CN110358453A - A kind of glass polishing nano-cerium oxide polishing fluid and preparation method thereof - Google Patents
A kind of glass polishing nano-cerium oxide polishing fluid and preparation method thereof Download PDFInfo
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- CN110358453A CN110358453A CN201810315580.1A CN201810315580A CN110358453A CN 110358453 A CN110358453 A CN 110358453A CN 201810315580 A CN201810315580 A CN 201810315580A CN 110358453 A CN110358453 A CN 110358453A
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- polishing
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- cerium oxide
- partial size
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Abstract
The present invention provides a kind of glass polishing nano-cerium oxide polishing fluids and preparation method thereof, based on mass fraction, including following components: the ceria oxide powder 10-25% of partial size 80-200nm, dispersing agent 0.1-2%, activating agent 0.1-2%, filler 0.01-2%, surplus are water to nano-cerium oxide polishing fluid；The filler is selected from one of microcrystalline cellulose, xanthan gum and montmorillonite or a variety of.Nano-cerium oxide polishing fluid provided by the invention polishing efficiency with higher under the synergistic effect of said components, and it is lower to polish product surface roughness.When nano-cerium oxide polishing fluid carries out chip glass polishing, the average apparent yield > 90% of product is polished, average polished rate is 1-2 μm/min, and the surface roughness of product is down to Ra < 0.65nm by Ra > 0.9nm.
Description
Technical field
The present invention relates to polishing fluid technical field more particularly to a kind of glass polishing nano-cerium oxide polishing fluid and its systems
Preparation Method.
Background technique
It improves with the continuous development of science and technology, market is growing day by day for high-precision chip glass demand, because
This requires the surface processing accuracy and surface integrity of chip glass higher and higher.Cerium oxide hardness is moderate, with its preparation
Polishing fluid is widely used in the processing of glass.China polish industry currently used for the precision machined polishing fluid of chip glass mainly according to
Rely import, higher cost.
At present many poor chemical stabilities, that auxiliary material consumes requirement of the fast precision glass chip to polishing fluid is very high, it is desirable that
It does not scratch and etching glass surface, while meeting the requirement of high polishing efficiency.
Summary of the invention
In view of this, the purpose of the present invention is to provide a kind of glass polishing nano-cerium oxide polishing fluids and its preparation side
The polishing efficiency of method, the polishing fluid is higher, and it is lower to polish product surface roughness.
The present invention provides a kind of glass polishing nano-cerium oxide polishing fluids, based on mass fraction, including following components:
Ceria oxide powder 10-25%, dispersing agent 0.1-2%, activating agent 0.1-2%, the filler 0.01- of partial size 80-200nm
2%, surplus is water；
The filler is selected from one of microcrystalline cellulose, xanthan gum and montmorillonite or a variety of.
Preferably, the dispersing agent is selected from one of stearic acid, polyethyleneimine and polyurethane or a variety of.
Preferably, the activating agent is selected from one of 1,2-PD, glycerine, 1,3-BDO and oleic acid or more
Kind.
Preferably, the glass polishing is specifically included with nano-cerium oxide polishing fluid:
The ceria oxide powder 20% of partial size 120nm, stearic acid 0.8%, 1,2- propylene glycol 0.6%, microcrystalline cellulose
0.8%, surplus is water；
Or ceria oxide powder 22%, polyethyleneimine 0.6%, 1,2- propylene glycol and the oleic acid mixture of partial size 150nm
0.4%, montmorillonite 1.0%, surplus are water；
Or ceria oxide powder 16%, stearic acid and the polyurethane mixture 0.5% of partial size 160nm, 1,2- propylene glycol and third
Three alcohol mixtures 0.2%, montmorillonite 0.4%, surplus are water；
Or partial size 130nm ceria oxide powder 19%, stearic acid, polyethyleneimine and polyurethane mixture 0.9%, the third three
Alcohol, 1,3 butylene glycol and oleic acid mixture 0.1%, xanthan gum and montmorillonite mixture 0.5%, surplus are water；
Or ceria oxide powder 14%, stearic acid 0.6%, oleic acid 0.25%, xanthan gum and the montmorillonite mixing of partial size 160nm
Object 0.6%, surplus are water.
