CN110735185A - Crystal growth furnace - Google Patents
Crystal growth furnace Download PDFInfo
- Publication number
- CN110735185A CN110735185A CN201911046376.5A CN201911046376A CN110735185A CN 110735185 A CN110735185 A CN 110735185A CN 201911046376 A CN201911046376 A CN 201911046376A CN 110735185 A CN110735185 A CN 110735185A
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- Prior art keywords
- vacuum
- furnace
- sealing ring
- crystal growth
- opening
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The invention discloses an crystal growth furnace, which comprises a furnace body and a furnace cover, wherein the furnace body is provided with a cavity, the upper part of the furnace body is provided with an opening communicated with the cavity, a flange body is sleeved at the opening, the furnace cover is arranged above the opening and is configured to open and close the opening, the crystal growth furnace comprises a sealing ring and a second sealing ring, the 0 sealing ring and the second sealing ring are sequentially arranged on the flange body along the radial direction of the opening, the 1 sealing ring and the second sealing ring are arranged at intervals, when the furnace cover closes the opening, a sealing cavity is defined among the sealing ring, the second sealing ring, the furnace cover and the flange body, the flange body is provided with a vacuum gas circuit, the end of the vacuum gas circuit is communicated with a vacuum source, a exhaust opening is formed in addition end, and the exhaust opening is communicated with the sealing cavity.
Description
Technical Field
The invention relates to the technical field of crystal growing furnaces, in particular to crystal growing furnaces.
Background
In the process of producing crystals by adopting the crystal growth furnace, the furnace cover is required to be used for sealing the cavity of the crystal growth furnace, then the air in the cavity of the crystal growth furnace is pumped out, and the crystal growth can be started after the vacuum degree reaches .
Disclosure of Invention
The invention aims to overcome the problems in the prior art and provide crystal growing furnaces, which have the advantage of good sealing performance.
In order to achieve the purpose, the invention provides crystal growth furnaces, which comprise a furnace body and a furnace cover, wherein the furnace body is provided with a cavity, the upper part of the furnace body is provided with an opening communicated with the cavity, a flange body is sleeved at the opening, the furnace cover is arranged above the opening and configured to open and close the opening, the crystal growth furnace comprises a sealing ring and a second sealing ring, the 0 sealing ring and the second sealing ring are sequentially arranged on the flange body along the radial direction of the opening, the 1 sealing ring and the second sealing ring are arranged at intervals, when the furnace cover closes the opening, a sealing cavity is defined among the sealing ring, the second sealing ring, the furnace cover and the flange body, the flange body is provided with a vacuum gas circuit, the end of the vacuum gas circuit is communicated with a vacuum source, another end forms a gas extraction opening, and the port is communicated with the sealing cavity.
Optionally, the crystal growth furnace comprises a vacuum pump as the th vacuum source, and the vacuum pump is configured to be capable of vacuumizing the chamber of the furnace body so that the chamber has a th air pressure.
Optionally, the th vacuum circuit is configured to enable the vacuum pump to evacuate the sealed cavity through the th vacuum circuit to enable the sealed cavity to have a second air pressure, wherein the second air pressure is smaller than the ambient air pressure.
Optionally, the second air pressure is the same as the th air pressure.
Optionally, the th vacuum circuit includes a plurality of th branches, each th branch connects the th vacuum source with the sealed cavity, and the plurality of th branches are arranged at intervals along the circumference of the flange body.
Optionally, a groove and a second groove for respectively mounting the -th sealing ring and the second sealing ring are formed in the flange body.
Optionally, a third groove and a fourth groove corresponding to the th groove and the second groove respectively are formed in the lower end surface of the furnace cover.
Optionally, a second vacuum gas path is formed in the furnace cover, an end of the second vacuum gas path is communicated with a second vacuum source, a second air extraction opening is formed at another end, and the second air extraction opening is arranged between the third groove and the fourth groove.
Optionally, the second vacuum circuit is configured to cooperate with the th vacuum circuit to pump the air pressure of the sealed cavity to the second air pressure.
Optionally, the second vacuum gas path includes a plurality of second branches, each of the second branches communicates with the second vacuum source and the sealing cavity, and the plurality of second branches are arranged at intervals along the circumferential direction of the furnace cover.
According to the technical scheme, the opening at the upper part of the furnace body is opened or closed by the furnace cover through the driving device, when the opening is closed by the furnace cover, the furnace cover is placed on the flange body, the furnace cover and the flange body are sealed through the th sealing ring and the second sealing ring, because the chamber of the furnace body is vacuumized by the 4 th vacuum source, the air pressure 865 in the chamber is far smaller than the air pressure of the sealed cavity defined among the th sealing ring, the second sealing ring, the furnace cover and the flange body, so that a larger air pressure difference is generated on two sides of the th sealing ring, the leakage rate of the th sealing ring is higher, and the whole sealing performance of the long crystal furnace is poorer, in order to solve the problem of the , the 4 th vacuum gas circuit is arranged on the flange body, the end of the th vacuum gas circuit is communicated with the th vacuum source, the th port formed by the other end is communicated with the sealed cavity, and the th vacuum source is also communicated with the sealed by the second sealing ring 8236 through the second vacuum circuit when the chamber is vacuumized, so that the whole sealing performance of the long crystal furnace is greatly reduced, and the leakage rate of the sealed 8536 is reduced as possible.
Drawings
FIG. 1 is a schematic structural diagram of embodiments of the crystal growth furnace of the present invention.
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, not limitation.
As shown in FIG. 1, the crystal growth furnace of the invention comprises a furnace body 10 and a furnace cover 20, wherein the furnace body 10 is provided with a chamber 11, the upper part of the furnace body 10 is provided with an opening communicated with the chamber 11, a flange body 12 is sleeved at the opening, the furnace cover 20 is arranged above the opening and is configured to open and close the opening, the crystal growth furnace comprises a sealing ring 30 and a second sealing ring 40, a sealing ring 30 and the second sealing ring 40 are sequentially arranged on the flange body 12 along the radial direction of the opening, a 0 sealing ring 30 and the second sealing ring 40 are arranged at intervals, when the furnace cover 20 closes the opening, a sealing cavity is defined among the sealing ring 30, the second sealing ring 40, the furnace cover 20 and the flange body 12, the flange body 12 is provided with a vacuum gas path 121, the end of the vacuum gas path 121 is communicated with a vacuum source 50, a end forms a air extraction opening 122, and the extraction opening 122 is communicated with.
In the invention, the furnace cover 20 opens or closes the opening at the upper part of the furnace body 10 through the driving device, when the furnace cover 20 closes the opening, the furnace cover 20 is placed on the flange body 12, the furnace cover 20 and the flange body 12 are sealed through the second sealing ring 30 and the second sealing ring 40, because the chamber 11 of the furnace body 10 is vacuumized by the second vacuum source 50, the air pressure in the chamber 11 is far smaller than the air pressure of the sealed cavity defined among the st sealing ring 30, the second sealing ring 40, the furnace cover 20 and the flange body 12, so that a larger air pressure difference is generated at two sides of the st sealing ring 30 865, the leakage rate of the st sealing ring 30 is higher, and the sealing performance of the whole crystal growing furnace is poorer, in order to solve the problem of , the invention opens the st vacuum air passage 121 on the flange body 12, the extraction end of the nd vacuum air passage is communicated with the 3 rd vacuum source 50, the port 122 formed on the other is communicated with the sealed cavity 637 th vacuum source, and the extraction port 6345 is communicated with the sealed cavity 73745 when the vacuum source 50 is used for reducing the pressure of the chamber 121, so that the second vacuum extraction ratio of the whole crystal growing furnace is greatly reduced, and the sealing performance of the second vacuum chamber 121 is ensured, and the second vacuum seal is greatly reduced, thereby the.
