CN110359028A - A kind of CVD device that the reaction being used to prepare graphene is full and uniform - Google Patents
A kind of CVD device that the reaction being used to prepare graphene is full and uniform Download PDFInfo
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- CN110359028A CN110359028A CN201910711241.XA CN201910711241A CN110359028A CN 110359028 A CN110359028 A CN 110359028A CN 201910711241 A CN201910711241 A CN 201910711241A CN 110359028 A CN110359028 A CN 110359028A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
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Abstract
The present invention relates to a kind of CVD devices that the reaction for being used to prepare graphene is full and uniform, including pedestal, reaction chamber, aspiration pump, gas supply mechanism, reaction mechanism and several stabilizer blades, reaction mechanism includes lifting assembly, lifting platform, fastening assembly, substrate and electromagnetic coil, fastening assembly includes first motor, turntable and several fastening units, gas supply mechanism includes gas source, air supply pipe, appendix, runner assembly, transverse tube, sealing cover, seal assembly, two vertical tubes and two spray heads, the full and uniform CVD device of reaction for being used to prepare graphene can drive spray head in the surface pivots of substrate by gas supply mechanism, and substrate lifting moving is driven by the lifting assembly in reaction mechanism, change the height and position of substrate and spray head, substrate uses the shape of tubulose, reaction gas is facilitated sufficiently uniformly to contact with the surfaces externally and internally of substrate , so that graphene uniform deposit and be attached to substrate surface, improve the yield of graphene, improve the practicability of equipment.
Description
Technical field
The present invention relates to new material production and processing equipment, in particular to a kind of reaction for being used to prepare graphene is abundant
Uniform CVD device.
Background technique
Graphene is a kind of honeycomb flat film formed in a specific way by carbon atom, is only one a kind of atomic layer
The quasi- two-dimensional material of thickness does monoatomic layer graphite so being called.The common power production method of graphene is mechanical glass at present
Glass method, oxidation-reduction method, silicon carbide epitaxial growth method etc., film production method are chemical vapour deposition technique (CVD), wherein CVD
Method can prepare the graphene of high quality large area, meet the requirement of prepare with scale high-quality graphene.
CVD method, usually using copper as substrate, is passed through carbonaceous gas and hydrogen-containing gas when preparing graphene in reacting furnace,
So that gas is carried out deposition reaction in substrate surface and generate graphene, the CVD growth of graphene relates generally in terms of three: carbon source,
Growing substrate and growth conditions (air pressure, carrier gas, temperature) etc., and existing CVD device, when producing graphene, usual substrate is each
Place's reaction gas is unevenly distributed, so that growth of the graphene on substrate is uneven, and is distributed in some reaction gas less
Region, equipment cannot make substrate and gas occur sufficiently to react, lead to the waste of resource, moreover, existing substrate is adopted
It is designed with the shape of plate, and the degree of gas phase reaction depends on the depositing temperature of substrate surface, heating device heats substrate
When, contacted with substrate, be easy occupy substrate big quantity space so that graphene can not on heating surface adventitious deposit, reduce
The production efficiency of graphene, so as to cause the reduction of existing CVD device practicability.
Summary of the invention
The technical problem to be solved by the present invention is for overcome the deficiencies in the prior art, providing one kind and being used to prepare graphite
The full and uniform CVD device of the reaction of alkene.
