CN110818246A - Flow field stabilizing device of clean reaction chamber for preform cladding deposition - Google Patents
Flow field stabilizing device of clean reaction chamber for preform cladding deposition Download PDFInfo
- Publication number
- CN110818246A CN110818246A CN201911330759.5A CN201911330759A CN110818246A CN 110818246 A CN110818246 A CN 110818246A CN 201911330759 A CN201911330759 A CN 201911330759A CN 110818246 A CN110818246 A CN 110818246A
- Authority
- CN
- China
- Prior art keywords
- reaction kettle
- reation kettle
- wall
- air inlet
- air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 180
- 230000008021 deposition Effects 0.000 title claims abstract description 40
- 238000005253 cladding Methods 0.000 title claims abstract description 22
- 230000000087 stabilizing effect Effects 0.000 title claims abstract description 15
- 239000002699 waste material Substances 0.000 claims abstract description 31
- 239000001257 hydrogen Substances 0.000 claims abstract description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 12
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 150000002431 hydrogen Chemical class 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 230000003749 cleanliness Effects 0.000 abstract description 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 31
- 239000002912 waste gas Substances 0.000 description 14
- 239000007789 gas Substances 0.000 description 10
- 239000000428 dust Substances 0.000 description 7
- 239000010410 layer Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000002737 fuel gas Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/0144—Means for after-treatment or catching of worked reactant gases
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention discloses a flow field stabilizing device of a clean reaction chamber for cladding deposition of a prefabricated rod, which comprises a reaction kettle and a plurality of air inlet pipelines connected with the reaction kettle, wherein a product and a plurality of burners are arranged on the reaction kettle, the reaction kettle is divided by the outer wall of the reaction kettle and the inner wall of the reaction kettle to form an inner-outer double-layer structure, an outer chamber of the reaction kettle is arranged between the outer wall of the reaction kettle and the inner wall of the reaction kettle, an inner chamber of the reaction kettle is arranged in the inner region of the inner wall of the reaction kettle, the reaction kettle is connected with a hydrogen discharge pipeline and the air inlet pipelines, the inner wall of one end of the inner chamber of the reaction kettle, which is far away from the burners, is narrowed from two sides to the middle part and then is connected with a waste discharge pipeline, the front end of each burner is positioned in. The invention has the advantages of ensuring the stability and cleanliness of the flow field of the reaction chamber, ensuring the deposition quality of products, ensuring the safety of production operation because the reaction kettle is not easy to deform, along with uniform air intake and exhaust, and the like.
Description
[ technical field ] A method for producing a semiconductor device
The invention relates to the technical field of preform cladding deposition related equipment, in particular to the technical field of a flow field stabilizing device of a clean reaction chamber for preform cladding deposition.
[ background of the invention ]
In the process of depositing the preform loose body by the OVD deposition method, a reaction kettle needs a stable flow field, the stable flow field is particularly critical to the reaction of the preform with a larger size, the whole deposition direction and any change of the wind speed can influence the reaction, so that the outer diameter, the density and the like of the product are uneven, and the qualification rate is reduced. At present, the reaction kettle for cladding deposition of various preform manufacturers at home basically adopts a single-layer design, and most of air volume of a reaction chamber in the reaction kettle mainly takes passive air intake. The design of the monolayer structure of the reaction kettle enables the temperature of the wall and the door of the reaction kettle and the like to be too high easily along with the reaction, the deformation is easy to occur, the equipment is damaged, in addition, the deformation process can generate a gap, outside air enters the reaction kettle from the gap, the internal flow field of the reaction kettle is changed to generate adverse effect on the reaction deposition of the product, the air inlet of an abnormal position can simultaneously influence the internal cleanliness of the reaction kettle, and the particle deposition enables the product to be scrapped on the product. The air inlet position is not fixed, so that a flow field in the reaction chamber is unstable, the influence of the environmental temperature is easy, the deposition reaction is unstable, the temperature can change, and the deposition efficiency and the quality of a product are influenced.