The present invention provides a kind of preparation method of nano-cerium oxide polishing fluid of glass polishing described in above-mentioned technical proposal,
The following steps are included:
Water, dispersing agent and filler are mixed, the first mixture is obtained；
The ceria oxide powder of first mixture and partial size 80-200nm are mixed, the second mixture is obtained；
Second mixture and activating agent are mixed, ultrasonic disperse obtains glass polishing nano-cerium oxide polishing fluid.
Preferably, the water, dispersing agent and filler mix under stirring conditions；The rate of stirring is 400-600rpm.
Preferably, 4-5h is stood after the mixing of the ceria oxide powder of first mixture and partial size 80-200nm.
The present invention provides a kind of glass polishing nano-cerium oxide polishing fluids, based on mass fraction, including following components:
The ceria oxide powder 10-25% of partial size 80-200nm, dispersing agent 0.1-2%, activating agent 0.1-2%, filler 0.01-2%,
Surplus is water；The filler is selected from one of microcrystalline cellulose, xanthan gum and montmorillonite or a variety of.Nanometer provided by the invention
Cerium oxide polishing slurry polishing efficiency with higher under the synergistic effect of said components, and polish product surface roughness compared with
It is low.The results showed that when nano-cerium oxide polishing fluid carries out chip glass polishing, the average apparent yield > 90% of product,
Average polished rate is 1-2 μm/min, and the surface roughness of product is down to Ra < 0.65nm by Ra > 0.9nm.
Specific embodiment
The present invention provides a kind of glass polishing nano-cerium oxide polishing fluids, based on mass fraction, including following components:
Ceria oxide powder 10-25%, dispersing agent 0.1-2%, activating agent 0.1-2%, the filler 0.01- of partial size 80-200nm
2%, surplus is water；
The filler is selected from one of microcrystalline cellulose, xanthan gum and montmorillonite or a variety of.
Nano-cerium oxide polishing fluid provided by the invention polishing efficiency with higher under the synergistic effect of said components,
And polishing product surface roughness is lower.
Glass polishing nano-cerium oxide polishing fluid provided by the invention includes the ceria oxide powder 10- of partial size 80-200nm
25%, preferably 14-22%.In the specific embodiment of the invention, the ceria oxide powder of the partial size 80-200nm is preferably selected from
The ceria oxide powder of partial size 120-160nm.
Glass polishing nano-cerium oxide polishing fluid provided by the invention includes dispersing agent 0.1-2%.The dispersing agent is excellent
Choosing is selected from one of stearic acid, polyethyleneimine and polyurethane or a variety of.
Glass polishing nano-cerium oxide polishing fluid provided by the invention includes activating agent 0.1-2%, and the activating agent is excellent
Choosing is selected from one of 1,2- propylene glycol, glycerine, 1,3 butylene glycol and oleic acid or a variety of.
Glass polishing nano-cerium oxide polishing fluid provided by the invention includes filler 0.01-2%；The filler is selected from micro-
One of crystalline cellulose, xanthan gum and montmorillonite are a variety of.