It should be understood that the th vacuum source 50 can take many forms, and in embodiments of the present invention, the th vacuum source 50 is optionally a vacuum pump configured to evacuate the chamber 11 of the furnace 10 to provide a th gas pressure to the chamber 11.
Since the chamber 11 of the furnace body 10 and the sealed cavity between the th sealing ring 30 and the second sealing ring 40 are both evacuated by the th vacuum source 50, the th vacuum source 50 can generate different suction forces on the chamber 11 and the sealed cavity by arranging the th vacuum path 121, in embodiments of the present invention, optionally, the th vacuum path 121 is configured as a vacuum pump to evacuate the sealed cavity through the th vacuum path 121 so that the sealed cavity has a second air pressure, wherein the second air pressure is less than the external air pressure.
To minimize the leakage rate of the ring 30, it is desirable to ensure that the pressures on the inner and outer sides of the ring 30 are equal, and therefore, the vacuum source 50 is required to make the second pressure in the seal chamber as much as possible equal to the pressure in the chamber 11, although the second pressure may be slightly greater than the pressure, in which case the second pressure is at least equal to the pressure and should be less than the ambient pressure outside the second ring 40.
According to the invention, the th vacuum gas path 121 is formed in the flange body 12, so that the leakage rate of the th sealing ring 30 can be reduced, when the th vacuum gas source 50 works, the gas pressure between the th sealing ring 30 and the second sealing ring 40 is rapidly reduced, and the furnace cover 20 can be adsorbed on the flange body 12 under the action of the external gas pressure, so that the self-locking effect of the furnace cover 20 and the furnace body 10 is realized.
Because the sealing cavity is an annular sealing cavity, in order to ensure that the air pressure at each position of the sealing cavity is uniform, optionally, the th vacuum air path 121 includes a plurality of th branches, each 0 th branch is communicated with the 1 th vacuum source 50 and the sealing cavity, and the plurality of 2 th branches are arranged at intervals along the circumferential direction of the flange body 12, that is, a plurality of th air suction ports are opened at intervals between the th sealing ring 30 and the second sealing ring 40 on the flange body 12, and each th air suction port is communicated with the th vacuum source 50 through th th branches, so that the sealing cavity is simultaneously vacuumized by the plurality of th branches, the air pressure at each position of the sealing cavity is ensured to be uniform, and the service life of the th sealing ring 30 is prolonged.
In order to facilitate the installation of the th and second sealing rings 30 and 40 and ensure the stability of the installation of the th and second sealing rings 30 and 40, the flange body 12 is optionally provided with a th groove 123 and a second groove 124 for installing the th and second sealing rings 30 and 40, respectively.
After the furnace cover 20 closes the opening of the furnace body 10, in order to further increase the sealing performance of the whole crystal growth furnace and prevent the displacement of the sealing ring 30 and the second sealing ring 40, optionally, the lower end surface of the furnace cover 20 is provided with a third groove 21 and a fourth groove 22 corresponding to the groove 123 and the second groove 124, respectively, in other words, the sealing ring 30 limits the upper part and the lower part of the sealing ring through the groove 123 and the third groove 21, respectively, thereby ensuring the mounting stability of the sealing ring 30, and similarly, the second sealing ring 40 limits the upper part and the lower part of the second sealing ring 40 through the second groove 124 and the fourth groove 22, respectively, thereby ensuring the mounting stability of the second sealing ring 40.
In order to more efficiently pump the air pressure of the sealed cavity to a second air pressure substantially equal to the th air pressure of the chamber 11, optionally, the furnace cover 20 is provided with a second vacuum air path 23, an end of the second vacuum air path 23 is communicated with a second vacuum source, another end forms a second air pumping port 24, and the second air pumping port 24 is disposed between the third groove 21 and the fourth groove 22, that is, the second vacuum source can cooperate with the th vacuum source 50 through the second vacuum air path 23 to quickly pump the air pressure of the sealed cavity to the second air pressure.
In order to ensure that the air pressure at each position of the seal cavity is uniform, optionally, the second vacuum air path 23 comprises a plurality of second branches, each second branch is communicated with the second vacuum source and the seal cavity, the plurality of second branches are arranged along the circumferential direction of the furnace cover 20 at intervals, that is, a plurality of second air pumping ports are arranged at the intervals between the third groove 21 and the fourth groove 22, each second air pumping port is communicated with the second vacuum air source through second branches, so that the seal cavity is simultaneously vacuumized by the plurality of second branches, the air pressure at each position of the seal cavity is ensured to be uniform, and the service life of the seal ring 30 is prolonged.
The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings, but the present invention is not limited thereto. Within the scope of the technical idea of the invention, many simple modifications may be made to the technical solution of the invention, and in order to avoid unnecessary repetition, various possible combinations of the invention will not be described further. Such simple modifications and combinations should be considered within the scope of the present disclosure as well.
Claims (10)
- The crystal growth furnace is characterized by comprising a furnace body (10) and a furnace cover (20), wherein the furnace body (10) is provided with a cavity (11), the upper part of the furnace body (10) is provided with an opening communicated with the cavity (11), a flange body (12) is sleeved at the opening, and the furnace cover (20) is arranged above the opening and is configured to open and close the opening;the crystal growth furnace comprises a th sealing ring (30) and a second sealing ring (40), the th sealing ring (30) and the second sealing ring (40) are sequentially arranged on the flange body (12) along the radial direction of the opening outwards, the th sealing ring (30) and the second sealing ring (40) are arranged at intervals, and when the furnace cover (20) closes the opening, a sealing cavity is defined among the th sealing ring (30), the second sealing ring (40), the furnace cover (20) and the flange body (12);the flange body (12) is provided with an th vacuum air path (121), the end of the th vacuum air path (121) is communicated with a th vacuum source (50), the end forms a th air suction port (122), and the th air suction port (122) is communicated with the sealed cavity.
- 2. The crystal growth furnace according to claim 1, characterized in that the crystal growth furnace comprises a vacuum pump as the th vacuum source (50), the vacuum pump being configured to be able to evacuate the chamber (11) of the furnace body (10) to make the chamber (11) have a th gas pressure.
- 3. The crystal growth furnace of claim 2, wherein the th vacuum gas path (121) is configured such that the vacuum pump evacuates the sealed cavity through the th vacuum gas path (121) to have a second gas pressure, wherein the second gas pressure is less than the ambient gas pressure.
- 4. The crystal growth furnace of claim 3, wherein the second gas pressure is the same as the th gas pressure.
- 5. The crystal growth furnace of claim 3, wherein the th vacuum path (121) comprises a plurality of th branches, each th branch connects the th vacuum source (50) and the sealed cavity, and the plurality of th branches are arranged at intervals along the circumference of the flange body (12).
- 6. The crystal growth furnace according to claim 3, wherein the flange body (12) is provided with a groove (123) and a second groove (124) for respectively mounting the -th seal ring (30) and the second seal ring (40).
- 7. The crystal growth furnace according to claim 6, wherein the lower end surface of the furnace cover (20) is provided with a third groove (21) and a fourth groove (22) corresponding to the th groove (123) and the second groove (124), respectively.
- 8. The crystal growth furnace according to claim 7, wherein the furnace cover (20) is provided with a second vacuum gas path (23), an end of the second vacuum gas path (23) is communicated with a second vacuum source, another end forms a second pumping port (24), and the second pumping port (24) is arranged between the third groove (21) and the fourth groove (22).
- 9. The crystal growth furnace according to claim 8, wherein the second vacuum circuit (23) is configured to cooperate with the th vacuum circuit (121) to pump the air pressure of the sealed cavity to the second air pressure.
- 10. The crystal growth furnace according to claim 8, wherein the second vacuum gas path (23) comprises a plurality of second branches, each second branch is communicated with the second vacuum source and the sealed cavity, and the plurality of second branches are arranged at intervals along the circumferential direction of the furnace cover (20).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911046376.5A CN110735185A (en) | 2019-10-30 | 2019-10-30 | Crystal growth furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911046376.5A CN110735185A (en) | 2019-10-30 | 2019-10-30 | Crystal growth furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110735185A true CN110735185A (en) | 2020-01-31 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911046376.5A Pending CN110735185A (en) | 2019-10-30 | 2019-10-30 | Crystal growth furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110735185A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113161264A (en) * | 2021-04-13 | 2021-07-23 | 上海广川科技有限公司 | Sealing air pumping and discharging system and method for wafer transmission |
| CN113532122A (en) * | 2021-08-03 | 2021-10-22 | 洛阳万基铝加工有限公司 | Sealing furnace cover for aluminum ingot smelting furnace |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101196453A (en) * | 2008-01-02 | 2008-06-11 | 电子科技大学 | Moisture permeable cup with double sealing ring gas isolation sealing structure and its using method |
| CN104280200A (en) * | 2014-09-28 | 2015-01-14 | 深圳市华星光电技术有限公司 | Method for detecting sealing performance of vacuum cavity |
| CN107966022A (en) * | 2017-12-21 | 2018-04-27 | 宁夏昇力恒真空设备有限公司 | Flange seal attachment device and ultrahigh vacuum sintering furnace |
-
2019
- 2019-10-30 CN CN201911046376.5A patent/CN110735185A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101196453A (en) * | 2008-01-02 | 2008-06-11 | 电子科技大学 | Moisture permeable cup with double sealing ring gas isolation sealing structure and its using method |
| CN104280200A (en) * | 2014-09-28 | 2015-01-14 | 深圳市华星光电技术有限公司 | Method for detecting sealing performance of vacuum cavity |
| CN107966022A (en) * | 2017-12-21 | 2018-04-27 | 宁夏昇力恒真空设备有限公司 | Flange seal attachment device and ultrahigh vacuum sintering furnace |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113161264A (en) * | 2021-04-13 | 2021-07-23 | 上海广川科技有限公司 | Sealing air pumping and discharging system and method for wafer transmission |
| CN113532122A (en) * | 2021-08-03 | 2021-10-22 | 洛阳万基铝加工有限公司 | Sealing furnace cover for aluminum ingot smelting furnace |
| CN113532122B (en) * | 2021-08-03 | 2023-10-20 | 洛阳万基铝加工有限公司 | Sealing furnace cover for aluminum ingot smelting furnace |
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Legal Events
| Date | Code | Title | Description |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20200720 Address after: 1205, floor 12, building 3, No. 11, Changchun Bridge Road, Haidian District, Beijing 100089 Applicant after: GUOHONG HUAYE INVESTMENT Co.,Ltd. Address before: 100081 building 4, floor 8, No. 9, Haidian District meteorological Road, Beijing City, 418 Applicant before: CISRI ENERGY SAVING TECHNOLOGY Co.,Ltd. |
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| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20210112 Address after: 100089 1204, 12 / F, building 3, 11 Changchun Bridge Road, Haidian District, Beijing Applicant after: Guohong Zhongyu Technology Development Co.,Ltd. Address before: 1205, 12 / F, building 3, No. 11, Changchun Bridge Road, Haidian District, Beijing 100089 Applicant before: GUOHONG HUAYE INVESTMENT Co.,Ltd. |
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| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20221019 Address after: 102502 Room 301, Building 1, No. 14, Liushui Industrial Zone, Yanshan District, Beijing Applicant after: Beijing Huikun New Materials Co.,Ltd. Address before: 100089 1204, 12 / F, building 3, 11 Changchun Bridge Road, Haidian District, Beijing Applicant before: Guohong Zhongyu Technology Development Co.,Ltd. |
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| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200131 |