CN110875234A - Electrostatic chuck, attachment apparatus having the same, and attachment method - Google Patents

Electrostatic chuck, attachment apparatus having the same, and attachment method Download PDF

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Publication number
CN110875234A
CN110875234A CN201910798852.2A CN201910798852A CN110875234A CN 110875234 A CN110875234 A CN 110875234A CN 201910798852 A CN201910798852 A CN 201910798852A CN 110875234 A CN110875234 A CN 110875234A
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CN
China
Prior art keywords
workpiece
electrostatic chuck
support block
electrostatic
expansion
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Pending
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CN201910798852.2A
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Chinese (zh)
Inventor
金相午
朴熙寅
林炯文
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Aps Holding Co Ltd
AP Systems Inc
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Aps Holding Co Ltd
AP Systems Inc
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Publication date
Application filed by Aps Holding Co Ltd, AP Systems Inc filed Critical Aps Holding Co Ltd
Publication of CN110875234A publication Critical patent/CN110875234A/en
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/185—Joining of semiconductor bodies for junction formation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Mathematical Physics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Liquid Crystal (AREA)
  • Making Paper Articles (AREA)

Abstract

The invention provides an electrostatic chuck, an attaching apparatus, and an attaching method. The electrostatic chuck supports a workpiece including a planar portion and a curved portion extending outwardly from an edge of the planar portion, the electrostatic chuck including: an electrostatic film installed to be positioned corresponding to a rear side of the planar portion of the workpiece; and a movable supporting block positioned corresponding to a rear side of the curved surface portion of the workpiece. Therefore, according to the electrostatic chuck of the exemplary embodiment, a gap or interference between the electrostatic chuck and the workpiece may be reduced as compared to that in the conventional art. Therefore, damage to the workpiece and alignment defects during workpiece attachment can be suppressed or prevented.

Description

Electrostatic chuck, attachment apparatus having the same, and attachment method
Technical Field
The present disclosure relates to an electrostatic chuck, an attaching apparatus including the same, and an attaching method, and more particularly, to an electrostatic chuck, an attaching apparatus including the same, and an attaching method, by which a workpiece whose edge is formed in a curved surface can be easily supported.
Background
Flat panel display devices include liquid crystal display devices (LCDs), plasma display Panel Devices (PDPs), field emission display devices (FEDs), electroluminescent display devices (ELDs), Organic Light Emitting Diodes (OLEDs), and the like, and exhibit excellent properties such as small thickness, light weight, and low power consumption, and thus rapidly replace conventional Cathode Ray Tubes (CRTs).
In addition, research has been conducted in recent years on curved display devices in which a panel is attached to a window having a curved surface.
Among the curved display devices, studies have been actively made on an edge-curved display device capable of presenting an image on both a flat portion and a curved portion.
As shown in fig. 1, this curved display device is manufactured by attaching a flexible panel to the inner surface of a window whose edge is not formed in a planar shape but in a bent or curved shape.
An attachment apparatus for attaching a window and a panel includes an electrostatic chuck supporting a window having an edge formed in a curved surface. The electrostatic chuck includes: a body having an empty space conforming to a shape of a window whose edge is formed in a curved surface; and an electrostatic film on the inner surface defined by the empty space of the main body. Since the electrostatic film is thus attached to the inner wall surface of the empty space defining the main body, the electrostatic film takes a shape corresponding to the window.
Meanwhile, the cavity portion of the electrostatic chuck is manufactured according to design values of a window whose edge is formed in the curved surface, and the design values include a total area of the window, a curvature of the curved surface portion, and the like. In addition, the window is manufactured by a general heat treatment forming method.
However, in manufacturing the window, it is practically difficult to manufacture the size or shape exactly the same as the design value.
In addition, when a window having a size or shape different from a design value is supported on the electrostatic chuck, a gap may be generated between the electrostatic chuck and the window, or interference may be generated such that the electrostatic chuck seizes a local area of the window. This gap or interference occurs frequently, in particular at the location of the curved portion of the viewing window.
The gap or interference between the electrostatic chuck and the window may cause damage to the window or alignment defects between the window and the panel during attachment of the panel to the window.
(related art documents)
(patent document 1) Korean patent No. 10-1619783
Disclosure of Invention
The present disclosure provides an electrostatic chuck capable of easily supporting a workpiece whose edge is formed in a curved surface, an attaching apparatus including the electrostatic chuck, and an attaching method.
The present disclosure also provides an electrostatic chuck capable of suppressing occurrence of a support defect in a curved surface region of a workpiece when supporting the workpiece having an edge formed on the curved surface, an attachment apparatus including the electrostatic chuck, and an attachment method.
According to an exemplary embodiment, an electrostatic chuck for supporting a workpiece including a planar portion and a curved portion extending outwardly from an edge of the planar portion, the electrostatic chuck includes: an electrostatic film installed to be positioned corresponding to a rear side of the planar portion of the workpiece; and a movable supporting block positioned corresponding to a rear side of the curved surface portion of the workpiece.
The electrostatic chuck may comprise a body having a void portion configured to receive a workpiece, wherein the electrostatic film and support block may be mounted on an inner wall of the body.
The support surface of the curved portion of the support block facing the workpiece may have a shape with a curvature conforming to that of the curved portion.
The electrostatic chuck may include a first liner portion positioned behind the electrostatic film and having a contraction elasticity and an expansion elasticity.
The supporting block can be moved backward by an external force applied from the workpiece.
The electrostatic chuck may include a second liner portion positioned behind the support block and having a contractive elasticity and an expansive elasticity.
The second liner portion may include: a first pad member positioned on an outer side in a width direction of the support block; and a second pad member positioned on an upper side of the support block.
The electrostatic chuck may comprise at least one of: an adhesive member positionable on the support surface of the support block; and a suction section comprising a suction tube mountable inside the support block to create a vacuum suction force against the support surface.
The electrostatic chuck may include an expansion member positioned behind the support block and configured to be expandable with a supplied fluid and contractible by discharging the fluid, wherein the support block is movable to a front side on which the workpiece is positioned by expansion of the expansion member.
The electrostatic chuck may include a return member installed to connect the support block and the body, and having a return force for moving the support block to a state before the movement by expansion of the expansion member.
The expansion member may comprise: a first expanding member positioned on an outer side in a width direction of the supporting block; and a second expansion member positioned on an upper side of the support block.
The return means may comprise: a first return member extending in a width direction of the support block and configured to connect the support block and the body; and a second return member extending in a height direction of the support block and configured to connect the support block and the body.
According to another exemplary embodiment, an attaching apparatus for attaching a second workpiece to a first workpiece, the first workpiece including a planar portion and a curved portion extending in an outward direction from an edge of the planar portion and having a curvature, includes: a chamber portion having an interior space; an electrostatic chuck positioned inside the chamber portion, configured to move up and down, and having one surface for supporting a first workpiece; a pressing portion positioned facing the electrostatic chuck inside the chamber portion; and a tray having a hollow shape, positionable between the electrostatic chuck and the pressing portion, and configured to fix and support the second workpiece, wherein the electrostatic chuck is divided into a region corresponding to the planar portion and a region corresponding to the curved portion of the first workpiece, and the region corresponding to the curved portion is movable.