[ summary of the invention ]
The invention aims to solve the problems in the prior art, and provides a flow field stabilizing device of a clean reaction chamber for preform cladding deposition, which can ensure that air inlet and air outlet are uniform, the stability and cleanliness of the flow field of the reaction chamber are relatively ensured, the deposition quality of products is ensured, and a reaction kettle is not easy to deform, so that the safety of production operation is ensured.
In order to achieve the purpose, the invention provides a stable flow field device of a clean reaction chamber for preform cladding deposition, which comprises a reaction kettle and a plurality of air inlet pipelines connected with the reaction kettle, wherein a product and a plurality of burners are installed on the reaction kettle, the reaction kettle is divided by the outer wall of the reaction kettle and the inner wall of the reaction kettle to form an inner-outer double-layer structure, an outer chamber of the reaction kettle is arranged between the outer wall of the reaction kettle and the inner wall of the reaction kettle, an inner chamber of the reaction kettle is arranged in an inner region of the inner wall of the reaction kettle, the reaction kettle is connected with a hydrogen exhaust pipeline and the plurality of air inlet pipelines, the inner wall of one end of the inner chamber of the reaction kettle, which is far away from the burners, is narrowed from the middle part from two sides and then is connected with a waste exhaust pipeline, the front end of the burner is positioned in the outer.
Preferably, the inner wall of one end, far away from the burner, of the inner bin of the reaction kettle is in an arc shape, the end, far away from the burner, of the inner bin of the reaction kettle is provided with a flat exhaust channel, the exhaust channel is connected with a waste discharge pipeline, and the outer wall of the reaction kettle is provided with an exhaust outlet.
As preferred, the quantity of intake stack is 3 and is first intake stack, second intake stack, third intake stack respectively, the end and the reation kettle right side of first intake stack link to each other, and the front end of first intake stack is the inlet scoop, second intake stack and hydrogen exhaust pipeline all communicate with the reation kettle top, third intake stack and reation kettle bottom communicate, the exhaust pipe links to each other with the reation kettle left side.
Preferably, the reaction kettle outer chamber and the reaction kettle inner chamber are respectively provided with a first air inlet filter and a nickel net, the first air inlet filter is arranged between the joint of the first air inlet pipeline and the reaction kettle outer wall and the front end of the burner, and the burner is arranged on the nickel net in a penetrating mode.
Preferably, the first air inlet pipeline, the second air inlet pipeline, the third air inlet pipeline, the waste discharge pipeline and the hydrogen discharge pipeline are connected with the first air feeder, the second air feeder, the third air feeder, the waste discharge fan and the hydrogen discharge fan in a one-to-one correspondence mode respectively, and the waste discharge pipeline is connected with the outdoor fresh air pipe with the fresh air valve.
Preferably, the waste discharge pipeline is provided with a waste discharge valve, a waste gas treatment device, a temperature sensor, a first pressure sensor, a main air valve and a second pressure sensor, and the first air inlet pipeline is provided with an air supply pressure gauge.
Preferably, a second air inlet filter is arranged between the second air inlet pipeline and the second air blower, and a third air inlet filter is arranged between the third air inlet pipeline and the third air blower.
Preferably, the reaction kettle is provided with a reaction kettle outer chamber pressure sensor, a plurality of reaction kettle inner bin pressure meters and valves.
Preferably, the upper end and the lower end of the product are respectively installed on the reaction kettle by using a traction device and a supporting device, the upper end and the lower end of the product are respectively provided with an upper protection plate and a lower protection plate, and the product is positioned in the reaction kettle inner bin.
