CN106835036A - It is a kind of to modulate the method that high-power impulse magnetron sputtering prepares AlCrN coatings - Google Patents

It is a kind of to modulate the method that high-power impulse magnetron sputtering prepares AlCrN coatings Download PDF

Info

Publication number
CN106835036A
CN106835036A CN201610674484.7A CN201610674484A CN106835036A CN 106835036 A CN106835036 A CN 106835036A CN 201610674484 A CN201610674484 A CN 201610674484A CN 106835036 A CN106835036 A CN 106835036A
Authority
CN
China
Prior art keywords
magnetron sputtering
power
alcrn
coatings
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201610674484.7A
Other languages
Chinese (zh)
Other versions
CN106835036B (en
Inventor
郑军
周晖
王启民
贵宾华
张延帅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lanzhou Institute of Physics of Chinese Academy of Space Technology
Original Assignee
Lanzhou Institute of Physics of Chinese Academy of Space Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lanzhou Institute of Physics of Chinese Academy of Space Technology filed Critical Lanzhou Institute of Physics of Chinese Academy of Space Technology
Priority to CN201610674484.7A priority Critical patent/CN106835036B/en
Publication of CN106835036A publication Critical patent/CN106835036A/en
Application granted granted Critical
Publication of CN106835036B publication Critical patent/CN106835036B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present invention provides a kind of method that modulation high-power impulse magnetron sputtering prepares AlCrN coatings, belongs to technical field of vacuum.Specifically, it is to utilize to modulate high-power impulse magnetron sputtering technology, by Optimizing Process Parameters, reaction magnetocontrol sputtering prepares AlCrN coatings, compared with existing technology of preparing, the technology is obtained in that smooth dense structure, surface, excellent mechanical performance, high high-temp stability, the AlCrN coatings with excellent high-speed cutting performance, is a kind of high-performance rigid coat preparing technology with applications well prospect.