The electrostatic chuck may include an electrostatic film mounted to be positioned corresponding to a backside of the planar portion of the workpiece; and a movable supporting block positioned corresponding to a rear side of the curved surface portion of the workpiece.
The support surface of the curved portion of the support block facing the workpiece may have a curvature conforming to the curved portion.
The attachment apparatus may include a first liner portion positioned behind the electrostatic film and having a contraction elasticity and an expansion elasticity.
The attachment apparatus may include a second pad portion positioned behind the support block and having a contraction elasticity and an expansion elasticity, wherein the support block may be moved backward by the second pad portion using an external force applied from the workpiece.
The attachment device may include at least one of: an adhesive member positionable on the support surface of the support block; and a suction section comprising a suction tube mountable inside the support block to create a vacuum suction force against the support surface.
The electrostatic chuck may comprise: an expansion member positioned behind the support block and configured to be expanded with a fluid that can be supplied and to be contracted by discharging the fluid; and a return member installed to connect the support block and the body and having a return force for moving the support block to a state before moving by expansion of the expansion member, wherein the support block is movable to a front side on which the workpiece is positioned by the expansion of the expansion member and is movable to a rear side by the return force of the return member.
According to yet another exemplary embodiment, a method for attaching a second workpiece to a first workpiece, the first workpiece including a planar portion and a curved portion extending in an outward direction from an edge of the planar portion and having a curvature, includes: supporting a first workpiece on an electrostatic chuck; supporting a second workpiece on a hollow tray positioned facing the electrostatic chuck; and moving the electrostatic chuck and the tray to bring the first workpiece and the second workpiece closer to each other and to attach the second workpiece to the first workpiece, wherein supporting the first workpiece on the electrostatic chuck comprises moving a support block of the electrostatic chuck corresponding to the curved portion of the first workpiece.
Supporting the first workpiece on the electrostatic chuck may comprise: arranging the workpieces such that a planar portion of the first workpiece is positioned facing the electrostatic film of the electrostatic chuck, a curved portion extends outwardly from an edge of the electrostatic film, and a support surface facing the curved portion faces a support block having a curved shape corresponding to the curved portion; and moving the first workpiece in a direction toward the electrostatic chuck and allowing the first workpiece and the electrostatic chuck to contact each other, wherein the support block is moved backward by an external force applied from the first workpiece to the electrostatic chuck when moving the support block.
Supporting the first workpiece on the electrostatic chuck may comprise: arranging the workpieces such that a planar portion of the first workpiece is positioned facing the electrostatic film of the electrostatic chuck, a curved portion extends outwardly from an edge of the electrostatic film, and a support surface facing the curved portion faces a support block having a curved shape corresponding to the curved portion; and moving the first workpiece in a direction toward the electrostatic chuck and allowing the first workpiece and the electrostatic chuck to contact each other.
When moving the support block, the support block is moved in a direction toward the first workpiece, and the support surface of the support block is allowed to contact the curved surface portion of the first workpiece.
When the supporting block is moved backward by an external force applied from the first workpiece to the electrostatic chuck, the supporting block may be moved by contracting the pad portion positioned behind the supporting block.
When moving the support block in a direction toward the curved surface portion of the first workpiece, fluid may be supplied to an expansion member positioned behind the support block, and the support block may be moved by expanding the expansion member.
The support block may be movable in at least one of a width direction or a vertical direction of the support block.
Drawings
Exemplary embodiments may be understood in more detail from the following description taken in conjunction with the accompanying drawings, in which:
fig. 1 is a view showing a state in which a second workpiece is attached or joined to a first workpiece whose edge is formed in a curved surface using an attaching apparatus according to a first exemplary embodiment.
Fig. 2 is a sectional view taken along line a-a' of fig. 1.
Fig. 3 to 6 are views showing an attaching apparatus according to a first exemplary embodiment.
Fig. 7 is a view illustrating an electrostatic chuck according to a first exemplary embodiment.
Fig. 8(a) to 8(c) are views for exemplarily showing a first workpiece (fig. 8(a)) manufactured to be the same as a design value and a first workpiece (fig. 8(b) and 8(c)) manufactured to be different from the design value.
Fig. 9 is a view for illustrating a moving operation of the supporting block when the first workpiece (fig. 8(b)) having a width Wfp different from the width Wfi of the design value is supported by the electrostatic chuck.
Fig. 10 is a view for illustrating a moving operation of the supporting block when the first workpiece (fig. 8(c)) having the width Wcp different from the width Wci of the design value is supported by the electrostatic chuck.
Fig. 11 is a view showing an electrostatic chuck according to a modified embodiment of the first embodiment.
Fig. 12 and 13 are views illustrating an electrostatic chuck according to a second exemplary embodiment.
Detailed Description
Exemplary embodiments will be described in detail below with reference to the accompanying drawings. This disclosure may, however, be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art. In the drawings, like reference numerals refer to like elements throughout.
The present disclosure relates to an electrostatic chuck that easily supports a workpiece having an edge formed in a curved surface and an attachment apparatus including the electrostatic chuck. More particularly, in terms of supporting a workpiece having an edge formed in a curved surface, the present disclosure relates to an electrostatic chuck capable of suppressing occurrence of a support defect in a curved surface region of the workpiece and an attachment apparatus including the electrostatic chuck.
Fig. 1 is a view showing a state in which a second workpiece is attached or joined to a first workpiece whose edge is formed in a curved surface using an attaching apparatus according to a first exemplary embodiment. Fig. 2 is a sectional view taken along line a-a' of fig. 1. Fig. 3 to 6 are views showing an attaching apparatus according to a first exemplary embodiment.
Fig. 7 is a view illustrating an electrostatic chuck according to a first exemplary embodiment. Fig. 8(a) to 8(c) are views for exemplarily showing a first workpiece (fig. 8(a)) manufactured to be the same as a design value and a first workpiece (fig. 8(b) and 8(c)) manufactured to be different from the design value.
Fig. 9 is a view for illustrating a moving operation of the supporting block when the first workpiece (fig. 8(b)) having a width Wfp different from the width Wfi of the design value is supported by the electrostatic chuck. Fig. 10 is a view for illustrating a moving operation of the supporting block when the first workpiece (fig. 8(c)) having the width Wcp different from the width Wci of the design value is supported by the electrostatic chuck.
Referring to fig. 1 and 2, the first workpiece S1 according to an exemplary embodiment has a shape that is bent or curved such that its outer circumference or edge becomes a curved surface. More specifically, the workpiece S1 according to an embodiment has a substantially rectangular horizontal cross-sectional shape, and has a shape in which two edges facing each other are curved.