The invention has the beneficial effects that: according to the invention, the reaction kettle adopts a double-layer structure design, the inlet air can flow in the outer chamber of the reaction kettle, so that the deformation of the inner wall of the reaction kettle due to overhigh temperature can be prevented, the inner bin and the outer chamber of the reaction kettle are in a negative pressure state and a positive pressure state respectively, and the inlet air can be effectively filtered by a plurality of inlet air filters, so that the flow field stability and the air supply cleanliness of the inner bin and the outer chamber of the reaction kettle are ensured; the inner wall of one end of the inner bin of the reaction kettle, which is far away from the burner, is narrowed from two sides to the middle part and then is connected with a waste discharge pipeline, the air inlet area of the inner bin of the reaction kettle is large, the air outlet area of the inner bin of the reaction kettle is small, so that the air inlet is uniform, the stability of the deposition reaction is ensured, the air outlet area of the inner bin of the reaction kettle is small, the air speed is high, waste gas and dust can be discharged in time, and the smooth proceeding of; the reaction kettle is connected with a hydrogen exhaust pipeline connected with a fan, a waste exhaust pipeline and a plurality of air inlet pipelines, the structure of the double exhaust pipeline can effectively prevent combustible gas from entering a waste gas treatment device or accumulating in the reaction kettle, the safety of production operation of equipment is ensured, and the stability of air supply temperature can be ensured by air suction at the top of a factory building; the device has high working stability and convenient adjustment and control.
The features and advantages of the present invention will be described in detail by embodiments in conjunction with the accompanying drawings.
[ description of the drawings ]
FIG. 1 is a schematic structural view of a flow field stabilizing apparatus of a clean reaction chamber for preform cladding deposition according to the present invention;
FIG. 2 is a partial top view of a stabilized flow field apparatus of a clean reaction chamber for preform cladding deposition in accordance with the present invention.
In the figure: 1-reaction kettle, 2-first air inlet pipeline, 3-third air feeder, 4-second air feeder, 5-outdoor fresh air pipe, 6-burner, 7-waste discharge pipeline, 8-upper protective plate, 9-lower protective plate, 10-reaction kettle outer chamber, 11-reaction kettle outer wall, 12-reaction kettle inner wall, 13-reaction kettle inner bin, 14-air outlet, 15-reaction kettle outer chamber pressure sensor, 16-first air inlet filter, 17-product, 18-nickel net, 19-valve, 21-first air feeder, 22-air supply pressure gauge, 23-air suction port, 31-third air inlet filter, 41-second air inlet filter, 51-fresh air valve, 71-waste discharge fan, 72-waste discharge valve, 73-an exhaust gas treatment device, 74-a temperature sensor, 75-a first pressure sensor, 76-a main air valve, 77-a second pressure sensor, 81-a traction device, 91-a supporting device, 101-a hydrogen exhaust fan and 102-a pressure gauge of an inner bin of the reaction kettle.
[ detailed description ] embodiments
Referring to fig. 1 and 2, the apparatus for stabilizing flow field of a clean reaction chamber for preform cladding deposition according to the present invention comprises a reaction vessel 1, a plurality of air inlet pipes and exhaust pipes connected to the reaction vessel 1, the exhaust pipes including a hydrogen exhaust pipe and a waste exhaust pipe 7, a product 17 and a plurality of burners 6 mounted on the reaction vessel 1, the reaction vessel 1 comprising a reaction vessel outer wall 11, the inner wall 12 of the reaction kettle is divided into an inner double-layer structure and an outer double-layer structure, the area between the outer wall 11 of the reaction kettle and the inner wall 12 of the reaction kettle is a reaction kettle outer chamber 10, the inner area of the inner wall 12 of the reaction kettle is a reaction kettle inner chamber 13, the reaction kettle 1 is connected with a hydrogen exhaust pipeline and a plurality of air inlet pipelines, the inner wall of one end of the reaction kettle inner chamber 13, which is far away from the combustor 6, is narrowed from two sides to the middle part and then is connected with a waste exhaust pipeline 7, the front end of the combustor 6 is positioned in the reaction kettle outer chamber 10, and the rear end of the combustor 6 is inserted into the reaction kettle inner chamber;
