multilayer wear-resistant cutter coating and preparation method thereof |
| US20220025538A1 (en) * | 2021-07-14 | 2022-01-27 | Jomoo Kitchen & Bath Co., Ltd. | Method for metallizing plastic by pre-plating for electroplating |
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