That is, the first workpiece S1 includes: a plane part FA extending in one direction, having a substantially rectangular shape, and having a plane shape other than an inclination angle and a curvature; and a curved surface portion CA extending downward from two edges facing each other among the four edges of the planar portion FA, and formed to be rounded or bent so as to have a curvature when extending outward from the planar portion FA.
The planar portion FA may have a rectangular shape including a pair of long sides disposed parallel to each other and a pair of short sides disposed parallel to each other when intersecting the pair of long sides.
The curved surface portion CA is formed to extend from the pair of long sides of the planar portion FA, and may be formed to have an inclination such that the closer to the outside, the farther from the planar portion FA without forming a right angle with the planar portion FA. At this time, in the case of inclining so as to be farther from the plane portion FA closer to the outer side, the shape has a curvature so that the inclination thereof is not constant. In other words, the curved surface portion CA is formed to have a curved surface in which the inner surface of the region corresponding to the curved surface portion CA in the inner surface (attached to the second workpiece S2) of the first workpiece S1 is recessed.
In addition, the curved surface portion CA may be a curved surface having a curvature in its entirety, or a curved surface in which at least one region connected to the planar portion FA and only a part of the region adjacent thereto have a curvature and the remaining portion has only a downward inclination without a curvature.
The first workpiece S1 according to an embodiment is a window made of glass or quartz, but the embodiment is not limited thereto, and various materials having a bent edge may be used as the first workpiece S1.
The second workpiece S2 may include a panel P displaying an image and a film F attached to the panel P. The film F may be shaped to also apply adhesive to one surface attached to the panel and to the back surface attached to the first workpiece S1.
In attaching the first workpiece S1 and the second workpiece, the second workpiece S2 is attached and joined to one surface of the first workpiece facing the second workpiece S2. At this time, since the second workpiece S2 is attached to the planar portion FA and the curved portion CA of one surface of the first workpiece S1, the flat panel display device to which the first workpiece S1 and the second workpiece S2 are attached has a shape in which two edges facing each other are curved, and an image is acquired on each of the planar portion FA and the curved portion CA.
The attachment apparatus that engages or attaches the second workpiece S2 to the first workpiece S1 includes an electrostatic chuck 2000 that supports the first workpiece S1. Here, the electrostatic chuck 2000 has a shape in which an edge is formed in a curved surface to support the first workpiece S1 in which the edge is formed in the curved surface. That is, in the electrostatic chuck 2000, a region corresponding to or facing the curved portion of the first workpiece S1 is manufactured in a shape having a curvature corresponding to the same curvature as the curved portion CA of the first workpiece S1.
The electrostatic chuck 2000 was manufactured according to design values of the first workpiece S1 whose edges were formed in a curved surface, and the design values included the area of the first workpiece S1 and the curvature of the curved surface portion CA. In addition, when the first workpiece S1 is a window, a window whose edge is formed in a curved surface is generally manufactured by a heat treatment forming method.
However, when a plurality of first works are manufactured, it is practically difficult to manufacture works having exactly the same shape and size as designed values. That is, the curvature of the design value and the length in at least one of the X-axis direction and the Y-axis direction of at least one of the curved surface portion CA, or the entirety of the first workpiece S1, or the planar portion FA and the curved surface portion CA.
In this case, when the first workpiece S1 is supported by the electrostatic chuck, there may occur a problem such that a gap may be generated between the first workpiece S1 and the electrostatic chuck 2000, or the electrostatic chuck 2000 seizes a local area in the second workpiece S2.
Specifically, when the lengths in the Y-axis direction, which is the direction in which the curvature of the curved surface portion CA is formed, are different, the height of the curved surface portion CA is different, or the curvature is different, and a gap or a disturbance is generated. In addition, a gap or interference is generated mainly at the position of the curved surface portion CA of the first workpiece S1 or its surrounding area between the first workpiece S1 and the electrostatic chuck 2000. This gap or interference acts as a factor causing damage to the first workpiece S1 or an alignment defect between the first workpiece S1 and the second workpiece S2 in the process of attaching the second workpiece S2 to the first workpiece S1.
Accordingly, in terms of supporting a first workpiece whose edge is formed in a curved surface, the exemplary embodiments provide an electrostatic chuck 2000 capable of suppressing occurrence of a support defect as compared with the conventional art, and an attachment apparatus including the electrostatic chuck.
Hereinafter, an attaching apparatus according to a first exemplary embodiment will be described with reference to fig. 3 to 10.
The attaching apparatus according to the first exemplary embodiment is a device that attaches or joins the second workpiece S2 to the first workpiece S1 whose edge is formed in a curved surface or in a circular shape. Here, the first workpiece S1 may be a window, and the second workpiece S2 may be a film F on which the panel P is attached. That is, the second workpiece S2 has a structure in which a film is attached to the rear surface of the panel P.
Referring to fig. 3 to 6, an attaching apparatus according to a first exemplary embodiment includes: a chamber portion 100 having an inner space; an electrostatic chuck 2000 positioned inside the chamber portion 100 so as to be capable of supporting a first workpiece S1; a pressing device 600 provided with a pressing portion 610 positioned facing the electrostatic chuck 2000 and capable of applying pressure in the direction of the first workpiece S1; and a supporting device 400 provided with a tray 410 positioned between the electrostatic chuck 2000 and the pressing portion 610 and capable of supporting the second workpiece S2.
In addition, the attaching apparatus according to the first exemplary embodiment includes a pressure adjusting part 310 and a pressure adjusting part 320, which are connected to the chamber part 100, adjust the inside of the chamber part 100 under vacuum pressure, or restore the atmospheric environment.
The chamber portion 100 includes: an upper chamber 110 having an inner space and being movable up and down; and a base 120 positioned below the upper chamber 110 and to which the pressing means 600 and the supporting means 400 are mounted. Here, the upper chamber 110 may have a shape with a predetermined empty space therein and an open lower side. In addition, the electrostatic chuck 2000 is mounted on an inner upper wall of the upper chamber 110.
The pressure adjusting part 310 and the pressure adjusting part 320 include: a first pressure regulating part 310 connected to the upper chamber 110; and a second pressure adjusting part 320 connected to the base 120.
The pressing device 600 includes: a pressing portion 610 positioned facing a lower side of the electrostatic chuck 2000 inside the chamber portion 100; and a support frame 620 extended such that one end thereof is connected to the pressing part 610 to support the pressing part 610, and the other end thereof passes through the base 120 and is positioned under the base 120, and moves the pressing part 610 up and down.
The pressing portion 610 is formed to extend in a direction corresponding to the extending direction of the first workpiece S1 and is installed facing the lower side of the electrostatic chuck 2000. The pressing portion 610 is a member having a shape deformable with at least one of a fluid flowing therein and an external force applied from the outside, and may be, for example, a tube or a rubber pad. In addition, as shown in fig. 3, the pressing part 610 may have an initial shape, an upper surface of which has a curved shape such that the height is smaller closer to the edge from the center.
Here, the initial shape of the pressing part 610 means a state before shape deformation occurs due to a fluid or an external force.