the inner wall of one end of the reaction kettle inner bin 13, which is far away from the combustor 6, is in a circular arc shape, one end of the reaction kettle inner bin 13, which is far away from the combustor 6, is provided with a flat exhaust channel, the exhaust channel is connected with the waste discharge pipeline 7, and the outer wall 11 of the reaction kettle is provided with a flat exhaust outlet 14;
the number of the air inlet pipelines is 3, the air inlet pipelines are respectively a first air inlet pipeline 2, a second air inlet pipeline and a third air inlet pipeline, the tail end of the first air inlet pipeline 2 is connected with the right side of the reaction kettle 1, the front end of the first air inlet pipeline 2 is provided with an air suction opening 23, the air suction opening 23 is positioned right above an air outlet 14 and generally positioned at the top of a factory building, the second air inlet pipeline and a hydrogen exhaust pipeline are both communicated with the top of the reaction kettle 1, the third air inlet pipeline is communicated with the bottom of the reaction kettle 1, a waste discharge pipeline 7 is connected with the left side of the reaction kettle 1, the first air inlet pipeline 2 is connected with the outer wall 11 of the reaction kettle, and the hydrogen exhaust pipeline, the second air inlet pipeline and the third air inlet pipeline are all connected with the;
a first air inlet filter 16 and a nickel screen 18 are respectively arranged on the reaction kettle outer chamber 10 and the reaction kettle inner bin 13, the first air inlet filter 16 is arranged between the joint of the first air inlet pipeline 2 and the reaction kettle outer wall 11 and the front end of the burner 6, and the burner 6 is arranged on the nickel screen 18 in a penetrating way;
the first air inlet pipeline 2, the second air inlet pipeline, the third air inlet pipeline, the waste discharge pipeline 7 and the hydrogen discharge pipeline are respectively connected with the first air feeder 21, the second air feeder 4, the third air feeder 3, the waste discharge fan 71 and the hydrogen discharge fan 101 in a one-to-one correspondence manner, and the waste discharge pipeline 7 is connected with the outdoor fresh air pipe 5 with the fresh air valve 51;
the waste discharge pipeline 7 is provided with a waste discharge valve 72, a waste gas treatment device 73, a temperature sensor 74, a first pressure sensor 75, a main air valve 76 and a second pressure sensor 77, the first air inlet pipeline 2 is provided with an air supply pressure gauge 22, and the main air valve 76 is a fully-opened and fully-closed gate valve;
a second air inlet filter 41 is arranged between the second air inlet pipeline and the second blower 4, and a third air inlet filter 31 is arranged between the third air inlet pipeline and the third blower 3;
a plurality of reaction kettle outer chamber pressure sensors 15, a plurality of reaction kettle inner bin pressure gauges 102 and valves 19 are arranged on the reaction kettle 1, each combustor 6 horizontally corresponds to one reaction kettle inner bin pressure gauge 102 and valve 19, and the reaction kettle inner bin pressure gauges 102 and the valves 19 are positioned in the vertical direction of the flat exhaust channel;
the upper end and the lower end of the product 17 are respectively installed on the reaction kettle 1 through the traction device 81 and the supporting device 91, the upper end and the lower end of the product 17 are respectively provided with an upper protection plate 8 and a lower protection plate 9, the product 17 is located in the reaction kettle inner bin 13, the upper protection plate 8 is located between the traction device 81 and the upper end of the product 17, and the lower protection plate 9 is located between the supporting device 91 and the lower end of the product 17.
