CN112647040A - Ta-c base multilayer wear-resistant cutter coating and preparation method thereof - Google Patents

Ta-c base multilayer wear-resistant cutter coating and preparation method thereof Download PDF

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CN112647040A
CN112647040A CN202110000976.9A CN202110000976A CN112647040A CN 112647040 A CN112647040 A CN 112647040A CN 202110000976 A CN202110000976 A CN 202110000976A CN 112647040 A CN112647040 A CN 112647040A
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coating
layer
wear
target
plating
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CN112647040B (en
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王晓波
陈庆春
李维民
赵改青
张广安
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Qingdao Center Of Resource Chemistry & New Materials (qingdao Research Development Center Lanzhou Institute Of Chemical Physics Chinese Academy Of Sciences)
Lanzhou Institute of Chemical Physics LICP of CAS
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Qingdao Center Of Resource Chemistry & New Materials (qingdao Research Development Center Lanzhou Institute Of Chemical Physics Chinese Academy Of Sciences)
Lanzhou Institute of Chemical Physics LICP of CAS
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025Metallic sublayers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605Carbon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates

Abstract

The invention relates to a magnetron sputtering-multi-arc ion plating coupling process deposition cutter coating, and particularly discloses a coating which consists of a metal bonding layer, a ta-c functional wear-resistant layer and a surface diamond-like carbon layer. The invention takes a metal Cr target and a graphite target as raw materials, and the system structure of the film layer is as follows: (1) the metal Cr layer is used as a bonding layer with the substrate and provides stronger adhesive strength for the ta-c functional layer; (2) the periodic continuous plating of the ta-c functional layer provides good lubricity during cutting; (3) the plating of the surface diamond-like carbon (DLC) film mainly plays a role in reducing the surface roughness and the pinning effect and improving the wear resistance of a film layer system. The ta-c-based multilayer wear-resistant coating prepared by the coupling coating process can obviously improve the wear resistance and reduce the adhesion behavior in the cutting process, and is particularly suitable for high-precision cutting working conditions.

Description

Ta-c base multilayer wear-resistant cutter coating and preparation method thereof
Technical Field
The invention relates to a preparation method of a cutter coating, in particular to a tetrahedral amorphous carbon (ta-c) -based composite cutter coating and a preparation method thereof, and belongs to the technical field of cutter coating preparation.
Background
With the continuous progress of modern machining technology, the traditional cutter has difficulty in meeting the high-standard machining requirements. When the traditional cutter is used for high-speed machining, the feeding amount is large, and the depth of cut materials is large, the cutter is easy to wear quickly, the service life is short, the machining precision is poor, the thermal deformation of the cutter and parts is serious, and the like. Coated tools have been developed which combine a high strength substrate with a hard, wear resistant film material and which are very important for improving the cutting performance of the tool and for improving the machining technology. The hard film not only keeps the excellent mechanical property of the base material, but also greatly improves the wear resistance, corrosion resistance and cutting performance, improves the processing precision and processing efficiency, prolongs the service life of the cutter, ensures the surface quality of the processed workpiece, and has the advantages of high efficiency, economy and low cost.
During machining, the tool is subjected to various insults, such as cutting heat, high pressure, wear and thermal shock. The temperature of the cutting edge will exceed 800 deg.c. This extreme heat can damage the bonding forces of the components of the tool material and other components, and can also lead to detrimental chemical reactions between the tool and the material being machined. The wear is accompanied by the whole cutting process, and the contact surface between the tool and the material to be machined is subjected to a pressure of 2-3GPa, which may cause adhesive wear (formation of a chip formation) and seriously affect the smooth proceeding of the cutting process. Thermal shock, rapid heating and cooling of the tool is a very common condition in the machining process; during cutting, the blade is heated rapidly and when the blade leaves the cutting surface, the blade is quenched. The cold and hot alternation greatly affects the microstructure of the cutter material and reduces the mechanical strength of the cutter material. It follows that it is essential to treat the surface of the tool material.