The supporting device 400 includes: a tray 410 which can move from the inside to the outside of the chamber portion 100 or from the outside to the inside and which can support the film; and a tray lifting part 420 moving up and down the tray 410 while supporting the tray 410 loaded into the chamber part 100.
The tray 410 has a hollow shape with a hollow center portion, and may have a shape corresponding to the second workpiece S2, for example, a rectangular shape. Here, the size of the central empty space of the tray 410 may be larger than the sizes of the first and second workpieces S1 and S2.
The tray 410 according to an embodiment may be a member for inserting an end of the second workpiece S2 (e.g., an outer circumferential end of the film F), and may be, for example, a clamp structure.
The tray lifting part 420 moves the tray 410 up and down while supporting the tray 410. The tray lifting part 420 includes: a shaft 421 having one end connected to a lower portion of the tray 410; and a lifting power part 422 connected to the other end of the shaft 421 and providing lifting power to the shaft 421. This tray lifting portion 420 may be installed to be positioned outside the pressing portion 610 and the electrostatic chuck.
Referring to fig. 7, the electrostatic chuck 2000 includes: an electrostatic film 2200 formed to extend in the extending direction of the planar portion FA of the first workpiece S1 and disposed to face the planar portion FA of the rear surface of the first workpiece S1; a pad portion (hereinafter referred to as a first pad portion 2300a) extending in an extending direction of the electrostatic film 2200 and positioned behind the electrostatic film 2200; a supporting block 2400 positioned facing the curved surface portion CA behind the first workpiece S1 and capable of moving backward by a force applied from the first workpiece; and a pad portion (hereinafter, referred to as a second pad portion 2300b) positioned behind the supporting block 2400.
In addition, the electrostatic chuck 2000 includes a body 2100, the body 2100 is positioned behind the first and second pad portions 2300a and 2300b and is fixedly mounted on the upper chamber 110, and the first and second pad portions 2300a and 2300b are fixedly mounted on the body 2100.
Here, the front side is a direction in which the first workpiece S1 is positioned, and the rear side means an opposite direction of the position of the first workpiece S1.
The above-described electrostatic chuck 2000 is described, in other words, the electrostatic chuck has a structure in which the electrostatic film 2200 is positioned only at a position facing the planar portion FA of the first workpiece S1 and the electrostatic film 2200 is not mounted at a position facing the curved surface portion CA of the first workpiece S1. In addition, in the electrostatic chuck 2000, the supporting block 2400 is installed to face the curved surface portion CA of the first workpiece S1, and the second pad portion 2300b is installed behind the supporting block 2400.
In addition, according to the above-described electrostatic chuck, an empty space (hereinafter, referred to as a void portion) having a predetermined height is partitioned by one surface of the electrostatic film facing the planar portion FA of the first workpiece S1 and the supporting surface of the supporting block 2400, and the first workpiece S1 is loaded or introduced into the void portion and supported by the electrostatic chuck 2000.
Hereinafter, the electrostatic chuck 2000 according to the first embodiment will be described in detail with reference to fig. 7 to 10.
The electrostatic film 2200 is disposed to face the planar portion FA of the first workpiece S1 and supports the first workpiece S1 using electrostatic force. This electrostatic film 2200 may have a structure in which a plurality of negative electrodes and a plurality of positive electrodes are formed in a patterned shape on a flexible film. In addition, although the power applying member is not illustrated, the power applying member is used to apply power to each of the negative electrode and the positive electrode.
The first pad section 2300a extends in the extending direction of the electrostatic film 2200, is installed facing the rear surface of the electrostatic film 2200, and has elasticity. The first pad section 2300a is provided by using a raw material including a material such as, but not limited to, silicone rubber, and may be provided by using various raw materials capable of applying elastic force.
The supporting block 2400 extends in the extending direction of the curved surface portion CA of the first workpiece S1, and one surface (i.e., the supporting surface 2410) facing the curved surface portion CA of the first workpiece S1 may have a concave curved shape.
This supporting block 2400 is disposed in a number corresponding to the number of the curved surface portions CA of the first workpiece S1, and is positioned corresponding to the rear side of each of the curved surface portions CA. When the first workpiece is provided with the curved surface portions CA on both edges in the Y-axis direction, two support blocks are provided and mounted on the main body 2100 so as to be positioned behind each of both edges of the first workpiece S1.
Each of the lengths of the supporting block 2400 in the X-axis direction and the Y-axis direction is provided to be equal to or greater than the lengths of the curved surface portion CA of the first workpiece in the X-axis direction and the Y-axis direction, and the curvature of the supporting surface 2410 of the supporting block 2400 facing the curved surface portion CA of the first workpiece S1 is formed to correspond to the curvature of the curved surface portion of the first workpiece.
Here, providing the lengths of the supporting block 2400 in the X-axis direction and the Y-axis direction that are equal to or greater than the lengths of the curved surface portion CA of the first workpiece in the X-axis direction and the Y-axis direction, and providing the curvature of the supporting surface 2410 of the supporting block 2400 facing the curved surface portion CA of the first workpiece S1 to correspond to the curvature of the curved surface portion of the first workpiece are based on the design values of the first workpiece S1. That is, the lengths of the support blocks in the X-axis direction and the Y-axis direction are provided to be equal to or greater than the designed lengths of the first workpiece S1 in the X-axis direction and the Y-axis direction. In addition, the curvature of the support surface 2410 of the support block 2400 that faces the curved surface portion CA of the first workpiece S1 is provided to correspond to or conform to the design curvature of the first workpiece S1.
The second pad section 2300b extends in the extending direction of the supporting block 2400 and is positioned rearward of the supporting block 2400. In addition, the second pad section 2300b is installed such that its front surface is in contact with the supporting block 2400 and its rear surface is in contact with the body 2100.
Here, the rear side of the supporting block 2400 is the outside of the supporting block in the upward direction and the width direction of the supporting block 2400. The outer side in the width direction of the supporting block 2400 means a position between the body 2100 and the supporting block 2400 in the Y-axis direction of the supporting block 2400.
The second pad section 2300b may be provided to be positioned outside in the upward direction and the width direction when positioned behind the supporting block 2400. More specifically, the second pad section 2300b includes: a first pad member 2310b positioned outside in the width direction of the supporting block 2400; and a second pad member 2320b positioned on an upper side of the support block 2400.
The first pad member 2310b allows the supporting block 2400 to move in the width direction, and the second pad member 2320b allows the supporting block 2400 to move in the upward direction.
In the above, the second pad section 2300b is formed as the first pad member 2310b and the second pad member 2320b, respectively, but may be an integrated type in which the first pad member 2310b and the second pad member 2320b are connected to each other.
The first and second pad sections 2300a and 2300b are provided by using a material such as a raw material including, but not limited to, silicone rubber, and various materials and members having elasticity capable of being compressed or contracted by an external force may be applied.
As described above, the electrostatic chuck 2000 includes the first pad portion 2300a positioned behind the electrostatic film 2200 and the second pad portion 2300b positioned behind the supporting block 2400.