The technical solution adopted by the present invention to solve the technical problems is: a kind of reaction being used to prepare graphene is sufficiently equal
Even CVD device, including pedestal, reaction chamber, aspiration pump, controller, gas supply mechanism, reaction mechanism and several stabilizer blades, the branch
Foot is circumferentially evenly distributed on the periphery of reaction chamber, and the reaction chamber is fixed on the top of pedestal by stabilizer blade, and the controller is solid
It is scheduled on one of stabilizer blade, PLC is equipped in the controller, the gas supply mechanism is located at the top of pedestal, the reaction machine
Structure is arranged in reaction chamber, and the aspiration pump is fixed on the top of aspirating chamber, and the aspiration pump is electrically connected with PLC；
The reaction mechanism includes lifting assembly, lifting platform, fastening assembly, substrate and electromagnetic coil, the lifting assembly,
Lifting platform, fastening assembly and substrate are set gradually from top to down, and the shape of the substrate is tubulose, and the electromagnet is located at substrate
Inside, the lifting assembly and lifting platform be sequentially connected, the fastening assembly include first motor, turntable and several fastenings singly
Member, the first motor are fixed on the lower section of lifting platform, and the first motor and turntable are sequentially connected, and the fastening unit is circumferential
It is evenly distributed on the lower section of turntable, the fastening unit includes drive rod, anchorage bar, fixture block and fixed ring, the drive rod
One end is hinged with turntable, and the other end of the drive rod and one end of anchorage bar are hinged, the other end and fixture block of the anchorage bar
It is fixedly connected, the fixed ring is fixed on the lower section of lifting platform, and the Fixing shrink ring is located at anchorage bar, and the fixture block is resisted against base
On the inner wall of piece, the electromagnet is fixed on the lower section of turntable, and the first motor and electromagnet are electrically connected with PLC；
The gas supply mechanism includes gas source, air supply pipe, appendix, runner assembly, transverse tube, sealing cover, seal assembly, two
Vertical tube and two spray heads, the gas source are fixed on the top of pedestal, and the shape of the air supply pipe is L shape, and the one of the air supply pipe
End is connected to gas source, and the inner wall of the other end of the periphery and air supply pipe of the bottom end of the appendix is tightly connected, the appendix
Top pass through and be connected at sealing cover and the center of transverse tube, two spray heads pass through the both ends of two vertical tubes and transverse tube respectively, described
Runner assembly and appendix are sequentially connected, and the top of pedestal is arranged in the seal assembly, and the seal assembly and sealing plate pass
Dynamic connection.
Preferably, mobile in order to control lifting of lifting table, the lifting assembly includes that cross bar, the second motor and two rise
Unit drops, and the both ends of the cross bar are fixed on the inner wall of reaction chamber, and second motor is fixed on the lower section of cross bar, and described the
Two motors are located between two lifting units, and second motor is electrically connected with PLC, the lifting unit include bearing, screw rod,
Movable block and strut, the bearing are fixed on the inner wall of reaction chamber, one end transmission connection of second motor and screw rod, institute
The other end for stating screw rod is arranged in bearing, and the movable block is set on screw rod, the junction with screw rod of the movable block
Equipped with the matched screw thread of screw rod, the movable block by strut and lifting platform it is hinged.
Preferably, the movable block is set on cross bar in order to realize that stablizing for movable block is moved.
Preferably, being equipped with pressure sensor, institute in the fixture block to detect whether fixture block is resisted against on substrate inner wall
Pressure sensor is stated to be electrically connected with PLC.
Preferably, the bottom end of the electromagnetic coil is equipped with several support units, the support in order to avoid substrate is fallen
Unit includes position-limited rack and support rod, and the periphery of the support rod and electromagnetic coil is hinged, and the shape of the position-limited rack is U-shaped,
One end of the position-limited rack is fixed on the lower section of electromagnetic coil, and the support rod is resisted against the top of the other end of position-limited rack, institute
State the top that substrate is resisted against support rod.
Preferably, the rotation in order to realize appendix, the runner assembly includes third motor, driving gear and driven
Gear, the third motor are fixed on the lower section of sealing cover, and the third motor is electrically connected with PLC, the third motor and drive
Moving gear transmission connection, the driving gear are engaged with driven gear, and the driven gear is coaxially fixed on appendix.
Preferably, the stable rotation in order to realize transverse tube, the runner assembly further includes annular groove and two sliding blocks, institute
The lower section that sliding block is fixed on transverse tube is stated, the annular groove is fixed on the lower section of sealing cover, and the sliding block is slidably connected with annular groove,
The annular groove is dovetail groove.
