CN112941461A - Composite superhard tough coating material and preparation method thereof - Google Patents
Composite superhard tough coating material and preparation method thereof Download PDFInfo
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- CN112941461A CN112941461A CN202110114463.0A CN202110114463A CN112941461A CN 112941461 A CN112941461 A CN 112941461A CN 202110114463 A CN202110114463 A CN 202110114463A CN 112941461 A CN112941461 A CN 112941461A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a composite superhard tough coating material and a preparation method thereof. The invention relates to a composite superhard tough coating material and a preparation method thereof, wherein the nanocrystalline composite coating material is constructed by AlTiN coating materials with different crystal phase structures by utilizing the superhard characteristic and the high temperature resistance characteristic of a nanocrystalline composite structure, the structural design is reasonable, and a transition support layer of a hardness gradient layer is obtained by gradual change of components, so that the AlTiN coating has good combination with a substrate, the hardness of the coating is improved, the good temperature resistance and wear resistance of the coating of the substrate of a cutter are improved greatly, the problems of insufficient temperature resistance and wear resistance of the coating of the substrate of the cutter are solved greatly, the service performance of the substrate is improved effectively, and the service life of the substrate is prolonged.
Description
Technical Field
The invention relates to the field of coating materials, in particular to a composite superhard tough coating material and a preparation method thereof.
Background
With the rapid increase of the usage amount of difficult-to-machine materials such as high-strength steel and composite materials along with the technological progress, the machining technology of the machining industry is gradually transferred to the processes of high-speed cutting, heavy-machining cutting and the like for use in large quantities, and thus the performance requirements on the machining tool are gradually increased. In the application of general traditional cutting tool coating, mainly TiN, TiCN, TiAlN and other series are taken as main flows. The conventional average hardness of the coating is about 20-30GPa, the high-temperature oxidation resistance of the coating is about 500 ℃, and the coating is affected by overhigh cutting heat when the coating is applied to a cutter in high-speed dry cutting, so that the coating is seriously oxidized and abraded and the cutter fails. In recent years, coatings with high aluminum content, such as AlTiN, AlCrN, etc., have been proposed to improve the wear resistance and oxidation resistance of the coatings. However, the high temperature oxidation resistance of the coating can be improved with the increase of the aluminum content, but the stability of the coating is reduced with the influence of the coating structure, so that how to increase the aluminum content is an important issue in the coating.
Disclosure of Invention
The invention mainly aims to provide a composite superhard tough coating material and a preparation method thereof, which can effectively solve the problems in the background technology.
In order to achieve the purpose, the invention adopts the technical scheme that:
the composite superhard tough coating material comprises a bonding layer, a transition layer, a hardening layer, a supporting layer and a superhard tough high-temperature-resistant wear-resistant layer from inside to outside on the surface of a base layer.
Preferably, the total thickness of the composite superhard tough coating is 2-14 microns, wherein the thickness of the bonding layer is 10-190 nanometers, the thickness of the transition layer is 20-350 nanometers, the thickness of the hardening layer is 150-1400 nanometers, the thickness of the supporting layer is 300-1600 nanometers, and the thickness of the high-temperature resistant tough wear-resistant layer is 0.3-11 microns.
A preparation method of a composite superhard tough coating material comprises the following steps:
s1, cleaning a substrate: polishing the substrate, then ultrasonically cleaning the substrate for 15-25 min by acetone and alcohol in sequence, drying the substrate by nitrogen, and then putting the substrate into a vacuum chamber;
s2, Ar and metal ion bombardment: turning on a heater, heating to 300-500 ℃, and vacuumizing a vacuum chamber until the vacuum degree is 1.2-8.5 multiplied by 10 < -3 > Pa; then introducing Ar gas of 250-350 sccm, setting the bias voltage of the workpiece support to-850-1100V, and performing glow cleaning on the cavity for 10-20 min; reducing the bias voltage to-650 to-850V, igniting the AlTi target, wherein the target current is 65-155A, bombarding the substrate with high-energy AlTi metal cations for 5-15 min, and activating the surface of the metal substrate to improve the film-substrate bonding force;
s3, depositing a bonding layer on the surface of the substrate by plasma vapor deposition, wherein the deposition conditions are as follows: under the conditions of 100-500 ℃ and argon atmosphere, after the chemically cleaned matrix is etched by arc plasma, a bonding layer with the thickness of 10-190 nanometers is deposited under the conditions of 0.01-0.21Pa, 800V and 1000V;
s4, depositing a transition layer on the bonding layer obtained in the previous step by using plasma vapor deposition, wherein the deposition conditions are as follows: depositing a transition layer with the thickness of 20-350 nanometers under the conditions of 0.11-2.4Pa, 15V and 300V.
S5, plasma vapor deposition hardening layer on the transition layer obtained in the previous step, wherein the deposition conditions are as follows: depositing a hardened layer with the thickness of 150-1400 nm under the bias pressure condition of 0.4-9Pa and the bias voltage of-60V to-300V.
S6, plasma vapor deposition of a supporting layer on the hardened layer obtained in the previous step, wherein the deposition conditions are as follows: the 300-1600 nm thick support layer is deposited under the bias pressure condition of 0.4-9Pa and-60V to-300V.
S7, carrying out plasma vapor deposition on the ultra-strong-toughness high-temperature-resistant wear-resistant layer on the supporting layer obtained in the previous step, wherein the deposition conditions are as follows: depositing a high-temperature resistant, tough and wear-resistant layer with the thickness of 0.3-11 microns under the bias pressure condition of 0.6-11Pa and the bias pressure of-15V to-300V.
And S8, closing the arc power supply, opening the vacuum chamber to take out the substrate when the temperature of the vacuum chamber is reduced to room temperature, and forming a coating on the surface of the substrate, namely the composite superhard tough coating.
Preferably, the total thickness of the composite super-hard tough coating is controlled to be 2-14 microns all the time.
Preferably, the atomic percentages of the elements of the AlTi target in steps S2-S7 are respectively Al: 30-75 at.%, Ti: 25 to 55 at.%.
Preferably, in step S1, the substrate is cemented carbide, stainless steel, high-speed steel, carbon steel or a mold.
Compared with the prior art, the invention has the following beneficial effects: the invention relates to a composite superhard tough coating material and a preparation method thereof, wherein the superhard characteristic and the high temperature resistance characteristic of a nanocrystalline composite structure are utilized to construct a nanocrystalline composite coating material from AlTiN coating materials with different crystal phase structures, the structural design is reasonable, and a transition support layer of a hardness gradient layer is obtained by gradual change of components, so that the AlTiN coating has good combination with a substrate, the hardness of the coating is improved, the good temperature resistance and wear resistance of the coating of the substrate of a cutter are improved, the problems of insufficient temperature resistance and wear resistance of the coating of the substrate of the cutter are greatly improved, the service performance of the substrate is effectively improved, and the service life of the substrate is prolonged.
Detailed Description
In order to make the technical means, the creation characteristics, the achievement purposes and the effects of the invention easy to understand, the invention is further described with the specific embodiments.
Example 1
A composite superhard tough coating material comprises a bonding layer, a transition layer, a hardening layer, a supporting layer and a superhard tough high-temperature resistant and wear-resistant layer from inside to outside on the surface of a base layer.
In this embodiment, the total thickness of the composite superhard tough coating is 2-14 microns, wherein the thickness of the bonding layer is 10-190 nm, the thickness of the transition layer is 20-350 nm, the thickness of the hardening layer is 150-.
A preparation method of a composite superhard tough coating material comprises the following steps:
s1, cleaning a substrate: polishing the substrate, then ultrasonically cleaning the substrate for 15-25 min by acetone and alcohol in sequence, drying the substrate by nitrogen, and then putting the substrate into a vacuum chamber;
s2, Ar and metal ion bombardment: turning on a heater, heating to 300-500 ℃, and vacuumizing a vacuum chamber until the vacuum degree is 1.2-8.5 multiplied by 10 < -3 > Pa; then introducing Ar gas of 250-350 sccm, setting the bias voltage of the workpiece support to-850-1100V, and performing glow cleaning on the cavity for 10-20 min; reducing the bias voltage to-650 to-850V, igniting the AlTi target, wherein the target current is 65-155A, bombarding the substrate with high-energy AlTi metal cations for 5-15 min, and activating the surface of the metal substrate to improve the film-substrate bonding force;
s3, depositing a bonding layer on the surface of the substrate by plasma vapor deposition, wherein the deposition conditions are as follows: under the conditions of 100-500 ℃ and argon atmosphere, after the chemically cleaned matrix is etched by arc plasma, a bonding layer with the thickness of 10-190 nanometers is deposited under the conditions of 0.01-0.21Pa, 800V and 1000V;
s4, depositing a transition layer on the bonding layer obtained in the previous step by using plasma vapor deposition, wherein the deposition conditions are as follows: depositing a transition layer with the thickness of 20-350 nanometers under the conditions of 0.11-2.4Pa, 15V and 300V.
S5, plasma vapor deposition hardening layer on the transition layer obtained in the previous step, wherein the deposition conditions are as follows: depositing a hardened layer with the thickness of 150-1400 nm under the bias pressure condition of 0.4-9Pa and the bias voltage of-60V to-300V.
S6, plasma vapor deposition of a supporting layer on the hardened layer obtained in the previous step, wherein the deposition conditions are as follows: the 300-1600 nm thick support layer is deposited under the bias pressure condition of 0.4-9Pa and-60V to-300V.
S7, carrying out plasma vapor deposition on the ultra-strong-toughness high-temperature-resistant wear-resistant layer on the supporting layer obtained in the previous step, wherein the deposition conditions are as follows: depositing a high-temperature resistant, tough and wear-resistant layer with the thickness of 0.3-11 microns under the bias pressure condition of 0.6-11Pa and the bias pressure of-15V to-300V.
And S8, closing the arc power supply, opening the vacuum chamber to take out the substrate when the temperature of the vacuum chamber is reduced to room temperature, and forming a coating on the surface of the substrate, namely the composite superhard tough coating.
In the embodiment, the total thickness of the composite superhard tough coating is controlled to be 2-14 microns all the time.
In the present embodiment, the atomic percentages of the elements of the AlTi target in steps S2-S7 are Al: 30-75 at.%, Ti: 25 to 55 at.%.
In this embodiment, in step S1, the substrate is a cemented carbide, a stainless steel, a high-speed steel, a carbon steel, or a mold.
The invention relates to a composite superhard tough coating material and a preparation method thereof, wherein a chemically cleaned substrate is subjected to plasma etching cleaning by using a substrate bias voltage and an arc light ion source, and then a bonding layer, a transition layer, a hardening layer, a supporting layer and a superhard tough high-temperature resistant wear-resistant layer are sequentially deposited by using an arc ion plating method; firstly, polishing a substrate, then ultrasonically cleaning the substrate for 15-25 min by acetone and alcohol, drying the substrate by nitrogen, then placing the substrate into a vacuum chamber, turning on a heater, heating the substrate to 300-500 ℃, and vacuumizing the vacuum chamber until the vacuum degree is 1.2-8.5 multiplied by 10 < -3 > Pa; then introducing Ar gas of 250-350 sccm, setting the bias voltage of the workpiece support to-850-1100V, and performing glow cleaning on the cavity for 10-20 min; reducing the bias voltage to-650 to-850V, igniting the AlTi target, setting the target current to 65-155A, bombarding the substrate with high-energy AlTi metal cations for 5-15 min, activating the surface of the metal substrate to improve the film-substrate bonding force, depositing under the conditions of 0.01-0.21Pa, 800V to-1000V to form a bonding layer, depositing on the bonding layer under the conditions of 0.11-2.4Pa, 15V to-300V to form a transition layer by plasma vapor deposition, depositing under the conditions of 0.4-9Pa, 60V to-300V to form a hardening layer, depositing under the bias voltage conditions of 0.4-9Pa, 60V to-300V to form a supporting layer, depositing under the conditions of 0.6-11Pa, 15V to-300V to form a high-temperature and high-toughness wear-resistant layer, finally waiting for natural cooling, and forming the composite super-hard coating on the surface of the substrate, and the total thickness of the composite superhard tough coating is controlled to be 2-14 microns all the time, the invention provides a composite superhard tough coating material of nanocrystalline prepared by different AlTi component proportions, and is composed of a bottom bonding layer, a middle transition supporting layer and a high-strength and toughness wear-resistant layer, the invention relates to a composite superhard and tough coating material and a preparation method thereof, by utilizing the super-hard characteristic and the high temperature resistance characteristic of the nanocrystalline composite structure, the AlTiN coating material with different crystal phase structures is constructed into the nanocrystalline composite coating material, the transition support layer of the hardness gradient layer is obtained by gradual change of components, so that the AlTiN coating has good binding property with the substrate, the hardness of the coating is improved, the obtained good temperature resistance and wear resistance are improved, the problems of insufficient temperature resistance and wear resistance of the substrate coating of the cutter are greatly improved, the service performance of the substrate is effectively improved, and the service life of the substrate is prolonged.
The foregoing shows and describes the general principles and broad features of the present invention and advantages thereof. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (6)
1. A composite superhard tough coating material is characterized in that: the composite superhard tough coating material is composed of a bonding layer, a transition layer, a hardening layer, a supporting layer and a superhard tough high-temperature-resistant wear-resistant layer from inside to outside on the surface of a base layer.
2. The composite superhard tough coating material according to claim 1, wherein: the total thickness of the composite superhard tough coating is 2-14 microns, wherein the thickness of the bonding layer is 10-190 nanometers, the thickness of the transition layer is 20-350 nanometers, the thickness of the hardening layer is 150-1400 nanometers, the thickness of the supporting layer is 300-1600 nanometers, and the thickness of the high-temperature-resistant tough wear-resistant layer is 0.3-11 microns.
3. The preparation method of the composite superhard tough coating material according to claim 1, wherein the preparation method comprises the following steps: carrying out plasma etching cleaning on the chemically cleaned substrate by using a substrate bias voltage and arc ion source, and then sequentially depositing a bonding layer, a transition layer, a hardening layer, a supporting layer and an ultra-high-temperature-resistant and ultra-high-strength wear-resistant layer by using an arc ion plating method, wherein the steps are as follows:
s1, cleaning a substrate: polishing the substrate, then ultrasonically cleaning the substrate for 15-25 min by acetone and alcohol in sequence, drying the substrate by nitrogen, and then putting the substrate into a vacuum chamber.
S2, Ar and metal ion bombardment: turning on a heater, heating to 300-500 ℃, and vacuumizing a vacuum chamber until the vacuum degree is 1.2-8.5 multiplied by 10 < -3 > Pa; then introducing Ar gas of 250-350 sccm, setting the bias voltage of the workpiece support to-850-1100V, and performing glow cleaning on the cavity for 10-20 min; and reducing the bias voltage to-650 to-850V, igniting the AlTi target, wherein the target current is 65-155A, bombarding the substrate with high-energy AlTi metal cations for 5-15 min, and activating the surface of the metal substrate to improve the film-substrate bonding force.
S3, depositing a bonding layer on the surface of the substrate by plasma vapor deposition, wherein the deposition conditions are as follows: under the conditions of 100-500 ℃ and argon atmosphere, after the chemically cleaned substrate is etched by arc plasma, a bonding layer with the thickness of 10-190 nanometers is deposited under the conditions of 0.01-0.21Pa, 800V and 1000V.
S4, depositing a transition layer on the bonding layer obtained in the previous step by using plasma vapor deposition, wherein the deposition conditions are as follows: depositing a transition layer with the thickness of 20-350 nanometers under the conditions of 0.11-2.4Pa, 15V and 300V.
S5, plasma vapor deposition hardening layer on the transition layer obtained in the previous step, wherein the deposition conditions are as follows: depositing a hardened layer with the thickness of 150-1400 nm under the bias pressure condition of 0.4-9Pa and the bias voltage of-60V to-300V.
S6, plasma vapor deposition of a supporting layer on the hardened layer obtained in the previous step, wherein the deposition conditions are as follows: the 300-1600 nm thick support layer is deposited under the bias pressure condition of 0.4-9Pa and-60V to-300V.
S7, carrying out plasma vapor deposition on the ultra-strong-toughness high-temperature-resistant wear-resistant layer on the supporting layer obtained in the previous step, wherein the deposition conditions are as follows: depositing a high-temperature resistant, tough and wear-resistant layer with the thickness of 0.3-11 microns under the bias pressure condition of 0.6-11Pa and the bias pressure of-15V to-300V.
And S8, closing the arc power supply, opening the vacuum chamber to take out the substrate when the temperature of the vacuum chamber is reduced to room temperature, and forming a coating on the surface of the substrate, namely the composite superhard tough coating.
4. The composite superhard tough coating material according to claim 1, wherein: the total thickness of the composite superhard and tough coating is controlled to be 2-14 microns all the time.
5. The composite superhard tough coating material according to claim 3, wherein: in steps S2-S7, the atomic percentages of the elements of the AlTi target are respectively Al: 30-75 at.%, Ti: 25 to 55 at.%.
6. The composite superhard tough coating material according to claim 3, wherein: in the step S1, the substrate is made of hard alloy, stainless steel, high-speed steel, carbon steel or a die.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115044873A (en) * | 2022-06-28 | 2022-09-13 | 东莞市华升真空镀膜科技有限公司 | Method for producing a coating structure |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104213075A (en) * | 2014-09-22 | 2014-12-17 | 武汉大学 | AlTiSiN-AlCrSiN nanocrystalline-amorphous multilayer composite superhard toughness coating material and manufacturing method |
| CN108690956A (en) * | 2018-04-28 | 2018-10-23 | 广东工业大学 | Arc ion plating-magnetron sputtering composite deposition high-temperature wearable antifriction AlTiN nano laminated coatings and its preparation method and application |
-
2021
- 2021-01-26 CN CN202110114463.0A patent/CN112941461A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104213075A (en) * | 2014-09-22 | 2014-12-17 | 武汉大学 | AlTiSiN-AlCrSiN nanocrystalline-amorphous multilayer composite superhard toughness coating material and manufacturing method |
| CN108690956A (en) * | 2018-04-28 | 2018-10-23 | 广东工业大学 | Arc ion plating-magnetron sputtering composite deposition high-temperature wearable antifriction AlTiN nano laminated coatings and its preparation method and application |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115044873A (en) * | 2022-06-28 | 2022-09-13 | 东莞市华升真空镀膜科技有限公司 | Method for producing a coating structure |
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