Accordingly, when the first workpiece S1, which supports or catches the first workpiece S1 to be in contact with the electrostatic chuck 2000 or is positioned facing the electrostatic chuck 2000, is pressed by the pressing portion 610, the supporting block 2400 may be moved backward or floated. That is, the movable supporting block 2400 to press at least one of the first pad member 2310b positioned on the outer side in the width direction (Y-axis direction) and the second pad member 2320b positioned on the upper side (Z-axis direction). This is because the pad member 2310b and the pad member 2320b are provided outside in the width direction (Y-axis direction) and the upward direction (Z-axis direction) of the supporting block 2400, respectively, and the pad member 2310b and the pad member 2320b can be contracted with a force applied from the supporting block 2400.
Meanwhile, the first workpiece S1 having the curved surface portion CA on the edge thereof may be manufactured so as to be different from the design value. That is, at least one of the length in the X-axis direction, the length in the Y-axis direction, and the curvature of the curved surface portion CA may be made different from the design value.
More specifically, at least one of the X-axis direction and the Y-axis direction of the planar portion FA of the first workpiece S1 may be different from the design value, or at least one of the X-axis direction and the Y-axis direction of the curved surface portion CA may be different from the design value. In addition, the curvature of the curved surface portion CA may be different from the curvature of the design value.
Here, the Y-axis direction of the first workpiece S1 (i.e., the alignment direction of the curved surface portion CA) may be referred to as a width direction, and the X-axis direction crossing or perpendicular to the width direction may be referred to as a length direction.
Meanwhile, since the shape of the electrostatic chuck 2000 is not changed, when the first workpiece S1 different from a design value is to be supported by the electrostatic chuck 2000, a gap may be generated between the electrostatic chuck 2000 and the first workpiece S1, or a disturbance may be generated at a local position. Specifically, the width (length in the Y-axis direction) of the first workpiece S1, which is the alignment direction of the curved surface portion CA, and the curvature of the curved surface portion CA serve as causes of generation of a gap and interference.
To solve this problem, the electrostatic chuck 2000 according to an exemplary embodiment provides the electrostatic chuck 2000 with a supporting block 2400 that is movable corresponding to at least one of the width of the first workpiece S1 and the curvature of the curved surface portion CA. That is, in the electrostatic chuck 2000 according to the embodiment, the electrostatic film 2200 and the supporting block 2400 can be moved by the first and second pad sections 2300a and 2300b according to the width and curvature of the first workpiece S1. Specifically, each of the pair of supporting blocks 2400 corresponding to both edges of the electrostatic chuck 2000 may be moved in the width direction and the upward direction by the first pad member 2310b and the second pad member 2320 b. Therefore, compared to the conventional art, the generation of the gap or the interference between the first workpiece S1 and the electrostatic chuck 2000 (and specifically between the curved surface portion CA of the first workpiece S1 and the electrostatic chuck 2000) can be suppressed.
For example, when the width WfP (fig. 8(b)) of the planar portion FA of the first workpiece to be actually supported is longer than the designed width Wfi (fig. 8(a)) of the planar portion, and when the first workpiece S1 is supported by the electrostatic chuck 2000, as shown in fig. 9, the supporting block 2400 may be moved toward the outer side in the width direction by the force applied from the first workpiece S1. At this time, the first pad member 2310b positioned on the outer side in the width direction of the support block 2400 is contracted.
Of course, a force may be applied in the Y-axis direction using the size and curvature of the first workpiece, and thus, the support block 2400 may move the support block in the upward direction and, at this time, contract the second pad member 2320 b.
In another example, when the height Hcp (fig. 8(c)) of the curved surface portion CA of the first workpiece S1 to be supported is smaller than the design height Hci (fig. 8(a)) of the curved surface portion CA, and when the first workpiece S1 is supported by the electrostatic chuck 2000, as shown in fig. 10, the supporting block 2400 may be moved at least in the upward direction by a predetermined distance by the force applied from the first workpiece S1.
Of course, a force is applied not only in the upward direction but also in the width direction according to the height and curvature of the curved surface portion CA of the first workpiece S1, and therefore, the supporting block 2400 may also be moved outward in the width direction, and at this time, the first pad member 2310b is contracted.
Examples in which the supporting block 2400 is moved are not limited to the above-described examples of fig. 8(b) and 8(c), and include various cases of errors that may occur between the first workpiece to be supported and the design value.
As such, the support block 2400 may move to correspond to the size or curvature of the first workpiece S1. Accordingly, the occurrence of the gap or the interference between the electrostatic chuck 2000 and the first workpiece S1 can be reduced compared to the occurrence of the gap or the interference in the conventional art. Accordingly, damage to the first workpiece S1 and the occurrence of an alignment defect between the first workpiece S1 and the second workpiece S2 can be suppressed or prevented.
Fig. 11 is a view showing an electrostatic chuck according to a modified embodiment of the first embodiment.
The electrostatic chuck 2000 according to the first embodiment has a structure in which a separate force is not applied to a region facing the curved surface portion CA of the first workpiece S1.
However, the embodiment is not limited thereto, and as in a modified example shown in fig. 11, the electrostatic chuck 2000 may include a supporting portion 2500 providing a supporting force to a supporting surface 2410 of the supporting block 2400 facing the curved surface portion of the first workpiece S1.
The support portion 2500 includes: an adhesive member 2510 attached to the supporting surface 2410 of the supporting block 2400 facing the curved surface portion CA of the first workpiece S1; and a suction portion 2520 generating a vacuum suction force to the supporting surface 2410 of the supporting block 2400.
The adhesive member 2510 is a member having adhesiveness and is attached or mounted on the support surface 2410 of the support block 2400. Accordingly, the adhesive member 2510 has a curvature corresponding to or the same as that of the supporting surface 2410 of the supporting block 2400.
The suction portion 2520 is positioned behind the adhesive member 2510 inside the supporting block 2400, and includes: a suction tube 2521 having one end connected to an adhesive member 2510; and a pump 2522 connected to the other end of the suction pipe 2521.
The suction tube 2521 has a tube shape with an inner space, passes through the adhesive member 2510 in the thickness direction, and may extend up to the front surface of the adhesive member such that one end thereof is exposed to the front surface. For this purpose, an aperture may be provided through which suction tube 2521 may pass.
Of course, the suction tube 2521 may not extend to the front surface of the adhesive member, but may be connected to a hole provided in the adhesive member while extending the rear side of the front surface of the adhesive member 2510.
In addition, the suction portion 2520 may include a passage 2523 provided to connect the suction pipe 2521 and the pump 2522 inside the support block 2400, and the inner diameter of the passage 2523 may be larger than that of the suction pipe 2521.
As such, the supporting portion 2500 is further mounted on the supporting block 2400, and thus, a supporting force is further added to a region corresponding to the curved surface portion CA of the first workpiece S1 in the electrostatic chuck. Therefore, the supporting force of the region corresponding to the curved surface portion CA of the first workpiece S1 is improved as compared with that in the first embodiment. Accordingly, the chuck defect of the first workpiece S1 by the electrostatic chuck 2000 and the damage of the first workpiece S1 due to the chuck defect can be further effectively prevented.