In the present invention, the glass polishing is specifically preferably included with nano-cerium oxide polishing fluid:
The ceria oxide powder 20% of partial size 120nm, stearic acid 0.8%, 1,2- propylene glycol 0.6%, microcrystalline cellulose
0.8%, surplus is water；
Or ceria oxide powder 22%, polyethyleneimine 0.6%, 1,2- propylene glycol and the oleic acid mixture of partial size 150nm
0.4%, montmorillonite 1.0%, surplus are water；
Or ceria oxide powder 16%, stearic acid and the polyurethane mixture 0.5% of partial size 160nm, 1,2- propylene glycol and third
Three alcohol mixtures 0.2%, montmorillonite 0.4%, surplus are water；
Or partial size 130nm ceria oxide powder 19%, stearic acid, polyethyleneimine and polyurethane mixture 0.9%, the third three
Alcohol, 1,3 butylene glycol and oleic acid mixture 0.1%, xanthan gum and montmorillonite mixture 0.5%, surplus are water；
Or ceria oxide powder 14%, stearic acid 0.6%, oleic acid 0.25%, xanthan gum and the montmorillonite mixing of partial size 160nm
Object 0.6%, surplus are water；
Or the ceria oxide powder 23% of partial size 180nm, polyethyleneimine and polyurethane mixture 1.0%, glycerine and 1,
3- mixture of butanediols 0.3%, xanthan gum 0.6%, surplus are water；
Or the ceria oxide powder 24% of partial size 90nm, polyurethane 0.7%, glycerine and oleic acid mixture 0.5%, xanthan gum
It is water with microcrystalline cellulose mixt 0.6%, surplus；
Or ceria oxide powder 18%, polyurethane 1.2%, glycerine 0.3%, microcrystalline cellulose and the Meng Tuo of partial size 170nm
Stone mixture 0.3%, surplus are water；
Or the ceria oxide powder 23% of partial size 150nm, polyurethane 1.2%, 1,3 butylene glycol 0.6%, montmorillonite 0.8%,
Surplus is water；
Or ceria oxide powder 12%, stearic acid 0.4%, glycerine, oleic acid and the 1,3 butylene glycol mixture of partial size 110nm
0.4%, microcrystalline cellulose, montmorillonite and xanthan gum mixtures 1.2%, surplus are water.
The present invention provides a kind of preparation method of nano-cerium oxide polishing fluid of glass polishing described in above-mentioned technical proposal,
The following steps are included:
Water, dispersing agent and filler are mixed, the first mixture is obtained；
The ceria oxide powder of first mixture and partial size 80-200nm are mixed, the second mixture is obtained；
Second mixture and activating agent are mixed, ultrasonic disperse obtains glass polishing nano-cerium oxide polishing fluid.
Method provided by the invention is simple, at low cost.
Dispersing agent and filler are preferably added in water by the present invention.In the present invention, the water, dispersing agent and filler are stirring
It is mixed under conditions of mixing；The rate of stirring is preferably 400-600rpm.
In the present invention, 4- is preferably stood after the mixing of the ceria oxide powder of first mixture and partial size 80-200nm
5h。
The present invention preferably stirs 1-2h after mixing the second mixture and activating agent.The time of the ultrasonic disperse is preferably
0.5-2h。
The present invention provides a kind of glass polishing nano-cerium oxide polishing fluids, based on mass fraction, including following components:
The ceria oxide powder 10-25% of partial size 80-200nm, dispersing agent 0.1-2%, activating agent 0.1-2%, filler 0.01-2%,
Surplus is water；The filler is selected from one of microcrystalline cellulose, xanthan gum and montmorillonite or a variety of.Nanometer provided by the invention
Cerium oxide polishing slurry polishing efficiency with higher under the synergistic effect of said components, and polish product surface roughness compared with
It is low.The results showed that when nano-cerium oxide polishing fluid carries out chip glass polishing, the average apparent yield > 90% of product,
Average polished rate is 1-2 μm/min, and the surface roughness of product is down to Ra < 0.65nm by Ra > 0.9nm.
In order to further illustrate the present invention, below with reference to embodiment to a kind of glass polishing nano oxygen provided by the invention
Change cerium polishing fluid and preparation method thereof to be described in detail, but they cannot be interpreted as to the limit to the scope of the present invention
It is fixed.
Examples 1 to 10
A, deionized water is stirred in 400-600rpm, is slowly added to dispersing agent and filler, stirred to uniformly mixed；
B, it is slowly added to nano-cerium oxide powder in the above solution, to after mixing, stopping stirring standing 4- for stirring
5h；
C, continue to be slowly added to activating agent, stir 1-2h；
D, ultrasonic disperse 0.5-2h is carried out to cerium oxide polishing slurry after purification to be polished to get glass polishing with nano-cerium oxide
Liquid.
