CN110709355A - 基板清洗装置及清洗基板的方法 - Google Patents
基板清洗装置及清洗基板的方法 Download PDFInfo
- Publication number
- CN110709355A CN110709355A CN201780091762.9A CN201780091762A CN110709355A CN 110709355 A CN110709355 A CN 110709355A CN 201780091762 A CN201780091762 A CN 201780091762A CN 110709355 A CN110709355 A CN 110709355A
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- water
- sterilization
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- cleaning
- recovery tank
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- 238000004140 cleaning Methods 0.000 title claims abstract description 159
- 239000000758 substrate Substances 0.000 title claims abstract description 86
- 238000000034 method Methods 0.000 title claims description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 231
- 230000001954 sterilising effect Effects 0.000 claims abstract description 210
- 238000004659 sterilization and disinfection Methods 0.000 claims abstract description 161
- 238000011084 recovery Methods 0.000 claims abstract description 97
- 238000001514 detection method Methods 0.000 claims description 80
- 241000894006 Bacteria Species 0.000 claims description 34
- 238000003860 storage Methods 0.000 claims description 32
- 238000004064 recycling Methods 0.000 claims description 29
- 230000003287 optical effect Effects 0.000 claims description 18
- 230000001580 bacterial effect Effects 0.000 claims description 9
- 238000007405 data analysis Methods 0.000 claims description 4
- 239000012780 transparent material Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 description 15
- 230000000694 effects Effects 0.000 description 11
- 239000000047 product Substances 0.000 description 6
- 238000011109 contamination Methods 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 4
- 238000004134 energy conservation Methods 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000001917 fluorescence detection Methods 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011895 specific detection Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
Landscapes
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physical Water Treatments (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
一种基板清洗装置，该基板清洗装置包括：清洗单元(100)，清洗单元(100)包括清洗槽(110)以及回收槽(120)，回收槽(120)被设置为能够回收清洗槽(110)中的水，并二次供给至清洗槽(110)中；以及杀菌单元(200)，杀菌单元(200)用于对回收槽(120)中的水进行杀菌。
Description
PCT国内申请，说明书已公开。
Claims (17)
- PCT国内申请，权利要求书已公开。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2017/111933 WO2019095383A1 (zh) | 2017-11-20 | 2017-11-20 | 基板清洗装置及清洗基板的方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110709355A true CN110709355A (zh) | 2020-01-17 |
Family
ID=66539238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780091762.9A Pending CN110709355A (zh) | 2017-11-20 | 2017-11-20 | 基板清洗装置及清洗基板的方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN110709355A (zh) |
| WO (1) | WO2019095383A1 (zh) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1127569A (zh) * | 1993-07-16 | 1996-07-24 | 莱格西系统公司 | 在液体中处理半导体片的方法和装置 |
| JP2001009392A (ja) * | 1999-06-29 | 2001-01-16 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置および基板洗浄方法 |
| CN102745845A (zh) * | 2011-04-18 | 2012-10-24 | 友达光电(上海)有限公司 | 用于液晶面板制作工艺的水循环回收系统 |
| CN202729846U (zh) * | 2012-06-12 | 2013-02-13 | 北京京东方光电科技有限公司 | 一种微生物去除装置和基板清洗设备 |
| CN103964541A (zh) * | 2014-05-08 | 2014-08-06 | 李宝华 | 一种紫外线自动消毒装置 |
| CN203875055U (zh) * | 2014-05-23 | 2014-10-15 | 北京京东方显示技术有限公司 | 一种回水管路及清洗设备 |
| KR20160118494A (ko) * | 2015-04-02 | 2016-10-12 | 대한민국(농촌진흥청장) | 순환형 정수 시스템 및 방법 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5802483B2 (ja) * | 2011-08-25 | 2015-10-28 | 株式会社キッツ | メッキ処理工程の水処理装置とメッキ処理工程の水処理方法 |
| CN103567181A (zh) * | 2012-08-08 | 2014-02-12 | 华仕德科技股份有限公司 | 洗净装置及其系统 |
| CN206064912U (zh) * | 2016-08-31 | 2017-04-05 | 苏州京浜光电科技股份有限公司 | 一种玻璃基板清洗装置 |
-
2017
- 2017-11-20 WO PCT/CN2017/111933 patent/WO2019095383A1/zh active Application Filing
- 2017-11-20 CN CN201780091762.9A patent/CN110709355A/zh active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1127569A (zh) * | 1993-07-16 | 1996-07-24 | 莱格西系统公司 | 在液体中处理半导体片的方法和装置 |
| JP2001009392A (ja) * | 1999-06-29 | 2001-01-16 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置および基板洗浄方法 |
| CN102745845A (zh) * | 2011-04-18 | 2012-10-24 | 友达光电(上海)有限公司 | 用于液晶面板制作工艺的水循环回收系统 |
| CN202729846U (zh) * | 2012-06-12 | 2013-02-13 | 北京京东方光电科技有限公司 | 一种微生物去除装置和基板清洗设备 |
| CN103964541A (zh) * | 2014-05-08 | 2014-08-06 | 李宝华 | 一种紫外线自动消毒装置 |
| CN203875055U (zh) * | 2014-05-23 | 2014-10-15 | 北京京东方显示技术有限公司 | 一种回水管路及清洗设备 |
| KR20160118494A (ko) * | 2015-04-02 | 2016-10-12 | 대한민국(농촌진흥청장) | 순환형 정수 시스템 및 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019095383A1 (zh) | 2019-05-23 |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20200117 |
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| WD01 | Invention patent application deemed withdrawn after publication |