The working process of the invention is as follows:
the invention relates to a stable flow field device of a clean reaction chamber for cladding deposition of a prefabricated rod, which is characterized in that in the working process, a prefabricated rod product to be deposited is placed in a reaction kettle inner bin 13, a main air valve 76 is firstly closed, the reading of a second pressure sensor 77 is more than or equal to 0pa, a first air blower 21, a second air blower 4 and a third air blower 3 are closed, a hydrogen exhaust fan 101 is opened, then a burner 6 outputs gas and ignites the gas, the main air valve 76 is opened after the ignition is finished, the reading of the second pressure sensor 77 is less than 0pa, the first air blower 21, the second air blower 4 and the third air blower 3 are opened, the hydrogen exhaust fan 101 is closed, the equipment starts normal deposition production, all harmful hydrogen chloride gas, partial silicon dioxide dust and heat generated by combustion generated by the deposition reaction are formed, waste gas is formed, in order to ensure that the deposition reaction can be normally carried out, the waste gas generated by the deposition reaction in the reaction kettle inner bin 13 is collected into a waste gas exhaust pipeline 7 through, the main air valve 76 and the fresh air valve 51 are opened to mix outdoor fresh air with waste gas in the waste discharge pipeline 7 through the outdoor fresh air pipe 5, the waste discharge valve 72 is opened to enable the waste gas to enter the waste gas treatment device 73, and the waste gas is discharged into the atmosphere through the waste discharge fan 71 after being treated qualified;
the air of the second air blower 4 and the air of the third air blower 3 respectively perform certain cooling and dedusting functions on the traction device 81 and the supporting device 91, so that the product 17 is stable in movement and rotation; the upper protection plate and the lower protection plate 9 not only effectively prevent silicon dioxide dust and hydrogen chloride gas generated by the deposition reaction from floating to the top and the bottom of the reaction kettle 1, but also effectively isolate light radiation generated by the combustion reaction, keep the low-temperature environment of the traction device 81 and the supporting device 91 and ensure the normal operation of the device; the front end of the combustor 6 is positioned in the reaction kettle outer chamber 10, so that the low-temperature environment of the front end connector of the combustor 6 can be effectively maintained, and the safety is guaranteed; the grade requirement of each air inlet filter is more than or equal to H13, the air inlet speed of the reaction kettle 1 is controlled within 0.7-1.0m/s, the difference between the highest air speed and the lowest air speed at the air inlet position is controlled within 0.2m/s, the air exhaust speed is generally 4-6.5m/s, and fresh air is extracted from the outdoor space, so that the load of an air supply air conditioner of a factory building can be effectively reduced, the input cost of air conditioning equipment and the running load of the air conditioner are reduced, and the production cost is reduced; the frequency is automatically controlled according to the pressure value read by a first pressure sensor 75 on the waste discharge pipeline 7, the waste discharge fan 71 is controlled in a frequency conversion mode, the pressure of the waste discharge pipeline 7 is ensured to be stable, the tail end of a combustor 6 is right opposite to the center of a product and can spray raw materials, fuel gas, oxygen and nitrogen, the front end of the combustor 6 is right opposite to the joint of a first air inlet pipe 2 and a reaction kettle 1, each filter can carry out filtration treatment to ensure the cleanliness in the reaction kettle, the pressure of a pressure gauge 102 of an inner bin of the reaction kettle corresponding to the combustor is regulated and controlled by opening or closing a valve 19, the pressure values of the pressure gauges 102 of the inner bins of the reaction kettle need to be regulated to be consistent and have the precision of 1pa to ensure the stable air discharge of the whole product;
in addition, the first blower 21 is controlled by frequency conversion, and in the deposition process, the frequency of the first blower 21 is controlled by the pressure value read by the outer reaction chamber pressure sensor 15, so that the pressure of the outer reaction chamber 10 of the reaction kettle is stable, and the stable air supply and the stable flow field of the inner reaction chamber 13 of the reaction kettle can be further ensured; the pressure of the outer reaction chamber 10 is controlled to be positive pressure, which is generally preferably 3-20pa, so that the air supply of the inner bin 13 of the outer reaction chamber is completely provided by the first air feeder 21, dust particles in a factory building are prevented from entering the inner bin 13 of the reaction kettle, and the quality of products is ensured; the pressure requirement of the pressure gauge 102 of the inner bin of the reaction kettle is controlled at negative pressure, which is preferably negative 2-10pa, so that dust particles and waste gas generated in the deposition reaction process can be discharged out of the inner bin 13 of the reaction kettle in time, and the normal production of products is guaranteed; the inner bin 13 of the reaction kettle is controlled to be negative pressure, and the outer chamber 10 of the reaction kettle is controlled to be positive pressure, so that harmful gas and dust generated by deposition reaction can be effectively prevented from overflowing into a plant, safety is ensured, particles in the plant can be effectively prevented from entering the inner bin of the reaction kettle, and air supply is ensured to be clean;
the air exhausted from the exhaust outlet 14 of the outer chamber of the reaction kettle contains a large amount of heat, the temperature is high, high-temperature gas in the factory floats upwards and is finally accumulated at the top of the factory building, so that the temperature of the top of the factory building is kept at about 40 ℃ and is stable; the inlet scoop 23 of first forced draught blower 21 designs in the factory building top directly over the reation kettle outer room air exit 14, can make high-temperature gas cyclic utilization effectively, reduces the operating load of factory building air conditioner, the energy saving, and the wind that storehouse 13 was sent to reation kettle in the first forced draught blower 21 simultaneously is higher than the temperature (about 25 ℃) of factory building bottom wind, temperature when can improve the combustor burning effectively, has reduced the use of fuel relatively effectively, reduction product manufacturing cost. Meanwhile, the temperature at the top of the plant is stable and uniform, so that the stable air supply temperature of all deposition equipment in the plant can be ensured, and the consistency of process parameters among all machines is ensured.