Above-mentioned technique is carried out using raw material additive amount shown in table 1 and substance, glass polishing is prepared and is thrown with nano-cerium oxide
Light liquid, surplus is water in each embodiment in table 1.
Table 1 embodiment 1-10 and comparative example 1-2 prepares the raw material dosage and title of polishing fluid use
The present invention polishes the embodiment 1-10 and comparative example 1-2 glass polishing prepared with nano-cerium oxide polishing fluid
Measure of merit, polishing condition are as follows:
Polishing machine: the bis- throwing machines of 15B；The chip being polished: chip glass；It is polished chip the piece number: 35pcs；Polishing pad: poly-
Urethane (fluting)；Polish pressure: 200kg；Polish revolving speed: 35rpm；Polishing time: 100s.
After polishing, after carrying out ultrasonic cleaning, drying to the chip glass of polishing, its apparent state is detected；Use thickness gauge
The thickness difference of chip glass is measured to calculate polishing speed, chip is polished to all 35pcs and is measured, averages to obtain
Polishing speed；Chip is polished to 35pcs with roughness tester to measure, and averages to obtain wafer surface roughness.
The polishing test result of embodiment 1-10 and comparative example 1-2 is shown in Table 2:
The polishing test result of polishing fluid prepared by 2 Examples 1 to 10 of table and comparative example 1~2
As shown in Table 2, for comparative example, nano-cerium oxide polishing fluid made from embodiment 1-10 carries out glass
When glass wafer polishing, the average apparent yield > 90% of product, average polished rate control polishes product in 1-2 μm/min
Surface roughness is down to Ra < 0.65nm by Ra > 0.9nm, not only fully meets in glass polishing manufacturing process for polishing speed
The requirement of rate and apparent mass, and improve quality of finish.
As seen from the above embodiment, the present invention provides a kind of glass polishing nano-cerium oxide polishing fluids, with quality point
Number meter, including following components: ceria oxide powder 10-25%, dispersing agent 0.1-2%, the activating agent of partial size 80-200nm is
0.1-2%, filler 0.01-2%, surplus are water；The filler be selected from one of microcrystalline cellulose, xanthan gum and montmorillonite or
It is a variety of.Nano-cerium oxide polishing fluid provided by the invention polishing efficiency with higher under the synergistic effect of said components, and
It is lower to polish product surface roughness.The results showed that when nano-cerium oxide polishing fluid carries out chip glass polishing, product
Average apparent yield > 90%, average polished rate are 1-2 μm/min, and the surface roughness of product is down to Ra by Ra > 0.9nm
< 0.65nm.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications are also answered
It is considered as protection scope of the present invention.
Claims (7)
1. a kind of glass polishing nano-cerium oxide polishing fluid, based on mass fraction, including following components:
The ceria oxide powder 10-25% of partial size 80-200nm, dispersing agent 0.1-2%, activating agent 0.1-2%, filler 0.01-2%,
Surplus is water；
The filler is selected from one of microcrystalline cellulose, xanthan gum and montmorillonite or a variety of.
2. glass polishing according to claim 1 nano-cerium oxide polishing fluid, which is characterized in that the dispersing agent is selected from
One of stearic acid, polyethyleneimine and polyurethane are a variety of.
3. glass polishing according to claim 2 nano-cerium oxide polishing fluid, which is characterized in that the activating agent is selected from
One of 1,2- propylene glycol, glycerine, 1,3 butylene glycol and oleic acid are a variety of.
