CN110411718A - High reflection element reflectivity and absorption method for real-time measurement under CW Laser - Google Patents
High reflection element reflectivity and absorption method for real-time measurement under CW Laser Download PDFInfo
- Publication number
- CN110411718A CN110411718A CN201910716817.1A CN201910716817A CN110411718A CN 110411718 A CN110411718 A CN 110411718A CN 201910716817 A CN201910716817 A CN 201910716817A CN 110411718 A CN110411718 A CN 110411718A
- Authority
- CN
- China
- Prior art keywords
- laser
- high reflection
- reflectivity
- real
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002310 reflectometry Methods 0.000 title claims abstract description 62
- 238000010521 absorption reaction Methods 0.000 title claims abstract description 37
- 238000005259 measurement Methods 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 31
- 230000003287 optical effect Effects 0.000 claims abstract description 93
- 230000008859 change Effects 0.000 claims abstract description 34
- 230000008569 process Effects 0.000 claims abstract description 10
- 238000005516 engineering process Methods 0.000 claims abstract description 8
- 238000012360 testing method Methods 0.000 claims description 16
- 238000001514 detection method Methods 0.000 claims description 10
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 230000007423 decrease Effects 0.000 claims description 3
- 238000006073 displacement reaction Methods 0.000 claims description 2
- 238000005286 illumination Methods 0.000 claims description 2
- 238000005375 photometry Methods 0.000 claims description 2
- 238000012544 monitoring process Methods 0.000 abstract description 3
- 239000006096 absorbing agent Substances 0.000 description 4
- 238000000691 measurement method Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000005457 optimization Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000007707 calorimetry Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/04—Optical benches therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The invention discloses high reflection elements under CW Laser reflectivity and absorb method for real-time measurement, using the real-time change of thermal lens measuring technique monitoring high reflection optical element absorption loss during laser irradiation, the real-time change of high reflection optical element reflectivity during laser irradiation is monitored simultaneously using optical cavity ring-down technology.The present invention can measure reflectivity and the absorption of high reflection optical element simultaneously, can monitor the dynamic changing process of high reflection optical element reflectivity and absorption during laser irradiation, facilitate the stability and service life of assessing optical element.
Description
Technical field
The present invention relates to the measurement methods of a kind of pair of optical component parameter, and especially high reflection element is in CW Laser
Lower reflectivity and absorption method for real-time measurement.
Background technique
With the fast development of science and technology being constantly progressive with laser system, especially high power laser system in recent years
Fast development, laser reflection optical element (normal mirror, deformation reflection mirror, tilting mirror etc.) is proposed more stringent
It is required that.The reflectivity of reflective optical devices and absorption directly affect the performance indicator of laser system, therefore in high power system
Reflective optical devices reflectivity is typically greater than 99.9%, absorbs and is less than 100ppm.General high reflection optical element factory at present
Before, its reflectivity and absorption characteristic need to be measured.Absorptiometry generally uses international standard laser calorimetry
(ISO11551:2003 (E)-Test method for absorptance of optical laser components) is surveyed
Its absorption loss for accompanying plating test film is measured, its advantage is that absorbing absolute value measurement, measurement sensitivity is high, the disadvantage is that sample size is solid
Fixed, temporal resolution is low, can not achieve on-line measurement;High reflectance generally uses optical cavity ring-down technology to measure.However these property
The qualified high reflection optical element of energy, under Irradiation of High, there may be colour center and other physics or changes for material internal
Process leads to its optical property reflectivity and absorbs slowly to decline, until catastrophic failure occurs, optical element uses the longevity
Life termination.Therefore the real-time change of measurement and real-time monitoring high reflection optical element reflectivity and absorption under high power laser light irradiation
Change and long-time stability to develop high optical property, the optical element of long life, reduce laser system use cost and
Maintenance cost is of great significance.
Various measurement methods were all in relatively weak Laser Measuring to the reflectivity of optical element and the measurement of absorption in the past
Test ring border, the measurement result surveyed cannot reflect situation of the optical element in practical high power laser light irradiation running environment.And
And its reflectivity and absorption were generally measured using different device respectively in the past, it cannot be guaranteed that its test is the same position, member
Part is in the same state, and device is complicated, troublesome in poeration, cannot achieve while on-line measurement.In order to preferably assess
High reflection optical element works online performance in high power laser light radiation environment, apparent high reflection optical element performance variation rule
Rule and service life further improve thin-film-coating technique, guarantee laser system long-time steady operation, develop a kind of while supervising
It is very necessary for surveying high reflection optical element method of reflectivity and absorption real-time change under CW Laser.
Summary of the invention
Purpose of the present invention technology solves the problems, such as: overcoming the shortcomings of existing reflectivity and absorption measurement techniques, provides one kind
The measurement method of high reflection optical element reflectivity and Change of absorption under laser irradiation is monitored simultaneously, is optical element laser irradiation
Lower optical performance stability and service life assessment provide technological means.This method can be monitored in real time high reflection optical element and exist
High power laser light irradiates the real-time change situation of lower reflectivity, and have many advantages, such as structure simply, it is high sensitivity, practical.
The technical solution adopted by the present invention is that measuring optics member respectively using optical cavity ring-down technology and surface thermal lensing technique
The reflectivity of part and absorption in the irradiation time of irradiation laser, while monitoring the ring-down time and surface heat penetration of its test chamber
The real-time change situation of optical element reflectivity to be measured and absorption is obtained by calculation in mirror signal.
Specific implementation step is as follows:
(1) irradiation laser light source 1 exports a branch of continuous irradiation laser beam by 2 focusing illumination of condenser lens to height to be measured
3 surface of reflective optical devices, reflectivity detecting laser 4 export a branch of reflectivity exploring laser light light beam coupling enter it is stable
Optical resonator uses optical cavity ring-down technology before laser irradiation, is measured using the first photodetector 8 by a plane mirror 5
Initial optical resonant cavity (a length of L of chamber formed with the first hysteroscope 6, the second hysteroscope 70) output decline and swing signal, fitting obtains just
Beginning optical resonator ring-down time τ0;After high reflection optical element 3 to be measured is added, is formed by high reflection optical element 3 to be measured, put down
Steady testing optical resonator (a length of L of chamber of face mirror 5 and the first hysteroscope 6, the second hysteroscope 7 composition1), use the first photodetection
Device 8, which measures its output and declines, swings signal, and fitting obtains the ring-down time τ of test optical resonator1, it is computed available high reflection
Reflectivity R=(the L of optical element0/cτ0-L1/cτ1), c is the light velocity;Optical cavity is tested in record continuous irradiation laser irradiation process
Thus the real-time change curve τ (t) of ring-down time at any time obtains the reflectivity real-time change of high reflection optical element 3 to be measured
Curve R (t)=(L0/cτ0-L1/cτ(t))。
(2) simultaneously 9 output power of absorptivity detecting laser is absorbed in the continuous laser beam of milliwatt or sub- milliwatt magnitude
Exploring laser light light beam passes through reflecting mirror 10, is incident on the identical table that high reflection optical element 3 to be measured is illuminated laser beam irradiation
Face region, with an aperture 11 and 12 measurement in a closed series of the second photodetector from 3 surface reflection of high reflection optical element to be measured
Exploring laser light light beam center of maximum light intensity changes delta I and irradiation laser irradiate before exploring laser light light beam center light it is tetanic
Flow valuve I0, obtain the opposite changes delta S=Δ I/ of maximum of absorbing detection laser beam central light strength in irradiation laser irradiation process
I0, i.e. surface thermal lens signal, and absolute value α is lost with known absorbing0Sample, under low-power laser irradiation, to surface heat
Lens signal Δ S0It is calibrated, obtains the calibration coefficient C=Δ S of the corresponding absorption loss value of surface thermal lens signal0/α0;Note
Record real-time change curve Δ S (t)=Δ I (the t)/I of surface thermal lens signal at any time in irradiation laser irradiation process0, Δ I
(t) it is the center of maximum light intensity real-time change amount of absorbing detection laser beam, thus obtains the suction of high reflection optical element 3 to be measured
Receive real-time change curve α (t)=C × d Δ S (t)/dt;Two-way measures simultaneously, will be by 8 real-time measurement of the first photodetector
It declines and swings the surface thermal lens signal of 12 real-time measurement of signal and the second photodetector, be transferred to computer 15, by locating in real time
Reason software obtains reflectivity and absorbs real-time change curve.
Wherein, the first hysteroscope 6, the second hysteroscope 7 of the composition initial optical resonant cavity and test optical resonator are flat
The reflectivity of recessed high reflection mirror, plano-concave high reflection mirror is all larger than 99%.
Wherein, the center of the continuous irradiation laser beam and absorption/reflection rate exploring laser light light beam is tested
High reflection optical element surface is overlapped, and in the hot spot of tested high reflection optical element surface position absorbing detection laser beam
Size is the 2 times or more of irradiation laser light beam, the spot size of reflectivity exploring laser light light beam as far as possible with irradiation laser light beam phase
Deng.
Wherein, the aperture in the aperture and the combination of the second photodetector is located at high reflection optics to be measured
After element, before the second photodetector test surface, and the bore of aperture is less than irradiation laser light beam tested high anti-
Penetrate the spot size of optical element surface position.
Wherein, the reflectivity detecting laser can be continuous laser or pulse laser.
Wherein, described its beam quality of absorptivity exploring laser light is better, and wavelength is shorter, and absorptiometry precision is higher.
Wherein, power density of the exposure beam at sample can be by changing laser output power or leading to
Cross mobile lens position change spot size.
Wherein, when less than 99% or under laser irradiation, reflectivity changes are greater than high reflection optical element reflectivity to be measured
When 0.5%, the second hysteroscope 7 can be moved away, using photometry real-time measurement reflectivity changes.
Wherein, high reflection optical element to be measured can be placed on two-dimension displacement platform, realize Two Dimensional Uniform scanning survey.
The invention has the following advantages over the prior art:
(1) present invention can measure the absorption loss and reflectivity of high reflection optical element simultaneously, be used for various laser systems
Performance detection, assessment optimization and the quality control of middle High-performance lasers element, structure is simple, and measurement accuracy is high, and a machine is more
With having saved cost.
(2) present invention can monitor optical element absorption loss and the change of the dynamic of reflectivity during optical element laser irradiation
Change process helps to study its Related Mechanism, provides stability test platform in high counterelement laser irradiation, facilitates height
The optimization and improvement of anti-optical element preparation process.
(3) present invention can be used under varying environment (vacuum, alternating temperature, electron irradiation, space-pollution etc.) high reflection optics member
Part reflectivity and absorption real-time measurement, facilitate the development for pushing very high performance laser diode.
Detailed description of the invention
Fig. 1 is high anti-optical element reflectivity and Change of absorption measuring device schematic diagram under laser irradiation of the invention;
Fig. 2 is the signal of optical element to be measured of the invention reflectivity and absorption real-time change under high power laser light irradiation
Figure;
In figure: 1 is irradiation laser light source, and 2 be condenser lens, and 3 be high reflection optical element to be measured, and 4 detect for reflectivity
Laser, 5 be plane mirror, and 6 be the first hysteroscope, and 7 be the second hysteroscope, and 8 be the first photodetector, and 9 be absorptivity exploring laser light
Device, 10 be reflecting mirror, and 11 be aperture, and 12 be the second photodetector, and 13 be the first absorber of light, and 14 be the first light absorption
Body, 15 be computer.
Specific embodiment
With reference to the accompanying drawing and specific embodiment further illustrates the present invention.
As shown in Figure 1, test device of the invention is by irradiation laser light source 1, condenser lens 2, high reflection optics to be measured member
Part 3, reflectivity detecting laser 4, plane mirror 5, the first hysteroscope 6, the second hysteroscope 7, the first photodetector 8, the second photoelectricity are visited
Survey device 12, absorptivity detecting laser 9, reflecting mirror 10, aperture 11, the first absorber of light 13, the second absorber of light 14, meter
Calculation machine 15 forms.The output beam line focus lens 2 of irradiation laser light source 1 focus on anti-3 surface of optical element of height to be measured, penetrate
The laser of high reflection optical element 3 to be measured is absorbed by the first absorber of light 13.Reflectivity detecting laser 4 exports a branch of reflectivity
Exploring laser light light beam coupling enters stable optical resonator, and optical cavity ring-down technology is used before laser irradiation, uses first
Photodetector 8 measures initial optical resonant cavity (a length of L of chamber being made of plane mirror 5 and the first hysteroscope 6, the second hysteroscope 70)
Output, which declines, swings signal, and fitting obtains initial optical resonant cavity ring-down time τ0;After high reflection optical element 3 to be measured is added, formed
Steady testing optical resonator (the chamber being made of high reflection optical element 3 to be measured, plane mirror 5 and the first hysteroscope 6, the second hysteroscope 7
A length of L1), using the measurement of the first photodetector 8, its output declines and swings signal, and fitting obtains the declining when swinging of test optical resonator
Between τ1, it is computed the reflectivity R=(L of available high reflection optical element0/cτ0-L1/cτ1), c is the light velocity;Record irradiation swashs
The real-time change curve τ (t) of optical cavity ring-down time at any time is tested in light irradiation process, thus obtains high reflection optics member to be measured
The reflectivity real-time change curve R (t) of part 3=(L0/cτ0-L1/cτ(t))。
9 output power of absorptivity detecting laser is in the continuous laser beam of milliwatt or sub- milliwatt magnitude, i.e. absorptivity simultaneously
Exploring laser light light beam passes through reflecting mirror 10, is incident on the identical table that high reflection optical element 3 to be measured is illuminated laser beam irradiation
Face region, with an aperture 11 and 12 measurement in a closed series of the second photodetector from 3 surface reflection of high reflection optical element to be measured
Exploring laser light light beam center of maximum light intensity changes delta I and irradiation laser irradiate before exploring laser light light beam center light it is tetanic
Flow valuve I0, obtain the opposite changes delta S=Δ I/ of maximum of absorbing detection laser beam central light strength in irradiation laser irradiation process
I0, i.e. surface thermal lens signal, and absolute value α is lost with known absorbing0Sample, under low-power laser irradiation, to surface heat
Lens signal Δ S0It is calibrated, obtains the calibration coefficient C=Δ S of the corresponding absorption loss value of surface thermal lens signal0/α0;Note
Record real-time change curve Δ S (t)=Δ I (the t)/I of surface thermal lens signal at any time in irradiation laser irradiation process0, Δ I
(t) it is the center of maximum light intensity real-time change amount of absorbing detection laser beam, thus obtains the suction of high reflection optical element 3 to be measured
Receive real-time change curve α (t)=C × d Δ S (t)/dt;Two-way measures simultaneously, will be by 8 real-time measurement of the first photodetector
It declines and swings the surface thermal lens signal of 12 real-time measurement of signal and the second photodetector, be transferred to computer 15, by locating in real time
Reason software obtains reflectivity and absorbs real-time change curve.
Claims (9)
1. high reflection element reflectivity and absorption method for real-time measurement under CW Laser, which is characterized in that steps are as follows:
Step (1) irradiation laser light source (1) export a branch of continuous irradiation laser beam by condenser lens (2) focusing illumination to
High reflection optical element (3) surface is surveyed, reflectivity detecting laser (4) exports a branch of reflectivity exploring laser light light beam coupling and enters
To stable optical resonator, optical cavity ring-down technology is used before laser irradiation, is measured using the first photodetector (8) by one
The a length of L of chamber of a plane mirror (5) and the first hysteroscope (6), the second hysteroscope (7) composition0The output of initial optical resonant cavity decline and swing
Signal, fitting obtain initial optical resonant cavity ring-down time τ0;After high reflection optical element (3) to be measured is added, formed by be measured
The a length of L of chamber of high reflection optical element (3), plane mirror (5) and the first hysteroscope (6), the second hysteroscope (7) composition1Steady testing
Optical resonator is measured its output and is declined and swings signal using the first photodetector (8), and fitting obtains declining for test optical resonator
Swing time τ1, it is computed the reflectivity R=(L of available high reflection optical element0/cτ0-L1/cτ1), c is the light velocity;Record connects
Thus the real-time change curve τ (t) of test optical cavity ring-down time at any time in continuous irradiation laser irradiation process obtains to be measured high anti-
Penetrate reflectivity real-time change curve R (t)=(L of optical element (3)0/cτ0-L1/cτ(t));
Step (2) simultaneously inhale in the continuous laser beam of milliwatt or sub- milliwatt magnitude by absorptivity detecting laser (9) output power
It receives exploring laser light light beam and passes through reflecting mirror (10), be incident on high reflection optical element (3) to be measured and be illuminated laser beam irradiation
Similar face region, with an aperture (11) and (12) measurement in a closed series of the second photodetector from high reflection optical element to be measured
(3) exploring laser light light beam before the center of maximum light intensity changes delta I of the exploring laser light light beam of surface reflection and irradiation laser irradiate
Central light strength D. C. value I0, obtain the opposite change of maximum of absorbing detection laser beam central light strength in irradiation laser irradiation process
Change Δ S=Δ I/I0, i.e. surface thermal lens signal, and absolute value α is lost with known absorbing0Sample, in low-power laser irradiation
Under, to surface thermal lens signal Δ S0It is calibrated, obtains the calibration coefficient C of the corresponding absorption loss value of surface thermal lens signal
=Δ S0/α0;Record real-time change curve Δ S (the t)=Δ I of surface thermal lens signal at any time in irradiation laser irradiation process
(t)/I0, Δ I (t) is the center of maximum light intensity real-time change amount of absorbing detection laser beam, thus obtains high reflection light to be measured
Learn absorption real-time change curve α (t)=C × d Δ S (the t)/dt of element (3);Two-way measures simultaneously, will be by the first photodetection
The surface thermal lens signal of signal and the second photodetector (12) real-time measurement is swung in declining for device (8) real-time measurement, is transferred to meter
Calculation machine (15) obtains reflectivity by real-time processing software and absorbs real-time change curve.
2. high reflection element according to claim 1 reflectivity and absorption method for real-time measurement under CW Laser,
It is characterized by: the first hysteroscope (6), the second hysteroscope (7) of the composition initial optical resonant cavity and test optical resonator are
Two pieces of plano-concave high reflection mirrors, the reflectivity of plano-concave high reflection mirror are all larger than 99%.
3. high reflection element according to claim 1 reflectivity and absorption method for real-time measurement under CW Laser,
It is characterized by: the center of continuous irradiation laser beam and absorption/reflection rate exploring laser light light beam is in the measured optical unit
Surface is overlapped, and is irradiation laser light beam in the spot size of the measured optical unit surface location absorbing detection laser beam
2 times or more, the spot size of reflected detection laser light light beam are equal with irradiation laser light beam as far as possible.
4. high reflection element according to claim 1 reflectivity and absorption method for real-time measurement under CW Laser,
It is characterized by: aperture and the second photodetector combination in aperture be located at high reflection optical element to be measured it
Afterwards, before the second photodetector test surface, and the bore of aperture is less than irradiation laser light beam in tested high reflection optics
The spot size of element surface position.
5. high reflection element according to claim 1 reflectivity and absorption method for real-time measurement under CW Laser,
It is characterized by: the reflectivity detecting laser can be continuous laser or pulse laser.
6. high reflection element according to claim 1 reflectivity and absorption method for real-time measurement under CW Laser,
It is characterized by: described its beam quality of absorptivity exploring laser light is better, wavelength is shorter, and absorptiometry precision is higher.
7. high reflection element according to claim 1 reflectivity and absorption method for real-time measurement under CW Laser,
It is characterized by: power density of the exposure beam at sample can be by changing laser output power or passing through
Mobile lens position change spot size.
8. high reflection element according to claim 1 reflectivity and absorption method for real-time measurement under CW Laser,
It is characterized by: when less than 99% or under laser irradiation, reflectivity changes are greater than 0.5% to high reflection optical element reflectivity to be measured
When, the second hysteroscope (7) can be moved away, using photometry real-time measurement reflectivity changes.
9. high reflection element according to claim 1 reflectivity and absorption method for real-time measurement under CW Laser,
It is characterized by: high reflection optical element to be measured can be placed on two-dimension displacement platform, Two Dimensional Uniform scanning survey is realized.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910716817.1A CN110411718A (en) | 2019-08-05 | 2019-08-05 | High reflection element reflectivity and absorption method for real-time measurement under CW Laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910716817.1A CN110411718A (en) | 2019-08-05 | 2019-08-05 | High reflection element reflectivity and absorption method for real-time measurement under CW Laser |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110411718A true CN110411718A (en) | 2019-11-05 |
Family
ID=68365828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910716817.1A Pending CN110411718A (en) | 2019-08-05 | 2019-08-05 | High reflection element reflectivity and absorption method for real-time measurement under CW Laser |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110411718A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113125368A (en) * | 2021-05-13 | 2021-07-16 | 北京环境特性研究所 | Aerosol extinction instrument and measurement method thereof |
CN113176220A (en) * | 2021-05-13 | 2021-07-27 | 北京环境特性研究所 | Gas detector and detection method thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1971233A (en) * | 2006-12-13 | 2007-05-30 | 中国科学院光电技术研究所 | Method for simultaneously measuring absorption loss and surface thermal deformation of optical element |
CN101082537A (en) * | 2007-07-12 | 2007-12-05 | 中国科学院光电技术研究所 | Method for measuring absorption loss of optical film |
CN102169050A (en) * | 2010-12-17 | 2011-08-31 | 中国科学院光电技术研究所 | Comprehensive measurement method for reflectivity |
CN102175427A (en) * | 2010-12-31 | 2011-09-07 | 中国科学院光电技术研究所 | Comprehensive test method for stability of deep ultraviolet optical element |
CN102252828A (en) * | 2011-04-19 | 2011-11-23 | 中国科学院光电技术研究所 | Method for monitoring real-time change of reflectivity of high-reflection optical element under laser irradiation |
CN103616164A (en) * | 2013-11-28 | 2014-03-05 | 中国科学院光电技术研究所 | Reflectivity/transmittance comprehensive measurement method based on pulse laser light source |
-
2019
- 2019-08-05 CN CN201910716817.1A patent/CN110411718A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1971233A (en) * | 2006-12-13 | 2007-05-30 | 中国科学院光电技术研究所 | Method for simultaneously measuring absorption loss and surface thermal deformation of optical element |
CN101082537A (en) * | 2007-07-12 | 2007-12-05 | 中国科学院光电技术研究所 | Method for measuring absorption loss of optical film |
CN102169050A (en) * | 2010-12-17 | 2011-08-31 | 中国科学院光电技术研究所 | Comprehensive measurement method for reflectivity |
CN102175427A (en) * | 2010-12-31 | 2011-09-07 | 中国科学院光电技术研究所 | Comprehensive test method for stability of deep ultraviolet optical element |
CN102252828A (en) * | 2011-04-19 | 2011-11-23 | 中国科学院光电技术研究所 | Method for monitoring real-time change of reflectivity of high-reflection optical element under laser irradiation |
CN103616164A (en) * | 2013-11-28 | 2014-03-05 | 中国科学院光电技术研究所 | Reflectivity/transmittance comprehensive measurement method based on pulse laser light source |
Non-Patent Citations (2)
Title |
---|
杨富 等: "《10 .6μm 激光辐照下光学薄膜的微弱吸收测量》", 《强激光与粒子束》 * |
黄祖鑫: "《光学元件微吸收特性测量仪的研制》", 《强激光与粒子束》 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113125368A (en) * | 2021-05-13 | 2021-07-16 | 北京环境特性研究所 | Aerosol extinction instrument and measurement method thereof |
CN113176220A (en) * | 2021-05-13 | 2021-07-27 | 北京环境特性研究所 | Gas detector and detection method thereof |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN112033644B (en) | High-reflection sample laser damage threshold testing device | |
CN111504612B (en) | Testing arrangement of many light sources laser damage threshold value | |
CN107132029B (en) | Method for simultaneously measuring reflectivity, transmittance, scattering loss and absorption loss of high-reflection/high-transmission optical element | |
US10739191B2 (en) | Determining a beam profile of a laser beam | |
CN113092077B (en) | Lens refractive index measuring device and measuring method thereof | |
Eickhoff et al. | Measuring method for the refractive index profile of optical glass fibres | |
CN110411718A (en) | High reflection element reflectivity and absorption method for real-time measurement under CW Laser | |
CN104897591A (en) | Sample measuring device | |
CN107655599A (en) | A kind of measuring method of optical element minimal stress | |
CN204694626U (en) | Sample measuring device | |
CN210863101U (en) | Lens refractive index measuring device | |
CN102252828B (en) | Method for monitoring real-time change of reflectivity of high-reflection optical element under laser irradiation | |
CN112834462A (en) | Method for measuring reflectivity of reflector | |
CN109900737A (en) | Optical element weak absorbing test device and method based on equivalent temperature | |
CN110579284B (en) | Interference type laser wavelength measuring device and use method thereof | |
CN106404695B (en) | Spectrophotometer | |
CN108572160B (en) | Refractometer for measuring refractive index distribution | |
CN215865737U (en) | Lens refractive index measuring device | |
CN105115698A (en) | Comprehensive testing system for semiconductor laser cavity surface failure analysis | |
CN104155085B (en) | Large-diameter sampling split plate sampling rate testing device and testing method | |
CN115436326B (en) | Method and device for measuring material protection threshold | |
CN213714690U (en) | X-ray focusing lens refraction performance testing device | |
CN109297591A (en) | Myriawatt power meter | |
CN114894124B (en) | Interference type angle measurement system and measurement method | |
CN215893966U (en) | High-transmissivity and high-reflectivity measuring device for optical element |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20191105 |
|
RJ01 | Rejection of invention patent application after publication |