CN109594058A - A kind of shading process for decorating DLC film - Google Patents
A kind of shading process for decorating DLC film Download PDFInfo
- Publication number
- CN109594058A CN109594058A CN201811524484.4A CN201811524484A CN109594058A CN 109594058 A CN109594058 A CN 109594058A CN 201811524484 A CN201811524484 A CN 201811524484A CN 109594058 A CN109594058 A CN 109594058A
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- CN
- China
- Prior art keywords
- film
- layer
- decorating
- substrate
- shading process
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
Abstract
The present invention relates to coating technique field, specifically a kind of shading process for decorating DLC film.A kind of shading process for decorating DLC film, including substrate, TAC film layer, coloring layer, it is characterised in that: specific step is as follows: S1: ultrasonic cleaning is carried out to substrate surface;S2: substrate is put into plated film cavity, and cavity is evacuated to 1.5x10‑5Torr;S3: carrying out ion etching to substrate surface, plates one layer of TAC film layer on the surface of substrate;S4: cavity is evacuated to 1.0x10‑5Torr, and it is filled with C2H2Gas carries out coloring layer plated film to the surface of TAC film layer.Compared with the existing technology, C is introduced when using FAVA plated film2H2Gas, thus it is possible to vary Film color makes film layer appearance have more selectivity, this can be obviously improved application range for decoration plating;Introduce C2H2, the deposition rate of film layer can be promoted, especially for FCVA-C film, plating membrane efficiency can be obviously improved.
Description
Technical field
The present invention relates to coating technique field, specifically a kind of shading process for decorating DLC film.
Background technique
FCVA (filtering cathode vacuum arc technology) technology is exactly a kind of improvement version plated film for belonging to arc ion plating field
Technology.The technology is filtered by bend pipe and high energy electricity, magnetic filtering are except devaporation generates bulky grain, makes to deposit to substrate surface
Film layer have the moist advantage of conventional sputter coating, while being caused but also with high rigidity, excellent adhesive force and film layer
Advantage not available for the conventional sputters such as close property.
DLC (DLC film) is a kind of high rigidity and wear-resisting functional coating, is usually used in such as cutter, mold, vapour
The more demanding occasion of the fretting wears such as vehicle components.Conventional DLC film is to use C using CVD (such as PECVD) mode2H2、
CH4Equal gases are deposited, and because coating temperature is higher (being greater than 200 DEG C), color fixes that (L value is about 48, and a value is big close to 0, b value
In 0, visual effect is partially yellow).Therefore it for many decorating films and is not suitable for.
And the tac film deposited using FCVA plated film mode, it is not hydrogeneous in film layer.Although coating temperature is lower,
Since color fixes, (L value is about that 0) 53, a value is greater than close to 0, b value, therefore the application in terms of decoration is also limited to very much.
Summary of the invention
The present invention in order to overcome the deficiencies of the prior art, provides a kind of shading process for decorating DLC film, is utilizing
C is introduced when FAVA plated film2H2Gas, thus it is possible to vary Film color makes film layer appearance have more selectivity, this is for decoration
For plating, application range can be obviously improved.
To achieve the above object, design it is a kind of decorate DLC film shading process, including substrate, TAC film layer,
Coloring layer, it is characterised in that: specific step is as follows:
S1: ultrasonic cleaning is carried out to substrate surface;
S2: substrate is put into plated film cavity, and cavity is evacuated to 1.5x10-5Torr;
S3: carrying out ion etching to substrate surface, plates one layer of TAC film layer on the surface of substrate;
S4: cavity is evacuated to 1.0x10-5Torr, and it is filled with C2H2Gas colours the surface of TAC film layer
Layer plated film.
In the step S4, it is filled with C2H2Gas makes the intracorporal vacuum of vacuum chamber reach 5.0x10-4Torr or so, so
Start depositing diamond-like film using FCVA coating technique afterwards.
The substrate is the metal bases such as stainless steel.
The TAC film layer is amorphous tetrahedral carbon films.
The C2H2Gas is acetylene gas, in FCVA coating process, is passed through C2H2Gas is of different nature to obtain
DLC film achievees the purpose that toning.