4. glass polishing according to claim 3 nano-cerium oxide polishing fluid, which is characterized in that the glass polishing is used
Nano-cerium oxide polishing fluid specifically includes:
It is the ceria oxide powder 20% of partial size 120nm, stearic acid 0.8%, 1,2- propylene glycol 0.6%, microcrystalline cellulose 0.8%, remaining
Amount is water；
Or partial size 150nm ceria oxide powder 22%, polyethyleneimine 0.6%, 1,2- propylene glycol and oleic acid mixture 0.4%,
Montmorillonite 1.0%, surplus are water；
Or ceria oxide powder 16%, stearic acid and the polyurethane mixture 0.5% of partial size 160nm, 1,2- propylene glycol and glycerine
Mixture 0.2%, montmorillonite 0.4%, surplus are water；
Or ceria oxide powder 19%, stearic acid, polyethyleneimine and the polyurethane mixture 0.9% of partial size 130nm, glycerine,
1,3- fourth propylene glycol and oleic acid mixture 0.1%, xanthan gum and montmorillonite mixture 0.5%, surplus are water；
Or ceria oxide powder 14%, stearic acid 0.6%, oleic acid 0.25%, xanthan gum and the montmorillonite mixture of partial size 160nm
0.6%, surplus is water.
5. the preparation method of glass polishing nano-cerium oxide polishing fluid described in a kind of claim 1-4 any one, including with
Lower step:
Water, dispersing agent and filler are mixed, the first mixture is obtained；
The ceria oxide powder of first mixture and partial size 80-200nm are mixed, the second mixture is obtained；
Second mixture and activating agent are mixed, ultrasonic disperse obtains glass polishing nano-cerium oxide polishing fluid.
6. preparation method according to claim 5, which is characterized in that the condition of the water, dispersing agent and filler in stirring
Lower mixing；The rate of stirring is 400-600rpm.
7. preparation method according to claim 5, which is characterized in that the oxygen of first mixture and partial size 80-200nm
4~5h is stood after changing the mixing of cerium powder.
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111635700A (en) * | 2020-06-04 | 2020-09-08 | 清远市宏图助剂有限公司 | Efficient anti-cracking polishing solution and using method thereof |
| CN113004805A (en) * | 2021-03-23 | 2021-06-22 | 中国工程物理研究院机械制造工艺研究所 | High-efficiency polishing slurry for fused quartz magnetorheological polishing and preparation method thereof |
| CN113372821A (en) * | 2021-06-09 | 2021-09-10 | 广东富行洗涤剂科技有限公司 | Glass polishing solution capable of improving yield and reducing consumption and preparation method thereof |
| CN113956798A (en) * | 2021-10-21 | 2022-01-21 | 河南联合精密材料股份有限公司 | Polycrystalline cerium oxide polishing solution for polishing microcrystalline glass and preparation method and application thereof |
| CN114231183A (en) * | 2022-01-11 | 2022-03-25 | 广东富行洗涤剂科技有限公司 | Nano cerium oxide suspension for grinding and polishing glass and preparation method thereof |
| CN114479676A (en) * | 2022-03-08 | 2022-05-13 | 机械科学研究总院海西（福建）分院有限公司 | Low-abrasive-content and weakly acidic polishing solution for ultraprecise processing of optical glass and preparation method thereof |
| CN115074087A (en) * | 2022-06-24 | 2022-09-20 | 广东优贝精细化工有限公司 | Glass grinding agent and preparation method thereof |
| CN117327451A (en) * | 2023-09-28 | 2024-01-02 | 中建材光芯科技有限公司 | Polishing mixture for polishing polymer optical fiber panel and preparation method and application thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114479676A (en) * | 2022-03-08 | 2022-05-13 | 机械科学研究总院海西（福建）分院有限公司 | Low-abrasive-content and weakly acidic polishing solution for ultraprecise processing of optical glass and preparation method thereof |
| CN115074087A (en) * | 2022-06-24 | 2022-09-20 | 广东优贝精细化工有限公司 | Glass grinding agent and preparation method thereof |
| CN117327451A (en) * | 2023-09-28 | 2024-01-02 | 中建材光芯科技有限公司 | Polishing mixture for polishing polymer optical fiber panel and preparation method and application thereof |
| CN117327451B (en) * | 2023-09-28 | 2024-03-22 | 中建材光芯科技有限公司 | Polishing mixture for polishing polymer optical fiber panel and preparation method and application thereof |
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Application publication date: 20191022 |