Preferably, the seal assembly includes several cylinders, and the cylinder is circumferentially uniformly distributed in order to support sealing cover
In the lower section of sealing cover, the cylinder is electrically connected with PLC, and the cylinder body of the cylinder is fixed on the lower section of pedestal, the cylinder
Gas bar is fixed on the lower section of sealing cover.
Preferably, being evenly distributed on inside and outside substrate for the ease of reaction gas, the substrate is equipped with several
Through-hole.
Preferably, the movement of equipment for convenience, the lower section of the pedestal is equipped with several universal wheels.
The invention has the advantages that the full and uniform CVD device of reacting for being used to prepare graphene passes through air feeder
Structure can drive spray head in the surface pivots of substrate, and drive substrate lifting moving by the lifting assembly in reaction mechanism, change
The height and position of substrate and spray head, substrate use tubulose shape, facilitate reaction gas sufficiently uniformly with the interior appearance of substrate
Face contact so that graphene uniform deposit and be attached to substrate surface, improve the yield of graphene, and then improve equipment
Practicability.
Detailed description of the invention
Present invention will be further explained below with reference to the attached drawings and examples.
Fig. 1 is the structural schematic diagram of the full and uniform CVD device of the reaction for being used to prepare graphene of the invention；
Fig. 2 is the portion the A enlarged drawing of Fig. 1；
Fig. 3 is that the structure of the lifting assembly of the full and uniform CVD device of the reaction for being used to prepare graphene of the invention is shown
It is intended to；
Fig. 4 is that the structure of the fastening assembly of the full and uniform CVD device of the reaction for being used to prepare graphene of the invention is shown
It is intended to；
In figure: 1. pedestals, 2. reaction chambers, 3. aspiration pumps, 4. stabilizer blades, 5. lifting platforms, 6. substrates, 7. electromagnetic coils, 8.
One motor, 9. turntables, 10. drive rods, 11. anchorage bars, 12. fixture blocks, 13. fixed rings, 14. gas sources, 15. air supply pipes, 16. gas transmissions
Pipe, 17. transverse tubes, 18. sealing covers, 19. vertical tubes, 20. spray heads, 21. cross bars, 22. second motors, 23. bearings, 24. screw rods, 25.
Movable block, 26. struts, 27. position-limited racks, 28. support rods, 29. third motors, 30. driving gears, 31. driven gears, 32. rings
Shape slot, 33. sliding blocks, 34. cylinders, 35. universal wheels, 36. controllers, 37. pressure sensors.
Specific embodiment
In conjunction with the accompanying drawings, the present invention is further explained in detail.These attached drawings are simplified schematic diagram, only with
Illustration illustrates basic structure of the invention, therefore it only shows the composition relevant to the invention.
As shown in Figure 1, a kind of CVD device that the reaction for being used to prepare graphene is full and uniform, including pedestal 1, reaction chamber
2, aspiration pump 3, controller 36, gas supply mechanism, reaction mechanism and several stabilizer blades 4, the stabilizer blade 4 is circumferential to be evenly distributed on reaction chamber
2 periphery, the reaction chamber 2 are fixed on the top of pedestal 1 by stabilizer blade 4, and the controller 36 is fixed therein a stabilizer blade 4
On, PLC is equipped in the controller 36, the gas supply mechanism is located at the top of pedestal 1, and the reaction mechanism is arranged in reaction chamber
In 2, the aspiration pump 3 is fixed on the top of aspirating chamber, and the aspiration pump 3 is electrically connected with PLC；
PLC, i.e. programmable logic controller (PLC), it is used for its internally stored program, is held using a kind of programmable memory
The user oriented instruction such as row logical operation, sequential control, timing, counting and arithmetical operation, and by digital or analog defeated
Enter/export the various types of mechanical or production processes of control, its essence is a kind of computer for being exclusively used in Industry Control, hardware
Structure is substantially identical as microcomputer, the reception and output of processing and the instruction of data is generally used for, for realizing in
Centre control.
This is used to prepare in the CVD device of graphene, and support is fixed to reaction chamber 2 by stabilizer blade 4, raw using equipment
When producing graphene, user can operate equipment operation by controller 36, provide reaction gas into reaction chamber 2 from gas supply mechanism,
Reaction gas is contacted with the substrate 6 in the reaction mechanism in reaction chamber 2, to generate graphene, using aspiration pump 3 by reaction chamber
Exhaust gas in 2 excludes.
As shown in Figure 3-4, the reaction mechanism includes lifting assembly, lifting platform 5, fastening assembly, substrate 6 and electromagnetic coil
7, the lifting assembly, lifting platform 5, fastening assembly and substrate 6 are set gradually from top to down, and the shape of the substrate 6 is tubulose,
The electromagnet is located at the inside of substrate 6, and the lifting assembly and lifting platform 5 are sequentially connected, and the fastening assembly includes first
Motor 8, turntable 9 and several fastening units, the first motor 8 are fixed on the lower section of lifting platform 5, the first motor 8 with turn
Disk 9 is sequentially connected, and the fastening unit is circumferentially evenly distributed on the lower section of turntable 9, and the fastening unit includes drive rod 10, tight
Solid rod 11, fixture block 12 and fixed ring 13, one end of the drive rod 10 and turntable 9 are hinged, the other end of the drive rod 10 with
One end of anchorage bar 11 is hinged, and the other end of the anchorage bar 11 is fixedly connected with fixture block 12, and the fixed ring 13 is fixed on liter
The lower section of platform 5 drops, and the fixed ring 13 is set in anchorage bar 11, and the fixture block 12 is resisted against on the inner wall of substrate 6, the electromagnetism
Ferropexy is electrically connected with PLC in the lower section of turntable 9, the first motor 8 and electromagnet；
In reaction mechanism, lifting platform 5 can be driven to be moved by lifting assembly, can be facilitated using fastening assembly by substrate
6 are fixed on the lower section of lifting platform 5, and substrate 6 is acted on the top of substrate 6 by fastening assembly using the shape of tubulose herein, side
Just reaction gas is adequately contacted inside and outside the substrate 6 of tubulose with the surface of substrate 6, and PLC controls electromagnetic coil 7
Starting generates alternating magnetic field by the alternating current in electromagnetic coil 7, is uniformly heated to substrate 6, and utilizes lifting
Component drives 5 lifting moving of lifting platform, so that the reaction gas that gas supply mechanism sprays uniformly acts on the surface of substrate 6, makes
Graphene uniform is fully deposited on inside and outside substrate 6, improves the yield of graphene.Utilize fastening assembly mounted substrate 6
When, the top of substrate 6 is leaned against to the lower section of lifting platform 5, then PLC controls first motor 8 and starts, and drives turntable 9 to rotate, turntable
9 act on the drive rod 10 of each fastening unit, and drive rod 10 acts on anchorage bar 11, so that anchorage bar 11 is along fixation
The direction at the axis of ring 13 to the center far from turntable 9 is mobile, so that fixture block 12 is resisted against on the inner wall of substrate 6, it is fixed
The installation of substrate 6 is completed in the position of substrate 6.After the reaction was completed, PLC controls first motor 8 and starts, and rotates backward turntable 9, leads to
Bar 10 of overdriving acts on anchorage bar 11, so that anchorage bar 11 drives axis of the fixture block 12 far from turntable 9, is detached from substrate 6
Substrate 6 is conveniently removed on surface.
As shown in Figs. 1-2, the gas supply mechanism include gas source 14, air supply pipe 15, appendix 16, runner assembly, transverse tube 17,
Sealing cover 18, seal assembly, two vertical tubes 19 and two spray heads 20, the gas source 14 are fixed on the top of pedestal 1, the gas supply
The shape of pipe 15 is L shape, and one end of the air supply pipe 15 is connected to gas source 14, the periphery of the bottom end of the appendix 16 and gas supply
The inner wall of the other end of pipe 15 is tightly connected, and the top of the appendix 16 passes through to be connected at the center of sealing cover 18 and transverse tube 17
Logical, two spray heads 20 pass through the both ends of two vertical tubes 19 and transverse tube 17 respectively, and the runner assembly and appendix 16 are sequentially connected,
The top of pedestal 1 is arranged in the seal assembly, and the seal assembly and sealing plate are sequentially connected.
