CN110352480A - 自动化衬底支架承载装置 - Google Patents
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Abstract
本发明涉及待用于无尘室中的衬底支架承载装置及含有此类衬底支架承载装置的无尘室处理装置。此外,本发明涉及承载具有第一衬底、更优选地具有第一及第二衬底的衬底支架的方法。
Description
技术领域
本发明涉及一种自动化衬底支架承载装置及一种含有此类衬底支架承载装置的无尘室处理装置,优选地用于电镀。此外,本发明涉及一种自动地承载双侧衬底支架的方法。
背景技术
衬底支架的使用在所属领域中为我们所知。在本文中,将通常提供极敏感的表面的衬底放置于衬底支架中,以尤其允许经由至少一个处理步骤来较容易地输送及处理所述衬底。使用此类衬底支架会高度地缩减损坏衬底的风险且甚至允许自动地加工高度敏感的衬底。举例来说,WO 2014053300 A1及WO 2016096946 A1涉及此类衬底支架及其效益。
然而,此类衬底承载元件提供衬底的平缓处置与衬底在衬底支架中的准确放置的平衡。在例如在将衬底交递至衬底支架期间将衬底牢固地附接至夹持器及衬底支架的状况下,极准确的放置是可能的。如果前述附接中的一或两者减弱,那么放置至少在长期运行时变得较不准确。已注意到,将高质量涂层涂覆于提供高度增加的敏感度的新种类的衬底上会需要准确放置与平缓处置的新平衡。当前系统似乎未能提供所需平衡或成本显著地增加。在本文中,已提到多个问题。减慢放置或多次校正位置会高度地缩减产出率,这是因为此步骤已经表示加工的瓶颈。考虑到经处理衬底的高价值以及构建及维持无尘室生产的成本,接受使用较大衬底的较不准确的放置且忽略衬底的损耗的未经处理的外部部件表示显著的损耗。接受使用正常尺寸的衬底的较不准确的放置且接纳电触点的不正确的放置会提供不规则的电接触,这通常会产生对于高质量要求是不可接受的显著非均质涂层。因此,必须测试对应衬底,且必须预期到,大量衬底不满足市场所需求的要求。此外,基于电子器械在现代社会中的稳定增加的重要性,生产系统应有益地提供不同衬底及衬底支架的灵活处置,以快速地适应于当前需求且尽可能地使用无尘室中的最小量的工作空间来适应生产。
本发明的目标
因此,需要提供一种改进式衬底支架承载装置以提供平缓而准确的处置的改进式平衡,以准备好用于新种类的衬底,优选地灵活地使用且仍允许高频率的衬底加工。
发明内容
前述问题由本发明解决,如独立权利要求及具体实施方式中所揭示。提供额外效益的另外修改包含于附属权利要求及以下具体实施方式中。然而,本文中未明确地陈述但从本文中所论述的联系直接可导出或可辨别的甚至另外效益由本发明及本文中所揭示的其实施例解决。
本发明涉及一种用于衬底至无尘室内部的衬底支架中的自动化水平承载的衬底支架承载装置,其中衬底支架承载装置含有衬底支架导引元件、驱动单元、移动机构、衬底支架处置元件及张开机构,其中驱动单元连接至移动机构,其中移动机构连接至衬底支架处置元件,其中移动机构适应于将来自驱动单元的推进传输至衬底支架处置元件以提供衬底支架处置元件围绕基本上平行于衬底的表面的轴线的旋转,其中衬底支架处置元件适应于旋转达约180°,其中衬底支架处置元件适应于可逆地紧固衬底支架且其中衬底支架处置元件含有张开机构,其中张开机构适应于自动地张开及闭合衬底支架,且其中移动机构含有步进齿轮及/或其中驱动单元为步进电机,优选地其中移动机构含有步进齿轮。