Description

It is a kind of to modulate the method that high-power impulse magnetron sputtering prepares AlCrN coatings
Technical field
The method that high-power impulse magnetron sputtering prepares AlCrN coatings is modulated the present invention relates to a kind of, belongs to vacuum technique Field.
Background technology
The proposition of the requirements such as high efficiency, high-quality, Green Machining, difficult-to-machine material are processed to material with modern manufacturing The machining condition of (such as hardened steel) is more and more harsher.Constantly development comes also to promote cutting tool coating material and coating technology simultaneously Coating quality is improved, to meet increasingly harsh demand.The performance for improving cutter coat can mainly be improved by two aspects： One is to add new chemical element in the coating, and two is the parameter optimization of selection by coating technology and deposition.
TiAlN and AlTiN are physical vapour deposition (PVD) (PVD) cutter coats that will be formed in Al element depositions to TiN.So far Untill the present, by increasing the aluminium content in TiAlN, AlTiN coating, so that strengthen the resistance to elevated temperatures and hardness of cutter coat, The important technical problem that always Tool Manufacturer and Coatings Corporation are paid close attention to.Due to being limited by coating structure stability, Aluminium content in AlTiN coatings has actually reached maximum (about 65%).In TiN base coatings, aluminium content is too high to cause painting Layer crystal structure is converted into hexagoinal lattice by cubic lattice：And in CrN base coatings, aluminium content can further improve without Cause the crystal structure of AlCrN coatings to change, with red hardness and inoxidizability higher, be considered as being more suitably applied to Dry cutting, is now emerging high-performance rigid coating.
Except coating composition, coating performance largely additionally depends on the technology of preparing of coating, painting prepared by different technologies Layer performance difference is very big.PVD technique is low due to depositing temperature, and have no adverse effect easily controllable coating composition and structure etc. to environment Advantage has turned into current and has prepared the at most widest methods of cutter application hard coat.Wherein it is used for the PVD of hard coat deposition Technology is mainly magnetron sputtering and the class of arc ion plating two.Traditional arc ion plating (aip) ionization level is high, can obtain close 90% ionization level and faster sedimentation rate, are the main flows for preparing cutter coat at this stage with excellent film-substrate cohesion Technology, has the advantages that ionization level is high, is adapted to industrialization large area production, and under back bias voltage acceleration, depositional coating adhesion is good, Dense structure, sedimentation rate is high, and Tool in Cutting hard wear-resistant coating and high-temperature protection coating are had been widely used at present.But apply The drop bulky grain of layer surface greatly influences the service life of coating performance and coated cutting tool.
High-power impulse magnetron sputtering technology (the High Power Impulse Magnetron for growing up in recent years Sputtering, HIPIMS) compactness and film-substrate cohesion of deposition film can be improved, especially for complex-shaped workpieces Deposition, control, the depositing coating to different zones etc. of reaction it is significant.But relative to traditional magnetically controlled DC sputtering and For multi sphere ion plating technology, HIPIMS still has sedimentation rate relatively low, and discharge stability, controllability are to be improved etc., and deficiency is deposited .To improve above mentioned problem, modulation high-power impulse magnetron sputtering (MPP or HIPIMS+) technology regulates and controls pulse by micropulse Position shape, using segmented pulse, low-voltage section is ignited plasma, and high voltage section can be than conventional high power pulsed sputter arteries and veins Rush it is much lower in the case of obtain plasma density and ionization level higher, reduce about amount of peak point current and peak power Level, and pulse width is widened to ms grades, maximum up to 3ms, dutycycle is up to 28%, so that voltage keeps permanent in pulse operating time It is fixed, improve the stability and controllability of high-power impulse magnetron sputtering.
The content of the invention
In view of this, AlCrN coatings are prepared it is an object of the invention to provide one kind modulation high-power impulse magnetron sputtering Method, methods described have good process repeatability, easily realize industrialized production, the AlCrN coatings prepared have table Face is smooth, dense structure, excellent mechanical performance, high high-temp stability, excellent high-speed cutting performance the advantages of, depositing coating knife The characteristics of tool is applied to the glass hard steel material machining under high-speed condition.
The purpose of the present invention is achieved through the following technical solutions.
A kind of modulate the high-power impulse magnetron sputtering method for preparing AlCrN coatings, methods described is concretely comprised the following steps：
By the matrix after cleaning, on work rest, work rest rotating speed keeps 2~5rpm to clamping, starts to vacuumize, and works as vacuum Degree is higher than 1~5 × 10-3During Pa, degasification is begun to warm up, temperature control is at 200~500 DEG C.When vacuum reaches 1~8 × 10- 3During Pa, Ar gas is passed through, vacuum is maintained at 0.3~0.9Pa.Pre-sputter cleaning is carried out to AlCr targets to remove AlCr target tables The gas and impurity of face absorption, while carrying out plasma clean 10~30 minutes to matrix surface using plasma source, increase Plus matrix surface cleanliness factor, strengthen matrix surface chemism, to improve binding ability between coating and matrix, plasma source work( Rate is 3~10kW.Logical N2100~300sccm of throughput, opens modulation high-power impulse magnetron sputtering AlCr targets, AlCr targets Composition is:Al60~70at.%, Cr are surplus, modulate high power pulsed source mean power 10kW, charging average voltage 350 ~650V, wherein 350~500V be light current press section, 500~650V be strong voltage section, single voltage pulse time be 500~ 1500 μ s, light current pressure the μ s of section 200~800, strong voltage section 300~700 μ s, 30~300Hz of frequency, pulse peak power 50~ 300kW, 430~850V of crest voltage, 130~400A of peak point current.To 30~200V of matrix plus back bias voltage, depositing Al CrN is applied Layer 60~180 minutes, sedimentation rate is 0.5~1.5 μm/h.Natural cooling after coating is deposited, when temperature drops to less than 80 DEG C When, obtain being prepared with a kind of modulation high-power impulse magnetron sputtering the matrix of AlCrN coatings.
