CN110838462A - Mass transfer method and system of device array - Google Patents
Mass transfer method and system of device array Download PDFInfo
- Publication number
- CN110838462A CN110838462A CN201810931059.0A CN201810931059A CN110838462A CN 110838462 A CN110838462 A CN 110838462A CN 201810931059 A CN201810931059 A CN 201810931059A CN 110838462 A CN110838462 A CN 110838462A
- Authority
- CN
- China
- Prior art keywords
- wafer
- cutting
- substrate
- units
- array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 29
- 238000005520 cutting process Methods 0.000 claims abstract description 59
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 238000000926 separation method Methods 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 238000003698 laser cutting Methods 0.000 claims description 4
- 238000006552 photochemical reaction Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 69
- 238000003491 array Methods 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68354—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to support diced chips prior to mounting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810931059.0A CN110838462B (en) | 2018-08-15 | 2018-08-15 | Mass transfer method and system of device array |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810931059.0A CN110838462B (en) | 2018-08-15 | 2018-08-15 | Mass transfer method and system of device array |
Publications (2)
Publication Number | Publication Date |
---|---|
CN110838462A true CN110838462A (en) | 2020-02-25 |
CN110838462B CN110838462B (en) | 2022-12-13 |
Family
ID=69573052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810931059.0A Active CN110838462B (en) | 2018-08-15 | 2018-08-15 | Mass transfer method and system of device array |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110838462B (en) |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030066983A (en) * | 2002-02-06 | 2003-08-14 | 삼성전자주식회사 | Dual die bonder for semiconductor devices |
FR2837981A1 (en) * | 2002-03-28 | 2003-10-03 | Commissariat Energie Atomique | PROCESS FOR HANDLING SEMICONDUCTOR LAYERS FOR THEIR SLOWDOWN |
US20050196901A1 (en) * | 2004-03-05 | 2005-09-08 | Kazuhiko Suzuki | Device mounting method and device transport apparatus |
US20060113637A1 (en) * | 2004-11-11 | 2006-06-01 | Yamaha Corporation | Semiconductor device, semiconductor wafer, chip size package, and methods of manufacturing and inspection therefor |
CN101388348A (en) * | 2007-09-14 | 2009-03-18 | 探微科技股份有限公司 | Wafer stage package cutting method protecting connection pad |
JP2011166002A (en) * | 2010-02-12 | 2011-08-25 | Disco Abrasive Syst Ltd | Method for processing wafer |
JP2011216729A (en) * | 2010-03-31 | 2011-10-27 | Sinfonia Technology Co Ltd | Semiconductor wafer conveying apparatus |
JP2012186446A (en) * | 2011-02-16 | 2012-09-27 | Tokyo Seimitsu Co Ltd | Workpiece dividing device and workpiece dividing method |
US20130126081A1 (en) * | 2011-11-18 | 2013-05-23 | Hsin-Hua Hu | Method of forming a micro led structure and array of micro led structures with an electrically insulating layer |
US20130130440A1 (en) * | 2011-11-18 | 2013-05-23 | Hsin-Hua Hu | Method of fabricating and transferring a micro device and an array of micro devices utilizing an intermediate electrically conductive bonding layer |
US20130248099A1 (en) * | 2012-03-23 | 2013-09-26 | Kabushiki Kaisha Toshiba | Method of manufacturing a semiconductor device and substrate separating apparatus |
US20130316516A1 (en) * | 2012-05-28 | 2013-11-28 | Tokyo Electron Limited | Bonding system and bonding method |
US20140295656A1 (en) * | 2013-04-01 | 2014-10-02 | Brewer Science Inc. | Apparatus and method for thin wafer transfer |