已注意到,尤其优选的是移动机构含有步进齿轮。此类移动机构允许提供衬底支架处置元件的可靠移动且允许使用提供高能效及高可靠性的基本驱动单元。
如本文中所使用的短语“约180°”优选地是指选自160°至200°、更优选地为170°至190°、甚至更为175°至185°的范围的角度。尤其,优选的是约180°是指180°的角度。在本文中,必须理解,旋转可能会中断,或其可能会旋转达大于约180°的角度且进一步含有在相反方向上的另一旋转以提供达约180°的总旋转。然而,通常优选的是衬底支架处置元件直接旋转达约180°。自然地,所述衬底支架处置元件还可旋转达小于指定角度。此类旋转可能例如用以在将经承载衬底支架从衬底支架承载装置送至无尘室处理装置的处理槽或电镀腔室之前使衬底支架竖直地定向。此外,所述衬底支架处置元件还可适应于旋转达较大角度。然而,已注意到,由于装置需求的增加,提供适应于提供较大旋转的衬底支架承载装置通常较不有益,所述装置需求通常未由对应效益补偿。在此上下文中,已注意到,举例来说,可靠地提供约180°的此类旋转而不增加安全性风险、避免衬底污染且保障尤其是衬底支架处置元件的电管线及真空管线在旋转期间的连接相当有挑战性且产生了本发明。虽然在无尘室外部所属领域的技术人员可依赖于标准手段来解决这些问题,但无尘室的高需求会消除许多可能性,而同时需要找到最佳平衡解决方案以用于保障安全生产而无长久的停工时间。
此外,本发明涉及一种用于湿式处理、优选地为电镀的无尘室处理装置,其中无尘室处理装置含有至少一个本发明衬底支架承载装置。
此外,本发明涉及一种使用本发明衬底支架承载装置来承载具有第一衬底的衬底支架的方法。
如本文中所使用的短语“自动地张开及闭合衬底支架”是指衬底支架的自动化张开及闭合,其可被预编程或从远处触发。举例来说,处理装置可经编程以基于过程步骤而自动地张开及闭合引入至衬底支架承载装置中的衬底支架,以提供在所述处理装置中处理的衬底的平稳且快速的加工。此外,其可例如由操作者在手动地运行处理装置以逐步地审阅处理过程或用于故障诊断期间从所述装置外部触发。
附图说明
为了更完全地理解本发明,参考结合附图所考虑的本发明的以下具体实施方式,图中:
图1展示本发明衬底支架承载装置的示意性透视图。
图2展示图1的衬底支架承载装置的衬底支架处置元件内部的示意性透视图,其中施压工具张开。
图3展示图1的衬底支架承载装置的衬底支架处置元件内部的示意性透视图,其中施压工具降低。
具体实施方式
根据一方面,本发明涉及用于衬底至无尘室内部的衬底支架中的自动化水平承载的衬底支架承载装置,其中衬底支架承载装置含有衬底支架导引元件、驱动单元、移动机构、衬底支架处置元件及张开机构,其中驱动单元连接至移动机构,其中移动机构连接至衬底支架处置元件,其中移动机构适应于将来自驱动单元的推进传输至衬底支架处置元件以提供衬底支架处置元件围绕基本上平行于衬底的表面的轴线的旋转,其中衬底支架处置元件适应于旋转达约180°,其中衬底支架处置元件适应于可逆地紧固衬底支架且其中衬底支架处置元件含有张开机构,其中张开机构适应于自动地张开及闭合衬底支架,且其中移动机构含有步进齿轮及/或其中驱动单元为步进电机,优选地其中移动机构含有步进齿轮。待使用如本文中所揭示的衬底支架承载装置而承载至衬底支架中的衬底的实例为板状衬底,比如晶片及印刷电路板,优选地为晶片。
通常,优选的是驱动单元与衬底支架处置元件之间的距离及/或移动机构的长度保持尽可能地短。尤其,通常优选的是驱动单元及/或步进齿轮与衬底支架处置元件之间的距离小于50cm,更优选地小于30cm,甚至更优选地小于20cm。通常,尤其优选的是移动机构含有步进齿轮。此类移动机构允许提供衬底支架处置元件的可靠移动且允许使用提供高能效及高可靠性的基本驱动单元。