The coating process is FCVA coating process, i.e. filtering cathode vacuum arc coating deposition technology.
The present invention compared with the existing technology, is provided a kind of shading process for decorating DLC film, is plated using FAVA
C is introduced when film2H2Gas, thus it is possible to vary Film color makes film layer appearance have more selectivity, this for decoration plating for,
Application range can be obviously improved;Introduce C2H2, the deposition rate of film layer can be promoted, especially for FCVA-C film, plates membrane efficiency
It can be obviously improved;Introduce C2H2, thus it is possible to vary the physicochemical property of film layer, so that preparation film layer has more selectivity.
Specific embodiment
It is not introduce gas in the conventional coating process of FCVA;In the thickness of 50~300nm of outermost layer of TAC film,
C is introduced in the case where possessing the source FCVA body equipment operating condition2H2Gas realizes C into vacuum cavity2H2Gas and the source FCVA body produce
Raw plasma collides, and generates the carbon ion of ionization, the carbon ion of the ionization can the source FCVA body generation cation
Substrate surface or both is deposited to together after reaction deposits to substrate surface respectively;In this way, guaranteeing original film layer
On the basis of performance, different appearance color is obtained, dicoration is enriched, has improved the overall quality and texture of product;
Different according to the amount for introducing gas, thickness is different, can debug to color.Available color gamut is following (compared to original
The intrinsic inclined yellow having, available partially blue cool tone coating): L value: maximum 55, minimum 38;A value: maximum+0.8,
Minimum -1.0;B value: maximum 2.0, minimum -4.0.L, a, b are three amounts for indicating color, and L indicates brightness, more bigger brighter, smaller
Darker, range is 0-100;A is to indicate red or green, exactly red, and it is green for bearing;B is to indicate yellow or blue, exactly yellow, and negative is blue.
Specific step is as follows:
S1: ultrasonic cleaning is carried out to substrate surface;
S2: substrate is put into plated film cavity, and cavity is evacuated to 1.5x10-5Torr carries out ion to substrate surface
Etching plates one layer of TAC film layer on the surface of substrate;
S3: cavity is evacuated to 1.0x10-5Torr, and it is filled with C2H2Gas colours the surface of TAC film layer
Layer plated film.
In step S4, it is filled with C2H2Gas makes the intracorporal vacuum of vacuum chamber reach 5.0x10-4Then Torr or so is used
FCVA coating technique starts depositing diamond-like film.
Substrate is the metal bases such as stainless steel.
TAC film layer is amorphous tetrahedral carbon films.
C2H2Gas is acetylene gas, in FCVA coating process, is passed through C2H2Gas is to obtain diamond-like of different nature
Stone film, achievees the purpose that toning.
Coating process is FCVA coating process, i.e. filtering cathode vacuum arc coating deposition technology.
Example one
Film layer preparating example:
A. substrate prepares: stainless steel substrates, cleans (ultrasonic cleaning) using industrial cleaning agent, then pure water rinsing, then
It is dried;
B. it by ready substrate clamping, and is packed into the TAC plated film cavity having had been prepared for;
C. it is evacuated, until the vacuum degree (being usually set to 5.0E-5Torr) of setting;
D. Ion Cleaning is carried out, ion etching is carried out to obtain better adhesive force to product surface;
E. magnetron sputtering, deposited metal layer, target Ti, film thickness 0.4um bottom plated film: are used;
F.TAC functional layer plated film: using FCVA coating technique, deposits TAC layer, target is graphite, film thickness 1.0um;
G.TAC color layers: using FCVA coating technique, and deposited colors layer mixes C2H2, operating air pressure 4.0E-4Torr, target
Material is graphite, film thickness 50nm.
Example two
Test result: film quality mainly is judged using color measuring, nano hardness, rubber test.
A. X-Rite i7 spectroscope, F-02 light source color: are used.Test result: L 42.52, a be -0.15, b be -
1.95。
B. Anton Paar nano-hardness tester, load 4mN nano hardness: are used.Test result: nano hardness 2610HV.
C. rubber test: use Taber5750 rubber test machine, CS-17 rubber, load 1kg, 1 inch of stroke.Test knot
Fruit: 3000 times without obvious scratch.