The tool coating technology is that a superhard coating in a micron scale range is prepared on the surface of a cutting tool by a vacuum vapor deposition method and forms a composite structure together with a tool substrate. Compared with a base material of the cutter, the surface coating has excellent performances of high hardness, wear resistance and corrosion resistance, the service life of the cutter can be obviously prolonged, the processing efficiency is improved, and the production cost is far lower than that of the base material with the same performance. Therefore, the cutter coating is widely applied in the industries of machinery, electronics, machining and the like. Nitride-based coatings such as TiAlN, CrN, TiAlCrN and the like are wear-resistant tool coatings widely applied in the early stage, and although the coatings have good wear resistance, the friction coefficient is relatively high and is 0.4-0.8. Compared with the traditional nitride hard coating, the diamond-like carbon film (DLC for short) is used as a solid lubricant to prolong the service life of a workpiece under various working conditions. The hybridization mode of carbon atoms in the film during deposition and film formation can be divided into sp2And sp3Two, sp3Hydrogen-free diamondoids in amounts of 70% to 90% are defined as tetrahedral amorphous carbons ta-c. the ta-c coating has lower wear rate, and meanwhile, the ta-c film is not sticky and can be suitable for processing most metals.
The ta-c coating cutter is prepared by using the arc ion plating composite magnetron sputtering technology, the composite technology comprehensively utilizes the advantages of high ionization rate of ion plating and suitability for industrial large-scale production, the deposited film layer has the characteristics of good bonding force, compact structure, high deposition rate and lower surface roughness of the magnetron sputtering film, and the prepared ta-c film has the advantages of higher hardness, good self-lubricating property, low friction coefficient and the like; can obviously reduce abrasion, inhibit adhesion and prolong the service life of the cutter.
Chinese patent 'application No. 201010136163.4' reports that the ta-c coating is prepared on the surface of hard alloy and high-speed steel materials by magnetron sputtering, and the obtained ta-c coating has good mechanical properties. Chinese patent 'application No. 201320221551.1' reports that the nano ta-c coating is deposited on the surface of the scalpel, so that the pain of a patient and the damage to cells can be relieved. the ta-c coating can show excellent characteristics under various occasions. Therefore, the ta-c coating has good application prospect and value.
For the coating of a cutting tool, it is important to improve the adhesion strength between the coating and the surface of the cutting tool base material while seeking wear resistance. If the transition layer does not function effectively as a bond, it can cause stress concentrations at the interface and can be prone to spalling failure during the cutting process. Therefore, in view of the characteristics of the tool material itself, the metal Cr is selected as the transition layer, and the difference in thermal expansion coefficient, lattice mismatch, and the like between the coating material and the tool surface is eliminated, and the atomic mixture transition layer and the pseudo diffusion layer are formed at the film-substrate interface to improve the bonding strength. The invention has simple preparation process, low plating cost and excellent film forming quality, can meet the requirement of batch surface treatment of whole furnace cutters and micro-drills, and has certain economic benefit.
Disclosure of Invention
Based on the defects of the wear resistance and the chip removal performance of the traditional cutter coating, the invention aims to provide a ta-c-based multi-layer wear-resistant cutter coating which is suitable for working conditions under high-speed cutting and other conditions.
The ta-c-based multi-layer wear-resistant cutter coating comprises a bonding layer, a wear-resistant layer and a surface modification layer; the bonding layer is a metal Cr layer, the wear-resistant layer is a ta-c coating prepared by periodic arc ion plating, and the surface modification layer is a diamond-like carbon layer.
The adhesive layer of the ta-c-based multilayer wear-resistant cutter coating is prepared by a magnetron sputtering technology, the wear-resistant layer is prepared by an arc ion plating technology, and the surface modification layer is prepared by the magnetron sputtering technology.
Furthermore, the wear-resistant layer is a ta-c coating which is periodically and continuously plated.
The thickness of the bonding layer of the ta-c-based multilayer wear-resistant cutter coating is 100-200 nm, the thickness of the wear-resistant layer is 500-1000 nm, and the thickness of the surface modification layer is 50-100 nm; preferably, the thickness of the bonding layer is 200nm, and the thickness of the surface modification layer is 60 nm.