如本文中所使用的短语“围绕基本上平行于衬底的表面的轴线旋转”是指在衬底支架承载装置中的承载过程期间基于仅略微偏离平行于放置至衬底支架中的衬底的表面的轴线的轴线的旋转。优选地,所述轴线与此平行轴线偏离小于10°、更优选地小于5°、甚至更优选地小于2°。通常,尤其优选的是轴线平行于表面。
如本文中所使用的短语“移动机构”是指适应于将由驱动单元提供的推进传输至衬底支架处置元件的衬底支架承载装置的子单元。
出乎意料地,已注意到,考虑到本发明的前述目标,本发明衬底支架承载装置提供最佳的整体结果。尤其,已注意到,包含用于移动衬底支架的步进齿轮的本发明机械构件提供极大的效益。与预期此类机构将引起紧邻于衬底的无尘室气氛的粒子污染相反的,所述机构被证明为相较于比如液压、气动或其它机械机构的机构优良得多。在本文中,例如已注意到,此类简单囊封步进齿轮显著地缩减或甚至预防气氛污染,其中所述囊封还可有效地与真空元件组合以将所释出的任何细粒缩减至接近于零或甚至将其完全地消除。然而,甚至在无额外真空元件的情况下,已注意到,使用此类囊封步进齿轮仍适于满足高质量无尘室要求。同时,使用此类步进齿轮会允许有效地控制旋转程度,而驱动单元可例如选自尺寸小、需要较少能量且提供高寿命及高可靠性的简单异步电机。除了出乎意料地验证紧邻于无尘室中的衬底的此类机械移动组件以外,所述构件进一步提供处置如本文中所指定的衬底支架处置元件的能力。考虑到必须包含的机械、电子器械及控制装置的数目,所述衬底支架处置元件的重量成为考虑确保安全操作的相关事实。对于典型的衬底尺寸,衬底支架处置元件的重量易于超过100kg。
已进一步注意到,比如液压及气动替代物的通常使用的系统被证明为在长期运行时是不适宜的。其未提供所需精确度,其需要极复杂的控制来检测及平衡偏差,或系统上的缺陷会引起极大的损坏,从而需要至少长的处理装置停工时间。
此外,已注意到,水平地放置衬底支架会允许提供衬底的高度准确的放置,同时缩减施加于衬底上的应力。与提供达约180°的准确旋转的可能性组合,而不管衬底支架处置元件的高重量,此衬底支架承载装置提供显著的改进。
另外,已注意到,本发明衬底支架承载装置被证明为尤其有益于提供模块化系统。在本文中,本发明衬底支架承载装置允许在维护期间仅仅交换衬底支架处置元件,或允许针对不同类型的衬底支架提供不同类型的衬底支架处置元件。这变得可能,这是因为基于运用本发明系统来准确地处置高重量的可能性,大部分复杂且特定的部件可包含于衬底支架处置元件中。尤其将控制机构包含至衬底支架处置元件中会高度地缩减所需连接的数目,且因此简化此类衬底支架处置元件的断开连接及重新连接。
尽管还可通过准确地移动将衬底支架引入至衬底支架处置元件中的装置来实现确切放置,但已注意到,提供衬底支架导引元件是有益的。不管由此类机械接触产生的可能细粒,已注意到,可尤其考虑到此方法的可靠性而忽略此类副作用。根据本发明的另外实施例,衬底支架导引元件是选自以下各者的群组:限止器,其适应于接触衬底支架的边缘;及突出元件,其适应于装配至衬底支架的对应物中。
通常,尤其优选的是衬底支架导引元件含有至少一个突出元件。这进一步提供可使用不同尺寸的衬底支架的效益,这是因为衬底支架的外部边界变得对于准确放置不相关。此外,衬底支架的生产简化,这是因为可在生产过程结束时引入衬底支架中的对应物,从而简化及减低衬底支架的生产成本。
