CN110780365A - Method for manufacturing micro-lens array by photoetching and electroforming process - Google Patents
Method for manufacturing micro-lens array by photoetching and electroforming process Download PDFInfo
- Publication number
- CN110780365A CN110780365A CN201911039489.2A CN201911039489A CN110780365A CN 110780365 A CN110780365 A CN 110780365A CN 201911039489 A CN201911039489 A CN 201911039489A CN 110780365 A CN110780365 A CN 110780365A
- Authority
- CN
- China
- Prior art keywords
- plate
- nickel
- electroforming
- lens array
- micro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
Abstract
The invention discloses a method for manufacturing a micro-lens array by utilizing photoetching and electroforming processes, which comprises the steps of photoetching a photoresist plate, then performing electroforming replication on the photoresist plate, and performing electroforming replication on a nickel plate obtained by electroforming to obtain a nickel working plate; adhering a nickel working plate to a glass plate, coating a thin layer of ultraviolet curing adhesive on the surface of the nickel working plate with a honeycomb structure, and completely filling the ultraviolet curing adhesive in a cavity of the honeycomb structure by a vacuumizing method; the liquid level of the ultraviolet curing glue in each honeycomb cavity becomes a spherical surface with a curvature radius, the cured micro-lens array nickel working plate of the ultraviolet curing glue is subjected to electroforming replication to obtain a nickel template, and the micro-lens array is replicated and produced in large batch. The method of the invention adopts a simpler process flow to manufacture the micro-lens array, which simplifies the process, reduces the cost and shortens the manufacturing flow.
Description
Technical Field
The invention relates to the technical field of micro-machining type micro-lens array manufacturing, in particular to a method for manufacturing a micro-lens array by utilizing photoetching and electroforming processes.
Background
In recent years, microlens arrays have found widespread use in the field of optoelectronics, such as focal plane optics, light effect enhancers, light homogenizers, beam shapers, micro-optical scanners, color filters, and even optical security markings. In recent years, various manufacturing techniques have been developed, but all of them belong to relatively complicated fine processing techniques, and have relatively complicated equipment, relatively complicated manufacturing processes, and relatively long process flows.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a method for manufacturing a micro-lens array by utilizing photoetching and electroforming processes.
In order to achieve the above object, the present invention provides a method for fabricating a microlens array by using photolithography and electroforming processes, comprising the following steps:
1) preparing a required positive photoresist plate and a glass photomask with a chromium film according to the size of the micro-lens array;
2) the chromium film surface of the glass photomask plate is tightly attached and clamped with the glue surface of the positive photoresist plate, and then the ultraviolet lamp is used for carrying out uniform exposure photoetching, so that ultraviolet rays pass through the glass photomask plate and irradiate on the positive photoresist plate (the effect of partial etching is achieved); after exposure, taking down the glass photomask, and placing the positive photoresist plate in a sodium hydroxide solution for development to obtain the photoresist plate with a honeycomb structure; wherein, the photoetching depth is required to etch the thickness of the transparent glue layer;
3) carrying out metallization treatment on the surface of the photoresist plate with the honeycomb structure, then carrying out electroforming (nickel electroforming) on the surface of the photoresist plate, and stripping the photoresist plate to obtain an electroforming layer, namely a nickel plate;
4) passivating the nickel plate obtained by electroforming, and electroforming again to obtain a nickel plate with a honeycomb structure, namely a nickel working plate (the nickel working plate used for manufacturing a template of a micro-lens array);
5) adhering a nickel working plate to an organic glass plate with the thickness of 3-5 nm, and passivating the nickel working plate;
6) coating a layer of ultraviolet curing adhesive on the surface of the passivated nickel working plate, placing the nickel working plate in a vacuum chamber, vacuumizing the vacuum chamber to discharge residual air in the cavity of the honeycomb structure, and completely filling the cavity of the honeycomb structure with the ultraviolet curing adhesive; then placing the honeycomb structure on a high-speed centrifuge, starting the centrifuge, throwing off redundant ultraviolet curing glue, and forming a spherical surface with the curvature radius R (the curvature radius of the spherical surface is determined according to the speed of the centrifuge and the viscosity of the ultraviolet curing glue) under the action of surface tension on the liquid level of the ultraviolet curing glue in each honeycomb;
7) the nickel working plate with the cured surface ultraviolet curing adhesive is metalized and then subjected to electroforming replication to obtain a nickel template for manufacturing the concave micro-lens array, wherein the cross section of the nickel template is shown in fig. 6.
