CN107655599A - A kind of measuring method of optical element minimal stress - Google Patents
A kind of measuring method of optical element minimal stress Download PDFInfo
- Publication number
- CN107655599A CN107655599A CN201710826216.7A CN201710826216A CN107655599A CN 107655599 A CN107655599 A CN 107655599A CN 201710826216 A CN201710826216 A CN 201710826216A CN 107655599 A CN107655599 A CN 107655599A
- Authority
- CN
- China
- Prior art keywords
- optical element
- optical
- stress
- measuring method
- laser beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 72
- 238000000034 method Methods 0.000 title claims abstract description 32
- 238000005259 measurement Methods 0.000 claims abstract description 24
- 230000010287 polarization Effects 0.000 claims abstract description 12
- 238000001514 detection method Methods 0.000 claims abstract description 7
- 238000012360 testing method Methods 0.000 claims description 17
- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000004364 calculation method Methods 0.000 claims description 3
- 230000005574 cross-species transmission Effects 0.000 claims description 2
- 230000005622 photoelectricity Effects 0.000 claims description 2
- 230000035945 sensitivity Effects 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 3
- 238000012545 processing Methods 0.000 abstract description 2
- 230000035882 stress Effects 0.000 description 35
- 239000000523 sample Substances 0.000 description 20
- 239000000463 material Substances 0.000 description 5
- 241000931526 Acer campestre Species 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000011900 installation process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/24—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The present invention relates to a kind of measuring method of optical element minimal stress, wherein：A branch of linearly polarized laser of optical resonator is entered, by being emitted after the modulation of birefringence effect caused by the optical element stress to be measured that intracavitary is placed perpendicular to laser beam out of resonator.It is changed into linearly polarized light after the polarization state detection means that emergent light forms through quarter-wave plate and analyzer, is collected after being focused on by condenser lens by photodetector.Incoming laser beam is turned off, produces and gathers optical cavity ring-down signal.The processing of optical cavity ring-down signal fitting is calculated to the stress value of optical element.Technical scheme advantage proposed by the present invention is：System architecture is simple, and measurement sensitivity and precision are high, and compared to traditional S é narmont quarter-wave plate method for measuring stress, measurement sensitivity at least improves three orders of magnitude.
Description
Technical field
The present invention relates to the field of measuring technique of optical material birefringence effect and stress, more particularly to a kind of measurement optics
The method of element minimal stress.
Background technology
In the manufacture of optical element, installation, use and failure procedure, the influence of stress is all widely present.Stress causes
The change of refractive index on optical element, birefringence effect is produced, particularly in high-accuracy optical device and instrument, to stress
In the presence of more sensitive, it is necessary to grasp and control in time caused residual stress during Optical element manufacturing, installation process to introduce
Mechanical stress, caused thermal stress etc. in high power laser application.To meet the high property of precision optics equipment and instrument
Energy high reliability, the stress of accurate measure optical element are particularly important.The method of typical measurement optical element stress is all logical
Cross measurement Retardation and carry out indirect gain stress information.
Traditional stress birfringence method for quantitative measuring has S é narmont quarter-wave plate methods, and monochromatic natural light is successively
Pass through the polarizer, testing sample, quarter-wave plate and analyzer.The polarizer and analyzer light transmission shaft are mutually perpendicular to and difference
It is parallel with quarter-wave plate fast slow axis.Rotary sample and analyzer successively, extinction position is found, answering on sample can be obtained
Power Retardation.Required precision of this method to quarter-wave plate phase retardation and the anglec of rotation is high, accuracy of detection
It is relatively low.
2009, Tian Fenggui et al. (stress of optical glass device and measuring method, application number
200910304198.1, application publication number CN 101592537 A) propose a kind of being total to using transverse zeeman laser composition
The method measurement optical element stress of thang-kng road interferometer, the process employs optical heterodyne principle, will be swashed by semi-transparent semi-reflecting lens
Light is divided into reflected light all the way and all the way transmitted light.Transmitted light is by half-wave plate, optical glass sample and polarizer by detector one
Receive；Another way reflected light is received by polarizer by detector two, and comparator probe one and detector two are mutually counted by position
Phase obtains Retardation caused by sample stress.
2013, Zeng Aijun et al. (measurement apparatus and measuring method of quarter-wave plate phase retardation, application number
201310250418.3 the A of application publication number CN 103335821) propose and a kind of utilize light ball modulator and lock-in amplifier
The method for measuring retardation of wave plate, the light that collimated light source is sent pass through circular polarizer, light ball modulator, wave plate to be measured successively
Photodetector is reached with analyzer is justified.Second harmonic component that photodetector exports and straight is detected by lock-in amplifier
Flow component measures retardation of wave plate.Light ball modulator is the method use, improves measurement cost.
2015, Tan Yidong et al. (a kind of optical material stress measurement system, number of patent application 201510409605.0,
The A of application publication number CN 105043612) propose a kind of output polarization state using half outside gas laser by optical material should
The phenomenon that feedback light after power birefringence modulation influences and polarization state saltus step occurs carries out the scheme of stress birfringence measurement.Exocoel
Long tuning block is modulated to the output light of laser, is incided the back side and has been plated on the testing sample of reflectance coating, is carried on the back from sample
The light feedback of face reflection causes laser output polarization state that saltus step occurs into laserresonator, is jumped by measuring output signal
The change time carrys out the birefringent size of identified sign, therefore measurement accuracy is influenceed by detector response time.
In summary, optical element method for measuring stress is various, respectively there is a feature, and a kind of optical element proposed by the present invention is micro-
The measuring method of small stress, there is simple in measurement system structure, sample nondestructive is hindered, easily regulation, do not fluctuated shadow by the intensity of light source
The advantages that ringing, compared to traditional S é narmont quarter-wave plate method for measuring stress, measurement sensitivity and precision at least improve
Three orders of magnitude, high accuracy and high sensitivity optical element stress measurement demand can be met.
The content of the invention
The technical problem to be solved in the present invention is：How optical element stress to be carried out by simple and reliable method lossless
Detection, particularly accurately measure optical element minimal stress.
To achieve the above object, the present invention proposes following technical scheme：A kind of measurement side of optical element minimal stress
Method, it is characterised in that：
(1) measurement apparatus described in is by LASER Light Source 1, the polarizer 2, plano-concave high reflection mirror 3 and 5, optical element 4 to be measured,
Quarter-wave plate 6, analyzer 7, condenser lens 8 and photodetector 9 are formed.The beam of laser that LASER Light Source 1 is sent is passed through
After the polarizer 2, the linearly polarized light that a branch of azimuth determines is formed.The linearly polarized light is impinged perpendicularly in optical resonator, institute
State optical resonator and stable initial straight chamber, a length of L of resonator are made up of two pieces of identical plano-concave high reflection mirrors 3 and 50；Coupling
The linearly polarized laser beam into optical resonator is closed in intracavitary roundtrip, and placed by the intracavitary perpendicular to laser beam
The modulation of the stress birfringence of optical element 4 to be measured, causes laser energy to be converted between S-polarization and P polarization；Laser beam is in intracavitary
During roundtrip, a part of laser energy is transmitted and impinged perpendicularly on by quarter-wave by plano-concave high reflection mirror 5
The polarization state detection means that piece 6 and analyzer 7 form.Focused on through the laser beam of analyzer 7 by lens 8 and by photodetector
9 collect；Shut-off laser simultaneously collects optical cavity ring-down signal I (t) by detector 9 simultaneously.Intended using non-linear multi-parameter
Conjunction method, optical cavity ring-down signal I (t) is pressed into formulaIt is fitted, can obtain stress
Polarization state frequency of oscillation ω caused by birefringence, then stress birefringence optical path difference OPD be represented byWherein, λ is
The optical maser wavelength of light source 1, c are vacuum light speed；L is test resonator length, passes through formula L=L0+ (n-1) d are calculated；Wherein, L0
Grown for initial cavity, n is optical element refractive index to be measured, and d is optic thickness.By the stress-optics for consulting optical material
The stress σ of optical element can be calculated in constant C and stress-optics formula σ=C × OPD.
(2) laser beam that the light source 1 described in exports is TEM00Mould light beam.
(3) light transmission shaft of the polarizer 2 described in can need to adjust according to test, and outgoing linearly polarized light azimuth can be 0-
Any angle of 180 degree.
(4) optical resonator being made up of plano-concave high reflection mirror 3 and 5 described in is stable cavity, the long L of initial resonant chamber chamber0
Meet 0<L0≤ 2r, wherein r are the radius of curvature of plano-concave high reflection mirror concave surface.
(5) the fast axle angle of the quarter-wave plate 6 described in can need to adjust according to test, and phase retardation can be 0-
Any angle of 180 degree.
(6) light transmission shaft of the analyzer 7 described in can need to adjust according to test, and emergent ray polarization azimuth can be 0-
Any angle of 180 degree.
(7) optical element is parallel plane optical element, optical element perpendicular to laser beam place when front and rear surfaces
Reflected light does not spill over optical resonator.
(8) in the technical scheme described in, for convenience of optical cavity ring-down signal is gathered, threshold triggers circuit monitoring photoelectricity can be used
The output voltage of detector 9, when collection voltages exceed threshold circuit given threshold, the laser beam in resonator is incided in shut-off
And detect optical cavity ring-down signal.
(9) in the technical scheme described in, the laser beam in resonator is incided for convenience of shut-off, square-wave frequency modulation half can be used
Conductor laser, or coordinate electrooptical switching or acoustooptic switch to realize the shut-off of laser beam using continuous He-Ne laser.
Brief description of the drawings
Fig. 1 is the implementation schematic diagram of technical scheme of the present invention；
In Fig. 1：1 is He-Ne lasers；2 be the polarizer；3 and 5 be plano-concave high reflection mirror；4 be optical element to be measured；6 are
Quarter-wave plate；7 be analyzer；8 be condenser lens；9 be photodetector；10 be data acquisition and processing (DAP) computer；11
For threshold triggers circuit；12 be acoustooptic switch；13 be diaphragm.Solid line in figure is light path, and dotted line is signal wire.
Fig. 2 is not add the optical cavity ring-down signal curve collected during sample, mono-exponential fit curve and regression criterion curve.
Fig. 3 is to add optical cavity ring-down signal curve, matched curve and regression criterion that testing sample collects in measurement point
Curve.
Embodiment
A kind of measuring method of optical element minimal stress proposed by the present invention is specifically described with reference to Fig. 1, but should
Work as understanding, being provided only for accompanying drawing more fully understands the present invention, and they should not be interpreted as limitation of the present invention.Specifically
Implementation steps are as follows：
(1) initial light cavity-type BPM system is built.Xyz coordinate systems shown in Fig. 1 are defined as laboratory coordinate system, that is, in testing
As reference frame, in paper, y directions are that vertical paper projects direction in wherein xz directions.
A. light source 1 and acoustooptic switch 12 are adjusted so that acoustooptic switch outgoing beam projects along laboratory coordinate system z directions, and
Impinged perpendicularly on by diaphragm 13 in the polarizer 2.
B. the polarizer 2 is rotated so that the parallel y-axis of the light transmission shaft of the polarizer 2, now, from the linearly polarized light side that the polarizer 2 is emitted
Parallactic angle is 90 degree.
C. plano-concave high reflection mirror 3 and 5, testing sample 4, quarter-wave plate 6, analyzer 7 are removed, adjusts condenser lens
8 and photodetector 9 so that photodetector 9 can detect whole light of the outgoing of the polarizer 2.Analyzer 7 is inserted, rotates analyzing
Device 7 make it that the detection signal of photodetector 9 is zero.Now, it is 0 degree to be emitted linearly polarized light azimuth from analyzer 7.
D. quarter-wave plate 6 is inserted into light path, rotation quarter-wave plate 6 make it that its phase retardation is 45
Degree.
E. plano-concave high reflection mirror 3 and 5 is inserted, forms initial resonant chamber, a length of L of adjustment resonator0, now, can be from meter
Calculation machine 10 observes the outgoing optical signal of initial resonant chamber.
F. the threshold value of given threshold triggers circuit 11 is V0, when the output voltage signal of detector 9 is more than V0When, threshold triggers
Circuit 11 sends trigger signal to acoustooptic switch 12 and computer 10.Now, acoustooptic switch 12 is closed, and laser beam is hidden by diaphragm 13
Gear, computer 10 collect the optical cavity ring-down signal I of initial resonant chamber0(t).By Single-Index Model formula
It can well be fitted to decline and swing signal I0(t), it is ensured that initial light cavity-type BPM system does not introduce interference.
(2) testing sample stress measurement.Testing sample 4 is inserted into the resonator being made up of plano-concave high reflection mirror 3 and 5
It is interior, adjust sample 4 so that the parallel x/y plane in the surface of sample 4, which that is to say, ensures that laser vertical is incided on sample 4.
A. the threshold value of given threshold triggers circuit 11 is V1, when the output voltage signal of detector 9 is more than V1When, threshold circuit
11 send trigger signal to acoustooptic switch 12 and computer 10.Now, acoustooptic switch 12 is closed, and laser beam is blocked by diaphragm 13,
Computer 10 collects test resonance cavity-type BPM signal I1(t).It will decline and swing signal I1(t) formula is pressedIt is fitted, polarization state frequency of oscillation ω caused by can obtain stress birfringence, then
Stress birefringence optical path difference OPD is represented byWherein, λ is the optical maser wavelength of light source 1, and c is vacuum light speed, and L is
Resonator length is tested, passes through formula L=L0+ (n-1) d are calculated；Wherein, L0Grown for initial resonant chamber chamber, n is to treat photometry member
Part refractive index, d are optic thickness.By the stress-optical constant C and stress-optics formula σ=C that consult optical material
× OPD can try to achieve the stress σ of measurement point size.
B. the linear polarization azimuth of the polarizer 2 is changed, and repeat step a takes multiple measurements and averaged, can improve should
Power measured value σ precision.
In a word, technical scheme proposed by the present invention, easy to operate, nondestructive measurement, not by light source simple with system architecture
The influence of strength fluctuation etc., compared to traditional S é narmont quarter-wave plate method for measuring stress, measurement sensitivity and precision
At least improve three orders of magnitude, can high sensitivity and high-acruracy survey optical element minimal stress.
The specific embodiment of detection means of the present invention is given below, specific embodiment is only used for describing the present invention in detail, and
The application scope of the claims is not limited.
Example 1
Testing sample in present example 1 is 20mm × 20mm square fused silica chip, thickness 2mm.Fig. 2 is not add
Enter cavity collection optical cavity ring-down signal, mono-exponential fit curve and the residual error during sample.Fig. 3 is adopting for testing sample measurement point
Collection optical cavity ring-down signal, matched curve and regression criterion, the Fitting Calculation obtain OPD=0.0222nm.
Claims (7)
- A kind of 1. measuring method of optical element minimal stress, it is characterised in that：Described measurement apparatus is risen by LASER Light Source 1 Inclined device 2, plano-concave high reflection mirror 3 and 5, optical element 4 to be measured, quarter-wave plate 6, analyzer 7, condenser lens 8 and photoelectricity are visited Device 9 is surveyed to form.The beam of laser that light source 1 is sent forms the linearly polarized light that a branch of azimuth determines and vertical after the polarizer 2 Incide in optical resonator, the optical resonator is made up of stable straight chamber two pieces of identical plano-concave high reflection mirrors 3 and 5； The polarized laser beam of optical resonator is coupled into intracavitary roundtrip, and is placed perpendicular to laser beam by intracavitary to be measured The modulation of the stress birfringence of optical element 4, causes laser energy to be converted between S-polarization and P polarization；Laser beam is in resonator During roundtrip, a part of laser energy is transmitted and impinged perpendicularly on by quarter-wave by plano-concave high reflection mirror 5 The polarization state detection means that piece 6 and analyzer 7 form；Lens 8 and photodetector 9 are focused through the laser beam of analyzer 7 Collect；Shut-off laser simultaneously collects resonance cavity-type BPM signal by detector 9 simultaneously；Declining for collection is swung into signal input meter Calculation machine carries out nonlinear fitting and obtains the Retardation for characterizing stress.
- A kind of 2. measuring method of optical element minimal stress according to claim 1, it is characterised in that：Described light source The laser beam of 1 output is TEM00Mould light beam.
- A kind of 3. measuring method of optical element minimal stress according to claim 1, it is characterised in that：Described is polarized The light transmission shaft of device 2 can need to adjust according to test, and outgoing linearly polarized light azimuth can be any angle of 0-180 degree.
- A kind of 4. measuring method of optical element minimal stress according to claim 1, it is characterised in that：It is described by putting down The optical resonator that recessed high reflection mirror 3 and 5 is formed is stable cavity, the long L of resonator0Meet 0<L0≤ 2r, wherein r are that plano-concave is high The radius of curvature of speculum concave surface.
- A kind of 5. measuring method of optical element minimal stress according to claim 1, it is characterised in that：Described four points One of the fast axle angle of wave plate 6 can need to adjust according to test, phase retardation can be any angle of 0-180 degree.
- A kind of 6. measuring method of optical element minimal stress according to claim 1, it is characterised in that：Described analyzing The light transmission shaft of device 7 can need to adjust according to test, and outgoing linearly polarized light azimuth can be any angle of 0-180 degree.
- A kind of 7. measuring method of optical element minimal stress according to claim 1, it is characterised in that：The optics member Part is parallel plane optical element, optical element perpendicular to laser beam place when front and rear surfaces reflected light do not spill over optical resonance Chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710826216.7A CN107655599B (en) | 2017-09-14 | 2017-09-14 | Method for measuring micro stress of optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710826216.7A CN107655599B (en) | 2017-09-14 | 2017-09-14 | Method for measuring micro stress of optical element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107655599A true CN107655599A (en) | 2018-02-02 |
| CN107655599B CN107655599B (en) | 2020-09-22 |
Family
ID=61129743
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710826216.7A Active CN107655599B (en) | 2017-09-14 | 2017-09-14 | Method for measuring micro stress of optical element |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107655599B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111386449A (en) * | 2019-03-22 | 2020-07-07 | 合刃科技（深圳）有限公司 | Stress analysis system for curved surface material inspection |
| CN112345465A (en) * | 2020-11-06 | 2021-02-09 | 电子科技大学 | Method for measuring thermal stress birefringence coefficient of laser crystal based on polarization cavity ring-down |
| CN112986127A (en) * | 2021-03-18 | 2021-06-18 | 中国科学院高能物理研究所 | Calibration device for stress optical coefficient of transparent material |
| CN113008426A (en) * | 2021-02-26 | 2021-06-22 | 江南大学 | Double-frequency quantitative photoelastic measuring instrument and measuring method |
| CN113155333A (en) * | 2021-04-22 | 2021-07-23 | 浙江清华柔性电子技术研究院 | Stress detection system, method and device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101592537A (en) * | 2009-07-10 | 2009-12-02 | 成都光明光电股份有限公司 | Stress of optical glass device and measuring method thereof |
| CN101650226A (en) * | 2009-09-24 | 2010-02-17 | 清华大学 | Micro phase delay measuring device for optical element based on laser feedback |
| CN103616164A (en) * | 2013-11-28 | 2014-03-05 | 中国科学院光电技术研究所 | Reflectivity and transmittance comprehensive measurement method based on pulse laser light source |
-
2017
- 2017-09-14 CN CN201710826216.7A patent/CN107655599B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101592537A (en) * | 2009-07-10 | 2009-12-02 | 成都光明光电股份有限公司 | Stress of optical glass device and measuring method thereof |
| CN101650226A (en) * | 2009-09-24 | 2010-02-17 | 清华大学 | Micro phase delay measuring device for optical element based on laser feedback |
| CN103616164A (en) * | 2013-11-28 | 2014-03-05 | 中国科学院光电技术研究所 | Reflectivity and transmittance comprehensive measurement method based on pulse laser light source |
Non-Patent Citations (2)
| Title |
|---|
| 杨秋霞: "连续波腔衰荡光谱技术特性及在气体浓度测量中应用研究", 《中国优秀博士学位论文全文数据库 信息科学辑》 * |
| 祖鸿宇: "偏振光反馈光腔衰荡高反射率测量技术研究", 《中国优秀硕士学位论文全文数据库 基础科学辑》 * |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111386449A (en) * | 2019-03-22 | 2020-07-07 | 合刃科技（深圳）有限公司 | Stress analysis system for curved surface material inspection |
| CN111386449B (en) * | 2019-03-22 | 2022-03-25 | 合刃科技（深圳）有限公司 | Stress analysis system for curved surface material inspection |
| CN112345465A (en) * | 2020-11-06 | 2021-02-09 | 电子科技大学 | Method for measuring thermal stress birefringence coefficient of laser crystal based on polarization cavity ring-down |
| CN113008426A (en) * | 2021-02-26 | 2021-06-22 | 江南大学 | Double-frequency quantitative photoelastic measuring instrument and measuring method |
| CN112986127A (en) * | 2021-03-18 | 2021-06-18 | 中国科学院高能物理研究所 | Calibration device for stress optical coefficient of transparent material |
| CN113155333A (en) * | 2021-04-22 | 2021-07-23 | 浙江清华柔性电子技术研究院 | Stress detection system, method and device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107655599B (en) | 2020-09-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107655599A (en) | A kind of measuring method of optical element minimal stress | |
| CN108548658B (en) | Method for simultaneously measuring stress and optical loss of single-layer film optical element | |
| CN105716756B (en) | A kind of device for accurately measuring of optical material microstress spatial distribution | |
| CN105387933B (en) | A kind of broadband Brewster window regulating device and method | |
| CN109115690A (en) | Real-time polarization sensitive terahertz time-domain ellipsometer and optical constant measuring method | |
| CN102735430B (en) | Method and device for detecting phase delay | |
| CN101398378A (en) | Phase measurement method of surface plasma resonance and measuring system thereof | |
| Zhang et al. | Methods for optical phase retardation measurement: a review | |
| CA2293369A1 (en) | Extended range interferometric refractometer | |
| CN111812061A (en) | Refractive index measuring method and system | |
| WO2014067184A1 (en) | Apparatus based on four-quadrant detector and for measuring flow field in cavity of pulsed gas laser | |
| CN110530531B (en) | Michelson interference-based fountain type atomic gravimeter light beam phase change measuring device and method | |
| Downs et al. | Bi-directional fringe counting interference refractometer | |
| CN110207822A (en) | Highly sensitive optical time delay estimating system, method and medium | |
| CN111964873B (en) | High-precision distributed extinction ratio measuring method for polarization maintaining optical fiber | |
| CN113567351A (en) | Complex magneto-optical angle measuring system and method based on quantum weak measurement | |
| CN209930263U (en) | Unequal-arm interferometer measuring device based on polarization selection | |
| CN103471815A (en) | Method for simultaneously measuring S-polarized light reflectivity and P-polarized light reflectivity of high reflecting mirror | |
| CN109211843B (en) | Method and device for determining incident angle of terahertz wave reflection measurement system | |
| CN107687935A (en) | A kind of scaling method of high reflective cavity mirror transmitance | |
| CN108760653B (en) | Method for accurately measuring concentration of sulfur dioxide gas by spectrometer | |
| JP3131242B2 (en) | Method of measuring incident angle of light beam, measuring device and method of using the device for distance measurement | |
| US10670520B2 (en) | Optical analysis device and optical analysis method | |
| JPH0245138B2 (en) | ||
| CN112557333A (en) | Optical wedge device and method for measuring infrared absorption coefficient of solution |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |