CN110592559B - Display screen line protection device and method - Google Patents
Display screen line protection device and method Download PDFInfo
- Publication number
- CN110592559B CN110592559B CN201910874116.0A CN201910874116A CN110592559B CN 110592559 B CN110592559 B CN 110592559B CN 201910874116 A CN201910874116 A CN 201910874116A CN 110592559 B CN110592559 B CN 110592559B
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- Prior art keywords
- vapor deposition
- deposition device
- display screen
- coil
- connector
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- 238000000034 method Methods 0.000 title claims abstract description 8
- 230000007246 mechanism Effects 0.000 claims abstract description 86
- 238000007740 vapor deposition Methods 0.000 claims abstract description 73
- 239000002184 metal Substances 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 239000004744 fabric Substances 0.000 claims description 2
- 230000000873 masking effect Effects 0.000 claims description 2
- 238000003466 welding Methods 0.000 claims description 2
- 230000005684 electric field Effects 0.000 abstract description 13
- 239000010408 film Substances 0.000 description 11
- 210000002381 plasma Anatomy 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45578—Elongated nozzles, tubes with holes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910874116.0A CN110592559B (en) | 2019-09-17 | 2019-09-17 | Display screen line protection device and method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910874116.0A CN110592559B (en) | 2019-09-17 | 2019-09-17 | Display screen line protection device and method |
Publications (2)
Publication Number | Publication Date |
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CN110592559A CN110592559A (en) | 2019-12-20 |
CN110592559B true CN110592559B (en) | 2021-08-27 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910874116.0A Active CN110592559B (en) | 2019-09-17 | 2019-09-17 | Display screen line protection device and method |
Country Status (1)
Country | Link |
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CN (1) | CN110592559B (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4422407A (en) * | 1980-09-17 | 1983-12-27 | Compagnie Industrille Des Telecommunications Cit-Alcatel | Apparatus for chemically activated deposition in a plasma |
CN103388129A (en) * | 2013-07-31 | 2013-11-13 | 中国科学院金属研究所 | Method for depositing thin film on inner surface of long tube by virtue of plasma enhanced chemical vapor deposition (PECVD) |
CN104156131A (en) * | 2014-08-20 | 2014-11-19 | 深圳市华星光电技术有限公司 | Touch panel manufacturing method |
CN105185970A (en) * | 2015-08-13 | 2015-12-23 | 深圳市贝特瑞新能源材料股份有限公司 | Silicon-coated carbon particle composite material and preparation method and equipment and application |
CN109689567A (en) * | 2016-07-15 | 2019-04-26 | 1D材料有限责任公司 | Silicon nanowires is prepared in carbon-based powder for the manufacturing equipment and method in battery |
-
2019
- 2019-09-17 CN CN201910874116.0A patent/CN110592559B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4422407A (en) * | 1980-09-17 | 1983-12-27 | Compagnie Industrille Des Telecommunications Cit-Alcatel | Apparatus for chemically activated deposition in a plasma |
CN103388129A (en) * | 2013-07-31 | 2013-11-13 | 中国科学院金属研究所 | Method for depositing thin film on inner surface of long tube by virtue of plasma enhanced chemical vapor deposition (PECVD) |
CN104156131A (en) * | 2014-08-20 | 2014-11-19 | 深圳市华星光电技术有限公司 | Touch panel manufacturing method |
CN105185970A (en) * | 2015-08-13 | 2015-12-23 | 深圳市贝特瑞新能源材料股份有限公司 | Silicon-coated carbon particle composite material and preparation method and equipment and application |
CN109689567A (en) * | 2016-07-15 | 2019-04-26 | 1D材料有限责任公司 | Silicon nanowires is prepared in carbon-based powder for the manufacturing equipment and method in battery |
Also Published As
Publication number | Publication date |
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CN110592559A (en) | 2019-12-20 |
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Effective date of registration: 20230915 Address after: 511 Fengtian Technology Building, Xuegang North Road, Qinghu Community, Longhua Street, Longhua District, Shenzhen City, Guangdong Province, China Patentee after: Molan Technology Co.,Ltd. Address before: 235025 No.8 workshop in the incubator of Qinglongshan Industrial Park, Lieshan Economic Development Zone, Huaibei City, Anhui Province Patentee before: HUAIBEI MOLAN TECHNOLOGY Co.,Ltd. |
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Effective date of registration: 20231108 Address after: Building 3, Nanchong Airport Science and Technology Innovation Center, No. 2 Lantian Road, Airport Economic Development Zone, Qinglian Street, Gaoping District, Nanchong City, Sichuan Province, 637100 Patentee after: Nanchong Moran Technology Co.,Ltd. Address before: 511 Fengtian Technology Building, Xuegang North Road, Qinghu Community, Longhua Street, Longhua District, Shenzhen City, Guangdong Province, China Patentee before: Molan Technology Co.,Ltd. |