Beneficial effect
(1) AlCrN coatings prepared by the modulation high-power impulse magnetron sputtering method provided using the present invention are relative to use AlCrN coatings prepared by magnetron sputtering or arc ion plating, high with hardness, without bulky grain, adhesion is strong, coefficient of friction on surface And the small advantage of cutting force, so that the hard alloy and high-speed steel tool that deposit the AlCrN coatings are applied under high-speed condition Glass hard steel material machining.Experiment test shows that deposited parameter optimization, AlCrN coatings have hard more than 30GPa Degree, the milling cutter life-span of the AlCrN coatings prepared with the modulation high-power impulse magnetron sputtering method that the present invention is provided is about to be had 2 times of the milling cutter life-span of AlCrN coatings prepared by arc ion plating, cutting force is significantly lower than with arc ion plating preparation The milling cutter of AlCrN coatings.
(2) cutter of the AlCrN coatings prepared with the modulation high-power impulse magnetron sputtering method that the present invention is provided, it resists Mechanical wear performance and high temperature oxidation resistance are improved largely, and can meet High-speed machining to the more preferable performance of cutter material Demand, have huge market potential and use value.
Brief description of the drawings
Fig. 1 (a), (b) are respectively in comparative example and modulate high power pulse magnetic in conventional arc ion plating and embodiment 2 The surface topography map of AlCrN coatings prepared by control sputtering.
Fig. 2 is conventional arc ion plating, the modulation high-power impulse magnetron sputtering technology preparation of embodiment 2 in comparative example AlCrN coatings milling cutter and non-coating milling cutter cutting of hardened steel when cutting force compare figure.
Fig. 3 is conventional arc ion plating, the modulation high-power impulse magnetron sputtering preparation of embodiment 2 in comparative example The milling cutter cutting of hardened steel life-span of the milling cutter of AlCrN coatings and non-coating compares figure.
Specific embodiment
The present invention, but not limited to this are described in detail in detail with reference to specific embodiment.
Embodiment 1
Carbide chip is cleaned with alcohol and acetone, is placed on the work rest of vacuum chamber after being dried up with air gun, adjust work Part frame rotating speed is 2rpm, is evacuated to 1 × 10-3Pa, opens heater, is warming up to 200 DEG C；When vacuum reaches 1 × 10-3Pa When, Ar throughput valves are opened, vacuum is maintained at 0.3Pa, pre-sputter cleaning is carried out to AlCr targets, while using plasma source Plasma clean is carried out to carbide chip surface, scavenging period is 10 minutes, and plasma source power is 10kW.Logical N2 Flow 200sccm, opens modulation high-power impulse magnetron sputtering AlCr targets, and AlCr target material compositions are:Al 70at.%, Cr are remaining Amount；Modulation high power pulsed source mean power 10kW, charging average voltage 350V, wherein 350~500V is light current presses section, 500~650V is strong voltage section, and single voltage pulse time is 500 μ s, wherein the light current pressure μ s of section 200, strong voltage 300 μ s of section, Frequency 30Hz, pulse peak power 50kW, crest voltage 430V, peak point current 150A.Add back bias voltage on carbide chip 30V, depositing Al CrN coating 60 minutes, natural cooling after about 0.5~1.5 μm/h. depositing coatings of sedimentation rate, when temperature is dropped to At less than 80 DEG C, the carbide cutter tool of the obtained AlCrN coatings that there is modulation high-power impulse magnetron sputtering method to prepare is taken out Piece.
The coating is measured using the NHTS/N060146 types nano hardness of Austrian Anton Paar Co., Ltd (CSM) production Amount, test condition is load 20mN, loading speed 20mN/min, measures the coating hardness for 33.4Gpa.
Embodiment 2
The flat carbide end mill of four swords (hereinafter referred to as carbide end mill) is cleaned with alcohol and acetone, air gun is used It is placed on the work rest of vacuum chamber after drying, regulation work rest rotating speed is 3rpm, is evacuated to 5 × 10-3Pa, opens heater, 400 DEG C are warming up to, when vacuum reaches 5 × 10-3During Pa, Ar throughput valves are opened, vacuum is maintained at 0.5Pa, to AlCr targets Pre-sputter cleaning is carried out, while plasma clean is carried out to carbide end mill surface using plasma source, during cleaning Between be 20 minutes, plasma source power is 5kW.Logical N2Flow 250sccm, opens modulation high-power impulse magnetron sputtering AlCr targets Material, AlCr target material compositions are:Al 65at.%, Cr are surplus；Modulation high power pulsed source mean power 10kW, charges average Voltage 450V, wherein 350~500V is light current pressing section, 500~650V is strong voltage section, and single voltage pulse time is 1000 μ S, wherein light current press the μ s of section 500, strong voltage section 500 μ s, frequency 150Hz, pulse peak power 200kW, crest voltage 600V, peak Value electric current 300A.To carbide end mill plus back bias voltage 100V, depositing Al CrN coatings 120 minutes, sedimentation rate about 0.5~ 1.5μm/h.Natural cooling after depositing coating, when temperature is dropped to below 80 DEG C, takes out obtained with modulation high power pulse The carbide end mill of AlCrN coatings prepared by magnetron sputtering method.
The coating is measured using the NHTS/N060146 types nanoindenter of CSM productions, and test condition is load 20mN, Loading speed 20mN/min, measures the coating hardness for 30.7Gpa.
Embodiment 3
