CN110501878A - A kind of focusing leveling device, lithographic equipment and focusing and leveling method - Google Patents

A kind of focusing leveling device, lithographic equipment and focusing and leveling method Download PDF

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Publication number
CN110501878A
CN110501878A CN201810481437.XA CN201810481437A CN110501878A CN 110501878 A CN110501878 A CN 110501878A CN 201810481437 A CN201810481437 A CN 201810481437A CN 110501878 A CN110501878 A CN 110501878A
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China
Prior art keywords
light beam
projected light
detection
unit
projected
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CN201810481437.XA
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Chinese (zh)
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CN110501878B (en
Inventor
庄亚政
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

The invention discloses a kind of focusing leveling device, lithographic equipment and focusing and leveling method, the focusing leveling devices, comprising: lighting unit, detection spectrophotometric unit, measures probe unit, with reference to probe unit and processing unit at projection spectrophotometric unit；Lighting unit generates projected light beam；It detects spectrophotometric unit and the projected light beam reflected through measured device is divided into the first projected light beam and the second projected light beam, and the first projected light beam is transmitted through measurement probe unit, and the second projected light beam of reflection, so that the second projected light beam is returned along projected-beam entrance optical path, it is incident to through measured device and projection spectrophotometric unit with reference to probe unit；The second projected light beam is received with reference to probe unit and is converted into reference to detectable signal；Measurement probe unit receives the first projected light beam and is converted into measurement detectable signal；Processing unit obtains the defocusing amount of measured device according to reference detectable signal and measurement detectable signal, eliminates the influence of fabrication error, improves the accuracy of the defocusing amount of measurement.

Description

A kind of focusing leveling device, lithographic equipment and focusing and leveling method
Technical field
The present embodiments relate to focusing and leveling technology more particularly to a kind of focusing leveling devices, lithographic equipment and focusing Leveling method.
Background technique
Projection mask aligner is the device that a kind of pattern on mask is projected to by object lens on silicon wafer face.In projection exposure In equipment, it is necessary to there is automatic focusing leveling system silicon wafer face to be accurately brought into specified exposure position.
Mainstream litho machine manufacturer is using the focusing and leveling system based on optical triangulation principle, to tested device at present The pattern on part surface is detected.However, when there are when technique figure on measured device, it will cause in single measuring beam Reflectivity is uneven, and the focusing and leveling system based on principle of triangulation, the semaphore of single measuring beam output, and characterization is The coupling of measured object defocusing amount and single beam internal reflection rate.Therefore, when single beam internal reflection rate is uneven, it will cause to focus The measurement error of levelling device cannot accurately determine the defocusing amount of measured device and focus.
Summary of the invention
The present invention provides a kind of focusing leveling device, lithographic equipment and focusing and leveling method, to realize reduction focusing and leveling Measurement error, improve measurement defocusing amount accuracy purpose.
In a first aspect, the embodiment of the invention provides a kind of focusing leveling devices, comprising: lighting unit, projection light splitting are single Member, measures probe unit, with reference to probe unit and processing unit at detection spectrophotometric unit；
Wherein, the lighting unit is for generating projected light beam；
The projection spectrophotometric unit is for projecting the projected light beam to measured device；
The detection spectrophotometric unit be used for by the projected light beam reflected through the measured device be divided into the first projected light beam and Second projected light beam, and first projected light beam is transmitted through the measurement probe unit, and reflect second projected light Beam, so that optical path of second projected light beam before the projected-beam entrance to the detection spectrophotometric unit returns, through institute It states measured device and the projection spectrophotometric unit is incident to reference to probe unit；
It is described to be used to receive second projected light beam and be converted into reference to detectable signal, the reference with reference to probe unit Detectable signal includes fabrication error information；
The measurement probe unit is for receiving first projected light beam and being converted into measurement detectable signal, the measurement Detectable signal includes the fabrication error information and defocusing amount information；
The processing unit is used to obtain the tested device with reference to detectable signal and the measurement detectable signal according to described The defocusing amount of part.
Optionally, the lighting unit includes: light source unit and projection slit component；
The directional light that the projection slit component is used to that the light source unit to be made to issue forms projected light beam.
Optionally, the projection spectrophotometric unit includes: projection spectrum groupware and beam modulation component；
The projection spectrum groupware, for projecting the projected light beam to measured device, and will be by the tested device Second projected light beam of part reflection reflexes to described with reference to probe unit；
The beam modulation component, for the projected light beam to be modulated to periodic dynamic projection light beam.
Optionally, the beam modulation component includes: scanning reflection mirror and modulation relaying microscope group.
Optionally, the detection spectrophotometric unit includes detection spectrum groupware and detection relaying microscope group component；
The detection spectrum groupware, for the projected light beam to be divided into the first projected light beam and the second projected light beam, and Transmit first projected light beam and reflection second projected light beam；
The detection relays microscope group component, for adjusting the projected light beam, so that the projected light beam vertical incidence is extremely The detection spectrum groupware.
Optionally, the detection spectrophotometric unit includes semi-transparent semi-reflecting plate glass.
Optionally, the measurement probe unit includes detection slit component and detection photoelectric detection unit；
Described with reference to probe unit includes reference slit component and with reference to photoelectric detection unit.
Optionally, the measurement probe unit further includes detection relay component, and the probe unit that refers to further includes reference Relay component；
The detection relay component is used to adjust the first projected light beam by the detection slit component, and makes through toning First projected-beam entrance of section is to the detection photoelectric detection unit；
It is described to be used to adjust the second projected light beam by the reference slit component with reference to relay component, and make through toning Second projected-beam entrance of section refers to photoelectric detection unit to described.
Optionally, the measurement probe unit is detection charge-coupled image sensor, and the reference imaging unit is ginseng Examine charge-coupled image sensor.
Optionally, the lighting unit includes: light source unit and projection grating component；
The light that the projection grating component is used to that the light source unit to be made to issue forms projected light beam.
Optionally, the measurement probe unit includes: the detection polarizer, detecting polarization beam-splitter, detection grating assembly, visits Survey photoelastic modulation component and detection photoelectric detection unit；
The detecting polarization beam-splitter, for first projected light beam for passing through the detection polarizer to be divided into first O light projected light beam and the first E light projected light beam；
The detection grating assembly detects sub-gratings and the second detection including at least the first of half of screen periods of dislocation Grating, the first O light projected light beam is by the first detection sub-gratings, and the first E light projected light beam is by described the Two detection sub-gratings；
The detection photoelastic modulation component, for modulating the first O light projected light by the detection grating assembly Beam and the first E light projected light beam, and form detection exchange light intensity signal；
Photoelectric detection unit is detected, for receiving the detection exchange light intensity signal and forming measurement detectable signal；
It is described with reference to probe unit include: with reference to the polarizer, with reference to polarization spectro plate, reference grating component, with reference to photoelastic Modulation component and refer to photoelectric detection unit；
It is described to refer to polarization spectro plate, it is divided into second for second projected light beam with reference to the polarizer will to be passed through O light projected light beam and the 2nd E light projected light beam；
The reference grating component, it is sub with reference to sub-gratings and the second reference including at least the first of half of screen periods of dislocation Grating, the 2nd O light projected light beam refer to sub-gratings by described first, and the 2nd E light projected light beam is by described the Two refer to sub-gratings；
It is described to refer to photoelastic modulation component, for modulating the 2nd O light projected light by the reference grating component Beam and the 2nd E light projected light beam, and formed with reference to exchange light intensity signal；
With reference to photoelectric detection unit, for receiving the reference exchange light intensity signal and being formed with reference to detectable signal.