In gas supply mechanism, provide reaction hydrogeneous, carbon reaction gas used from tracheae to air supply pipe 15, gas passes through defeated
Tracheae 16 is delivered in transverse tube 17, then is sprayed by vertical tube 19 from spray head 20, is supported sealing cover 18 using seal assembly, can be driven
Sealing cover 18 is gone up and down, and after sealing cover 18 blocks reaction chamber 2, gas source 14 is by air supply pipe 15, appendix 16, transverse tube 17 and erects
Pipe 19 is delivered to spray head 20, so that reaction gas is sprayed on the surface of 20 substrate 6 of spray head, while runner assembly starts, and drives gas transmission
Pipe 16 is rotated around own axes, and then by transverse tube 17 and vertical bar spray head 20 is rotated around the outer surface of substrate 6,
So that reaction gas is sufficiently uniformly contacted with substrate 6, then substrate 6 is driven by lifting platform 5 and fastening assembly by lifting assembly
Change height and position, so that graphene uniform distribution is deposited on the surfaces externally and internally of substrate 6, improves the practicability of equipment.
As shown in Fig. 2, the lifting assembly includes cross bar 21, the second motor 22 and two lifting units, the cross bar 21
Both ends be fixed on the inner wall of reaction chamber 2, second motor 22 is fixed on the lower section of cross bar 21,22, second motor
Between two lifting units, second motor 22 is electrically connected with PLC, and the lifting unit includes bearing 23, screw rod 24, moves
Motion block 25 and strut 26, the bearing 23 are fixed on the inner wall of reaction chamber 2, and one end of second motor 22 and screw rod 24 passes
The other end of dynamic connection, the screw rod 24 is arranged in bearing 23, and the movable block 25 is set on screw rod 24, the movable block
25 be equipped with the junction of screw rod 24 is cut with scissors with the matched screw thread of screw rod 24, the movable block 25 by strut 26 and lifting platform 5
It connects.
The position of cross bar 21 is fixed, and convenient for fixing the position of the second motor 22, PLC controls the starting of the second motor 22, drives
Screw rod 24 in the lifting unit of two sides rotates under the supporting role of bearing 23, and screw rod 24 is by threaded function in movable block 25
On, so that movable block 25 is moved along the axis direction of screw rod 24, and then is acted on lifting platform 5 by strut 26, make
It obtains lifting platform 5 and carries out lifting moving.
Preferably, the movable block 25 is set on cross bar 21 in order to realize that stablizing for movable block 25 is moved.Using admittedly
It positions the cross bar 21 set and passes through movable block 25, the moving direction of movable block 25 is secured, so that the stabilization of movable block 25 can be realized
It is mobile.
Preferably, being equipped with pressure sensing in the fixture block 12 to detect whether fixture block 12 is resisted against on 6 inner wall of substrate
Device 37, the pressure sensor 37 are electrically connected with PLC.Pressure after fixture block 12 is resisted against on the inner wall of substrate 6, in fixture block 12
Sensor 37 detects the pressure from 6 inner wall of substrate to fixture block 12, and pressure data is passed to PLC, PLC by pressure sensor 37
After detecting each pressure data, that is, it can determine that fixture block 12 is resisted against on the inner wall of substrate 6, PLC controls first motor 8 and stops fortune
Row completes the fixed installation to substrate 6.