The invention relates to a stable flow field device of a clean reaction chamber for preform cladding deposition, which is characterized in that a reaction kettle 1 adopts a double-layer structure design, inlet air can flow in an outer chamber 10 of the reaction kettle to prevent the inner wall 12 of the reaction kettle from deforming due to overhigh temperature, an inner chamber 13 of the reaction kettle and the outer chamber 10 of the reaction kettle are in negative pressure and positive pressure states respectively, a plurality of inlet air filters can effectively filter the inlet air, and the flow field stability and the air supply cleanliness of the inner chamber 13 of the reaction kettle and the outer chamber 10 of the reaction kettle are ensured; the inner wall of one end of the reaction kettle inner bin 13, which is far away from the combustor 6, is narrowed from two sides to the middle part and then is connected with the waste discharge pipeline 7, the air inlet area of the reaction kettle inner bin 13 is large, the air outlet area is small, so that air inlet is uniform, the stability of the deposition reaction is ensured, the air outlet area is small, the air speed is high, waste gas and dust can be discharged in time, and the smooth proceeding of the deposition reaction is ensured, and the quality of product deposition is ensured; the reaction kettle 1 is connected with a hydrogen exhaust pipeline connected with a fan, a waste exhaust pipeline 7 and a plurality of air inlet pipelines, and the structure of the double exhaust pipelines can effectively prevent combustible gas from entering a waste gas treatment device or accumulating in the reaction kettle 1, so that the safety of the production operation of equipment is ensured, and the air suction at the top of a factory building ensures the stability of the air supply temperature; the device has high working stability, convenient adjustment and control and production cost saving.
The above embodiments are illustrative of the present invention, and are not intended to limit the present invention, and any simple modifications of the present invention are within the scope of the present invention.
Claims (9)
1. The utility model provides a prefabricated excellent cladding is stable flow field device of clean reaction chamber for deposit, includes reation kettle (1), a plurality of air inlet ducts that link to each other with reation kettle (1), installs product (17) and a plurality of combustor (6) on reation kettle (1), its characterized in that: reation kettle (1) is separated by reation kettle outer wall (11), reation kettle inner wall (12) and forms inside and outside bilayer structure, and regional outer room (10) for the reation kettle between reation kettle outer wall (11) and reation kettle inner wall (12), the inside region of reation kettle inner wall (12) is storehouse (13) in the reation kettle, reation kettle (1) links to each other with hydrogen discharge pipe way, a plurality of air inlet duct, the one end inner wall of keeping away from combustor (6) in storehouse (13) in the reation kettle is narrowed back by both sides to the middle part and is linked to each other with exhaust pipe way (7), the front end of combustor (6) is located outer room (10) of reation kettle, and the rear end of combustor (6) inserts in storehouse (13) in the reation kettle and aims at product (17).
