CN110487173B - Reflection type phase orthogonal single-frequency laser interference measuring device and measuring method - Google Patents
Reflection type phase orthogonal single-frequency laser interference measuring device and measuring method Download PDFInfo
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/0201—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal phase variation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
Abstract
The invention relates to a reflection type phase quadrature single-frequency laser interference measuring device and a measuring method, wherein a single-frequency laser source provides 45-degree polarized light, the 45-degree polarized light enters a polarization beam splitter prism through a polarizer and is uniformly split, the split P light and S light are emitted in parallel at spatial positions, are respectively projected to a measuring plane mirror and a reference plane mirror to return after passing through an 1/4 wave plate, and are combined and emitted through a polarization beam splitter after passing through a 1/4 wave plate again. The emergent beam combination light is uniformly split by the semi-transparent semi-reflecting mirror, and the transmitted light is received by the photoelectric detector after passing through the analyzer to generate an interference signal VI(ii) a The reflected light passes through the quarter-wave plate and then the detector, and the photoelectric detector receives the signal to generate an interference signal VQ. The polarization beam splitter prism is used for forming balanced reference light and measurement light with adjustable space distance, so that the environmental noise is greatly inhibited, and the measurement precision is improved; the azimuth angle of the polarizer is adjusted for nonlinear error correction in the signal processing stage, and the measurement precision is improved.
Description
Technical Field
The present invention relates to an optical measurement device, and more particularly, to a reflective phase quadrature single-frequency laser interferometry device and method.
Background
Double beam laser interferometers, whether single frequency or difference frequency, are widely used in high precision sensing applications and measurements. Compared with a double-frequency laser interferometer, the single-frequency laser interferometer adopting the phase quadrature method has the advantages of simple structure, easy signal processing, unlimited measuring speed, capability of simultaneously obtaining the amplitude and phase change of the measuring beam and the like, and is widely applied to various measuring fields such as high-precision displacement measurement, surface type measurement, measurement of refractive indexes of fluid, gas and the like. However, in practical applications, the sensitivity of the single-frequency laser interferometer to the measurement environmental noise and the existence of the nonlinear error become key factors limiting the improvement of the measurement precision of the single-frequency laser interferometer.
For a typical single frequency laser interferometer with quadrature phase interference, the phase difference between the signals of the two channels is 90 °, and the obtained quadrature interference signal can be expressed as:
wherein A is the amplitude of the interference signal,is the phase difference between the measurement signal and the reference signal caused by the measured change. Ideally, by
The phase difference can be determined and a measurement can be obtained.
In practical application, due to the reasons of non-ideal performance of optical devices, non-in-place installation, non-uniform gain of quadrature circuits and the like, the received interference signal is represented as:
wherein A isI、AQFor DC offset error, BI、BQIs the amplitude error and gamma is the non-quadrature error. Due to the existence of the three differences, the Lissajous figure of the orthogonal interference signal is distorted into an ellipse from a circle in an ideal state, and nonlinear errors are introduced to influence the measurement accuracy.
At present, when a single-frequency laser interferometer is used, distortion parameters are generally obtained by fitting a measurement signal in an ellipse mode, so that error compensation is carried out during real-time measurement. In order to ensure effective compensation, firstly interference signals are required not to be influenced by external environment disturbance, and secondly, distortion parameters can be obtained through fitting only when at least one phase difference change of 2 pi period is generated, so that second-level delay exists in real-time measurement and compensation. In order to solve the problem, application publication No. CN109539975A proposes that a liquid crystal phase retarder is used to introduce phase shift variation to achieve the effect of measuring mirror displacement to introduce phase shift, and under the condition that the measuring mirror is fixed before measurement is performed, the liquid crystal phase retarder is controlled to introduce additional phase shift to obtain phase difference variation of 2 pi period of interference signal, so as to generate required measuring signal to determine distortion parameter. The method is suitable for the application that the measuring mirror only has a small stroke or is static, otherwise, other angular motion errors introduced by the motion of the measuring mirror in actual measurement can change the signal distortion degree, and therefore complete compensation of nonlinear errors cannot be completed. The patent of application publication No. CN106225667A then suppresses polarization aliasing through inserting two polarization beam splitters of high extinction ratio in the light path to reduce non-quadrature error, revise direct current offset error and amplitude error through the gain of the photoelectric detector who adjusts among the receiving circuit simultaneously, entire system has certain complexity, and the high extinction ratio polaroid can only suppress the polarization aliasing in interfering the light path, can't eliminate the polarization of 2 polarization beam splitters in the receiving light path and reveal.
Disclosure of Invention
The invention provides a reflection type phase quadrature single-frequency laser interference measuring device and a measuring method aiming at the problem of nonlinear error during measurement of a single-frequency laser interferometer.
The technical scheme of the invention is as follows: a reflection-type phase quadrature single-frequency laser interference measuring device comprises a single-frequency laser source, a polarizer, a polarization splitting prism, a first 1/4 wave plate, a reference reflector, a measuring reflector, a semi-transparent semi-reflective splitting prism, a first analyzer, a first photoelectric detector, a second 1/4 wave plate, a second analyzer, a second photoelectric detector and an interference signal processing unit;
the polarization beam splitter prism is formed by bonding right-angle surfaces of two right-angle prisms with the same structure and size, the bevel edges of the two right-angle prisms are a surface A and a surface B respectively, the third surface of the polarization beam splitter prism is a surface C, and a layer of polarization beam splitting film is plated on a bonding surface D;
the single-frequency laser source emits 45-degree polarized light, the 45-degree polarized light enters from a surface A of the polarization splitting prism after passing through the polarizer, a P component penetrates through a polarization splitting surface D and then is reflected by a surface B and then exits from a surface C, an S component is reflected by the polarization splitting surface D and the surface A and then exits from the surface C, and the P light exiting from the surface C is parallel to the S light in space;
the P light and the S light split by the polarization beam splitter prism pass through a first 1/4 wave plate with an azimuth angle of 45 degrees to become two beams of orthogonal circularly polarized light, the two beams of orthogonal circularly polarized light are reflected by a measuring reflector and a reference reflector respectively, the original path returns to change the polarization state by 90 degrees through a first 1/4 wave plate again, the P light of the measuring light is changed into the S light, the S light of the reference light is changed into the P light, the P light and the S light of the reference light are combined through a polarization beam splitting surface D after being incident from the C surface of the polarization beam splitter prism and are emitted from the B surface of the polarization beam splitter prism;
the combined emergent light vertically enters and passes through the semi-transparent semi-reflecting beam splitter prism, and the transmitted light passes through the first analyzer and the first photodetector to obtain an interference signal VIThe reflected light passes through a second 1/4 wave plate with the azimuth angle of 0 degree, and then passes through a second analyzer and a second photodetector to become an interference signal VQTwo orthogonal interference signals VIAnd VQAnd an interference signal processing unit.
The testing method of the reflection type phase quadrature single-frequency laser interference measuring device specifically comprises the following steps:
1) firstly, the azimuth angle theta of the polarizer is adjusted to be 0 DEG, all optical pieces in the device are kept static, after light emitted by the single-frequency laser source passes through the device, the light intensity measured by the photoelectric detector is as follows:
AIx、AQxthe light intensity measured by the first photoelectric detector and the second photoelectric detector respectively;
2) other optical parts are kept still in the device, the azimuth angle theta of the polarizer is adjusted to be 90 degrees, and after light emitted by the single-frequency laser source passes through the device, the light intensity measured by the photoelectric detector at the moment is as follows:
AIy、AQythe light intensity measured by the first photoelectric detector and the second photoelectric detector respectively;
3) keeping other optical parts in the device still, adjusting polarizer azimuth theta to 45 degrees, after the light emitted by the single-frequency laser source passes through the device, the interference signal measured by the photoelectric detector at the moment is as follows:
the extinction ratio of the polarizing beam splitter is 1 × 10-3Above, the non-orthogonal error γ can be considered to be zero;
4) finally, the orthogonal interference signals after the direct current offset and the signal amplitude correction are obtained as follows:
the phase difference caused by the measurement quantity is:
the invention has the beneficial effects that: compared with other phase quadrature single-frequency laser interferometers, the reflective phase quadrature single-frequency laser interference measuring device and the measuring method adopt a beam balancing mode, so that a reference beam and a measuring beam share a light path, the device has a better inhibiting effect on environmental noise, and the measuring precision is improved; obtaining V by respectively setting the azimuth angles of the polarizers at 0 DEG and 90 DEGI,VQThe direct current offset and the amplitude value of the interference signal are determined, the nonlinear error in online measurement is compensated, and the measurement precision is improved. The measuring device can be widely applied to the field of reflective precision measurement.
Drawings
FIG. 1 is a schematic structural diagram of a reflective phase quadrature single-frequency laser interferometry device of the present invention.
Detailed Description
The invention is described in detail by taking a reflection-type phase quadrature single-frequency laser interferometry device as an embodiment shown in fig. 1.
The utility model provides a high accuracy reflection-type phase quadrature single-frequency laser interferometry device, includes single-frequency laser source 1, polarizer 2, polarization beam splitter prism 3, first 1/4 wave plate 4, reference mirror 5, measurement mirror 6, half-transmitting half-reflecting beam splitter prism 7, first analyzer 8, first photoelectric detector 9, second 1/4 wave plate 10, second analyzer 11, second photoelectric detector 12, interference signal processing unit 13.
The polarization beam splitter prism 3 can be formed by bonding two right-angle surfaces of a right-angle prism with the same structure size, the bevel edges of the two right-angle prisms are respectively a surface A and a surface B, the third surface of the polarization beam splitter prism 3 is a surface C, and a layer of polarization beam splitting film is plated on the bonding surface D. The appropriate areas of the surface A and the surface B are plated with reflecting films, so that light beams incident from the surface A are reflected by the surface A and the surface B after being split at the bonding surface D, namely the polarization splitting surface, and then are emitted from the surface C in parallel, or S light and P light incident from the surface C are reflected by the surface A and the surface B and then are emitted from the surface B after being combined at the polarization splitting surface D. And proper areas of the surface A and the surface B for light incidence and emergence are plated with anti-reflection grinding. The space distance of the emergent parallel light can be adjusted by adjusting the incident point of the incident light on the surface A.
The single-frequency laser source 1 emits a beam of 45-degree linearly polarized light, the linearly polarized light enters from the surface A of the polarization splitting prism 3 through the polarizer 2, the P component penetrates through the polarization splitting surface D and is reflected by the surface B and then exits from the surface C, and the S component is reflected by the polarization splitting surface D and the surface A in sequence and then exits from the surface C. The P light emitted from the surface C is spatially parallel to the S light.
The P light and the S light split by the polarization beam splitter 3 pass through a first 1/4 wave plate 4 with an azimuth angle of 45 degrees and then become two beams of orthogonal circularly polarized light, and after being reflected by a measurement reflector 6 and a reference reflector 5 respectively, the original path returns to pass through a first 1/4 wave plate 4 again, the polarization state is changed by 90 degrees, the measurement light P light becomes the S light, the reference light S light becomes the P light, the P light and the S light are incident from the C surface of the polarization beam splitter 3, then are combined by a polarization beam splitting surface D, and are emitted from the B surface of the polarization beam splitter 3.
The combined emergent light is vertically incidentThrough the semi-transmitting semi-reflecting beam splitter prism 7, the transmission light passes through the first analyzer 8 and the first photodetector 9 to obtain an interference signal VIThe reflected light passes through a second 1/4 wave plate 10 with an azimuth angle of 0 ° and then passes through a second analyzer 11 and a second photodetector 12 to become an interference signal VQ. Two orthogonal interference signals VIAnd VQAnd an interference signal processing unit 13.
When the practical measurement is carried out by using the embodiment, firstly, the azimuth angle theta of the polarizer 2 is adjusted to be 0 DEG, all the optical pieces are kept static, and the light intensity measured by the photoelectric detector is as follows:
wherein A isIx、AQxThe light intensity measured by the first photodetector and the light intensity measured by the second photodetector are the light intensity of the P component after passing through the whole interference device.
Keeping other optical pieces still, adjusting the azimuth angle theta of the polarizer 2 to be 90 degrees, wherein the light intensity measured by the photoelectric detector is as follows:
wherein A isIy、AQyThe light intensity measured by the first photodetector and the second photodetector respectively, that is, the light intensity of the S component after passing through the whole interference device.
The polarizer azimuth angle theta is adjusted to be 45 degrees, and the measured value is measured. The light intensity (i.e., interference signal) measured by the photodetector at this time is:
considering the extinction ratio of the polarizing beam splitter 3 to be 1 × 10-3In the embodiment, the measurement light and the reference light pass through the polarization beam splitter prism for 2 times, and the extinction ratio is 10-6Above, therefore, the phase error caused by the polarization leakageAnd can be ignored. The measuring device is preferably used for the application that the positions of the reference mirror and the measuring mirror are fixed, such as the measurement of the refractive index of liquid and gas; or the use of a displacement scanning stage in which the measurement mirror has only a small displacement, e.g. on the order of nanometers. Under the two measurement conditions, the measurement light beam and the reference light beam are balanced, the dead range is minimized, the influence of environmental disturbance on light intensity and phase shift can be greatly inhibited, and the non-orthogonal error gamma can be considered as zero. At this time, the light intensity (i.e., interference signal) is:
thus, the quadrature interference signal after the direct current offset and the signal amplitude correction can be obtained by the following formula:
at this time, the phase difference caused by the measurement amount is:
by adjusting the azimuth angle of the polarizer 2, error correction is carried out in real time in actual measurement, an ideal orthogonal interference signal is obtained, and the measurement precision is improved.
Claims (1)
1. A testing method based on a reflection type phase quadrature single-frequency laser interference measuring device comprises a single-frequency laser source, a polarizer, a polarization beam splitter prism, a first 1/4 wave plate, a reference reflector, a measuring reflector, a semi-transparent semi-reflective beam splitter prism, a first analyzer, a first photoelectric detector, a second 1/4 wave plate, a second analyzer, a second photoelectric detector and an interference signal processing unit;
the polarization beam splitter prism is formed by bonding right-angle surfaces of two right-angle prisms with the same structure and size, the bevel edges of the two right-angle prisms are a surface A and a surface B respectively, the third surface of the polarization beam splitter prism is a surface C, and a layer of polarization beam splitting film is plated on a bonding surface D;
the single-frequency laser source emits 45-degree polarized light, the 45-degree polarized light enters from a surface A of the polarization splitting prism after passing through the polarizer, a P component penetrates through a polarization splitting surface D and then is reflected by a surface B and then exits from a surface C, an S component is reflected by the polarization splitting surface D and the surface A in sequence and then exits from the surface C, and the P light exiting from the surface C is parallel to the S light in space;
the P light and the S light split by the polarization beam splitter prism pass through a first 1/4 wave plate with an azimuth angle of 45 degrees to become two beams of orthogonal circularly polarized light, the two beams of orthogonal circularly polarized light are reflected by a measuring reflector and a reference reflector respectively, the original path returns to change the polarization state by 90 degrees through a first 1/4 wave plate again, the P light of the measuring light is changed into the S light, the S light of the reference light is changed into the P light, the P light and the S light of the reference light are combined through a polarization beam splitting surface D after entering from a surface C of the polarization beam splitter prism and are emitted from a surface B of the polarization beam splitter prism;
the combined emergent light vertically enters and passes through the semi-transparent semi-reflecting beam splitter prism, and the transmitted light passes through the first analyzer and the first photodetector to obtain an interference signal VIThe reflected light passes through a second 1/4 wave plate with the azimuth angle of 0 degree, and then passes through a second analyzer and a second photodetector to become an interference signal VQTwo orthogonal interference signals VIAnd VQSending interference signal processing unit;
the method specifically comprises the following steps:
1) firstly, the azimuth angle theta of the polarizer is adjusted to be 0 DEG, all optical pieces in the device are kept static, after light emitted by the single-frequency laser source passes through the device, the light intensity measured by the photoelectric detector is as follows:
AIx、AQxthe light intensity measured by the first photoelectric detector and the second photoelectric detector respectively;
2) other optical parts are kept still in the device, the azimuth angle theta of the polarizer is adjusted to be 90 degrees, and after light emitted by the single-frequency laser source passes through the device, the light intensity measured by the photoelectric detector at the moment is as follows:
AIy、AQythe light intensity measured by the first photoelectric detector and the second photoelectric detector respectively;
3) keeping other optical parts in the device still, adjusting polarizer azimuth theta to 45 degrees, after the light emitted by the single-frequency laser source passes through the device, the interference signal measured by the photoelectric detector at the moment is as follows:
the extinction ratio of the polarizing beam splitter is 1 × 10-3Above, the non-orthogonal error γ can be considered to be zero;
4) finally, the orthogonal interference signals after the direct current offset and the signal amplitude correction are obtained as follows:
the phase difference caused by the measurement quantity is:
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1320812A (en) * | 2000-04-24 | 2001-11-07 | 周晟 | Phase difference measurer and heterodyne interference measuring system using it |
US6519042B1 (en) * | 2000-08-25 | 2003-02-11 | Industrial Technology Research Institute | Interferometer system for displacement and straightness measurements |
CN101839686A (en) * | 2010-03-26 | 2010-09-22 | 中国计量科学研究院 | Nonlinear error correction method of laser interferometer, device and interferometer applying method and device |
CN201974286U (en) * | 2010-11-19 | 2011-09-14 | 福建师范大学 | 30 DEG optical splitter checking device for checking lens face shape deflection |
CN103411689A (en) * | 2013-08-29 | 2013-11-27 | 浙江理工大学 | Laser wavelength direct measurement method and device based on single frequency orthogonal linearly polarized light |
CN104748672A (en) * | 2015-03-05 | 2015-07-01 | 哈尔滨工业大学 | Interference-mount separating type nonlinear error correcting method and device for single-frequency laser interferometer |
CN106225667A (en) * | 2016-08-05 | 2016-12-14 | 合肥工业大学 | A kind of single frequency laser interferometer nonlinear error compensation device |
-
2019
- 2019-08-22 CN CN201910777593.5A patent/CN110487173B/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1320812A (en) * | 2000-04-24 | 2001-11-07 | 周晟 | Phase difference measurer and heterodyne interference measuring system using it |
US6519042B1 (en) * | 2000-08-25 | 2003-02-11 | Industrial Technology Research Institute | Interferometer system for displacement and straightness measurements |
CN101839686A (en) * | 2010-03-26 | 2010-09-22 | 中国计量科学研究院 | Nonlinear error correction method of laser interferometer, device and interferometer applying method and device |
CN201974286U (en) * | 2010-11-19 | 2011-09-14 | 福建师范大学 | 30 DEG optical splitter checking device for checking lens face shape deflection |
CN103411689A (en) * | 2013-08-29 | 2013-11-27 | 浙江理工大学 | Laser wavelength direct measurement method and device based on single frequency orthogonal linearly polarized light |
CN104748672A (en) * | 2015-03-05 | 2015-07-01 | 哈尔滨工业大学 | Interference-mount separating type nonlinear error correcting method and device for single-frequency laser interferometer |
CN106225667A (en) * | 2016-08-05 | 2016-12-14 | 合肥工业大学 | A kind of single frequency laser interferometer nonlinear error compensation device |
Non-Patent Citations (1)
Title |
---|
外差激光干涉仪非线性误差分析及测量;乐燕芬等;《外差激光干涉仪非线性误差分析及测量》;20161231;第051203-1至051203-10页 * |
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