Preferably, the bottom end of the electromagnetic coil 7 is equipped with several support units, the branch in order to avoid substrate 6 is fallen
Supportting unit includes position-limited rack 27 and support rod 28, and the periphery of the support rod 28 and electromagnetic coil 7 is hinged, the position-limited rack 27
Shape is U-shaped, and one end of the position-limited rack 27 is fixed on the lower section of electromagnetic coil 7, and the support rod 28 is resisted against position-limited rack 27
The other end top, the substrate 6 is resisted against the top of support rod 28.Support rod 28 can be contacted around it with electromagnetic coil 7
Position rotation, the slewing area of support rod 28 can be limited by position-limited rack 27, avoids support rod 28 diagonally downward, is being pacified
When dress, after support rod 28 is rotated up the periphery close to electromagnetic coil 7, then by substrate 6 by being placed on the lower section of lifting platform 5
Afterwards, support rod 28 is decontroled, so that support rod 28 rotates down, after being supported by position-limited rack 27, substrate 6 falls in support rod 28
Top then passes through the installation of the achievable substrate 6 of fastening assembly, and substrate 6 is prevented to be detached from fixture block 12, after completion of the reaction, fixture block
12 are detached from the inner wall of substrate 6, and support rod 28 is rotated up, and substrate 6 is facilitated to be detached from from the periphery of electromagnetic coil 7.
As shown in Fig. 2, the runner assembly includes third motor 29, driving gear 30 and driven gear 31, the third
Motor 29 is fixed on the lower section of sealing cover 18, and the third motor 29 is electrically connected with PLC, the third motor 29 and driving gear
30 transmission connections, the driving gear 30 are engaged with driven gear 31, and the driven gear 31 is coaxially fixed on appendix 16.
PLC control third motor 29 start, drive driving gear 30 rotate, driving gear 30 act on be engaged with from
On moving gear 31, so that driven gear 31 rotates, and then drives appendix 16 to rotate, make to spray by transverse tube 17 and vertical tube 19
First 20 uniformly spray reaction gas around the periphery of substrate 6.
Preferably, the stable rotation in order to realize transverse tube 17, the runner assembly further includes annular groove 32 and two cunnings
Block 33, the sliding block 33 are fixed on the lower section of transverse tube 17, and the annular groove 32 is fixed on the lower section of sealing cover 18, the sliding block 33
It is slidably connected with annular groove 32, the annular groove 32 is dovetail groove.Utilize the annular groove 32 for being fixed on 18 top of sealing cover, specification
The rotary motion trace of sliding block 33, since annular groove 32 is dovetail groove so that sliding block 33 can not be detached from annular groove 32, so can guarantee with
The sliding block 33 that transverse tube 17 is fixedly connected carries out stable rotation.
Preferably, the seal assembly includes several cylinders 34 in order to support sealing cover 18, the cylinder 34 is circumferential
The even lower section for being distributed in sealing cover 18, the cylinder 34 are electrically connected with PLC, and the cylinder body of the cylinder 34 is fixed under pedestal 1
Side, the gas bar of the cylinder 34 are fixed on the lower section of sealing cover 18.PLC controls cylinder 34 and starts, in the cylinder body for adjusting cylinder 34
Air capacity, the gas bar of cylinder 34 can be driven mobile, realize the lifting of sealing cover 18.
Preferably, being evenly distributed on inside and outside substrate 6 for the ease of reaction gas, if the substrate 6 is equipped with
Dry through-hole.Reaction gas is facilitated to circulate inside and outside substrate 6 by through-hole, so that graphene uniform is distributed in substrate 6
Surfaces externally and internally.
Preferably, the movement of equipment for convenience, the lower section of the pedestal 1 is equipped with several universal wheels 35.
For the CVD device when preparing graphene, using the position of the fixed substrate 6 of fastening assembly, substrate 6 uses the shape of tubulose
Shape, and the calutron of heating source and substrate 6 maintain a certain distance space, facilitate the surfaces externally and internally of reaction gas Yu substrate 6
Contact drives spray head 20 to rotate in the outer surface of substrate 6, and drives lifting platform 5 to rotate by lifting assembly using runner assembly,
Change the relative altitude position of spray head 20 and substrate 6, so that the reaction gas that spray head 20 sprays equably is connect with substrate 6
Touching guarantees that reaction sufficiently carries out, so that graphene uniform deposition is attached to the surfaces externally and internally of substrate 6, improves the production of graphene
Efficiency, and then improve the practicability of equipment.
Compared with prior art, which can by gas supply mechanism
It drives spray head 20 in the surface pivots of substrate 6, and 6 lifting moving of substrate is driven by the lifting assembly in reaction mechanism, change
The height and position of substrate 6 and spray head 20, substrate 6 facilitate reaction gas sufficiently uniformly and in substrate 6 using the shape of tubulose
Appearance face contact so that graphene uniform deposit and be attached to 6 surface of substrate, improve the yield of graphene, and then improve
The practicability of equipment.
Taking the above-mentioned ideal embodiment according to the present invention as inspiration, through the above description, relevant staff is complete
Various changes and amendments can be carried out without departing from the scope of the technological thought of the present invention' entirely.The technology of this invention
Property range is not limited to the contents of the specification, it is necessary to which the technical scope thereof is determined according to the scope of the claim.
Claims (10)
1. a kind of CVD device that the reaction for being used to prepare graphene is full and uniform, which is characterized in that including pedestal (1), reaction chamber
(2), aspiration pump (3), controller (36), gas supply mechanism, reaction mechanism and several stabilizer blades (4), the stabilizer blade (4) is circumferential uniformly to divide
Cloth is fixed on the top of pedestal (1), the controller by stabilizer blade (4) in the periphery of reaction chamber (2), the reaction chamber (2)
(36) it is fixed therein on a stabilizer blade (4), PLC is equipped in the controller (36), the gas supply mechanism is located at pedestal (1)
Top, in reaction chamber (2), the aspiration pump (3) is fixed on the top of aspirating chamber, the aspiration pump for the reaction mechanism setting
(3) it is electrically connected with PLC；
The reaction mechanism includes lifting assembly, lifting platform (5), fastening assembly, substrate (6) and electromagnetic coil (7), the lifting
Component, lifting platform (5), fastening assembly and substrate (6) are set gradually from top to down, and the shape of the substrate (6) is tubulose, described
Electromagnet is located at the inside of substrate (6), and the lifting assembly and lifting platform (5) are sequentially connected, and the fastening assembly includes first
Motor (8), turntable (9) and several fastening units, the first motor (8) are fixed on the lower section of lifting platform (5), first electricity
Machine (8) and turntable (9) are sequentially connected, and the fastening unit is circumferentially evenly distributed on the lower section of turntable (9), the fastening unit packet
Drive rod (10), anchorage bar (11), fixture block (12) and fixed ring (13) are included, one end and turntable (9) of the drive rod (10) are cut with scissors
It connects, one end of the other end and anchorage bar (11) of the drive rod (10) is hinged, the other end and fixture block of the anchorage bar (11)
(12) it is fixedly connected, the fixed ring (13) is fixed on the lower section of lifting platform (5), and the fixed ring (13) is set in anchorage bar
(11), the fixture block (12) is resisted against on the inner wall of substrate (6), and the electromagnet is fixed on the lower section of turntable (9), and described first
Motor (8) and electromagnet are electrically connected with PLC；
The gas supply mechanism includes gas source (14), air supply pipe (15), appendix (16), runner assembly, transverse tube (17), sealing cover
(18), seal assembly, two vertical tubes (19) and two spray heads (20), the gas source (14) is fixed on the top of pedestal (1), described
The shape of air supply pipe (15) is L shape, and one end of the air supply pipe (15) is connected to gas source (14), the bottom end of the appendix (16)
Periphery and the inner wall of the other end of air supply pipe (15) be tightly connected, the top of the appendix (16) pass through sealing cover (18) with
It being connected at the center of transverse tube (17), two spray heads (20) are respectively by the both ends of two vertical tubes (19) and transverse tube (17), and described turn
Dynamic component and appendix (16) are sequentially connected, and the seal assembly setting is in the top of pedestal (1), the seal assembly and sealing
Plate transmission connection.
