CN110687074A - Wavefront sensor-based optical part uniformity detection device and method - Google Patents
Wavefront sensor-based optical part uniformity detection device and method Download PDFInfo
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Abstract
The invention belongs to the technical field of optical workpiece uniformity detection, and particularly discloses a device and a method for detecting the uniformity of an optical workpiece based on a wavefront sensor, wherein the device comprises a laser, a beam expander, a polaroid, a transparent groove, an imaging lens group and the wavefront sensor which are coaxially arranged in sequence, and a refractive index matching solution with the same refractive index as that of a material of the optical workpiece to be detected is filled in the transparent groove; during detection, laser emitted by the laser is expanded by the beam expander and then becomes polarized light through the polaroid, the polarized light sequentially passes through the front wall of the transparent groove, the refractive index matching solution and the rear wall of the transparent groove and then is imaged by the imaging lens group, the formed image is obtained by the wavefront sensor to obtain the wavefront difference at the moment, and then the refractive index uniformity condition of the workpiece is obtained through the wavefront difference with or without the workpiece. The method and the device effectively reduce the influence of the geometric shape of the workpiece on the detection of the refractive index, and provide a high-efficiency, strong-applicability and high-precision method and device for detecting the uniformity of the refractive index of the optical workpiece with the surface shape.
Description
Technical Field
The invention belongs to the technical field of uniformity detection of optical workpieces, and particularly relates to a device and a method for detecting uniformity of an optical workpiece based on a wavefront sensor.
Background
The optical part refers to a transparent element part of an optical system, and with the increasingly wide application requirements of the optical system in the fields of national defense, military, scientific research and civil use, such as high-end telescopes, mobile phone lenses, LED lighting parts and the like, the optical part is manufactured with high precision, high efficiency and low cost by the improvement of the design of the optical system, optical materials, a forming process and a detection technology. The optical field includes imaging and non-imaging designs, and free-form surface parts are increasingly used with their excellent optical properties.
The traditional optical parts are manufactured by glass grinding, and the quality of a glass blank influences the uniformity of the refractive index of the final part; at present, plastics are also commonly used for manufacturing optical parts, the plastics have the advantages of light weight, excellent mechanical property and easy large-scale manufacturing and have wide application prospect, the forming process comprises but is not limited to injection forming, hot press forming, rapid forming and machining forming technologies, and the complex temperature field shear field in the forming process causes orientation, uneven shrinkage and warping of a high molecular chain to cause uneven refractive index of the parts, thereby causing optical distortion, primary aberration and other optical property deterioration. The uniformity evaluation of the optical parts is carried out, guidance is provided for the production of the optical parts, and the optimization of the production process of the optical parts is of great significance.
The existing refractive index uniformity detection method comprises the following steps: and testing the uniformity of the flat blank material by adopting a plate placing method, and testing the uniformity of the optical workpiece by adopting a refractive index matching fluid and an interferometer. For example, patent CN201510404630 provides a device and a method for detecting uniformity of refractive index of a large-caliber uniaxial crystal, which realize uniformity detection of the crystal by combining a shack-hartmann wavefront sensor with an optical path design, but the device and the method are only suitable for detecting a parallel flat plate blank, and when a workpiece with a surface shape is detected, the surface shape has large interference factors on the wavefront, and the optical workpiece with the surface shape cannot be detected; patent CN201510962193 provides a method for detecting the uniformity of spherical lens material, which is used to test the uniformity of spherical lens material by combining refractive index matching liquid with interferometer, but the method has high requirement on interferometer.
Disclosure of Invention
Aiming at the defects or improvement requirements in the prior art, the invention provides a wavefront sensor-based optical workpiece uniformity detection device and method, and aims to realize refractive index uniformity detection of an optical workpiece by combining a wavefront detection technology, a refractive index matching solution and a high-precision parallel container, effectively reduce the influence of the geometric shape of the workpiece on refractive index detection, and provide a high-efficiency, high-applicability and high-precision method and device for detecting the refractive index uniformity of the optical workpiece with a surface shape.
In order to achieve the above object, according to an aspect of the present invention, an optical device uniformity detection apparatus based on a wavefront sensor is provided, including a laser, a beam expander, a polarizer, a transparent groove, an imaging lens group and a wavefront sensor, which are coaxially disposed in sequence, wherein a refractive index matching solution having the same refractive index as that of an optical device material to be detected is filled in the transparent groove;
during detection, after laser emitted by the laser is expanded by the beam expander, the laser becomes polarized light through the polaroid, the polarized light passes through the transparent groove filled with the refractive index matching solution and then is imaged by the imaging lens group, and the formed image is acquired by the wavefront sensor.