此外,已注意到,特定张开机构通常是有益的。根据本发明的另外实施例,张开机构是基于机械、压力或磁性构件。已注意到,基于机械构件的张开机构被证明为尤其有用。
通常,进一步优选的是衬底支架承载装置的移动机构仅使用机械构件以将驱动单元的推进转移至衬底支架处置元件。已注意到,完全地消除移动机构中基于液压或气动构件的部件通常会进一步增加移动精确度且允许较高移动速度。
另外,已注意到,可通过选择适当齿轮来进一步增加步进齿轮的效率及可靠性。根据本发明的另外实施例,步进齿轮的输入轴件、步进齿轮的输出轴件或两者含有球状蜗轮。在本文中,已经使用单一球状齿轮会提供显著的改进。然而,尤其优选的是相互作用的两个齿轮是选自球状蜗轮。
此外,已注意到,通过在将衬底放置于衬底支架的不同部件中时使用特定种类的夹持器以可逆地附接所述衬底支架的部件,可进一步缩减粒子污染的风险。根据本发明的另外实施例,衬底支架处置元件含有真空夹持器以在将衬底放置于衬底支架的不同部件中时可逆地附接至衬底支架的部件。
另外,已注意到,通常优选的是包含施压工具,施压工具在与机械或磁性张开机构一起使用的情况下尤其有益。根据本发明的另外实施例,衬底支架承载装置含有施压工具,施压工具适应于在张开机构起作用时将衬底支架的至少两个部件施压在一起。在提供此类施压工具的机械张开机构尤其有效的状况下,似乎进一步减低细粒产生,衬底支架的部件施压在一起,且释放机构在衬底支架的张开及闭合期间较少地应变。通常,优选的是施压工具含有真空夹持器,真空夹持器适应于在将衬底放置于衬底支架中时可逆地附接衬底支架的部件。
此外,已出乎意料地注意到,滑动元件的使用被证明为有帮助,但此类滑动元件通常代表另外粒子污染源。根据本发明的另外实施例,施压工具含有至少一个滑动元件,其中至少一个滑动元件结合、优选地含有真空元件,真空元件适应于提取至少一个滑动元件处所释出的细粒。通常,优选的是衬底支架元件含有至少两个、更优选地为至少三个、甚至更优选地为至少四个滑动元件,滑动元件结合、优选地含有此类真空元件。尽管此类机械构件通常应避免用于将在无尘室中使用的装置,但已注意到,组合此类滑动元件与真空元件以移除所产生的细粒会提供压力工具的可靠及准确移动的极佳平衡,而不会使衬底遭到污染危险。
另外,已注意到,似乎不需要高真空以从衬底支架处置元件中的粒子源移除细粒,且因此可使用具有较低功率的小真空泵来移除粒子。此类小真空泵可集成至衬底支架处置元件中。然而,已注意到,通常优选的是将真空泵放置于衬底支架处置元件外部以缩减所述元件的重量。此外,消除由此类真空泵引起的衬底支架处置元件的微小振动会似乎进一步改进准确放置。根据本发明的另外实施例,将至少一个真空元件连接至位于衬底支架处置元件外部的真空泵。
此外,已注意到,在处理装置中包含提供与周围环境隔离的外壳会显著地增加安全性。根据本发明的另外实施例,衬底支架处置元件含有外壳。另外,已注意到,基于外壳针对内部组件提供的保护,此类外壳简化所述衬底支架处置元件在维护期间的更换。衬底支架承载装置的剩余组件显示显著的寿命及可靠性。因此,衬底支架处置元件含有此类构件以容易地更换含有对于维护最重要的所有部件的完整单元会提供停工时间的显著的减低,从而增加产出率。
另外,已注意到,本发明衬底支架承载装置出乎意料地尤其适合于无尘室处理装置。根据另一方面,本发明涉及用于湿式处理的无尘室处理装置,其中无尘室处理装置含有至少一个本发明衬底支架承载装置。此类湿式处理的实例为化学金属沉积或电镀、化学或电解蚀刻及/或化学清洁。尤其优选的是用于电镀、化学蚀刻及/或化学清洁、更优选地用于电镀的无尘室处理装置。此类电镀可用以沉积例如铜,其中此类铜沉积可借助于竖直沉积而有益地执行。