Or, after metallization treatment, electroforming replication is carried out on the nickel working plate with the surface ultraviolet curing adhesive cured, so as to obtain a nickel template, passivation treatment is carried out on the nickel template, and electroforming replication is carried out again, so as to obtain the nickel template for manufacturing the convex micro-lens array;
8) and 7) respectively manufacturing the concave micro-lens array or the convex micro-lens array by using the manufactured nickel template obtained in the step 7).
Further, in the step 1), the thickness of the positive photoresist plate is 40-50 nm.
Still further, in the step 2), the mass fraction of the sodium hydroxide solution is 1%.
Further, in the step 3), the thickness of the electroforming layer on the photoresist plate is 90-110 nm.
Further, in the step 4), the thickness of the electroforming layer on the nickel plate is 90-110 nm.
And furthermore, in the step 5), the thickness of the organic glass plate is 3-5 mm.
Further, in the step 7), the thickness of the electroforming layer on the surface of the nickel template of the concave micro-lens array is 50-60 nm.
The invention has the beneficial effects that:
1) the method of the invention carries out electroforming replication on the cured micro-lens array nickel working plate of the ultraviolet curing glue, thus obtaining the nickel template for manufacturing the concave micro-lens array. The nickel template is subjected to electroforming replication again to obtain the nickel template for manufacturing the convex microlens array. Due to the high mechanical strength of the nickel plate, the microlens array can be reproduced in large quantities.
2) The invention can manufacture the nickel templates of the micro-lens arrays with different curvature radiuses by controlling the rotating speed of the centrifugal spin coater and the viscosity of the ultraviolet curing glue, thereby greatly reducing the manufacturing cost and improving the manufacturing speed of the templates.
Drawings
Figure 1 is a schematic diagram of a microlens array layout,
in the figure, D is the diameter of the transparent area of the chromium film in the mask plate, namely the diameter of the micro-lens, and D is the interval between the micro-lenses;
FIG. 2 is a schematic cross-sectional view of a cavity with a honeycomb structure formed by photolithography of a photoresist plate;
in the figure: 1-honeycomb photoresist layer, 2-glass substrate;
D
1is the diameter of the top surface of the honeycomb cavity, i.e. D
1The size is the same as the diameter D of the micro lens;
d
1is the spacing between the top surfaces of the honeycomb cavities, i.e. d
1The size is the same as the spacing d between the microlenses;
h
1depth of the honeycomb cavity;
FIG. 3 is a schematic cross-sectional view of a nickel plate obtained after the first electroforming;
in the figure, D
2The diameter of the bottom surface of the conical boss after electroforming, namely D
2The size is the same as the diameter D of the micro-lens, D
1＝D
2＝D；
d
2Is the space between the bottom surfaces of the conical bosses after electroforming, i.e. d
2Size and spacing between microlenses, d
1＝d
2＝d；
h
2The height h of the taper boss after electroforming
2＝h
1；
FIG. 4 is a schematic cross-sectional view of a nickel work plate having a honeycomb structure obtained after the second electroforming;
in the figure, D
1Is the diameter of the top surface of the honeycomb-shaped cavity; d
1The space between the top surfaces of the honeycomb-shaped cavities; h is
1Depth of the honeycomb cavity;
FIG. 5 is a schematic view of a spherical surface shape of the UV-curable adhesive liquid level in the honeycomb cavity after spin coating;
in the figure: 3-ultraviolet curing glue, 4-honeycomb electroformed nickel layer and 5-organic glass substrate;
d is the diameter of the micro-lenses, and D is the interval between the micro-lenses; r is the curvature radius of the liquid level, namely the curvature radius of the micro lens;
FIG. 6 is a schematic cross-sectional view of a nickel template for making a concave microlens array,
in the figure, D is the diameter of the micro-lens, R is the radius of curvature of the micro-lens, D is the interval between the micro-lenses, and H is the thickness of the electroformed nickel layer;
FIG. 7 is a schematic cross-sectional view of a nickel template for fabricating a convex microlens array,
in the figure, D is the diameter of the microlens, R is the radius of curvature of the microlens, D is the interval between the microlenses, and H is the thickness of the electroformed nickel layer.