The support portion 2500 according to the modified embodiment described above includes the adhesive member 2510 and the suction portion 2520. However, embodiments are not limited thereto, and the support portion 2500 may be configured to include any one of the adhesive member 2510 and the suction portion 2520.
Fig. 12 and 13 are views illustrating an electrostatic chuck according to a second exemplary embodiment.
The electrostatic chucks 2000 according to the first and modified embodiments each have the second pad portion 2300b installed behind the supporting block 2400 and move backward by an external force applied to the supporting block 2400.
However, the embodiment is not limited thereto, and as in the second embodiment shown in fig. 12 and 13, the electrostatic chuck may be configured to be movable by the expanding movement of the expanding member 2610 and the expanding member 2620 positioned behind the supporting block 2400.
That is, the electrostatic chuck 2000 according to the second embodiment includes: a body 2100 positioned above the pressing portion 610 to face the pressing portion 610 inside the chamber portion 100; an electrostatic film 2200 extending in one direction to be positioned facing the planar portion FA of the first workpiece S1 and attached to the lower portion of the body 2100; a pad portion 2300a extending in an extending direction of the electrostatic film 2200 and installed inside the body 2100 to be positioned behind the electrostatic film 2200; a supporting block 2400 positioned inside the main body 2100 so as to be positioned behind the first workpiece S1, having a supporting surface 2410 facing the curved surface portion CA of the first workpiece S1 and having a curvature corresponding to or conforming to that of the curved surface portion CA of the first workpiece S1, and movable toward the curved surface portion CA of the first workpiece S1; an expanding member 2610 and an expanding member 2620 which are positioned behind the supporting block 2400 inside the main body 2100 and move the supporting block 2400 in the direction in which the first workpiece S1 is positioned by an expanding movement; and a return member 2710 and a return member 2720 installed to connect the support block 2400 and the body 2100 and having a return force for returning the support block 2400 to an initial position.
The expansion member 2610 and the expansion member 2620 may be tubes each having an internal space in which a fluid such as air may be supplied and which can be contracted according to the expansion and discharge of the supplied fluid.
The expansion member 2610 and the expansion member 2620 are positioned behind the support block 2400, and the plurality of expansion members 2610 and expansion members 2620 are positioned behind the support block 2400. For example, as shown in fig. 12 and 13, the expansion members 2610 and 2620 may be positioned outward in the width direction of the support block 2400 and on the support block 2400, respectively. Hereinafter, the expansion member positioned outward in the width direction of the supporting block 2400 is referred to as a first expansion member 2610, and the expansion member positioned on the supporting block 2400 is referred to as a second expansion member 2620.
The first expansion member 2610 moves the supporting block 2400 in the width direction by its expansion, and when it is expanded
When the first expansion member 2610 expands, the supporting block 2400 positioned on the front side thereof moves in the width direction so as to approach the first workpiece S1.
The second expanding member 2620 moves the supporting block 2400 in the vertical direction by its expansion, and when the second expanding member 2620 expands, the supporting block 2400 positioned on the front side thereof moves in the downward direction so as to approach the first workpiece S1.
The expansion control unit 2800, which controls the supply and discharge of fluid, is connected for moving the first and second expansion members 2610, 2620. The expansion control unit 2800 includes: a connection pipe 2810 having one end connected to each of the first and second expansion members 2610 and 2620 and provided with an inner space through which fluid flows; a supply part 2820 connected to the other end of the connection pipe 2810 and supplying fluid to the connection pipe 2810; and a discharge portion 2830 connected to the other end of the connection pipe 2810 and discharging fluid inside the first and second expansion members 2610 and 2620 through the connection pipe 2810. In addition, the expansion control unit 2800 includes a first valve for controlling communication with the supply part 2820 and a second valve for controlling communication with the discharge part 2830, each of which is installed on an extended passage of the connection pipe 2810.
Due to the expansion control unit, each of the first and second expansion members 2610 and 2620 is expanded by supplying fluid by operating the supply portion 2820, and the fluid inside the first and second expansion members 2610 and 2620 is discharged by operating the discharge portion 2830 and contracts the first and second expansion members 2610 and 2620. The return members 2710 and 2720 serve to help the support block return to the initial state position when the first and second expansion members 2610 and 2620 are contracted.
The return members 2710 and 2720 are installed to connect the main body 2100 and the support block 2400 as described above, and a plurality of return members may be provided to correspond to the number of the expansion members 2610 and the expansion members 2620.
For example, as shown in fig. 12 and 13, the return member 2710 and the return member 2720 include: a first return member 2710 extending in the width direction in front of the support block 2400 and having one end connected to the support block 2400 and the other end connected to the body 2100; and a second return member 2720 extending in a vertical direction and having one end connected to an upper end of the support block 2400 and the other end connected to the main body. Each of the first return member 2710 and the second return member 2720 may be a spring that can expand and contract.
Hereinafter, referring to fig. 12 and 13, the operation of the electrostatic chuck 2000 and the process of supporting the first workpiece S1 according to the second exemplary embodiment.
The first workpiece S1, whose edge is formed in a curved surface, is moved to be positioned at the gap portion of the electrostatic chuck 2000, and the planar portion FA of the first workpiece S1 is allowed to contact the electrostatic film 2200. In addition, at least one of the first expansion member 2610 and the second expansion member 2620 is expanded by using the expansion control unit 2800, and the support block 2400 is moved so that the support surface 2410 comes into contact with the curved surface portion CA of the first workpiece S1. That is, at least one of the first and second expansion members 2610 and 2620 is expanded to move the supporting block 2400 in at least one of the width direction and the downward direction, and the supporting surface 2410 of the supporting block 2400 is allowed to come into contact with the curved surface portion CA of the first workpiece S1.
As such, the supporting block 2400 can move toward the curved surface portion CA of the first workpiece S1. In other words, the support block 2400 may be moved to bring the support surface 2410 into contact with the curved surface portion CA of the first workpiece S1 by moving at least one of the first and second expansion members 2610, 2620 in accordance with the size or shape of the first workpiece S1. That is, the movable supporting block 2400 is formed to correspond to the size or shape of the first workpiece S1. Therefore, the supporting force of the electrostatic chuck 2000 with respect to the first workpiece S1 can be improved.
When the first workpiece S1 is supported by the electrostatic chuck 2000, the second workpiece S2 is attached to the first workpiece S1. In addition, after the attachment between the first and second workpieces S1 and S2 is completed, and when the workpieces are separated from the electrostatic chuck 2000, the discharge portion 2830 of the expansion control unit 2800 is operated to discharge fluid from the expansion member, which is supplied with fluid in the first and second expansion members 2610 and 2620. Accordingly, the expanded expansion member 2610 or the expansion member 2620 among the first and second expansion members 2610 and 2620 contracts, and at this time, the support block 2400 returns to the initial state by the return force of the first and second return members 2710 and 2720.