CN105210171A (en) * | 2012-10-30 | 2015-12-30 | 希百特股份有限公司 | Led die dispersal in displays and light panels with preserving neighboring relationship |
CN107768487A (en) * | 2016-08-18 | 2018-03-06 | 新世纪光电股份有限公司 | The method of flood tide transferred-electron device |
-
2018
- 2018-08-15 CN CN201810931059.0A patent/CN110838462B/en active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030066983A (en) * | 2002-02-06 | 2003-08-14 | 삼성전자주식회사 | Dual die bonder for semiconductor devices |
FR2837981A1 (en) * | 2002-03-28 | 2003-10-03 | Commissariat Energie Atomique | PROCESS FOR HANDLING SEMICONDUCTOR LAYERS FOR THEIR SLOWDOWN |
US20050196901A1 (en) * | 2004-03-05 | 2005-09-08 | Kazuhiko Suzuki | Device mounting method and device transport apparatus |
US20060113637A1 (en) * | 2004-11-11 | 2006-06-01 | Yamaha Corporation | Semiconductor device, semiconductor wafer, chip size package, and methods of manufacturing and inspection therefor |
CN101388348A (en) * | 2007-09-14 | 2009-03-18 | 探微科技股份有限公司 | Wafer stage package cutting method protecting connection pad |
JP2011166002A (en) * | 2010-02-12 | 2011-08-25 | Disco Abrasive Syst Ltd | Method for processing wafer |
JP2011216729A (en) * | 2010-03-31 | 2011-10-27 | Sinfonia Technology Co Ltd | Semiconductor wafer conveying apparatus |
JP2012186446A (en) * | 2011-02-16 | 2012-09-27 | Tokyo Seimitsu Co Ltd | Workpiece dividing device and workpiece dividing method |
US20130126081A1 (en) * | 2011-11-18 | 2013-05-23 | Hsin-Hua Hu | Method of forming a micro led structure and array of micro led structures with an electrically insulating layer |
US20130130440A1 (en) * | 2011-11-18 | 2013-05-23 | Hsin-Hua Hu | Method of fabricating and transferring a micro device and an array of micro devices utilizing an intermediate electrically conductive bonding layer |
US20130248099A1 (en) * | 2012-03-23 | 2013-09-26 | Kabushiki Kaisha Toshiba | Method of manufacturing a semiconductor device and substrate separating apparatus |
US20130316516A1 (en) * | 2012-05-28 | 2013-11-28 | Tokyo Electron Limited | Bonding system and bonding method |
CN105210171A (en) * | 2012-10-30 | 2015-12-30 | 希百特股份有限公司 | Led die dispersal in displays and light panels with preserving neighboring relationship |
US20140295656A1 (en) * | 2013-04-01 | 2014-10-02 | Brewer Science Inc. | Apparatus and method for thin wafer transfer |
CN107768487A (en) * | 2016-08-18 | 2018-03-06 | 新世纪光电股份有限公司 | The method of flood tide transferred-electron device |
Non-Patent Citations (2)
Title |
---|
刘轩等: "微小芯片粘贴系统的拾取误差校正", 《微计算机信息》 * |
费飞等: "面向微粒操纵的介电泳芯片系统研究", 《传感技术学报》 * |
Also Published As
Publication number | Publication date |
---|---|
CN110838462B (en) | 2022-12-13 |
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Legal Events
Date | Code | Title | Description |
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20221104 Address after: 3-5 / F, building A2, phase I, Zhihui Industrial Park, intersection of Chongqing Road and Yan'an Road, Baohe Economic Development Zone, Hefei, Anhui 230001 Applicant after: Beike Tianhui (Hefei) laser technology Co.,Ltd. Address before: 6 / F, building B1, Dongfang Chuangzhi garden, No.18 JinFang Road, Suzhou Industrial Park, Suzhou City, Jiangsu Province, 215125 Applicant before: SURESTAR (SUZHOU) LASER TECHNOLOGY Co.,Ltd. |
|
TA01 | Transfer of patent application right | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A Massive Transfer Method and System for Device Arrays Effective date of registration: 20231025 Granted publication date: 20221213 Pledgee: Hefei Binhu fountainhead financing Company limited by guarantee Pledgor: Beike Tianhui (Hefei) laser technology Co.,Ltd. Registration number: Y2023980062596 |
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PE01 | Entry into force of the registration of the contract for pledge of patent right |