The flat carbide end mill of four swords (hereinafter referred to as carbide end mill) is cleaned with alcohol and acetone, air gun is used It is placed on the work rest of vacuum chamber after drying, regulation work rest rotating speed is 5rpm, is evacuated to 3 × 10~3Pa, opens heater, 500 DEG C are warming up to, when vacuum reaches 8 × 10-3During Pa, Ar throughput valves are opened, vacuum is maintained at 0.9Pa, to AlCr targets Pre-sputter cleaning is carried out, while plasma clean is carried out to carbide end mill surface using plasma source, during cleaning Between be 30 minutes, plasma source power is 3kW.Logical N2Flow 300sccm, opens modulation high-power impulse magnetron sputtering AlCr targets Material, AlCr target material compositions are:Al 60at.%, Cr are surplus；Modulation high power pulsed source mean power 10kW, charges average Voltage 650V, wherein 350~500V is light current pressing section, 500~650V is strong voltage section, and single voltage pulse time is 1500 μ S, wherein light current press the μ s of section 800, strong voltage section 700 μ s, frequency 300Hz, pulse peak power 300kW, crest voltage 850V, peak Value electric current 400A.Add back bias voltage 200V, depositing Al CrN coatings 180 minutes, sedimentation rate about 0.5 on carbide end mill ~1.5 μm/h.Natural cooling after depositing coating, when temperature is dropped to below 80 DEG C, takes out obtained with modulation high power arteries and veins Rush the carbide end mill of the AlCrN coatings of magnetron sputtering method preparation.
The coating is measured using the NHTS/N060146 types nano hardness of Austrian Anton Paar Co., Ltd (CSM) production Amount, test condition is load 20mN, loading speed 20mN/min, measures the coating hardness for 32.1Gpa.
Comparative example
The flat carbide end mill of four swords (hereinafter referred to as carbide end mill) is cleaned with alcohol and acetone, air gun is used It is placed on the work rest of vacuum chamber after drying, regulation work rest rotating speed is 5rpm, is evacuated to 3 × 10~3Pa, opens heater, 400 DEG C are warming up to, when vacuum reaches 4 × 10-3During Pa, Ar throughput valves are opened, vacuum is maintained at 1.5Pa, in hard alloy Adding back bias voltage 1000V on slotting cutter carries out aura cleaning 30min, is then turned on Cr (atomic ratio is 99.99%) target, and electric current is 60A, the negative bias reduced on carbide end mill is depressed into 900V, icon bombardment cleaning carbide end mill surface 6min.So Lead to N afterwards2Flow 300sccm, makes vacuum be maintained at 2.0Pa, reduces carbide end mill negative bias and is depressed into 200V, deposition CrN bottoms Layer 4min.Regulation choke valve, makes vacuum be maintained at 2.5Pa, later on AlCr targets, and target current is 80A, reduces hard alloy and stands Negative bias is depressed into 100V on milling cutter, and the time is 4min, prepares AlCrN-CrN transition zones, finally closes Cr target arc sources, and vacuum keeps In 2.5Pa, AlCr target currents are 80A, and the negative bias reduced on carbide end mill is depressed into 80V, depositing Al CrN coatings 60min. Film layer is prepared after finishing, and sample is cooled down under vacuum condition in stove, and taking-up is obtained to have prepared by arc ion plating The carbide end mill of AlCrN coatings.
Fig. 1 (a), (b) modulate prepared by high-power impulse magnetron sputtering in being respectively conventional arc ion plating and embodiment 1 The surface topography map of AlCrN coatings.The AlCrN coating surfaces of new type of modulation high-power impulse magnetron sputtering technology deposition are without big Grain, surface is substantially more smooth.And coating is finer and close.
Fig. 2 is to be applied with the AlCrN that high-power impulse magnetron sputtering preparation is modulated in conventional arc ion plating, embodiment 1 Layer milling cutter and non-coating milling cutter cutting of hardened steel when cutting force compare figure.Abscissa Cutting Length grow for cutting Degree, ordinate Cutting Force are cutting force.Arc-AlCrN represents the milling of the AlCrN coatings prepared with arc ion plating Knife, Hipims-AlCrN represents the milling cutter of the AlCrN coatings prepared with modulation high-power impulse magnetron sputtering, Uncoated tables Show the milling cutter of non-coating.Milling Parameters are：Milling Speed v=200m/min (rotating speed n=10616rpm), feed engagement f= 0.05mm/z, milling depth ap=2mm, milling width ae=0.1mm.Milling with the AlCrN coatings prepared described in embodiment 1 Milling cutter of the knife cutting force significantly lower than the AlCrN coatings prepared with conventional arc ion plating.Because modulation high power arteries and veins The AlCrN coating surfaces for rushing magnetron sputtering technique deposition are more smooth, and skin-friction coefficient is smaller, causes cutting force smaller.
Fig. 3 is to be applied with the AlCrN that high-power impulse magnetron sputtering preparation is modulated in conventional arc ion plating, embodiment 1 The milling cutter of layer and the milling cutter cutting of hardened steel life-span of non-coating compare figure.Abscissa Cutting Length are length of cut, are indulged Coordinate Frank Wear are wear extent.Arc-AlCrN represents the milling cutter of the AlCrN coatings prepared with arc ion plating, Hipims-AlCrN represents the milling cutter of the AlCrN coatings prepared with modulation high-power impulse magnetron sputtering, and Uncoated is represented The milling cutter of non-coating.300um is blunt standard.Milling Parameters are：Milling Speed v=200m/min (rotating speed n=10616rpm), Feed engagement f=0.05mm/z, milling depth ap=2mm, milling width ae=0.1mm.With what is prepared described in embodiment 1 The milling cutter life-span of AlCrN coatings is about 2 times of the milling cutter life-span of the AlCrN coatings prepared with conventional arc ion plating, and this is Because the AlCrN coating surfaces of modulation high-power impulse magnetron sputtering technology deposition are more smooth, mechanical property is more preferable, high-temperature behavior More excellent, wearability is more preferably so as to the life-span is longer.
The present invention include but is not limited to above example, it is every carried out under the principle of spirit of the present invention it is any equivalent Replace or local improvement, all will be regarded as within protection scope of the present invention.