More preferably, the refractive index matching solution is prepared from kerosene, ethanol and bromonaphthalene.
More preferably, the laser is a helium-neon laser.
More preferably, the transparent groove is a quartz groove.
Further preferably, the wall surface of the transparent groove is subjected to polishing treatment.
Preferably, the wavefront sensor is further connected with a data acquisition and processing unit.
According to another aspect of the present invention, a method for detecting uniformity of an optical device based on a wavefront sensor is provided, which is implemented by using the above detection apparatus, and specifically includes the following steps:
s1, after the laser emitted by the laser is expanded by the beam expander, the laser becomes polarized light through the polaroid, the polarized light passes through the transparent groove filled with the refractive index matching solution and is imaged by the imaging lens group, the formed image is obtained by the wavefront sensor, and the wavefront difference L of the light path at the moment is obtained from the imageO(x,y)；
S2, immersing the optical component to be measured in the refractive index matching solution, expanding the laser emitted by the laser through the beam expander, converting the laser into polarized light through the polaroid, imaging the polarized light by the imaging lens group after the polarized light passes through the transparent groove filled with the refractive index matching solution and the optical component to be measured, acquiring the formed image by the wavefront sensor, and further acquiring the wavefront difference L of the light path at the moment through the imaget(x,y)；
S3 calculating wave front difference DeltaL (x, y) ═ L caused by the optical piece to be measured from wave front difference before and after immersing the optical piece to be measuredt(x,y)-LO(x, y), further obtaining the refractive index distribution in the thickness direction of the optical product to be detected by the wavefront difference delta L (x, y) caused by the optical product to be detected, and obtaining the uniformity condition of the optical product to be detected according to the refractive index distribution.
More preferably, the detection temperature is preferably 15 to 25 ℃, and still more preferably 20 ℃.
Generally, compared with the prior art, the above technical solution conceived by the present invention mainly has the following technical advantages:
1. the invention combines a wavefront detection technology, a refractive index matching solution and a high-precision parallel container to realize the refractive index uniformity detection of an optical workpiece, avoids the light path wavefront difference caused by the surface shape of the workpiece by immersing the optical workpiece into the solution matched with the initial refractive index of the workpiece material, detects the light wavefront difference caused by non-uniform refractive index by a wavefront method, and calculates the two-dimensional plane refractive index uniformity difference of the workpiece by the presence or absence of the wavefront difference of the workpiece.
2. The detection method and the device have strong applicability, the applicable optical workpiece materials can be polymers such as PC, PMMA, PS, BK7 and the like and glass, the workpiece forming process can be injection forming, hot press forming, rapid forming, machining forming and the like, and the workpiece surface shape can be a plane, a spherical surface, an aspheric surface, a free-form surface lens, a special-shaped transparent part and the like.
3. According to the invention, through the two-dimensional plane result of the optical workpieces detected by the wavefront sensor, the refractive index uniformity extreme value and standard deviation of single and batch optical workpieces can be effectively evaluated, and a reliable basis is provided for the process optimization of the optical workpieces.
Drawings
Fig. 1 is a schematic diagram of uniformity detection of an optical device based on a wavefront sensor according to an embodiment of the present invention.
The same reference numbers will be used throughout the drawings to refer to the same or like elements or structures, wherein: the method comprises the following steps of 1-a laser, 2-a beam expander, 3-a polaroid, 4-a refractive index matching solution, 5-an optical part to be detected, 6-a transparent groove, 7-an imaging lens group, 8-a wavefront sensor, A1-a laser light path, A2-a standard wavefront and A3-a distorted wavefront.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
The optical workpiece uniformity detection device based on the wavefront sensor, as shown in fig. 1, comprises a laser 1, a beam expander 2, a polarizer 3, a transparent groove 6, an imaging lens group 7 and a wavefront sensor 8 which are coaxially arranged in sequence and fixed with a support through a base station, wherein a refractive index matching solution 4 with the same refractive index as the raw material of the optical workpiece to be detected is filled in the transparent groove 6; the wavefront sensor 8 is used for acquiring wavefront data, and is also connected with a corresponding data acquisition and processing unit, and the data acquisition and processing unit processes the wavefront data to obtain refractive index uniformity data through calculation.
Specifically, the refractive index matching solution 4 is prepared by mixing a low refractive index solution with strong intermiscibility and a high refractive index solution, wherein the low refractive index and the high refractive index are relative to the refractive index of the raw material of the optical part to be detected, and the refractive index matching solution is preferably prepared from kerosene, ethanol and bromonaphthalene.
Preferably, the laser 1 is a helium-neon laser and the wavefront sensor includes, but is not limited to, a Shack-Hartmann wavefront sensor; the transparent groove 6 is a quartz groove, and the front wall and the rear wall of the transparent groove are polished to improve the parallelism.
The detection device for detecting the uniformity of the optical part specifically comprises the following steps:
s1, selecting the models of the beam expander 2, the polaroid 3 and the imaging lens group 7 according to the optical component 5 to be measured, and adjusting the distance between the models to make the wavefront of the optical path zero; testing the refractive index n of the raw material of the optical part 5 to be tested at the temperature T by using a high-precision Abbe refractometer0Test accuracy 10-5In order of magnitude, the refractive index matching solution 4 is configured to have a refractive index n0And is injected into the transparent groove 6, and then the transparent groove 6 is installed between the polarizer 3 and the imaging lens group 7;
s2, at the temperature T, the laser 1 is turned on, the laser emitted by the laser is expanded by the beam expander 2 and then becomes polarized light through the polaroid 3, the polarized light passes through the front wall of the transparent groove 6, the refractive index matching solution 4 and the rear wall of the transparent groove 6 in sequence and then is imaged by the imaging lens group 7, the formed image is acquired by the wavefront sensor 8, and the wavefront difference L of the light path at the time is obtained from the imageO(x, y) including wavefront differences caused by the respective optical devices and wavefront differences caused by the transparent groove 6 and the refractive index matching solution 4;
s3, immersing the optical piece 5 to be measured into the refractive index matching solution 4, and fixing by adopting a tool; what is needed isAfter being expanded by the beam expander 2, the laser emitted by the laser 1 becomes polarized light through the polaroid 3, the polarized light sequentially passes through the front wall of the transparent groove 6, the refractive index matching solution 4, the optical part 5 to be detected, the refractive index matching solution 4 and the rear wall of the transparent groove 6, then is imaged by the imaging lens group 7, a formed image is obtained by the wavefront sensor 8, and further the wavefront difference L of the light path at the moment is obtained through the imaget(x, y); stirring the solution, and obtaining the average value of the wave front difference by collecting the result for multiple timesSo as to improve the detection precision;
specifically, as shown in fig. 1, the laser optical path a1 is parallel light emitted by the laser 1, when the refractive index of a device passing through the laser optical path a1 is uniform, the direction of the laser optical path a1 is not changed, and the wavefront is parallel, that is, the laser optical path a is a standard wavefront a2, when the refractive index of the device passing through the laser optical path a is not uniform, because the refractive indexes at different positions have deviations, a wavefront difference occurs after the parallel light enters, that is, a distorted wavefront A3; however, when the parallel light directly passes through the optical member having a surface shape, the wavefront difference is affected by the surface shape and the refractive index deviation at the same time, and after the optical member is immersed in the refractive index matching solution 4, the optical member and the refractive index matching solution 4 can be regarded as a whole with approximate refractive index, so that only the refractive index deviation is caused to cause the optical path difference, thereby excluding the influence of the surface shape of the optical member;
s4 wavefront difference caused by the optical part 5 to be measured is calculated from the wavefront difference before and after the optical part 5 to be measured is immersed
Further, the refractive index distribution Δ n (x, y) in the thickness direction of the optical article 5 to be measured is calculated from the wavefront difference Δ L (x, y) caused by the optical article 5 to be measured by the following formula:
ΔL(x,y)＝Δn(x,y)·d(x,y)
wherein d (x, y) is a thickness distribution function of the optical path direction of the optical part 5 to be measured;
specifically, a spatial rectangular coordinate system is established by taking the light path direction as the z-axis direction, a points are taken on the x-axis, b points are taken on the y-axis, and the points are connected into a netA grid, for any point (i, j) on the grid, whose coordinates are (x)i,yj) The refractive index at this point is Δ n (x)i,yj) The refractive index distribution Δ n (x, y) is a refractive index distribution function of all points on the grid;
s5, according to the refractive index distribution delta n (x, y), evaluating the uniformity of the optical product 5 to be tested, and the evaluation parameters comprise the refractive index deviation pole difference delta n of the plane direction of the productPVSAnd standard deviation Δ nSTDSRefractive index deviation pole difference DeltanPVSAnd standard deviation Δ nSTDSThe smaller the optical article, the better the uniformity of the optical article, specifically calculated by the following formula:
ΔnPVS＝Δn(x，y)max-Δn(x，y)min
the refractive index deviation pole difference delta n of the workpieces in the same batch can be further calculatedPVBAnd standard deviation Δ nSTDBTo evaluate the uniformity of a batch of optical articles, the refractive index deviation is extremely different by anPVBAnd standard deviation Δ nSTDBThe smaller the batch, the better the uniformity of the batch, specifically calculated by the following formula:
ΔnPVB＝ΔnPVSmax-ΔnPVSmin
wherein K is the number of the batch of optical products, and Δ n is the average value of the refractive index of each optical product.
Preferably, the detection temperature T is 15 to 25 ℃, and more preferably 20 ℃.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (8)
1. The device for detecting the uniformity of the optical workpiece based on the wavefront sensor is characterized by comprising a laser (1), a beam expander (2), a polaroid (3), a transparent groove (6), an imaging lens group (7) and the wavefront sensor (8) which are coaxially arranged in sequence, wherein a refractive index matching solution (4) with the same refractive index as that of the material of the optical workpiece to be detected is filled in the transparent groove (6);
during detection, after laser emitted by the laser (1) is expanded by the beam expander (2), the laser becomes polarized light through the polaroid (3), the polarized light passes through the transparent groove (6) filled with the refractive index matching solution (4) and then is imaged by the imaging lens group (7), and a formed image is acquired by the wavefront sensor (8).
2. The wavefront sensor based optical article uniformity detection device of claim 1 where the index matching solution (4) is configured from kerosene, ethanol and bromonaphthalene.
3. The wavefront sensor based optical article uniformity inspection device of claim 1 wherein said laser (1) is a helium-neon laser.
4. The wavefront sensor based optical article uniformity inspection device of claim 1 wherein the transparent groove (6) is a quartz groove.
5. The wavefront sensor based optical article uniformity inspection device as claimed in claim 1, wherein the wall surface of the transparent groove (6) is polished.
6. The wavefront sensor based optical article uniformity inspection device according to any of claims 1-5, wherein a data acquisition and processing unit is further connected to said wavefront sensor (8).
7. A method for detecting uniformity of an optical component based on a wavefront sensor, which is implemented by using the detection device as claimed in any one of claims 1 to 6, and comprises the following steps:
s1, after the laser emitted by the laser (1) is expanded by the beam expander (2), the laser becomes polarized light through the polaroid (3), the polarized light passes through the transparent groove (6) filled with the refractive index matching solution (4) and then is imaged by the imaging lens group (7), the formed image is acquired by the wavefront sensor (8), and the wavefront difference L of the light path at the moment is obtained through the imageO(x,y)；
S2, immersing an optical part (5) to be detected into a refractive index matching solution (4), after laser emitted by a laser (1) is expanded by a beam expander (2), the laser becomes polarized light through a polaroid (3), the polarized light passes through a transparent groove (6) filled with the refractive index matching solution (4) and the optical part (5) to be detected and is imaged by an imaging lens group (7), a formed image is obtained by a wavefront sensor (8), and then the image is used for obtaining a wavefront difference L of a light path at the momentt(x,y)；
S3 wave front difference DeltaL (x, y) ═ L caused by the optical piece (5) to be measured is calculated from the wave front difference before and after the optical piece (5) to be measured is immersedt(x,y)-LO(x, y), and further obtaining the refractive index distribution of the optical workpiece (5) to be measured in the thickness direction by the wavefront difference delta L (x, y) caused by the optical workpiece (5) to be measured, and obtaining the uniformity condition of the optical workpiece (5) to be measured according to the refractive index distribution.
8. The method for inspecting the uniformity of an optical article based on a wavefront sensor as in claim 7 wherein the inspection temperature is preferably 15 ℃ to 25 ℃, more preferably 20 ℃.
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Cited By (2)
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| CN113203686A (en) * | 2021-04-16 | 2021-08-03 | 中国科学院上海光学精密机械研究所 | Polarization characteristic detection device and detection method for non-planar transparent element |
| CN114739627A (en) * | 2022-03-16 | 2022-07-12 | 中国农业大学 | Optical matching calibration method and device for internal flow field of complex structure |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113203686A (en) * | 2021-04-16 | 2021-08-03 | 中国科学院上海光学精密机械研究所 | Polarization characteristic detection device and detection method for non-planar transparent element |
| CN113203686B (en) * | 2021-04-16 | 2023-02-14 | 中国科学院上海光学精密机械研究所 | Polarization characteristic detection device and detection method for non-planar transparent element |
| CN114739627A (en) * | 2022-03-16 | 2022-07-12 | 中国农业大学 | Optical matching calibration method and device for internal flow field of complex structure |
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