此外,已注意到,包含机器人臂会提供极有效率的方式以使与本发明衬底支架承载装置组合的无尘室处理装置中的衬底处置自动化。根据本发明的另外实施例,无尘室处理装置含有至少一个机器人臂以将衬底从引入至所述无尘室处理装置中的盒子输送至衬底支架承载装置。
另外,已注意到,对准器有益地包含于无尘室处理装置中。根据本发明的另外实施例,无尘室处理装置含有至少一个对准器,所述对准器适应于在将衬底放置至衬底支架承载装置中的衬底支架中之前使衬底对准。提供此类对准器会允许使衬底更准确地定向,这与本发明衬底支架承载装置的可能性组合而变得尤其有用。
此外,已注意到,接触式夹持器,尤其是真空夹持器,尤其适于典型应用。此类夹持器似乎尤其适于提供衬底的准确放置。根据本发明的另外实施例,机器人臂使用接触式夹持器以将衬底从对准器输送至衬底支架承载装置。通常,优选的是此类接触式夹持器为真空夹持器。
另外,已注意到,通常可通过将由机械构件引起的细粒导引至无尘室处理装置外部来实现所述细粒的尤其有效的移除。根据本发明的另外实施例,将至少一个真空元件连接至无尘室处理装置外部。以此方式,变得有可能将无尘室处理装置的对应出口与无尘室外部进一步连接以将无尘室中所释出的细粒缩减至接近于零或甚至为零。
根据另一方面,本发明涉及一种使用本发明衬底支架承载装置来承载具有第一衬底的衬底支架的方法。
此外,已注意到,本发明衬底支架处置尤其适于将两个衬底准确地放置于衬底支架的相对侧上。根据本发明的另外实施例,基于第一衬底的位置,将第二衬底承载至衬底支架的相对侧上。
根据本发明的另外实施例,在将第二衬底承载至衬底支架上之前,使衬底支架承载装置的衬底支架处置元件旋转达约180°。此类方法提供关于两个衬底的准确放置的极佳结果,同时缩减施加至衬底的机械应力。
根据本发明的另外实施例,本发明方法含有以下步骤:
d)将第一衬底放置于衬底支架上,
e)将第一衬底顶部上的第一对应物紧固至衬底支架,
f)使衬底支架围绕基本上平行于第一衬底的表面的轴线旋转达约180°,
i)将第二衬底放置于衬底支架上,
j)将第二衬底顶部上的第二对应物紧固至衬底支架。
根据本发明的另外实施例,本发明方法含有以下步骤:
a)将衬底支架安装至衬底支架承载装置中,
b)从衬底支架移除第一对应物,
c)从衬底支架中取出通过移除如果存在的第一对应物而拆卸的衬底支架中已经含有的衬底,
d)将第一衬底放置于衬底支架上,
e)将第一衬底顶部上的第一对应物紧固至衬底支架,
f)使衬底支架围绕基本上平行于第一衬底的表面的轴线旋转达约180°,
g)从衬底支架移除第二对应物,
h)从衬底支架中取出通过移除如果存在的第二对应物而拆卸的衬底支架中已经含有的衬底,
i)将第二衬底放置于衬底支架上,
j)将第二衬底顶部上的第二对应物紧固至衬底支架。已注意到,此类方法允许提供具有高产出率的高效的承载过程。在本文中,可将例如来自处理的经承载衬底支架引入至衬底支架承载装置中。可移除其中所含有的衬底,且可将待处理的第一及第二衬底放置于仍张开的衬底支架中。因此,即使衬底已经存在于衬底支架中,但整体处置过程也未改变很多且承载所需要的时间保持相当。这例如允许自由地组合提供多个同时执行的过程步骤的高产出率过程与由于维护原因的单衬底支架的灵活更换,或从一种类型的衬底支架平稳地改变至另一类型的衬底支架。
根据本发明的另外实施例,步骤d)及i)中的第一衬底及第二衬底的放置是通过使用附接至机器人臂的接触式夹持器、更优选地为真空夹持器而执行。此类夹持器通常是优选的,这是因为其允许极准确地处置衬底。