Claims (1)

  1. It is 1. a kind of to modulate the method that high-power impulse magnetron sputtering prepares AlCrN coatings, it is characterised in that：Methods described it is specific Step is：
    By the matrix after cleaning, on work rest, work rest rotating speed keeps 2~5rpm to clamping, starts to vacuumize, when vacuum is high In 1~5 × 10-3During Pa, begin to warm up degasification, temperature control at 200~500 DEG C, when vacuum reaches 1~8 × 10-3During Pa, Ar gas is passed through, vacuum is maintained at 0.3~0.9Pa, pre-sputter cleaning is carried out to AlCr targets, while using plasma source to base Body surface face carries out plasma clean 10~30 minutes, leads to N2100~300sccm of throughput, opens modulation high power pulse magnetic control Sputtering AlCr targets, to 30~200V of matrix plus back bias voltage, depositing Al CrN coatings 60~180 minutes, sedimentation rate is 0.5~ 1.5 μm/h, natural cooling after coating is deposited, when temperature is dropped to below 80 DEG C, obtained with a kind of modulation high power Pulsed magnetron sputtering prepares the matrix of AlCrN coatings；
    The AlCr target material compositions are：Al 60~70at.%, Cr are surplus；During the plasma clean, plasma source Power is 3~10kW；Modulation high power pulsed source mean power 10kW, the charging 350~650V of average voltage, wherein 350~500V is that light current presses section, and 500~650V is strong voltage section, and single voltage pulse time is 500~1500 μ s, wherein weak Voltage section 200~800 μ s, strong voltage section 300~700 μ s, 30~300Hz of frequency, 50~300kW of pulse peak power, peak value 430~850V of voltage, 130~400A of peak point current.
CN201610674484.7A 2016-08-16 2016-08-16 A method of modulation high-power impulse magnetron sputtering prepares AlCrN coating Active CN106835036B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610674484.7A CN106835036B (en) 2016-08-16 2016-08-16 A method of modulation high-power impulse magnetron sputtering prepares AlCrN coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610674484.7A CN106835036B (en) 2016-08-16 2016-08-16 A method of modulation high-power impulse magnetron sputtering prepares AlCrN coating

Publications (2)

Publication Number Publication Date
CN106835036A true CN106835036A (en) 2017-06-13
CN106835036B CN106835036B (en) 2019-02-19

Family

ID=59145544

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610674484.7A Active CN106835036B (en) 2016-08-16 2016-08-16 A method of modulation high-power impulse magnetron sputtering prepares AlCrN coating

Country Status (1)

Country Link
CN (1) CN106835036B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111378929A (en) * 2018-12-29 2020-07-07 苏州星蓝纳米技术有限公司 Novel P coating
CN113201719A (en) * 2021-04-20 2021-08-03 安徽工业大学 AlCrBN hard coating prepared by modulating high-power pulse magnetron sputtering and preparation method thereof
CN113728125A (en) * 2019-05-08 2021-11-30 瓦尔特公开股份有限公司 Coated cutting tool

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101879794A (en) * 2010-05-31 2010-11-10 武汉嘉树科技有限公司 CrTiAlSiN nano composite coating, cutter deposited with same and preparation method thereof
CN104508171A (en) * 2012-04-16 2015-04-08 欧瑞康贸易股份公司(特吕巴赫) High performance tools exhibiting reduced crater wear in particular by dry machining operations
EP3018233A1 (en) * 2014-11-05 2016-05-11 Walter Ag Cutting tool with multilayer PVD coating

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101879794A (en) * 2010-05-31 2010-11-10 武汉嘉树科技有限公司 CrTiAlSiN nano composite coating, cutter deposited with same and preparation method thereof
CN104508171A (en) * 2012-04-16 2015-04-08 欧瑞康贸易股份公司(特吕巴赫) High performance tools exhibiting reduced crater wear in particular by dry machining operations
EP3018233A1 (en) * 2014-11-05 2016-05-11 Walter Ag Cutting tool with multilayer PVD coating