2. the full and uniform CVD device of the reaction for being used to prepare graphene as described in claim 1, which is characterized in that described
Lifting assembly includes cross bar (21), the second motor (22) and two lifting units, and the both ends of the cross bar (21) are fixed on reaction
On the inner wall of room (2), second motor (22) is fixed on the lower section of cross bar (21), and second motor (22) is located at two and rises
It drops between unit, second motor (22) is electrically connected with PLC, and the lifting unit includes bearing (23), screw rod (24), movement
Block (25) and strut (26), the bearing (23) are fixed on the inner wall of reaction chamber (2), second motor (22) and screw rod
(24) one end transmission connection, in bearing (23), the movable block (25) is set in for the other end setting of the screw rod (24)
On screw rod (24), the movable block (25) be equipped with the junction of screw rod (24) and screw rod (24) matched screw thread, the shifting
Motion block (25) is hinged by strut (26) and lifting platform (5).
3. the full and uniform CVD device of the reaction for being used to prepare graphene as claimed in claim 2, which is characterized in that described
Movable block (25) is set on cross bar (21).
4. the full and uniform CVD device of the reaction for being used to prepare graphene as described in claim 1, which is characterized in that described
Pressure sensor (37) are equipped in fixture block (12), the pressure sensor (37) is electrically connected with PLC.
5. the full and uniform CVD device of the reaction for being used to prepare graphene as described in claim 1, which is characterized in that described
The bottom end of electromagnetic coil (7) is equipped with several support units, and the support unit includes position-limited rack (27) and support rod (28), described
Support rod (28) and the periphery of electromagnetic coil (7) are hinged, and the shape of the position-limited rack (27) is U-shaped, the position-limited rack (27)
One end is fixed on the lower section of electromagnetic coil (7), and the support rod (28) is resisted against the top of the other end of position-limited rack (27), described
Substrate (6) is resisted against the top of support rod (28).
6. the full and uniform CVD device of the reaction for being used to prepare graphene as described in claim 1, which is characterized in that described
Runner assembly includes that third motor (29), driving gear (30) and driven gear (31), the third motor (29) are fixed on close
The lower section of (18) is covered, the third motor (29) is electrically connected with PLC, the third motor (29) and driving gear (30) transmission
Connection, the driving gear (30) are engaged with driven gear (31), and the driven gear (31) is coaxially fixed on appendix (16)
On.
7. the full and uniform CVD device of the reaction for being used to prepare graphene as described in claim 1, which is characterized in that described
Runner assembly further includes annular groove (32) and two sliding blocks (33), and the sliding block (33) is fixed on the lower section of transverse tube (17), described
Annular groove (32) is fixed on the lower section of sealing cover (18), and the sliding block (33) is slidably connected with annular groove (32), the annular groove
It (32) is dovetail groove.
8. the full and uniform CVD device of the reaction for being used to prepare graphene as described in claim 1, which is characterized in that described
Seal assembly includes several cylinders (34), and the cylinder (34) is circumferentially evenly distributed on the lower section of sealing cover (18), the cylinder
(34) it is electrically connected with PLC, the cylinder body of the cylinder (34) is fixed on the lower section of pedestal (1), and the gas bar of the cylinder (34) is fixed
In the lower section of sealing cover (18).
9. the full and uniform CVD device of the reaction for being used to prepare graphene as described in claim 1, which is characterized in that described
Substrate (6) is equipped with several through-holes.
10. the full and uniform CVD device of the reaction for being used to prepare graphene as described in claim 1, which is characterized in that described
The lower section of pedestal (1) is equipped with several universal wheels (35).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910711241.XA CN110359028A (en) | 2019-08-02 | 2019-08-02 | A kind of CVD device that the reaction being used to prepare graphene is full and uniform |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910711241.XA CN110359028A (en) | 2019-08-02 | 2019-08-02 | A kind of CVD device that the reaction being used to prepare graphene is full and uniform |
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| CN110359028A true CN110359028A (en) | 2019-10-22 |
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| CN201910711241.XA Withdrawn CN110359028A (en) | 2019-08-02 | 2019-08-02 | A kind of CVD device that the reaction being used to prepare graphene is full and uniform |
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Application publication date: 20191022 |