Claims (6)
1. a kind of shading process for decorating DLC film, including substrate, TAC film layer, coloring layer, it is characterised in that: tool
Steps are as follows for body:
S1: ultrasonic cleaning is carried out to substrate surface;
S2: substrate is put into plated film cavity, and cavity is evacuated to 1.5x10-5Torr;
S3: carrying out ion etching to substrate surface, plates one layer of TAC film layer on the surface of substrate;
S4: cavity is evacuated to 1.0x10-5Torr, and it is filled with C2H2Gas carries out coloring layer plating to the surface of TAC film layer
Film.
2. a kind of shading process for decorating DLC film according to claim 1, it is characterised in that: the step
In S4, it is filled with C2H2Body makes the intracorporal vacuum of vacuum chamber reach 5.0x10-4Then Torr or so is opened using FCVA coating technique
Beginning depositing diamond-like film.
3. a kind of shading process for decorating DLC film according to claim 1, it is characterised in that: the substrate
For metal bases such as stainless steels.
4. a kind of shading process for decorating DLC film according to claim 1, it is characterised in that: the TAC
Film layer is amorphous tetrahedral carbon films.
5. a kind of shading process for decorating DLC film according to claim 1, it is characterised in that: the C2H2
Gas is acetylene gas, in FCVA coating process, is passed through C2H2Gas is reached with obtaining DLC film of different nature
The purpose of toning.
6. a kind of shading process for decorating DLC film according to claim 1, it is characterised in that: the plated film
Technique is FCVA coating process, i.e. filtering cathode vacuum arc coating deposition technology.
Priority Applications (1)
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CN201811524484.4A CN109594058B (en) | 2018-12-13 | 2018-12-13 | Toning method for decorative diamond-like carbon film |
Applications Claiming Priority (1)
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CN201811524484.4A CN109594058B (en) | 2018-12-13 | 2018-12-13 | Toning method for decorative diamond-like carbon film |
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CN109594058A true CN109594058A (en) | 2019-04-09 |
CN109594058B CN109594058B (en) | 2022-02-11 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111041430A (en) * | 2020-01-10 | 2020-04-21 | 安徽纯源镀膜科技有限公司 | Production process of high-temperature-resistant diamond-like carbon film layer |
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US20100163824A1 (en) * | 2008-12-31 | 2010-07-01 | Huiwen Xu | Modulation of resistivity in carbon-based read-writeable materials |
CN102605319A (en) * | 2011-01-22 | 2012-07-25 | 南京理工大学 | Method for modifying and depositing diamond-like film on surface of aluminum alloy |
CN103000669A (en) * | 2011-09-09 | 2013-03-27 | 中国科学院微电子研究所 | Source-drain buried graphene transistor device on diamond-like carbon substrate and manufacture method |
CN106011771A (en) * | 2016-08-04 | 2016-10-12 | 北京师范大学 | Apparatus for rapidly depositing DLC film on surface of piston ring, and method thereof |
CN106282935A (en) * | 2015-05-15 | 2017-01-04 | 新科实业有限公司 | Material with diamond-like coating and preparation method thereof |
-
2018
- 2018-12-13 CN CN201811524484.4A patent/CN109594058B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US20100163824A1 (en) * | 2008-12-31 | 2010-07-01 | Huiwen Xu | Modulation of resistivity in carbon-based read-writeable materials |
CN102605319A (en) * | 2011-01-22 | 2012-07-25 | 南京理工大学 | Method for modifying and depositing diamond-like film on surface of aluminum alloy |
CN103000669A (en) * | 2011-09-09 | 2013-03-27 | 中国科学院微电子研究所 | Source-drain buried graphene transistor device on diamond-like carbon substrate and manufacture method |
CN106282935A (en) * | 2015-05-15 | 2017-01-04 | 新科实业有限公司 | Material with diamond-like coating and preparation method thereof |
CN106011771A (en) * | 2016-08-04 | 2016-10-12 | 北京师范大学 | Apparatus for rapidly depositing DLC film on surface of piston ring, and method thereof |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111041430A (en) * | 2020-01-10 | 2020-04-21 | 安徽纯源镀膜科技有限公司 | Production process of high-temperature-resistant diamond-like carbon film layer |
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