Detailed Description
The present invention is described in further detail below with reference to specific examples so as to be understood by those skilled in the art.
Example 1
The method for manufacturing the concave micro-lens array by utilizing the photoetching and electroforming processes comprises the following steps of:
1) purchasing a positive photoresist plate with the thickness of 40-50 nm and customizing a glass photomask with a chromium film according to the layout and the size of the micro-lens array shown in FIG. 1; as shown in fig. 1: d ═ 100nm and D ═ 5 nm;
2) the chromium film surface of the glass photomask plate is tightly attached and clamped with the glue surface of the positive photoresist plate, and then the ultraviolet lamp is used for carrying out uniform exposure photoetching, so that ultraviolet rays pass through the glass photomask plate and irradiate on the positive photoresist plate (the effect of partial etching is achieved); after exposure, the glass photomask is taken down, and the positive photoresist plate is placed in hydrogen hydroxide with the mass fraction of 1 percentDeveloping in sodium solution to obtain the photoresist plate with honeycomb structure (the photoetching depth should be equal to the thickness of the photoresist layer), and the section of the photoresist plate is shown in figure 2: d
1＝100nm、d
15nm and h
1＝40～50nm；
3) Carrying out metallization treatment on the surface of the photoresist plate with the honeycomb structure, then carrying out electroforming (nickel electroforming) on the surface of the photoresist plate, and stripping the photoresist plate to obtain an electroforming layer, namely a nickel plate; the thickness of the electroforming layer on the photoresist plate is 90-110 nm; as shown in fig. 3:
D
2＝100nm、d
25nm and h
2＝40～50nm；
4) Passivating the nickel plate obtained by electroforming, and electroforming again to obtain a nickel plate with a honeycomb structure, namely a nickel working plate, wherein the thickness of an electroforming layer on the nickel plate is 90-110 nm (the nickel working plate is used for manufacturing a template of a micro-lens array); the section is shown in figure 4: d
1＝100nm、d
15nm and h
1＝40～50nm。
5) Adhering a nickel working plate to an organic glass plate with the thickness of 3-5 mm, and passivating the nickel working plate;
6) coating a layer of ultraviolet curing adhesive on the surface of the passivated nickel working plate, placing the nickel working plate in a vacuum chamber, vacuumizing the vacuum chamber to discharge residual air in the cavity of the honeycomb structure, and completely filling the cavity of the honeycomb structure with the ultraviolet curing adhesive; then placing the honeycomb structure on a high-speed centrifuge, starting the centrifuge, throwing off redundant ultraviolet curing glue, and forming a spherical surface with the curvature radius R (the curvature radius of the spherical surface is determined according to the speed of the centrifuge and the viscosity of the ultraviolet curing glue) under the action of surface tension on the liquid level of the ultraviolet curing glue in each honeycomb; as shown in fig. 5: d ═ 100nm and D ═ 5 nm;
7) carrying out metallization treatment on the nickel working plate with the surface ultraviolet curing adhesive cured, and then carrying out electroforming replication to obtain a nickel template for manufacturing the concave micro-lens array, wherein the thickness of the electroforming layer on the surface of the nickel template for manufacturing the concave micro-lens array is 50-60 nm; its cross section is shown in fig. 6: d is 100nm, D is 5nm and H is 50-60 nm;
8) and 7) manufacturing the concave micro-lens array by using the nickel template obtained in the step 7).
Example 2
The method for manufacturing the convex micro-lens array by utilizing the photoetching and electroforming processes comprises the following steps:
1) purchasing a positive photoresist plate with the thickness of 40-50 nm and customizing a glass photomask with a chromium film according to the layout and the size of the micro-lens array shown in FIG. 1; as shown in fig. 1: d ═ 100nm and D ═ 5 nm;
2) the chromium film surface of the glass photomask plate is tightly attached and clamped with the glue surface of the positive photoresist plate, and then the ultraviolet lamp is used for carrying out uniform exposure photoetching, so that ultraviolet rays pass through the glass photomask plate and irradiate on the positive photoresist plate (the effect of partial etching is achieved); after exposure, taking down the glass photomask, and placing the positive photoresist plate in a sodium hydroxide solution with the mass fraction of 1% for development to obtain the photoresist plate with a honeycomb structure (the photoetching depth is equal to the thickness of the photoresist layer), wherein the section of the photoresist plate is as shown in fig. 2: d
1＝100nm、d
15nm and h
1＝40～50nm；
3) Carrying out metallization treatment on the surface of the photoresist plate with the honeycomb structure, then carrying out electroforming (nickel electroforming) on the surface of the photoresist plate, and stripping the photoresist plate to obtain an electroforming layer, namely a nickel plate; the thickness of the electroforming layer on the photoresist plate is 90-110 nm; as shown in fig. 3:
D
2＝100nm、d
25nm and h
2＝40～50nm；
4) Passivating the nickel plate obtained by electroforming, and electroforming again to obtain a nickel plate with a honeycomb structure, namely a nickel working plate, wherein the thickness of an electroforming layer on the nickel plate is 90-110 nm (the nickel working plate is used for manufacturing a template of a micro-lens array); the section is shown in figure 4: d
1＝100nm、d
15nm and h
1＝40～50nm；
5) Adhering a nickel working plate to an organic glass plate with the thickness of 3-5 mm, and passivating the nickel working plate;
6) coating a layer of ultraviolet curing adhesive on the surface of the passivated nickel working plate, placing the nickel working plate in a vacuum chamber, vacuumizing the vacuum chamber to discharge residual air in the cavity of the honeycomb structure, and completely filling the cavity of the honeycomb structure with the ultraviolet curing adhesive; then placing the honeycomb structure on a high-speed centrifuge, starting the centrifuge, throwing off redundant ultraviolet curing glue, and forming a spherical surface with the curvature radius R (the curvature radius of the spherical surface is determined according to the speed of the centrifuge and the viscosity of the ultraviolet curing glue) under the action of surface tension on the liquid level of the ultraviolet curing glue in each honeycomb; as shown in fig. 5: d ═ 100nm and D ═ 5 nm;
7) performing metallization treatment on a nickel working plate with the surface of which the ultraviolet curing adhesive is cured, performing electroforming replication to obtain a nickel template, performing passivation treatment on the nickel template, and performing electroforming replication again to obtain the nickel template for manufacturing the convex micro-lens array; as shown in fig. 7: d is 100nm, D is 5nm and H is 50-60 nm;
8) and 7) manufacturing the convex micro-lens array by using the nickel template obtained in the step 7).
Other parts not described in detail are prior art. Although the present invention has been described in detail with reference to the above embodiments, it is only a part of the embodiments of the present invention, not all of the embodiments, and other embodiments can be obtained without inventive step according to the embodiments, and the embodiments are within the scope of the present invention.
Claims (7)
1. A method for manufacturing a micro-lens array by utilizing photoetching and electroforming processes is characterized by comprising the following steps: the method comprises the following steps:
1) preparing a required positive photoresist plate and a glass photomask with a chromium film according to the size of the micro-lens array;
2) closely attaching and clamping a chromium film surface of the glass photomask plate and a glue surface of the positive photoresist plate, and then carrying out uniform exposure photoetching by using an ultraviolet lamp to enable ultraviolet rays to penetrate through the glass photomask plate and irradiate on the positive photoresist plate; after exposure, taking down the glass photomask, and placing the positive photoresist plate in a sodium hydroxide solution for development to obtain the photoresist plate with a honeycomb structure; wherein, the photoetching depth is required to etch the thickness of the transparent glue layer;
3) carrying out metallization treatment on the surface of the photoresist plate with the honeycomb structure, then electroforming the surface of the photoresist plate, and stripping the photoresist plate to obtain an electroforming layer, namely a nickel plate;
4) passivating the nickel plate obtained by electroforming, and electroforming again to obtain a nickel plate with a honeycomb structure, namely a nickel working plate;
5) adhering a nickel working plate to the organic glass plate, and passivating the nickel working plate;
6) coating a layer of ultraviolet curing adhesive on the surface of the passivated nickel working plate, placing the nickel working plate in a vacuum chamber, vacuumizing the vacuum chamber to discharge residual air in the cavity of the honeycomb structure, and completely filling the cavity of the honeycomb structure with the ultraviolet curing adhesive; then placing the honeycomb bodies on a high-speed centrifuge, starting the centrifuge, throwing off redundant ultraviolet curing glue, and forming spherical surfaces with curvature radius R by the liquid level of the ultraviolet curing glue in each honeycomb under the action of surface tension;
7) carrying out metallization treatment on the nickel working plate with the surface ultraviolet curing adhesive cured, and then carrying out electroforming replication to obtain a nickel template for manufacturing the concave micro-lens array;
or, after metallization treatment, electroforming replication is carried out on the nickel working plate with the surface ultraviolet curing adhesive cured, so as to obtain a nickel template, passivation treatment is carried out on the nickel template, and electroforming replication is carried out again, so as to obtain the nickel template for manufacturing the convex micro-lens array;
8) respectively manufacturing the concave micro-lens array or the convex micro-lens array by using the nickel template obtained in the step 7).
2. The method of claim 1, wherein the method further comprises the steps of: in the step 1), the thickness of the positive photoresist plate is 40-50 nm.
3. The method of claim 1, wherein the method further comprises the steps of: in the step 2), the mass fraction of the sodium hydroxide solution is 1%.
4. The method of claim 1, wherein the method further comprises the steps of: in the step 3), the thickness of the electroforming layer on the photoresist plate is 90-110 nm.
5. The method of claim 1, wherein the method further comprises the steps of: in the step 4), the thickness of the electroforming layer on the nickel plate is 90-110 nm.
6. The method of claim 1, wherein the method further comprises the steps of: in the step 5), the thickness of the organic glass plate is 3-5 mm.
7. The method of claim 1, wherein the method further comprises the steps of: in the step 7), the thickness of the electroforming layer on the surface of the nickel template of the concave micro-lens array is 50-60 nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911039489.2A CN110780365A (en) | 2019-10-29 | 2019-10-29 | Method for manufacturing micro-lens array by photoetching and electroforming process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911039489.2A CN110780365A (en) | 2019-10-29 | 2019-10-29 | Method for manufacturing micro-lens array by photoetching and electroforming process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110780365A true CN110780365A (en) | 2020-02-11 |
Family
ID=69387484
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911039489.2A Pending CN110780365A (en) | 2019-10-29 | 2019-10-29 | Method for manufacturing micro-lens array by photoetching and electroforming process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110780365A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115421230A (en) * | 2022-09-30 | 2022-12-02 | 北京邮电大学 | Integrated micro lens with supporting structure and preparation method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5298366A (en) * | 1990-10-09 | 1994-03-29 | Brother Kogyo Kabushiki Kaisha | Method for producing a microlens array |
| EP0426441B1 (en) * | 1989-10-30 | 1996-12-11 | Sharp Kabushiki Kaisha | An optical device having a microlens and a process for making microlenses |
| CN102866440A (en) * | 2012-09-25 | 2013-01-09 | 中国科学技术大学 | Manufacturing method of plano-convex microlens and array of plano-convex microlens |
| CN103353627A (en) * | 2013-07-12 | 2013-10-16 | 厦门理工学院 | Manufacturing method of micro lens array mold |
| CN105005106A (en) * | 2015-06-01 | 2015-10-28 | 陈昭红 | Honeycomb slightly convex grating, and preparation method and application thereof |
| CN108909331A (en) * | 2018-09-04 | 2018-11-30 | 深圳市裕同包装科技股份有限公司 | A kind of the 3D imaging method and device of microstructured optical film |
-
2019
- 2019-10-29 CN CN201911039489.2A patent/CN110780365A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0426441B1 (en) * | 1989-10-30 | 1996-12-11 | Sharp Kabushiki Kaisha | An optical device having a microlens and a process for making microlenses |
| US5298366A (en) * | 1990-10-09 | 1994-03-29 | Brother Kogyo Kabushiki Kaisha | Method for producing a microlens array |
| CN102866440A (en) * | 2012-09-25 | 2013-01-09 | 中国科学技术大学 | Manufacturing method of plano-convex microlens and array of plano-convex microlens |
| CN103353627A (en) * | 2013-07-12 | 2013-10-16 | 厦门理工学院 | Manufacturing method of micro lens array mold |
| CN105005106A (en) * | 2015-06-01 | 2015-10-28 | 陈昭红 | Honeycomb slightly convex grating, and preparation method and application thereof |
| CN108909331A (en) * | 2018-09-04 | 2018-11-30 | 深圳市裕同包装科技股份有限公司 | A kind of the 3D imaging method and device of microstructured optical film |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115421230A (en) * | 2022-09-30 | 2022-12-02 | 北京邮电大学 | Integrated micro lens with supporting structure and preparation method thereof |
| CN115421230B (en) * | 2022-09-30 | 2023-10-27 | 北京邮电大学 | Integrated micro-lens with supporting structure and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111175861B (en) | Design and preparation method of multi-focal-length curved fly-eye lens | |
| KR100703095B1 (en) | High sag lens fabrication method and high sag lens manufactured thereby | |
| KR100638826B1 (en) | Method of manufacturing a high sag lens | |
| EP3081369B1 (en) | Method for manufacturing a lens | |
| CN103913784A (en) | Method for preparing polymer micro lens array | |
| US20050147925A1 (en) | System and method for analog replication of microdevices having a desired surface contour | |
| KR100541027B1 (en) | Image sensor, fabrication method of an image sensor and mold for fabricating a micro condenser element array used in the same | |
| CN113126188A (en) | Curved fly-eye lens and preparation method thereof | |
| CN110780365A (en) | Method for manufacturing micro-lens array by photoetching and electroforming process | |
| CN113740942B (en) | Micro-lens array grating and preparation method and application thereof | |
| CN110954977B (en) | Preparation method of cycloolefin copolymer microlens array | |
| CN110187599B (en) | Micro-lens mask and preparation method thereof | |
| JP2001518206A (en) | Method for manufacturing light guiding structure | |
| KR100701355B1 (en) | Fabrication method of micro lens array and stamper for duplicating micro lens array | |
| CN1218196C (en) | Production method of millimeter-level microlens array | |
| TWM606178U (en) | Lens stamping die and camera lens module | |
| CN116224476B (en) | Microlens array and method for manufacturing same | |
| CN109164516A (en) | The manufacture craft of micro-lens array | |
| CN116577855B (en) | Double-glued fly-eye lens with diaphragm and preparation method thereof | |
| CN113608285B (en) | Ni column-assisted PMMA (polymethyl methacrylate) microlens array and preparation method thereof | |
| CN217385873U (en) | Micro-lens array with glue overflow groove | |
| CN116125569B (en) | Preparation method of microlens array based on nanoimprint lithography | |
| CN115598745A (en) | Preparation method of micro-lens array | |
| TWI398670B (en) | Method for making lens array | |
| CN116047869A (en) | Processing method of photoetching mother board for electroforming and micro-fluidic chip |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200211 |
|
| RJ01 | Rejection of invention patent application after publication |