Due to this electrostatic chuck 2000 according to the second embodiment, the supporting block 2400 is actively moved by the first and second expansion members 2610 and 2620 according to the size or shape of the first workpiece S1. That is, the moving direction and the moving amount of the supporting block 2400 are adjusted according to the size or the shape of the first workpiece S1 such that the supporting surface 2410 is brought into contact with the curved surface portion CA of the first workpiece S1.
Therefore, even when the first workpiece S1 is manufactured to be different from the design value, the occurrence of the gap or the interference between the electrostatic chuck 2000 and the first workpiece S1 can be reduced as compared with the occurrence of the gap or the interference in the conventional art. Accordingly, damage to the first workpiece S1 and the occurrence of alignment defects between the first workpiece S1 and the second workpiece S2 can also be suppressed or prevented.
In the above-described first embodiment, modified embodiment, and second embodiment, the configuration in which both edges of the first workpiece S1 in the Y-axis direction are curved and the electrostatic chuck includes two support blocks aligned in the Y-axis direction is described.
However, the embodiment is not limited thereto, and the first workpiece may have a shape in which a curved surface is formed in the X direction, and thus, the electrostatic chuck may have a structure in which a support block is provided to be positioned facing a curved surface portion provided on an edge of the first workpiece in the X axis direction.
In addition, the first workpiece is not limited to a rectangular shape, and the shape may be a circular shape or various polygonal shapes whose edges are formed in a curved surface. In addition, a support block of the electrostatic chuck is provided to correspond to a position of the curved surface of the first workpiece.
Hereinafter, with reference to fig. 1 to 10, an operation of the attaching device and an attaching process between the first workpiece and the second workpiece according to an exemplary embodiment will be described.
First, as in fig. 3, the first workpiece S1 having an edge formed in a curved shape is supported by the electrostatic chuck 2000, and the second workpiece S2 is supported on the tray 410. Here, the second workpiece S2 includes a film F and a panel P attached to the film F and implementing an image.
When the electrostatic chuck 2000 supports the first workpiece S1, first, the first workpiece S1 is positioned facing the lower side of the electrostatic chuck 2000.
Subsequently, the first workpiece is moved upward and the rear surface of the first workpiece S1 is allowed to contact the electrostatic film 2200 of the electrostatic chuck 2000 and the supporting surface of the supporting block 2400. More specifically, the planar portion FA of the first workpiece S1 is allowed to contact the electrostatic film 2200, and the curved surface portion CA is allowed to contact the supporting surface 2410 of the supporting block 2400.
When the first workpiece S1 is in contact with and supported by the electrostatic chuck 2000, at least one of the electrostatic film 2200 and the supporting block 2400 may be moved backward. That is, the electrostatic film 2200 may be moved upward, or the supporting block 2400 may be moved in at least one direction toward the outer side or the upper side in the width direction.
Such movement of the electrostatic film 2200 and the supporting block 2400 is due to a pressure or force applied according to the size of the first workpiece S1 and the curvature or shape of the curved surface portion when contacting the electrostatic chuck 2000. In other words, when the first workpiece S1 is in contact with and supported by the electrostatic chuck 2000, the electrostatic film 2200 and the supporting block 2400 are not fixed but move due to the applied force. That is, the void portion of the electrostatic chuck 2000 changes in size according to the size, curvature, or shape of the first workpiece S1.
Accordingly, the occurrence of a gap or interference between the electrostatic chuck 2000 and the first workpiece S1 can be reduced as compared to the conventional art. Accordingly, damage to the first workpiece S1 and the occurrence of an alignment defect between the first workpiece S1 and the second workpiece S2 can be suppressed or prevented.
When the first workpiece S1 is supported by the electrostatic chuck 2000, the tray 410 moves downward as shown in fig. 4 to be positioned below the pressing portion 610. Therefore, the second workpiece S2 has a convex shape like the shape of the pressing portion 610 such that the closer to the center in the width direction, the greater the height.
Subsequently, as in fig. 5, the upper chamber 110 is moved downward so that the chamber portion 100 is closed, and the center of the first workpiece S1 in the width direction and the center of the second workpiece S2 in the width direction are allowed to contact each other. When the chamber portion 100 is closed, the interior of the chamber portion 100 is divided into an upper region and a lower region of the film F with respect to the film F. In an embodiment, after the chamber part 100 is closed, each of the first and second pressure adjusting parts 310 and 320 is operated to form each of the upper and lower regions of the film F in the vacuum pressure.
Next, the lower area of the film F is returned to the atmospheric pressure by using the second pressure regulating part 320. At this time, the film F and the panel P attached to the film move upward in the direction in which the window W is positioned and press the window W due to the pressure difference, and thus, the attachment is performed first.
In addition, when the pressing portion 610 is moved upward by using the supporting frame 620, as shown in fig. 6, the movement is restricted by the electrostatic chuck 2000 fixed on the upper side. Accordingly, a force pushing the second workpiece S2 in the direction in which the first workpiece S1 is positioned is generated, and at this time, the pressing portion 610 changes the shape to a shape conforming to or corresponding to the shape of the first workpiece S1. As such, the second workpiece S2 is attached to the inner surface of the first workpiece S1 with a force that the pressing portion 610 completely presses the second workpiece S2 from below the second workpiece S2.
As such, the electrostatic film and the support block of the electrostatic chuck according to an exemplary embodiment may move according to the size, curvature, or shape of the first workpiece. Specifically, the supporting block corresponding to the curved surface portion (both edges) of the first workpiece moves in at least one of the outward direction and the upward direction. Accordingly, the void portion of the electrostatic chuck 2000 changes in size or volume depending on the size, curvature or shape of the first workpiece S1.
Accordingly, the occurrence of the gap or the interference between the electrostatic chuck 2000 and the first workpiece S1 can be reduced as compared with the occurrence of the gap or the interference in the conventional art. Accordingly, damage to the first workpiece S1 and the occurrence of an alignment defect between the first workpiece S1 and the second workpiece S2 can be suppressed or prevented.
According to the electrostatic chuck of the exemplary embodiment, the supporting block may be moved according to the size, curvature or shape of the first workpiece. Specifically, the supporting block corresponding to the curved surface portion (both edges) of the first workpiece is moved in at least one of the outward direction and the upward direction. Accordingly, the size or volume of the void portion of the electrostatic chuck may be varied depending on the size, curvature, or shape of the first workpiece.
Accordingly, the occurrence of a gap or interference between the electrostatic chuck and the first workpiece can be reduced as compared with the occurrence of a gap or interference in the conventional art. Therefore, damage to the first workpiece and occurrence of alignment defects between the first workpiece and the second workpiece can be suppressed or prevented.

Claims (25)

1. An electrostatic chuck for supporting a workpiece comprising a planar portion and a curved portion extending outwardly from an edge of the planar portion, the electrostatic chuck comprising:
an electrostatic film mounted to be positioned facing a rear side of the planar portion of the workpiece; and
a movable support block positioned corresponding to a rear side of the curved portion of the workpiece.