Optionally, the measurement probe unit includes: detection triangular grating component and detection photoelectric detection unit；
The detection triangular grating component, for first projected light beam to be divided into the first U light projected light beam and the first D Light projected light beam；
The detection photoelectric detection unit, includes at least the first son detection photoelectric detection unit and the second son detection photoelectricity is visited Unit is surveyed, the first son detection photoelectric detection unit forms the first son measurement for receiving the first U light projected light beam Detectable signal, the second son detection photoelectric detection unit form the second son and survey for receiving the first D light projected light beam Detectable signal is measured, the measurement detection letter is formed according to the first son measurement detectable signal and the second son measurement detectable signal Number；
The probe unit that refers to includes: with reference to triangular grating component and with reference to photoelectric detection unit；
It is described to refer to triangular grating component, for second projected light beam to be divided into the 2nd U light projected light beam and the 2nd D Light projected light beam；
It is described to refer to photoelectric detection unit, it includes at least the first son and refers to photoelectric detection unit and the second sub- reference light electrical resistivity survey Unit is surveyed, first son is with reference to photoelectric detection unit for receiving the 2nd U light projected light beam, and formation the first son reference Detectable signal, second son is with reference to photoelectric detection unit for receiving the 2nd D light projected light beam, and formation the second son ginseng Detectable signal is examined, the reference detection letter is formed with reference to detectable signal with reference to detectable signal and the second son according to first son Number.
Second aspect, the embodiment of the invention also provides a kind of lithographic equipments, including above-mentioned any focusing and leveling Device.
The third aspect, the embodiment of the invention also provides a kind of focusing and leveling methods, comprising:
Lighting unit generates projected light beam；
Projection spectrophotometric unit projects the projected light beam to measured device；
The projected light beam reflected through the measured device is divided into the first projected light beam and the second projection by detection spectrophotometric unit Light beam, and first projected light beam is transmitted through measurement probe unit, and reflect second projected light beam, so that described the Optical path of two projected light beams before the projected-beam entrance to the detection spectrophotometric unit returns, through the measured device and institute Projection spectrophotometric unit is stated to reflex to reference to probe unit；
It is described to receive second projected light beam with reference to probe unit and be converted into reference to detectable signal, wherein the ginseng Examining detectable signal includes fabrication error information；
The measurement probe unit receives first projected light beam and is converted into measurement detectable signal, wherein the survey Measuring detectable signal includes the fabrication error information and defocusing amount information；
Processing unit is according to described with reference to detectable signal and the measurement detectable signal obtains the defocus of the measured device Amount.
The invention discloses a kind of focusing leveling device, lithographic equipment and focusing and leveling method, the focusing leveling device, packets Include: lighting unit, detection spectrophotometric unit, measures probe unit, with reference to probe unit and processing unit at projection spectrophotometric unit；Its In, lighting unit is for generating projected light beam；Projection spectrophotometric unit is for projecting projected light beam to measured device；Detection light splitting Unit is used to for the projected light beam reflected being divided into the first projected light beam and the second projected light beam through measured device, and first is projected Light beam is transmitted through measurement probe unit, and reflects the second projected light beam, so that the second projected light beam is along projected-beam entrance to spy Optical path before surveying spectrophotometric unit returns, and is incident to through measured device and projection spectrophotometric unit with reference to probe unit；It is single with reference to detection Member includes fabrication error information with reference to detectable signal for receiving the second projected light beam and being converted into reference to detectable signal；Measurement For probe unit for receiving the first projected light beam and being converted into measurement detectable signal, measurement detectable signal includes fabrication error information With defocusing amount information；Processing unit is used to obtain the defocusing amount of measured device according to reference detectable signal and measurement detectable signal. Projected light beam is divided into the first projected light beam and the second projected light beam, the survey that the first projected light beam obtains by detection spectrophotometric unit Measure includes fabrication error information and defocusing amount information in detectable signal；The reference detectable signal that second projected light beam obtains includes work Skill control information.According to reference detectable signal and the measurement available revised defocusing amount of detectable signal, technique mistake is eliminated The influence of difference, reduces the measurement error of focusing and leveling, improves the accuracy of the defocusing amount of measurement.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram for focusing leveling device that the embodiment of the present invention one provides；
Fig. 2 is a kind of compensation principle schematic diagram for focusing leveling device that the embodiment of the present invention one provides；
Fig. 3 is a kind of structural schematic diagram for measured device that the embodiment of the present invention one provides；
Fig. 4 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides；
Fig. 5 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides；
Fig. 6 is a kind of structural schematic diagram for beam modulation component that the embodiment of the present invention one provides；
Fig. 7 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides；
Fig. 8 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides；
Fig. 9 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides；
Figure 10 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides；
Figure 11 is a kind of structural schematic diagram of focusing leveling device provided by Embodiment 2 of the present invention；
Figure 12 is the structural schematic diagram of another focusing leveling device provided by Embodiment 2 of the present invention；
Figure 13 is a kind of semi-transparent semi-reflecting plate glass tilt angle provided by Embodiment 2 of the present invention and detection laser image spot The relational graph of offset；
Figure 14 is a kind of structural schematic diagram for focusing leveling device that the embodiment of the present invention three provides；
Figure 15 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention three provides；
Figure 16 is a kind of flow chart for focusing and leveling method that the embodiment of the present invention five provides.
Specific embodiment
The present invention is described in further detail with reference to the accompanying drawings and examples.It is understood that this place is retouched The specific embodiment stated is used only for explaining the present invention rather than limiting the invention.It also should be noted that in order to just Only the parts related to the present invention are shown in description, attached drawing rather than entire infrastructure.
Embodiment one
Fig. 1 is a kind of structural schematic diagram for focusing leveling device that the embodiment of the present invention one provides.Referring to Fig. 1, the present invention Embodiment provides a kind of focusing leveling device, comprising: lighting unit 110, projection spectrophotometric unit 120, detection spectrophotometric unit 130, probe unit 140 is measured, with reference to probe unit 150 and processing unit (not shown).
Wherein, lighting unit 110 is for generating projected light beam 210；Spectrophotometric unit 120 is projected to be used for projected light beam 210 It projects to measured device 160；Detection spectrophotometric unit 130 is first for dividing the projected light beam 210 reflected through measured device 160 Projected light beam 211 and the second projected light beam 212, and the first projected light beam 211 is transmitted through measurement probe unit 140, and reflect Second projected light beam 212, so that the second projected light beam 212 is incident to the optical path before detecting spectrophotometric unit 130 along projected light beam 210 It returns, is incident to through measured device 160 and projection spectrophotometric unit 120 with reference to probe unit 150；It is used for reference to probe unit 150 It receives by the second projected light beam 212 and is converted into reference to detectable signal, include fabrication error information with reference to detectable signal；Measurement is visited Unit 140 is surveyed for receiving the first projected light beam 211 and being converted into measurement detectable signal, measurement detectable signal includes the technique Control information and defocusing amount information；Processing unit is used to obtain measured device according to reference detectable signal and measurement detectable signal 160 defocusing amount.
It should be noted that the projected light beam 210 that lighting unit 110 generates is by projection spectrophotometric unit 101 projection to quilt It surveys on device 160, through 160 reflective projection of measured device into detection spectrophotometric unit 130.Wherein, it detects and has in spectrophotometric unit 130 There is spectrum groupware, can transmit simultaneously and form the first projected light with reflected projection beam 210, the projected light beam 210 of transmissive portion The projected light beam 101 of beam 211, reflective portion forms the second projected light beam 212.
First projected light beam 211 is directly transmitted to measurement probe unit 140, and measurement probe unit 140 is according to receiving First projected light beam 211 forms measurement detectable signal.Wherein, it should be noted that measurement probe unit 130 obtain single the The measurement detectable signal that one projected light beam 211 is formed, characterization is measured device defocusing amount and 211 internal reflection of the first projected light beam The coupling of rate.
Fig. 2 is a kind of compensation principle schematic diagram for focusing leveling device that the embodiment of the present invention one provides.Referring to fig. 2, make With the principle of triangulation of traditional optical, under the conditions of SC, when the vertical variation of measured device 160 is Δ Z, it will cause to project The translation of 210 relative measurement probe unit 140 of light beam is Δ d, and Δ Z=K × Δ d, K is conversion coefficient, is constant, by equipment (such as litho machine) determines.When, there are when art pattern CAD, Fig. 3 is one kind that the embodiment of the present invention one provides on measured device 160 The structural schematic diagram of measured device.Referring to Fig. 3, illustratively, when the distribution situation of the reflectivity on measured device 160 is extreme In the case of, such as black and white face (bottom material widely different), wherein RA, RBThe respectively reflectivity in two parts region, will lead to Reflectivity in first projected light beam 211 is uneven, fabrication error occurs, and the size of fabrication error is Zerror=(RA-RB)/(RA +RB)×K.It include that fabrication error information and defocusing amount are believed in the measurement detectable signal then obtained according to the first projected light beam 211 Breath.
Second projected light beam 212 is through detecting the reflection of spectrophotometric unit 130, according to light path principle, along projected light beam 210 Optical path before being incident to detection spectrophotometric unit 130 returns, and is incident to refer to through measured device 160 and projection spectrophotometric unit 120 and visit Survey unit 150.Since the second projected light beam 212 is along the incident path backtracking of projected light beam 101, the second projected light beam There is no variations for the height of 212 opposite projected light beams 101, i.e. its interference that can exclude height (defocusing amount) information.According to It include its reflectivity unevenly caused fabrication error information in the reference detectable signal that second projected light beam 212 obtains.
Since the second projected light beam 212 and 210 optical path of projected light beam are reciprocal optical path, the two is in measured device 160 On point of irradiation it is identical, the art pattern CAD on measured device 160 is to projected light beam 210 (or first projected light beam 211) and second The influence of projected light beam 212 is identical, i.e., caused by fabrication error it is identical, be Zerror.Therefore according to measurement detectable signal and ginseng Detectable signal, calculation processing through the processing unit are examined, the defocusing amount after the available correction of measured device 160 eliminates work The influence of skill error reduces the measurement error of focusing and leveling, improves the accuracy of the defocusing amount of measurement.
Projected light beam is divided into the first projected light beam by detection spectrophotometric unit by focusing leveling device provided in this embodiment It include fabrication error information and defocusing amount information in the measurement detectable signal obtained with the second projected light beam, the first projected light beam； The reference detectable signal that second projected light beam obtains includes fabrication error information.According to reference detectable signal and measurement detectable signal Available revised defocusing amount, eliminates the influence of fabrication error, reduces the measurement error of focusing and leveling, improves survey The accuracy of the defocusing amount of amount.
Fig. 4 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides.Referring to fig. 4, optional , lighting unit 110 includes: light source unit 112 and projection slit component 113；Projection slit component 113 is for making light source unit 112 directional lights issued form projected light beam 210.
It is understood that in view of the light that light source 111 issues in light source unit 112 may not be directional light, measurement Effect can be declined, and the light that light source 111 issues first can be adjusted to directional light by light fixture.Light fixture can be with It is illuminating lens component, is also possible to lighting fiber, to adjusting light fixture that light source unit emits beam not in the application Do any restrictions.The directional light of formation is irradiated on projection slit component 113, forms projection through the light beam of projection slit 113 Light beam 210.
Fig. 5 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides.It is optional referring to Fig. 5 , projection spectrophotometric unit 120 includes: projection spectrum groupware 121 and beam modulation component 122；Spectrum groupware 121 is projected, is used for By the projection of projected light beam 210 to measured device 160, and the second projected light beam 212 reflected by measured device 160 is reflexed to With reference to probe unit 150；Beam modulation component 122 is used to projected light beam 210 being modulated to periodic dynamic projection light beam.
Projected light beam 210 can be incident to projection spectrum groupware 121, and be incident on light beam by projection spectrum groupware 121 In modulation component 122, beam modulation component 122 can modulate projected light beam 210, and illustratively, beam modulation component 122 can be with Allow projected light beam 210 according to preset motion profile movement or other obtain the modulation system pair of measured device defocusing amount Projected light beam 210 is modulated.In addition, the adjusting by beam modulation component 122 can be incident on tested device with projected light beam 210 Clearly image can be maintained when on part 160, prevents projected light beam 210 from disperse occur during paths, influence to measure Effect.
When projected light beam 210 is detected the light splitting of spectrophotometric unit 130 and by the second projected light beam 212 along projected light beam 210 Incident path reflection, through measured device 160 and beam modulation component 122 be incident on projection spectrum groupware 121 on, projection light splitting Component 121 can reflex to the second projected light beam 212 with reference to probe unit 150.
Optionally, beam modulation component 122 includes: scanning reflection mirror and modulation relaying microscope group.
Fig. 6 is a kind of structural schematic diagram for beam modulation component that the embodiment of the present invention one provides.It is exemplary referring to Fig. 6 Ground, scanning reflection mirror 123 are located between each lens element in modulation relaying microscope group, wherein modulation relaying microscope group includes two A projecting lens 124 and two reflecting mirrors 215.Scanning reflection mirror 123 makees periodical simple harmonic oscillation, and projected light beam 210 is through overscan Retouching after reflecting mirror 123 is periodical dynamic projection light beam, then measures probe unit 140 and obtain finally measuring detectable signal being the period The Dynamic Signal of property obtains measured device by the signal analysis and processing fed back to the Dynamic Signal combination scanning reflection mirror 123 160 vertical position (i.e. defocusing amount).
Fig. 7 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides.It is optional referring to Fig. 7 , detection spectrophotometric unit 130 includes detection spectrum groupware 131 and detection relaying microscope group component 132；Spectrum groupware 131 is detected, is used Divide in by projected light beam 210 for the first projected light beam 211 and the second projected light beam 212, and transmits the first projected light beam 211 and anti- Penetrate the second projected light beam 212；Detection relaying microscope group component 132, for adjusting projected light beam 210, so that projected light beam 210 is vertical It is incident to detection spectrum groupware 131.
Wherein, detection spectrum groupware 131 is provided simultaneously with the function of transmission and reflection, can be with transmissive portion projected light beam 210 The first projected light beam 211 is formed, reflective portion projected light beam 210 forms the second projected light beam 212.Detection is divided in the application With no restrictions, optionally, detection spectrum groupware 131 includes semi-transparent semi-reflecting plate glass to the specific composition of component.
The detection relaying adjustable projected light beam 210 of microscope group component 132, prevents projected light beam 210 in paths process In there is diffusing phenomenon, influence measurement result.Projected light beam 210 relays the adjusting vertical incidence of microscope group component 132 by detection To detection spectrum groupware 131, in order to so that the second projected light beam 212 of its reflection can enter rays along projected light beam 210 Diameter returns.
Fig. 8 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides.It is optional referring to Fig. 8 , measurement probe unit 140 includes detection slit component 141 and detection photoelectric detection unit 142；It is wrapped with reference to probe unit 150 It includes reference slit component 151 and refers to photoelectric detection unit 152.
It should be noted that detection slit component 141 and reference slit component 151 respectively can single slit grating, It can be slit grating pair.When 160 defocusing amount difference of measured device, the first projected light beam 211 passes through detection slit component 141 Beam size can also change, the light intensity magnitude that receives of detection photoelectric detection unit 142 can also change accordingly.Example Property, when projecting in spectrum groupware 121 includes scanning reflection mirror 123, scanning reflection mirror 123 can make 210 period of projected light beam Property movement, then detecting 142 final output of photoelectric detection unit is periodic dynamic voltage signal (measurement detectable signal), is led to Cross and the square wave of dynamic voltage signal combination scanning reflection mirror feedback be analyzed and processed, realize to measured device 160 from The measurement of coke amount, when there are deposit in defocusing amount when art pattern CAD, measured according to the first projected light beam 211 on measured device 160 In fabrication error.
Similarly, when the second projected light beam 212 is changed by reference to 151 beam size of slit component, with reference to photoelectricity The light intensity magnitude that probe unit 152 receives can also change accordingly, with reference to photoelectric detection unit 152 according to the light intensity received Size exports corresponding signal value.Illustratively, according to the modulating action of scanning reflection mirror 123, with reference to photoelectric detection unit 152 Final output is also periodic dynamic voltage signal (referring to detectable signal), the square wave progress fed back in conjunction with scanning reflection mirror Analysis processing, realizes the measurement to fabrication error on measured device 160.
It is handled through the processing unit to measurement detectable signal and with reference to detectable signal, show that measured device 160 is corrected Defocusing amount afterwards.
Optionally, measurement probe unit 140 further includes detection relay component 143, further includes reference with reference to probe unit 150 Relay component 153；Detection relay component 143 is used to adjust the first projected light beam 211 by detection slit component 141, and makes The first projected light beam 211 through overregulating is incident to detection photoelectric detection unit 142；With reference to relay component 153 for adjusting warp The second projected light beam 212 of reference slit component 151 is crossed, and the second projected light beam 212 through overregulating is made to be incident to reference light Electric probe unit 152.
Wherein, detection relay component 143 is located between detection slit component 141 and detection photoelectric detection unit 142, reference Relay component 153 is located at reference slit component 151 and with reference between photoelectric detection unit 152, detects relay component 143 and reference Relay component 153 is respectively adjusted the first projected light beam 211 and the second projected light beam 212, prevents it in paths mistake Occur disperse in journey, influences measurement result.
In view of detection photoelectric detection unit 142 and the reference reception of photoelectric detection unit 152 beam area are smaller, in detection Light can also be carried out to the first projected light beam 211 and the second projected light beam 212 respectively after component 143 and with reference to relay component 153 Density compression processing allows the first projected light beam 211 and the second projected light beam 212 to be smoothly detected photoelectric detection unit 142 It is received with reference photoelectric detection unit 152.
Optionally, measurement probe unit 140 is detection charge-coupled image sensor, and reference imaging unit 150 is reference Charge-coupled image sensor.
It should be noted that detection charge-coupled image sensor (Charge Coupled Device, CCD) and reference CDD receives the first projected light beam 211 and the second projected light beam 212 respectively.It can detected by analyzing the first projected light beam 211 CCD (or change in location of second projected light beam 212 on reference CCD) target surface is completed to the defocusing amount of measured device 160 (or work Skill error) measurement.
Optionally, lighting unit includes: light source unit and projection grating component；Projection grating component is for making light source unit The light of sending forms projected light beam.
It should be noted that the projected light beam generated in view of projection slit is only a projection hot spot, it is understood that there may be compared with Big Technological adaptability error, therefore projection slit can be replaced using projection grating component, the projected light beam of generation includes more A projection hot spot can reduce influence of the Technological adaptability error to measurement error.
The light that light source unit issues can form directional light by the adjusting of light fixture, can not also form directional light, It can be adjusted according to the actual demand to optical path, so as to the higher projected light beam of quality reached, be improved accordingly The accuracy of measurement result.
Fig. 9 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides.It is optional referring to Fig. 9 , measurement probe unit 140 includes: the detection polarizer 143, detecting polarization beam-splitter 144, detection grating assembly 145, detection light Play modulation component 146 and detection photoelectric detection unit 147.
Detecting polarization beam-splitter 144, the first projected light beam 211 for that will pass through the detection polarizer 143 divide for the first O light Projected light beam and the first E light projected light beam；Grating assembly 145 is detected, including at least first detection of half of screen periods of dislocation Sub-gratings and the second detection sub-gratings, the first O light projected light beam pass through by the first detection sub-gratings, the first E light projected light beam Second detection sub-gratings；Photoelastic modulation component 146 is detected, for modulating the first O light projected light beam by detection grating assembly With the first E light projected light beam, and formed detection exchange light intensity signal；Photoelectric detection unit 147 is detected, for receiving detection exchange Light intensity signal simultaneously forms measurement detectable signal.
With reference to probe unit 150 include: with reference to the polarizer 153, with reference to polarization spectro plate 154, reference grating component 155, With reference to photoelastic modulation component 156 and refer to photoelectric detection unit 157.
With reference to polarization spectro plate 154, the second projected light beam 212 for that will pass through with reference to the polarizer 153 divides for the second O light Projected light beam and the 2nd E light projected light beam；Reference grating component 155, including at least first reference of half of screen periods of dislocation Sub-gratings and second refer to sub-gratings, and the 2nd O light projected light beam refers to sub-gratings by first, and the 2nd E light projected light beam passes through Second refers to sub-gratings；With reference to photoelastic modulation component 156, for modulating the 2nd O light projected light beam for passing through reference grating component With the 2nd E light projected light beam, and formed with reference to exchange light intensity signal；With reference to photoelectric detection unit 157, for receiving with reference to exchange Light intensity signal is simultaneously formed with reference to detectable signal.
It should be noted that respectively including two spatially half of dislocation in detection grating assembly and reference grating component The grating assembly of screen periods, using the detection grating assembly and detection grating assembly for including two dislocation placements, from spatially Using Differential Detection, defocusing amount and fabrication error are calculated, scanning reflection mirror etc. is can replace and is calculated using the method for time difference Defocusing amount, avoid because surface sweeping reflecting mirror it is unstable caused by measurement error, keep measurement structure more accurate.
Specifically, when lighting unit includes projection grating component, the light that light source issues shape after projection grating component At projected light beam be projection grating light beam, projection grating light beam by projection spectrophotometric unit project to measured device, through quilt Detection spectrophotometric unit is incident in the reflection for surveying device, and projection grating light beam is divided into the first projected light beam and the by detection spectrophotometric unit Two projected light beams.
For first projected light beam transmitted through detection spectrophotometric unit and by the detection polarizer and detecting polarization beam-splitter, detection is inclined First projected light beam is divided into the first O light projected light beam and the first E light projected light beam by vibration beam-splitter；First O light projected light beam warp The first detection sub-gratings are crossed, the first E light projected light beam is by the second detection sub-gratings；By the first O light for detecting grating assembly Projected light beam and the first E light projected light beam are incident to detection photoelastic modulation component, and detection photoelastic modulation component modulates the first O light Projected light beam and the first E light projected light beam, and form detection exchange light intensity signal；It exchanges light intensity signal and is detected photodetection list Member receives and is formed measurement detectable signal, and measurement detectable signal includes the fabrication error information and defocusing amount information.
Similarly, the second projected light beam is detected spectrophotometric unit reflection, before projected-beam entrance to detection spectrophotometric unit Optical path returns, and is incident to through measured device and projection spectrophotometric unit with reference to the polarizer；By the reference polarizer and with reference to polarization point Second projected light beam is divided into the 2nd O light projected light beam and the 2nd E light projected light beam with reference to polarization spectro plate by tabula rasa；2nd O light Projected light beam refers to sub-gratings by first, and the first E light projected light beam refers to sub-gratings by second；By reference grating component The 2nd O light projected light beam and the 2nd E light projected light beam be incident to reference to photoelastic modulation component, with reference to photoelastic modulation component tune The 2nd O light projected light beam and the 2nd E light projected light beam are made, and is formed with reference to exchange light intensity signal；Exchange light intensity signal is referenced Photoelectric detection unit is received and is formed with reference to detectable signal, includes fabrication error information with reference to detectable signal.
Processing unit obtains the revised defocusing amount of measured device according to reference detectable signal and measurement detectable signal.
Figure 10 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention one provides.Referring to Figure 10, survey Amount probe unit 140 includes: detection triangular grating component 148 and detection photoelectric detection unit 147；Detect triangular grating component 148, for dividing the first projected light beam 211 for the first U light projected light beam and the first D light projected light beam；Detect photodetection list Member 147, includes at least the first son detection photoelectric detection unit and the second son detection photoelectric detection unit, and the first son detection photoelectricity is visited Unit is surveyed for receiving the first U light projected light beam, and forms the first son measurement detectable signal, the second son detection photoelectric detection unit For receiving the first D light projected light beam, and form the second son measurement detectable signal, according to the first son measurement detectable signal and Second son measurement detectable signal forms measurement detectable signal.
It include: with reference to triangular grating component 158 and to refer to photoelectric detection unit 157 with reference to probe unit 150；With reference to triangle Grating assembly 158, for dividing the second projected light beam 212 for the second U light projected light beam and the 2nd D light projected light beam；Reference light Electric probe unit includes at least the first son with reference to photoelectric detection unit and the second son and refers to photoelectric detection unit, the first son reference Photoelectric detection unit forms the first son and refers to detectable signal, the second sub- reference light electrical resistivity survey for receiving the 2nd U light projected light beam Unit is surveyed for receiving the 2nd D light projected light beam, and forms the second son and refers to detectable signal, detectable signal is referred to according to the first son It is formed with the second son with reference to detectable signal and refers to detectable signal.
Wherein, using broadband UV light (200nm~425nm) as the light source 111 in the focusing leveling device, to mention The Technological adaptability ability of the high focusing and leveling, compensates fabrication error without configuration baroceptor.
Larger color difference will be introduced by using broadband UV light, then using polarised light light splitting scheme, influences measurement accuracy, Therefore, it in order to ensure the accuracy measured in focusing leveling device, can be realized using triangular grating component to defocusing amount and work The measurement of skill error.
Specifically, when lighting unit includes projection grating component, the light that light source issues shape after projection grating component At projected light beam be projection grating light beam, projection grating light beam by projection spectrophotometric unit project to measured device, through quilt Detection spectrophotometric unit is incident in the reflection for surveying device, and projection grating light beam is divided into the first projected light beam and the by detection spectrophotometric unit Two projected light beams.
First projected light beam is incident to detection triangular grating component 148 transmitted through detection spectrophotometric unit, detects triangular grating Component 148 divides the first projected light beam 211 for the first U light projected light beam and the first D light projected light beam；First son detection photoelectricity is visited It surveys unit and receives the first U light projected light beam, and form the first son measurement detectable signal, the second son detection photoelectric detection unit receives The first D light projected light beam, and the second son measurement detectable signal is formed, it is surveyed according to the first son measurement detectable signal and the second son It measures detectable signal and forms measurement detectable signal, measurement detectable signal includes the fabrication error information and defocusing amount information.
Similarly, the second projected light beam is detected spectrophotometric unit reflection, before projected-beam entrance to detection spectrophotometric unit Optical path returns, and is incident to through measured device and projection spectrophotometric unit with reference to triangular grating component 158；With reference to triangular grating component 158 divide the second projected light beam 212 for the second U light projected light beam and the 2nd D light projected light beam；First son refers to photodetection list Member receives the 2nd U light projected light beam, and forms the first son and refer to detectable signal, and the second son receives second with reference to photoelectric detection unit D light projected light beam, and form the second son and refer to detectable signal, according to the first son with reference to detectable signal and the second son with reference to detection letter Number formed refer to detectable signal.
Processing unit obtains the revised defocusing amount of measured device according to reference detectable signal and measurement detectable signal.
Embodiment two
The present embodiment on the basis of the above embodiments, provides two kinds of optional examples.
Figure 11 is a kind of structural schematic diagram of focusing leveling device provided by Embodiment 2 of the present invention.Referring to Figure 11, the tune Burnt levelling device includes: lighting unit 110, projection spectrophotometric unit 120, detection spectrophotometric unit 130, measurement probe unit 140, ginseng Examine probe unit 150 and processing unit (not shown).
Wherein, lighting unit 110 includes light source unit 112 and projection slit component 113；Projecting spectrophotometric unit 120 includes Project spectrum groupware 121 and beam modulation component 122；Detecting spectrophotometric unit 130 includes detection spectrum groupware 131 and detection relaying Microscope group component 132；Measuring probe unit 140 includes detection slit component 141, detection photoelectric detection unit 142 and detection relaying Component 143；It include reference slit component 151, with reference to photoelectric detection unit 152 and with reference to relay component with reference to probe unit 150 153。
The light that light source 111 issues forms directional light through light fixture and is radiated on projection slit component 113, through projection The light beam of slit component 113 forms projected light beam 210, and projected light beam 210 is successively by projection spectrum groupware 121 and light beam regulation Component 122 forms multiple projection hot spots, 160 reflected projection beam 210 of measured device, projected light beam 210 on measured device 160 Vertical irradiation is adjusted to detection spectrum groupware 131 by detection relaying microscope group component 132, detects 131 transmissive portion of spectrum groupware Projected light beam 210 forms the first projected light beam 211, and reflection another part projected light beam 210 forms the second projected light beam 212.
First projected light beam 211 is imaged on detection slit component 141 through detection spectrum groupware 131, through detection slit The light of component 141 is detected photoelectric detection unit 142 by the adjusting of detection relay component 143 and receives, and detects photodetection list Member 142 exports corresponding signal value (i.e. measurement detectable signal) according to the light intensity magnitude received.
Second projected light beam 212 is reflected through detection spectrum groupware 131, exposes to detection spectrum groupware along projected light beam 210 Optical path before 131 returns, and exposes to projection through detection relaying microscope group component 132, measured device 160 and light beam regulation component 122 Spectrum groupware 121, through projection 121 catoptric imaging of spectrum groupware in reference slit component 151, through reference slit component 151 Light is referenced the reception of photoelectric detection unit 152 by the adjusting with reference to relay component 153, with reference to 152 basis of photoelectric detection unit The light intensity magnitude received exports corresponding signal value (i.e. with reference to detectable signal).
When beam modulation component 122 includes scanning reflection mirror 123, scanning reflection mirror 123 makees periodical simple harmonic oscillation, with Measurement result can be normalized in calculating process by continuing after an action of the bowels.Projected light beam 210 is after being scanned reflecting mirror 123 Periodical dynamic projection light beam then measures photoelectric detection unit 142 and respectively obtains final measurement with reference to photoelectric detection unit 152 Detectable signal and be also periodic Dynamic Signal with reference to detectable signal, processing unit is by measurement detectable signal and with reference to visiting The signal analysis and processing that signal combination scanning reflection mirror 123 is fed back is surveyed, the revised defocusing amount of measured device 160 is obtained, is eliminated The influence of fabrication error, reduces the measurement error of focusing and leveling, improves the accuracy of the defocusing amount of measurement.
It should be noted that the present embodiment two additionally provides another focusing and adjusts on the basis of above-described embodiment scheme The specific example of leveling device.Figure 12 is the structural schematic diagram of another focusing leveling device provided by Embodiment 2 of the present invention.Ginseng See that Figure 12, measurement probe unit 140 are detection CCD, reference imaging unit 150 is with reference to CCD, remaining element can be constant.
First projected light beam, 211 direct imaging is on detection CCD, and detection CCD is according to as caused by the variation of vertical position The location variation that laser image spot is detected on detection CCD target surface, completes the measurement to 160 vertical position of measured device, when tested There are when art pattern CAD on device 160, which includes the defocusing amount information and fabrication error information of measured device 160.
Second projected light beam 212 is reflected through detection spectrum groupware 131, exposes to detection spectrum groupware along projected light beam 210 Optical path before 131 returns, through projection 121 catoptric imaging of spectrum groupware on reference CCD, with reference to CCD according on measured device 160 With reference to the variation of laser image spot center of gravity caused by the fabrication error that art pattern CAD occurs, complete to 160 fabrication error of measured device Measurement.
It should be noted that referring to Figure 12, when measuring 160 defocusing amount of measured device and fabrication error, respectively to detect CCD It is measuring basis with reference CCD, it is therefore desirable to consider the installation site of detection spectrum groupware 131 to detection laser image spot and reference light Spot picture is respectively relative to the influence of detection CCD and the positional relationship with reference to CCD (310).
In general, the device of triangulation is carried out using CCD, detection CCD needs to be mounted on detection imaging system Position of focal plane, therefore detect spectrum groupware 131 and can be only installed at the defocus position of detection imaging system, Constrained Project fulfillment capability Limitation, the installation of detection spectrum groupware 131 has the error of tilt angle, it is therefore desirable to comprehensively consider its defocusing amount and inclination Angle is respectively relative to the offset of detection CCD and reference CCD to formed detection laser image spot and with reference to laser image spot.
Illustratively, when detection spectrum groupware 131 is semi-transparent semi-reflecting plate glass, the variation of defocus will not change detection Positional relationship of the laser image spot relative to detection CCD, but its inclination angle will will lead to detection laser image spot relative to the flat of detection CCD Move, if semi-transparent semi-reflecting plate glass with a thickness of d, refractive index n, inclination angle θ, then caused by offset L1 are as follows: L1=d × sinθ×(1-cosθ/(sqrt(n2-sin2θ))。
Figure 13 is a kind of semi-transparent semi-reflecting plate glass tilt angle provided by Embodiment 2 of the present invention and detection laser image spot The relational graph of offset.Illustratively, d=5mm, n=1.6, then between its different inclination angle and the offset L1 for detecting CCD Relationship is as shown in figure 13, it can be observed from fig. 13 that offset L1 and inclination angle are substantially linear.Due to semi-transparent semi-reflecting flat Offset caused by glass sheet inclination angle is the overall offsets of all detection laser image spots, therefore in design, according to TOLERANCE ANALYSIS, Come design detection CCD adjusting range, compensate offset caused by the part.
Due to the influence of defocus gap tilt effect, the defocusing amount m of semi-transparent semi-reflecting plate glass and the coupling of tilt angle theta will It will lead to reference to offset L2 of the laser image spot relative to reference CCD, set the focal length f=500mm of the device, optical system multiplying power It is 1, is emulated using Zmax, the relationship between L2 and m, θ is as shown in table 1, from table 1 it follows that L2=m × θ, is also linear Relationship, equally can be according to TOLERANCE ANALYSIS, the adjusting range of design reference CCD, to compensate offset caused by the part.
Table 1 is a kind of semi-transparent semi-reflecting plate glass tilt angle provided by Embodiment 2 of the present invention and refer to the inclined of laser image spot The relationship of shifting amount.
Table 1
Embodiment three
The present embodiment on the basis of the above embodiments, provides two kinds of optional examples.
Figure 14 is a kind of structural schematic diagram for focusing leveling device that the embodiment of the present invention three provides.Referring to Figure 14, the tune Burnt levelling device includes: lighting unit 110, projection spectrophotometric unit 120, detection spectrophotometric unit 130, measurement probe unit 140, ginseng Examine probe unit 150 and processing unit (not shown).
Wherein, lighting unit 110 includes light source unit 112 and projection grating component 114；Projecting spectrophotometric unit 120 includes Project spectrum groupware 121 and beam modulation component 122；Detecting spectrophotometric unit 130 includes detection spectrum groupware 131 and detection relaying Microscope group component 132；Measuring probe unit 140 includes the detection polarizer 143, detecting polarization beam-splitter 144, detection grating assembly 145, photoelastic modulation component 146 and detection photoelectric detection unit 147 are detected；It include referring to the polarizer with reference to probe unit 150 153, with reference to polarization spectro plate 154, reference grating component 155, with reference to photoelastic modulation component 156 and with reference to photoelectric detection unit 157。
Wherein, it is half of screen periods that detecting polarization beam-splitter 144 and reference polarization spectro plate 154, which can be shearing displacement, SAVART polarization spectro plate.
The light that light source 111 issues is irradiated on projection grating component 114 by lighting fiber, through projection grating component 114 light forms projected light beam 210, and projected light beam 210 is by projection spectrum groupware 121 and beam modulation component 122 with certain Angle (for example, 70 degree) is incident on the surface of measured device 160, and the reflection through measured device is successively by detection relaying microscope group Component 132 and detection spectrum groupware 131, detection spectrum groupware 131 divide projected light beam 210 for the first projected light beam 211 and the Two projected light beams 212.
First projected light beam 211 is through detection spectrum groupware 131, successively by with reference to the polarizer 153 and with reference to polarization point Tabula rasa 154 projects 211 points of the first projected light beam point for the first O light projected light beam and the first E light with reference to polarization spectro plate 154 Light beam；First O light projected light beam is by the first detection sub-gratings, and the first E light projected light beam is by the second detection sub-gratings；By The first O light projected light beam and the first E light projected light beam for detecting grating assembly are incident to detection photoelastic modulation component, detect light It plays modulation component and the first O light projected light beam for carrying vertical information and the first E light projected light beam is modulated into exchange light intensity signal； Exchange light intensity signal is detected photoelectric detection unit and receives and formed measurement detectable signal, and measurement detectable signal includes the technique Control information and defocusing amount information.
Similarly, it is obtained by the second projected light beam with reference to detectable signal, includes fabrication error information with reference to detectable signal.
After the demodulation of electric module, processing unit respectively obtains the amplitude of AC signal according to measurement detectable signal AC (as Io-Ie) and DC quantity DC (as Io+Ie), and it is transferred to software processing module, software processing module receives After AC, D/C voltage value, the calibration value S of each measurement grating is calculated:
Then processing unit is further according to the relationship between the calibration value S demarcated in advance and the vertical defocusing amount Z of measured device, meter Calculate the defocusing amount of measured device 160.
It should be noted that when, there are when art pattern CAD, there are fabrication error, processing for the defocusing amount on measured device 160 Unit refers to detectable signal, and the value of available corresponding fabrication error, processing according to above-mentioned similar processing mode processing Unit is according to the obtained revised defocusing amount of the available measured device of defocusing amount and fabrication error.
Figure 15 is the structural schematic diagram for another focusing leveling device that the embodiment of the present invention three provides.Referring to Figure 15, In On the basis of above-described embodiment, the present embodiment additionally provides another focusing leveling device, wherein measurement probe unit 140 wraps It includes: detection triangular grating component 148 and detection photoelectric detection unit 147；It include: with reference to triangular grating with reference to probe unit 150 Component 158 and reference photoelectric detection unit 157.
First projected light beam 211 is incident to detection triangular grating component 148 through detection spectrum groupware 131, detects triangle Grating assembly 148 divides the first projected light beam 211 for the first U light projected light beam and the first D light projected light beam；First son detection light Electric probe unit receives the first U light projected light beam, and forms the first son measurement detectable signal, the second son detection photoelectric detection unit The first D light projected light beam is received, and forms the second son measurement detectable signal, detectable signal and second is measured according to the first son Son measurement detectable signal forms measurement detectable signal, and measurement detectable signal includes the fabrication error information and defocusing amount information.
Similarly, the second projected light beam is detected spectrum groupware 131 and reflects, before projected-beam entrance to detection spectrophotometric unit Optical path return, expose to projection light splitting group through detection relaying microscope group component 132, measured device 160 and light beam regulation component 122 Part 121 is projected spectrum groupware 121 and is reflexed to reference to triangular grating component 158；Second is thrown with reference to triangular grating component 158 Shadow light beam 212 divides for the second U light projected light beam and the 2nd D light projected light beam；First son receives the 2nd U with reference to photoelectric detection unit Light projected light beam, and form the first son and refer to detectable signal, the second son receives the 2nd D light projected light with reference to photoelectric detection unit Beam, and form the second son and refer to detectable signal, ginseng is formed with reference to detectable signal with reference to detectable signal and the second son according to the first son Examine detectable signal.
Processing unit acquires the first son measurement detectable signal, the second son measurement is visited according to complete machine synchronous bus signal respectively It surveys signal, the first son and refers to detectable signal with reference to detectable signal and the second son.Then each detectable signal is transferred at software Module is managed to calculate after software processing module receives the first son measurement detectable signal (U) and the second son measurement detectable signal (D) The scalar quantity S of each measurement grating:
Then further according to the S and measured device 160 demarcated in advance it is defocusing amount Z vertical between relationship, calculate tested device The defocusing amount of part.
Equally, when on measured device 160 there are when art pattern CAD, the defocusing amount there are fabrication error, processing unit according to Above-mentioned similar processing mode processing refers to detectable signal, and the value of available corresponding fabrication error, processing unit according to The obtained revised defocusing amount of the available measured device of defocusing amount and fabrication error.
Example IV
The embodiment of the invention also provides a kind of lithographic equipment, the focusing and leveling dress provided including above-mentioned any embodiment It sets.
Projected light beam is divided into the first projected light beam by detection spectrophotometric unit by lithographic equipment provided in an embodiment of the present invention It include fabrication error information and defocusing amount information in the measurement detectable signal obtained with the second projected light beam, the first projected light beam； The reference detectable signal that second projected light beam obtains includes fabrication error information.According to reference detectable signal and measurement detectable signal Available revised defocusing amount, eliminates the influence of fabrication error, reduces the measurement error of focusing and leveling, improves survey The accuracy of the defocusing amount of amount, and then reduce the photoetching error of lithographic equipment.
Embodiment five
Figure 16 is a kind of flow chart for focusing and leveling method that the embodiment of the present invention five provides.Referring to Figure 16, the present invention is real It applies example and provides a kind of focusing and leveling method, comprising:
S10: lighting unit generates projected light beam.
Lighting unit may include light source, lighting unit and projection slit component, and the light that light source issues is single by illumination Member is adjusted to directional light.The directional light of formation is irradiated on projection slit component, forms projected light through the light beam of projection slit Beam.
S20: projection spectrophotometric unit projects projected light beam to measured device.
Projection spectrophotometric unit may include: projection spectrum groupware and beam modulation component.Projected light beam can be incident to throwing Shadow spectrum groupware, and be incident in beam modulation component by projection spectrum groupware, beam modulation component can modulate projected light Beam is projected by modulated projected light beam to measured device.
S30: the projected light beam reflected through measured device is divided into the first projected light beam and the second projection by detection spectrophotometric unit Light beam, and the first projected light beam is transmitted through measurement probe unit, and reflect the second projected light beam, so that the second projected light beam edge Optical path before projected-beam entrance to detection spectrophotometric unit returns, and reflexes to through measured device and projection spectrophotometric unit with reference to detection Unit.
Detection spectrophotometric unit may include detection spectrum groupware and detection microscope group component.Detection spectrum groupware will be for that will project Light beam is divided into the first projected light beam and the second projected light beam, and transmits the second projected light beam of the first projected light beam and reflection.Detection Microscope group component is for adjusting projected light beam, so that projected light beam vertical incidence is to detecting spectrum groupware, and can prevent projected light There is diffusing phenomenon during paths in beam, influences measurement result.
S40: the second projected light beam is received with reference to probe unit and is converted into reference to detectable signal, wherein with reference to detection letter Number include fabrication error information.
It may include reference slit component, with reference to photoelectric detection unit and with reference to relay component with reference to probe unit, alternatively, With reference to probe unit or CCD is referred to, with the light intensity magnitude of the second projected light beam based on the received or hot spot can be referred to Detectable signal is referred to as being formed.
S50: measurement probe unit receives the first projected light beam and is converted into measurement detectable signal, wherein measurement detection letter Number include fabrication error information and defocusing amount information.
Measurement probe unit may include detection slit component, detection photoelectric detection unit and detect relay component, alternatively, Measurement probe unit may be measurement CCD, can be with the light intensity magnitude of the first projected light beam based on the received or detection hot spot As forming measurement detectable signal.
S60: processing unit obtains the defocusing amount of measured device according to reference detectable signal and measurement detectable signal.
Processing unit by measurement detectable signal and with reference to detectable signal analysis handle, obtain measured device it is revised from Jiao Liang.
Projected light beam is divided into the first projection by detection spectrophotometric unit by focusing and leveling method provided in an embodiment of the present invention Light beam and the second projected light beam include that fabrication error information and defocusing amount are believed in the measurement detectable signal that the first projected light beam obtains Breath；The reference detectable signal that second projected light beam obtains includes fabrication error information.According to reference detectable signal and measurement detection The available revised defocusing amount of signal, eliminates the influence of fabrication error, reduces the measurement error of focusing and leveling, improves The accuracy of the defocusing amount of measurement.
It should be noted that the focusing and leveling method of the embodiment of the present invention can be adjusted as provided by any embodiment of the present invention Burnt levelling device realizes have and execute corresponding functional unit and beneficial effect in above-mentioned focusing leveling device.Not in this implementation The technical detail of detailed description in example, reference can be made to focusing leveling device provided by the embodiment of the present invention.
Note that the above is only a better embodiment of the present invention and the applied technical principle.It will be appreciated by those skilled in the art that The invention is not limited to the specific embodiments described herein, be able to carry out for a person skilled in the art it is various it is apparent variation, It readjusts and substitutes without departing from protection scope of the present invention.Therefore, although being carried out by above embodiments to the present invention It is described in further detail, but the present invention is not limited to the above embodiments only, without departing from the inventive concept, also It may include more other equivalent embodiments, and the scope of the invention is determined by the scope of the appended claims.

Claims (14)

1. a kind of focusing leveling device characterized by comprising lighting unit, detection spectrophotometric unit, is surveyed projection spectrophotometric unit Measure probe unit, with reference to probe unit and processing unit；
Wherein, the lighting unit is for generating projected light beam；
The projection spectrophotometric unit is for projecting the projected light beam to measured device；
The detection spectrophotometric unit is used to the projected light beam reflected through the measured device being divided into the first projected light beam and second Projected light beam, and first projected light beam is transmitted through the measurement probe unit, and reflect second projected light beam, with Return to optical path of second projected light beam before the projected-beam entrance to the detection spectrophotometric unit, through described tested Device and the projection spectrophotometric unit are incident to reference to probe unit；
It is described to be used to receive second projected light beam and be converted into reference to detectable signal with reference to probe unit, it is described with reference to detection Signal includes fabrication error information；
The measurement probe unit is for receiving first projected light beam and being converted into measurement detectable signal, the measurement detection Signal includes the fabrication error information and defocusing amount information；
The processing unit is used for according to described with reference to detectable signal and the measurement detectable signal obtains the measured device Defocusing amount.
2. focusing leveling device according to claim 1, which is characterized in that the lighting unit include: light source unit and Projection slit component；
The directional light that the projection slit component is used to that the light source unit to be made to issue forms projected light beam.
3. focusing leveling device according to claim 1, which is characterized in that the projection spectrophotometric unit includes: projection point Optical assembly and beam modulation component；
The projection spectrum groupware, for projecting the projected light beam to measured device, and will be anti-by the measured device The second projected light beam penetrated reflexes to described with reference to probe unit；
The beam modulation component, for the projected light beam to be modulated to periodic dynamic projection light beam.
4. focusing leveling device according to claim 3, which is characterized in that the beam modulation component includes: that scanning is anti- Penetrate mirror and modulation relaying microscope group.
5. focusing leveling device according to claim 1, which is characterized in that the detection spectrophotometric unit includes detection light splitting Component and detection relaying microscope group component；
The detection spectrum groupware for the projected light beam to be divided into the first projected light beam and the second projected light beam, and transmits First projected light beam and reflection second projected light beam；
The detection relays microscope group component, for adjusting the projected light beam, so that the projected light beam vertical incidence is to described Detect spectrum groupware.
6. focusing leveling device according to claim 1, which is characterized in that the detection spectrophotometric unit includes semi-transparent semi-reflecting Plate glass.
7. focusing leveling device according to claim 4, which is characterized in that
The measurement probe unit includes detection slit component and detection photoelectric detection unit；
Described with reference to probe unit includes reference slit component and with reference to photoelectric detection unit.
8. focusing leveling device according to claim 7, which is characterized in that the measurement probe unit further includes in detection After component, the probe unit that refers to further includes with reference to relay component；
The detection relay component is used to adjust by first projected light beam for detecting slit component, and makes to be overregulated First projected-beam entrance is to the detection photoelectric detection unit；
Second projected light beam for being used to adjust the process reference slit component with reference to relay component, and make to be overregulated Second projected-beam entrance refers to photoelectric detection unit to described.
9. focusing leveling device according to claim 1, which is characterized in that the measurement probe unit is detection charge coupling Imaging sensor is closed, the reference imaging unit is reference charge coupled image sensor.
10. focusing leveling device according to claim 1, which is characterized in that the lighting unit include: light source unit and Projection grating component；
The light that the projection grating component is used to that the light source unit to be made to issue forms projected light beam.
11. focusing leveling device according to claim 10, which is characterized in that the measurement probe unit includes: detection The polarizer, detecting polarization beam-splitter, detection grating assembly, detection photoelastic modulation component and detection photoelectric detection unit；
The detecting polarization beam-splitter, for first projected light beam for passing through the detection polarizer to be divided into the first O light Projected light beam and the first E light projected light beam；
The detection grating assembly detects sub-gratings and the second detection sub-light including at least the first of half of screen periods of dislocation Grid, the first O light projected light beam pass through described second by the first detection sub-gratings, the first E light projected light beam Detect sub-gratings；
The detection photoelastic modulation component, for modulate by it is described detection grating assembly the first O light projected light beam and The first E light projected light beam, and form detection exchange light intensity signal；
Photoelectric detection unit is detected, for receiving the detection exchange light intensity signal and forming measurement detectable signal；
It is described with reference to probe unit include: with reference to the polarizer, with reference to polarization spectro plate, reference grating component, with reference to photoelastic modulation Component and refer to photoelectric detection unit；
It is described to refer to polarization spectro plate, it is divided into the 2nd O light for second projected light beam with reference to the polarizer will to be passed through Projected light beam and the 2nd E light projected light beam；
The reference grating component refers to sub-light with reference to sub-gratings and second including at least the first of half of screen periods of dislocation Grid, the 2nd O light projected light beam refer to sub-gratings by described first, and the 2nd E light projected light beam passes through described second With reference to sub-gratings；
It is described to refer to photoelastic modulation component, for modulate the 2nd O light projected light beam by the reference grating component with The 2nd E light projected light beam, and formed with reference to exchange light intensity signal；
With reference to photoelectric detection unit, for receiving the reference exchange light intensity signal and being formed with reference to detectable signal.
12. focusing leveling device according to claim 10, which is characterized in that the measurement probe unit includes: detection Triangular grating component and detection photoelectric detection unit；
The detection triangular grating component, for first projected light beam to be divided into the first U light projected light beam and the throwing of the first D light Shadow light beam；
The detection photoelectric detection unit includes at least the first son detection photoelectric detection unit and the second son detection photodetection list Member, the first son detection photoelectric detection unit form the first son measurement detection for receiving the first U light projected light beam Signal, the second son detection photoelectric detection unit form the second son measurement and visit for receiving the first D light projected light beam Signal is surveyed, the measurement detectable signal is formed according to the first son measurement detectable signal and the second son measurement detectable signal；
The probe unit that refers to includes: with reference to triangular grating component and with reference to photoelectric detection unit；
It is described to refer to triangular grating component, for second projected light beam to be divided into the 2nd U light projected light beam and the throwing of the 2nd D light Shadow light beam；
It is described to refer to photoelectric detection unit, the first son, which is included at least, with reference to photoelectric detection unit and the second son refers to photodetection list Member, first son are used to receive the 2nd U light projected light beam with reference to photoelectric detection unit, and form the first son with reference to detection Signal, second son refer to photoelectric detection unit for receiving the 2nd D light projected light beam, and form the second son with reference to spy Signal is surveyed, is formed with reference to detectable signal according to first son with reference to detectable signal and the second son described with reference to detectable signal.
13. a kind of lithographic equipment, which is characterized in that including the described in any item focusing leveling devices of claim 1-12.
14. a kind of focusing and leveling method characterized by comprising
Lighting unit generates projected light beam；
Projection spectrophotometric unit projects the projected light beam to measured device；
It detects spectrophotometric unit and the projected light beam reflected through the measured device is divided into the first projected light beam and the second projected light beam, And first projected light beam is transmitted through measurement probe unit, and reflect second projected light beam, so that described second throws Optical path of the shadow light beam before the projected-beam entrance to the detection spectrophotometric unit returns, through the measured device and the throwing Shadow spectrophotometric unit is reflexed to reference to probe unit；
It is described to receive second projected light beam with reference to probe unit and be converted into reference to detectable signal, wherein described with reference to spy Surveying signal includes fabrication error information；
The measurement probe unit receives first projected light beam and is converted into measurement detectable signal, wherein the measurement is visited Surveying signal includes the fabrication error information and defocusing amount information；
Processing unit is according to described with reference to detectable signal and the measurement detectable signal obtains the defocusing amount of the measured device.
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CN101169602A (en) * 2007-11-30 2008-04-30 北京理工大学 Focusing leveling measuring method and device
US20180031368A1 (en) * 2010-04-23 2018-02-01 Nikon Corporation Autofocus system and method
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