The preparation method of the ta-c-based multilayer wear-resistant cutter coating comprises the following specific steps:
(1) ultrasonically cleaning the cutter by using acetone and absolute ethyl alcohol for 15-20 min respectively to remove surface oil stains and oxides thereof; after the absolute ethyl alcohol ultrasonic stage is finished, quickly taking out the matrix, and blowing the matrix by using dry nitrogen to ensure that no residual liquid exists on the surface of the matrix;
(2) sucking impurity particles and fine dust in the vacuum cavity by using a dust collector, placing the cutter clamp on a rotating frame, starting a vacuumizing unit until the vacuum degree of the cavity reaches 3.0 multiplied by 10-3When Pa is needed, starting a magnetic control rectangular Cr target, adjusting the target power to 200W, and carrying out sputtering plating for 10 min; the step can eliminate the influence of low film forming quality caused by redundant charges in the cavity and the surface pollution of the clamp;
(3) placing the cleaned cutter on a rotating frame in a coating chamber, wherein the sample rotating frame can revolve and rotate, the uniformity of the deposition process can be ensured, the rotating speed of the workpiece rotating frame is adjusted to be 3-5 rpm/min, a thermocouple is started, a sample base is heated, the temperature is increased to 150 ℃, the whole coating process is always maintained at 150 ℃, an Ar gas flow valve is started, high-purity Ar with the flow rate of 100-150 sccm/min is introduced, the pressure intensity of a vacuum chamber is adjusted to be 0.1-0.3 Pa, negative bias is applied to a substrate to be-200-500V, glow etching cleaning is carried out for 15-30 min, and oxides and other impurities on the surface of the cutter are further removed;
(4) maintaining the pressure of a coating cavity at 0.1-0.3 Pa, then adjusting the negative bias of a substrate to-200V, using a rectangular magnetic control Cr target as a Cr bonding layer of a bottom layer, controlling the sputtering rate of the magnetic control Cr target by adjusting the power of the magnetic control Cr target, adjusting the power of the target to 200W, bombarding the substrate with Cr ions at high energy for 15-30 min, so as to activate the surface of the substrate and form a metal transition bonding layer;
(5) the pure Cr target was turned off. Controlling the total air pressure to be 0.01-0.03 Pa, starting an electric arc graphite target power supply, uniformly arranging three round cake-shaped electric arc graphite targets from top to bottom in sequence to serve as a source for preparing the ta-c tetrahedral amorphous carbon, wherein the purity of the graphite target is 99.999%, regulating and controlling the upper end graphite target arc current 60A, the middle graphite target current 50A and the lower end graphite target current 60A, depositing a ta-c coating, and lasting for 30-45 s;
(6) closing the arc graphite target, maintaining the temperature of the chamber at 150 ℃ for 15-30 s, so as to ensure that the graphite particles with the lubricating function have sufficient time for film-forming growth;
(7) and (5) and (6) are defined as a coating period. Repeating the film coating period for 60-90 times to prepare a multi-layer ta-c coating with a uniform structure;
(8) and after the preparation process of the ta-c coating is finished, closing the power supply of the electric arc graphite target, starting the magnetic control graphite target, introducing high-purity Ar of 100-150 sccm/min into the vacuum chamber, adjusting the pressure of the coating cavity to be 0.1-0.3 Pa, adjusting the power of the rectangular graphite magnetic control sputtering target to be 100W, and coating the diamond-like carbon film on the surface of the ta-c coating for 20-30 min. And (4) after the film coating is finished, closing the power supply of the thermocouple, and taking out the cutter with the ta-c-based multilayer wear-resistant coating when the temperature of the vacuum film coating cavity is reduced to room temperature.
The invention discloses a method for preparing a ta-c cutter coating by a magnetron sputtering-multi-arc ion plating coupling process, which mainly comprises the following steps of:
1. the invention adopts the magnetron sputtering technology to bombard the surface of the substrate material with high energy, and introduces the transitional bonding layer (Cr layer) between the ta-c coating and the substrate, thereby alleviating the difference between the ta-c coating and the substrate due to physical properties and reducing the stress concentration of the film substrate. In addition, the cutting tool is susceptible to fatigue stress due to the alternating load during the metal cutting process. If a single-layer ta-c coating is prepared on the surface of the cutter, the surface coating is easily affected by stress impact to generate fatigue cracks. As the cutting process progresses, cracks tend to propagate along the tool surface and eventually spall off. The periodic continuous plating of the ta-c coating can provide the growth time for graphite particles of a lubricating phase, and can play a good role in inhibiting crack propagation and spalling failure.
2. For the cutter coating, if the microcosmic surface roughness is large, accumulated cutting nodules are easy to generate, the top layer diamond-like film is prepared by magnetron sputtering, the distribution of large particles on the surface caused by a multi-arc process is effectively reduced, the surface of the coating is compact and smooth, obvious defects do not exist, chips can be smoothly removed in the cutting process, the generation of the accumulated cutting nodules can be reduced, and the surface quality of a workpiece is improved.