2. The electrostatic chuck of claim 1, comprising a body having a void portion configured to receive the workpiece, wherein
The electrostatic film and the support block are mounted on the inner wall of the main body.
3. The electrostatic chuck of claim 2, wherein a support surface of the support block facing the curved portion of the workpiece has a shape with a curvature conforming to the curved portion.
4. The electrostatic chuck of claim 1, comprising a first liner portion positioned behind the electrostatic film and having a contraction elasticity and an expansion elasticity.
5. The electrostatic chuck of any one of claims 1 to 4, wherein the support block is movable backwards by an external force applied from the workpiece.
6. The electrostatic chuck of claim 5, comprising a second liner portion positioned behind the support block and having a contracting elasticity and an expanding elasticity.
7. The electrostatic chuck of claim 6, wherein the second liner portion comprises:
a first pad member positioned on an outer side in a width direction of the support block; and
a second pad member positioned on an upper side of the support block.
8. The electrostatic chuck of claim 3, comprising at least one of:
an adhesive member mountable on the support surface of the support block; and
a suction section comprising a suction tube mountable inside the support block to create a vacuum suction force against the support surface.
9. The electrostatic chuck of any one of claims 1 to 4, comprising:
an expansion member positioned behind the support block and configured to be expandable by a supplied fluid and contractible by discharging the fluid, wherein
The support block is movable to a front side on which the workpiece is positioned by expansion of the expansion member.
10. The electrostatic chuck of claim 2, comprising a return member mounted to connect the support block and the body and having a return force for moving the support block to a state before movement by expansion of the expansion member.
11. The electrostatic chuck of claim 10, wherein the expansion member comprises:
a first expanding member positioned on an outer side in a width direction of the supporting block; and
a second expansion member positioned on an upper side of the support block.
12. The electrostatic chuck of claim 11, wherein the return member comprises:
a first return member extending in the width direction of the support block and configured to connect the support block and the body; and
a second return member extending in a height direction of the support block and configured to connect the support block and the body.
13. An attachment apparatus for attaching a second workpiece to a first workpiece, the first workpiece comprising a planar portion and a curved portion extending in an outward direction from an edge of the planar portion and having a curvature, the attachment apparatus comprising:
a chamber portion having an interior space;
an electrostatic chuck positioned inside the chamber portion, configured to move up and down, and having one surface for supporting the first workpiece;
a pressing portion positioned facing the electrostatic chuck inside the chamber portion; and
a tray having a hollow shape, positionable between the electrostatic chuck and the pressing portion, and configured to fix and support the second workpiece, wherein
The electrostatic chuck is divided into a region corresponding to the planar portion and a region corresponding to the curved portion of the first workpiece, and
the region corresponding to the curved surface portion is movable.
14. The attachment apparatus of claim 13, wherein the electrostatic chuck comprises:
an electrostatic film installed to be positioned corresponding to a rear side of the planar portion of the first workpiece; and
a movable support block positioned corresponding to a rear side of the curved portion of the first workpiece.
15. The attachment apparatus according to claim 14, wherein a support surface of the support block facing the curved portion of the first workpiece has a curvature conforming to the curved portion.
16. The attachment apparatus of claim 15, comprising a first gasket portion positioned behind the electrostatic film and having a contraction elasticity and an expansion elasticity.
17. The attachment device of any one of claims 14 to 16, comprising:
a second pad portion positioned behind the support block and having a contraction elasticity and an expansion elasticity, wherein
The supporting block may be moved backward by the second pad section using an external force applied from the first workpiece.
18. The attachment device of claim 15, comprising at least one of:
an adhesive member positionable on the support surface of the support block; and
a suction section comprising a suction tube mountable inside the support block to create a vacuum suction force against the support surface.
19. The attachment apparatus according to any one of claims 14 to 16, wherein the electrostatic chuck comprises:
an expansion member positioned behind the support block and configured to be expandable by a supplied fluid and contractible by discharging the fluid; and
a return member installed to connect the support block and the body and having a return force for moving the support block to a state before moving by expansion of the expansion member, wherein
The support block is movable to a front side by the expansion of the expansion member, the first workpiece is positioned on the front side, and the support block is movable to a rear side by the return force of the return member.
20. A method for attaching a second workpiece to a first workpiece, the first workpiece comprising a planar portion and a curved portion extending in an outward direction from an edge of the planar portion and having a curvature, the method comprising:
supporting the first workpiece on an electrostatic chuck;
supporting the second workpiece on a hollow tray positioned facing the electrostatic chuck; and
moving the electrostatic chuck and the pallet to bring the first and second workpieces into proximity with each other and attaching the second workpiece to the first workpiece, wherein
Supporting the first workpiece on the electrostatic chuck includes moving a support block in the electrostatic chuck corresponding to the curved portion of the first workpiece.
21. The method for attaching a second workpiece to a first workpiece according to claim 20, wherein supporting the first workpiece on the electrostatic chuck comprises:
arranging the first workpiece such that the planar portion of the first workpiece is positioned facing an electrostatic film of the electrostatic chuck, the curved portion extends outward from an edge of the electrostatic film, and a support surface facing the curved portion faces the support block having a curved shape corresponding to the curved portion; and
moving the first workpiece in a direction toward the electrostatic chuck and allowing the first workpiece and the electrostatic chuck to contact each other, wherein
Moving the support block backward with an external force applied to the electrostatic chuck from the first workpiece while moving the support block.
22. The method for attaching a second workpiece to a first workpiece according to claim 20, wherein supporting the first workpiece on the electrostatic chuck comprises:
arranging the first workpiece such that the planar portion of the first workpiece is positioned facing an electrostatic film of the electrostatic chuck, the curved portion extends outward from an edge of the electrostatic film, and a support surface facing the curved portion faces the support block having a curved shape corresponding to the curved portion; and
moving the first workpiece in a direction toward the electrostatic chuck and allowing the first workpiece and the electrostatic chuck to contact each other, wherein
Upon moving the support block, the support block moves in a direction toward the curved portion of the first workpiece to allow the support surface of the support block to contact the curved portion of the first workpiece.
23. The method for attaching a second workpiece to a first workpiece according to claim 21, wherein the support block is moved by contraction of a pad portion positioned behind the support block when the support block is moved backward by an external force applied from the first workpiece to the electrostatic chuck.
24. The method of claim 22, wherein upon moving the support block in a direction toward the curved portion of the first workpiece,
supplying fluid to an expansion member positioned behind the support block and moving the support block by expanding the expansion member.
25. The method for attaching a second workpiece to a first workpiece according to any one of claims 20 to 24, wherein the support block moves in at least one of a width direction or a vertical direction of the support block.
CN201910798852.2A 2018-08-29 2019-08-27 Electrostatic chuck, attachment apparatus having the same, and attachment method Pending CN110875234A (en)

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TW202010037A (en) 2020-03-01

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