提供以下非限制性实例以说明本发明的优选实施例且促进对本发明的理解,但并不意图限制本发明的范围,所述范围是由在此随附的权利要求书界定。
图1展示本发明衬底支架承载装置1的示意性透视图。所述衬底支架承载装置1适应于衬底至无尘室内部的衬底支架中的自动化水平承载。其含有衬底支架导引元件、驱动单元2、移动机构6、衬底支架处置元件7及张开机构。为异步电机的驱动单元2连接至含有步进齿轮3的移动机构6。移动机构6的步进齿轮3含有输入轴件及输出轴件,其中两个轴件皆含有球状蜗轮,其中所述球状蜗轮相互作用以将来自输入轴件的推进转移至输出轴件。此类步进齿轮3提供推进的尤其有效的转移以及高寿命。
所述移动机构6进一步连接至衬底支架处置元件7。驱动单元2的推进通过移动机构6传输至衬底支架处置元件7,以提供衬底支架处置元件7沿着基本上平行于衬底的表面的轴线的180°旋转。衬底支架处置元件7适应于可逆地紧固衬底支架,且含有张开机构以自动地张开及闭合放置于衬底支架处置元件7中的衬底支架。
衬底支架处置元件7的内部进一步提供为突出元件的衬底支架导引元件,突出元件适应于装配至衬底支架的对应物中。此外,其含有基于机械构件的张开机构以与衬底支架的释放机构自动机械地相互作用。触发所述释放机构会拆离衬底支架的对应物以允许衬底放置于衬底支架内部。
此外,衬底承载器处置元件7含有真空夹持器以在将衬底放置于衬底支架的不同部件中时可逆地附接至衬底支架的部件。所述真空夹持器位于施压工具5处,施压工具5适应于在张开机构激活时将衬底支架的至少两个部件施压在一起。所述施压工具5含有位于衬底支架处置元件7的拐角处的四个滑动元件,其中每一滑动元件提供真空元件,真空元件适应于提取所述滑动元件处所释出的细粒。真空元件连接至位于衬底支架处置元件7外部的真空泵。另外,衬底支架处置元件7含有环绕衬底支架处置元件7内部的外壳4。
图2展示图1的衬底支架承载装置1的衬底支架处理元件7内部的示意性透视图,其中施压工具5张开。在本文中,四个滑动元件9中的三者是可见的,且展示附接至两个滑动元件的真空元件8。
衬底支架处置元件7的施压工具5视需要处于其张开位置,以将衬底支架放置于衬底支架处置元件7中或将衬底放置于张开的衬底支架中。
图3展示图1的衬底支架承载装置的衬底支架处理元件7内部的示意性透视图,其中施压工具5降低。施压工具5沿着四个滑动元件9移动,其中真空元件8移除由移动引起的细粒。未展示衬底支架处置元件7中所含有的衬底支架以致使所述图较清晰。在此位置中,衬底支架的部件施压在一起以更易于触发衬底支架的机械释放机构且缩减由机械元件的移动引起的摩擦。
参考符号
1:衬底支架承载装置
2:驱动单元
3:步进齿轮
4:外壳
5:施压工具
6:移动机构
7:衬底支架处置元件
8:真空元件
9:滑动元件
Claims (15)
1.一种用于衬底至无尘室内部的衬底支架中的自动化水平承载的衬底支架承载装置(1),
其中所述衬底支架承载装置(1)含有衬底支架导引元件、驱动单元(2)、移动机构(6)、衬底支架处置元件(7)及张开机构,
其中所述驱动单元(2)连接至所述移动机构(6),
其中所述移动机构(6)连接至所述衬底支架处置元件(7),
其中所述移动机构(6)适应于将来自所述驱动单元(2)的推进传输至所述衬底支架处置元件(7)以提供所述衬底支架处置元件(7)沿着基本上平行于所述衬底的表面的轴线的旋转,
其中所述衬底支架处置元件(7)适应于旋转达约180°,
其中所述衬底支架处置元件(7)适应于可逆地紧固所述衬底支架且其中所述衬底支架处置元件(7)含有所述张开机构,
其中所述张开机构适应于自动地张开及闭合所述衬底支架,且
其中所述移动机构(6)含有步进齿轮(3)及/或其中所述驱动单元(2)为步进电机。
2.根据权利要求1所述的衬底支架承载装置(1),其中所述至少一个衬底支架导引元件是选自以下各者的群组:限止器,其适应于接触所述衬底支架的边缘;及突出元件,其适应于装配至所述衬底支架的对应物中。
3.根据权利要求1或2所述的衬底支架承载装置(1),其中所述张开机构是基于机械、压力或磁性构件。
4.根据前述权利要求中任一权利要求所述的衬底支架承载装置(1),其中所述步进齿轮(3)的输入轴件、所述步进齿轮(3)的输出轴件或两者含有球状蜗轮。
5.根据前述权利要求中任一权利要求所述的衬底支架承载装置(1),其中所述衬底支架处置元件(7)含有真空夹持器以在将所述衬底放置于所述衬底支架的不同部件中时可逆地附接至所述衬底支架的部件。
6.根据前述权利要求中任一权利要求所述的衬底支架承载装置(1),其中所述衬底支架承载装置(1)含有施压工具(5),所述施压工具(5)适应于在所述张开机构起作用时将所述衬底支架的至少两个部件施压在一起。
7.根据前述权利要求中任一权利要求所述的衬底支架承载装置(1),其中所述施压工具(5)含有至少一个滑动元件(9),
其中所述至少一个滑动元件(9)结合真空元件(8),所述真空元件(8)适应于提取所述至少一个滑动元件(9)处所释出的细粒。
8.根据前述权利要求中任一权利要求所述的衬底支架承载装置(1),其中所述至少一个真空元件连接至位于所述衬底支架处置元件(7)外部的真空泵。
9.根据前述权利要求中任一权利要求所述的衬底支架承载装置(1),其中所述衬底支架处置元件(7)含有外壳(4)。
10.一种用于湿式处理、优选地电镀的无尘室处理装置,其中所述无尘室处理装置含有至少一个根据权利要求1至9中任一权利要求所述的衬底支架承载装置(1)。
11.根据权利要求10所述的无尘室处理装置,其中所述无尘室处理装置含有至少一个机器人臂以将衬底从引入至所述无尘室处理装置中的盒子输送至所述衬底支架承载装置(1)。
12.根据权利要求10至11中任一权利要求所述的无尘室处理装置,其中所述无尘室处理装置含有至少一个对准器,所述至少一个对准器适应于在将所述衬底放置至所述衬底支架承载装置(1)中的衬底支架中之前使所述衬底对准。
13.根据权利要求10至12中任一权利要求所述的无尘室处理装置,其中所述机器人臂使用接触式夹持器以将所述衬底从所述对准器输送至所述衬底支架承载装置(1)。
14.一种使用根据权利要求1至9中任一权利要求所述的衬底支架承载装置(1)来承载具有第一衬底的衬底支架的方法。
15.根据权利要求14所述的方法,其含有以下步骤:
a)将衬底支架安装至所述衬底支架承载装置(1)中,
b)从所述衬底支架移除第一对应物,
c)从所述衬底支架中取出所述衬底支架中已经含有的通过移除所述第一对应物(如果存在)而拆卸的衬底,
d)将第一衬底放置于所述衬底支架上,
e)将所述第一衬底顶部上的第一对应物紧固至所述衬底支架,
f)使所述衬底支架围绕基本上平行于所述衬底的表面的轴线旋转达约180°,
g)从所述衬底支架移除第二对应物,
h)从所述衬底支架中取出所述衬底支架中已经含有的通过移除所述第二对应物(如果存在)而拆卸的衬底,
i)将第二衬底放置于所述衬底支架上,
j)将所述第二衬底顶部上的第二对应物紧固至所述衬底支架。
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