Drawings
FIG. 1 is a simplified schematic diagram of a magnetron sputtering-multi-arc ion plating coupling coating device;
FIG. 2 is a surface SEM image of a ta-c based multi-layer wear resistant coating of example 1;
FIG. 3 is a cross-sectional SEM image of a ta-c based multi-layer wear resistant coating of example 1;
FIG. 4 is a load-displacement curve for the ta-c based multilayer abrasion resistant coating of example 1;
FIG. 5 is a microdriller sample of the ta-c based multilayer wear resistant coating of example 2.
Detailed Description
The ta-c based multilayer wear resistant coatings are described in detail below with reference to the figures and associated test results.
The simple schematic diagram of the magnetron sputtering-multi-arc ion plating coupling coating equipment used by the invention is shown in figure 1, and the coating equipment mainly comprises an electric arc graphite target 1, an electric arc graphite target 2, an electric arc graphite target 3, a rectangular magnetron graphite target 4, a matrix bias voltage 5, a vacuum pumping system 6, a rotating bracket 7, a magnetron sputtering Cr target 8 and an argon flow valve 9.
The invention utilizes the rectangular magnetic control Cr target as the source of the transition bonding layer, and the power of the Cr target is adjusted to control the sputtering yield; circular arc graphite targets are used as a source for preparing a ta-c coating, the three circular arc graphite targets are uniformly arranged in the cavity, the sputtering rate of the graphite targets is controlled by adjusting target current, the rectangular magnetic control graphite targets are used as a source of a diamond-like carbon film, and high-purity Ar enters the vacuum cavity through a flow valve 9.
Example 1:
(1) commercially available YG6 tungsten carbide cemented carbide tool was used as a sample (tool material composition, WC: 94wt.%, Co: 6wt.%, hardness HRA 89); ultrasonic cleaning the sample with acetone and anhydrous ethanol for 20min to remove oil stain and oxide on the surface;
(2) sucking impurity particles and fine dust in the vacuum cavity by using a dust collector, placing the cutter clamp on a rotating frame, starting a vacuumizing unit until the vacuum degree of the cavity reaches 3.0 multiplied by 10-3And when Pa is needed, starting the magnetic control rectangular Cr target, adjusting the target power to 200W, and carrying out sputtering plating for 10 min. The step can eliminate the influence of low film forming quality caused by redundant charges in the cavity and the surface pollution of the clamp;
(3) ion etching cleaning of a sample: the cutter sample is held on the rotating stand 7, and the vacuum degree of the cavity is pumped to 3.0 multiplied by 10- 3Pa, the rotating speed of the sample rotating stand is 5rpm/min, and a thermocouple heater is started to heat to 150 ℃; introducing high-purity Ar gas of 100sccm/min into the vacuum chamber, adjusting the pressure of the chamber to 0.1Pa, opening the bias voltage to-500V, and performing bombardment cleaning on the surface of the sample for 20 min;
(4) preparing a metal bonding layer Cr: after the ion etching cleaning stage is completed, maintaining the pressure of a vacuum cavity at 0.1Pa, starting a rectangular magnetic control Cr target power supply, adjusting the target power to 200W, adjusting the bias voltage to-200V, and preparing a Cr bonding layer for 15 min;
(5) preparation of ta-c coating: closing the magnetic control Cr target after the Cr bonding layer is finished; adjusting the pressure of a cavity to be 0.01Pa, starting an electric arc graphite target, adjusting the currents of the graphite target at the upper, middle and lower positions to be 60A, 50A and 60A respectively, starting to prepare a ta-c coating on the Cr bonding layer, wherein the starting working time of the electric arc target is 45s, the interval is 15s, 1min is taken as a plating period, the process lasts for 1h, and the temperatures of the cavity and a rotating frame are always maintained at 150 ℃ in the film plating process;
(6) preparing a diamond-like film: after the ta-c coating is prepared, closing the electric arc graphite target; opening a rectangular magnetic control graphite target, introducing high-purity Ar gas of 100sccm/min, adjusting the pressure of a vacuum cavity to 0.1Pa and the target power to 100W, and plating a diamond-like carbon film for 30 min; and after the film coating is finished, the temperature of the cavity of the vacuum chamber is reduced to room temperature, and the sample is taken out.
Mechanical properties: using antopaNHT2 model nano indentor characterizes the hardness (H) and elastic modulus (E) of a ta-c multi-layer wear-resistant coating, the load of an indenter is 100mN, and in order to avoid the influence of a base material on the intrinsic mechanical properties of the coating, the indentation depth exceeds 10% of the coating thickness. H and E were calculated according to the load-displacement curve by the Oliver-Phar method. Five test points are randomly selected in the test area, and the average value is taken to reduce the experimental error. The results show that: the hardness of the ta-c multi-layer wear-resistant coating is 70GPa, and the elastic modulus of the ta-c multi-layer wear-resistant coating is 460 GPa. And (3) microstructure characterization: the film layer surface is observed to be compact and uniform, the surface appearance of the sample is shown in figure 2, and the microstructure of the ta-c-based multi-layer wear-resistant coating is shown in figure 3. And (3) testing tribological properties: the tribology behaviour of the coating was studied using a reciprocating friction tester CSM, with the parameters chosen: the linear reciprocating frequency is 5Hz, the reciprocating stroke length is 5mm, the sliding distance is 200m, the test temperature is 21 ℃ plus or minus 5 ℃, the environmental humidity is 35 percent plus or minus 5 percent, the dual material is GCr15 steel ball with phi 6mm, and the average friction coefficient of the coating is 0.15 represented by a ball disc type friction tester. Resistance to crack propagation: by scratch tester RST3The adhesion of the coating to the substrate was evaluated, the progressive load loading rate was 49N/min, the scratch stroke was 5mm, and the critical load value was determined by the fluctuation of the acoustic signal, and the experimental results showed that the ta-c based multilayer abrasion resistant coating broke at a critical load of 14N, the longitudinal length of the crack was about 700 μm, and some plastic deformation occurred, but no peeling was observed during the whole scratch stage.
Example 2:
(1) commercial micro drills with different cutting diameters are purchased, and ultrasonic cleaning is sequentially carried out for 10min by using petroleum ether, acetone and absolute ethyl alcohol. After the ultrasound is finished, taking out the sample and purging by using dry nitrogen;
(2) cleaning particle impurities, target surface pollutants and sample rotating stand impurities in the cavity by using a high-power dust collector, placing a cutter clamp on the rotating stand, starting a vacuumizing unit until the vacuum degree of the cavity reaches 3.0 multiplied by 10-3When Pa is needed, starting a magnetic control rectangular Cr target, adjusting the target power to 200W, and carrying out sputtering plating for 10 min;
(3) putting the cleaned micro drill into a clamping sleeve tool, and putting a cavityVacuum pumping to 3.0 × 10-3Setting the temperature below Pa to be 150 ℃, then introducing 100sccm/min argon into the cavity, keeping the bias voltage at-300V, and cleaning for 30min by utilizing glow discharge of Ar ions;
(4) preparing a substrate bonding layer Cr: regulating the working pressure of a vacuum chamber to be 0.1Pa, starting magnetic control metal Cr, setting a sample rotating frame to be 5rmp/min, regulating the bias voltage of a matrix to be 200V, regulating the target power to be 200W, and plating for 10 min;
(5) preparation of ta-c coating: adjusting the pressure of the cavity to 0.01 Pa; adjusting the current of the three arc graphite targets to be 60A, 40A and 60A respectively, setting the working time of the graphite arc targets in a cycle period to be 30s, and repeating the cycle period for 40 times at an interval of 60s, namely continuously plating for 1 h;
(6) preparing a diamond-like film: and closing the electric arc graphite target, opening the rectangular magnetic control graphite target, adjusting the pressure of the cavity to 0.1Pa, adjusting the target power to 200w, and plating for 30 min. Thus obtaining the ta-c multi-layer wear-resistant coating with homogeneous surface.
Comparative example 1:
the embodiment provides a method for preparing a cutter coating by a magnetron sputtering-multi-arc ion plating coupling process, which is used for preparing a ta-c-based multilayer wear-resistant coating on the surface of a cutter, and the specific preparation process comprises the following steps:
(1) commercially available YG6 tungsten carbide cemented carbide tools were used as samples (tool material composition, WC: 94wt.%, Co: 6wt.%, hardness HRA 89). Ultrasonic cleaning the sample with acetone and anhydrous ethanol for 20min to remove oil stain and oxide on the surface;
(2) sucking impurity particles and fine dust in the vacuum cavity by using a dust collector, placing the cutter clamp on a rotating frame, starting a vacuumizing unit until the vacuum degree of the cavity reaches 3.0 multiplied by 10-3When Pa is needed, starting a magnetic control rectangular Cr target, adjusting the target power to 200W, and carrying out sputtering plating for 10 min;
(3) ion etching cleaning of a sample: the cutter sample is held on the rotating stand 7, and the vacuum degree of the cavity is pumped to 3.0 multiplied by 10- 3Pa, the rotating speed of the sample rotating stand is 5rpm/min, and a thermocouple heater is started to heat to 150 ℃; further, high-purity Ar gas of 100sccm/min is introduced into the vacuum chamber, and the pressure of the chamber is adjusted to be 0.1PaOpening the bias voltage to-500V to carry out bombardment cleaning on the surface of the sample for 20 min;
(4) preparing a metal bonding layer Cr: after the ion etching stage is completed, maintaining the pressure of a vacuum cavity at 0.1Pa, starting a rectangular magnetic control Cr target power supply, adjusting the target power to 200W, adjusting the bias voltage to-200V, and preparing a Cr bonding layer for 15 min;
(5) preparation of ta-c coating: closing the magnetic control Cr target after the Cr bonding layer is finished; adjusting the pressure of the cavity to be 0.01Pa, starting the electric arc graphite target, adjusting the currents of the graphite targets at the upper, middle and lower positions to be 60A, 50A and 60A respectively, starting to prepare a ta-c coating on the Cr bonding layer, starting the electric arc target to continuously plate for 0.5h, and keeping the temperature of the cavity and the rotating frame at 150 ℃ all the time in the film plating process.
(6) Preparing a diamond-like film: after the ta-c coating is prepared, closing the electric arc graphite target; opening a rectangular magnetic control graphite target, introducing high-purity Ar gas of 100sccm/min, adjusting the pressure of a vacuum cavity to 0.1Pa and the target power to 100W, and plating a diamond-like carbon film for 30 min; and after the film coating is finished, the temperature of the cavity of the vacuum chamber is reduced to room temperature, and the sample is taken out.
Mechanical properties: the method is characterized in that a ta-c multi-layer wear-resistant coating has the hardness (H) and the elastic modulus (E) by using an Antopa NHT2 model nano indenter, the load of an indenter is 100mN, and in order to avoid the influence of a base material on the intrinsic mechanical property of the coating, the indentation depth exceeds 10% of the coating thickness. H and E were calculated according to the load-displacement curve by the Oliver-Phar method. Five test points are randomly selected in the test area, and the average value is taken to reduce the experimental error. The results show that: the hardness of the ta-c multi-layer wear-resistant coating is 78GPa, and the elastic modulus of the ta-c multi-layer wear-resistant coating is 420 GPa. And (3) testing tribological properties: the tribology behaviour of the coating was studied using a reciprocating friction tester CSM, with the parameters chosen: the linear reciprocating frequency is 5Hz, the reciprocating stroke length is 5mm, the sliding distance is 200m, the test temperature is 21 ℃ plus or minus 5 ℃, the environmental humidity is 35 percent plus or minus 5 percent, the dual material is GCr15 steel ball with phi 6mm, and the average friction coefficient of the coating is 0.16 represented by a ball disc type friction tester. Resistance to crack propagation: the adhesion of the coating and the substrate is evaluated by a scratch tester RST3, the gradual load loading rate is 49N/min, the scratch stroke is 5mm, the critical load value is determined by the fluctuation change of the acoustic signal, and the experimental result shows that the ta-c multi-layer wear-resistant coating is cracked when the critical load is 12N, the longitudinal length of the crack is about 1mm, and the scratch edge is scaled after a diamond indenter is scratched.
The above description of the embodiments is only intended to facilitate the understanding of the method of the invention and its core idea. It should be noted that it is obvious to those skilled in the art that the present invention can be modified in the art without departing from the principle of the present invention, and such modifications and changes also fall within the protection scope of the claims of the present invention.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. The general principles defined herein may be implemented in other embodiments without departing from the spirit or principles of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (10)

1. A ta-c base multilayer wear-resisting cutter coating is characterized in that the coating comprises a bonding layer, a wear-resisting layer and a surface modification layer; the bonding layer is a metal Cr layer, the wear-resistant layer is a ta-c coating prepared by periodic arc ion plating, and the surface modification layer is a diamond-like carbon layer.
2. The ta-c based multilayer wear-resistant tool coating according to claim 1, wherein the bonding layer is prepared by magnetron sputtering technology, the wear-resistant layer is prepared by arc ion plating technology, and the surface modification layer is prepared by magnetron sputtering technology.
3. A ta-c based multi-layer wear resistant tool coating according to claim 1, wherein said wear resistant layer is a periodic continuous plated ta-c coating.
4. A ta-c based multi-layer wear resistant tool coating as claimed in claim 1, wherein: the thickness of the bonding layer is 100-200 nm, the thickness of the wear-resistant layer is 500-1000 nm, and the thickness of the surface modification layer is 50-100 nm.
5. A ta-c based multi-layer wear resistant tool coating as claimed in claim 1, wherein: the thickness of the bonding layer is 200nm, and the thickness of the surface modification layer is 60 nm.
6. A method for producing a ta-c based multilayer wear resistant tool coating according to claim 1, characterized in that the production process is as follows:
s1, cleaning the surface of a base material: soaking and ultrasonically cleaning a matrix for 15-20 min by using acetone and absolute ethyl alcohol in sequence;
s2, pre-cleaning of the vacuum cavity: sucking impurity particles and fine dust in a vacuum chamber by using a dust collector, placing a sample clamp on a rotating stand, starting a vacuum unit, and vacuumizing to 3 x 10-3Pa, starting a magnetic control rectangular Cr target, adjusting the target power to 200W, and pre-sputtering the surface of a rotating frame for 10 min;
s3, ion etching of the surface of the substrate: after the cavity is pre-cleaned, placing a cutter into a clamp, adjusting the rotating speed of a sample rotating frame to be 3-5 rpm/min, starting a thermocouple, heating a sample base station, heating to 150 ℃ and keeping unchanged, introducing high-purity Ar of 100-150 sccm/min, adjusting the pressure of a coating cavity to be 0.1-0.3 Pa, setting the bias voltage of a matrix to be-200-500V, and performing ion etching cleaning for 15-30 min;
s4, preparing a bonding layer: maintaining the pressure of a coating cavity at 0.1-0.3 Pa, starting a magnetic control metal Cr target power supply, adjusting the target power to 200W, adjusting the negative bias of a substrate to-200V, and depositing for 15-30 min;
s5, preparing a ta-c coating: after the bonding layer is plated, closing a metal Cr target power supply, starting an electric arc graphite target power supply, adjusting the pressure of a plating cavity to be 0.01-0.03 Pa, setting target currents of an upper graphite target, a middle graphite target and a lower graphite target to be 60A, 50A and 60A respectively, depositing a ta-c coating, wherein the duration time is 30-45 s, the intermittent time is 15-30 s, defining the time for depositing the ta-c coating once and the intermittent time for depositing the ta-c coating once to be a plating period, and circulating the preparation of the ta-c coating for 60-90 periods;
s6, preparing a diamond-like film: after the ta-c coating is plated, turning off a power supply of an electric arc graphite target, turning on a magnetic control graphite target, introducing 100-150 sccm/min high-purity Ar, adjusting the pressure of a coating cavity to 0.1-0.3 Pa, adjusting the target power to 100W, and plating a diamond-like film on the surface of the ta-c coating for 20-30 min;
and after the plating process is finished, the power supply of the thermocouple is turned off, the cabin door is opened after the temperature of the cavity is naturally cooled to the room temperature, and the cutter attached with the ta-c-based multilayer wear-resistant coating is taken out.
7. The method of making a ta-c based multilayer wear resistant tool coating of claim 6, wherein: and in the S4, the working pressure of the cavity is 0.3Pa, the deposition time is 15min, and the working gas is high-purity argon.
8. The method of making a ta-c based multilayer wear resistant tool coating of claim 6, wherein: the electric arc graphite target in the S5 is a round cake-shaped high-purity electric arc graphite target, one cycle of plating period comprises 45S of depositing the ta-c coating, the interval is 15S, and the plating period is 60 periods.
9. The method of making a ta-c based multilayer wear resistant tool coating of claim 6, wherein: the magnetic control graphite target in the S6 is a rectangular flat high-purity graphite target, and the plating time is 20 min.
10. A ta-c based multi-layer wear resistant tool coating as claimed in claim 6, wherein: the cutter material comprises any one of stainless steel metal, hard alloy and ceramic cutter.
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