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
王启民等: ""高功率脉冲磁控溅射技术沉积硬质涂层研究进展"", 《光电工业大学学报》 *
钱苗根等: "《材料表面技术及其应用手册》", 30 November 1998, 机械工业出版社 *
魏松: ""可调脉冲高功率磁控溅射电源研制及AlCrN薄膜制备"", 《中国优秀硕士学位论文全文数据库 工程科技Ⅰ辑》 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111378929A (en) * 2018-12-29 2020-07-07 苏州星蓝纳米技术有限公司 Novel P coating
CN113728125A (en) * 2019-05-08 2021-11-30 瓦尔特公开股份有限公司 Coated cutting tool
CN113728125B (en) * 2019-05-08 2024-04-26 瓦尔特公开股份有限公司 Coated cutting tool
CN113201719A (en) * 2021-04-20 2021-08-03 安徽工业大学 AlCrBN hard coating prepared by modulating high-power pulse magnetron sputtering and preparation method thereof

Also Published As

Publication number Publication date
CN106835036B (en) 2019-02-19

Similar Documents

Publication Publication Date Title
CN106086806B (en) A kind of AlTiCrN high-temperature wear resistant coating and preparation method thereof
CN103898445B (en) A kind of multilayer Al CrN cutting tool coating and preparation method thereof
CN103668095B (en) A kind of high power pulse plasma enhancing combined magnetic-controlled sputter deposition apparatus and using method thereof
CN103273687B (en) TiSiN+ZrSiN composite nanometer coated cutting tool and preparation method thereof
CN103695858B (en) A kind of multi-functional full-automatic ion film coating machine for cutter coat deposition and using method thereof
CN107747092B (en) A kind of high temperature resistant hard composite coating and preparation method thereof and coated cutting tool
CN110158044B (en) Multi-element composite gradient coating cutter and preparation method thereof
CN102277554B (en) Gradient multiple coating tool and preparation method thereof
CN107523790B (en) A kind of AlCrSiCuN nano laminated coating and preparation method thereof
CN103132019B (en) A1ZrCrN composite dual-gradient coating cutting tool and preparation method thereof
CN104928638A (en) AlCrSiN-based multilayer nanometer composite cutter coating layer and preparation method thereof
WO2019128904A1 (en) Alcrsin coating with enhanced ion source and gradient-changed si content and ion size
CN111500999A (en) Self-lubricating superhard coating and preparation method thereof
CN110129741B (en) Multi-element nano laminated coating cutter and preparation method thereof
CN110004409B (en) CrAlN nano gradient coating with high hardness and high binding force and preparation process thereof
CN108251797B (en) TiAlN/CrN multilayer coating for titanium alloy cutting tool and preparation method thereof
CN106835036B (en) A method of modulation high-power impulse magnetron sputtering prepares AlCrN coating
CN110777336A (en) Method for preparing ultra-thick hard film based on energy regulation and control principle
CN103382548A (en) Preparation method of matrix surface nano compound Me-Si-N superhard coating
CN105925946A (en) Method for preparing TiN or CrN film on surface of aluminum alloy through magnetron sputtering method
CN108118301A (en) A kind of AlCrSiN coatings in the interlayer with the variation of Si concentration gradients, preparation method
CN111647851A (en) Zr-B-N nano composite coating with high hardness and high toughness and preparation method thereof
CN108866481B (en) Nano composite Al-Ti-V-Cu-N coating and preparation method and application thereof
CN106756841B (en) A kind of preparation method of cutter composite coating
CN106868450A (en) A kind of utilization modulates the method that high-power impulse magnetron sputtering prepares AlTiN hard coats

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB03 Change of inventor or designer information
CB03 Change of inventor or designer information

Inventor after: Zhou Hui

Inventor after: Zheng Jun

Inventor after: Wang Qimin

Inventor after: Gui Binhua

Inventor after: Zhang Yanshuai

Inventor before: Zheng Jun

Inventor before: Zhou Hui

Inventor before: Wang Qimin

Inventor before: Gui Binhua

Inventor before: Zhang Yanshuai

GR01 Patent grant
GR01 Patent grant