2. The apparatus for stabilizing a flow field of a clean reaction chamber for preform cladding deposition according to claim 1, wherein: the inner wall of one end, far away from the combustor (6), of the reaction kettle inner bin (13) is in an arc shape, one end, far away from the combustor (6), of the reaction kettle inner bin (13) is provided with a flat exhaust channel, the exhaust channel is connected with the waste discharge pipeline (7), and the reaction kettle outer wall (11) is provided with an air outlet (14).
3. The apparatus for stabilizing a flow field of a clean reaction chamber for preform cladding deposition according to claim 2, wherein: the quantity of intake stack is 3 and is first intake stack (2), second intake stack, third intake stack respectively, the end and reation kettle (1) right side of first intake stack (2) link to each other, and the front end of first intake stack (2) is inlet scoop (23), second intake stack and hydrogen exhaust pipeline all are linked together with reation kettle (1) top, third intake stack and reation kettle (1) bottom are linked together, exhaust pipe (7) link to each other with reation kettle (1) left side.
4. The apparatus for stabilizing a flow field of a clean reaction chamber for preform cladding deposition according to claim 3, wherein: install first air inlet filter (16), nickel net (18) on reation kettle outer room (10) and reation kettle interior storehouse (13) respectively, first air inlet filter (16) are between the front end of the junction of first intake stack (2) and reation kettle outer wall (11) and combustor (6), combustor (6) are worn to establish on nickel net (18).
5. The apparatus for stabilizing a flow field of a clean reaction chamber for preform cladding deposition according to claim 3, wherein: first intake stack (2), second intake stack, third intake stack, exhaust pipe way (7), hydrogen discharge pipeline and respectively with first forced draught blower (21), second forced draught blower (4), third forced draught blower (3), exhaust fan (71), exhaust fan (101) one-to-one link to each other, exhaust pipe way (7) link to each other with outdoor fresh air pipe (5) of taking new trend valve (51).
6. The apparatus for stabilizing a flow field in a clean reaction chamber for preform cladding deposition of claim 5, wherein: install exhaust valve (72), exhaust treatment device (73), temperature sensor (74), first pressure sensor (75), total blast gate (76) and second pressure sensor (77) on exhaust pipe (7), install air supply manometer (22) on first intake stack (2).
7. The apparatus for stabilizing a flow field in a clean reaction chamber for preform cladding deposition of claim 5, wherein: and a second air inlet filter (41) is arranged between the second air inlet pipeline and the second air feeder (4), and a third air inlet filter (31) is arranged between the third air inlet pipeline and the third air feeder (3).
8. The apparatus for stabilizing a flow field in a clean reaction chamber for preform cladding deposition of claim 5, wherein: the reaction kettle (1) is provided with a reaction kettle outer chamber pressure sensor (15), a plurality of reaction kettle inner bin pressure gauges (102) and a valve (19).
9. The apparatus for stabilizing a flow field of a clean reaction chamber for preform cladding deposition according to any one of claims 1 to 8, wherein: the upper end and the lower end of the product (17) are respectively installed on the reaction kettle (1) through a traction device (81) and a supporting device (91), the upper end and the lower end of the product (17) are respectively provided with an upper protection plate (8) and a lower protection plate (9), and the product (17) is located in the reaction kettle inner bin (13).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911330759.5A CN110818246B (en) | 2019-12-20 | 2019-12-20 | Stable flow field device of clean reaction chamber for preform cladding deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911330759.5A CN110818246B (en) | 2019-12-20 | 2019-12-20 | Stable flow field device of clean reaction chamber for preform cladding deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110818246A true CN110818246A (en) | 2020-02-21 |
| CN110818246B CN110818246B (en) | 2023-12-26 |
Family
ID=69546126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911330759.5A Active CN110818246B (en) | 2019-12-20 | 2019-12-20 | Stable flow field device of clean reaction chamber for preform cladding deposition |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110818246B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04270133A (en) * | 1991-02-21 | 1992-09-25 | Fujikura Ltd | Production unit of porous optical fiber matrix |
| JPH11292558A (en) * | 1998-04-07 | 1999-10-26 | Furukawa Electric Co Ltd:The | Reactor for production of glass fine particle deposit for optical fiber glass |
| CN105060700A (en) * | 2015-08-07 | 2015-11-18 | 中国科学院上海光学精密机械研究所 | Making device and method for soft glass optical fiber preform |
| CN206337170U (en) * | 2016-11-23 | 2017-07-18 | 浙江富通光纤技术有限公司 | The control system of negative pressure value in VAD reaction vessels |
| CN209468317U (en) * | 2019-01-29 | 2019-10-08 | 杭州永通智造科技有限公司 | A kind of plug settling chamber flowing field stability control device |
| CN211170460U (en) * | 2019-12-20 | 2020-08-04 | 杭州永通智造科技有限公司 | Flow field stabilizing device of clean reaction chamber for preform cladding deposition |
-
2019
- 2019-12-20 CN CN201911330759.5A patent/CN110818246B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04270133A (en) * | 1991-02-21 | 1992-09-25 | Fujikura Ltd | Production unit of porous optical fiber matrix |
| JPH11292558A (en) * | 1998-04-07 | 1999-10-26 | Furukawa Electric Co Ltd:The | Reactor for production of glass fine particle deposit for optical fiber glass |
| CN105060700A (en) * | 2015-08-07 | 2015-11-18 | 中国科学院上海光学精密机械研究所 | Making device and method for soft glass optical fiber preform |
| CN206337170U (en) * | 2016-11-23 | 2017-07-18 | 浙江富通光纤技术有限公司 | The control system of negative pressure value in VAD reaction vessels |
| CN209468317U (en) * | 2019-01-29 | 2019-10-08 | 杭州永通智造科技有限公司 | A kind of plug settling chamber flowing field stability control device |
| CN211170460U (en) * | 2019-12-20 | 2020-08-04 | 杭州永通智造科技有限公司 | Flow field stabilizing device of clean reaction chamber for preform cladding deposition |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110818246B (en) | 2023-12-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102679467A (en) | Air-conditioner ventilating system for pretreatment workshop for dairy product production | |
| CN211170460U (en) | Flow field stabilizing device of clean reaction chamber for preform cladding deposition | |
| CN110818246A (en) | Flow field stabilizing device of clean reaction chamber for preform cladding deposition | |
| CN110044173B (en) | Blank drying device for energy-saving wide kiln | |
| CN203960246U (en) | The top hot blast air-supply arrangement of blast furnace iron notch | |
| CN205008091U (en) | Powder coating inner loop crocus dust removal cooling system | |
| CN201277574Y (en) | Flue dust conveyer used for tertiary air exhaust-heat boiler | |
| CN207716837U (en) | A kind of hard alloy vacuum sintering furnace | |
| CN202343028U (en) | Side air inlet bag type dust collector with branch chamber inlet valve | |
| CN206119151U (en) | Wind energy cyclic utilization device of roast machine of tobacco leaf | |
| CN206262263U (en) | Double-deck deduster | |
| CN206617919U (en) | For the steam supply system in production | |
| CN206591033U (en) | A kind of high purity quartz process units | |
| CN206819974U (en) | Quartz boat cooling cabinet | |
| CN112838282A (en) | System for negative-pressure formation of lithium battery with clean pipeline and cleaning process of system | |
| CN207512074U (en) | One kind is used for preform manufacturing device | |
| CN206285641U (en) | A kind of filter | |
| CN201488271U (en) | Straight tube shaped direct coal firing air heating furnace | |
| CN106540790A (en) | A kind of powdery paints interior circulation milling dedusting cooling system | |
| CN217465351U (en) | Atmosphere stove exhaust control structure | |
| CN106810056A (en) | A kind of high purity quartz process units | |
| CN205505707U (en) | Two segmentation tunnel caves with ventilation cooling device | |
| CN221217650U (en) | Oxygen-enriched glass kiln | |
| CN216925180U (en) | Waste heat recovery device for metal surface treatment | |
| CN204563806U (en) | A kind of device for recovering powder |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |